JP7216070B2 - 機能被覆の上の保護層 - Google Patents
機能被覆の上の保護層 Download PDFInfo
- Publication number
- JP7216070B2 JP7216070B2 JP2020505768A JP2020505768A JP7216070B2 JP 7216070 B2 JP7216070 B2 JP 7216070B2 JP 2020505768 A JP2020505768 A JP 2020505768A JP 2020505768 A JP2020505768 A JP 2020505768A JP 7216070 B2 JP7216070 B2 JP 7216070B2
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- JP
- Japan
- Prior art keywords
- transparent conductive
- conductive oxide
- film
- protective
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000576 coating method Methods 0.000 title claims description 98
- 239000011248 coating agent Substances 0.000 title claims description 93
- 239000011241 protective layer Substances 0.000 title description 105
- 239000010410 layer Substances 0.000 claims description 318
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 186
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 164
- 239000000758 substrate Substances 0.000 claims description 155
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 152
- 230000001681 protective effect Effects 0.000 claims description 133
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 123
- 238000000034 method Methods 0.000 claims description 106
- 239000011253 protective coating Substances 0.000 claims description 100
- 239000012528 membrane Substances 0.000 claims description 85
- 239000000377 silicon dioxide Substances 0.000 claims description 81
- 239000011787 zinc oxide Substances 0.000 claims description 76
- 239000000203 mixture Substances 0.000 claims description 71
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 55
- 229910001887 tin oxide Inorganic materials 0.000 claims description 55
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 48
- 238000000151 deposition Methods 0.000 claims description 45
- 229910003437 indium oxide Inorganic materials 0.000 claims description 30
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 claims description 17
- 239000002346 layers by function Substances 0.000 claims description 16
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 10
- 229910052709 silver Inorganic materials 0.000 claims description 10
- 239000004332 silver Substances 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 239000000463 material Substances 0.000 description 134
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 50
- 239000001301 oxygen Substances 0.000 description 50
- 229910052760 oxygen Inorganic materials 0.000 description 50
- 239000011521 glass Substances 0.000 description 38
- 238000010438 heat treatment Methods 0.000 description 29
- 239000011701 zinc Substances 0.000 description 27
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 24
- 229910052725 zinc Inorganic materials 0.000 description 22
- 229910052718 tin Inorganic materials 0.000 description 21
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 20
- 229910052782 aluminium Inorganic materials 0.000 description 20
- 239000000523 sample Substances 0.000 description 19
- 229910044991 metal oxide Inorganic materials 0.000 description 18
- 150000004706 metal oxides Chemical class 0.000 description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 17
- 230000005540 biological transmission Effects 0.000 description 16
- 229910045601 alloy Inorganic materials 0.000 description 13
- 239000000956 alloy Substances 0.000 description 13
- 229910052710 silicon Inorganic materials 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 238000005137 deposition process Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 229910052719 titanium Inorganic materials 0.000 description 11
- 239000010936 titanium Substances 0.000 description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 9
- 238000000137 annealing Methods 0.000 description 9
- 229910052738 indium Inorganic materials 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- 238000001771 vacuum deposition Methods 0.000 description 8
- 229910052726 zirconium Inorganic materials 0.000 description 8
- 229910010052 TiAlO Inorganic materials 0.000 description 7
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 7
- 229910052735 hafnium Inorganic materials 0.000 description 7
- 238000001755 magnetron sputter deposition Methods 0.000 description 7
- 229910052758 niobium Inorganic materials 0.000 description 7
- 239000010955 niobium Substances 0.000 description 7
- 230000005855 radiation Effects 0.000 description 7
- -1 Polypropylene terephthalate Polymers 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 229910052797 bismuth Inorganic materials 0.000 description 6
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 5
- 229910001092 metal group alloy Inorganic materials 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 238000005496 tempering Methods 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 229910001297 Zn alloy Inorganic materials 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- 229910005728 SnZn Inorganic materials 0.000 description 2
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 229910000416 bismuth oxide Inorganic materials 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 2
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910001347 Stellite Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000788 chromium alloy Substances 0.000 description 1
- AHICWQREWHDHHF-UHFFFAOYSA-N chromium;cobalt;iron;manganese;methane;molybdenum;nickel;silicon;tungsten Chemical compound C.[Si].[Cr].[Mn].[Fe].[Co].[Ni].[Mo].[W] AHICWQREWHDHHF-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000013068 control sample Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001483 poly(ethyl methacrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3642—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing a metal layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
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- C03C2217/00—Coatings on glass
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- C03C2217/00—Coatings on glass
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- C—CHEMISTRY; METALLURGY
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- C03C2217/00—Coatings on glass
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- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/948—Layers comprising indium tin oxide [ITO]
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Description
ガラス基材を下層及び透明導電性酸化物層で被覆した。下層は、第1の下層膜及び第2の下層膜を有した。第1の下層膜は、ガラス基材の上のスズ酸亜鉛であり、第2の下層膜は、第1の下層膜の上のシリカ-アルミナ合金であり、約85重量パーセントのシリカ及び15重量パーセントのアルミナを有した。第2の下層膜の上の透明導電性酸化物層は、スズでドープされた酸化インジウム(「ITO」)であった。
ガラス基材を透明導電性酸化物層で被覆した。透明導電性酸化物は、ガリウムでドープされた酸化亜鉛(「GZO」)であった。異なるGZO厚さを有するいくつかのサンプルを準備し、サンプルについてのシート抵抗を測定し、蒸着時GZOのシート抵抗に対する蒸着後処理の効果を比較した。蒸着後プロセスは、被覆物品を炉に入れることであった。フラッシュ・アニーリングの前後に各サンプルのシート抵抗を試験し、結果を図9に示す。試験したサンプルについての厚さ及びシート抵抗を以下の表3に挙げる。
ガラス基材を、アルミニウムでドープされた酸化亜鉛(「AZO」)の透明導電性酸化物層で被覆した。異なるAZO厚さを有するいくつかのサンプルを準備し、サンプルについてのシート抵抗を測定し、蒸着時AZOのシート抵抗に対する蒸着後処理の効果を比較した。蒸着後プロセスは、被覆物品を炉に入れることを伴った。フラッシュ・アニーリングの前後に各サンプルのシート抵抗を試験し、結果を図10に示す。試験したサンプルについての厚さ及びシート抵抗を以下の表4に挙げる。
FILM STARを使用して、様々な下層厚さを試験し、どの厚さが許容可能な色又は中間色を提供するかを判定した。下層及び透明導電性酸化物を有するガラス基材を使用した。下層は、第1の膜及び第2の膜を有した。第1の下層膜は、ガラス基材の上のスズ酸亜鉛であり、第2の下層膜は、第1の下層膜の上のシリカ-アルミナ合金であり、約85重量パーセントのシリカ及び15重量パーセントのアルミナを有した。第2の下層膜の上の透明導電性酸化物層は、厚さ170nmのスズでドープされた酸化インジウム(「ITO」)層であった。
FILM STARを使用して、透明導電性酸化物層の変動する厚さを試験し、下層についての適当な厚さを判定した。この例では、FILM STARパラメータは、第1の下層膜及び第2の下層膜を有する下層で被覆されたガラス基材を含んだ。第1の下層膜はスズ酸亜鉛であり、第2の下層膜はシリカであった。第2の下層膜の上の透明導電性酸化物層は、スズでドープされた酸化インジウム(「ITO」)であった。ITO層の上に、シリカの保護層が位置した。表6及び図12は、試験したサンプルを示す。表6は、ITO層及びSiO2層に関してFILM STARに入力した値を示す。出力は、-1、-1(a*、b*)の色を提供するはずの2つの下層膜についての厚さを提供した。
様々な深さ及び厚さにおける埋込み膜の効果を試験し、埋込み層のない透明導電性酸化物層と比較した。ガラス基材を底部透明導電性酸化物膜で被覆した。底部透明導電性酸化物膜は、スズでドープされた酸化インジウム(「ITO」)から作製され、厚さ120nm、180nm、又は240nmであった。底部透明導電性酸化物層の上に、埋込み膜を付着させた。埋込み膜は、厚さ15nm又は30nmであり、スズ酸亜鉛膜であった。埋込み膜の上に、頂部透明導電性酸化物膜を付着させた。頂部透明導電性酸化物膜はITOであり、厚さ240nm、180nm、又は120nmであった。底部及び頂部の透明導電性酸化物膜の総計厚さは360nmであった。対照のために、基材の上に、埋込み膜を含まないITO酸化物を360nmの厚さで付着させた。550nmにおけるシート抵抗及び透過率をサンプルに対して測定した。これらのサンプルを以下の表7及び図13に挙げる。
この例では、様々な保護層を調査した。ガラス基材の上に、保護層を配置した。被覆物品は、基材と保護層との間に、アルミニウムでドープされた酸化亜鉛の透明導電性酸化物を含んだ。下層、機能層、又は透明導電性酸化物層が観察結果に影響しないとは予期されないはずである。
透明導電性酸化物が様々な雰囲気中でスパッタリングされたサンプルを試験した。図16~図20に示すように、マグネトロン・スパッタリング真空蒸着(「MSVD」)方法を介して、ガラス基材を、インジウムでドープされた酸化スズ(「ITO」)又はアルミニウムでドープされた酸化亜鉛(「AZO」)で被覆した。ITOサンプルは、0%、0.5%、1%、1.5%、又は2%の酸素を含有した雰囲気中でスパッタリングし、その後熱処理し、AZOサンプルは、0%、1%、2%、3%、4%、5%、又は6%の酸素を含有した雰囲気中でスパッタリングし、その後熱処理した。雰囲気の残りはアルゴンであった。ITOサンプルは、225nm、175nm、又は150nmのITO厚さを有し、AZOサンプルは、基材上に付着されたAZOの300nm~350nmの厚さを有した。これらのサンプルを試験して、放射率、吸収率、及び/又はシート抵抗を判定した(放射率は伝導率の測度である)。サンプルの透明導電性酸化物表面が約30秒間で少なくとも223.9℃(435°F)に到達するような期間にわたって被覆物品を炉に入れることによって、これらのサンプルを熱処理した。
マグネトロン・スパッタリング真空蒸着(「MSVD」)プロセスによって、ガラス基材を、アルミニウムでドープされた酸化亜鉛層で被覆した。ターゲットは、特定の量の酸素を含有するセラミック・アルミニウムでドープされた酸化亜鉛であった。MSVDプロセスを使用して透明導電性酸化物などの材料を蒸着させるとき、このプロセスはセラミック原材料を解離させ、場合により酸素の一部を逃す。蒸着した材料が酸化することを確実にするために、多くの場合、不活性ガスともに被覆チャンバへ酸素が供給される。この例では、MSVDによって被覆チャンバ内でAZOが蒸着され、チャンバに供給される酸素含有率は0%、1%、2%、3%、4%、5%、又は6%であった。被覆チャンバに供給される雰囲気の残りはアルゴンであったが、任意の不活性ガスを使用することができる。被覆の正規化吸収率を判定した。図18に示すように、0%の酸素が被覆チャンバに供給されるとき、550nmの正規化吸収率が最善であった。1%の酸素が被覆チャンバに供給されるときも許容可能であった。図18に示すデータに基づいて、被覆チャンバ内の酸素が0.5%未満である場合、1%の酸素が使用されるときより著しく良好な吸収率を提供することが推定されるはずである。
被覆物品の蒸着後加熱に伴う1つの問題は、無駄になるエネルギーの量である。上記で論じたように、透明導電性酸化物(「TCO」)層の蒸着後加熱は、より小さい厚さで改善された性能を提供する。被覆物品を炉に入れて物品全体を加熱するとき、TCO層を結晶化するために必要な温度を超えるとエネルギーが無駄になる。透明導電性酸化物層の性能を改善するために必要とされる表面温度を判定するために、ガラス基材を、厚さ115nm又は厚さ171nmのインジウムでドープされた酸化スズで被覆した。サンプルは、表11及び表12に挙げる温度まで加熱されたITO層の表面を有した。この実験の目的で、被覆物品全体を炉に入れることによって表面を加熱したが、代替としてフラッシュ・ランプを使用することもできる。
Claims (18)
- 基材と、前記基材の少なくとも一部分の上に少なくとも1つの透明導電性酸化物層を含む機能層と、前記機能層の少なくとも一部分の上の第1の保護膜であって、アルミナ、シリカ、又はこれらの混合物を含む第1の保護膜と、第1の保護膜の少なくとも一部分の上の第2の保護膜であって、チタニア及びアルミナを含み、最も外側の膜である第2の保護膜とを含む被覆物品。
- 前記第2の保護膜が、35~65重量パーセントのチタニアを含む、請求項1に記載の被覆物品。
- 前記第2の保護膜が、45~55重量パーセントのチタニアを含む、請求項1に記載の被覆物品。
- 前記第2の保護膜が、65~35重量パーセントのアルミナを含む、請求項1に記載の被覆物品。
- 前記第2の保護膜が、55~45重量パーセントのアルミナを含む、請求項1に記載の被覆物品。
- 前記透明導電性酸化物層が、アルミニウムでドープされた酸化亜鉛、ガリウムでドープされた酸化亜鉛、及びスズでドープされた酸化インジウムからなる群から選択される、請求項1に記載の被覆物品。
- 前記機能層が、銀、金、パラジウム、銅、又はこれらの混合物からなる群から選択された金属を含む、請求項1に記載の被覆物品。
- 基材と、前記基材の少なくとも一部分の上に少なくとも1つの透明導電性酸化物層を含む機能層と、前記機能層の少なくとも一部分の上の第1の保護膜であって、チタニア、アルミナ、酸化亜鉛、スズ酸亜鉛、酸化スズ、ジルコニア、シリカ、又はこれらの混合物を含む第1の保護膜と、第1の保護膜の少なくとも一部分の上の第2の保護膜であって、チタニア及びアルミナを含み、最も外側の膜である第2の保護膜と、前記第1の保護膜と前記第2の保護膜との間に位置決めされた第3の保護膜であって、前記第3の保護膜が、シリカ、アルミナ、又はこれらの混合物を含む、第3の保護膜とを含む被覆物品。
- 前記第2の保護膜が、35~65重量パーセントのチタニアを含む、請求項8に記載の被覆物品。
- 前記第2の保護膜が、45~55重量パーセントのチタニアを含む、請求項8に記載の被覆物品。
- 前記第2の保護膜が、65~35重量パーセントのアルミナを含む、請求項8に記載の被覆物品。
- 前記第2の保護膜が、55~45重量パーセントのアルミナを含む、請求項8に記載の被覆物品。
- 前記第1の保護膜が、シリカ及びアルミナを含む、請求項8に記載の被覆物品。
- 前記透明導電性酸化物層が、アルミニウムでドープされた酸化亜鉛、ガリウムでドープされた酸化亜鉛、及びスズでドープされた酸化インジウムからなる群から選択される、請求項8に記載の被覆物品。
- 前記機能層が、銀、金、パラジウム、銅、又はこれらの混合物からなる群から選択された金属を含む、請求項8に記載の被覆物品。
- 機能被覆を保護する方法であって、少なくとも1つの透明導電性酸化物層を含む機能被覆で被覆された物品を提供するステップと、前記機能被覆の少なくとも一部分の上に第1の保護膜を付着させるステップであり、前記第1の保護膜がチタニア、アルミナ、酸化亜鉛、酸化スズ、ジルコニア、シリカ、又はこれらの混合物を含む、第1の保護膜を付着させるステップと、第1の保護膜の少なくとも一部分の上に第2の保護膜を付着させるステップであり、前記第2の保護膜がチタニア及びアルミナを含む、第2の保護膜を付着させるステップとを含む方法。
- 前記第1の保護膜の少なくとも一部分の上に、前記第1の保護膜と前記第2の保護膜との間に位置決めされた第3の保護膜を付着させるステップをさらに含み、前記第3の保護膜が、アルミナ、シリカ、又はこれらの混合物を含む、請求項16に記載の方法。
- 前記第1の保護膜が前記機能被覆に直接接触しており、前記第2の保護膜が前記第1の保護膜に直接接触しており、前記第2の保護膜が前記物品上の最も外側の膜であり、前記第1の保護膜が、アルミナ、シリカ、又はこれらの混合物を含む、請求項16に記載の方法。
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AU (2) | AU2018311059B2 (ja) |
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CA (1) | CA3072069A1 (ja) |
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ES (1) | ES2882379T3 (ja) |
MX (1) | MX2020001401A (ja) |
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FR3087382B1 (fr) * | 2018-10-18 | 2022-09-09 | Saint Gobain | Vitrage comprenant un revetement fonctionnel et un revetement absorbant d'ajustement colorimetrique |
KR20200093737A (ko) * | 2019-01-28 | 2020-08-06 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조 방법 |
US11454440B2 (en) | 2019-07-12 | 2022-09-27 | Cardinal Cg Company | Bus bar connection and coating technology |
CN114401932A (zh) * | 2019-09-18 | 2022-04-26 | 日本板硝子株式会社 | 带低辐射层积膜的玻璃板和玻璃产品 |
US20220119934A1 (en) * | 2020-10-21 | 2022-04-21 | Vitro Flat Glass Llc | Heat-Treatable Coating with Blocking Layer Having Reduced Color Shift |
WO2023064111A1 (en) | 2021-10-11 | 2023-04-20 | Vitro Flat Glass Llc | Heat-treatable coating having reduced haze |
CN115558904A (zh) * | 2022-10-11 | 2023-01-03 | 兰州空间技术物理研究所 | 一种空间用防静电复合原子氧防护涂层 |
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US20190043640A1 (en) | 2019-02-07 |
EP3907200A1 (en) | 2021-11-10 |
BR112020002350B1 (pt) | 2024-03-12 |
AU2018311059A1 (en) | 2020-02-20 |
JP2020529383A (ja) | 2020-10-08 |
CN111164057A (zh) | 2020-05-15 |
EP3661885B1 (en) | 2021-06-30 |
ES2882379T3 (es) | 2021-12-01 |
KR20240033118A (ko) | 2024-03-12 |
AU2024200131A1 (en) | 2024-01-25 |
BR112020002350A2 (pt) | 2020-09-01 |
EP3661885A1 (en) | 2020-06-10 |
MY196379A (en) | 2023-03-27 |
KR20200038277A (ko) | 2020-04-10 |
SG11202000947PA (en) | 2020-02-27 |
CA3072069A1 (en) | 2019-02-07 |
MX2020001401A (es) | 2021-02-09 |
AU2018311059B2 (en) | 2023-10-12 |
CO2020002401A2 (es) | 2020-04-01 |
JP2023041739A (ja) | 2023-03-24 |
KR102642712B1 (ko) | 2024-03-05 |
WO2019028296A1 (en) | 2019-02-07 |
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