JP7452428B2 - Manufacturing method of infrared absorbing glass - Google Patents

Description

The present invention relates to a method for manufacturing infrared absorbing glass.

Conventionally, as disclosed in Patent Document 1, an infrared absorbing glass containing 5% or more of P ⁵⁺ and 0.5% or more of Cu ²⁺ in terms of cation percentage is known as a glass composition. Such infrared absorbing glass is used, for example, as a filter for correcting the visibility of solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs (complementary metal oxide semiconductors).

Japanese Patent Application Publication No. 2016-199430

The above-mentioned infrared absorbing glass is prepared by preparing a glass containing 5% or more P ⁵⁺ expressed as cation percentage and 0.5% or more Cu ²⁺ as a glass composition, and subjecting this glass to treatments such as polishing and cleaning. It can be obtained by applying

Here, glass with a glass composition mainly composed of P ⁵⁺ as described above has extremely low water resistance compared to glass whose main component is SiO ₂ , so it can be easily damaged by water adhering to it during polishing, cleaning, etc. If the glass is left in a wet state, there is a risk that the glass will become brittle and that it will not be possible to maintain a sufficient quality of the glass.

The present invention has been made in view of these circumstances, and its purpose is to provide a method for manufacturing infrared absorbing glass that can suppress deterioration in quality.

A method for manufacturing an infrared absorbing glass that solves the above problems includes a preparation step of preparing a glass containing 5% or more P ⁵⁺ expressed as cation percentage and 0.5% or more Cu ²⁺ as a glass composition; a first treatment step in which the glass is treated using a water-based solvent; and a second treatment step in which water adhering to the surface of the glass is diluted or removed using an organic solvent that is compatible with the water after the first treatment step. 2 processing steps.

According to this method, the water adhering to the glass surface after the first treatment step is diluted or removed using an organic solvent in the second treatment step, thereby reducing the contact between the glass surface and water. The embrittlement of glass can be suppressed.

In the method for producing infrared absorbing glass, the second treatment step preferably includes a treatment liquid immersion step of immersing the glass in a treatment liquid containing the organic solvent.
According to this method, water adhering to the surface of the glass can be quickly diluted or removed.

In the above method for producing infrared absorbing glass, it is preferable that the glass in the treatment liquid is irradiated with ultrasonic waves in the treatment liquid immersion step of the second treatment step.
According to this method, the cleanliness of the glass can be further improved by using the treatment liquid immersion step.

In the method for producing infrared absorbing glass, the second treatment step preferably includes a spraying step of spraying a treatment liquid containing the organic solvent onto the glass.
According to this method, for example, it is possible to suppress the amount of organic solvent used.

In the method for manufacturing infrared absorbing glass, the first treatment step preferably includes a polishing step of polishing the glass.
According to this method, an infrared absorbing glass with improved surface smoothness can be obtained.

In the method for producing infrared absorbing glass, the first treatment step preferably includes a scrubbing step of scrubbing and cleaning the glass using a resin foam.
According to this method, foreign matter adhering to the surface of the glass can be easily removed, so that the cleanliness of the glass can be easily improved.

In the method for producing infrared absorbing glass, the first treatment step preferably includes a immersion cleaning step of immersing and cleaning the glass in an aqueous cleaning solution containing water.
According to this method, the cleanliness of glass can be easily improved using an aqueous cleaning liquid.

In the method for producing infrared absorbing glass, the aqueous cleaning liquid used in the immersion cleaning step of the first treatment step preferably contains a surfactant.
According to this method, the cleanliness of the glass surface can be further easily improved by utilizing the cleaning action of the surfactant.

In the above method for producing infrared absorbing glass, the pH of the aqueous cleaning liquid containing the surfactant is preferably in the range of 9 or more and 13 or less.
According to this method, for example, it is possible to suppress the embrittlement of the glass and to improve the cleanability of the glass.

In the method for producing infrared absorbing glass, the organic solvent used in the second treatment step preferably has higher volatility than the water.
According to this method, for example, it is possible to quickly dry glass.

In the above method for producing infrared absorbing glass, the processing operation of performing the second processing step after the first processing step may be repeated multiple times.
According to this method, for example, it is possible to handle more advanced glass processing.

In the above method for producing infrared absorbing glass, the glass prepared in the preparation step has a glass composition expressed in cation percentages: P ⁵⁺ : 5 to 50%, Al ³⁺ : 2 to 30%, R ⁺ (However, R is at least one selected from Li, Na, and K): 10 to 50%, R' ²⁺ (wherein R' is at least one selected from Mg, Ca, Sr, Ba, and Zn): 20 to 50%, and Cu ²⁺ : 0.5 to 15%, and preferably contains F ⁻ : 5 to 80% and O ²⁻ : 20 to 95% in anion percentage.

According to the present invention, deterioration in the quality of infrared absorbing glass can be suppressed.

It is a flow diagram showing a manufacturing method of infrared absorbing glass in an embodiment. FIG. 2 is a flow diagram showing a first processing step of a method for manufacturing infrared absorbing glass. FIG. 3 is a flow diagram showing a second processing step of the method for producing infrared absorbing glass. It is a flowchart which shows the manufacturing method of the infrared absorption glass in a modification.

Hereinafter, embodiments of a method for manufacturing infrared absorbing glass will be described with reference to the drawings.
As shown in FIG ^. 1, the method for producing infrared absorbing glass includes ^a preparatory step (step S1) and a first treatment step (step S2) of treating glass using water. The method for manufacturing infrared absorbing glass includes, after the first treatment step of step S2, a second treatment step (in which water adhering to the surface of the glass is diluted or removed using an organic solvent that is compatible with the water). The method further includes step S3).

First, the preparation process of step S1 will be explained.
Among the glasses prepared in the preparation process of step S1, the glass composition expressed in cation percentage is P ⁵⁺ : 5 to 50%, Al ³⁺ : 2 to 30%, and R ⁺ (where R is Li, Na, and K). R' ²⁺ (where R' is at least one selected from Mg, Ca, Sr, Ba, and Zn): 10 to 50%, and Cu ²⁺ : 0. Glass containing 5 to 15% of F ⁻ :5 to 80% and O ²⁻ :20 to 95% in anion percentage is preferred.

As a specific example of a more preferable glass, in terms of cation percentage, the glass composition is P ⁵⁺ : 40 to 50%, Al ³⁺ : 7 to 12%, K ⁺ : 15 to 25%, Mg ²⁺ : 3 to 12%, Ca Contains ²⁺ : 3 to 6%, Ba ²⁺ : 7 to 12%, Cu ²⁺ : 1 to 15%, and in anion percentage display, F ⁻ : 5 to 80%, and O ²⁻ : 20 to 95%. Examples include glass containing (phosphate glass).

Other specific examples of more preferable glasses include glass compositions expressed in cation percentage: P ⁵⁺ : 20-35%, Al ³⁺ : 10-20%, Li ⁺ : 20-30%, Na ⁺ : 0-10%. , Mg ²⁺ : 1-8%, Ca ²⁺ : 3-13%, Sr ²⁺ : 2-12%, Ba ²⁺ : 2-8%, Zn ²⁺ : 0-5%, and Cu ²⁺ : 0.5-5. %, and also contains F ⁻ : 30 to 65% and O ² − : 35 to 75% (fluorophosphate glass).

Other specific examples of more preferable glasses include, in terms of cation percentage, P ⁵⁺ : 35-45%, Al ³⁺ : 8-12%, Li ⁺ : 20-30%, Mg ²⁺ : 1-5%. , Ca ²⁺ : 3 to 6%, Ba ²⁺ : 4 to 8%, and Cu ²⁺ : 1 to 6%, and expressed in anion percentage, F ⁻ : 10 to 20%, and O ²⁻ : 75 to Glass containing 95% (fluorophosphate glass) is mentioned.

Specific examples of other more preferable glasses include, in terms of cation percentage, P ⁵⁺ : 30 to 45%, Al ³⁺ : 15 to 25%, Li ⁺ : 1 to 5%, Na ⁺ : 7 to 13%. , K ⁺ : 0.1-5%, Mg ²⁺ : 1-8%, Ca ²⁺ : 3-13%, Ba ²⁺ : 6-12%, Zn ²⁺ : 0-7%, and Cu ²⁺ : 1-5. %, and also contains F ⁻ :30 to 45% and O ²⁻ :50 to 70% (fluorophosphate glass).

The glass is preferably plate-shaped. The thickness of the plate glass is preferably 0.4 mm or less, more preferably 0.3 mm or less, and still more preferably 0.02 mm or more and 0.2 mm or less.

Glass is obtained by molding molten glass obtained through steps such as melting, fining, and stirring of glass raw materials using a well-known method. Glass can be obtained by cutting a glass ingot formed from molten glass, or by a molding method such as an overflow downdraw method, a downdraw method (slot down method, redraw method, etc.), float method, or the like.

Next, the first processing step of step S2 will be explained.
As shown in FIG. 2, the first processing step of step S2 in this embodiment includes a polishing step (step S2A) of polishing the glass. The polishing stage of step S2A can be performed, for example, by a known polishing method using an aqueous polishing liquid and a polishing pad. The polishing in the polishing stage of step S2A may be performed by a polishing method in which a polishing tape is moved or reciprocated. The polishing in the polishing stage of step S2A may be any of chemical polishing, mechanical polishing, and chemical mechanical polishing. Further, the polishing in the polishing stage of step S2A may be rough polishing (lap polishing) or precision polishing (finish polishing, mirror polishing). Further, the polishing step of step S2A may be surface polishing that polishes the surface of the plate-shaped glass, or end-face polishing that polishes the end face of the plate-shaped glass.

The first treatment step of step S2 in the present embodiment further includes an immersion cleaning step (step S2B) in which the glass is immersed in an aqueous cleaning solution containing water for cleaning. The aqueous cleaning liquid may be composed of only water or may contain a surfactant. Examples of the surfactant to be included in the aqueous cleaning liquid include anionic surfactants, cationic surfactants, amphoteric surfactants, and nonionic surfactants. The pH of the aqueous cleaning liquid containing a surfactant is preferably in the range of 9 or more and 13 or less. The pH of the aqueous cleaning solution is a value measured at 20°C. The pH of the aqueous cleaning solution can be adjusted using a pH adjuster (an inorganic or organic alkali, an inorganic or organic acid, etc.) or a buffer, if necessary. The content of the surfactant in the aqueous cleaning liquid is preferably in the range of 1% by mass or more and 5% by mass or less. In this case, the cleaning action of the surfactant can be enhanced and the amount of surfactant remaining on the surface of the glass can be reduced. In the immersion cleaning step of step S2B, the glass is immersed in a cleaning tank filled with an aqueous cleaning solution, for example, with one or more pieces of glass supported in a vertical position on a jig. Note that the glass may be immersed in the cleaning tank while being supported in a horizontal position. The temperature of the aqueous cleaning liquid used in the immersion cleaning step of step S2B is, for example, 1 to 90°C, preferably 5 to 50°C, more preferably 10 to 40°C. Further, the immersion time in the immersion cleaning step of step S2B is, for example, 1 to 10 minutes, preferably 1 to 5 minutes, and more preferably 1 to 3 minutes.

Glass that has been immersed in an aqueous cleaning solution is in a state where it is susceptible to embrittlement due to water, and if ultrasonic waves are irradiated to glass in this state, erosion is likely to occur in the glass. Become. From the viewpoint of suppressing the occurrence of such erosion, it is preferable that the cleaning in the immersion cleaning stage of step S2B be a cleaning that does not irradiate the glass with ultrasonic waves.

The first treatment step of step S2 in this embodiment further includes a scrubbing step (step S2C) of scrubbing and cleaning the glass using a resin foam. Examples of the resin of the resin foam used in the scrubbing step of step S2C include polyvinyl alcohol resin, polyurethane resin, polyolefin resin, and melamine resin.

The scrubbing step of step S2C may be carried out by pressing a rotating pad or rotating roller made of the above resin against the main surface of the glass, or may be carried out manually by an operator.

Next, the second processing step of step S3 will be explained.
Examples of the organic solvent used in the second treatment step of step S3 include alcohol, ketone, and ether. Among the organic solvents, organic solvents with higher volatility than water are preferred, monohydric alcohols having 1 to 3 carbon atoms are more preferred, and isopropyl alcohol is even more preferred.

As shown in FIG. 3, the second treatment step of step S3 in this embodiment includes a treatment liquid immersion step (step S3A) in which the glass is immersed in a treatment liquid containing an organic solvent. The treatment liquid used in the treatment liquid immersion step of step S3A contains an organic solvent as a main component, and may further contain water or the like that is compatible with the organic solvent. The content of the organic solvent in the treatment liquid used in the treatment liquid immersion step of step S3A is preferably 50% by mass or more, more preferably 70% by mass or more, and still more preferably 90% by mass or more. By increasing the content of the organic solvent in this treatment liquid, embrittlement of the glass can be further suppressed. The temperature of the treatment liquid used in the treatment liquid immersion step of step S3A is, for example, 1 to 90°C, preferably 5 to 50°C, and more preferably 10 to 40°C. Further, the immersion time in the treatment liquid immersion step of step S3A is, for example, 1 to 10 minutes, preferably 1 to 5 minutes, and more preferably 1 to 3 minutes.

In the treatment liquid immersion step of step S3A, the glass is immersed in a treatment tank filled with the treatment liquid, for example, in a state where one or more pieces of glass are supported in a vertical position on a jig. Note that the glass may be immersed in the processing tank while being supported in a horizontal position.

In the treatment liquid immersion stage of step S3A, it is preferable to irradiate the glass in the treatment liquid with ultrasonic waves. In the treatment liquid immersion stage of step S3A, a known ultrasonic cleaning device can be used.

The second treatment step of step S3 in this embodiment further includes a spraying step (step S3B) of spraying a treatment liquid containing an organic solvent onto the glass. The treatment liquid used in the spraying stage of step S3B contains an organic solvent as a main component, and may further contain water or the like that is compatible with the organic solvent.

It is preferable that the content of the organic solvent in the treatment liquid used in the spraying stage of step S3B is higher than the content of organic solvent in the treatment liquid used in the treatment liquid immersion stage of step S3A. The content of the organic solvent in the treatment liquid used in the spraying stage of step S3B is preferably 90% by mass or more, more preferably 95% by mass or more. By increasing the content of the organic solvent in this treatment liquid, embrittlement of the glass can be further suppressed. Moreover, when an organic solvent having higher volatility than water is used as the organic solvent, the glass can also be quickly dried. That is, in the final stage of the second treatment process of step S3 (the stage of obtaining infrared absorbing glass for inspection), from the viewpoint of further suppressing glass embrittlement and quickly drying the surface of the glass, a more volatile material than water is used. It is preferable to use a treatment liquid containing 90% by mass or more of a highly reactive organic solvent.

In the spraying step of step S3B described above, a one-fluid spray nozzle or a two-fluid spray nozzle can be used. In the spraying step of step S3B, the treatment liquid is sprayed onto both main surfaces of the glass, for example, with one or more pieces of glass supported in a vertical position on a jig. Note that the treatment liquid may be sprayed onto both main surfaces of the glass while the glass is supported in a horizontal position. The temperature of the spraying atmosphere in the spraying stage of step S3B is, for example, 1 to 90°C, preferably 5 to 50°C, more preferably 10 to 40°C. Further, the spraying time in the spraying stage of step S3B is, for example, 1 to 10 minutes, preferably 1 to 5 minutes, and more preferably 1 to 3 minutes.

In addition, in the manufacturing method of infrared absorbing glass, the processing operation of performing the second processing step after the first processing step described above may be repeated multiple times. That is, in the method for manufacturing infrared absorbing glass, the first treatment step and the second treatment step can be performed as one treatment operation, and this treatment operation can be performed two or more times.

The infrared absorbing glass obtained by the infrared absorbing glass manufacturing method is inspected for presence or absence of abnormalities (such as scratches) on the surface, and then shipped in a packaged state.
Glass obtained by the method for producing infrared absorbing glass can be suitably used, for example, as a filter for correcting the visibility of solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs (complementary metal oxide semiconductors). can.

Next, the functions and effects of this embodiment will be explained.
(1) The method for manufacturing infrared absorbing glass includes a preparation process in step S1, a first treatment process in step S2, and a second treatment process in step S3.

According to this method, the water adhering to the surface of the glass after the first treatment step of step S2 is diluted or removed using an organic solvent in the second treatment step of step S2, thereby removing the water that has adhered to the surface of the glass. It is possible to suppress the embrittlement of glass caused by contact with water. Therefore, deterioration in the quality of the infrared absorbing glass can be suppressed.

(2) In the method for manufacturing infrared absorbing glass, it is preferable that the second treatment step of step S3 includes a treatment liquid immersion step of step S3A. In this case, water adhering to the surface of the glass can be quickly diluted or removed.

(3) When the second treatment process in step S3 includes the treatment liquid immersion step in step S3A, it is preferable that the glass in the treatment liquid is irradiated with ultrasonic waves in the treatment liquid immersion step in step S3A. In this case, the cleanliness of the glass can be further improved by using the treatment liquid immersion step of step S3A.

(4) In the method for manufacturing infrared absorbing glass, it is preferable that the second treatment step in step S3 includes a spraying step in step S3B. In this case, for example, it is possible to suppress the amount of organic solvent used.

(5) In the method for manufacturing infrared absorbing glass, it is preferable that the first treatment step in step S2 includes a polishing step in step S2A. In this case, an infrared absorbing glass with improved surface smoothness can be obtained.

(6) In the method for manufacturing infrared absorbing glass, it is preferable that the first treatment step of step S2 includes a scrubbing step of step S2C. In this case, since foreign matter adhering to the surface of the glass can be easily removed, the cleanliness of the glass can be easily improved.

(7) In the method for manufacturing infrared absorbing glass, it is preferable that the first treatment step in step S2 includes an immersion cleaning step in step S2B. In this case, the cleanliness of the glass can be easily improved using an aqueous cleaning liquid.

(8) The aqueous cleaning liquid used in the immersion cleaning step of step S2B preferably contains a surfactant. In this case, the cleanliness of the glass surface can be further easily improved by utilizing the cleaning action of the surfactant.

(9) When using an aqueous cleaning solution containing a surfactant in the immersion cleaning step of step S2B, the pH of the aqueous cleaning solution is preferably within the range of 9 or more and 13 or less. In this case, for example, it becomes possible to suppress the embrittlement of the glass and to improve the cleanability of the glass.

(10) The organic solvent used in the second treatment step of step S3 preferably has higher volatility than water. In this case, for example, it becomes possible to quickly dry the glass.
Note that the organic solvent used in the treatment liquid immersion step of step S3A and the organic solvent used in the spraying step of step S3B may be of the same type or may be of different types. For example, in the treatment liquid immersion stage of step S3A, an organic solvent with lower volatility than water can be used, and in the spraying stage of step S3B, an organic solvent with higher volatility than water can be used.

(11) In the method for manufacturing infrared absorbing glass, the processing operation of performing the second processing step of step S3 after the first processing step of step S2 may be repeated multiple times. In this case, for example, by performing the polishing step of step S2A multiple times, it is possible to handle more advanced glass processing. Furthermore, even if the time from the end of the first processing operation to the start of the next second processing operation is extended, embrittlement of the glass can be suppressed, so it is possible to ensure waiting time between processes. It is possible to increase the degree of freedom in the manufacturing process of infrared absorbing glass.

(Example of change)
This embodiment can be modified and implemented as follows. This embodiment and the following modified examples can be implemented in combination with each other within a technically consistent range.

- In the method for manufacturing infrared absorbing glass, the first treatment step of step S2 can also be comprised of at least one stage. Further, the first treatment step of step S2 can be changed to a step including, for example, a shower cleaning step of cleaning the glass using a shower nozzle that sprays water. Preferably, the first processing step of step S2 includes at least one of the polishing step of step S2A, the immersion cleaning step of step S2B, the rubbing cleaning step of step S2C, and the shower cleaning step.

- In the method for manufacturing infrared absorbing glass, the second treatment step of step S3 can also be comprised of at least one stage. Further, the second treatment step in step S3 can be changed to a step including, for example, a treatment liquid supply step in which the treatment liquid is supplied to the glass using a shower nozzle that sprays a treatment liquid containing an organic solvent. It is preferable that the second treatment step of step S3 includes at least one of the treatment liquid immersion step of step S3A, the spraying step of step S3B, and the treatment liquid supply step.

- In the first treatment step of step S2, the order of the immersion cleaning stage of step S2B and the scrubbing stage of step S2C may be changed.
- In the first processing step of step S2 or the second processing step of step S3, the same step may be repeated multiple times. For example, in the immersion cleaning stage of step S2B, a plurality of immersion tanks are prepared and the glass is sequentially immersed in the plurality of tanks, so that the immersion cleaning stage of step S2B can be repeated multiple times. In this case, the compositions of the aqueous cleaning liquids in the plurality of tanks may be the same or may be different from each other. For example, regarding the treatment liquid immersion step in step S3A, the treatment liquid immersion step in step S3A can be repeated multiple times by preparing a plurality of dipping tanks and sequentially immersing the glass in the plurality of tanks. In this case as well, the compositions of the processing liquids in the plurality of tanks may be the same or may be different from each other.

- After the second processing step of step S3 described above, the etching step of step S4 may be further performed as shown in FIG. The etching process in step S4 is performed, for example, by immersing the glass in an etching solution. As the etching solution, for example, a detergent containing an alkaline component such as Na or K, a surfactant such as triethanolamine, benzyl alcohol, or glycol, and water or alcohol can be used. For example, hydrofluoric acid, hydrochloric acid, or the like may be further added at a low concentration to this etching solution. Since the glass that has been processed in steps S1 to S3 of the present invention is less prone to erosion and embrittlement, it is less likely to suffer breakage or hole defects in the etching process of step S4, making it possible to obtain high-quality glass.

- After the etching process in step S4, it is preferable to further wash the glass with water. Further, after cleaning, the second processing step of step S3 may be performed again. According to such a configuration, it is possible to suitably remove the etching liquid adhering to the glass in the etching process of step S4, and to suppress embrittlement of the glass due to residual moisture.

The present disclosure includes the following configurations.
[Additional note 1]
A method of manufacturing infrared absorbing glass according to a non-limiting example includes:
A step of preparing a substrate made of, for example, a glass plate containing 5% or more of P ⁵⁺ and 0.5% or more of Cu ²⁺ in cation percentage;
treating the substrate with water;
After the step of treating the base material, the method includes a step of diluting or removing water adhering to the surface of the base material using an organic solvent that is compatible with water.

[Additional note 2]
In a non-limiting example, diluting or removing water on the surface of the substrate includes immersing the substrate in a treatment liquid containing the organic solvent.

[Additional note 3]
In a non-limiting example, during immersion of the substrate in the treatment liquid, the substrate in the treatment liquid is irradiated with ultrasound.

[Additional note 4]
In a non-limiting example, diluting or removing water on the surface of the substrate includes spraying the substrate with a treatment liquid containing the organic solvent.

[Additional note 5]
In a non-limiting example, treating the substrate includes polishing the substrate.
[Additional note 6]
In a non-limiting example, treating the substrate includes scrubbing the substrate with a resin foam.

[Additional note 7]
In a non-limiting example, treating the substrate includes cleaning the substrate by soaking it in an aqueous cleaning solution.

[Additional note 8]
In a non-limiting example, the aqueous cleaning solution contains a surfactant.
[Additional note 9]
In a non-limiting example, the pH of the aqueous cleaning solution is between 9 and 13.

[Additional note 10]
In a non-limiting example, the organic solvent has high volatility compared to water.
[Additional note 11]
In a non-limiting example, the steps of treating the substrate and subsequently diluting or removing water from the surface of the substrate are repeated multiple times.

[Additional note 12]
In a non-limiting example, the substrate comprises 5 to 50% P ⁵⁺ , 2 to 30% Al ³⁺ , and 10 to 50% R ⁺ in cationic %, where R is Li, Na, and K), 20 to 50% R' ²⁺ (where R' is at least one selected from Mg, Ca, Sr, Ba, and Zn), and 0.5 to 15% Cu ²⁺ . and contains 5 to 80% F ^- and 20 to 95% O ^{2 -} in terms of anion percentage.

Claims (11)

The glass composition is expressed in cation percentage : P ⁵⁺ : 5 to 50%, Al ³⁺ : 2 to 30%, R ⁺ (where R is at least one selected from Li, Na, and K): 10 to 50%, Contains R' ²⁺ (where R' is at least one selected from Mg, Ca, Sr, Ba, and Zn): 20 to 50%, and Cu ²⁺ : 0.5 to 15%, and anion % display a preparation step of preparing a glass containing F ⁻ : 5 to 80% and O ² − : 20 to 95% ;
a first treatment step of treating the glass using water;
After the first treatment step, the infrared rays method further comprises a second treatment step of diluting or removing water adhering to the surface of the glass using an organic solvent that is compatible with the water. Method of manufacturing absorbing glass. 2. The method of manufacturing infrared absorbing glass according to claim 1, wherein the second treatment step includes a treatment liquid immersion step of immersing the glass in a treatment liquid containing the organic solvent. 3. The method for manufacturing infrared absorbing glass according to claim 2, wherein in the treatment liquid immersion step of the second treatment step, the glass in the treatment liquid is irradiated with ultrasonic waves. The second treatment step includes a spraying step of spraying the treatment liquid containing the organic solvent toward both main surfaces of the plate-shaped glass using a nozzle,
The method for producing infrared absorbing glass according to any one of claims 1 to 3, wherein the content of the organic solvent in the treatment liquid is 90% by mass or more. The method for manufacturing infrared absorbing glass according to any one of claims 1 to 4, wherein the first treatment step includes a polishing step of polishing the glass. The production of infrared absorbing glass according to any one of claims 1 to 5, wherein the first treatment step includes a scrubbing step of scrubbing and cleaning the glass using a resin foam. Method. The infrared absorbing glass according to any one of claims 1 to 6, wherein the first treatment step includes a immersion cleaning step of immersing and cleaning the glass in an aqueous cleaning solution containing water. manufacturing method. The aqueous cleaning liquid used in the immersion cleaning step of the first treatment step contains a surfactant,
8. The method for manufacturing infrared absorbing glass according to claim 7, wherein in the immersion cleaning step of the first treatment step, the glass in the aqueous cleaning liquid is not irradiated with ultrasonic waves. 9. The method for producing infrared absorbing glass according to claim 8, wherein the pH of the aqueous cleaning liquid containing the surfactant is within a range of 9 or more and 13 or less. The method for producing infrared absorbing glass according to any one of claims 1 to 9, wherein the organic solvent used in the second treatment step has higher volatility than the water. The method for manufacturing infrared absorbing glass according to any one of claims 1 to 10, characterized in that a treatment operation in which the second treatment step is performed after the first treatment step is repeated multiple times.

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