JP7668093B2 - 成膜方法、成膜装置、および半導体装置の製造方法 - Google Patents

成膜方法、成膜装置、および半導体装置の製造方法 Download PDF

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JP7668093B2
JP7668093B2 JP2020135695A JP2020135695A JP7668093B2 JP 7668093 B2 JP7668093 B2 JP 7668093B2 JP 2020135695 A JP2020135695 A JP 2020135695A JP 2020135695 A JP2020135695 A JP 2020135695A JP 7668093 B2 JP7668093 B2 JP 7668093B2
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film
gas
containing gas
metal
substrate
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JP2021110030A5 (https=
JP2021110030A (ja
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錫亨 洪
毅 高橋
太一 門田
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to US17/758,819 priority Critical patent/US20230037960A1/en
Priority to CN202080092277.5A priority patent/CN114929933A/zh
Priority to KR1020227026933A priority patent/KR102639411B1/ko
Priority to PCT/JP2020/044478 priority patent/WO2021145077A1/ja
Publication of JP2021110030A publication Critical patent/JP2021110030A/ja
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JP2020135695A 2020-01-15 2020-08-11 成膜方法、成膜装置、および半導体装置の製造方法 Active JP7668093B2 (ja)

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Application Number Priority Date Filing Date Title
US17/758,819 US20230037960A1 (en) 2020-01-15 2020-11-30 Film forming method, film forming device, and method for manufacturing semiconductor device
CN202080092277.5A CN114929933A (zh) 2020-01-15 2020-11-30 成膜方法、成膜装置以及半导体装置的制造方法
KR1020227026933A KR102639411B1 (ko) 2020-01-15 2020-11-30 성막 방법, 성막 장치 및 반도체 장치의 제조 방법
PCT/JP2020/044478 WO2021145077A1 (ja) 2020-01-15 2020-11-30 成膜方法、成膜装置、および半導体装置の製造方法

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JP2020004161 2020-01-15
JP2020004161 2020-01-15

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JP2021110030A5 JP2021110030A5 (https=) 2023-03-13
JP7668093B2 true JP7668093B2 (ja) 2025-04-24

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014183195A (ja) 2013-03-19 2014-09-29 Hitachi Ltd 半導体装置とその製造方法
JP2017183551A (ja) 2016-03-30 2017-10-05 東京エレクトロン株式会社 ボロンドープシリコンゲルマニウム膜の形成方法および形成装置
US20180347040A1 (en) 2017-06-02 2018-12-06 Eugenus, Inc. TiSiN Coating Method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10144629A (ja) * 1996-11-11 1998-05-29 Mitsubishi Electric Corp バリアメタルの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014183195A (ja) 2013-03-19 2014-09-29 Hitachi Ltd 半導体装置とその製造方法
JP2017183551A (ja) 2016-03-30 2017-10-05 東京エレクトロン株式会社 ボロンドープシリコンゲルマニウム膜の形成方法および形成装置
US20180347040A1 (en) 2017-06-02 2018-12-06 Eugenus, Inc. TiSiN Coating Method

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