JP7159011B2 - 電子線装置 - Google Patents
電子線装置 Download PDFInfo
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- JP7159011B2 JP7159011B2 JP2018210323A JP2018210323A JP7159011B2 JP 7159011 B2 JP7159011 B2 JP 7159011B2 JP 2018210323 A JP2018210323 A JP 2018210323A JP 2018210323 A JP2018210323 A JP 2018210323A JP 7159011 B2 JP7159011 B2 JP 7159011B2
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- 238000010894 electron beam technology Methods 0.000 title claims description 59
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- 238000003384 imaging method Methods 0.000 claims description 67
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
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- 238000004519 manufacturing process Methods 0.000 description 1
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- 238000010943 off-gassing Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/29—Reflection microscopes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
Claims (8)
- ステージに載置される試料に電子線を照射する照射光学系と、
前記試料に紫外線を含む光を照射する光照射ユニットと、
前記電子線が前記試料に到達する前に電子軌道が反転するよう、前記試料に負電圧を印加する試料電圧制御部と、
前記負電圧の印加により反射されたミラー電子を結像してミラー電子像を取得する結像光学系とを有し、
前記結像光学系は、前記ミラー電子像を取得するセンサと、前記センサと前記ステージとの間に設けられ、前記光照射ユニットからの光が前記センサに到達することを抑制する迷光抑制部材とを有し、
前記迷光抑制部材は、前記結像光学系の光軸が通るように配置された筒型部材であり、
前記迷光抑制部材の内壁に、前記光照射ユニットからの光が前記センサに到達することを抑制するための加工が施された電子線装置。 - 請求項1において、
対物レンズと、
前記照射光学系の前記電子線を前記対物レンズの光軸に一致させるよう偏向させるとともに、前記電子線と前記ミラー電子とを分離して前記ミラー電子を前記結像光学系の光軸に導くビームセパレータとを有する電子線装置。 - 請求項2において、
前記迷光抑制部材は、前記センサと前記ビームセパレータとの間に設けられる電子線装置。 - 請求項1において、
前記迷光抑制部材の内壁に、前記光照射ユニットからの光を散乱または反射させる凹凸が設けられた、または前記光照射ユニットからの光を吸収するコーティングがなされた電子線装置。 - 請求項1において、
前記結像光学系は、前記光照射ユニットが、前記試料に紫外線を含む光を照射することによって放出される光電子を結像して光電子像を取得する電子線装置。 - 請求項5において、
前記結像光学系は結像レンズを有し、
前記結像光学系は、前記結像レンズにより前記光電子が前記迷光抑制部材の内壁に衝突しないように制御する電子線装置。 - 請求項5において、
前記光照射ユニットは、紫外線ランプと前記紫外線ランプからの発光を所定の波長帯域に制限するフィルタとを有し、
前記結像光学系が前記光電子像を取得する際には、前記光照射ユニットは、前記フィルタを外した状態で前記紫外線ランプからの発光を前記試料に照射する電子線装置。 - 請求項1において、
前記ステージを内蔵する試料室及び前記結像光学系を内蔵するカラムを含む筐体を有し、
前記筐体の内壁に、前記光照射ユニットからの光が前記センサに到達することを抑制するための加工が施された電子線装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018210323A JP7159011B2 (ja) | 2018-11-08 | 2018-11-08 | 電子線装置 |
US16/660,152 US11515121B2 (en) | 2018-11-08 | 2019-10-22 | Electron beam device |
DE102019217080.3A DE102019217080B4 (de) | 2018-11-08 | 2019-11-06 | Elektronenstrahlvorrichtung |
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JP2018210323A JP7159011B2 (ja) | 2018-11-08 | 2018-11-08 | 電子線装置 |
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JP2020077529A JP2020077529A (ja) | 2020-05-21 |
JP7159011B2 true JP7159011B2 (ja) | 2022-10-24 |
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US (1) | US11515121B2 (ja) |
JP (1) | JP7159011B2 (ja) |
DE (1) | DE102019217080B4 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6909859B2 (ja) * | 2017-09-20 | 2021-07-28 | 株式会社日立ハイテク | 荷電粒子線装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009004114A (ja) | 2007-06-19 | 2009-01-08 | Hitachi Ltd | 検査方法および装置 |
WO2011126041A1 (ja) | 2010-04-06 | 2011-10-13 | 大学共同利用機関法人自然科学研究機構 | 複合顕微鏡装置 |
JP2013064675A (ja) | 2011-09-20 | 2013-04-11 | Hitachi Ltd | 検査装置 |
Family Cites Families (6)
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JP2007207688A (ja) | 2006-02-06 | 2007-08-16 | Hitachi High-Technologies Corp | ミラー電子顕微鏡およびミラー電子顕微鏡を用いた検査装置 |
EP2587281A4 (en) | 2010-06-23 | 2015-10-28 | Konica Minolta Advanced Layers | SOLAR HEAT PRODUCTION LAYER MIRROR AND METHOD FOR PRODUCING THE SAME AND SOLAR HEAT PRODUCTION REFLECTION DEVICE |
JP5860044B2 (ja) * | 2010-07-08 | 2016-02-16 | エフ・イ−・アイ・カンパニー | 視覚画像化および赤外画像化を行なう荷電粒子ビーム処理システム |
WO2016002003A1 (ja) | 2014-07-01 | 2016-01-07 | 株式会社日立ハイテクノロジーズ | 基板検査装置及び方法 |
WO2017158742A1 (ja) | 2016-03-16 | 2017-09-21 | 株式会社 日立ハイテクノロジーズ | 欠陥検査装置 |
DE112016006521T5 (de) | 2016-03-28 | 2018-11-22 | Hitachi High-Technologies Corporation | Ladungsträgerstrahlvorrichtung und Verfahren zum Einstellen der Ladungsträgerstrahlvorrichtung |
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2018
- 2018-11-08 JP JP2018210323A patent/JP7159011B2/ja active Active
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2019
- 2019-10-22 US US16/660,152 patent/US11515121B2/en active Active
- 2019-11-06 DE DE102019217080.3A patent/DE102019217080B4/de active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009004114A (ja) | 2007-06-19 | 2009-01-08 | Hitachi Ltd | 検査方法および装置 |
WO2011126041A1 (ja) | 2010-04-06 | 2011-10-13 | 大学共同利用機関法人自然科学研究機構 | 複合顕微鏡装置 |
JP2013064675A (ja) | 2011-09-20 | 2013-04-11 | Hitachi Ltd | 検査装置 |
Also Published As
Publication number | Publication date |
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US11515121B2 (en) | 2022-11-29 |
US20200152415A1 (en) | 2020-05-14 |
JP2020077529A (ja) | 2020-05-21 |
DE102019217080A1 (de) | 2020-05-14 |
DE102019217080B4 (de) | 2022-09-29 |
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