JP7382339B2 - Ｍｅｍｓに基づくコリオリ質量流コントローラ - Google Patents

Ｍｅｍｓに基づくコリオリ質量流コントローラ Download PDF

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Publication number
JP7382339B2
JP7382339B2 JP2020552898A JP2020552898A JP7382339B2 JP 7382339 B2 JP7382339 B2 JP 7382339B2 JP 2020552898 A JP2020552898 A JP 2020552898A JP 2020552898 A JP2020552898 A JP 2020552898A JP 7382339 B2 JP7382339 B2 JP 7382339B2
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Japan
Prior art keywords
mass flow
flow controller
controller assembly
housing portion
housing
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JP2020552898A
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Japanese (ja)
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JP2021519700A (ja
JP2021519700A5 (cg-RX-API-DMAC7.html
Inventor
スミス・デニス
レイマー・ピーター
ゴパラクリシャナン・スダカー
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Lam Research Corp
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Lam Research Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8404—Coriolis or gyroscopic mass flowmeters details of flowmeter manufacturing methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8409—Coriolis or gyroscopic mass flowmeters constructional details
    • G01F1/844—Coriolis or gyroscopic mass flowmeters constructional details microfluidic or miniaturised flowmeters
    • G01F1/8445—Coriolis or gyroscopic mass flowmeters constructional details microfluidic or miniaturised flowmeters micromachined flowmeters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8409—Coriolis or gyroscopic mass flowmeters constructional details
    • G01F1/8422—Coriolis or gyroscopic mass flowmeters constructional details exciters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8409—Coriolis or gyroscopic mass flowmeters constructional details
    • G01F1/8427—Coriolis or gyroscopic mass flowmeters constructional details detectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8409—Coriolis or gyroscopic mass flowmeters constructional details
    • G01F1/8431—Coriolis or gyroscopic mass flowmeters constructional details electronic circuits
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/845—Coriolis or gyroscopic mass flowmeters arrangements of measuring means, e.g., of measuring conduits
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/001—Means for regulating or setting the meter for a predetermined quantity
    • G01F15/002—Means for regulating or setting the meter for a predetermined quantity for gases
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/001—Means for regulating or setting the meter for a predetermined quantity
    • G01F15/003—Means for regulating or setting the meter for a predetermined quantity using electromagnetic, electric or electronic means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/005—Valves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/12—Cleaning arrangements; Filters
    • G01F15/125—Filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
    • G01N9/32—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity by using flow properties of fluids, e.g. flow through tubes or apertures
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0652—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in parallel
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0688—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by combined action on throttling means and flow sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0612—Production flow monitoring, e.g. for increasing throughput
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/57—Mask-wafer alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Measuring Volume Flow (AREA)
  • Micromachines (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Flow Control (AREA)
JP2020552898A 2018-03-30 2019-03-28 Ｍｅｍｓに基づくコリオリ質量流コントローラ Active JP7382339B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862650657P 2018-03-30 2018-03-30
US62/650,657 2018-03-30
PCT/US2019/024583 WO2019191428A1 (en) 2018-03-30 2019-03-28 Mems-based coriolis mass flow controller

Publications (3)

Publication Number Publication Date
JP2021519700A JP2021519700A (ja) 2021-08-12
JP2021519700A5 JP2021519700A5 (cg-RX-API-DMAC7.html) 2023-08-17
JP7382339B2 true JP7382339B2 (ja) 2023-11-16

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Country Link
US (1) US11860016B2 (cg-RX-API-DMAC7.html)
JP (1) JP7382339B2 (cg-RX-API-DMAC7.html)
KR (1) KR102662822B1 (cg-RX-API-DMAC7.html)
WO (1) WO2019191428A1 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110987916B (zh) * 2019-12-17 2021-01-05 中国科学院半导体研究所 一种微流控芯片及其检测方法
US12417899B2 (en) * 2022-03-16 2025-09-16 Applied Materials, Inc. Integrated showerhead
US12601621B2 (en) 2022-03-30 2026-04-14 Applied Materials, Inc. Methods of manufacturing plasma generating cells for a plasma source

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100037706A1 (en) 2008-02-11 2010-02-18 Integrated Sensing Systems, Inc. Microfluidic device and methods of operation and making
US20140299204A1 (en) 2013-03-15 2014-10-09 Bhushan Somani Real time diagnostics for flow controller systems and methods

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Publication number Priority date Publication date Assignee Title
US6526839B1 (en) * 1998-12-08 2003-03-04 Emerson Electric Co. Coriolis mass flow controller and capacitive pick off sensor
US6418954B1 (en) * 2001-04-17 2002-07-16 Mks Instruments, Inc. System and method for dividing flow
US7921737B2 (en) * 2008-02-11 2011-04-12 Integrated Sensing Systems, Inc. Microfluidic device and method of operation
KR101336868B1 (ko) * 2012-08-22 2013-12-05 한국에너지기술연구원 마이크로웨이브 플라즈마를 이용한 바이오디젤 생산 부산물로부터 합성가스 급속 생산 장치 및 방법
US10114387B2 (en) 2013-03-12 2018-10-30 Illinois Tool Works Inc. Mass flow controller with near field communication and/or USB interface to receive power from external device
US10214817B2 (en) * 2013-10-16 2019-02-26 The Board Of Trustees Of The University Of Illinois Multi-metal films, alternating film multilayers, formation methods and deposition system
JP6481282B2 (ja) * 2014-08-15 2019-03-13 アルメックスコーセイ株式会社 気体流量制御装置および気体流量制御弁

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100037706A1 (en) 2008-02-11 2010-02-18 Integrated Sensing Systems, Inc. Microfluidic device and methods of operation and making
US20140299204A1 (en) 2013-03-15 2014-10-09 Bhushan Somani Real time diagnostics for flow controller systems and methods

Also Published As

Publication number Publication date
US20210096011A1 (en) 2021-04-01
KR20200128183A (ko) 2020-11-11
JP2021519700A (ja) 2021-08-12
US11860016B2 (en) 2024-01-02
KR102662822B1 (ko) 2024-05-02
WO2019191428A1 (en) 2019-10-03

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