JP7467497B2 - リソグラフィによる遮熱コーティングの保護および強化 - Google Patents
リソグラフィによる遮熱コーティングの保護および強化 Download PDFInfo
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- JP7467497B2 JP7467497B2 JP2021557096A JP2021557096A JP7467497B2 JP 7467497 B2 JP7467497 B2 JP 7467497B2 JP 2021557096 A JP2021557096 A JP 2021557096A JP 2021557096 A JP2021557096 A JP 2021557096A JP 7467497 B2 JP7467497 B2 JP 7467497B2
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- 239000012720 thermal barrier coating Substances 0.000 title description 59
- 230000002708 enhancing effect Effects 0.000 title description 3
- 238000001459 lithography Methods 0.000 title description 3
- 239000000919 ceramic Substances 0.000 claims description 70
- 238000000034 method Methods 0.000 claims description 49
- 238000000576 coating method Methods 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 27
- 239000002002 slurry Substances 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 22
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 14
- 230000008569 process Effects 0.000 claims description 13
- 229910010293 ceramic material Inorganic materials 0.000 claims description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000000206 photolithography Methods 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 2
- 239000010432 diamond Substances 0.000 claims description 2
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- 230000035939 shock Effects 0.000 claims description 2
- 230000007704 transition Effects 0.000 claims description 2
- 238000000233 ultraviolet lithography Methods 0.000 claims description 2
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- 230000008021 deposition Effects 0.000 description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
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- 238000005260 corrosion Methods 0.000 description 4
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910052761 rare earth metal Inorganic materials 0.000 description 4
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- 229910017052 cobalt Inorganic materials 0.000 description 3
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- 238000009792 diffusion process Methods 0.000 description 3
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- 229910052742 iron Inorganic materials 0.000 description 3
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- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 3
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 241000588731 Hafnia Species 0.000 description 2
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 2
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- 239000000292 calcium oxide Substances 0.000 description 2
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- HJGMWXTVGKLUAQ-UHFFFAOYSA-N oxygen(2-);scandium(3+) Chemical compound [O-2].[O-2].[O-2].[Sc+3].[Sc+3] HJGMWXTVGKLUAQ-UHFFFAOYSA-N 0.000 description 2
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- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 2
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- 239000007921 spray Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical group [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
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- 229910015342 Ni2Al3 Inorganic materials 0.000 description 1
- 229910000943 NiAl Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
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- 229910052581 Si3N4 Inorganic materials 0.000 description 1
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- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
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- 238000010285 flame spraying Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
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- 239000007788 liquid Substances 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
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- 238000012986 modification Methods 0.000 description 1
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- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910000907 nickel aluminide Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000009718 spray deposition Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
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- 238000005406 washing Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
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- F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
- F01D11/00—Preventing or minimising internal leakage of working-fluid, e.g. between stages
- F01D11/08—Preventing or minimising internal leakage of working-fluid, e.g. between stages for sealing space between rotor blade tips and stator
- F01D11/12—Preventing or minimising internal leakage of working-fluid, e.g. between stages for sealing space between rotor blade tips and stator using a rubstrip, e.g. erodible. deformable or resiliently-biased part
- F01D11/122—Preventing or minimising internal leakage of working-fluid, e.g. between stages for sealing space between rotor blade tips and stator using a rubstrip, e.g. erodible. deformable or resiliently-biased part with erodable or abradable material
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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- F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
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- F01D5/005—Repairing methods or devices
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
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- F01D5/00—Blades; Blade-carrying members; Heating, heat-insulating, cooling or antivibration means on the blades or the members
- F01D5/12—Blades
- F01D5/28—Selecting particular materials; Particular measures relating thereto; Measures against erosion or corrosion
- F01D5/288—Protective coatings for blades
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
- F23R—GENERATING COMBUSTION PRODUCTS OF HIGH PRESSURE OR HIGH VELOCITY, e.g. GAS-TURBINE COMBUSTION CHAMBERS
- F23R3/00—Continuous combustion chambers using liquid or gaseous fuel
- F23R3/002—Wall structures
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2230/00—Manufacture
- F05D2230/20—Manufacture essentially without removing material
- F05D2230/22—Manufacture essentially without removing material by sintering
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2230/00—Manufacture
- F05D2230/30—Manufacture with deposition of material
- F05D2230/31—Layer deposition
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
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- F05D2250/10—Two-dimensional
- F05D2250/11—Two-dimensional triangular
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
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- F05D2250/18—Two-dimensional patterned
- F05D2250/181—Two-dimensional patterned ridged
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
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- F05D2250/182—Two-dimensional patterned crenellated, notched
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
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- F05D2250/10—Two-dimensional
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- F05D2250/184—Two-dimensional patterned sinusoidal
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2250/00—Geometry
- F05D2250/20—Three-dimensional
- F05D2250/21—Three-dimensional pyramidal
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2250/00—Geometry
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
- F23R—GENERATING COMBUSTION PRODUCTS OF HIGH PRESSURE OR HIGH VELOCITY, e.g. GAS-TURBINE COMBUSTION CHAMBERS
- F23R2900/00—Special features of, or arrangements for continuous combustion chambers; Combustion processes therefor
- F23R2900/00018—Manufacturing combustion chamber liners or subparts
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
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- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Ceramic Engineering (AREA)
- Combustion & Propulsion (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
200 コンポーネント
210 基材層、基材、ベース層
220 中間層
230 結合コーティング、結合コーティング層、結合コート、結合コート層
240 遮熱コーティング(TBC)、遮熱コーティング層、TBCコーティング、TBC層、セラミック遮熱コーティング
250 粗面化層または多孔質層
260 犠牲層、遮熱コーティング層、セラミック層
310 支持部材
311 列
320 シート
330 支持要素
405 パターン
410 隆起部
420 湾曲部分
430 直線部分
440 距離
450 角度
451 基準線
500 コンポーネント
550 応力上昇要素
Claims (19)
- コンポーネント(200)の表面上のコーティング(240)を保護するための方法(100)であって、
前記コンポーネント(200)の少なくとも一部分をセラミックスラリーでコーティングするステップ(110)と、
リソグラフィックプロセスによって前記コンポーネント(200)へと光のパターンを投影し、セラミック層(260)を露光して凝固させるステップ(130)と、
前記セラミックスラリーの未露光部分を前記コンポーネント(200)から除去するステップ(140)と、
前記コンポーネント(200)を加熱して前記セラミック層(260)を焼結するステップ(160)と
を含んでおり、
前記セラミック層(260)は、衝撃力を吸収し、下方に位置する層への正味の衝撃および応力を低減することによって、異物による損傷を抑えるために、複数の面を備えて形成されており、
前記セラミック層(260)は、セラミック材料の複数のシートを支持する複数の支持要素と、前記支持要素よりも大きい複数の巨視的な支持部材(310)をさらに備える、方法(100)。 - 所望の数のセラミック層(260)が得られるまで、前記コーティングするステップ(110)、前記投影するステップ(130)、および前記除去するステップ(140)を繰り返すステップ(150)
をさらに含む、請求項1に記載の方法(100)。 - 前記セラミック層(260)は、複数の平行な前記面を備えて形成されている、請求項1に記載の方法(100)。
- 前記複数の面は、セラミック材料の複数の平行なシート(320)によって形成されている、請求項1に記載の方法(100)。
- 前記シート(320)は、複数の支持要素(330)によって離されて少なくとも部分的に支持されている、請求項1に記載の方法(100)。
- 前記複数の支持要素(330)は、三角形または角錐の形状である、請求項5に記載の方法(100)。
- 前記巨視的な支持部材(310)の各々は、おおむね立方体または菱形の形状を有する、請求項1に記載の方法(100)。
- 前記複数の巨視的な支持部材(310)は、列に配置されており、前記列において、各巨視的な支持部材(310)は、前記セラミック層の厚さ方向および/又は前記セラミック層の表面に平行な方向に隣接する巨視的な支持部材に連結されるように形成される、請求項7に記載の方法(100)。
- 前記列(311)の間の介在領域に、セラミック材料の複数の平行なシート(320)が存在している、請求項8に記載の方法(100)。
- 前記平行なシート(320)は、複数の支持要素(330)によって離されて少なくとも部分的に支持されている、請求項9に記載の方法(100)。
- 前記複数の支持要素(330)は、三角形または角錐の形状である、請求項10に記載の方法(100)。
- 前記面の少なくとも一部分は、下方に位置する基材層(210)と10度~90度未満の間の角度を形成する、請求項1に記載の方法(100)。
- 前記面の少なくとも一部分は、下方に位置する基材層(210)と平行である、請求項1に記載の方法(100)。
- 前記面の第1の部分が、下方に位置する基材層(210)と10度~90度未満の間の角度を形成し、前記面の第2の部分が、下方に位置する基材層(210)と平行である、請求項1に記載の方法(100)。
- 前記コンポーネント(500)は、ガスタービンにおいて使用されるように構成されたブレード、ノズル、燃焼器、つなぎピース、またはシュラウドである、請求項1に記載の方法(100)。
- 前記リソグラフィックプロセスは、
フォトリソグラフィ、光リソグラフィ、または紫外線リソグラフィ
のうちの少なくとも1つである、請求項1に記載の方法(100)。 - 前記リソグラフィックプロセスは、マスクによるプロセスまたはマスクレスプロセスである、請求項16に記載の方法(100)。
- 前記セラミックスラリーは、
ジルコニア、アルミナ、シリカ、炭化物、チッ化物、ケイ酸塩、またはこれらの組み合わせ
のうちの少なくとも1つを含む、請求項1に記載の方法(100)。 - コンポーネント(200)について、コンポーネント(200)の損傷を補修し、あるいはコンポーネント(200)の寿命を延ばすために実行される、請求項1に記載の方法(100)。
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US16/373,701 US10969684B2 (en) | 2019-04-03 | 2019-04-03 | Protection and enhancement of thermal barrier coating by lithography |
US16/373,701 | 2019-04-03 | ||
PCT/US2020/025674 WO2020205713A1 (en) | 2019-04-03 | 2020-03-30 | Protection and enhancement of thermal barrier coating by lithography |
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EP (1) | EP3947774A1 (ja) |
JP (1) | JP7467497B2 (ja) |
KR (1) | KR20210151104A (ja) |
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WO (1) | WO2020205713A1 (ja) |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004530045A (ja) | 2001-04-21 | 2004-09-30 | アイ ティー エヌ ナノベーション ゲーエムベーハー | 結晶ナノ粒子から成る支持層に基づく機能性セラミック層 |
JP2006193828A (ja) | 2004-12-14 | 2006-07-27 | Mitsubishi Heavy Ind Ltd | 遮熱コート材料、遮熱部材、遮熱コーティング部材及びその製造方法 |
JP2010229026A (ja) | 2009-03-27 | 2010-10-14 | Alstom Technology Ltd | 多層熱的保護システム及び多層熱的保護システムを形成する方法 |
JP2016137708A (ja) | 2014-12-22 | 2016-08-04 | ゼネラル・エレクトリック・カンパニイ | セラミックマトリックス複合材料のアブレイダブルコーティングを有する環境バリアコーティング |
JP2018507988A (ja) | 2014-02-25 | 2018-03-22 | シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft | 燃焼タービンの超合金鋳造における冷却通路の形成 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5413591A (en) * | 1977-07-01 | 1979-02-01 | Sumitomo Chem Co Ltd | Photopolymerizable paste composition and formation of inorganic body |
JPS59155038A (ja) * | 1983-02-23 | 1984-09-04 | 東レ株式会社 | 無機コ−テイング膜およびその製造方法 |
US5419971A (en) | 1993-03-03 | 1995-05-30 | General Electric Company | Enhanced thermal barrier coating system |
TW349984B (en) | 1993-09-13 | 1999-01-11 | Starck H C Gmbh Co Kg | Pastes for the coating of substrates, methods for manufacturing them and their use |
US5870956A (en) | 1995-12-21 | 1999-02-16 | Eastman Kodak Company | Zirconia ceramic lithographic printing plate |
US6602766B2 (en) * | 2000-12-07 | 2003-08-05 | Aem, Inc. | Ultraviolet/electron beam forming process for multi-layer electronic components and products thereof |
US6846574B2 (en) | 2001-05-16 | 2005-01-25 | Siemens Westinghouse Power Corporation | Honeycomb structure thermal barrier coating |
US8357454B2 (en) | 2001-08-02 | 2013-01-22 | Siemens Energy, Inc. | Segmented thermal barrier coating |
US20030101587A1 (en) | 2001-10-22 | 2003-06-05 | Rigney Joseph David | Method for replacing a damaged TBC ceramic layer |
US6887528B2 (en) | 2002-12-17 | 2005-05-03 | General Electric Company | High temperature abradable coatings |
WO2004093145A2 (en) * | 2003-04-11 | 2004-10-28 | Paratek Microwave, Inc. | Voltage tunable photodefinable dielectric and method of manufacture therefore |
US20080131611A1 (en) | 2003-07-29 | 2008-06-05 | Hass Derek D | Method for Application of a Thermal Barrier Coating and Resultant Structure Thereof |
US20080264897A1 (en) | 2007-04-30 | 2008-10-30 | Canan Uslu Hardwicke | Turbine component pattern forming method |
JP5767248B2 (ja) | 2010-01-11 | 2015-08-19 | ロールス−ロイス コーポレイション | 環境障壁コーティングに加わる熱又は機械的応力を軽減するための特徴体 |
CN102769091B (zh) * | 2012-05-25 | 2015-11-25 | 瑞声声学科技(深圳)有限公司 | Led封装中的陶瓷挡墙制造方法 |
US9808885B2 (en) | 2013-09-04 | 2017-11-07 | Siemens Energy, Inc. | Method for forming three-dimensional anchoring structures on a surface |
US9289917B2 (en) | 2013-10-01 | 2016-03-22 | General Electric Company | Method for 3-D printing a pattern for the surface of a turbine shroud |
US9249680B2 (en) | 2014-02-25 | 2016-02-02 | Siemens Energy, Inc. | Turbine abradable layer with asymmetric ridges or grooves |
US20180066527A1 (en) | 2015-02-18 | 2018-03-08 | Siemens Aktiengesellschaft | Turbine component thermal barrier coating with vertically aligned, engineered surface and multifurcated groove features |
DE102015120640A1 (de) * | 2015-11-27 | 2017-06-01 | Epcos Ag | Vielschichtbauelement und Verfahren zur Herstellung eines Vielschichtbauelements |
US10023500B2 (en) | 2016-08-30 | 2018-07-17 | General Electric Company | Light-curable ceramic slurries with hybrid binders |
-
2019
- 2019-04-03 US US16/373,701 patent/US10969684B2/en active Active
-
2020
- 2020-03-30 KR KR1020217033529A patent/KR20210151104A/ko unknown
- 2020-03-30 CN CN202080028203.5A patent/CN113661271A/zh active Pending
- 2020-03-30 EP EP20721049.3A patent/EP3947774A1/en active Pending
- 2020-03-30 JP JP2021557096A patent/JP7467497B2/ja active Active
- 2020-03-30 WO PCT/US2020/025674 patent/WO2020205713A1/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004530045A (ja) | 2001-04-21 | 2004-09-30 | アイ ティー エヌ ナノベーション ゲーエムベーハー | 結晶ナノ粒子から成る支持層に基づく機能性セラミック層 |
JP2006193828A (ja) | 2004-12-14 | 2006-07-27 | Mitsubishi Heavy Ind Ltd | 遮熱コート材料、遮熱部材、遮熱コーティング部材及びその製造方法 |
JP2010229026A (ja) | 2009-03-27 | 2010-10-14 | Alstom Technology Ltd | 多層熱的保護システム及び多層熱的保護システムを形成する方法 |
JP2018507988A (ja) | 2014-02-25 | 2018-03-22 | シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft | 燃焼タービンの超合金鋳造における冷却通路の形成 |
JP2016137708A (ja) | 2014-12-22 | 2016-08-04 | ゼネラル・エレクトリック・カンパニイ | セラミックマトリックス複合材料のアブレイダブルコーティングを有する環境バリアコーティング |
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US10969684B2 (en) | 2021-04-06 |
US20200319552A1 (en) | 2020-10-08 |
CN113661271A (zh) | 2021-11-16 |
WO2020205713A1 (en) | 2020-10-08 |
KR20210151104A (ko) | 2021-12-13 |
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