JP7134420B2 - 排気ガス汚染物質低減装置 - Google Patents
排気ガス汚染物質低減装置 Download PDFInfo
- Publication number
- JP7134420B2 JP7134420B2 JP2020563707A JP2020563707A JP7134420B2 JP 7134420 B2 JP7134420 B2 JP 7134420B2 JP 2020563707 A JP2020563707 A JP 2020563707A JP 2020563707 A JP2020563707 A JP 2020563707A JP 7134420 B2 JP7134420 B2 JP 7134420B2
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- Prior art keywords
- exhaust gas
- unit
- water
- scrubber
- oxidation catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000003344 environmental pollutant Substances 0.000 title claims description 40
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- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 44
- 239000007800 oxidant agent Substances 0.000 claims description 40
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
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- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 claims description 3
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
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- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
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- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
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Description
排気ガスに含まれた窒素酸化物は、下記の反応式により反応して2次酸化されて逆反応が防止される。
一酸化窒素(NO)は、第2酸化剤(LPC・Co/SiO2)と反応して二酸化窒素(NO2)に2次酸化され、二酸化窒素(NO2)と水(H2O)が反応して生成された亜硝酸(HNO2)が第2酸化剤(LPC・Co/SiO2)および酸素(O2)と反応することにより硝酸(HNO3)になり、ここにアルカリ薬品(Na+、NH4 +、Mg2+、Ca2+)等と反応して塩が形成されて逆反応が防止される。
10 排気ガス管
20 洗浄水供給管
21 清水貯蔵タンク
30 スクラッバ
30a 噴射ノズル
31 第1接触部
31a 混合機
31b 攪拌パネル
32 第2接触部
32a 液滴分離機
32b 排気ファン
33 洗浄水排出管
34 排気管
40 第1酸化ユニット
50 第2酸化ユニット
60 貯蔵部
61 循環管
62 第1濾過ユニット
63 流管
70 中和剤供給部
71 センサ部
72 制御部
80 水処理ユニット
81 第2濾過ユニット
82 酸化触媒分離ユニット
82a 隔壁
83 塩貯蔵タンク
84 第1冷却ユニット
85 分離ユニット
86 第2冷却ユニット
87 冷却器
88 フィルタユニット
89 貯蔵タンク
Claims (8)
- 海洋構造物に搭載された燃焼機関の排気ガスを供給する排気ガス管と、
洗浄水を供給する洗浄水供給管と、
前記排気ガス管と前記洗浄水供給管が連結され、内部に前記排気ガス管から供給された前記排気ガスに前記洗浄水を噴射する噴射ノズルが設置されたスクラッバと、
前記排気ガス管に第1酸化剤を噴射して前記排気ガスを1次酸化させる第1酸化ユニットと、
前記スクラッバの内部に、遷移金属水酸化物を含む無機金属化合物と、スルホキシドを含む有機化合物の混合物である酸化触媒を第2酸化剤として噴射して前記排気ガスを2次酸化させて逆反応を防止させる第2酸化ユニットと、を含み、
前記スクラッバの下部に連結され、前記スクラッバから排出される前記洗浄水と前記酸化触媒を貯蔵する貯蔵部と、
前記貯蔵部と前記洗浄水供給管との間を連結して前記洗浄水と前記酸化触媒を再循環する循環管と、をさらに含み、
前記スクラッバから排出される前記洗浄水と前記酸化触媒の混合液から塩を除去し、前記洗浄水と前記酸化触媒を再び前記スクラッバに再循環させる水処理ユニットをさらに含み、
前記水処理ユニットは、
前記混合液の供給を受けて比重差を利用して前記酸化触媒と、塩を含む洗浄水に分離する酸化触媒分離ユニットと、を含み、
前記水処理ユニットは、
前記塩を含む洗浄水の供給を受けて1次冷却させて硫酸塩を析出する第1冷却ユニットと、
前記第1冷却ユニットの後段に連結されて前記塩を含む洗浄水から固相の硫酸塩を分離するフィルタユニットと、をさらに含む、排気ガス汚染物質低減装置。 - 前記遷移金属水酸化物は、シリカナノ粒子に担持された、請求項1に記載の排気ガス汚染物質低減装置。
- 前記シリカナノ粒子と前記遷移金属水酸化物は、スルホキシドを含む有機化合物と水の混合物中に浮游する形態で存在する、請求項2に記載の排気ガス汚染物質低減装置。
- 前記遷移金属水酸化物は、コバルト(Co)、ニッケル(Ni)、銅(Cu)、鉄(Fe)、マンガン(Mn)、クロム(Cr)、ロジウム(Rh)、ルテニウム(Ru)、モリブデン(Mo)、オスミウム(Os)、白金(Pt)、タングステン(W)、亜鉛(Zn)、バナジウム(V)、チタン(Ti)、ジルコニウム(Zr)、パラジウム(Pd)、イリジウム(Ir)の中から選択された一つ以上の金属を含む、請求項1に記載の排気ガス汚染物質低減装置。
- 前記水処理ユニットは、
前記第1冷却ユニットと前記フィルタユニットとの間に設置されて比重差を利用して前記固相の硫酸塩を含まない洗浄水を分離する分離ユニットと、
前記分離ユニットから分離した前記固相の硫酸塩を含まない洗浄水を前記第1冷却ユニットより低い温度に2次冷却させて硫酸塩を析出する第2冷却ユニットと、をさらに含む
、請求項1に記載の排気ガス汚染物質低減装置。 - 前記第2冷却ユニットを通過した洗浄水は再び前記分離ユニットに供給される、請求項5に記載の排気ガス汚染物質低減装置。
- 前記スクラッバは、
上部が前記排気ガス管と連通され、前記排気ガスの流動方向に沿って前記排気ガスと前記洗浄水および前記酸化触媒を混合する攪拌パネルと混合機が少なくとも一つ設置される第1接触部と、
前記第1接触部と連通されて屈折部をなし、前記排気ガスと接して水分粒子を凝縮させる液滴分離機が設置された第2接触部と、を含む、請求項1に記載の排気ガス汚染物質低減装置。 - 前記スクラッバは、
前記液滴分離機の上段に設置されて前記排気ガスを外部に排出する排気ファンをさらに含む、請求項7に記載の排気ガス汚染物質低減装置。
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