JP7241027B2 - レーザ生成プラズマ源 - Google Patents

レーザ生成プラズマ源 Download PDF

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Publication number
JP7241027B2
JP7241027B2 JP2019558698A JP2019558698A JP7241027B2 JP 7241027 B2 JP7241027 B2 JP 7241027B2 JP 2019558698 A JP2019558698 A JP 2019558698A JP 2019558698 A JP2019558698 A JP 2019558698A JP 7241027 B2 JP7241027 B2 JP 7241027B2
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JP
Japan
Prior art keywords
pulse
radiation
seed laser
polarizer
laser module
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2019558698A
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English (en)
Japanese (ja)
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JP2020519934A (ja
Inventor
ホフストラ，ラモン，マーク
スウィンケルズ，ゲラルドス，ヒューベルタス，ペトラス，マリア
モールス，ヨハネス，フベルトゥス，ヨセフィナ
クリアリー，ポール，ウィリアム
ドリーエーンハイゼン，ベルト，ピーター ヴァン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
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ASML Netherlands BV
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Publication of JP2020519934A publication Critical patent/JP2020519934A/ja
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Publication of JP7241027B2 publication Critical patent/JP7241027B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0064—Anti-reflection devices, e.g. optical isolaters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2019558698A 2017-05-10 2018-04-17 レーザ生成プラズマ源 Active JP7241027B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP17170322 2017-05-10
EP17170322.6 2017-05-10
PCT/EP2018/059775 WO2018206244A1 (fr) 2017-05-10 2018-04-17 Source de plasma produit par laser

Publications (2)

Publication Number Publication Date
JP2020519934A JP2020519934A (ja) 2020-07-02
JP7241027B2 true JP7241027B2 (ja) 2023-03-16

Family

ID=58699051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019558698A Active JP7241027B2 (ja) 2017-05-10 2018-04-17 レーザ生成プラズマ源

Country Status (4)

Country Link
JP (1) JP7241027B2 (fr)
CN (1) CN110612482B (fr)
NL (1) NL2020778A (fr)
WO (1) WO2018206244A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2024009A (en) * 2018-10-18 2020-05-07 Asml Netherlands Bv Control of optical modulator

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011516913A (ja) 2008-03-31 2011-05-26 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド 複数のビームを結合し、繰り返し率と平均パワーが高い偏光レーザビームを形成する方法
JP2013093308A (ja) 2011-10-05 2013-05-16 Gigaphoton Inc 極端紫外光生成装置および極端紫外光生成方法
JP2015531544A (ja) 2012-09-07 2015-11-02 エーエスエムエル ネザーランズ ビー．ブイ． シードレーザモード安定化のためのシステムおよび方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003192A1 (nl) * 2008-07-30 2010-02-02 Asml Netherlands Bv Alignment of collector device in lithographic apparatus.
NL2004837A (en) * 2009-07-09 2011-01-10 Asml Netherlands Bv Radiation system and lithographic apparatus.
JP2013229553A (ja) * 2012-03-30 2013-11-07 Gigaphoton Inc レーザ装置及び極端紫外光生成装置
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
US9625824B2 (en) * 2015-04-30 2017-04-18 Taiwan Semiconductor Manufacturing Company, Ltd Extreme ultraviolet lithography collector contamination reduction

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011516913A (ja) 2008-03-31 2011-05-26 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド 複数のビームを結合し、繰り返し率と平均パワーが高い偏光レーザビームを形成する方法
JP2013093308A (ja) 2011-10-05 2013-05-16 Gigaphoton Inc 極端紫外光生成装置および極端紫外光生成方法
JP2015531544A (ja) 2012-09-07 2015-11-02 エーエスエムエル ネザーランズ ビー．ブイ． シードレーザモード安定化のためのシステムおよび方法

Also Published As

Publication number Publication date
WO2018206244A1 (fr) 2018-11-15
JP2020519934A (ja) 2020-07-02
CN110612482A (zh) 2019-12-24
CN110612482B (zh) 2022-04-26
NL2020778A (en) 2018-11-14

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