JP7208787B2 - 照明光学系、露光装置、および物品の製造方法 - Google Patents

照明光学系、露光装置、および物品の製造方法 Download PDF

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Publication number
JP7208787B2
JP7208787B2 JP2018243789A JP2018243789A JP7208787B2 JP 7208787 B2 JP7208787 B2 JP 7208787B2 JP 2018243789 A JP2018243789 A JP 2018243789A JP 2018243789 A JP2018243789 A JP 2018243789A JP 7208787 B2 JP7208787 B2 JP 7208787B2
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Japan
Prior art keywords
illumination
light
optical system
pupil plane
area
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JP2018243789A
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English (en)
Japanese (ja)
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JP2020106622A (ja
Inventor
諒 中山
大輔 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2018243789A priority Critical patent/JP7208787B2/ja
Priority to KR1020190163564A priority patent/KR102612692B1/ko
Priority to CN201911333037.5A priority patent/CN111381455B/zh
Publication of JP2020106622A publication Critical patent/JP2020106622A/ja
Application granted granted Critical
Publication of JP7208787B2 publication Critical patent/JP7208787B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2018243789A 2018-12-26 2018-12-26 照明光学系、露光装置、および物品の製造方法 Active JP7208787B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018243789A JP7208787B2 (ja) 2018-12-26 2018-12-26 照明光学系、露光装置、および物品の製造方法
KR1020190163564A KR102612692B1 (ko) 2018-12-26 2019-12-10 조명 광학계, 노광 장치, 및 물품의 제조 방법
CN201911333037.5A CN111381455B (zh) 2018-12-26 2019-12-23 照明光学系统、曝光装置以及产品的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018243789A JP7208787B2 (ja) 2018-12-26 2018-12-26 照明光学系、露光装置、および物品の製造方法

Publications (2)

Publication Number Publication Date
JP2020106622A JP2020106622A (ja) 2020-07-09
JP7208787B2 true JP7208787B2 (ja) 2023-01-19

Family

ID=71219671

Family Applications (1)

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JP2018243789A Active JP7208787B2 (ja) 2018-12-26 2018-12-26 照明光学系、露光装置、および物品の製造方法

Country Status (3)

Country Link
JP (1) JP7208787B2 (zh)
KR (1) KR102612692B1 (zh)
CN (1) CN111381455B (zh)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001284240A (ja) 2000-04-03 2001-10-12 Canon Inc 照明光学系、および該照明光学系を備えた投影露光装置と該投影露光装置によるデバイスの製造方法
JP2002158157A (ja) 2000-11-17 2002-05-31 Nikon Corp 照明光学装置および露光装置並びにマイクロデバイスの製造方法
JP2009527112A (ja) 2006-02-17 2009-07-23 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置のための照明システム

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08129177A (ja) * 1994-11-02 1996-05-21 Hitachi Ltd 表示装置
JP2768328B2 (ja) * 1995-10-25 1998-06-25 日本電気株式会社 映像投射装置
JP2634039B2 (ja) * 1996-03-11 1997-07-23 日本電信電話株式会社 投影露光装置
US6281967B1 (en) * 2000-03-15 2001-08-28 Nikon Corporation Illumination apparatus, exposure apparatus and exposure method
JP4545854B2 (ja) * 1999-11-05 2010-09-15 キヤノン株式会社 投影露光装置
KR101547077B1 (ko) * 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001284240A (ja) 2000-04-03 2001-10-12 Canon Inc 照明光学系、および該照明光学系を備えた投影露光装置と該投影露光装置によるデバイスの製造方法
JP2002158157A (ja) 2000-11-17 2002-05-31 Nikon Corp 照明光学装置および露光装置並びにマイクロデバイスの製造方法
JP2009527112A (ja) 2006-02-17 2009-07-23 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置のための照明システム

Also Published As

Publication number Publication date
CN111381455A (zh) 2020-07-07
KR20200080146A (ko) 2020-07-06
CN111381455B (zh) 2023-04-28
JP2020106622A (ja) 2020-07-09
KR102612692B1 (ko) 2023-12-12

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