JP7482809B2 - Quantum dot dispersion and curable composition containing the same - Google Patents
Quantum dot dispersion and curable composition containing the same Download PDFInfo
- Publication number
- JP7482809B2 JP7482809B2 JP2021019712A JP2021019712A JP7482809B2 JP 7482809 B2 JP7482809 B2 JP 7482809B2 JP 2021019712 A JP2021019712 A JP 2021019712A JP 2021019712 A JP2021019712 A JP 2021019712A JP 7482809 B2 JP7482809 B2 JP 7482809B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- quantum dot
- weight
- dot dispersion
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002096 quantum dot Substances 0.000 title claims description 104
- 239000000203 mixture Substances 0.000 title claims description 75
- 239000006185 dispersion Substances 0.000 title claims description 56
- 150000001875 compounds Chemical class 0.000 claims description 53
- 238000006243 chemical reaction Methods 0.000 claims description 36
- 239000000178 monomer Substances 0.000 claims description 36
- 239000002904 solvent Substances 0.000 claims description 28
- 239000011342 resin composition Substances 0.000 claims description 22
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 18
- 229910052717 sulfur Inorganic materials 0.000 claims description 18
- 239000011593 sulfur Substances 0.000 claims description 18
- 125000002723 alicyclic group Chemical group 0.000 claims description 16
- 230000002269 spontaneous effect Effects 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 4
- 125000003161 (C1-C6) alkylene group Chemical group 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000002245 particle Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 25
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 19
- 238000000576 coating method Methods 0.000 description 19
- 239000011347 resin Substances 0.000 description 18
- 229920005989 resin Polymers 0.000 description 18
- -1 i.e. Substances 0.000 description 16
- 239000010410 layer Substances 0.000 description 16
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 15
- 239000000758 substrate Substances 0.000 description 15
- 239000003999 initiator Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadec-1-ene Chemical compound CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- 230000007423 decrease Effects 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000011258 core-shell material Substances 0.000 description 8
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 7
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 7
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 7
- 239000005642 Oleic acid Substances 0.000 description 7
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 7
- 239000011247 coating layer Substances 0.000 description 7
- 238000007739 conversion coating Methods 0.000 description 7
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 7
- 230000014759 maintenance of location Effects 0.000 description 7
- 239000002105 nanoparticle Substances 0.000 description 7
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 7
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000013110 organic ligand Substances 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000002243 precursor Substances 0.000 description 6
- 238000007704 wet chemistry method Methods 0.000 description 6
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 238000007641 inkjet printing Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 3
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 239000002318 adhesion promoter Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 230000001588 bifunctional effect Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000002612 dispersion medium Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- 239000003446 ligand Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000001451 molecular beam epitaxy Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000007261 regionalization Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 239000004246 zinc acetate Substances 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 2
- 229910017115 AlSb Inorganic materials 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 2
- 229910005540 GaP Inorganic materials 0.000 description 2
- 229910005542 GaSb Inorganic materials 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 229910000673 Indium arsenide Inorganic materials 0.000 description 2
- 241000764773 Inna Species 0.000 description 2
- VAYOSLLFUXYJDT-RDTXWAMCSA-N Lysergic acid diethylamide Chemical compound C1=CC(C=2[C@H](N(C)C[C@@H](C=2)C(=O)N(CC)CC)C2)=C3C2=CNC3=C1 VAYOSLLFUXYJDT-RDTXWAMCSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910007709 ZnTe Inorganic materials 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 230000002744 anti-aggregatory effect Effects 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- VBXWCGWXDOBUQZ-UHFFFAOYSA-K diacetyloxyindiganyl acetate Chemical compound [In+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VBXWCGWXDOBUQZ-UHFFFAOYSA-K 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 2
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 2
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 125000003396 thiol group Chemical class [H]S* 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- OUMZKMRZMVDEOF-UHFFFAOYSA-N tris(trimethylsilyl)phosphane Chemical compound C[Si](C)(C)P([Si](C)(C)C)[Si](C)(C)C OUMZKMRZMVDEOF-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- YBNMDCCMCLUHBL-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-pyren-1-ylbutanoate Chemical compound C=1C=C(C2=C34)C=CC3=CC=CC4=CC=C2C=1CCCC(=O)ON1C(=O)CCC1=O YBNMDCCMCLUHBL-UHFFFAOYSA-N 0.000 description 1
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- BOGFHOWTVGAYFK-UHFFFAOYSA-N 1-[2-(2-propoxyethoxy)ethoxy]propane Chemical compound CCCOCCOCCOCCC BOGFHOWTVGAYFK-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 1
- RKYJPYDJNQXILT-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCOC(=O)C=C RKYJPYDJNQXILT-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- YHFGMFYKZBWPRW-UHFFFAOYSA-N 3-methylpentane-1,1-diol Chemical compound CCC(C)CC(O)O YHFGMFYKZBWPRW-UHFFFAOYSA-N 0.000 description 1
- ZEWLHMQYEZXSBH-UHFFFAOYSA-N 4-[2-(2-methylprop-2-enoyloxy)ethoxy]-4-oxobutanoic acid Chemical compound CC(=C)C(=O)OCCOC(=O)CCC(O)=O ZEWLHMQYEZXSBH-UHFFFAOYSA-N 0.000 description 1
- HQHKCNMTLZRXIP-UHFFFAOYSA-N 4-[2-(2-methylprop-2-enoyloxy)ethoxycarbonyl]benzoic acid Chemical compound CC(=C)C(=O)OCCOC(=O)C1=CC=C(C(O)=O)C=C1 HQHKCNMTLZRXIP-UHFFFAOYSA-N 0.000 description 1
- UZDMJPAQQFSMMV-UHFFFAOYSA-N 4-oxo-4-(2-prop-2-enoyloxyethoxy)butanoic acid Chemical compound OC(=O)CCC(=O)OCCOC(=O)C=C UZDMJPAQQFSMMV-UHFFFAOYSA-N 0.000 description 1
- JPQXNTOALKRJMH-UHFFFAOYSA-N 5-methoxypentyl acetate Chemical compound COCCCCCOC(C)=O JPQXNTOALKRJMH-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910004262 HgTe Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 229910019714 Nb2O3 Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 229910002665 PbTe Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 229910005642 SnTe Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910009815 Ti3O5 Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001661 cadmium Chemical class 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012156 elution solvent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003627 tricarboxylic acid derivatives Chemical class 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- LPEBYPDZMWMCLZ-CVBJKYQLSA-L zinc;(z)-octadec-9-enoate Chemical compound [Zn+2].CCCCCCCC\C=C/CCCCCCCC([O-])=O.CCCCCCCC\C=C/CCCCCCCC([O-])=O LPEBYPDZMWMCLZ-CVBJKYQLSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
- C09K11/025—Use of particular materials as binders, particle coatings or suspension media therefor non-luminescent particle coatings or suspension media
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/45—Heterocyclic compounds having sulfur in the ring
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Nonlinear Science (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Mathematical Physics (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Electroluminescent Light Sources (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Luminescent Compositions (AREA)
Description
本発明は、量子ドット分散体及びこれを含む硬化性組成物に係り、より詳しくは、量子ドットの耐光性に優れ且つ塗膜への適用時に塗膜の硬度を向上させることができる量子ドット分散体及びこれを含む硬化性組成物に関する。 The present invention relates to a quantum dot dispersion and a curable composition containing the same, and more particularly to a quantum dot dispersion that has excellent light resistance of quantum dots and can improve the hardness of a coating film when applied to the coating film, and a curable composition containing the same.
近年、カラーフィルタを具現する方法の1つとして、顔料分散型の感光性樹脂を用いた顔料分散法が適用されている。しかし、このような顔料分散法では、光源から照射された光がカラーフィルタを透過する過程で光の一部がカラーフィルタに吸収されることで光効率が低下し、また、カラーフィルタに含まれている顔料の特性によって色再現が低下するという問題点が生じている。 In recent years, one method for creating color filters is the pigment dispersion method, which uses a pigment-dispersed photosensitive resin. However, this type of pigment dispersion method has problems in that the light efficiency is reduced because part of the light emitted from the light source is absorbed by the color filter as it passes through the color filter, and color reproduction is reduced due to the characteristics of the pigment contained in the color filter.
こうした問題を解決することができる方案として、量子ドット感光性樹脂組成物を用いたカラーフィルタが提示された。例えば、大韓民国特許公開第2009-0036373号では、既存のカラーフィルタを量子ドット蛍光体からなる発光層に置き換えることで発光効率を向上させ、表示装置の表示品質を改善することができることを開示している。 A color filter using a quantum dot photosensitive resin composition has been proposed as a solution to these problems. For example, Korean Patent Publication No. 2009-0036373 discloses that by replacing existing color filters with a light-emitting layer made of quantum dot phosphors, the light-emitting efficiency can be improved and the display quality of the display device can be improved.
このように量子ドットをカラーフィルタの発光物質として用いた場合、発光波形を狭めることができ且つ顔料では具現できない高い色再現性を有し、優れた輝度特性を有する。しかし、量子ドットカラーフィルタが装着された画像表示装置では、光源として青色光を用い、このとき、用いる青色光が量子ドットの光特性を低下させるという問題点があった。 When quantum dots are used as the luminescent material of a color filter in this way, the luminescence waveform can be narrowed, and high color reproducibility that cannot be realized with pigments is achieved, with excellent brightness characteristics. However, image display devices equipped with quantum dot color filters use blue light as a light source, and there is a problem in that the blue light used at this time reduces the optical characteristics of the quantum dots.
そのため、量子ドットの耐光性を向上させることができる技術に関する開発が要求されている。 Therefore, there is a demand for the development of technology that can improve the light resistance of quantum dots.
さらに、量子ドットを用いて塗膜を形成する場合、塗膜の物性を増加させることができる方案が必要である。 Furthermore, when forming a coating film using quantum dots, a method is needed to increase the physical properties of the coating film.
本発明の一目的は、耐光性及び塗膜の硬度を向上させることができる量子ドット分散体を提供することである。 One object of the present invention is to provide a quantum dot dispersion that can improve the light resistance and hardness of a coating film.
本発明の他の目的は、前記量子ドット分散体を含む硬化性組成物を提供することである。 Another object of the present invention is to provide a curable composition containing the quantum dot dispersion.
本発明のまた他の目的は、前記硬化性組成物を用いて形成される硬化膜を提供することである。 Another object of the present invention is to provide a cured film formed using the curable composition.
本発明のさらなる目的は、前記硬化膜を含む画像表示装置を提供することである。 A further object of the present invention is to provide an image display device including the cured film.
一方、本発明は、量子ドット、及び3~6員の硫黄含有脂環式炭化水素基を有する化合物を含む量子ドット分散体を提供する。 On the other hand, the present invention provides a quantum dot dispersion that contains quantum dots and a compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group.
本発明の一実施形態において、前記3~6員の硫黄含有脂環式炭化水素基を有する化合物は、下記の化学式1で表される化合物を含んでよい。 In one embodiment of the present invention, the compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group may include a compound represented by the following chemical formula 1.
前記式中、
Zは、
In the above formula,
Z is,
又は or
であり、
R1及びR2は、それぞれ独立して、存在しないか、鎖炭素のうちの1つ以上が酸素で置換若しくは非置換のC1~C6のアルキレン基であり、
Aは、存在しないか、又はO、NR4又はSであり、
R3及びR4は、それぞれ独立して、水素又はC1~C6のアルキル基であり、
n及びmは、それぞれ独立して、1~4の整数であり、
pは、1~100の整数である。
and
R 1 and R 2 are each independently an absent or C 1 -C 6 alkylene group in which one or more of the chain carbons are unsubstituted or substituted with oxygen;
A is absent, O, NR4 or S;
R3 and R4 are each independently hydrogen or a C1 - C6 alkyl group;
n and m are each independently an integer from 1 to 4;
p is an integer from 1 to 100.
本発明の一実施形態において、n及びmは1であってよい。 In one embodiment of the present invention, n and m may be 1.
本発明の一実施形態に係る量子ドット分散体は、硬化性モノマー及び溶剤の少なくとも一方を更に含んでよい。 The quantum dot dispersion according to one embodiment of the present invention may further include at least one of a curable monomer and a solvent.
他の一方で、本発明は、前記量子ドット分散体を含む硬化性組成物を提供する。 On the other hand, the present invention provides a curable composition comprising the quantum dot dispersion.
本発明の一実施形態において、前記硬化性組成物は、光変換インク組成物、光変換樹脂組成物、又は自発光感光性樹脂組成物であってよい。 In one embodiment of the present invention, the curable composition may be a photoconversion ink composition, a photoconversion resin composition, or a spontaneous light-emitting photosensitive resin composition.
また他の一方で、本発明は、前記硬化性組成物を用いて形成される硬化膜を提供する。 On the other hand, the present invention provides a cured film formed using the curable composition.
本発明の一実施形態において、前記硬化膜は、カラーフィルタ又は光変換シートであってよい。 In one embodiment of the present invention, the cured film may be a color filter or a light conversion sheet.
また他の一方で、本発明は、前記硬化膜を含む画像表示装置を提供する。 On the other hand, the present invention provides an image display device including the cured film.
本発明に係る量子ドット分散体は、量子ドットの耐光性に優れ且つ塗膜への適用時に塗膜の硬度などの物理的特性に優れる。このため、本発明に係る量子ドット分散体は、カラーフィルタ、光変換シートなどの多様な量子ドット活用分野に有効に適用でき、信頼性に優れる画像表示装置を具現することができる。 The quantum dot dispersion according to the present invention has excellent light resistance of quantum dots and excellent physical properties such as hardness of the coating film when applied to the coating film. Therefore, the quantum dot dispersion according to the present invention can be effectively applied to various fields using quantum dots such as color filters and light conversion sheets, and can realize an image display device with excellent reliability.
以下、本発明をより詳しく説明する。 The present invention will be explained in more detail below.
本発明の一実施形態は、量子ドット(A)、及び3~6員の硫黄含有脂環式炭化水素基を有する化合物(B)を含む量子ドット分散体に関する。 One embodiment of the present invention relates to a quantum dot dispersion that includes quantum dots (A) and a compound (B) having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group.
量子ドット(A)
本発明の一実施形態において、前記量子ドットとは、ナノ大きさの半導体物質を称するものである。原子が分子をなし、分子がクラスタという小さな分子の集合体を構成してナノ粒子をなすが、このようなナノ粒子が半導体特性を呈しているときにこれを量子ドットという。前記量子ドットは、外部からエネルギーを受けて励起状態になると、当該量子ドットの自ら該当するエネルギーバンドギャップに応じたエネルギーを放出するようになる。
Quantum dots (A)
In one embodiment of the present invention, the quantum dot refers to a nano-sized semiconductor material. Atoms form molecules, and molecules form small molecular aggregates called clusters to form nanoparticles. When such nanoparticles exhibit semiconductor properties, they are called quantum dots. When the quantum dot receives energy from the outside and becomes excited, it emits energy according to the energy band gap corresponding to the quantum dot itself.
本発明の一実施形態において、前記量子ドットは、非カドミウム系量子ドットであってよい。 In one embodiment of the present invention, the quantum dots may be non-cadmium-based quantum dots.
前記非カドミウム系量子ドットは、光による刺激で発光し得る量子ドット粒子であれば特に限定されない。例えば、II-VI族半導体化合物;III-V族半導体化合物;IV-VI族半導体化合物;IV族元素又はこれを含む化合物;及びこれらの組み合わせからなる群より選ばれるものであってよく、これらは、単独で又は2種以上混合して用いてよい。 The non-cadmium quantum dots are not particularly limited as long as they are quantum dot particles that can emit light when stimulated by light. For example, they may be selected from the group consisting of II-VI group semiconductor compounds; III-V group semiconductor compounds; IV-VI group semiconductor compounds; IV group elements or compounds containing the same; and combinations thereof, and these may be used alone or in combination of two or more kinds.
具体的に、前記II-VI族半導体化合物は、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、及びこれらの混合物からなる群より選ばれる二元素化合物;ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、HgZnS、HgZnSe、HgZnTe、及びこれらの混合物からなる群より選ばれる三元素化合物;及びHgZnSeS、HgZnSeTe、HgZnSTe、及びこれらの混合物からなる群より選ばれる四元素化合物からなる群より選ばれるものであってよいが、これらに限定されるものではない。 Specifically, the II-VI group semiconductor compound may be selected from the group consisting of two-element compounds selected from the group consisting of ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; three-element compounds selected from the group consisting of ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, HgZnS, HgZnSe, HgZnTe, and mixtures thereof; and four-element compounds selected from the group consisting of HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof, but are not limited thereto.
前記III-V族半導体化合物は、GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、及びこれらの混合物からなる群より選ばれる二元素化合物;GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、及びこれらの混合物からなる群より選ばれる三元素化合物;及びGaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs、InAlPSb、及びこれらの混合物からなる群より選ばれる四元素化合物からなる群より選ばれるものであってよいが、これらに限定されるものではない。 The III-V semiconductor compound is a bi-element compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures thereof. and mixtures thereof; and quaternary compounds selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof, but are not limited thereto.
前記IV-VI族半導体化合物は、SnS、SnSe、SnTe、PbS、PbSe、PbTe、及びこれらの混合物からなる群より選ばれる二元素化合物;SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe、及びこれらの混合物からなる群より選ばれる三元素化合物;及びSnPbSSe、SnPbSeTe、SnPbSTe、及びこれらの混合物からなる群より選ばれる四元素化合物からなる群より選ばれる1種以上であってよいが、同様にこれらに限定されるものではない。 The IV-VI semiconductor compound may be one or more selected from the group consisting of two-element compounds selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; three-element compounds selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; and four-element compounds selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof, but is similarly not limited thereto.
これらに限定されるものではないが、前記IV族元素又はこれを含む化合物は、Si、Ge、及びこれらの混合物からなる群より選ばれる元素;及びSiC、SiGe、及びこれらの混合物からなる群より選ばれる二元素化合物からなる群より選ばれるものであってよい。 The Group IV element or a compound containing the same may be, but is not limited to, an element selected from the group consisting of Si, Ge, and mixtures thereof; and a two-element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.
前記量子ドットは、均質な(homogeneous)単一構造;コア-シェル(core-shell)、グラディエント(gradient)構造などのような二重構造;又はこれらの混合構造を有するものであってよい。好ましくは、前記量子ドットは、コア及びコアを覆うシェルを含むコア-シェル構造を有するものであってよい。 The quantum dots may have a homogeneous single structure; a double structure such as a core-shell or gradient structure; or a mixed structure thereof. Preferably, the quantum dots have a core-shell structure including a core and a shell covering the core.
具体的に、前記コア-シェルの二重構造において、それぞれのコアとシェルをなす物質は、前述した互いに異なる半導体化合物からなるものであってよい。例えば、前記コアは、GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs、及びInAlPSbからなる群より選ばれる1種以上を含み、前記シェルは、ZnSe、ZnS、及びZnTeからなる群より選ばれる1種以上を含んでよいが、これらに限定されるものではない。 Specifically, in the core-shell double structure, the materials constituting the core and shell may be made of different semiconductor compounds as described above. For example, the core may be made of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, G The shell may include, but is not limited to, one or more selected from the group consisting of aAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, and InAlPSb. The shell may include, but is not limited to, one or more selected from the group consisting of ZnSe, ZnS, and ZnTe.
好ましくは、コア-シェル構造の量子ドットは、InP/ZnS、InP/ZnSe、InP/GaP/ZnS、InP/ZnSe/ZnS、InP/ZnSeTe/ZnS、及びInP/MnSe/ZnSなどが挙げられる。 Preferably, the core-shell quantum dots include InP/ZnS, InP/ZnSe, InP/GaP/ZnS, InP/ZnSe/ZnS, InP/ZnSeTe/ZnS, and InP/MnSe/ZnS.
前記量子ドットは、湿式化学工程(wet chemical process)、有機金属化学蒸着工程(MOCVD、metal organic chemical vapor deposition)、又は分子線エピタキシ工程(MBE、molecular beam epitaxy)によって合成されていてよいが、これらに限定されるものではなく、湿式化学工程(wet chemical process)によって合成したほうがより光特性に優れる量子ドットが得られるため、好ましい。 The quantum dots may be synthesized by, but are not limited to, a wet chemical process, a metal organic chemical vapor deposition process (MOCVD), or a molecular beam epitaxy process (MBE), and are preferably synthesized by a wet chemical process, since quantum dots with better optical properties can be obtained.
前記湿式化学工程とは、有機溶剤に前駆体物質を入れて粒子を成長させる方法である。湿式化学工程では、結晶が成長するときに有機溶剤が自然に量子ドット結晶の表面に配位し、分散剤の役割をして結晶の成長を調節するようになるので、有機金属化学蒸着工程や分子線エピタキシのような気相蒸着法よりも容易且つ低廉な工程によってナノ粒子の成長を制御することができる。そのため、前記湿式化学工程を用いて前記量子ドットを製造したほうが好ましい。 The wet chemical process is a method of growing particles by putting precursor materials into an organic solvent. In the wet chemical process, as the crystals grow, the organic solvent naturally coordinates to the surface of the quantum dot crystals and acts as a dispersant to regulate the growth of the crystals, so the growth of nanoparticles can be controlled by a process that is easier and less expensive than gas phase deposition methods such as metalorganic chemical vapor deposition and molecular beam epitaxy. Therefore, it is preferable to manufacture the quantum dots using the wet chemical process.
湿式化学工程によって量子ドットを製造する場合、量子ドットの凝集を抑え且つ量子ドットの粒子の大きさをナノレベルに制御するために有機配位子が用いられる。このような有機配位子としては、一般的にオレイン酸が用いられてよい。 When manufacturing quantum dots by wet chemical processes, organic ligands are used to suppress the aggregation of quantum dots and to control the particle size of quantum dots to the nano level. Oleic acid may generally be used as such an organic ligand.
本発明の一実施形態において、前記量子ドットの製造過程で用いられたオレイン酸は、必要に応じて他の有機配位子によって配位子交換方法により置き換えられる。 In one embodiment of the present invention, the oleic acid used in the manufacturing process of the quantum dots is replaced by other organic ligands by a ligand exchange method, if necessary.
前記配位子交換は、本来の有機配位子、すなわちオレイン酸を有する量子ドットを含有する分散液に、交換したい有機配位子を添加し、これを常温~200℃で30分~3時間撹拌して行われてよい。必要に応じて前記配位子交換反応が完了した量子ドットを分離し精製する過程を更に行ってもよい。 The ligand exchange may be carried out by adding the organic ligand to be exchanged to a dispersion containing quantum dots having the original organic ligand, i.e., oleic acid, and stirring the mixture at room temperature to 200°C for 30 minutes to 3 hours. If necessary, the quantum dots that have undergone the ligand exchange reaction may be further separated and purified.
前記他の有機配位子としては、例えば、C5~C20のアルキルカルボン酸、C5~C20のアルケニルカルボン酸、C5~C20のアルキニルカルボン酸、チオール(thiol)、リン酸、ピリジン、メルカプトアルコール、ホスフィン、ホスフィン酸化物などを含んでよく、これらに限定されるものではない。 Examples of the other organic ligands include, but are not limited to, C5 - C20 alkyl carboxylic acids, C5 - C20 alkenyl carboxylic acids, C5 - C20 alkynyl carboxylic acids, thiols, phosphoric acid, pyridine, mercapto alcohols, phosphines, and phosphine oxides.
前記量子ドット(A)は、量子ドット分散体の全体100重量%に対し、5~80重量%、好ましくは、10~70重量%の範囲で含まれてよい。前記量子ドットが前記範囲内で含まれる場合、分散安定性に優れる。 The quantum dots (A) may be contained in the range of 5 to 80% by weight, preferably 10 to 70% by weight, based on 100% by weight of the total quantum dot dispersion. When the quantum dots are contained within the above range, the dispersion stability is excellent.
3~6員の硫黄含有脂環式炭化水素基を有する化合物(B)
本発明の一実施形態において、前記3~6員の硫黄含有脂環式炭化水素基を有する化合物(B)は、量子ドットの耐光性を向上させ且つ塗膜への適用時に硬度などの物理的特性を強化するための添加剤として且つ量子ドットの分散媒としての役割をする。
Compound (B) having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group
In one embodiment of the present invention, the compound (B) having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group serves as an additive for improving the light resistance of the quantum dots and enhancing physical properties such as hardness when applied to a coating film, and also serves as a dispersion medium for the quantum dots.
具体的に、前記3~6員の硫黄含有脂環式炭化水素基を有する化合物は、青色光源に影響され得る量子ドットの光保持率を向上させることができる。また、前記3~6員の硫黄含有脂環式炭化水素基を有する化合物は、量子ドットを硬化性組成物に適用して塗膜を形成する場合、塗膜の硬度などの物理的特性を向上させることができる。 Specifically, the compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group can improve the light retention rate of quantum dots that can be affected by blue light sources. In addition, when the quantum dots are applied to a curable composition to form a coating film, the compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group can improve the physical properties of the coating film, such as hardness.
好ましくは、前記3~6員の硫黄含有脂環式炭化水素基を有する化合物は、下記の化学式1で表される化合物を含んでよい。 Preferably, the compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group may include a compound represented by the following chemical formula 1.
前記式中、
Zは、
In the above formula,
Z is,
又は or
であり、
R1及びR2は、それぞれ独立して、存在しないか、鎖炭素のうちの1つ以上が酸素で置換若しくは非置換のC1~C6のアルキレン基であり、
Aは、存在しないか、又はO、NR4又はSであり、
R3及びR4は、それぞれ独立して、水素又はC1~C6のアルキル基であり、
n及びmは、それぞれ独立して、1~4の整数であり、
pは、1~100の整数である。
and
R 1 and R 2 are each independently an absent or C 1 -C 6 alkylene group in which one or more of the chain carbons is unsubstituted or substituted with oxygen;
A is absent, O, NR4 or S;
R3 and R4 are each independently hydrogen or a C1 - C6 alkyl group;
n and m are each independently an integer from 1 to 4;
p is an integer from 1 to 100.
本明細書において用いられる鎖炭素のうちの1つ以上が酸素で置換若しくは非置換のC1~C6のアルキレン基は、炭素数1~6個からなる直鎖状若しくは分岐状の2価炭化水素において鎖炭素のうちの1つ以上が酸素で置換若しくは非置換の官能基を意味し、例えば、メチレン、エチレン、プロピレン、ブチレン、オキシエチレンなどが含まれるが、これらに限定されるものではない。 As used herein, a C1 - C6 alkylene group in which one or more of the chain carbons are substituted or unsubstituted with oxygen refers to a functional group in which one or more of the chain carbons in a straight or branched divalent hydrocarbon having 1 to 6 carbon atoms are substituted or unsubstituted with oxygen, examples of which include, but are not limited to, methylene, ethylene, propylene, butylene, oxyethylene, and the like.
本明細書において用いられるC1~C6のアルキル基は、炭素数1~6個で構成された直鎖状若しくは分岐状の1価炭化水素を意味し、例えば、メチル、エチル、n-プロピル、i-プロピル、n-ブチル、i-ブチル、t-ブチル、n-ペンチル、n-ヘキシルなどが含まれるが、これらに限定されるものではない。 As used herein, a C1 - C6 alkyl group means a linear or branched monovalent hydrocarbon group composed of 1 to 6 carbon atoms, including, but not limited to, methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, t-butyl, n-pentyl, n-hexyl, and the like.
本発明の一実施形態において、n及びmは、1であってよい。 In one embodiment of the present invention, n and m may be 1.
前記3~6員の硫黄含有脂環式炭化水素基を有する化合物(B)は、量子ドット分散体の全体100重量%に対し、5~95重量%、好ましくは、5~90重量%の範囲で含まれてよい。前記3~6員の硫黄含有脂環式炭化水素基を有する化合物が、量子ドット分散体の全体100重量%に対し、5重量%未満の量で含まれると、量子ドットの分散性が低下することがあり、また95重量%超の量で含まれると、分散体の分散特性には優れるが、フィルム化した際に励起光の漏れ(leakage)によって色再現特性が低下することがある。 The compound (B) having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group may be contained in an amount of 5 to 95% by weight, preferably 5 to 90% by weight, based on 100% by weight of the entire quantum dot dispersion. If the compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group is contained in an amount of less than 5% by weight, based on 100% by weight of the entire quantum dot dispersion, the dispersibility of the quantum dots may decrease. If the compound is contained in an amount of more than 95% by weight, the dispersion has excellent dispersion characteristics, but the color reproduction characteristics may decrease due to leakage of excitation light when made into a film.
本発明の一実施形態に係る量子ドット分散体は、硬化性モノマー(C)及び溶剤(D)の少なくとも一方を更に含んでよい。 The quantum dot dispersion according to one embodiment of the present invention may further include at least one of a curable monomer (C) and a solvent (D).
硬化性モノマー(C)
本発明の一実施形態において、前記硬化性モノマー(C)は、光や熱の作用による反応性を有し、量子ドットの分散媒として作用する。
Curable Monomer (C)
In one embodiment of the present invention, the curable monomer (C) has reactivity due to the action of light or heat, and acts as a dispersion medium for the quantum dots.
例えば、前記硬化性モノマー(C)は、単官能単量体、2官能単量体、その他の多官能単量体などが挙げられ、これらのうち2官能単量体が好ましく用いられる。
前記単官能単量体の種類は特に限定されず、例えば、ノニルフェニルカルビトールアクリレート、2-ヒドロキシ-3-フェノキシプロピルアクリレート、2-エチルヘキシルカルビトールアクリレート、2-ヒドロキシエチルアクリレート、N-ビニルピロリドンなどが挙げられる。
For example, the curable monomer (C) may be a monofunctional monomer, a bifunctional monomer, or another polyfunctional monomer, and among these, a bifunctional monomer is preferably used.
The type of the monofunctional monomer is not particularly limited, and examples thereof include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, and N-vinylpyrrolidone.
前記2官能単量体の種類は特に限定されないが、例えば、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、ビスフェノールAのビス(アクリロイルオキシエチル)エーテル、3-メチルペンタンジオールジ(メタ)アクリレートなどが挙げられる。 The type of the bifunctional monomer is not particularly limited, but examples include 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, ethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, bis(acryloyloxyethyl)ether of bisphenol A, and 3-methylpentanediol di(meth)acrylate.
前記多官能単量体の種類は特に限定されず、例えば、トリメチロールプロパントリ(メタ)アクリレート、エトキシレイテッドトリメチロールプロパントリ(メタ)アクリレート、プロポキシレイテッドトリメチロールプロパントリ(メタ)アクリレート、ペンタエリトリトールトリ(メタ)アクリレート、ペンタエリトリトールテトラ(メタ)アクリレート、ジペンタエリトリトールトリ(メタ)アクリレート、ジペンタエリトリトールペンタ(メタ)アクリレート、エトキシレイテッドジペンタエリトリトールヘキサ(メタ)アクリレート、プロポキシレイテッドジペンタエリトリトールヘキサ(メタ)アクリレート、ジペンタエリトリトールヘキサ(メタ)アクリレートなどが挙げられる。 The type of the polyfunctional monomer is not particularly limited, and examples thereof include trimethylolpropane tri(meth)acrylate, ethoxylated trimethylolpropane tri(meth)acrylate, propoxylated trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, ethoxylated dipentaerythritol hexa(meth)acrylate, propoxylated dipentaerythritol hexa(meth)acrylate, and dipentaerythritol hexa(meth)acrylate.
前記硬化性モノマー(C)は、量子ドット分散体の全体100重量%に対し、5~80重量%、好ましくは、5~70重量%の範囲で含まれてよい。前記硬化性モノマーが、量子ドット分散体の全体100重量%に対し、5重量%未満の量で含まれると、分散性が低下したり塗膜の硬化密度が低下して金属保護膜の蒸着の際にシワやクラックのような問題が生じることがあり、また、80重量%超の量で含まれると、励起光の漏れによって色再現特性が低下することがある。 The curable monomer (C) may be contained in an amount of 5 to 80% by weight, preferably 5 to 70% by weight, based on 100% by weight of the total quantum dot dispersion. If the curable monomer is contained in an amount of less than 5% by weight, based on 100% by weight of the total quantum dot dispersion, the dispersibility may decrease or the cured density of the coating film may decrease, causing problems such as wrinkles and cracks during deposition of the metal protective film. If the curable monomer is contained in an amount of more than 80% by weight, the color reproduction characteristics may decrease due to leakage of excitation light.
溶剤(D)
本発明の一実施形態において、前記溶剤(D)は特に制限されず、当該技術分野において通常用いられる有機溶剤であってよい。
Solvent (D)
In one embodiment of the present invention, the solvent (D) is not particularly limited and may be an organic solvent commonly used in the technical field.
例えば、前記溶剤としては、エーテル又はエステル系溶剤、脂肪族飽和炭化水素系溶剤、ハロゲン化炭化水素系溶剤、芳香族炭化水素系溶剤、ケトン系溶剤、アルコール系溶剤などを用いてよい。 For example, the solvent may be an ether or ester solvent, an aliphatic saturated hydrocarbon solvent, a halogenated hydrocarbon solvent, an aromatic hydrocarbon solvent, a ketone solvent, an alcohol solvent, or the like.
具体的に、前記エーテル又はエステル系溶剤としては、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート、n-ペンチルアセテート、3-メトキシブチルアセテート、メトキシブチルアセテート、メトキシペンチルアセテート、エチレングリコールモノエチルエーテルアセテート、メチルセロソルブアセテート、エチルセロソルブアセテート、3-エトキシプロピオン酸エチル、3-メトキシプロピオン酸メチル、γ-ブチロラクトン、プロピレングリコールモノメチルエーテル、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールジプロピルエーテル、ジエチレングリコールジブチルエーテルなどが挙げられる。 Specific examples of the ether or ester solvent include propylene glycol monomethyl ether acetate, propylene glycol monopropyl ether acetate, n-pentyl acetate, 3-methoxybutyl acetate, methoxybutyl acetate, methoxypentyl acetate, ethylene glycol monoethyl ether acetate, methyl cellosolve acetate, ethyl cellosolve acetate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, γ-butyrolactone, propylene glycol monomethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether.
前記脂肪族飽和炭化水素系溶剤としては、ヘキサン、ペンタン、ヘプタン、シクロペンタン、シクロヘキサン、ケロシン(kerosene)などが挙げられる。 Examples of the aliphatic saturated hydrocarbon solvent include hexane, pentane, heptane, cyclopentane, cyclohexane, and kerosene.
前記ハロゲン化炭化水素系溶剤としては、クロロホルム、ジクロロメタン、4塩化炭素、ジクロロエタン、テトラクロロエタンなどが挙げられる。 Examples of the halogenated hydrocarbon solvent include chloroform, dichloromethane, carbon tetrachloride, dichloroethane, and tetrachloroethane.
前記芳香族炭化水素系溶剤としては、ベンゼン、トルエン、キシレン、メシチレン、ジクロロベンゼンなどが挙げられる。 Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, mesitylene, and dichlorobenzene.
前記ケトン系溶剤としては、メチルエチルケトン、アセトン、メチルアミルケトン、メチルイソブチルケトン、シクロヘキサノンなどが挙げられる。 Examples of the ketone solvent include methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone.
前記アルコール系溶剤としては、エタノール、プロパノール、ブタノール、ヘキサノール、シクロヘキサノール、エチレングリコール、グリセリンなどが挙げられる。 Examples of the alcohol-based solvent include ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin.
前記らの溶剤は、単独で又は2種以上混合して用いてよい。 The above solvents may be used alone or in combination of two or more.
前記溶剤(D)は、量子ドット分散体の全体100重量%に対し、20~90重量%、好ましくは、25~85重量%の範囲で含まれてよい。前記溶剤が前記範囲内で含まれると、量子ドット分散体中での粒子の沈澱が抑制でき、分散安定性及び光学特性に優れるため分散体の保管安定性の面で有利である。 The solvent (D) may be contained in the range of 20 to 90% by weight, preferably 25 to 85% by weight, based on 100% by weight of the total quantum dot dispersion. When the solvent is contained within the above range, precipitation of particles in the quantum dot dispersion can be suppressed, and the dispersion has excellent dispersion stability and optical properties, which is advantageous in terms of storage stability of the dispersion.
<硬化性組成物>
本発明の一実施形態は、上述した量子ドット分散体を含む硬化性組成物に関する。
例えば、前記硬化性組成物は、光変換インク組成物、光変換樹脂組成物、又は自発光感光性樹脂組成物であってよい。
<Curable Composition>
One embodiment of the present invention relates to a curable composition comprising the quantum dot dispersion described above.
For example, the curable composition may be a light-converting ink composition, a light-converting resin composition, or a spontaneous light-emitting photosensitive resin composition.
本発明の一実施形態において、前記光変換インク組成物は、前記量子ドット分散体の他、光重合性モノマー及び光重合開始剤を更に含んでよい。 In one embodiment of the present invention, the light conversion ink composition may further contain a photopolymerizable monomer and a photopolymerization initiator in addition to the quantum dot dispersion.
前記光重合性モノマーは、光及び後述する光重合開始剤の作用で重合し得る化合物であれば、その種類は特に制限されずに用いてよく、上述した量子ドット分散体で用いられる硬化性モノマーと同一のものであってよい。 The photopolymerizable monomer may be of any type without particular limitation as long as it is a compound that can be polymerized by the action of light and a photopolymerization initiator described below, and may be the same as the curable monomer used in the quantum dot dispersion described above.
前記光重合性モノマーは、前記光変換インク組成物の全体100重量%に対し、20~90重量%、好ましくは、30~80重量%の量で含まれてよい。前記光重合性モノマーが前記範囲内で含まれると、画素部の強度や平滑性の面で好ましいという利点がある。前記光重合性モノマーが前記範囲未満で含まれると、画素部の強度がやや低下することがあり、また、前記光重合性モノマーが前記範囲を超えて含まれると、平滑性がやや低下することがあるため、前記範囲内で含まれることが好ましい。 The photopolymerizable monomer may be contained in an amount of 20 to 90% by weight, preferably 30 to 80% by weight, relative to 100% by weight of the total photoconversion ink composition. When the photopolymerizable monomer is contained within the above range, it has the advantage of being favorable in terms of the strength and smoothness of the pixel portion. When the photopolymerizable monomer is contained below the above range, the strength of the pixel portion may be slightly decreased, and when the photopolymerizable monomer is contained above the above range, the smoothness may be slightly decreased, so it is preferable that the photopolymerizable monomer is contained within the above range.
前記光重合開始剤は、前記光重合性モノマーを重合させ得るものであれば、その種類は特に制限されずに用いてよい。特に、前記光重合開始剤は、重合特性、開始効率、吸収波長、入手性、価格などの観点から、アセトフェノン系化合物、ベンゾフェノン系化合物、トリアジン系化合物、ビイミダゾール系化合物、オキシム系化合物、及びチオキサントン系化合物からなる群より選ばれる1種以上の化合物を用いることが好ましい。 The photopolymerization initiator may be of any type, as long as it can polymerize the photopolymerizable monomer. In particular, from the viewpoints of polymerization characteristics, initiation efficiency, absorption wavelength, availability, price, etc., it is preferable to use one or more compounds selected from the group consisting of acetophenone-based compounds, benzophenone-based compounds, triazine-based compounds, biimidazole-based compounds, oxime-based compounds, and thioxanthone-based compounds as the photopolymerization initiator.
前記光重合開始剤は、前記光変換インク組成物の全体100重量%に対し、0.01~20重量%、好ましくは、0.5~15重量%の範囲で含まれてよい。前記光重合開始剤が前記範囲内で含まれると、前記光変換インク組成物が高感度化して露光時間が短縮することで生産性が向上するため好ましい。また、本発明に係る光変換インク組成物を用いて形成した画素部の強度と前記画素部の表面での平滑性が良好になるという利点がある。 The photopolymerization initiator may be contained in the range of 0.01 to 20% by weight, preferably 0.5 to 15% by weight, relative to 100% by weight of the total photoconversion ink composition. When the photopolymerization initiator is contained within the above range, the photoconversion ink composition becomes highly sensitive, shortening the exposure time and improving productivity, which is preferable. In addition, there is an advantage in that the strength of the pixel portion formed using the photoconversion ink composition according to the present invention and the smoothness of the surface of the pixel portion are improved.
前記光重合開始剤は、本発明に係る光変換インク組成物の感度を向上させるために、光重合開始補助剤を更に含んでよい。前記光重合開始補助剤が含まれると、感度が一層高められて生産性が向上するという利点がある。 The photopolymerization initiator may further contain a photopolymerization initiation assistant to improve the sensitivity of the photoconversion ink composition according to the present invention. The inclusion of the photopolymerization initiation assistant has the advantage of further increasing the sensitivity and improving productivity.
前記光重合開始補助剤は、例えば、アミン化合物、カルボン酸化合物、チオール基を有する有機硫黄化合物からなる群より選ばれる1種以上の化合物が好ましく用いられてよいが、これらに限定されるものではない。 The photopolymerization initiator aid may be, for example, one or more compounds selected from the group consisting of amine compounds, carboxylic acid compounds, and organic sulfur compounds having a thiol group, but is not limited thereto.
前記光重合開始補助剤は、本発明の効果を損なわない範囲で適宜追加して用いてよい。 The photopolymerization initiator aid may be added as needed as long as it does not impair the effects of the present invention.
本発明の一実施形態において、前記光変換インク組成物は、散乱粒子を更に含んでよい。 In one embodiment of the present invention, the light conversion ink composition may further include scattering particles.
前記散乱粒子は、量子ドットから放出された光の経路を増やして全体的な光効率を高める役割をする。 The scattering particles increase the number of paths for the light emitted from the quantum dots, thereby increasing the overall light efficiency.
前記散乱粒子としては、通常の無機材料を用いてよく、好ましくは、金属酸化物を用いてよい。 The scattering particles may be made of a normal inorganic material, preferably a metal oxide.
前記金属酸化物は、Li、Be、B、Na、Mg、Al、Si、K、Ca、Sc、V、Cr、Mn、Fe、Ni、Cu、Zn、Ga、Ge、Rb、Sr、Y、Mo、Cs、Ba、La、Hf、W、Tl、Pb、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Ti、Sb、Sn、Zr、Nb、Ce、Ta、In、及びこれらの組み合わせからなる群より選ばれた1種以上の金属を含む酸化物であってよいが、これらに限定されるものではない。 The metal oxide may be an oxide containing one or more metals selected from the group consisting of Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In, and combinations thereof, but is not limited thereto.
具体的に、Al2O3、SiO2、ZnO、ZrO2、BaTiO3、TiO2、Ta2O5、Ti3O5、ITO、IZO、ATO、ZnO-Al、Nb2O3、SnO、MgO、及びこれらの組み合わせからなる群より選ばれた1種であってよい。必要に応じて、アクリレートなどの不飽和結合を有する化合物で表面処理された材質も使用してよい。 Specifically, it may be one selected from the group consisting of Al2O3 , SiO2 , ZnO, ZrO2, BaTiO3, TiO2, Ta2O5, Ti3O5 , ITO , IZO , ATO , ZnO-Al, Nb2O3 , SnO, MgO, and combinations thereof. If necessary, a material that has been surface-treated with a compound having an unsaturated bond, such as acrylate, may also be used.
散乱粒子は、50~1000nmの平均粒径を有してよく、好ましくは、100~500nm、より好ましくは、150~300nmの範囲のものがよい。このとき、粒子の大きさが小さ過ぎると、量子ドットから放出された光の十分な散乱効果を期待することができず、これと逆に大き過ぎると、組成物中に沈んだりして均一な品質の光変換層表面を得ることができないため、前記範囲内で適宜調節して用いる。 The scattering particles may have an average particle size of 50 to 1000 nm, preferably 100 to 500 nm, and more preferably 150 to 300 nm. If the particle size is too small, it is not possible to expect a sufficient scattering effect of the light emitted from the quantum dots, and conversely, if the particle size is too large, it may sink in the composition and it may be impossible to obtain a light conversion layer surface of uniform quality, so the particle size should be adjusted appropriately within the above range.
本発明において平均粒径とは、数平均粒径のことであってよく、例えば、電界放出型走査電子顕微鏡(FE-SEM)又は透過電子顕微鏡(TEM)によって観察した像から求めることができる。具体的に、FE-SEM又はTEMの観察画像から幾つかのサンプルを抽出し、これらのサンプルの径を測定して算術平均した値から得ることができる。 In the present invention, the average particle size may refer to the number average particle size, and can be determined, for example, from images observed with a field emission scanning electron microscope (FE-SEM) or a transmission electron microscope (TEM). Specifically, it can be obtained by extracting several samples from the FE-SEM or TEM observation images, measuring the diameters of these samples, and taking the arithmetic average value.
前記散乱粒子は、前記光変換インク組成物の全体100重量%に対し、0.5~20重量%、好ましくは、1~15重量%の範囲で含んでよい。前記散乱粒子が前記範囲内で含まれると、発光強さの増加効果が極大化するため好ましい。前記散乱粒子が前記範囲未満で含まれると、得ようとする発光強さの確保が難しくなることがあり、また前記範囲を超えると、青色照射光の透過度が低下するため発光効率に問題が生じることがある。 The scattering particles may be contained in the range of 0.5 to 20% by weight, preferably 1 to 15% by weight, based on 100% by weight of the total light conversion ink composition. When the scattering particles are contained within the above range, the effect of increasing the luminous intensity is maximized, which is preferable. When the scattering particles are contained below the above range, it may be difficult to ensure the desired luminous intensity, and when the scattering particles are contained above the above range, the transmittance of blue irradiation light decreases, which may cause problems with luminous efficiency.
本発明の一実施形態に係る光変換インク組成物は、前記した成分の他、塗膜平坦性や密着性を高めるために界面活性剤、密着促進剤といった添加剤を更に含んでよい。 In addition to the components described above, the light conversion ink composition according to one embodiment of the present invention may further contain additives such as surfactants and adhesion promoters to improve the flatness and adhesion of the coating film.
本発明の一実施形態に係る光変換インク組成物は、溶剤型又は無溶剤型のものであってよく、連続工程の面から、無溶剤型のものが好ましい。 The light conversion ink composition according to one embodiment of the present invention may be a solvent-based or solventless type, and from the viewpoint of continuous processing, the solventless type is preferred.
前記光変換インク組成物が、無溶剤型のものである場合、溶剤を実質的に含まず、含んでも光変換インク組成物の全体100重量%に対し、2重量%以下の量で含んでよい。 When the photoconversion ink composition is a solvent-free type, it does not substantially contain a solvent, and even if it does contain a solvent, it may contain an amount of 2% by weight or less based on 100% by weight of the total photoconversion ink composition.
前記光変換インク組成物が、溶剤型のものである場合、上述した量子ドット分散体で説明したのと同一の溶剤を用いてよい。 If the light conversion ink composition is a solvent-based composition, the same solvent as described above for the quantum dot dispersion may be used.
本発明の一実施形態において、前記光変換樹脂組成物は、前記量子ドット分散体の他、硬化性樹脂を更に含む。 In one embodiment of the present invention, the photoconversion resin composition further contains a curable resin in addition to the quantum dot dispersion.
前記硬化性樹脂は、量子ドットの分散媒として且つ結合剤樹脂として作用する。 The curable resin acts as a dispersion medium for the quantum dots and as a binder resin.
前記硬化性樹脂としては、光を透過する透明な高分子を用いてよく、特に、量子ドットの劣化防止の面から、低透湿、低透気特性を有する樹脂を用いてよい。 The curable resin may be a transparent polymer that transmits light, and in particular, a resin with low moisture and air permeability may be used to prevent deterioration of the quantum dots.
例えば、前記硬化性樹脂は、エポキシ樹脂、アクリル系樹脂、エポキシアクリレート樹脂、ポリビニルアセテート、ポリビニルアルコール、ポリエチレン、ポリプロピレン、ポリカーボネート、ポリビニルクロリドなどを単独で又は2種以上含んでよく、特にエポキシ樹脂を含んでよい。 For example, the curable resin may include epoxy resin, acrylic resin, epoxy acrylate resin, polyvinyl acetate, polyvinyl alcohol, polyethylene, polypropylene, polycarbonate, polyvinyl chloride, etc., either alone or in combination, and may particularly include epoxy resin.
前記硬化性樹脂のゲル透過クロマトグラフィー(GPC;テトラヒドロフランを溶出溶剤とする)で測定したポリスチレン換算重量平均分子量(以下、略して「重量平均分子量」という)は、5000g/mol~50000g/mol、好ましくは、8000g/mol~40000g/molの範囲であることが好ましい。重量平均分子量が前記範囲内であると、塗膜の硬度が増加するという長所があるため好ましい。 The polystyrene-equivalent weight average molecular weight (hereinafter, abbreviated as "weight average molecular weight") of the curable resin measured by gel permeation chromatography (GPC; using tetrahydrofuran as an elution solvent) is preferably in the range of 5,000 g/mol to 50,000 g/mol, and more preferably 8,000 g/mol to 40,000 g/mol. If the weight average molecular weight is within the above range, it is preferable because it has the advantage of increasing the hardness of the coating film.
前記硬化性樹脂は、光変換樹脂組成物の固形分全体100重量%に対し、5~60重量%、好ましくは、10~50重量%の範囲の量で含まれてよい。前記硬化性樹脂が5重量%未満の量で含まれると、工程上、厚膜の硬化膜を得ることが難しくなり、また60重量%超の量で含まれると、均一な厚さの硬化膜の形成が難しくなることがある。 The curable resin may be contained in an amount ranging from 5 to 60% by weight, preferably 10 to 50% by weight, based on 100% by weight of the total solid content of the photoconversion resin composition. If the curable resin is contained in an amount less than 5% by weight, it may be difficult to obtain a thick cured film in the process, and if it is contained in an amount exceeding 60% by weight, it may be difficult to form a cured film of uniform thickness.
本発明の一実施形態において、前記光変換樹脂組成物は、散乱粒子、溶剤、分散剤及び/又は硬化剤を更に含んでよい。 In one embodiment of the present invention, the light-converting resin composition may further include scattering particles, a solvent, a dispersant, and/or a curing agent.
前記散乱粒子は、上述した光変換インク組成物で用いるものと同一のものを用いてよい。 The scattering particles may be the same as those used in the light conversion ink composition described above.
前記散乱粒子は、光変換樹脂組成物の固形分全体100重量%に対し、0.5~30重量%の範囲の量で含まれてよい。前記散乱粒子が0.5重量%未満の量で含まれると、光散乱の効果が低すぎて塗膜で用いることができる適切な光出力が得られないことがあり、また30重量%超の量で含まれれると、散乱の効果が強すぎて量子ドットの発光した光が透過できず、塗膜を通り抜けることができないため光出力が低下することがある。 The scattering particles may be contained in an amount ranging from 0.5 to 30% by weight, based on 100% by weight of the total solid content of the light-converting resin composition. If the scattering particles are contained in an amount less than 0.5% by weight, the light scattering effect may be too low to obtain an appropriate light output for use in a coating film, and if the scattering particles are contained in an amount exceeding 30% by weight, the scattering effect may be too strong, and the light emitted by the quantum dots may not be able to transmit or pass through the coating film, resulting in a decrease in light output.
前記溶剤としては、上述した量子ドット分散体で説明したのと同一の溶剤を用いてよい。 The solvent may be the same as that described for the quantum dot dispersion above.
前記分散剤は、量子ドットの脱凝集効果を奏する。前記分散剤としては、カルボン酸及び不飽和二重結合を含む化合物を用いてよい。 The dispersant has a deagglomeration effect on the quantum dots. The dispersant may be a compound containing a carboxylic acid and an unsaturated double bond.
前記硬化剤としては、エポキシ化合物、多官能イソシアネート化合物、オキセタン化合物などを用いてよい。 The curing agent may be an epoxy compound, a polyfunctional isocyanate compound, an oxetane compound, or the like.
本発明に係る光変換樹脂組成物は、必要に応じて界面活性剤、密着促進剤、酸化防止剤、紫外線吸収剤、凝集防止剤などの添加剤を更に含んでよい。 The photoconversion resin composition according to the present invention may further contain additives such as surfactants, adhesion promoters, antioxidants, UV absorbers, and anti-aggregation agents, as necessary.
本発明の一実施形態において、前記自発光感光性樹脂組成物は、前記量子ドット分散体の他、アルカリ可溶性樹脂、光重合性モノマー、及び光重合開始剤を更に含む。 In one embodiment of the present invention, the spontaneously luminous photosensitive resin composition further contains an alkali-soluble resin, a photopolymerizable monomer, and a photopolymerization initiator in addition to the quantum dot dispersion.
前記アルカリ可溶性樹脂は、前記自発光感光性樹脂組成物で製造するパターンの非露光部をアルカリ可溶性にして除去可能にし、露光領域を残留させる役割を遂行することができる。また、前記自発光感光性樹脂組成物が前記アルカリ可溶性樹脂を含む場合、前記量子ドットが組成物中に一様に分散できるようにし、且つ工程中に前記量子ドットを保護して輝度を保つようにする役割を遂行することができる。 The alkali-soluble resin can make the non-exposed areas of the pattern produced from the spontaneous light-emitting photosensitive resin composition alkali-soluble and removable, while allowing the exposed areas to remain. In addition, when the spontaneous light-emitting photosensitive resin composition contains the alkali-soluble resin, it can make the quantum dots uniformly disperse in the composition and protect the quantum dots during the process to maintain their brightness.
前記アルカリ可溶性樹脂は、50~200(KOHmg/g)の範囲の酸価を有するものを選定して用いてよい。前記「酸価」とは、重合体1gを中和するのに要する水酸化カリウムの量(mg)として測定される値であって溶解性に関与する。前記アルカリ可溶性樹脂の酸価が前記範囲未満であると、十分な現像速度を確保し難くなることがあり、また前記範囲を超えると、基板との密着性が減少してパターンの短絡が生じ易くなり、且つ組成物全体の保存安定性が低下して粘度が上昇するという問題が生じることがある。 The alkali-soluble resin may be selected to have an acid value in the range of 50 to 200 (KOH mg/g). The "acid value" is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of polymer, and is related to solubility. If the acid value of the alkali-soluble resin is below the above range, it may be difficult to ensure a sufficient development speed, and if it exceeds the above range, adhesion to the substrate may decrease, making the pattern more susceptible to short circuits, and the storage stability of the entire composition may decrease, resulting in an increase in viscosity.
また、前記アルカリ可溶性樹脂の重量平均分子量は、3,000~30,000、好ましくは、5,000~20,000の範囲であってよく、分子量分布度は、1.5~6.0、好ましくは、1.8~4.0の範囲であってよい。 The weight average molecular weight of the alkali-soluble resin may be in the range of 3,000 to 30,000, preferably 5,000 to 20,000, and the molecular weight distribution may be in the range of 1.5 to 6.0, preferably 1.8 to 4.0.
前記アルカリ可溶性樹脂は、カルボキシル基含有不飽和単量体の重合体、又はこれと共重合可能な不飽和結合を有する単量体との共重合体、及びこれらの組み合わせであってよい。 The alkali-soluble resin may be a polymer of a carboxyl-containing unsaturated monomer, or a copolymer of the polymer and a monomer having an unsaturated bond copolymerizable therewith, or a combination thereof.
前記カルボキシル基含有不飽和単量体としては、不飽和モノカルボン酸、不飽和ジカルボン酸、不飽和トリカルボン酸などが挙げられる。具体的に、不飽和モノカルボン酸としては、例えば、アクリル酸、メタクリル酸、クロトン酸、α-クロロアクリル酸、桂皮酸などが挙げられる。不飽和ジカルボン酸としては、例えば、マレイン酸、フマル酸、イタコン酸、シトラコン酸、メサコン酸などが挙げられる。不飽和ジカルボン酸は酸無水物であってもよく、具体的には、マレイン酸無水物、イタコン酸無水物、シトラコン酸無水物などが挙げられる。また、不飽和ジカルボン酸は、そのモノ(2-(メタ)アクリロイルオキシアルキル)エステルであってもよく、例えば、コハク酸モノ(2-アクリロイルオキシエチル)、コハク酸モノ(2-メタクリロイルオキシエチル)、フタル酸モノ(2-アクリロイルオキシエチル)、フタル酸モノ(2-メタクリロイルオキシエチル)などが挙げられる。不飽和ジカルボン酸は、その両末端ジカルボキシ重合体のモノ(メタ)アクリレートであってもよく、例えば、ω-カルボキシポリカプロラクトンモノアクリレート、ω-カルボキシポリカプロラクトンモノメタクリレートなどが挙げられる。これらのカルボキシル基含有単量体は、それぞれ単独で又は2種以上を混合して用いていてよい。
また、カルボキシル基含有不飽和単量体と共重合が可能な単量体は、芳香族ビニル化合物、不飽和カルボン酸エステル化合物、不飽和カルボン酸アミノアルキルエステル化合物、不飽和カルボン酸グリシジルエステル化合物、カルボン酸ビニルエステル化合物、不飽和エーテル化合物、シアン化ビニル化合物、不飽和アミド化合物、不飽和イミド化合物、脂肪族共役ジエン化合物、分子鎖の末端にモノアクリロイル基又はモノメタクリロイル基を有する巨大単量体、バルキー性単量体、及びこれらの組み合わせからなる群より選ばれた1種であってよい。
The carboxyl group-containing unsaturated monomer includes unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, unsaturated tricarboxylic acid, etc. Specific examples of unsaturated monocarboxylic acid include acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, cinnamic acid, etc. Specific examples of unsaturated dicarboxylic acid include maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid, etc. The unsaturated dicarboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride, citraconic anhydride, etc. The unsaturated dicarboxylic acid may also be a mono(2-(meth)acryloyloxyalkyl)ester thereof, and examples thereof include mono(2-acryloyloxyethyl) succinate, mono(2-methacryloyloxyethyl) succinate, mono(2-acryloyloxyethyl) phthalate, and mono(2-methacryloyloxyethyl) phthalate. The unsaturated dicarboxylic acid may be a mono(meth)acrylate of a polymer having dicarboxy groups at both ends thereof, such as ω-carboxypolycaprolactone monoacrylate, ω-carboxypolycaprolactone monomethacrylate, etc. These carboxyl group-containing monomers may be used alone or in combination of two or more kinds.
In addition, the monomer copolymerizable with the carboxyl group-containing unsaturated monomer may be one selected from the group consisting of aromatic vinyl compounds, unsaturated carboxylic acid ester compounds, unsaturated carboxylic acid amino alkyl ester compounds, unsaturated carboxylic acid glycidyl ester compounds, carboxylic acid vinyl ester compounds, unsaturated ether compounds, vinyl cyanide compounds, unsaturated amide compounds, unsaturated imide compounds, aliphatic conjugated diene compounds, macromonomers having a monoacryloyl group or a monomethacryloyl group at the molecular chain terminal, bulky monomers, and combinations thereof.
前記アルカリ可溶性樹脂は、自発光感光性樹脂組成物の固形分全体100重量%に対し、5~80重量%、具体的に、10~70重量%、より具体的に、15~60重量%の範囲で含まれてよい。 The alkali-soluble resin may be contained in a range of 5 to 80% by weight, specifically 10 to 70% by weight, more specifically 15 to 60% by weight, based on 100% by weight of the total solid content of the self-luminous photosensitive resin composition.
前記光重合性モノマーは、光及び後述する光重合開始剤の作用で重合し得る化合物であれば、上述した量子ドット分散体で用いられる硬化性モノマーと同一のものであってよい。 The photopolymerizable monomer may be the same as the curable monomer used in the quantum dot dispersion described above, so long as it is a compound that can be polymerized by the action of light and a photopolymerization initiator described below.
前記光重合性モノマーは、自発光感光性樹脂組成物の固形分全体100重量%に対し、5~70重量%、具体的に、10~60重量%、より具体的に、15~50重量%の範囲で含まれてよい。 The photopolymerizable monomer may be contained in the range of 5 to 70% by weight, specifically 10 to 60% by weight, more specifically 15 to 50% by weight, based on 100% by weight of the total solid content of the self-luminous photosensitive resin composition.
前記光重合開始剤は、上述した光変換インク組成物で用いるものと同一のものを用いてよく、必要に応じて光重合開始補助剤を更に含んでよい。 The photopolymerization initiator may be the same as that used in the photoconversion ink composition described above, and may further contain a photopolymerization initiator assistant as necessary.
前記光重合開始剤は、自発光感光性樹脂組成物の固形分全体100重量%に対し、0.1~20重量%、好ましくは、0.5~15重量%、より好ましくは、1~10重量%の範囲で含まれてよい。 The photopolymerization initiator may be contained in the range of 0.1 to 20% by weight, preferably 0.5 to 15% by weight, and more preferably 1 to 10% by weight, based on 100% by weight of the total solid content of the self-luminous photosensitive resin composition.
前記自発光感光性樹脂組成物は、溶剤を更に含んでよく、前記溶剤としては、上述した量子ドット分散体で説明したものと同一の溶剤を用いてよい。 The spontaneous light-emitting photosensitive resin composition may further contain a solvent, and the solvent may be the same as that described for the quantum dot dispersion above.
前記自発光感光性樹脂組成物中の溶剤の含量は、前記自発光感光性樹脂組成物の全体100重量%に対し、20~90重量%、好ましくは、25~85重量%、より好ましくは、30~80重量%の範囲であってよい。 The content of the solvent in the self-luminous photosensitive resin composition may be in the range of 20 to 90% by weight, preferably 25 to 85% by weight, and more preferably 30 to 80% by weight, based on 100% by weight of the entire self-luminous photosensitive resin composition.
本発明に係る自発光感光性樹脂組成物は、必要に応じて密着促進剤、界面活性剤、酸化防止剤、紫外線吸収剤、凝集防止剤などの添加剤を更に含んでよい。 The self-luminous photosensitive resin composition according to the present invention may further contain additives such as adhesion promoters, surfactants, antioxidants, ultraviolet absorbers, and anti-aggregation agents, as necessary.
<硬化膜>
本発明の一実施形態は、上述した硬化性組成物を用いて形成される硬化膜に関する。
<Cured film>
One embodiment of the present invention relates to a cured film formed using the above-mentioned curable composition.
本発明の一実施形態において、前記硬化膜は、カラーフィルタ又は光変換シートであってよい。 In one embodiment of the present invention, the cured film may be a color filter or a light conversion sheet.
本発明に係るカラーフィルタ及び光変換シートは、本発明に係る量子ドット分散体を含む硬化性組成物の硬化物を含むため、量子ドットの耐光性に優れ且つ塗膜の硬度に優れるという利点がある。 The color filter and light conversion sheet according to the present invention contain a cured product of a curable composition containing the quantum dot dispersion according to the present invention, and therefore have the advantage of excellent light resistance of the quantum dots and excellent hardness of the coating film.
前記カラーフィルタは、基板及び前記基板の上部に形成されたパターン層を含む。 The color filter includes a substrate and a patterned layer formed on top of the substrate.
前記基板は、前記カラーフィルタそれ自体基板であってよく、又は、ディスプレイ装置などにカラーフィルタが位置する部位であってもよく、特に制限されない。前記基板は、ガラス、シリコン(Si)、シリコン酸化物(SiOx)、Al、GaAs又は高分子基板であってよく、前記高分子は、ポリエーテルスルホン、ポリカーボネート、ポリエステル、芳香族ポリアミド、ポリアミドイミド、ポリイミドなどであってよい。前記基板は、隔壁マトリックスが形成されていてもよい。 The substrate may be the substrate of the color filter itself, or may be a portion of a display device or the like where the color filter is located, and is not particularly limited. The substrate may be a glass, silicon (Si), silicon oxide (SiOx), Al, GaAs, or polymer substrate, and the polymer may be polyethersulfone, polycarbonate, polyester, aromatic polyamide, polyamideimide, polyimide, or the like. The substrate may have a partition matrix formed thereon.
前記パターン層は、本発明に係る硬化性組成物を含む層であって、インクジェット印刷パターニング方式にてパターン化され、又はフォトリソグラフィにてパターン化されたものであってよい。 The pattern layer is a layer containing the curable composition according to the present invention, and may be patterned by an inkjet printing patterning method or by photolithography.
前記インクジェット印刷パターニング方式を用いたパターン形成方法は、上述した硬化性組成物をインクジェット方式にて所定の領域に塗布し、該塗布された硬化性組成物を硬化することで行われてよい。 The pattern formation method using the inkjet printing patterning method may be performed by applying the above-mentioned curable composition to a predetermined area by an inkjet method and curing the applied curable composition.
先ず、本発明に係る硬化性組成物をインクジェット噴射機に注入し基板の所定の領域をプリントする。 First, the curable composition of the present invention is injected into an inkjet printer and printed onto a specified area of a substrate.
インクジェット噴射機の一例であるピエゾインクジェットヘッドから噴射され基板の上で適切な相(phase)を形成するために、粘度、流動性、量子ドット粒子などの特性がインクジェットヘッドと釣り合う必要がある。本発明で用いられたピエゾインクジェットヘッドは制限されないが、約10~100pL、好ましくは、約20~40pLの液滴の大きさを有するインクを噴射する。 In order for the ink to be sprayed from a piezoelectric inkjet head, which is an example of an inkjet sprayer, and to form the appropriate phase on the substrate, the properties of the viscosity, fluidity, quantum dot particles, etc. must be balanced with the inkjet head. The piezoelectric inkjet head used in the present invention sprays ink with a droplet size of about 10 to 100 pL, preferably about 20 to 40 pL, although there is no limit to this.
インクジェット印刷パターニング方式を用いる場合、本発明に係る硬化性組成物の粘度は約3~30cPの範囲が適当であり、より好ましくは、7~20cPの範囲で調節される。 When using the inkjet printing patterning method, the viscosity of the curable composition according to the present invention is suitably adjusted to a range of about 3 to 30 cP, and more preferably, to a range of 7 to 20 cP.
前記フォトリソグラフィ方式を用いたパターン形成方法は、上述した硬化性組成物を塗布し所定のパターンに露光、現像、及び熱硬化することで行われてよい。前記フォトリソグラフィ方式を用いたパターン形成方法は、当該技術分野において通常的に知られた方法を行うことで形成してよい。 The pattern formation method using the photolithography method may be performed by applying the above-mentioned curable composition, exposing it to a predetermined pattern, developing it, and thermally curing it. The pattern formation method using the photolithography method may be performed by a method commonly known in the technical field.
前記カラーフィルタは、赤色パターン層、緑色パターン層、及び青色パターン層のうちの2種色相のパターン層のみを備えてもよいが、これに限定されない。なお、前記カラーフィルタが2種色相のパターン層のみを備える場合、前記パターン層は、前記量子ドット粒子を含有しない透明パターン層を更に備えてよい。 The color filter may include only two pattern layers of different hues, a red pattern layer, a green pattern layer, and a blue pattern layer, but is not limited to this. In addition, when the color filter includes only two pattern layers of different hues, the pattern layers may further include a transparent pattern layer that does not contain the quantum dot particles.
前記カラーフィルタが前記2種色相のパターン層のみを備える場合は、前記2種色相以外の色相を呈する波長の光を放出する光源を用いてよい。例えば、前記カラーフィルタが赤色パターン層及び緑色パターン層を含む場合は、青色光を放出する光源を用いてよく、この場合、赤量子ドットは赤色光を、緑量子ドットは緑色光を放出し、前記透明パターン層は、前記光源による青色光が素通しすることによって青色を呈してよい。 When the color filter has only pattern layers of the two hues, a light source that emits light of a wavelength that exhibits a hue other than the two hues may be used. For example, when the color filter includes a red pattern layer and a green pattern layer, a light source that emits blue light may be used, in which case the red quantum dots emit red light and the green quantum dots emit green light, and the transparent pattern layer may exhibit blue by allowing the blue light from the light source to pass through.
前記光変換シートは、発光素子が放出する光の波長を変換して放出するシートである。 The light conversion sheet is a sheet that converts the wavelength of light emitted by the light emitting element and emits it.
前記光変換シートは、基材を更に含んでよい。 The light conversion sheet may further include a substrate.
前記光変換シートは、基材上に上述した硬化性組成物を塗布し乾燥した後に硬化してなるものであってよい。 The light conversion sheet may be formed by applying the above-mentioned curable composition onto a substrate, drying it, and then curing it.
前記基材は、必要に応じて離型処理が施されたものであってよい。 The substrate may be subjected to a release treatment as necessary.
前記基材としては、ガラス又はポリエチレンテレフタレート(PET)フィルムなどを用いてよい。 The substrate may be glass or a polyethylene terephthalate (PET) film.
前記硬化は、熱硬化又は光硬化条件で行われてよい。 The curing may be carried out under heat or light curing conditions.
<画像表示装置>
本発明の一実施形態は、上述した硬化膜を含む画像表示装置に関する。
<Image display device>
One embodiment of the present invention relates to an image display device including the above-mentioned cured film.
本発明の一実施形態に係る画像表示装置において上述した硬化膜は、カラーフィルタ又は光変換シートとして適用されてよく、これにより、カラーフィルタ基板やバックライトユニットの光源の製造の際に用いられ得る。 The cured film described above in the image display device according to one embodiment of the present invention may be applied as a color filter or a light conversion sheet, and thus may be used in the manufacture of a color filter substrate or a light source for a backlight unit.
本発明に係る硬化膜は、通常の液晶表示装置(LCD)だけでなく、電界発光表示装置(EL)、プラズマ表示装置(PDP)、電界放出表示装置(FED)、有機発光素子(OLED)、量子ドット発光ダイオード(Quantum Dot Light-Emitting Diode、QLED)などの各種の画像表示装置に適用可能である。 The cured film according to the present invention can be applied to various image display devices, such as not only ordinary liquid crystal display devices (LCDs), but also electroluminescent display devices (ELs), plasma display devices (PDPs), field emission display devices (FEDs), organic light-emitting devices (OLEDs), and quantum dot light-emitting diodes (QLEDs).
本発明に係る画像表示装置は、上述した硬化膜を備えたことを除いては、当該技術分野において知られた構成を含む。 The image display device according to the present invention includes a configuration known in the art, except that it is provided with the above-mentioned cured film.
また、本発明の一実施形態に係る量子ドットは、上述したディスプレイだけでなく、照明用光源、太陽電池、半導体レーザ/光増幅器、バイオイメージングなどの素材としても適用可能である。 The quantum dots according to one embodiment of the present invention can be used not only in the displays described above, but also as materials for lighting sources, solar cells, semiconductor lasers/optical amplifiers, bioimaging, and the like.
以下、実施例、比較例及び実験例によって本発明をより具体的に説明することにする。なお、これらの実施例、比較例及び実験例は、単に本発明を説明するためのものに過ぎず、本発明の範囲がこれらに限定されるものではないことは当業者にとって自明である。 Hereinafter, the present invention will be described in more detail with reference to examples, comparative examples, and experimental examples. Note that it will be obvious to those skilled in the art that these examples, comparative examples, and experimental examples are merely for the purpose of explaining the present invention, and that the scope of the present invention is not limited to these examples, comparative examples, and experimental examples.
合成例1:量子ドット(A-1)の合成
三つ口フラスコ(3-neck flask)にインジウムアセテート0.05839g、オレイン酸0.12019g、及び1-オクタデセン(ODE)10mLを入れた。前記フラスコを撹拌しながら110℃、100mTorr下で30分間の脱気(degassing)過程を経た後、溶液が透明になるまで不活性気体下、270℃の温度で加熱した。
Synthesis Example 1: Synthesis of quantum dots (A-1) 0.05839 g of indium acetate, 0.12019 g of oleic acid, and 10 mL of 1-octadecene (ODE) were placed in a three-neck flask. The flask was degassed at 110° C. and 100 mTorr for 30 minutes while stirring, and then heated at 270° C. under an inert gas until the solution became transparent.
リン(P)前駆体としてトリス(トリメチルシリル)ホスフィンを0.025054g準備し、1-オクタデセン0.5mLとトリ-n-オクチルホスフィン0.5mLに入れて撹拌し、これを、不活性気体下、270℃で加熱された前記フラスコに素早く注入した。1時間反応させた後、素早く冷却させて反応を終結させた。次いで、フラスコの温度が100℃に達したとき、10mLのトルエンを注入してから50mL遠心分離チューブに移した。エタノール10mLを添加した後、沈澱及び再分散方法を活用して2回精製した。精製されたInPコアナノ粒子を1-オクタデセンに分散させた後に保存した。 0.025054 g of tris(trimethylsilyl)phosphine was prepared as a phosphorus (P) precursor, and was added to 0.5 mL of 1-octadecene and 0.5 mL of tri-n-octylphosphine, which was stirred and then quickly injected into the flask heated to 270°C under an inert gas. After reacting for 1 hour, the reaction was terminated by quickly cooling. Then, when the temperature of the flask reached 100°C, 10 mL of toluene was injected and the mixture was transferred to a 50 mL centrifuge tube. After adding 10 mL of ethanol, the mixture was purified twice using the precipitation and redispersion method. The purified InP core nanoparticles were dispersed in 1-octadecene and stored.
三つ口フラスコに酢酸亜鉛3.669g、オレイン酸20mL、及び1-オクタデセン20mLを入れ、撹拌しながら110℃、100mTorr下で30分間の脱気(degassing)過程を経た後、溶液が透明になるまで不活性気体下、270℃の温度で加熱してから60℃に冷却させて、透明なオレイン酸亜鉛形態の前駆体溶液を得た。 3.669 g of zinc acetate, 20 mL of oleic acid, and 20 mL of 1-octadecene were placed in a three-neck flask, and the mixture was degassed at 110°C and 100 mTorr for 30 minutes while stirring. The mixture was then heated at 270°C under an inert gas until the solution became transparent, and then cooled to 60°C to obtain a transparent precursor solution of zinc oleate.
三つ口フラスコに硫黄0.6412g及びトリ-n-オクチルホスフィン10mLを入れ、溶液が透明になるまで不活性気体雰囲気で撹拌しながら80℃の温度で加熱してから常温に冷却させて、TOP:S形態のS前駆体溶液を得た。 0.6412 g of sulfur and 10 mL of tri-n-octylphosphine were placed in a three-neck flask, heated at 80°C while stirring in an inert gas atmosphere until the solution became transparent, and then cooled to room temperature to obtain a TOP:S-type S precursor solution.
別途の三つ口フラスコに予め準備したInPコアのナノ粒子溶液を入れ、フラスコの温度を300℃に調節してから予め準備した亜鉛前駆体溶液0.6mLを注射器を活用して素早く注入した。次いで、予め準備したS前駆体溶液0.3mLを注射器ポンプを活用して2mL/hrの速度でフラスコに注入した。注入が終わってから更に3時間反応を進め、素早く冷却させて反応を終結させた。フラスコの温度が100℃に達したとき、10mLのトルエンを注入した後、50mL遠心分離チューブに移した。エタノール10mLを添加した後、沈澱及び再分散方法を活用して2回精製した。精製されたInP/ZnSコア-シェル構造のナノ粒子をn-クロロホルムに分散させた後に保存した。固形分は25重量%に調整した。最大発光波長は525nmであった。 A separate three-neck flask was filled with the InP core nanoparticle solution, and the flask temperature was adjusted to 300°C. Then, 0.6 mL of the zinc precursor solution was quickly injected using a syringe. Then, 0.3 mL of the S precursor solution was injected into the flask at a rate of 2 mL/hr using a syringe pump. After the injection, the reaction was continued for another 3 hours and then quickly cooled to terminate the reaction. When the flask temperature reached 100°C, 10 mL of toluene was injected and then transferred to a 50 mL centrifuge tube. After adding 10 mL of ethanol, the mixture was purified twice using the precipitation and redispersion method. The purified InP/ZnS core-shell structured nanoparticles were dispersed in n-chloroform and stored. The solid content was adjusted to 25 wt%. The maximum emission wavelength was 525 nm.
合成例2:量子ドット(A-2)の合成
インジウムアセテート(Indium acetate)0.4mmol(0.058g)、パルミチン酸(palmitic acid)0.6mmol(0.15g)、及び1-オクタデセン(octadecene)20mLを反応器に入れ、真空下、120℃で加熱した。1時間後に反応器内の雰囲気を窒素に転換した。280℃で加熱した後、トリス(トリメチルシリル)ホスフィン(TMS3P)0.2mmol(58μl)及びトリオクチルホスフィン1.0mLの混合溶液を素早く注入し、0.5分間反応させた。
Synthesis Example 2: Synthesis of quantum dots (A-2) 0.4 mmol (0.058 g) of indium acetate, 0.6 mmol (0.15 g) of palmitic acid, and 20 mL of 1-octadecene were placed in a reactor and heated at 120° C. under vacuum. After 1 hour, the atmosphere in the reactor was replaced with nitrogen. After heating at 280° C., a mixed solution of 0.2 mmol (58 μl) of tris(trimethylsilyl)phosphine (TMS 3 P) and 1.0 mL of trioctylphosphine was quickly injected and reacted for 0.5 minutes.
次いで、亜鉛アセテート2.4mmoL(0.448g)、オレイン酸4.8mmol、及びトリオクチルアミン20mLを反応器に入れ、真空下、120℃で加熱した。1時間後に反応器内の雰囲気を窒素に転換し、反応器を280℃に昇温させた。先に合成したInPコア溶液2mLを入れ、次いで、トリオクチルホスフィン中のセレニウム(Se/TOP)4.8mmolを入れた後、最終混合物を2時間反応させた。常温に素早く冷却させた反応溶液にエタノールを入れ、遠心分離して得た沈澱物を減圧ろ過後に減圧乾燥して、InP/ZnSeコア-シェルを形成させた。 Next, 2.4 mmol of zinc acetate (0.448 g), 4.8 mmol of oleic acid, and 20 mL of trioctylamine were placed in a reactor and heated to 120°C under vacuum. After 1 hour, the atmosphere in the reactor was replaced with nitrogen, and the reactor was heated to 280°C. 2 mL of the previously synthesized InP core solution was added, followed by 4.8 mmol of selenium in trioctylphosphine (Se/TOP), and the final mixture was reacted for 2 hours. Ethanol was added to the reaction solution, which was quickly cooled to room temperature, and the precipitate obtained by centrifuging was filtered under reduced pressure and dried under reduced pressure to form an InP/ZnSe core-shell.
次いで、亜鉛アセテート2.4mmoL(0.448g)、オレイン酸4.8mmol、及びトリオクチルアミン20mLを反応器に入れ、真空下、120℃で加熱した。1時間後に反応器内の雰囲気を窒素に転換し、反応器を280℃に昇温させた。先に合成したInP/ZnSeコア-シェル溶液2mLを入れ、次いで、トリオクチルホスフィン中の硫黄(S/TOP)4.8mmolを入れた後、最終混合物を2時間反応させた。常温に素早く冷却させた反応溶液にエタノールを入れ、遠心分離して得た沈澱物を減圧ろ過後に減圧乾燥して、InP/ZnSe/ZnSコア-シェル構造の量子ドットを収得した後にクロロホルムに分散させた。固形分は25重量%に調整した。最大発光波長は520nmであった。 Next, 2.4 mmol of zinc acetate (0.448 g), 4.8 mmol of oleic acid, and 20 mL of trioctylamine were placed in a reactor and heated to 120°C under vacuum. After 1 hour, the atmosphere in the reactor was replaced with nitrogen, and the reactor was heated to 280°C. 2 mL of the previously synthesized InP/ZnSe core-shell solution was added, followed by 4.8 mmol of sulfur in trioctylphosphine (S/TOP), and the final mixture was reacted for 2 hours. Ethanol was added to the reaction solution that was quickly cooled to room temperature, and the precipitate obtained by centrifuging was filtered under reduced pressure and dried under reduced pressure to obtain quantum dots with an InP/ZnSe/ZnS core-shell structure, which were then dispersed in chloroform. The solid content was adjusted to 25% by weight. The maximum emission wavelength was 520 nm.
実施例及び比較例:量子ドット分散体の製造
下記表1の組成でそれぞれの成分を混合して量子ドット分散体を製造した(重量%)。
Examples and Comparative Examples: Preparation of Quantum Dot Dispersion A quantum dot dispersion was prepared by mixing the components according to the composition in Table 1 below (wt %).
実施例及び比較例:光変換インク組成物の製造
下記表2及び表3の組成でそれぞれの成分を混合して光変換インク組成物を製造した(重量%)。
Examples and Comparative Examples: Preparation of Light-Converting Ink Compositions Light-converting ink compositions were prepared by mixing the components according to the compositions in Tables 2 and 3 below (wt %).
実験例1:
前記実施例及び比較例で製造された量子ドット分散体の粘度安定性、分散粒度、及び耐光性を下記のような方法にて測定し、その結果を下記表4に表した。
Experimental Example 1:
The viscosity stability, dispersion particle size, and light resistance of the quantum dot dispersions prepared in the above examples and comparative examples were measured by the following methods, and the results are shown in Table 4 below.
(1)粘度安定性
実施例1~15及び比較例1~比較例4の量子ドット分散体に対し、R型粘度計(VISCOMETER MODEL RE120L SYSTEM、東機産業株式会社製)を用いて、回転数10rpm、温度30℃の条件で初期粘度及び低温5℃で1ヶ月保管後の粘度を測定した。粘度変化率から粘度安定性を下記の評価基準によって評価した。
(1) Viscosity Stability For the quantum dot dispersions of Examples 1 to 15 and Comparative Examples 1 to 4, the initial viscosity was measured at a rotation speed of 10 rpm and a temperature of 30° C. using an R-type viscometer (VISCOMETER MODEL RE120L SYSTEM, manufactured by Toki Sangyo Co., Ltd.) and the viscosity after one month of storage at a low temperature of 5° C. The viscosity stability was evaluated based on the rate of viscosity change according to the following evaluation criteria.
<評価基準>
○:粘度変化率105%以下
△:粘度変化率105%超~110%以下
×:粘度変化率110%超
(2)分散粒度
前記実施例1~15及び比較例1~比較例4の量子ドット分散体の分散粒度をELSZ-2000ZS(大塚電子社製)を用いて測定した。
<Evaluation criteria>
◯: Viscosity change rate 105% or less △: Viscosity change rate from 105% to 110% or less ×: Viscosity change rate over 110% (2) Dispersion particle size The dispersion particle size of the quantum dot dispersions of Examples 1 to 15 and Comparative Examples 1 to 4 was measured using ELSZ-2000ZS (manufactured by Otsuka Electronics Co., Ltd.).
(3)耐光性(光保持率)
量子ドット分散体の製造初期の量子効率(QY%)と常温で15日放置後の量子効率(QY%)をPL分光光度計及びUV-Vis分光光度計を用いて測定した。
(3) Light resistance (light retention rate)
The quantum efficiency (QY%) of the quantum dot dispersion immediately after preparation and after standing at room temperature for 15 days were measured using a PL spectrophotometer and a UV-Vis spectrophotometer.
量子ドットの表面が酸化すると、量子効率が低減するようになるので、量子効率の低減量を測定して耐光性(光保持率)を確認することができる。すなわち、ΔQY%を測定して耐光性を確認することができる。 When the surface of a quantum dot is oxidized, the quantum efficiency decreases, so the amount of quantum efficiency decrease can be measured to confirm light resistance (light retention rate). In other words, light resistance can be confirmed by measuring ΔQY%.
前記表4に表したように、3~6員の硫黄含有脂環式炭化水素基を有する化合物を含む実施例の量子ドット分散体は、3~6員の硫黄含有脂環式炭化水素基を有する化合物を含まない比較例の量子ドット分散体に比べて、粘度安定性、分散粒度、及び耐光性が大きく向上することを確認することができた。 As shown in Table 4, it was confirmed that the quantum dot dispersion of the embodiment containing a compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group has significantly improved viscosity stability, dispersion particle size, and light resistance compared to the quantum dot dispersion of the comparative example not containing a compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group.
実験例2:
前記実施例及び比較例で製造された光変換インク組成物を用いて下記のように光変換コーティング層を製造し、このときの光変換効率、耐光性(光保持率)、連続ジェッティング回数、及び塗膜の硬度を下記のような方法にて測定し、その結果を下記表5に表した。
Experimental Example 2:
The light conversion coating layer was prepared as described below using the light conversion ink compositions prepared in the above examples and comparative examples, and the light conversion efficiency, light resistance (light retention rate), number of continuous jetting, and hardness of the coating were measured as described below, and the results are shown in Table 5 below.
<光変換コーティング層の製造>
実施例及び比較例で製造されたそれぞれの光変換インク組成物をインクジェット方式で5cm×5cmガラス基板上に塗布した後、紫外線光源としてg、h、i線をいずれも含有する1kWの高圧水銀灯を用いて100mJ/cm2で照射後、180℃の加熱オーブンで30分間加熱して、光変換コーティング層を製造した。
<Production of light conversion coating layer>
Each of the light conversion ink compositions prepared in the examples and comparative examples was applied onto a 5 cm x 5 cm glass substrate by the inkjet method, and then irradiated with 100 mJ/ cm2 using a 1 kW high pressure mercury lamp containing g, h, and i rays as an ultraviolet light source, and then heated in a heating oven at 180°C for 30 minutes to prepare a light conversion coating layer.
(1)光変換効率
製造された光変換コーティング層を青色(blue)光源(XLamp XR-E LED、Royal blue 450、Cree社製)の上部に位置させた後、輝度測定器(CAS140CT Spectrometer、Instrument systems社製)を用いて光変換効率を下記の数学式1にて測定した。
光変換効率(%)が高いほど優れた輝度を得ることができる。
(1) Light Conversion Efficiency The prepared light conversion coating layer was placed on top of a blue light source (XLamp XR-E LED, Royal blue 450, manufactured by Cree), and the light conversion efficiency was measured using a luminance meter (CAS140CT Spectrometer, manufactured by Instrument Systems) according to the following mathematical formula 1.
The higher the light conversion efficiency (%), the better the brightness that can be obtained.
(2)耐光性(光保持率)
製造された光変換コーティング層を青色(blue)光源(XLamp XR-E LED、Royal blue 450、Cree社製)の上部に位置させた後、輝度測定器(CAS140CT Spectrometer、Instrument systems社製)を用いて初期光変換効率を前記数学式1にて算出した。次いで、前記光変換コーティング層を80mW/cm2照度の450nm LEDで3日間照射してから前記のように光変換効率を測定し、該光変換効率から下記の数学式2にて光保持率を算出した。
(2) Light resistance (light retention rate)
The prepared light conversion coating layer was placed above a blue light source (XLamp XR-E LED, Royal blue 450, manufactured by Cree), and the initial light conversion efficiency was calculated using a luminance meter (CAS140CT Spectrometer, manufactured by Instrument Systems) according to Equation 1. Then, the light conversion coating layer was irradiated with a 450 nm LED with an illuminance of 80 mW/ cm2 for 3 days, and the light conversion efficiency was measured as described above, and the light retention was calculated from the light conversion efficiency according to Equation 2 below.
(3)連続ジェッティング回数
前記実施例16~30及び比較例5~9の光変換インク組成物をユニジェット社製のインクジェットプリンティング設備に充填した後、ジェッティングヘッドの温度を40℃に固定してから1分間インクを吐出し、その後、30分間放置することを、ジェッティングヘッド部のノズル詰りにより吐出ができなくなるまで繰り返し行って連続ジェッティング回数を評価した。
(3) Number of Continuous Jettings The light conversion ink compositions of Examples 16 to 30 and Comparative Examples 5 to 9 were filled into an inkjet printing device manufactured by Unijet Co., Ltd., and the temperature of the jetting head was fixed at 40° C., and the ink was ejected for 1 minute. Thereafter, the ink was left for 30 minutes. This was repeated until the nozzle of the jetting head became clogged and ejection became impossible, and the number of continuous jettings was evaluated.
連続ジェッティング回数が増加するほど連続工程に優れるという特性を得ることができる。 The more consecutive jetting times you do, the better the continuous process you can achieve.
(4)塗膜の硬度
前記製造された光変換コーティング層の硬度を硬度計(HM500;Fischer社製)を用いて150℃の高温で測定し、その表面硬度を下記の評価基準で評価した。
(4) Hardness of Coating Film The hardness of the prepared light conversion coating layer was measured at a high temperature of 150° C. using a hardness tester (HM500; manufactured by Fischer), and the surface hardness was evaluated according to the following evaluation criteria.
<評価基準>
○:表面硬度50N/mm2以上
△:表面硬度30N/mm2以上50N/mm2未満
×:表面硬度30N/mm2未満
<Evaluation criteria>
○: Surface hardness of 50 N/mm2 or more △: Surface hardness of 30 N/mm2 or more and less than 50 N/ mm2 ×: Surface hardness of less than 30 N/ mm2
前記表5に表したように、3~6員の硫黄含有脂環式炭化水素基を有する化合物を含む量子ドット分散体を用いた実施例の光変換インク組成物は、3~6員の硫黄含有脂環式炭化水素基を有する化合物を含まない量子ドット分散体を用いた比較例の光変換インク組成物に比べて、光変換効率、耐光性(光保持率)、連続ジェッティング回数、及び塗膜の硬度に優れることを確認することができた。 As shown in Table 5, it was confirmed that the light conversion ink composition of the example using a quantum dot dispersion containing a compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group was superior in light conversion efficiency, light resistance (light retention rate), number of continuous jetting, and hardness of the coating film compared to the light conversion ink composition of the comparative example using a quantum dot dispersion not containing a compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group.
以上、本発明の特定の部分について詳しく記述したが、本発明の属する技術分野における通常の知識を有する者であれば、このような具体的な記述は単に好適な具現例であるに過ぎず、これらによって本発明の範囲が制限されるものではないことは明らかである。本発明の属する技術分野における通常の知識を有する者であれば、前記内容を基に本発明の範疇内で種々の応用および変形を行うことが可能であろう。 Although specific aspects of the present invention have been described in detail above, it will be clear to anyone with ordinary knowledge in the technical field to which the present invention pertains that these specific descriptions are merely preferred examples and do not limit the scope of the present invention. Anyone with ordinary knowledge in the technical field to which the present invention pertains will be able to make various applications and modifications within the scope of the present invention based on the above content.
したがって、本発明の実質的な範囲は、特許請求の範囲とその等価物によって定義されると言えよう。 Therefore, the true scope of the present invention is defined by the claims and their equivalents.
Claims (8)
前記3~6員の硫黄含有脂環式炭化水素基を有する化合物は、下記の化学式1で表される化合物を含む、量子ドット分散体。
前記式中、
Zは、
又は
であり、
R 1 及びR 2 は、それぞれ独立して、存在しないか、鎖炭素のうちの1つ以上が酸素で置換若しくは非置換のC 1 ~C 6 のアルキレン基であり、
Aは、存在しないか、又はO、NR 4 又はSであり、
R 3 及びR 4 は、それぞれ独立して、水素又はC 1 ~C 6 のアルキル基であり、
n及びmは、それぞれ独立して、1~4の整数であり、
pは、1~100の整数である。 The present invention relates to a compound having a quantum dot and a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group,
The quantum dot dispersion includes a compound having a 3- to 6-membered sulfur-containing alicyclic hydrocarbon group, the compound being represented by the following chemical formula 1 :
In the above formula,
Z is,
or
and
R 1 and R 2 are each independently an absent or C 1 -C 6 alkylene group in which one or more of the chain carbons are unsubstituted or substituted with oxygen;
A is absent, O, NR4 or S;
R3 and R4 are each independently hydrogen or a C1 - C6 alkyl group ;
n and m are each independently an integer from 1 to 4;
p is an integer from 1 to 100.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2020-0017189 | 2020-02-12 | ||
KR1020200017189A KR20210102758A (en) | 2020-02-12 | 2020-02-12 | Quantum Dot Dispersion and Curable Composition Comprising the Same |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021128339A JP2021128339A (en) | 2021-09-02 |
JP7482809B2 true JP7482809B2 (en) | 2024-05-14 |
Family
ID=77466831
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021019712A Active JP7482809B2 (en) | 2020-02-12 | 2021-02-10 | Quantum dot dispersion and curable composition containing the same |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP7482809B2 (en) |
KR (1) | KR20210102758A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2023152725A (en) * | 2022-03-31 | 2023-10-17 | 住友化学株式会社 | Composition, membrane and display device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011029380A (en) | 2009-07-24 | 2011-02-10 | Showa Denko Kk | Liquid curable resin composition for sealing led, light emitting device, light emitting module, and lighting device |
CN105018092A (en) | 2014-04-29 | 2015-11-04 | Tcl集团股份有限公司 | Quantum dot/polymer composite and preparation method and application thereof |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101376755B1 (en) | 2007-10-09 | 2014-03-24 | 삼성디스플레이 주식회사 | Display Device |
-
2020
- 2020-02-12 KR KR1020200017189A patent/KR20210102758A/en not_active Application Discontinuation
-
2021
- 2021-02-10 JP JP2021019712A patent/JP7482809B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011029380A (en) | 2009-07-24 | 2011-02-10 | Showa Denko Kk | Liquid curable resin composition for sealing led, light emitting device, light emitting module, and lighting device |
CN105018092A (en) | 2014-04-29 | 2015-11-04 | Tcl集团股份有限公司 | Quantum dot/polymer composite and preparation method and application thereof |
Non-Patent Citations (2)
Title |
---|
Carlos PINA-HERNANDEZ et al.,"Nanoimprinted High-Refractive Index Active Photonic Nanostructures Based on Quantum Dots for Visible Light",Scientific Reports,2017年12月15日,Vol. 7, No. 1,DOI: :10.1038/s41598-017-17732-0 |
Yunhui TANG et al.,"A novel high-refractive index episulfide-thiol polymer for nanoimprinting optical elements",Journal of Materials Chemistry C,2018年,Vol. 6, No. 32,p.8823-8831,DOI: 10.1039/c8tc02029a |
Also Published As
Publication number | Publication date |
---|---|
JP2021128339A (en) | 2021-09-02 |
KR20210102758A (en) | 2021-08-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101878421B1 (en) | Quantum dot dispersion, self emission type photosensitive resin composition comprising the same, color filter and image display device manufactured using the same | |
KR101879016B1 (en) | Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same | |
CN110300791B (en) | Quantum dot dispersion, self-luminous photosensitive resin composition, color filter, and image display device | |
CN110297391B (en) | Light conversion resin composition, light conversion laminated substrate, and image display device | |
JP2020512570A (en) | Quantum dot dispersion, self-luminous photosensitive resin composition, color filter manufactured using the same, and image display device | |
CN111320898B (en) | Light conversion ink composition, light conversion pixel, color filter, and image display device | |
JP2020506442A (en) | Color filter and image display device | |
JP7404200B2 (en) | Photoconversion ink composition, color filter, and image display device | |
KR102153965B1 (en) | Light Conversion Ink Composition, Color Filter and Display Device | |
JP7482809B2 (en) | Quantum dot dispersion and curable composition containing the same | |
CN111320981B (en) | Quantum dot, light-converting ink composition, light-converting pixel, color filter, and image display device | |
TWI811502B (en) | Quantum dot having ligand layer on surface, light converting ink composition comprising quantum dot, light converting pixel, color filter and display device comprising the same | |
JP7404199B2 (en) | Photoconversion ink composition, color filter, and image display device | |
KR20210117047A (en) | An ink composition, a pixel manufactured by using thereof, a color filter comprising the pixel, and a display device comprising the color filter | |
CN107880871B (en) | Quantum dot dispersion, self-luminous photosensitive resin composition and use thereof | |
JP7485630B2 (en) | Light conversion ink composition, color filter, and image display device | |
JP2022112507A (en) | Quantum dot, quantum dot dispersion, photoconversion ink composition, electronic element, color filter, photoconversion laminate substrate, and image display device | |
KR102671678B1 (en) | Light Conversion Ink Composition, Color Filter and Display Device | |
JP7459003B2 (en) | An ink composition, a pixel manufactured using the same, a color filter including the pixel, and an image display device including the color filter | |
JP7487134B2 (en) | Light conversion ink composition, color filter, and image display device | |
JP2021123724A (en) | Quantum dots, quantum dot dispersion containing the same, curable composition, cured film, and image display device | |
JP7020014B2 (en) | Ink composition, light conversion layer and color filter | |
CN115678536A (en) | Quantum dots and applications thereof | |
TW202336208A (en) | Quantum dot, quantum dot dispersion, light converting curable composition, and cured film and display device manufactured by the composition | |
JP2023107228A (en) | Quantum dot, dispersion liquid of quantum dot, photoconversion curable composition, cured film to be formed by use of the composition, and image display apparatus containing the cured film |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230126 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231024 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240124 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20240416 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240430 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7482809 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |