JP7133383B2 - 蒸着マスク - Google Patents

蒸着マスク Download PDF

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Publication number
JP7133383B2
JP7133383B2 JP2018144174A JP2018144174A JP7133383B2 JP 7133383 B2 JP7133383 B2 JP 7133383B2 JP 2018144174 A JP2018144174 A JP 2018144174A JP 2018144174 A JP2018144174 A JP 2018144174A JP 7133383 B2 JP7133383 B2 JP 7133383B2
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Japan
Prior art keywords
frame
vapor deposition
mask
outer peripheral
strength
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JP2018144174A
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English (en)
Japanese (ja)
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JP2020019994A5 (https=
JP2020019994A (ja
Inventor
樹一郎 石川
裕仁 田丸
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Maxell Ltd
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Maxell Ltd
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Priority to JP2018144174A priority Critical patent/JP7133383B2/ja
Publication of JP2020019994A publication Critical patent/JP2020019994A/ja
Publication of JP2020019994A5 publication Critical patent/JP2020019994A5/ja
Priority to JP2022134603A priority patent/JP7449344B2/ja
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Publication of JP7133383B2 publication Critical patent/JP7133383B2/ja
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  • Physical Vapour Deposition (AREA)
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JP2018144174A 2018-07-31 2018-07-31 蒸着マスク Active JP7133383B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2018144174A JP7133383B2 (ja) 2018-07-31 2018-07-31 蒸着マスク
JP2022134603A JP7449344B2 (ja) 2018-07-31 2022-08-26 枠体および蒸着マスク

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JP2018144174A JP7133383B2 (ja) 2018-07-31 2018-07-31 蒸着マスク

Related Child Applications (1)

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JP2022134603A Division JP7449344B2 (ja) 2018-07-31 2022-08-26 枠体および蒸着マスク

Publications (3)

Publication Number Publication Date
JP2020019994A JP2020019994A (ja) 2020-02-06
JP2020019994A5 JP2020019994A5 (https=) 2021-06-17
JP7133383B2 true JP7133383B2 (ja) 2022-09-08

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ID=69587497

Family Applications (2)

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JP2018144174A Active JP7133383B2 (ja) 2018-07-31 2018-07-31 蒸着マスク
JP2022134603A Active JP7449344B2 (ja) 2018-07-31 2022-08-26 枠体および蒸着マスク

Family Applications After (1)

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JP2022134603A Active JP7449344B2 (ja) 2018-07-31 2022-08-26 枠体および蒸着マスク

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JP (2) JP7133383B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7837536B2 (ja) * 2021-11-25 2026-03-31 株式会社Magnolia White 蒸着マスクとその製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003100456A (ja) 2001-06-27 2003-04-04 Eastman Kodak Co アラインメントデバイス及び有機材料の蒸着方法
JP2005353510A (ja) 2004-06-14 2005-12-22 Canon Inc 真空蒸着マスクとその固定方法、該マスクを用いた有機ｅｌディスプレイパネルの製造方法
JP2014194062A (ja) 2013-03-29 2014-10-09 Sony Corp マスクフレームユニット、マスク装置及び処理方法
JP2018109211A (ja) 2016-12-28 2018-07-12 マクセルホールディングス株式会社 蒸着用マスク並びにその設置方法及び製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003100456A (ja) 2001-06-27 2003-04-04 Eastman Kodak Co アラインメントデバイス及び有機材料の蒸着方法
JP2005353510A (ja) 2004-06-14 2005-12-22 Canon Inc 真空蒸着マスクとその固定方法、該マスクを用いた有機ｅｌディスプレイパネルの製造方法
JP2014194062A (ja) 2013-03-29 2014-10-09 Sony Corp マスクフレームユニット、マスク装置及び処理方法
JP2018109211A (ja) 2016-12-28 2018-07-12 マクセルホールディングス株式会社 蒸着用マスク並びにその設置方法及び製造方法

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Publication number Publication date
JP2020019994A (ja) 2020-02-06
JP7449344B2 (ja) 2024-03-13
JP2022167981A (ja) 2022-11-04

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