JP7693306B2 - 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法 - Google Patents
情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法 Download PDFInfo
- Publication number
- JP7693306B2 JP7693306B2 JP2020206835A JP2020206835A JP7693306B2 JP 7693306 B2 JP7693306 B2 JP 7693306B2 JP 2020206835 A JP2020206835 A JP 2020206835A JP 2020206835 A JP2020206835 A JP 2020206835A JP 7693306 B2 JP7693306 B2 JP 7693306B2
- Authority
- JP
- Japan
- Prior art keywords
- information
- layout data
- data
- layout
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Landscapes
- General Factory Administration (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020206835A JP7693306B2 (ja) | 2020-12-14 | 2020-12-14 | 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020206835A JP7693306B2 (ja) | 2020-12-14 | 2020-12-14 | 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022094041A JP2022094041A (ja) | 2022-06-24 |
| JP2022094041A5 JP2022094041A5 (https=) | 2023-12-11 |
| JP7693306B2 true JP7693306B2 (ja) | 2025-06-17 |
Family
ID=82088463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020206835A Active JP7693306B2 (ja) | 2020-12-14 | 2020-12-14 | 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7693306B2 (https=) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004294358A (ja) | 2003-03-28 | 2004-10-21 | Hitachi High-Technologies Corp | 欠陥検査方法および装置 |
| JP2006287061A (ja) | 2005-04-01 | 2006-10-19 | Canon Inc | 露光装置及びそのパラメータ設定方法 |
| JP2006310551A (ja) | 2005-04-28 | 2006-11-09 | Hitachi High-Technologies Corp | 検査支援システム、及び方法 |
| JP2008065555A (ja) | 2006-09-06 | 2008-03-21 | Hitachi High-Technologies Corp | 画像処理装置の機能診断方法及び機能診断システム |
| JP2011154918A (ja) | 2010-01-28 | 2011-08-11 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
-
2020
- 2020-12-14 JP JP2020206835A patent/JP7693306B2/ja active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004294358A (ja) | 2003-03-28 | 2004-10-21 | Hitachi High-Technologies Corp | 欠陥検査方法および装置 |
| JP2006287061A (ja) | 2005-04-01 | 2006-10-19 | Canon Inc | 露光装置及びそのパラメータ設定方法 |
| JP2006310551A (ja) | 2005-04-28 | 2006-11-09 | Hitachi High-Technologies Corp | 検査支援システム、及び方法 |
| JP2008065555A (ja) | 2006-09-06 | 2008-03-21 | Hitachi High-Technologies Corp | 画像処理装置の機能診断方法及び機能診断システム |
| JP2011154918A (ja) | 2010-01-28 | 2011-08-11 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2022094041A (ja) | 2022-06-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4779003B2 (ja) | フルチップ設計のパターン分解を行うための方法 | |
| JP4751866B2 (ja) | ターゲットパターンを複数のパターンに分解するための方法、そのコンピュータプログラムを記憶するコンピュータ読取可能記憶媒体、デバイス製造方法、およびマスクを生成するための方法 | |
| KR100860088B1 (ko) | 다중 노광 리소그래피 프로세스에 사용하기 위한 모델 기반기하학적 분해를 위한 방법, 프로그램물 및 장치 | |
| US20030061592A1 (en) | General purpose shape-based layout processing scheme for IC layout modifications | |
| JP7090650B2 (ja) | 変形を求める方法 | |
| US20050081178A1 (en) | Multiple exposure technique to pattern tight contact geometries | |
| JP2022016547A (ja) | 製品ユニットの製造プロセスのシーケンスの最適化 | |
| KR20080043724A (ko) | Dpt 프로세스에 사용하기 위한 패턴의 분해를 수행하는방법, 프로그램물 및 장치 | |
| JP7693305B2 (ja) | 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法 | |
| JP2005538425A (ja) | 多層レチクル | |
| JP7693306B2 (ja) | 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法 | |
| US7941234B2 (en) | Exposure apparatus and parameter editing method | |
| JP7732048B2 (ja) | 情報処理装置、及び情報処理方法 | |
| TW202209000A (zh) | 資訊處理設備及資訊處理方法 | |
| JP4916116B2 (ja) | パターン特定方法およびパターン特定装置 | |
| JP2008306030A (ja) | マーク設計装置および位置検出装置 | |
| JP7426845B2 (ja) | 計測方法、露光方法、物品の製造方法、プログラム及び露光装置 | |
| JP7340988B2 (ja) | 基板処理装置、および物品製造方法 | |
| CN114859665A (zh) | 信息处理装置、信息处理方法、物品制造系统和方法 | |
| JP2006041126A (ja) | 操作・表示装置、表示方法及び表示プログラム | |
| JP2010153601A (ja) | 情報処理装置、露光装置、デバイス製造方法、情報処理方法およびプログラム | |
| JP2020191379A (ja) | 情報処理装置、プログラム、基板処理装置、物品の製造方法、及び物品の製造システム | |
| TW202232256A (zh) | 資訊處理設備、資訊處理方法、物品製造系統、以及物品製造方法 | |
| JP2005136181A (ja) | 直接露光システムおよびユーザインタフェース | |
| KR20230122025A (ko) | 집적 회로를 제조하기 위한 방법 및 시스템 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20210108 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231130 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231130 |
|
| RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20231213 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20240924 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20241008 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20241206 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20250225 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250417 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20250507 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20250605 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7693306 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |