JP7467232B2 - Substrate Processing Equipment - Google Patents

Description

The present disclosure relates to a substrate processing apparatus .

A substrate processing apparatus is known that includes a processing vessel that houses a boat on which substrates are loaded, and an injector that extends vertically along the inner wall of the processing vessel near the processing vessel and has multiple gas holes in the longitudinal direction (see, for example, Patent Document 1). In this substrate processing apparatus, the gas holes are oriented on the inner wall near the processing vessel.

JP 2019-186335 A

This disclosure provides technology that can suppress injector tilt.

A substrate processing apparatus according to one aspect of the present disclosure comprises a processing vessel having an approximately cylindrical shape, an injector extending vertically along the inside of an inner wall of the processing vessel, and a tilt suppression unit that suppresses tilt of the injector , the tilt suppression unit being centered on the central axis of the processing vessel and including a circumferential position to which the injector extends, and including a first partition plate extending radially of the processing vessel, the first partition plate being provided at an upper portion of the processing vessel .

This disclosure makes it possible to suppress injector tilt.

1 is a schematic diagram illustrating an example of a substrate processing apparatus according to a first embodiment; FIG. 2 is an enlarged perspective view of a portion of an upper portion of the substrate processing apparatus of FIG. FIG. 2 is an enlarged cross-sectional view showing a portion of an upper portion of the substrate processing apparatus of FIG. FIG. 4 is an enlarged view of a portion of FIG. FIG. 2 is an enlarged cross-sectional view showing a portion of an upper portion of the substrate processing apparatus of FIG. A diagram showing an example of a horizontal part of an injector. A diagram showing an example of how to install an injector FIG. 13 is a diagram showing an example of a tilt suppression unit; FIG. 13 is a diagram showing another example of a tilt suppressing portion; FIG. 13 is a diagram showing yet another example of a tilt suppressing portion; FIG. 13 is a schematic diagram illustrating an example of a substrate processing apparatus according to a second embodiment; FIG. 12 is an enlarged perspective view of a portion of the upper part of the substrate processing apparatus of FIG. 11 . FIG. 1 is a perspective view showing a portion of the upper part of the inner tube; A perspective view showing a portion of the upper part of the injector. Cross-sectional view showing the relative positions of the injector and inner tube

Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the attached drawings. In all the attached drawings, the same or corresponding members or parts are denoted by the same or corresponding reference numerals, and duplicate descriptions will be omitted.

First Embodiment
An example of a substrate processing apparatus according to a first embodiment will be described with reference to Figures 1 to 7. Figure 1 is a schematic diagram showing an example of a substrate processing apparatus according to a first embodiment. Figure 2 is an enlarged perspective view of a part of an upper portion of the substrate processing apparatus shown in Figure 1. Figure 3 is an enlarged cross-sectional view of a part of an upper portion of the substrate processing apparatus shown in Figure 1, showing a cross section cut along a horizontal plane passing through an inner tube, above the height at which the injectors are disposed. Note that the tilt suppression unit is not shown in Figure 1.

The substrate processing apparatus 1 includes a processing vessel 10, a gas supply unit 20, an exhaust unit 30, a heating unit 40, a tilt suppression unit 100, and a control unit 90.

The processing vessel 10 contains a boat (not shown). The boat holds a plurality of substrates at a predetermined interval in the height direction. The substrates may be, for example, semiconductor wafers. The processing vessel 10 has an inner tube 11 and an outer tube 12. The inner tube 11 is also called an inner tube, and is formed in a generally cylindrical shape with a ceiling and an open lower end. The inner tube 11 has a ceiling portion 11a formed, for example, flat. The outer tube 12 is also called an outer tube, and is formed in a generally cylindrical shape with a ceiling and an open lower end that covers the outside of the inner tube 11. In other words, the upper part of the outer tube 12 is closed. The inner tube 11 and the outer tube 12 are arranged coaxially to form a double tube structure. The inner tube 11 and the outer tube 12 are formed of a heat-resistant material such as quartz.

On one side of the inner tube 11, an injector housing 13 is formed along its longitudinal direction (vertical direction) to house an injector. As shown in FIG. 3, for example, the injector housing 13 is formed by forming a convex portion 14 by protruding a part of the side wall of the inner tube 11 outward, and the inside of the convex portion 14 is formed as the injector housing 13. A rectangular opening (not shown) is formed along the longitudinal direction (vertical direction) on the side wall of the inner tube 11 opposite the injector housing 13. The opening is a gas exhaust port formed so that gas inside the inner tube 11 can be exhausted. The vertical length of the opening is the same as the vertical length of the boat, or is formed so as to extend vertically longer than the length of the boat.

A gas outlet 15 is formed in the side wall of the outer tube 12. A lid (not shown) is attached to an opening 16 at the lower end of the outer tube 12 via a sealing member such as an O-ring. The lid can open and close the opening 16, and hermetically closes and seals the opening 16.

The gas supply unit 20 has multiple gas supply sources (not shown) and multiple (e.g., seven) injectors 21 to 27.

The multiple gas supply sources supply various process gases to the multiple injectors 21-27. The various process gases include, for example, a film forming gas for forming a film, an etching gas for etching and removing the film, a cleaning gas for cleaning the inside of the process vessel 10, and a purge gas for purging the inside of the process vessel 10.

The injectors 21-27 are arranged at intervals from one another in a row along the circumferential direction in the injector housing 13 inside the inner wall of the inner tube 11. Each injector 21-27 is formed of a quartz tube with a circular cross section, and discharges various process gases supplied from multiple gas supply sources into the inner tube 11. Each injector 21-27 is arranged inside the inner wall of the inner tube 11 along the longitudinal direction (vertical direction) of the inner tube 11. Each injector 21-27 is bent in an L-shape at the bottom and extends through the side wall of the outer tube 12 to the corresponding gas supply source. Each injector 21-27 is folded back in a U-shape at the top and then extends downward. In other words, each injector 21-27 is configured as a folded-back injector. Hereinafter, the portions of the injectors 21-27 that are arranged along the longitudinal direction of the inner tube 11 will be referred to as the introduction portions 21a-27a, and the portions that extend downward after being folded back will be referred to as the discharge portions 21b-27b. In addition, because the introduction portions 21a-27a and the discharge portions 21b-27b are arranged vertically along the longitudinal direction of the inner tube 11, the introduction portions 21a-27a and the discharge portions 21b-27b will also be referred to as the vertical portions. In addition, the portions that connect the introduction portions 21a-27a and the discharge portions 21b-27b will be referred to as the bent portions 21c-27c, and the portions that are arranged horizontally and pass through the outer tube 12 will be referred to as the horizontal portions 21d-27d.

As shown in Figures 1 and 2, the injectors 21 to 27 include injectors with different vertical lengths. However, the vertical length of each of the injectors 21 to 27 is not limited to the example shown in Figures 1 and 2.

The injectors 21-23, 27 have the same vertical length for the introduction sections 21a-23a, 27a. The injectors 21-23, 27 also have the same vertical length for the discharge sections 21b-23b, 27b. The vertical length of the discharge sections 21b-23b, 27b is the same as the vertical length of the boat, or is formed to extend vertically longer than the length of the boat. The discharge sections 21b-23b, 27b have multiple gas holes at predetermined intervals along the longitudinal direction, and are configured to supply various process gases to all areas of the boat in the vertical direction.

The injectors 24-26 have inlet portions 24a-26a whose vertical lengths are longer in that order, and outlet portions 24b-26b are disposed at the bottom, center, and top of the processing vessel 10, respectively. The outlet portions 24b-26b have a plurality of gas holes at predetermined intervals along the longitudinal direction, and are configured to supply various processing gases to the bottom, center, and top of the processing vessel 10, respectively. As shown in FIG. 2, the injectors 24 and 25 are provided with dummy tubes 24e and 25e that extend upward from the tops of the bent portions 24c and 25c, respectively. The height position of the upper ends of the dummy tubes 24e and 25e may be approximately the same as the height position of the upper end of the injector 26, for example.

The multiple gas holes are oriented toward the inner wall side near the inner tube 11. Each of the discharge sections 21b to 27b discharges various process gases horizontally toward the inner wall side near the inner tube 11 through the respective gas holes. After being reflected by the inner wall near the inner tube 11, the various discharged process gases are supplied while diffusing horizontally toward the center side (substrate side) of the inner tube 11.

Here, referring to FIG. 4, the protrusion 22f provided on the injector 22 will be described. FIG. 4 is an enlarged view of a portion of FIG. 3. As shown in FIG. 4, the protrusion 22f is provided on the inner wall side near the inner tube 11 at the bent portion 22c of the injector 22. However, the protrusion 22f may be provided, for example, on the inlet portion 22a, on the outlet portion 22b, or on both the inlet portion 22a and the outlet portion 22b. The protrusion 22f has a hemispherical shape protruding from the surface of the injector 22 and contacts the inner wall near the inner tube 11. For example, the injector 22 is formed such that the bending angle of the L-shaped bent portion at the lower end (the connection portion between the inlet portion 22a and the horizontal portion 22d) is slightly smaller than 90 degrees (acute angle). The injector 22 is attached to the inner tube 11 by fixing the horizontal portion 22d with a nut or the like while pressing the protruding portion 22f against the inner wall near the inner tube 11. In this way, the injector 22 is fixed at two points, so that the injector 22 can be prevented from tilting. Furthermore, the provision of the protruding portion 22f allows the injector 22 and the inner tube 11 to come into contact at a point, so that the injector 22 and the inner tube 11 can be prevented from sticking together due to film formation. On the other hand, if the protruding portion 22f is not provided, the injector 22 and the inner tube 11 will come into contact with each other in a line or surface, and the injector 22 may stick to the inner tube 11 due to film formation. Note that the injectors 21, 23 to 27 are also provided with protruding portions in the same manner as the injector 21.

Here, referring to FIG. 5, the orientation angle of the gas hole 22h opened in the discharge portion 22b of the injector 22 will be described. FIG. 5 is an enlarged cross-sectional view of a part of the upper portion of the substrate processing apparatus 1 of FIG. 1, showing a cross section cut along a horizontal plane passing through the injector 22. As shown in FIG. 5, the gas hole 22h is arranged at an angle θ on the introduction portion 22a side with respect to a radial line L4 passing through the center of the inner tube 11 and the center C of the discharge portion 22b of the injector 22 in a plan view of the substrate processing apparatus 1. As a result, various processing gases discharged horizontally through the gas hole 22h are reflected by the inner wall of the inner tube 11 and then supplied while diffusing horizontally toward the center side of the inner tube 11. In addition, various processing gases discharged horizontally through the gas hole 22h are reflected by the inner wall of the inner tube 11 and then further reflected by the injector 22 itself and the adjacent injectors 21, 23, etc., and then supplied while diffusing horizontally toward the center side of the inner tube 11. The angle θ may be, for example, in the range of 0 degrees to 60 degrees. In addition, the gas holes 22h may be arranged at an angle on the opposite side to the inlet portion 22a with respect to the radial line L4 in a plan view of the substrate processing apparatus 1. In this case, the angle may be in the range of 0 degrees to 60 degrees, for example. The gas holes provided in the discharge portions 21b, 23b to 26b of the injectors 21, 23 to 26 may also be oriented at the same angle as the gas holes 22h.

Here, the shape of the horizontal portion 22d of the injector 22 will be described with reference to Figures 6 and 7. Figure 6 is a diagram showing an example of the horizontal portion 22d of the injector 22. Figure 6(a) is a perspective view showing the horizontal portion 22d, and Figure 6(b) is a cross-sectional view showing the horizontal portion 22d. Figure 7 is a diagram showing an example of a method of attaching the injector 22. As shown in Figure 6(b), the injector 22 is attached to the outer tube 12 by inserting the horizontal portion 22d into a substantially cylindrical through hole 17 formed in the outer tube 12. At this time, as shown in Figure 7, the horizontal portion 22d is inserted into the through hole 17 while swinging the horizontal portion 22d from the center side of the inner tube 11 to the inner wall side with the upper part of the introduction portion 22a of the injector 22 as the center of rotation. As shown in Figure 6(a), the injector 22 includes a tip portion 22g processed into a D-cut shape with the upper side of the outer shape being a straight line. This makes it easier to insert the horizontal part 22d into the through hole 17 when the horizontal part 22d is swung from the center side of the inner tube 11 to the inner wall side with the upper part of the introduction part 22a as the center of rotation. In other words, it becomes easier to attach the injector 22 to the processing vessel 10.

The exhaust section 30 has an exhaust passage 31, a pressure adjustment valve 32, and a vacuum pump 33. The exhaust passage 31 is connected to the gas outlet 15. The pressure adjustment valve 32 and the vacuum pump 33 are interposed in the exhaust passage 31, and exhaust the gas in the inner tube 11 that is discharged from the opening through the space between the inner tube 11 and the outer tube 12.

The heating unit 40 heats the substrate housed in the processing vessel 10. The heating unit 40 is formed, for example, on the outer periphery of the outer tube 12 in a substantially cylindrical shape so as to cover the outer tube 12. From the viewpoint of being able to control the temperature independently in the vertical direction, it is preferable that the heating unit 40 includes multiple heaters divided in the vertical direction. However, the heating unit 40 may be composed of a single heater that is not divided.

When the injectors 21 to 27 are tilted, the tilt suppression unit 100 comes into contact with the injectors 21 to 27 to suppress the injectors 21 to 27 from tilting. Details of the tilt suppression unit 100 will be described later.

The control unit 90 controls the overall operation of the substrate processing apparatus 1. The control unit 90 has a CPU (Central Processing Unit), a ROM (Read Only Memory), and a RAM (Random Access Memory). The CPU executes the desired heat treatment according to a recipe stored in a storage area such as the RAM. The recipe sets control information for the apparatus with respect to the process conditions. The control information may be, for example, gas flow rate, pressure, temperature, and process time. The recipe and the program used by the control unit 90 may be stored, for example, in a hard disk or semiconductor memory. The recipe, etc. may be set in a predetermined position and read out while being stored in a portable computer-readable storage medium such as a CD-ROM or DVD. The control unit 90 may be provided separately from the substrate processing apparatus 1.

With reference to Figures 2 to 5 and Figure 8, an example of a tilt suppression unit that is provided in the substrate processing apparatus 1 and suppresses the tilt of the injectors 21 to 27 will be described. Figure 8 is a diagram showing an example of a tilt suppression unit. Figure 8(a) is a diagram showing the tilt suppression unit as viewed horizontally from the center side of the inner tube 11, Figure 8(b) is a diagram showing the tilt suppression unit as viewed from below the center side of the inner tube 11, and Figure 8(c) is a cross-sectional view cut along a horizontal plane passing through the tilt suppression unit. Note that Figures 8(a) to 8(c) show a state in which the injectors 21 to 27 are not attached to the processing vessel 10.

The tilt suppression unit 100 suppresses the tilt of the injectors 21 to 27. The tilt suppression unit 100 includes a first partition plate 110 and a second partition plate 120.

The first partition plate 110 is provided in the injector housing 13 with a gap G1 between it and the upper part of the inner tube 11, for example, the ceiling part 11a of the inner tube 11. The first partition plate 110 is provided around the central axis of the inner tube 11 and includes the circumferential positions where the injectors 21 to 27 are extended. The first partition plate 110 is formed in a flat plate shape extending from the inner wall near the inner tube 11 toward the center of the inner tube 11. The first partition plate 110 is formed from the same material as the inner tube 11, for example, a heat-resistant material such as quartz, and one end is welded and fixed to the inner wall near the inner tube 11. A plurality of first partition plates 110 are provided in the circumferential direction of the inner tube 11 so as to sandwich the injectors 21 to 27. In the example of FIG. 8, six first partition plates 110 are provided.

The second partition plate 120 is provided so as to sandwich the injectors 21-27 between itself and the inner wall of the inner tube 11. The second partition plate 120 is formed as a curved plate extending from one end of the injector housing portion 13 to the other end in the circumferential direction of the inner tube 11. The second partition plate 120 is formed from the same material as the inner tube 11, for example, a heat-resistant material such as quartz, and is formed integrally with the first partition plate 110. However, the second partition plate 120 may be formed separately from the first partition plate 110 and fixed to the first partition plate 110 by welding.

As described above, according to the substrate processing apparatus 1 of the first embodiment, the upper portions of the injectors 21-27 are surrounded by the inner wall of the inner tube 11 (protrusion 14), the first partition plate 110, and the second partition plate 120. As a result, when the injectors 21-27 tilt, the injectors 21-27 come into contact with at least a portion of the inner wall of the inner tube 11 (protrusion 14), the first partition plate 110, and the second partition plate 120. As a result, the tilt of the injectors 21-27 can be suppressed.

With reference to Figure 9, another example of a tilt suppression unit provided in the substrate processing apparatus 1 to suppress the tilt of the injectors 21-27 will be described. Figure 9 is a diagram showing another example of a tilt suppression unit. Figure 9(a) is a diagram showing the tilt suppression unit as viewed horizontally from the center side of the inner tube 11, Figure 9(b) is a diagram showing the tilt suppression unit as viewed from below the center side of the inner tube 11, and Figure 9(c) is a cross-sectional view cut along a horizontal plane passing through the tilt suppression unit. Note that Figures 9(a) to 9(c) show a state in which the injectors 21-27 are not attached to the processing vessel 10.

The tilt suppression unit 100A suppresses the tilt of the injectors 21 to 27. The tilt suppression unit 100A includes a first partition plate 110A, a second partition plate 120A, and a third partition plate 130A.

The first partition plate 110A is provided in the injector housing 13 with a gap G2 between it and the upper part of the inner tube 11, for example, the ceiling part 11a of the inner tube 11. The first partition plate 110A is provided around the central axis of the inner tube 11 and includes the circumferential positions where the injectors 21 to 27 are extended. The first partition plate 110A is formed in a flat plate shape extending from the inner wall near the inner tube 11 toward the center of the inner tube 11. The first partition plate 110A is formed from the same material as the inner tube 11, for example, a heat-resistant material such as quartz, and one end is welded and fixed to the inner wall near the inner tube 11. A plurality of first partition plates 110A are provided in the circumferential direction of the inner tube 11 so as to sandwich the injectors 21 to 27. In the example of FIG. 9, six first partition plates 110A are provided.

The second partition plate 120A is provided so as to sandwich the injectors 21 to 27 between itself and the inner wall of the inner tube 11. The second partition plate 120A is formed in a flat plate shape extending from the other end of the first partition plate 110A along the circumferential direction of the inner tube 11. However, the second partition plate 120A may be formed in a curved plate shape. The second partition plate 120A is formed from the same material as the inner tube 11, for example, a heat-resistant material such as quartz, and is formed integrally with the first partition plate 110A. However, the second partition plate 120A may be formed separately from the first partition plate 110A and fixed to the first partition plate 110A by welding.

The third partition plate 130A is provided on one of the first partition plates 110A that are provided at intervals along the circumferential direction of the inner tube 11. The third partition plate 130A is provided so as to sandwich the injectors 21 to 27 between the third partition plate 130A and the inner wall of the inner tube 11. The third partition plate 130A is formed in a flat plate shape extending from the other end of the first partition plate 110A along the circumferential direction of the inner tube 11 in the opposite direction to the second partition plate 120A. However, the third partition plate 130A may be formed in a curved plate shape. The third partition plate 130A is formed of the same material as the inner tube 11, for example, a heat-resistant material such as quartz, and is formed integrally with the first partition plate 110A and the second partition plate 120A. However, the third partition plate 130A may be formed separately from the first partition plate 110A and the second partition plate 120A and may be welded to the first partition plate 110A and the second partition plate 120A.

As described above, when the substrate processing apparatus 1 is equipped with the tilt suppression unit 100A, the upper portions of the injectors 21-27 are surrounded by the inner wall of the inner tube 11 (protrusion 14), the first partition plate 110A, the second partition plate 120A, and the third partition plate 130A. As a result, when the injectors 21-27 tilt, the injectors 21-27 come into contact with at least a portion of the inner wall of the inner tube 11 (protrusion 14), the first partition plate 110A, the second partition plate 120A, and the third partition plate 130A. As a result, the tilt of the injectors 21-27 can be suppressed.

Referring to FIG. 10, we will explain yet another example of a tilt suppression unit that is provided in the substrate processing apparatus 1 and suppresses the tilt of the injectors 21-27. FIG. 10 is a diagram showing yet another example of a tilt suppression unit. FIG. 10(a) is a diagram showing the tilt suppression unit as viewed horizontally from the center side of the inner tube 11, FIG. 10(b) is a diagram showing the tilt suppression unit as viewed from below the center side of the inner tube 11, and FIG. 10(c) is a cross-sectional view cut along a horizontal plane passing through the tilt suppression unit. Note that FIGS. 10(a) to 10(c) show a state in which the injectors 21-27 are not attached to the processing vessel 10.

The tilt suppression unit 100B suppresses the tilt of the injectors 21 to 27. The tilt suppression unit 100B includes a first partition plate 110B and a second partition plate 120B.

The first partition plate 110B is fixed to the ceiling 11a of the inner tube 11 in the injector housing 13. The first partition plate 110B is provided around the central axis of the inner tube 11 and includes the circumferential positions where the injectors 21 to 27 are extended. The first partition plate 110B is formed in a flat plate shape extending toward the center of the inner tube 11 with a gap G3 from the inner wall near the inner tube 11. The first partition plate 110B is formed from the same material as the inner tube 11, for example, a heat-resistant material such as quartz, and is welded and fixed to the ceiling 11a of the inner tube 11. A plurality of first partition plates 110B are provided in the circumferential direction of the inner tube 11 so as to sandwich the injectors 21 to 27. In the example of FIG. 10, six first partition plates 110B are provided.

The second partition plate 120B is provided so as to sandwich the injectors 21-27 between itself and the inner wall of the inner tube 11. The second partition plate 120B is welded and fixed to the ceiling portion 11a of the inner tube 11. The second partition plate 120B is formed in a curved plate shape extending from one end to the other end of the injector housing portion 13 in the circumferential direction of the inner tube 11. The second partition plate 120B is formed from the same material as the inner tube 11, for example, a heat-resistant material such as quartz, and is formed integrally with the first partition plate 110B. However, the second partition plate 120B may be formed separately from the first partition plate 110B and welded and fixed to the first partition plate 110B.

As described above, when the substrate processing apparatus 1 is equipped with the tilt suppression unit 100B, the upper portions of the injectors 21-27 are surrounded by the inner wall of the inner tube 11 (convex portion 14), the first partition plate 110B, and the second partition plate 120B. As a result, when the injectors 21-27 tilt, the injectors 21-27 come into contact with at least a portion of the inner wall of the inner tube 11 (convex portion 14), the first partition plate 110B, and the second partition plate 120B. As a result, the tilt of the injectors 21-27 can be suppressed.

Second Embodiment
An example of a substrate processing apparatus according to the second embodiment will be described with reference to Figs. 11 to 15. Fig. 11 is a schematic diagram showing an example of a substrate processing apparatus according to the second embodiment. Fig. 12 is an enlarged perspective view showing a part of the upper part of the substrate processing apparatus shown in Fig. 11, and is a view of the tilt suppression unit as viewed from below the center side of the inner tube 11. Fig. 13 is a perspective view showing a part of the upper part of the inner tube, and is a view of the inner tube as viewed obliquely from above. Fig. 14 is a perspective view showing a part of the upper part of the injector, and is a view of the injector as viewed obliquely from above. Fig. 15 is a cross-sectional view showing the positional relationship between the injector and the inner tube.

The substrate processing apparatus 1M of the second embodiment differs from the substrate processing apparatus 1 of the first embodiment in that it is equipped with a tilt suppression unit 100M instead of the tilt suppression unit 100 in the substrate processing apparatus 1 of the first embodiment. The following will focus on the differences from the substrate processing apparatus 1 of the first embodiment.

The substrate processing apparatus 1M includes a processing vessel 10, a gas supply unit 20, an exhaust unit 30, a heating unit 40, a tilt suppression unit 100M, and a control unit 90. The processing vessel 10, the gas supply unit 20, the exhaust unit 30, the heating unit 40, and the control unit 90 may have the same configuration as in the first embodiment.

The tilt suppression portion 100M suppresses the tilt of the injectors 21 to 27. The tilt suppression portion 100M includes an insertion hole 160 and a protrusion portion 170.

The through holes 160 are formed in a row along the circumferential direction at intervals in the portion of the ceiling portion 11a of the inner tube 11 where the injector housing portion 13 is formed. The through holes 160 have a shape and size that allows the protrusion 170 to pass through. The through holes 160 may be, for example, a hole that is slightly larger than the outer shape of the protrusion 170 in a plan view. As a result, when the protrusion 170 is inserted into the through holes 160, the movement of the protrusion 170 is restricted by the through holes 160. The positions at which the through holes 160 are formed are determined in accordance with the positions of the protrusions 170 provided on the upper portions of the injectors 21 to 27.

The protrusions 170 extend upward from the tops of each of the bent portions 21c to 27c. The protrusions 170 have a shape of, for example, a round bar, a square bar, or a hollow U-shape, and their upper ends are inserted into insertion holes 160 formed in the ceiling portion 11a of the inner tube 11, and extend to a position higher than the ceiling portion 11a. The protrusions 170 are made of the same material as the injectors 21 to 27, for example, a heat-resistant material such as quartz, and are fixed, for example, by welding, to the tops of the bent portions 21c to 27c of the injectors 21 to 27.

As described above, according to the second embodiment of the substrate processing apparatus 1M, a protrusion 170 is provided on the top of each of the injectors 21 to 27, and the protrusion 170 is inserted into an insertion hole 160 formed in the ceiling portion 11a of the inner tube 11. In this way, if the injectors 21 to 27 tilt, the movement of the protrusion 170 is restricted by the insertion hole 160. As a result, the tilt of the injectors 21 to 27 can be suppressed.

The embodiments disclosed herein should be considered in all respects as illustrative and not restrictive. The above-described embodiments may be omitted, substituted, or modified in various ways without departing from the scope and spirit of the appended claims.

In the above embodiment, the injectors 21 to 27 are folded injectors, but the present disclosure is not limited to this. For example, some or all of the injectors 21 to 27 may be non-folded injectors that are not folded at the top.

In the above embodiment, the substrate processing apparatus 1 having seven injectors 21 to 27 has been described as an example, but the present disclosure is not limited to this. For example, the substrate processing apparatus may have only one injector. Also, the substrate processing apparatus may have two to six, or eight or more injectors.

REFERENCE SIGNS LIST 1, 1M Substrate processing apparatus 10 Processing vessel 11 Inner tube 11a Ceiling portion 17 Through hole 21-27 Injector 21d-27d Horizontal portion 22f Projection portion 22g Tip portion 22h Gas hole 100, 100A, 100B, 100M Tilt suppression portion 110, 110A, 110B First partition plate 120, 120A, 120B Second partition plate 160 Insertion hole 170 Projection portion

Claims (15)

A processing vessel having a substantially cylindrical shape;
an injector extending vertically along the inside of the inner wall of the processing vessel;
a tilt suppression portion that suppresses tilt of the injector;
Equipped with
the tilt suppression unit includes a first partition plate that is provided around a central axis of the processing vessel and includes a circumferential position to which the injector is extended, and that extends in a radial direction of the processing vessel;
The first partition plate is provided at an upper portion of the processing vessel.
Substrate processing equipment. The first partition plate is fixed to the inside of the inner wall of the processing vessel.
The substrate processing apparatus according to claim 1 . A processing vessel having a substantially cylindrical shape;
an injector extending vertically along the inside of the inner wall of the processing vessel;
a tilt suppression portion that suppresses tilt of the injector;
Equipped with
the tilt suppression unit includes a first partition plate that is provided around a central axis of the processing vessel and includes a circumferential position to which the injector is extended, and that extends in a radial direction of the processing vessel;
The first partition plate is fixed to a ceiling of the processing vessel.
Substrate processing equipment. A processing vessel having a substantially cylindrical shape;
an injector extending vertically along the inside of the inner wall of the processing vessel;
a tilt suppression portion that suppresses tilt of the injector;
Equipped with
The tilt suppression portion is
a first partition plate that is provided around a central axis of the processing vessel and includes a circumferential position to which the injector is extended, and that extends in a radial direction of the processing vessel;
a second partition plate extending in a circumferential direction of the processing vessel and disposed between the second partition plate and an inner wall of the processing vessel and the injector;
including,
Substrate processing equipment. the tilt suppression unit is provided to sandwich the injector between itself and an inner wall of the processing vessel, and includes a second partition plate extending in a circumferential direction of the processing vessel.
The substrate processing apparatus according to claim 1 . The second partition plate is integrally formed with the first partition plate.
The substrate processing apparatus according to claim 4 . The second partition plate is fixed to a ceiling of the processing vessel.
The substrate processing apparatus according to claim 4 . The injector includes a folded-back injector that extends upward, is folded back at an upper portion, and then extends downward.
The substrate processing apparatus according to claim 1 . A processing vessel having a substantially cylindrical shape;
an injector extending vertically along the inside of the inner wall of the processing vessel;
a tilt suppression portion that suppresses tilt of the injector;
Equipped with
the tilt suppression portion is formed in a ceiling portion of the processing vessel and includes an insertion hole through which an upper portion of the injector can be inserted.
Substrate processing equipment. The injector includes a folded-back injector that extends upward, is folded back at an upper portion, and then extends downward,
the tilt suppression portion includes a protrusion portion that extends upward from a folded-back portion of the folded-back type injector and is inserted into the insertion hole,
The substrate processing apparatus according to claim 9 . A processing vessel having a substantially cylindrical shape;
an injector extending vertically along the inside of the inner wall of the processing vessel;
a tilt suppression portion that suppresses tilt of the injector;
Equipped with
the injector is provided with a protruding portion protruding toward an inner wall of the processing vessel in a longitudinal direction of the injector;
Substrate processing equipment. the injector is provided with a protruding portion protruding toward an inner wall of the processing vessel in a longitudinal direction of the injector;
The substrate processing apparatus according to claim 1 . The injector is formed with a plurality of gas holes extending along a longitudinal direction thereof,
The gas holes are oriented toward an inner wall side near the processing vessel.
The substrate processing apparatus according to claim 1 . A processing vessel having a substantially cylindrical shape;
an injector extending vertically along the inside of the inner wall of the processing vessel;
a tilt suppression portion that suppresses tilt of the injector;
Equipped with
the injector has a horizontal portion disposed horizontally at a lower portion thereof and penetrating the processing vessel;
The horizontal portion includes a tip portion processed into a D-cut shape with an upper side of the outer shape being a straight line,
Substrate processing equipment. the injector has a horizontal portion disposed horizontally at a lower portion thereof and penetrating the processing vessel;
The horizontal portion includes a tip portion processed into a D-cut shape with an upper side of the outer shape being a straight line,
The substrate processing apparatus according to claim 1 .

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