JP7454265B2 - マクロ検査システム、装置および方法 - Google Patents
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Description
本出願は、2018年10月11日出願の米国特許仮出願第62/744,478号の利益を主張する2019年1月30日出願の米国特許出願第16/262,017号の優先権を主張し、これらの内容全体が、参照により本明細書に組み込まれる。
Claims (12)
- 検査用の試料を保持するように構成された台と、
前記台上に配置され、前記台の少なくとも一部分を包含する視野を有する撮像デバイスと、
前記撮像デバイスに統合され、前記台の少なくとも前記一部分を包含する視野を有するレンズと、
前記台上方の可動プラットフォームに配置された複数の光源と、
前記撮像デバイス、前記台、前記可動プラットフォーム、および前記レンズのそれぞれに結合され、前記台の位置、前記可動プラットフォームの高さ、および前記レンズの焦点を制御するように構成されている、制御モジュールと
を備え、前記光源からの照明が前記試料で反射され前記レンズを透過し、前記撮像デバイスに到達する、検査装置であって、前記制御モジュールが、
前記撮像デバイスから、前記台に保持された試料の少なくとも部分的な視像に対応する画像データを、受け取ることと、
前記試料の照明プロファイルを自動的に選択することと、
前記照明プロファイルに基づき、前記複数の光源の各光源の、輝度、色、位置の群から選ばれた動作を自動的に調整すること、を含む動作を実施するように構成され、
前記試料の照明プロファイルを自動的に選択することが、
前記試料の物理的特性及び機械的特性を含む検出された属性に基づき、前記画像データを分析して、前記台に保持された前記試料に対応する試料分類を決定することと、
データベースに記憶された複数の照明プロファイルから、前記試料分類に基づき特定された前記照明プロファイルを特定することにより実施されるものである、
検査装置。 - 前記動作はさらに、
前記照明プロファイルに基づき、前記制御モジュールを使用して、前記台の前記位置を自動的に調整することを含む、請求項1に記載の検査装置。 - 前記動作はさらに、
前記照明プロファイルに基づき、前記制御モジュールを使用して、前記可動プラットフォームの前記高さを自動的に調整することを含む、請求項1に記載の検査装置。 - 前記動作はさらに、
前記照明プロファイルに基づき、前記制御モジュールを使用して、前記レンズの前記焦点を自動的に調整することを含む、請求項1に記載の検査装置。 - 前記動作はさらに、
前記照明プロファイルに基づき、前記可動プラットフォームに配置された前記複数の光源のうちの少なくとも1つにおける前記試料に対する照明角度を、自動的に調整することを含む、請求項1に記載の検査装置。 - 前記撮像デバイスが、前記台の前記一部分を前記レンズを介して見るように構成される、請求項1に記載の検査装置。
- 検査装置によって得られる照明特性を自動的に調整するための、コンピュータで実施される方法であって、
撮像デバイスから画像データを受け取るステップであって、前記画像データが、前記検査装置の台に保持され、複数の光源により照明された、試料の少なくとも部分的な視像に対応する、ステップと、
照明プロファイルを自動的に選択するステップと、
前記照明プロファイルに基づき、前記複数の光源の各光源の、輝度、色、位置の群から選ばれた動作を自動的に調整するステップと、を含み、
前記照明プロファイルを自動的に選択するステップは、
前記試料の物理的特性及び機械的特性を含む検出された属性に基づき、前記画像データを分析して、前記台に保持された前記試料に対応する試料分類を決定することと、
データベースに記憶された複数の照明プロファイルから、前記試料分類に基づき特定された前記照明プロファイルを特定することにより実施される、
コンピュータで実施される方法。 - 前記照明プロファイルに基づいて、前記台の位置を自動的に調整するステップをさらに含む、請求項7に記載のコンピュータで実施される方法。
- 前記照明プロファイルに基づいて、前記台の上方の1つまたは複数の光源の高さを自動的に調整するステップをさらに含む、請求項7に記載のコンピュータで実施される方法。
- 前記照明プロファイルに基づいて、前記試料を見るために使用されるレンズの焦点を自動的に調整するステップをさらに含む、請求項7に記載のコンピュータで実施される方法。
- 前記照明プロファイルに基づいて、前記台の上方に配置された前記複数の光源のうちの少なくとも1つにおける前記試料に対する照明角度を、自動的に調整するステップをさらに含む、請求項7に記載のコンピュータで実施される方法。
- 前記試料分類を用いてプロファイルデータベースを参照するステップと、
前記照明プロファイルを受け取るステップとをさらに含み、前記照明プロファイルが前記プロファイルデータベース中の前記試料分類に関連付けられている、請求項7に記載のコンピュータで実施される方法。
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US16/262,017 US10545096B1 (en) | 2018-10-11 | 2019-01-30 | Marco inspection systems, apparatus and methods |
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US20200364442A1 (en) * | 2019-05-15 | 2020-11-19 | Getac Technology Corporation | System for detecting surface pattern of object and artificial neural network-based method for detecting surface pattern of object |
US10915992B1 (en) | 2019-08-07 | 2021-02-09 | Nanotronics Imaging, Inc. | System, method and apparatus for macroscopic inspection of reflective specimens |
US11593919B2 (en) | 2019-08-07 | 2023-02-28 | Nanotronics Imaging, Inc. | System, method and apparatus for macroscopic inspection of reflective specimens |
CN111054638A (zh) * | 2019-11-27 | 2020-04-24 | 奥特斯科技(重庆)有限公司 | 制造部件承载件的方法及在制造期间操控面板的设备 |
US11099119B1 (en) | 2020-07-28 | 2021-08-24 | General Inspection, Llc | Inspection system for manufactured components |
EP4012475A1 (de) * | 2020-12-14 | 2022-06-15 | BST eltromat International GmbH | Vorrichtung zum erfassen von bildern einer oberfläche |
KR102421127B1 (ko) * | 2021-12-23 | 2022-07-15 | 주식회사 뷰온 | 에어리어 카메라가 구비된 검사 장치 및 에어리어 카메라가 구비된 검사 장치를 이용한 검사 방법 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008122198A (ja) | 2006-11-10 | 2008-05-29 | Omron Corp | 視覚センサおよび照明設定方法 |
JP2012083282A (ja) | 2010-10-14 | 2012-04-26 | Ail Kk | 検査装置用照明システム |
JP2012215394A (ja) | 2011-03-31 | 2012-11-08 | Dainippon Screen Mfg Co Ltd | 三次元計測装置および三次元計測方法 |
JP2016020867A (ja) | 2014-07-15 | 2016-02-04 | 株式会社日立ハイテクノロジーズ | 欠陥観察方法及びその装置 |
JP2016050864A (ja) | 2014-09-01 | 2016-04-11 | 三菱電機株式会社 | 半田付外観検査装置 |
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---|---|---|---|---|
US4647764A (en) * | 1984-02-22 | 1987-03-03 | Kla Instruments Corporation | Rotational and focusing apparatus for turret mounted lenses |
EP0459489B1 (en) * | 1990-05-30 | 1997-01-22 | Dainippon Screen Mfg. Co., Ltd. | Method of reading optical image of inspected surface and image reading system employable therein |
US5172005A (en) | 1991-02-20 | 1992-12-15 | Pressco Technology, Inc. | Engineered lighting system for tdi inspection comprising means for controlling lighting elements in accordance with specimen displacement |
JPH06109660A (ja) * | 1992-09-30 | 1994-04-22 | Fujikura Ltd | 異物検査方法 |
US5544256A (en) * | 1993-10-22 | 1996-08-06 | International Business Machines Corporation | Automated defect classification system |
US6487307B1 (en) * | 1994-11-30 | 2002-11-26 | Isoa, Inc. | System and method of optically inspecting structures on an object |
US5689620A (en) * | 1995-04-28 | 1997-11-18 | Xerox Corporation | Automatic training of character templates using a transcription and a two-dimensional image source model |
US6021380A (en) | 1996-07-09 | 2000-02-01 | Scanis, Inc. | Automatic semiconductor wafer sorter/prober with extended optical inspection |
US6272235B1 (en) | 1997-03-03 | 2001-08-07 | Bacus Research Laboratories, Inc. | Method and apparatus for creating a virtual microscope slide |
US5829698A (en) | 1996-09-04 | 1998-11-03 | Svedala New Zealand Ltd. | Rotor design |
US5917588A (en) | 1996-11-04 | 1999-06-29 | Kla-Tencor Corporation | Automated specimen inspection system for and method of distinguishing features or anomalies under either bright field or dark field illumination |
US6201892B1 (en) * | 1997-02-26 | 2001-03-13 | Acuity Imaging, Llc | System and method for arithmetic operations for electronic package inspection |
US5952657A (en) | 1997-08-22 | 1999-09-14 | Thermo Microscopes, Corp. | Atomic force microscope with integrated optics for attachment to optical microscope |
EP1047022B1 (en) | 1997-11-25 | 2007-11-14 | Kabushiki Kaisha Sega doing business as Sega Corporation | Image generating device |
EP1001460B1 (en) | 1998-10-15 | 2001-05-02 | Wacker Siltronic Gesellschaft für Halbleitermaterialien Aktiengesellschaft | Method and apparatus for detecting, monitoring and characterizing edge defects on semiconductor wafers |
JP3215858B2 (ja) | 1998-12-25 | 2001-10-09 | ライオンエンジニアリング株式会社 | 物品外観検査装置 |
US6711283B1 (en) * | 2000-05-03 | 2004-03-23 | Aperio Technologies, Inc. | Fully automatic rapid microscope slide scanner |
AU2002219847A1 (en) * | 2000-11-15 | 2002-05-27 | Real Time Metrology, Inc. | Optical method and apparatus for inspecting large area planar objects |
US6547409B2 (en) * | 2001-01-12 | 2003-04-15 | Electroglas, Inc. | Method and apparatus for illuminating projecting features on the surface of a semiconductor wafer |
CA2439307A1 (en) | 2001-02-23 | 2002-09-06 | Genicon Sciences Corporation | Methods for providing extended dynamic range in analyte assays |
JP3629244B2 (ja) | 2002-02-19 | 2005-03-16 | 本多エレクトロン株式会社 | ウエーハ用検査装置 |
US7253946B2 (en) | 2002-09-16 | 2007-08-07 | Rensselaer Polytechnic Institute | Microscope with extended field of vision |
US6775004B1 (en) * | 2002-10-08 | 2004-08-10 | John B. Putman | Measuring surface roughness to calculate filler dispersion in a polymer sample |
JP2005010042A (ja) | 2003-06-19 | 2005-01-13 | Olympus Corp | 検査装置 |
US7227628B1 (en) * | 2003-10-10 | 2007-06-05 | Kla-Tencor Technologies Corp. | Wafer inspection systems and methods for analyzing inspection data |
JP3867724B2 (ja) * | 2004-02-27 | 2007-01-10 | オムロン株式会社 | 表面状態検査方法およびその方法を用いた表面状態検査装置ならびに基板検査装置 |
US7176433B1 (en) | 2004-05-07 | 2007-02-13 | Kla-Teacor Technologies Corporation | Resolution enhancement for macro wafer inspection |
US7539583B2 (en) * | 2005-03-04 | 2009-05-26 | Rudolph Technologies, Inc. | Method and system for defect detection |
JP2006294969A (ja) | 2005-04-13 | 2006-10-26 | Reitetsukusu:Kk | ウエハ検査装置及びウエハの検査方法 |
JP4996856B2 (ja) | 2006-01-23 | 2012-08-08 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置およびその方法 |
US7724362B1 (en) | 2006-03-14 | 2010-05-25 | Kla-Tencor Corporation | Oblique incidence macro wafer inspection |
US7508504B2 (en) | 2006-05-02 | 2009-03-24 | Accretech Usa, Inc. | Automatic wafer edge inspection and review system |
US9633426B2 (en) | 2014-05-30 | 2017-04-25 | General Electric Company | Remote visual inspection image capture system and method |
WO2009081498A1 (ja) | 2007-12-26 | 2009-07-02 | Shimadzu Corporation | 生体画像取得装置 |
IL188825A0 (en) | 2008-01-16 | 2008-11-03 | Orbotech Ltd | Inspection of a substrate using multiple cameras |
US20100039818A1 (en) * | 2008-08-18 | 2010-02-18 | Coinsecure, Inc. | Numismatic storage container to prevent counterfeiting of coinage |
GB0900526D0 (en) | 2009-01-14 | 2009-02-11 | Perkinelmer Ltd | Fluorescence microscopy methods and apparatus |
JP5656414B2 (ja) | 2010-01-29 | 2015-01-21 | キヤノン株式会社 | 眼科像撮像装置及び眼科像撮像方法 |
SG177786A1 (en) * | 2010-07-13 | 2012-02-28 | Semiconductor Tech & Instr Inc | System and method for capturing illumination reflected in multiple directions |
JP5694759B2 (ja) | 2010-12-28 | 2015-04-01 | ミサワホーム株式会社 | インナーバルコニーを有する住宅 |
US9671345B2 (en) * | 2011-02-24 | 2017-06-06 | Reametrix, Inc. | Mapping volumes of interest in selected planes in liquid samples |
US9575013B2 (en) * | 2011-05-17 | 2017-02-21 | Gii Acquisition, Llc | Non-contact method and system for inspecting a manufactured part at an inspection station having a measurement axis |
JP5893316B2 (ja) | 2011-09-27 | 2016-03-23 | オリンパス株式会社 | 顕微鏡システムおよびカメラヘッド |
US20130077892A1 (en) | 2011-09-27 | 2013-03-28 | Yasunori Ikeno | Scan Order Optimization and Virtual Slide Stitching |
US9488819B2 (en) * | 2012-08-31 | 2016-11-08 | Nanotronics Imaging, Inc. | Automatic microscopic focus system and method for analysis of transparent or low contrast specimens |
EP2929327B1 (en) | 2012-12-05 | 2019-08-14 | Perimeter Medical Imaging, Inc. | System and method for wide field oct imaging |
US9503709B2 (en) | 2013-02-19 | 2016-11-22 | Intel Corporation | Modular camera array |
CN203480189U (zh) * | 2013-10-16 | 2014-03-12 | 浙江欧威科技有限公司 | 修板台光源结构 |
US20150133778A1 (en) | 2013-11-04 | 2015-05-14 | Medlumics S.L. | Diagnostic Device for Dermatology with Merged OCT and Epiluminescence Dermoscopy |
US9769392B1 (en) | 2014-06-27 | 2017-09-19 | Amazon Technologies, Inc. | Imaging system for addressing specular reflection |
JP1524346S (ja) | 2014-10-14 | 2015-05-25 | ||
JP2016115331A (ja) * | 2014-12-12 | 2016-06-23 | キヤノン株式会社 | 識別器生成装置、識別器生成方法、良否判定装置、良否判定方法、プログラム |
US10023895B2 (en) | 2015-03-30 | 2018-07-17 | Accelerate Diagnostics, Inc. | Instrument and system for rapid microogranism identification and antimicrobial agent susceptibility testing |
US9495590B1 (en) | 2015-04-23 | 2016-11-15 | Global Bionic Optics, Ltd. | Extended depth-of-field biometric system |
US9970750B2 (en) | 2015-05-29 | 2018-05-15 | Nippon Steel & Sumitomo Metal Corporation | Shape inspection apparatus for metallic body and shape inspection method for metallic body |
KR20170001223A (ko) | 2015-06-26 | 2017-01-04 | 삼성전자주식회사 | 정보 추출 시스템, 정보 추출 장치, 그의 정보 추출 방법 및 비일시적 컴퓨터 판독가능 기록매체 |
US10186026B2 (en) * | 2015-11-17 | 2019-01-22 | Kla-Tencor Corp. | Single image detection |
US10068326B2 (en) * | 2016-03-18 | 2018-09-04 | Siemens Energy, Inc. | System and method for enhancing visual inspection of an object |
US10838192B2 (en) | 2016-05-10 | 2020-11-17 | The Regents Of The University Of California | Method and device for high-resolution color imaging using merged images from holographic and lens-based devices |
US10223615B2 (en) * | 2016-08-23 | 2019-03-05 | Dongfang Jingyuan Electron Limited | Learning based defect classification |
JP6735645B2 (ja) | 2016-09-28 | 2020-08-05 | 日本電子株式会社 | 観察方法および試料観察装置 |
KR102414312B1 (ko) | 2017-02-10 | 2022-06-28 | 나노트로닉스 이미징, 인코포레이티드 | 현미경 검사에서 대 영역 이미징을 용이하게 하는 카메라 및 표본 정렬 |
US11392970B2 (en) | 2017-02-15 | 2022-07-19 | Qualtrics, Llc | Administering a digital survey over voice-capable devices |
US11178801B2 (en) | 2017-07-12 | 2021-11-16 | Mycronic AB | Method and system for determining component illumination settings |
US10742894B2 (en) | 2017-08-11 | 2020-08-11 | Ut-Battelle, Llc | Optical array for high-quality imaging in harsh environments |
US11984199B2 (en) | 2019-08-02 | 2024-05-14 | Kpn Innovations, Llc | Methods and systems for generating compatible substance instruction sets using artificial intelligence |
US10915992B1 (en) | 2019-08-07 | 2021-02-09 | Nanotronics Imaging, Inc. | System, method and apparatus for macroscopic inspection of reflective specimens |
-
2019
- 2019-01-30 US US16/262,017 patent/US10545096B1/en active Active
- 2019-10-03 CN CN201980063455.9A patent/CN112840351A/zh active Pending
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008122198A (ja) | 2006-11-10 | 2008-05-29 | Omron Corp | 視覚センサおよび照明設定方法 |
JP2012083282A (ja) | 2010-10-14 | 2012-04-26 | Ail Kk | 検査装置用照明システム |
JP2012215394A (ja) | 2011-03-31 | 2012-11-08 | Dainippon Screen Mfg Co Ltd | 三次元計測装置および三次元計測方法 |
JP2016020867A (ja) | 2014-07-15 | 2016-02-04 | 株式会社日立ハイテクノロジーズ | 欠陥観察方法及びその装置 |
JP2016050864A (ja) | 2014-09-01 | 2016-04-11 | 三菱電機株式会社 | 半田付外観検査装置 |
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US20210181121A1 (en) | 2021-06-17 |
US10545096B1 (en) | 2020-01-28 |
CN112840351A (zh) | 2021-05-25 |
WO2020076591A1 (en) | 2020-04-16 |
EP3864578A4 (en) | 2022-08-10 |
US10914686B2 (en) | 2021-02-09 |
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US20200240925A1 (en) | 2020-07-30 |
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US11656184B2 (en) | 2023-05-23 |
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