JP7285870B2 - 部品洗浄方法及び装置 - Google Patents
部品洗浄方法及び装置 Download PDFInfo
- Publication number
- JP7285870B2 JP7285870B2 JP2021019845A JP2021019845A JP7285870B2 JP 7285870 B2 JP7285870 B2 JP 7285870B2 JP 2021019845 A JP2021019845 A JP 2021019845A JP 2021019845 A JP2021019845 A JP 2021019845A JP 7285870 B2 JP7285870 B2 JP 7285870B2
- Authority
- JP
- Japan
- Prior art keywords
- supply member
- coolant
- plasma
- parts
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
- B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
- H01J37/32862—In situ cleaning of vessels and/or internal parts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/002—Cooling arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/335—Cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32825—Working under atmospheric pressure or higher
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
Description
一例で、部品洗浄処理方法は、洗浄ガスから発生されたプラズマを冷媒と共に供給して部品を洗浄処理し、冷媒はプラズマに比べて低い温度に提供されることができる。
また、本発明は、部品洗浄装置を提供する。一例で、部品洗浄装置は、プラズマを供給する供給部材と、供給部材内に洗浄ガスを供給するガス供給部材と、供給部材内に提供された洗浄ガスからプラズマを形成するプラズマソースと、供給部材内に冷媒を供給する冷媒供給部材と、を含み、冷媒はプラズマより低い温度に提供され、供給部材はプラズマ及び冷媒を共に吐出することができる。
図2は本発明の実施形態に係る基板処理装置を示す図面である。図2を参照すれば、基板処理装置はチャンバー100、基板支持ユニット200、リングアセンブリ250、ガス供給ユニット300、プラズマソース400、ライナー530、そしてバッフル550を含む。
ガス供給部材1200はガス導入口1230に洗浄ガスを供給する。ガス供給部材1200はガス導入口1230に連結されるガス供給ライン1300を含む。一例によれば、洗浄ガスはエアである。エアは第1空間1212でプラズマソースによって励起されて窒素プラズマ及び酸素プラズマを形成する。各プラズマは第2空間1222に移動される。したがって、第2空間1222は第1空間1212と共に放電空間に提供される。
1200 供給部材
1210 ボディー部
1212 第1空間
1220 吐出部
1222 第2空間
1300 ガス供給部材
1400 冷媒供給部材
Claims (18)
- 基板処理装置の部品を洗浄する方法(部品洗浄方法)であって、
洗浄ガスから発生されたプラズマを冷媒と共に供給して前記部品を洗浄処理し、
前記冷媒は、前記プラズマに比べて低い温度に提供され、
前記プラズマ及び前記冷媒は、供給部材を含む部品洗浄装置から供給され、
前記供給部材は、
第1空間を有するボディー部と、
前記第1空間から延長される第2空間を有し、前記プラズマを吐出する吐出部と、を含み、
前記供給部材の吐出口は、前記吐出部に提供される部品洗浄方法。 - 前記冷媒が前記供給部材内に導入される位置は、前記洗浄ガスが前記供給部材内に導入される位置より前記供給部材の前記吐出口にさらに近い請求項1に記載の部品洗浄方法。
- 前記冷媒は、液状の純水を含む請求項2に記載の部品洗浄方法。
- 前記冷媒は、噴霧形態に供給される請求項2に記載の部品洗浄方法。
- 前記冷媒は、前記プラズマが吐出されるうちに継続的に供給される請求項2に記載の部品洗浄方法。
- 前記冷媒は、前記プラズマの温度が既設定範囲を逸脱すれば、供給される請求項2に記載の部品洗浄方法。
- 前記部品洗浄装置は、
前記供給部材内に洗浄ガスを供給するガス供給部材と、
前記供給部材内に提供された前記洗浄ガスからプラズマを形成するプラズマソースと、
前記供給部材内に冷媒を供給する冷媒供給部材と、をさらに含む請求項2に記載の部品洗浄方法。 - 前記洗浄ガスは、前記第1空間に導入され、
前記冷媒は、前記第2空間に導入される請求項1乃至請求項7のいずれかの一項に記載の部品洗浄方法。 - 前記第2空間は、前記第1空間から垂直になる方向に延長される請求項1乃至請求項7のいずれかの一項に記載の部品洗浄方法。
- 前記部品は、セラミックがコーティングされた金属を含む請求項1乃至請求項9のいずれかの一項に記載の部品洗浄方法。
- 基板処理装置の部品を洗浄する装置(部品洗浄装置)であって、
プラズマを供給する供給部材と、
前記供給部材内に洗浄ガスを供給するガス供給部材と、
前記供給部材内に提供された前記洗浄ガスからプラズマを形成するプラズマソースと、
前記供給部材内に冷媒を供給する冷媒供給部材と、を含み、
前記冷媒は、前記プラズマより低い温度に提供され、
前記供給部材は、
第1空間を有するボディー部と、
前記第1空間から延長される第2空間を有し、前記プラズマを吐出する吐出部と、を含み、
前記吐出部に形成された吐出口を通じて前記冷媒と前記プラズマが共に吐出される部品洗浄装置。 - 前記洗浄ガスは、前記第1空間に導入され、
前記冷媒は、前記第2空間に導入される請求項11に記載の部品洗浄装置。 - 前記第2空間は、前記第1空間から垂直になる方向に延長される請求項12に記載の部品洗浄装置。
- 前記冷媒供給部材は、前記冷媒を噴霧方式に前記第2空間に供給する請求項12に記載の部品洗浄装置。
- 前記冷媒は、液状の純水を含む請求項11に記載の部品洗浄装置。
- 前記装置は、
前記洗浄ガスが供給されるうちに前記冷媒が継続的に供給されるように前記ガス供給部材及び前記冷媒供給部材を制御する制御器をさらに含む請求項11に記載の部品洗浄装置。 - 前記装置は、
前記部品に供給される前記プラズマの温度を測定するセンサーと、
前記センサーから受信された温度情報に基づいて前記ガス供給部材及び前記冷媒供給部材を制御する制御器と、をさらに含み、
前記制御器は、前記温度情報が既設定範囲を逸脱すれば、前記供給部材に前記冷媒が供給されるように前記冷媒供給部材を制御する請求項11に記載の部品洗浄装置。 - 前記部品は、セラミックがコーティングされた金属を含む請求項11乃至請求項17のいずれかの一項に記載の部品洗浄装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020200019876A KR102410743B1 (ko) | 2020-02-18 | 2020-02-18 | 부품 세정 방법 및 장치 |
KR10-2020-0019876 | 2020-02-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021132206A JP2021132206A (ja) | 2021-09-09 |
JP7285870B2 true JP7285870B2 (ja) | 2023-06-02 |
Family
ID=77272983
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021019845A Active JP7285870B2 (ja) | 2020-02-18 | 2021-02-10 | 部品洗浄方法及び装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US11967491B2 (ja) |
JP (1) | JP7285870B2 (ja) |
KR (1) | KR102410743B1 (ja) |
CN (1) | CN113345816A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20230390811A1 (en) * | 2022-06-06 | 2023-12-07 | Applied Materials, Inc. | Throttle valve and foreline cleaning using a microwave source |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008027657A (ja) | 2006-07-19 | 2008-02-07 | Tokyo Institute Of Technology | プラズマ源、処理装置及び処理方法 |
JP2009302401A (ja) | 2008-06-16 | 2009-12-24 | Tokyo Seimitsu Co Ltd | チャックテーブル洗浄方法、チャックテーブル洗浄装置及び半導体ウェーハ平面加工装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990081141A (ko) | 1998-04-27 | 1999-11-15 | 김영환 | 반도체 세정장비의 부품세척장치 |
US20090159573A1 (en) | 2007-12-21 | 2009-06-25 | Kyu Ok Hwang | Four surfaces cooling block |
JP5750767B2 (ja) * | 2009-10-09 | 2015-07-22 | 国立大学法人東北大学 | 薄膜とその形成方法、及びその薄膜を備えた半導体発光素子 |
JP6169040B2 (ja) * | 2014-05-12 | 2017-07-26 | 東京エレクトロン株式会社 | プラズマ処理装置の上部電極構造、プラズマ処理装置、及びプラズマ処理装置の運用方法 |
KR20160070929A (ko) * | 2014-12-10 | 2016-06-21 | 삼성디스플레이 주식회사 | 표시 장치 제조 장치 및 표시 장치 제조 방법 |
KR101909482B1 (ko) | 2016-08-01 | 2018-10-19 | 세메스 주식회사 | 기판 처리 장치의 부품 세정 방법 |
KR20180042876A (ko) | 2016-10-18 | 2018-04-27 | 주식회사 원익아이피에스 | 기판 처리 장치 |
KR101884857B1 (ko) | 2016-10-27 | 2018-08-02 | 세메스 주식회사 | 버퍼 유닛 및 이를 가지는 기판 처리 설비 |
US10672594B2 (en) * | 2016-11-01 | 2020-06-02 | Ontos Equipment Systems, Inc. | System and method for plasma head thermal control |
KR102029011B1 (ko) | 2017-09-11 | 2019-10-07 | 주식회사 솔텍코리아 | 박막 증착물 세정장치 |
KR101997509B1 (ko) | 2017-11-17 | 2019-07-08 | 김광석 | 포토마스크 표면 이물질 세정방법 |
KR102065349B1 (ko) | 2018-05-31 | 2020-01-13 | 세메스 주식회사 | 기판 처리 방법 및 장치 |
-
2020
- 2020-02-18 KR KR1020200019876A patent/KR102410743B1/ko active IP Right Grant
-
2021
- 2021-02-10 JP JP2021019845A patent/JP7285870B2/ja active Active
- 2021-02-16 US US17/177,135 patent/US11967491B2/en active Active
- 2021-02-18 CN CN202110190117.0A patent/CN113345816A/zh active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008027657A (ja) | 2006-07-19 | 2008-02-07 | Tokyo Institute Of Technology | プラズマ源、処理装置及び処理方法 |
JP2009302401A (ja) | 2008-06-16 | 2009-12-24 | Tokyo Seimitsu Co Ltd | チャックテーブル洗浄方法、チャックテーブル洗浄装置及び半導体ウェーハ平面加工装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20210105489A (ko) | 2021-08-27 |
CN113345816A (zh) | 2021-09-03 |
US11967491B2 (en) | 2024-04-23 |
KR102410743B1 (ko) | 2022-06-21 |
JP2021132206A (ja) | 2021-09-09 |
US20210257193A1 (en) | 2021-08-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101495288B1 (ko) | 기판 처리 장치 및 방법 | |
US11145534B2 (en) | Support unit and substrate treating apparatus comprising the same | |
JP7320874B2 (ja) | 基板処理装置及び基板処理方法 | |
KR20210115861A (ko) | 기판 처리 장치 및 기판 처리 방법 | |
KR102083854B1 (ko) | 기판 처리 장치 및 기판 처리 방법 | |
JP7285870B2 (ja) | 部品洗浄方法及び装置 | |
KR20190117247A (ko) | 기판 처리 장치 및 기판 처리 방법 | |
KR101853367B1 (ko) | 배기 배플, 그리고 이를 가지는 기판 처리 장치 및 방법 | |
KR101970981B1 (ko) | 지지 유닛, 기판 처리 장치 및 기판 처리 방법 | |
US20210074519A1 (en) | Heat medium circulation system and substrate processing apparatus | |
KR101605719B1 (ko) | 기판 처리 장치 및 기판 처리 방법 | |
KR100837625B1 (ko) | 기판 처리 장치 및 방법 | |
KR20190046327A (ko) | 기판 처리 장치 및 기판 처리 방법 | |
KR102290908B1 (ko) | 기판 처리 장치 및 플라즈마 처리 방법 | |
KR102152905B1 (ko) | 부품 세정 방법 및 장치 | |
KR101909484B1 (ko) | 기판 처리 장치 | |
KR20160134920A (ko) | 기판 처리 장치 및 기판 처리 방법 | |
KR101934985B1 (ko) | 기판 처리 장치 및 이의 표면을 안정화시키는 방법 | |
KR20210046150A (ko) | 기판 처리 시스템 및 방법 | |
US20230130652A1 (en) | Substrate treating method and chamber cleaning method | |
US20240096603A1 (en) | Apparatus for treating substrate | |
KR102275078B1 (ko) | 기판 처리 장치 그리고 기판 처리 방법 | |
KR20220044705A (ko) | 샤워 헤드 유닛 및 이를 구비하는 기판 처리 시스템 | |
KR20240037737A (ko) | 기판 처리 장치 및 기판 처리 방법 | |
KR20240037738A (ko) | 기판 처리 장치 및 기판 처리 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210928 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20221206 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230303 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230516 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230523 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7285870 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |