KR102662822B1 - MEMS-기반 코리올리 (coriolis) 질량 유량 제어기 - Google Patents

MEMS-기반 코리올리 (coriolis) 질량 유량 제어기 Download PDF

Info

Publication number
KR102662822B1
KR102662822B1 KR1020207031376A KR20207031376A KR102662822B1 KR 102662822 B1 KR102662822 B1 KR 102662822B1 KR 1020207031376 A KR1020207031376 A KR 1020207031376A KR 20207031376 A KR20207031376 A KR 20207031376A KR 102662822 B1 KR102662822 B1 KR 102662822B1
Authority
KR
South Korea
Prior art keywords
housing portion
housing
mass flow
inlet
flow controller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020207031376A
Other languages
English (en)
Korean (ko)
Other versions
KR20200128183A (ko
Inventor
데니스 스미스
피터 라이머
수드하카르 고팔라크리슈넌
Original Assignee
램 리써치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20200128183A publication Critical patent/KR20200128183A/ko
Application granted granted Critical
Publication of KR102662822B1 publication Critical patent/KR102662822B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8409—Coriolis or gyroscopic mass flowmeters constructional details
    • G01F1/844—Coriolis or gyroscopic mass flowmeters constructional details microfluidic or miniaturised flowmeters
    • G01F1/8445—Coriolis or gyroscopic mass flowmeters constructional details microfluidic or miniaturised flowmeters micromachined flowmeters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8404—Coriolis or gyroscopic mass flowmeters details of flowmeter manufacturing methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8409—Coriolis or gyroscopic mass flowmeters constructional details
    • G01F1/8422—Coriolis or gyroscopic mass flowmeters constructional details exciters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8409—Coriolis or gyroscopic mass flowmeters constructional details
    • G01F1/8427—Coriolis or gyroscopic mass flowmeters constructional details detectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/8409—Coriolis or gyroscopic mass flowmeters constructional details
    • G01F1/8431—Coriolis or gyroscopic mass flowmeters constructional details electronic circuits
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/78—Direct mass flowmeters
    • G01F1/80—Direct mass flowmeters operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
    • G01F1/84—Coriolis or gyroscopic mass flowmeters
    • G01F1/845—Coriolis or gyroscopic mass flowmeters arrangements of measuring means, e.g., of measuring conduits
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/001—Means for regulating or setting the meter for a predetermined quantity
    • G01F15/002—Means for regulating or setting the meter for a predetermined quantity for gases
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/001—Means for regulating or setting the meter for a predetermined quantity
    • G01F15/003—Means for regulating or setting the meter for a predetermined quantity using electromagnetic, electric or electronic means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/005—Valves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/12—Cleaning arrangements; Filters
    • G01F15/125—Filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
    • G01N9/32—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity by using flow properties of fluids, e.g. flow through tubes or apertures
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0652—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in parallel
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0688—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by combined action on throttling means and flow sources
    • H01L21/67017—
    • H01L21/67253—
    • H01L21/67276—
    • H01L21/682—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0612—Production flow monitoring, e.g. for increasing throughput
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/57—Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Measuring Volume Flow (AREA)
  • Micromachines (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Flow Control (AREA)
KR1020207031376A 2018-03-30 2019-03-28 MEMS-기반 코리올리 (coriolis) 질량 유량 제어기 Active KR102662822B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862650657P 2018-03-30 2018-03-30
US62/650,657 2018-03-30
PCT/US2019/024583 WO2019191428A1 (en) 2018-03-30 2019-03-28 Mems-based coriolis mass flow controller

Publications (2)

Publication Number Publication Date
KR20200128183A KR20200128183A (ko) 2020-11-11
KR102662822B1 true KR102662822B1 (ko) 2024-05-02

Family

ID=68060516

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020207031376A Active KR102662822B1 (ko) 2018-03-30 2019-03-28 MEMS-기반 코리올리 (coriolis) 질량 유량 제어기

Country Status (4)

Country Link
US (1) US11860016B2 (cg-RX-API-DMAC7.html)
JP (1) JP7382339B2 (cg-RX-API-DMAC7.html)
KR (1) KR102662822B1 (cg-RX-API-DMAC7.html)
WO (1) WO2019191428A1 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110987916B (zh) * 2019-12-17 2021-01-05 中国科学院半导体研究所 一种微流控芯片及其检测方法
US12417899B2 (en) * 2022-03-16 2025-09-16 Applied Materials, Inc. Integrated showerhead
US12601621B2 (en) 2022-03-30 2026-04-14 Applied Materials, Inc. Methods of manufacturing plasma generating cells for a plasma source

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009102763A1 (en) 2008-02-11 2009-08-20 Integrated Sensing Systems, Inc. Microfluidic device and method of operation

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6526839B1 (en) * 1998-12-08 2003-03-04 Emerson Electric Co. Coriolis mass flow controller and capacitive pick off sensor
US6418954B1 (en) * 2001-04-17 2002-07-16 Mks Instruments, Inc. System and method for dividing flow
US8272274B2 (en) * 2008-02-11 2012-09-25 Integrated Sensing Systems Inc. Microfluidic device and methods of operation and making
KR101336868B1 (ko) * 2012-08-22 2013-12-05 한국에너지기술연구원 마이크로웨이브 플라즈마를 이용한 바이오디젤 생산 부산물로부터 합성가스 급속 생산 장치 및 방법
US10114387B2 (en) 2013-03-12 2018-10-30 Illinois Tool Works Inc. Mass flow controller with near field communication and/or USB interface to receive power from external device
US9454158B2 (en) * 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
US10214817B2 (en) * 2013-10-16 2019-02-26 The Board Of Trustees Of The University Of Illinois Multi-metal films, alternating film multilayers, formation methods and deposition system
JP6481282B2 (ja) * 2014-08-15 2019-03-13 アルメックスコーセイ株式会社 気体流量制御装置および気体流量制御弁

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009102763A1 (en) 2008-02-11 2009-08-20 Integrated Sensing Systems, Inc. Microfluidic device and method of operation

Also Published As

Publication number Publication date
JP7382339B2 (ja) 2023-11-16
US20210096011A1 (en) 2021-04-01
KR20200128183A (ko) 2020-11-11
JP2021519700A (ja) 2021-08-12
US11860016B2 (en) 2024-01-02
WO2019191428A1 (en) 2019-10-03

Similar Documents

Publication Publication Date Title
KR102626481B1 (ko) 임베딩된 전극을 갖는 세라믹 가스 분배 플레이트
US12451335B2 (en) Multi-plate electrostatic chucks with ceramic baseplates
KR102525777B1 (ko) 기생 플라즈마를 억제하고 웨이퍼-내 불균일성을 감소시키기 위한 시스템들 및 방법들
US11662237B2 (en) MEMS coriolis gas flow controller
US11967517B2 (en) Electrostatic chuck with ceramic monolithic body
KR102662822B1 (ko) MEMS-기반 코리올리 (coriolis) 질량 유량 제어기
KR20210008919A (ko) 냉각된 대면 플레이트를 갖는 샤워헤드를 갖는 기판 프로세싱 챔버
US11133211B2 (en) Ceramic baseplate with channels having non-square corners
KR20220159431A (ko) 빔 투과형 레이저 센서를 사용한 인-시츄 (in-situ) 웨이퍼 두께 및 갭 모니터링
JP2021519700A5 (cg-RX-API-DMAC7.html)
US20240417857A1 (en) Connector for substrate support with embedded temperature sensors
JP7767323B2 (ja) 効率的な熱伝達のためのモノブロック台座

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000