JP7498232B2 - フォトポリマー露光で使用するためのuv led放射光源 - Google Patents
フォトポリマー露光で使用するためのuv led放射光源 Download PDFInfo
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1025—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials using materials comprising a polymeric matrix containing a polymeric particulate material, e.g. hydrophobic heat coalescing particles
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
- F21K9/00—Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
- F21K9/20—Light sources comprising attachment means
- F21K9/27—Retrofit light sources for lighting devices with two fittings for each light source, e.g. for substitution of fluorescent tubes
- F21K9/278—Arrangement or mounting of circuit elements integrated in the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
- G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0061—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
- G02B19/0066—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED in the form of an LED array
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B45/00—Circuit arrangements for operating light-emitting diodes [LED]
- H05B45/10—Controlling the intensity of the light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21W—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO USES OR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS
- F21W2131/00—Use or application of lighting devices or systems not provided for in codes F21W2102/00-F21W2121/00
- F21W2131/40—Lighting for industrial, commercial, recreational or military use
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2103/00—Elongate light sources, e.g. fluorescent tubes
- F21Y2103/10—Elongate light sources, e.g. fluorescent tubes comprising a linear array of point-like light-generating elements
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2115/00—Light-generating elements of semiconductor light sources
- F21Y2115/10—Light-emitting diodes [LED]
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
- G02B3/08—Simple or compound lenses with non-spherical faces with discontinuous faces, e.g. Fresnel lens
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Computer Networks & Wireless Communication (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
- Fastening Of Light Sources Or Lamp Holders (AREA)
Description
LEDと比較すると消費電力が高いこと、
ランプがオンになった後、多くの場合、短期出力がドリフトすること、
出力のドリフトを回避するために、多くの場合、管が、追加のエネルギーを消費する待機モードで動作すること、
電球の寿命にわたってライト出力が一定ではないこと、
500~1000時間後、硬化結果が許容できなくなるほどにUV出力が衰える場合があること、
管の頻繁な交換によりコストが増加すること、
管の水銀含有量が環境的な問題であること。
比較的少ない数の比較的高い電力のLEDの代わりに、比較的多くの均等に分布した比較的低い電力のLEDを使用する手段、
異なる傾斜角度のグループにLEDを配列する手段、
限定はされないが、万華鏡などの反射型オプティクスを使用して、点光源をエリア光源に変換する手段、
限定はされないが、フレネルレンズまたはディフューザプレートなどの透過型オプティクスを使用する手段。
Claims (18)
- フォトポリマー印刷プレートを化学線放射で硬化するための放射光源であって、該放射光源は、
ヒートシンクを備える基部であって、前記基部が、軸に沿って幅および長さを有し、前記長さが、前記幅よりも大きい、基部と、
前記基部上に装着される1つ以上の回路基板であって、前記1つ以上の回路基板が、前記基部の前記長さにわたって分布する複数の発光ダイオード(LED)を集合的に有する、1つ以上の回路基板と、
前記化学線放射に対して透明または半透明で、前記基部上に装着されるカバーであって、該カバーが、前記基部と一緒になって、前記複数のLEDのための筐体を画定する、カバーと、
指定された長さを有する蛍光電球を受容するように構成されたソケットの両側で装着されるように構成された電気コネクタのセットであって、前記放射光源は前記蛍光電球を置き換えるように構成されている、電気コネクタのセットと、
該放射光源内に配設された前記複数のLEDの出力を制御するための制御エレクトロニクスと、前記制御エレクトロニクスに接続され、前記制御エレクトロニクスを動作させるための信号を受信するように構成された遠隔制御レシーバを備える、放射光源。 - 前記放射光源は、ある直径を有する管を備える蛍光電球に置き換えられるように構成されており、前記管の前記直径よりも大きい幅にわたって分布する複数のLEDを含むアレイ内に、前記LEDは分布する、請求項1に記載の放射光源。
- 前記LEDの前記出力は、少なくとも一つの第1の露光特性を提供するように制御可能である、請求項2に記載の放射光源。
- 前記放射光源は、管状形状を有する、請求項1に記載の放射光源。
- 前記基部が、前記カバーの対応する表面を受容するための平面状のカバー装着エリアを備え、前記平面状のカバー装着エリアが、目標照明平面と平行である、請求項1に記載の放射光源。
- 前記基部および前記カバーが、前記基部内の1つ以上の嵌合特徴に嵌合するように構成された、前記カバーの1つ以上のポジ型特徴またはネガ型特徴を備える、インターフェースを有する、請求項1に記載の放射光源。
- 請求項1に記載の放射光源を複数備える、露光システム。
- 前記複数の放射光源の前記遠隔制御レシーバに信号を送信するための遠隔制御トランスミッタをさらに備え、前記遠隔制御トランスミッタが、前記遠隔制御レシーバに伝送される情報を受信するための1つ以上の入力を有する、請求項7に記載の露光システム。
- 前記1つ以上の入力が、前記放射光源について所望の照明強度を設定するための制御パネルを備える、請求項8に記載の露光システム。
- 前記複数の放射光源のうちの1つ以上が発する放射強度を検出するための1つ以上のフォトディテクタをさらに備え、各フォトディテクタが、前記遠隔制御トランスミッタの前記1つ以上の入力にフィードバック信号を提供するように構成されており、前記制御エレクトロニクスが、前記複数の放射光源のうちの1つ以上が発する前記強度を制御するために前記フィードバック信号を使用するように構成されている、請求項8または9に記載の露光システム。
- 前記1つ以上の放射光源の各々が発した放射照度を測定するように構成されたセンサと、前記測定された放射照度に基づいて前記1つ以上の放射光源の各々の強度を制御するように構成されたコントローラと、をさらに備える、請求項7~10のいずれか一項に記載の露光システム。
- 前記コントローラが、前記複数の放射光源の第1の光源の前記強度を制御して、前記第1の光源の性能特性と前記複数の放射光源の第2の光源の性能特性との差を補償するように構成されている、請求項11に記載の露光システム。
- 前記コントローラが、前記複数の放射光源の第1の光源の前記強度を制御して、経時的な前記第1の光源の性能特性の変化を補償するように構成されている、請求項12に記載の露光システム。
- 前記基部が、互いに対して角度付けされ、前記基部の前記軸と平行に配設された複数の表面を備え、前記複数のLEDのサブセット、および前記複数の表面の各々の上に装着される対応する1つ以上の回路基板またはその一部を有する、請求項7~13のいずれか一項に記載の露光システム。
- 前記カバーが、1つ以上のプリズム構造および/または屈折構造を備える、請求項7~14のいずれか一項に記載の露光システム。
- 請求項7~15のいずれか一項に記載の露光システムを使用して、印刷プレートを化学線UV放射に露光する方法。
- 前記印刷プレート内にラウンドトップドットを作り出すための第1の露光特性、および前記印刷プレート内にフラットトップドットを作り出すための第2の露光特性を提供するように、または
第1の強度を有する第1の露光の後に、前記第1の強度よりも高い第2の強度を有する第2の露光を提供するように、
前記複数の発光ダイオードの放射出力を調節すること、をさらに含む請求項16に記載の方法。 - 前記第1の強度を有する前記第1の露光の後に、前記第1の強度よりも高い前記第2の強度を有する前記第2の露光を提供し、前記第1の露光と前記第2の露光とを一緒に組み合わせることにより、前記プレートを硬化させるのに必要な総エネルギー量を提供するように、前記複数の発光ダイオードの放射出力を調節する、請求項17に記載の方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201962893395P | 2019-08-29 | 2019-08-29 | |
US62/893,395 | 2019-08-29 | ||
JP2021500255A JP7133083B2 (ja) | 2019-08-29 | 2020-08-28 | フォトポリマー露光で使用するためのuv led放射光源 |
PCT/EP2020/074075 WO2021038039A1 (en) | 2019-08-29 | 2020-08-28 | Uv led radiation sources for use in photopolymer exposure |
Related Parent Applications (1)
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EP4102298A1 (en) | 2022-12-14 |
JP2022191212A (ja) | 2022-12-27 |
EP3811155A1 (en) | 2021-04-28 |
CN112752997A (zh) | 2021-05-04 |
KR20230008914A (ko) | 2023-01-16 |
KR20210027278A (ko) | 2021-03-10 |
EP3811155B1 (en) | 2022-07-27 |
DK3811155T3 (da) | 2022-08-29 |
US20220305769A1 (en) | 2022-09-29 |
JP7133083B2 (ja) | 2022-09-07 |
KR102486138B1 (ko) | 2023-01-10 |
WO2021038039A1 (en) | 2021-03-04 |
EP3811155B8 (en) | 2022-08-31 |
JP2022501628A (ja) | 2022-01-06 |
KR102588061B1 (ko) | 2023-10-13 |
TW202123787A (zh) | 2021-06-16 |
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