JP7300197B2 - イオン源と、それを備えた多種イオン生成装置 - Google Patents

イオン源と、それを備えた多種イオン生成装置 Download PDF

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JP7300197B2
JP7300197B2 JP2021511364A JP2021511364A JP7300197B2 JP 7300197 B2 JP7300197 B2 JP 7300197B2 JP 2021511364 A JP2021511364 A JP 2021511364A JP 2021511364 A JP2021511364 A JP 2021511364A JP 7300197 B2 JP7300197 B2 JP 7300197B2
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ion
source
ion source
gas flow
flow path
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JPWO2020203186A1 (enrdf_load_stackoverflow
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健 片桐
崇志 涌井
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NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICALSCIENCE AND TECHNOLOGY
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NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICALSCIENCE AND TECHNOLOGY
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Radiation-Therapy Devices (AREA)
  • Particle Accelerators (AREA)
JP2021511364A 2019-04-03 2020-03-13 イオン源と、それを備えた多種イオン生成装置 Active JP7300197B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019071409 2019-04-03
JP2019071409 2019-04-03
PCT/JP2020/011145 WO2020203186A1 (ja) 2019-04-03 2020-03-13 イオン源と、それを備えた多種イオン生成装置

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JPWO2020203186A1 JPWO2020203186A1 (enrdf_load_stackoverflow) 2020-10-08
JP7300197B2 true JP7300197B2 (ja) 2023-06-29

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JP2021511364A Active JP7300197B2 (ja) 2019-04-03 2020-03-13 イオン源と、それを備えた多種イオン生成装置

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JP (1) JP7300197B2 (enrdf_load_stackoverflow)
WO (1) WO2020203186A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102844510B1 (ko) * 2019-04-16 2025-08-08 액셀리스 테크놀러지스, 인크. 다중 아크 챔버 소스

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60240039A (ja) * 1984-05-11 1985-11-28 Ryuichi Shimizu イオン銃
JP2879342B2 (ja) * 1988-12-20 1999-04-05 理化学研究所 電子ビーム励起イオン源
JP2586836B2 (ja) * 1994-10-19 1997-03-05 日新電機株式会社 イオン源装置
US9117617B2 (en) * 2013-06-24 2015-08-25 Agilent Technologies, Inc. Axial magnetic ion source and related ionization methods

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JPWO2020203186A1 (enrdf_load_stackoverflow) 2020-10-08
WO2020203186A1 (ja) 2020-10-08

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