JP7109924B2 - Display device - Google Patents

Description

The present invention relates to display devices.

Patent Document 1 describes a plurality of optical modulators arranged between a pair of light-transmitting substrates, having a predetermined refractive index anisotropy, and having different responsiveness to an electric field generated by electrodes provided on the light-transmitting substrates. A display device is described that has a light modulating layer that includes elements and a light source that causes light of a predetermined color to enter the light modulating layer from the side surface of the light modulating layer. The light modulating layer transmits incident light from the light source when no electric field is generated, and scatters and emits the incident light to the translucent substrate when an electric field is generated.

JP 2016-85452 A

In the display device described in Patent Document 1, there is a possibility that internal scattering occurs in the metal layer inside and the transmittance decreases.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a display device in which the background on the opposite side of the display panel can be visually recognized from one side and a decrease in transmittance can be suppressed.

A display device according to an aspect includes: a first translucent substrate; a second translucent substrate arranged to face the first translucent substrate; a liquid crystal layer having a polymer-dispersed liquid crystal sealed between itself and a light-transmitting substrate; a multilayer film that reflects light from the optical substrate or the second translucent substrate and absorbs light from outside the first translucent substrate or the second translucent substrate.

FIG. 1 is a perspective view showing an example of a display device according to this embodiment. FIG. 2 is a block diagram representing the display device of FIG. FIG. 3 is a timing chart for explaining the timing at which the light source emits light in the field sequential method. FIG. 4 is an explanatory diagram showing the relationship between the voltage applied to the pixel electrode and the scattering state of the pixel. 5 is a cross-sectional view showing an example of a cross section of the display device of FIG. 1. FIG. 6 is a plan view showing a plane of the display device of FIG. 1. FIG. FIG. 7 is an enlarged cross-sectional view of the liquid crystal layer portion of FIG. FIG. 8 is a cross-sectional view for explaining the non-scattering state in the liquid crystal layer. FIG. 9 is a cross-sectional view for explaining the scattering state in the liquid crystal layer. FIG. 10 is a plan view showing pixels. 11 is a cross-sectional view taken along line XV-XV' of FIG. 10. FIG. FIG. 12 is a diagram for explaining incident light from the light emitting section. 13A and 13B are explanatory diagrams for schematically explaining internal scattering caused by a metal layer inside the display device of Comparative Example 1. FIG. FIG. 14 is an explanatory diagram for schematically explaining internal scattering caused by an internal metal layer in the display device of Comparative Example 2. FIG. FIG. 15 is an explanatory diagram for schematically explaining internal scattering caused by a metal layer inside the display device of the present embodiment. FIG. 16A is an explanatory diagram for explaining the manufacturing method of the display device according to this embodiment. FIG. 16B is an explanatory diagram for explaining the manufacturing method of the display device according to this embodiment. FIG. 16C is an explanatory diagram for explaining the manufacturing method of the display device according to this embodiment. FIG. 16D is an explanatory diagram for explaining the manufacturing method of the display device according to this embodiment. FIG. 16E is an explanatory diagram for explaining the manufacturing method of the display device according to this embodiment. FIG. 17 is a cross-sectional view showing an example of the cross section of the display device according to Modification 1 of the present embodiment. FIG. 18 is a cross-sectional view showing an example of a cross section of a display device according to Modification 2 of the present embodiment. FIG. 19A is an explanatory diagram for explaining the manufacturing method of the display device according to Modification 2 of the present embodiment. FIG. 19B is an explanatory diagram for explaining the manufacturing method of the display device according to Modification 2 of the present embodiment. FIG. 19C is an explanatory diagram for explaining the manufacturing method of the display device according to Modification 2 of the present embodiment. FIG. 19D is an explanatory diagram for explaining the manufacturing method of the display device according to Modification 2 of the present embodiment. FIG. 19E is an explanatory diagram for explaining the manufacturing method of the display device according to Modification 2 of the present embodiment. FIG. 20 is a plan view showing a plane of a display device according to Modification 3 of the present embodiment. FIG. 21 is a cross-sectional view for explaining a multilayer film according to Modification 4 of the present embodiment. FIG. 22 is a plan view showing a plane of a display device according to Modification 5 of the present embodiment. 23 is a cross-sectional view taken along line XXIII-XXIII' of FIG. 22. FIG. FIG. 24 is a plan view showing a plane of a display device according to Modification 6 of the present embodiment. 25 is a cross-sectional view taken along line XXV-XXV' of FIG. 24. FIG. 26 is a cross-sectional view taken along line XXVI-XXVI' of FIG. 24. FIG.

Modes (embodiments) for carrying out the invention will be described in detail with reference to the drawings. The present disclosure is not limited by the contents described in the following embodiments. In addition, the components described below include those that can be easily assumed by those skilled in the art and those that are substantially the same. Furthermore, the components described below can be combined as appropriate. It should be noted that the disclosure is merely an example, and those skilled in the art can easily conceive of appropriate modifications while maintaining the gist of the invention are, of course, included in the scope of the present disclosure. In addition, in order to make the description clearer, the drawings may schematically show the width, thickness, shape, etc. of each part compared to the actual embodiment, but this is only an example, and the interpretation of the present disclosure is not intended. It is not limited. In addition, in this specification and each figure, the same reference numerals may be given to the same elements as those described above with respect to the existing figures, and detailed description thereof may be omitted as appropriate.

FIG. 1 is a perspective view showing an example of a display device according to this embodiment. FIG. 2 is a block diagram representing the display device of FIG. FIG. 3 is a timing chart for explaining the timing at which the light source emits light in the field sequential method.

As shown in FIG. 1, the display device 1 includes a display panel 2, a side light source device 3, a driving circuit 4 forming part of a display control section 5 (see FIG. 2) described later, and an external light setting section 93. and Here, one direction of the plane of the display panel 2 is the PX direction, the direction perpendicular to the PX direction is the PY direction, and the direction perpendicular to the PX-PY plane is the PZ direction.

The display panel 2 includes a first translucent substrate 10, a second translucent substrate 20, and a liquid crystal layer 50 (see FIG. 5). The second translucent substrate 20 is arranged facing the direction perpendicular to the surface of the first translucent substrate 10 (PZ direction shown in FIG. 1). In the liquid crystal layer 50 (see FIG. 5), a polymer-dispersed liquid crystal, which will be described later, is sealed with the first light-transmitting substrate 10, the second light-transmitting substrate 20, and the sealing portion 19. FIG.

As shown in FIG. 1, in the display panel 2, the inner side of the sealing portion 19 is the display area. A plurality of pixels Pix are arranged in a matrix in the display area. In the present disclosure, a row refers to a pixel row having m pixels Pix arranged in one direction. A column refers to a pixel column having n pixels Pix arranged in a direction orthogonal to the direction in which rows are arranged. The values of m and n are determined according to the vertical display resolution and the horizontal display resolution. A plurality of scanning lines 12 are wired for each row, and a plurality of signal lines 13 are wired for each column.

As shown in FIG. 1, a multilayer film 7 is provided on the outer surface of the second translucent substrate 20 . The multilayer film 7 reflects light from a first direction and absorbs light from a second direction different from the first direction. For example, light that propagates through the second translucent substrate 20 and reaches the multilayer film 7 is reflected into the second translucent substrate 20 at the multilayer film 7 and propagates from the outside of the second translucent substrate 20. External light 69 reaching the multilayer film 7 is absorbed by the multilayer film 7 . In this embodiment, the multilayer film 7 is arranged at a position overlapping the plurality of scanning lines 12 and the plurality of signal lines 13 in plan view. Therefore, the multilayer film 7 has a lattice shape in plan view.

The side light source device 3 has a light emitting section 31 . As shown in FIG. 2 , the light source control section 32 , the light source substrate 33 on which the light emitting section 31 and the light source control section 32 are arranged, and the driving circuit 4 constitute the display control section 5 . The light source substrate 33 is a flexible substrate, and the light source substrate 33 also functions as a wiring that electrically connects the light source controller 32 and the drive circuit 4 (see FIG. 2). The light emitting unit 31 and the light source control unit 32 are electrically connected by wiring inside the light source substrate 33 .

For example, the external light setting unit 93 is a visible light sensor that detects the external light 69 from the external light source Q and generates a signal ELV of external light information corresponding to the external light 69 . The external light setting unit 93 transmits the generated external light information signal ELV to the drive circuit 4 . The external light setting part 93 is fixed to the surface of the first translucent substrate 10 . The external light setting unit 93 can be fixed at any position as long as the external light 69 around the display panel 2 can be detected.

As shown in FIG. 1, the drive circuit 4 is fixed to the surface of the first translucent substrate 10 . As shown in FIG. 2 , the drive circuit 4 includes an analysis section 41 , a pixel control section 42 , a gate drive section 43 , a source drive section 44 and a common potential drive section 45 . The first light-transmitting substrate 10 has a larger area in the XY plane than the second light-transmitting substrate 20, and the driving circuit 4 is provided in the projecting portion of the first light-transmitting substrate 10 exposed from the second light-transmitting substrate 20 is provided.

An input signal (such as an RGB signal) VS is input to the analysis unit 41 from the image output unit 91 of the external upper control unit 9 via the flexible substrate 92 .

The analysis unit 41 includes an input signal analysis unit 411 , an external light analysis unit 412 , a storage unit 413 and a signal adjustment unit 414 . The input signal analysis unit 411 generates the first pixel input signal VCS and the light source control signal LCS based on the input signal VS input from the outside. The light source control signal LCS is, for example, a signal containing information on the amount of light of the light emitting unit 31 that is set according to the input gradation values to all the pixels Pix. For example, when a dark image is displayed, the light intensity of the light emitting unit 31 is set small. When a bright image is displayed, the light intensity of the light emitting unit 31 is set large.

The first pixel input signal VCS is a signal that determines what gradation value is given to each pixel Pix of the display panel 2 based on the video signal VS. In other words, the first pixel input signal VCS is a signal containing gradation information regarding the gradation value of each pixel Pix. The pixel control unit 42 sets the output gradation value by applying correction processing such as gamma correction and expansion processing to the input gradation value of the first pixel input signal VCS.

A signal ELV of the external light information from the external light setting unit 93 is input to the external light analysis unit 412 . The outside light analysis unit 412 generates an adjustment signal LAS corresponding to the outside light information signal ELV based on the set values stored in the storage unit 413 .

The signal adjustment unit 414 generates a light source control signal LCS according to the adjustment signal LAS as a light source control signal LCSA, sends it to the light source control unit 32, and converts the first pixel input signal VCS according to the adjustment signal LAS to the second pixel input signal. Send out the signal VCSA.

Then, the pixel control section 42 generates the horizontal drive signal HDS and the vertical drive signal VDS based on the second pixel input signal VCSA. In the present embodiment, since driving is performed by the field sequential method, the horizontal drive signal HDS and the vertical drive signal VDS are generated for each color that the light emitting section 31 can emit light.

The gate driving section 43 sequentially selects the scanning lines 12 of the display panel 2 within one vertical scanning period based on the horizontal driving signal HDS. The order of selection of the scanning lines 12 is arbitrary.

The source driving unit 44 supplies a grayscale signal corresponding to the output grayscale value of each pixel Pix to each signal line 13 of the display panel 2 within one horizontal scanning period based on the vertical drive signal VDS.

In this embodiment, the display panel 2 is an active matrix panel. For this reason, it has signal (source) lines 13 and scanning (gate) lines 12 extending in the PX direction and the PY direction in a plan view, and has switching elements Tr at the intersections of the signal lines 13 and the scanning lines 12. .

A thin film transistor is used as the switching element Tr. A bottom-gate transistor or a top-gate transistor may be used as an example of a thin film transistor. A single-gate thin film transistor is exemplified as the switching element Tr, but a double-gate transistor may be used. One of the source electrode and the drain electrode of the switching element Tr is connected to the signal line 13, the gate electrode is connected to the scanning line 12, and the other of the source electrode and the drain electrode is connected to one end of the liquid crystal capacitor LC. . The liquid crystal capacitor LC has one end connected to the switching element Tr via the pixel electrode 16 and the other end connected to the common potential COM via the common electrode 22 . A common potential COM is supplied from the common potential driver 45 .

The light emitting unit 31 includes a first color (eg, red) light emitter 34R, a second color (eg, green) light emitter 34G, and a third color (eg, blue) light emitter 34B. Based on the light source control signal LCSA, the light source control unit 32 emits light from the first color light emitter 34R, the second color light emitter 34G, and the third color light emitter 34B in a time division manner. Thus, the first color light emitter 34R, the second color light emitter 34G, and the third color light emitter 34B are driven in a so-called field sequential manner.

As shown in FIG. 3, in the first subframe (first predetermined time) RON, the light emitter 34R of the first color emits light, and the pixel Pix selected within one vertical scanning period GateScan scatters light. indicate. At this time, in the display panel 2 as a whole, if a gradation signal corresponding to the output gradation value of each pixel Pix is supplied to each signal line 13 to the pixel Pix selected within one vertical scanning period GateScan, Only the first color is lit.

Next, in the second subframe (second predetermined time) GON, the light emitter 34G of the second color emits light, and the pixel Pix selected within one vertical scanning period GateScan scatters light for display. At this time, in the display panel 2 as a whole, if a gradation signal corresponding to the output gradation value of each pixel Pix is supplied to each signal line 13 to the pixel Pix selected within one vertical scanning period GateScan, Only the second color is lit.

Further, in the third sub-frame (third predetermined time) BON, the light emitter 34B of the third color emits light, and the pixel Pix selected within one vertical scanning period GateScan scatters light for display. At this time, in the display panel 2 as a whole, if a gradation signal corresponding to the output gradation value of each pixel Pix is supplied to each signal line 13 to the pixel Pix selected within one vertical scanning period GateScan, Only the third color is lit.

Since the human eye has a limited temporal resolution and an afterimage occurs, an image composed of three colors is recognized in one frame (1F) period. The field sequential method can eliminate the need for color filters and reduce the absorption loss in the color filters, thereby achieving high transmittance. In the color filter method, one pixel is made up of sub-pixels obtained by dividing the pixel Pix for each of the first, second, and third colors. Therefore, it becomes easy to increase the resolution.

FIG. 4 is an explanatory diagram showing the relationship between the voltage applied to the pixel electrode and the scattering state of the pixel. 5 is a cross-sectional view showing an example of a cross section of the display device of FIG. 1. FIG. 6 is a plan view showing a plane of the display device of FIG. 1. FIG. FIG. 5 is a cross section taken along line V-V' of FIG. FIG. 7 is an enlarged cross-sectional view of the liquid crystal layer portion of FIG. FIG. 8 is a cross-sectional view for explaining the non-scattering state in the liquid crystal layer. FIG. 9 is a cross-sectional view for explaining the scattering state in the liquid crystal layer.

If a grayscale signal corresponding to the output grayscale value of each pixel Pix is supplied to each of the signal lines 13 described above to the pixel Pix selected within one vertical scanning period GateScan, the pixel electrode 16 is changed. When the voltage applied to the pixel electrode 16 changes, the voltage between the pixel electrode 16 and the common electrode 22 changes. Then, as shown in FIG. 4, the scattering state of the liquid crystal layer 50 for each pixel Pix is controlled according to the voltage applied to the pixel electrode 16, and the scattering ratio within the pixel Pix changes.

As shown in FIGS. 5 and 6, the first translucent substrate 10 has a first main surface 10A, a second main surface 10B, a first side surface 10C, a second side surface 10D, a third side surface 10E and a fourth side surface 10F. Prepare. The first main surface 10A and the second main surface 10B are parallel planes. Also, the first side surface 10C and the second side surface 10D are parallel planes. The third side surface 10E and the fourth side surface 10F are parallel planes.

As shown in FIGS. 5 and 6, the second translucent substrate 20 has a first main surface 20A, a second main surface 20B, a first side surface 20C, a second side surface 20D, a third side surface 20E and a fourth side surface 20F. Prepare. The first main surface 20A and the second main surface 20B are parallel planes. The first side surface 20C and the second side surface 20D are parallel planes. The third side surface 20E and the fourth side surface 20F are parallel planes.

As shown in FIGS. 5 and 6, the light emitting section 31 is provided so as to face the first side surface 20C of the second translucent substrate 20. As shown in FIGS. As shown in FIG. 5, the light emitting unit 31 irradiates the first side surface 20C of the second translucent substrate 20 with the light source light L. As shown in FIG. 20 C of 1st side surfaces of the 2nd translucent board|substrate 20 which opposes the light emission part 31 become a light-incidence surface. A space G is provided between the light emitting portion 31 and the light incident surface. The space G is an air layer.

As shown in FIG. 5, the light source light L emitted from the light emitting section 31 is reflected by the first major surface 10A of the first translucent substrate 10 and the first major surface 20A of the second translucent substrate 20. , propagate away from the first side surface 20C. When the light source light L is directed from the first main surface 10A of the first translucent substrate 10 or the first main surface 20A of the second translucent substrate 20 to the air layer, the medium with a large refractive index changes to a medium with a small refractive index. Therefore, if the incident angle at which the light source light L is incident on the first major surface 10A of the first translucent substrate 10 or the first major surface 20A of the second translucent substrate 20 is larger than the critical angle, The light source light L is totally reflected by the first major surface 10A of the first translucent substrate 10 or the first major surface 20A of the second translucent substrate 20 .

As shown in FIG. 5, the light source light L propagating inside the first light-transmitting substrate 10 and the second light-transmitting substrate 20 is scattered by the pixel Pix where the liquid crystal is in the scattering state, and the scattered light The incident angle becomes an angle smaller than the critical angle, and the emitted light 68, 68A is radiated to the outside from the first major surface 10A of the first translucent substrate 10 or the first major surface 20A of the second translucent substrate 20. be done. Radiation lights 68 and 68A radiated to the outside from the first major surface 10A of the first translucent substrate 10 or the first major surface 20A of the second translucent substrate 20 are observed by an observer. The polymer-dispersed liquid crystal in the scattering state and the polymer-dispersed liquid crystal in the non-scattering state will be described below with reference to FIGS. 7 to 9. FIG.

As shown in FIG. 7, the first translucent substrate 10 is provided with a first alignment film 55 . A second alignment film 56 is provided on the second translucent substrate 20 . The first alignment film 55 and the second alignment film 56 are, for example, vertical alignment films.

A solution in which liquid crystal is dispersed in polymer monomer is sealed between the first translucent substrate 10 and the second translucent substrate 20 . Next, while the monomer and liquid crystal are oriented by the first alignment film 55 and the second alignment film 56 , the monomer is polymerized by ultraviolet light or heat to form the bulk 51 . As a result, a liquid crystal layer 50 having a reverse mode polymer-dispersed liquid crystal in which the liquid crystal is dispersed in the gaps of the polymer network formed in a mesh shape is formed.

Thus, the liquid crystal layer 50 has a bulk 51 made of polymer and a plurality of fine particles 52 dispersed in the bulk 51 . The fine particles 52 are made of liquid crystal. The bulk 51 and fine particles 52 each have optical anisotropy.

The orientation of the liquid crystal contained in the fine particles 52 is controlled by the voltage difference between the pixel electrode 16 and the common electrode 22 . When the common electrode 22 is used, the orientation of the liquid crystal changes depending on the voltage applied to the pixel electrode 16 . By changing the orientation of the liquid crystal, the degree of scattering of light passing through the pixel Pix changes.

For example, as shown in FIG. 8, when no voltage is applied between the pixel electrode 16 and the common electrode 22, the optical axis Ax1 of the bulk 51 and the optical axis Ax2 of the fine particles 52 are oriented in the same direction. The optical axis Ax2 of the fine particles 52 is parallel to the PZ direction of the liquid crystal layer 50 . The optical axis Ax1 of the bulk 51 is parallel to the PZ direction of the liquid crystal layer 50 regardless of the presence or absence of voltage.

The bulk 51 and fine particles 52 have the same ordinary refractive index. When no voltage is applied between the pixel electrode 16 and the common electrode 22, the refractive index difference between the bulk 51 and the fine particles 52 is zero in all directions. The liquid crystal layer 50 becomes a non-scattering state in which the light source light L is not scattered. The light source light L propagates away from the light emitting section 31 while being reflected by the first major surface 10A of the first translucent substrate 10 and the first major surface 20A of the second translucent substrate 20 . When the liquid crystal layer 50 is in a non-scattering state in which the light source light L is not scattered, the background from the first main surface 10A of the first translucent substrate 10 to the first main surface 20A of the second translucent substrate 20 is visible. , the background on the side of the first main surface 10A of the first translucent substrate 10 from the first main surface 20A of the second translucent substrate 20 is visually recognized.

As shown in FIG. 9, between the pixel electrode 16 and the common electrode 22 to which a voltage is applied, the optical axis Ax2 of the fine particle 52 is tilted by the electric field generated between the pixel electrode 16 and the common electrode 22. Become. Since the optical axis Ax1 of the bulk 51 does not change due to the electric field, the directions of the optical axis Ax1 of the bulk 51 and the optical axis Ax2 of the fine particles 52 are different from each other. The light source light L is scattered at the pixel Pix having the pixel electrode 16 to which the voltage is applied. A part of the light source light L scattered as described above is radiated to the outside from the first main surface 10A of the first translucent substrate 10 or the first main surface 20A of the second translucent substrate 20, Observed by an observer.

In the pixel Pix having the pixel electrode 16 to which no voltage is applied, the background from the first main surface 10A of the first translucent substrate 10 to the first main surface 20A of the second translucent substrate 20 is visible. 2 The background on the side of the first main surface 10A of the first translucent substrate 10 is visually recognized from the first main surface 20A of the translucent substrate 20 . In the display device 1 of the present embodiment, when an input signal VS is input from the image output unit 91, a voltage is applied to the pixel electrodes 16 of the pixels Pix that display an image, and an image based on the input signal VS is displayed as a background. is visible with

The light source light L is scattered in the pixel Pix where the pixel electrode 16 to which the voltage is applied is scattered, and the image displayed by the light emitted to the outside overlaps the background and is displayed. In other words, the display device 1 of the present embodiment displays an image superimposed on the background by combining the emitted light 68 or the emitted light 68A with the background. When external light 69 is incident on the display panel 2, the external light 69 is also scattered within the pixel Pix according to the applied voltage and emitted as the radiation light 68 described above.

FIG. 10 is a plan view showing pixels. 11 is a cross-sectional view taken along line XV-XV' of FIG. 10. FIG. As shown in FIGS. 1, 2, and 10, a plurality of signal lines 13 and a plurality of scanning lines 12 are provided in a grid pattern on the first translucent substrate 10 in plan view. A region surrounded by adjacent scanning lines 12 and adjacent signal lines 13 is a pixel Pix. A pixel electrode 16 and a switching element Tr are provided in the pixel Pix. In this embodiment, the switching element Tr is a bottom gate type thin film transistor. The switching element Tr has a semiconductor layer 15 overlapping the gate electrode 12G electrically connected to the scanning line 12 in plan view.

The scanning lines 12 are wirings of metals such as molybdenum (Mo) and aluminum (Al), laminates thereof, or alloys thereof, and the signal lines 13 are wirings of metals such as aluminum or alloys thereof.

The semiconductor layer 15 is provided so as not to protrude from the gate electrode 12G in plan view. As a result, the light source light L directed toward the semiconductor layer 15 from the gate electrode 12G side is reflected, and light leakage in the semiconductor layer 15 is less likely to occur.

As shown in FIG. 10, the source electrode 13S electrically connected to the signal line 13 overlaps one end of the semiconductor layer 15 in plan view.

As shown in FIG. 10, a drain electrode 14D is provided at a position adjacent to the source electrode 13S across the central portion of the semiconductor layer 15 in plan view. The drain electrode 14D overlaps the other end of the semiconductor layer 15 in plan view. A portion that does not overlap with the source electrode 13S and the drain electrode 14D functions as a channel of the switching element Tr. As shown in FIG. 11, the conductive wiring 14 connected to the drain electrode 14D is electrically connected to the pixel electrode 16 through the through hole SH.

As shown in FIG. 11, the first translucent substrate 10 has a first base material 11 made of glass, for example. The first base material 11 may be a resin such as polyethylene terephthalate as long as it has translucency. There is an insulating layer 17 on the first substrate 11 . The insulating layer 17 has a first insulating layer 17a, a second insulating layer 17b and a third insulating layer 17c. A first insulating layer 17a is provided on the first base material 11, and the scanning lines 12 and the gate electrodes 12G are provided on the first insulating layer 17a. Also, a second insulating layer 17b is provided to cover the scanning line 12 . The first insulating layer 17a and the second insulating layer 17b are made of, for example, a transparent inorganic insulating member such as silicon nitride.

A semiconductor layer 15 is laminated on the second insulating layer 17b. The semiconductor layer 15 is made of amorphous silicon, for example, but may be made of polysilicon or an oxide semiconductor.

A source electrode 13S and a signal line 13 covering part of the semiconductor layer 15, a drain electrode 14D covering part of the semiconductor layer 15, and a conductive wiring 14 are provided on the second insulating layer 17b. The drain electrode 14</b>D is made of the same material as the signal line 13 . A third insulating layer 17c is provided on the semiconductor layer 15, the signal line 13 and the drain electrode 14D. The third insulating layer 17c is made of, for example, a transparent inorganic insulating member such as silicon nitride.

A pixel electrode 16 is provided on the third insulating layer 17c. The pixel electrode 16 is made of a translucent conductive member such as ITO (Indium Tin Oxide). The pixel electrode 16 is electrically connected to the conductive wiring 14 and the drain electrode 14D through a contact hole provided in the third insulating layer 17c. A first alignment film 55 is provided on the pixel electrode 16 .

The second translucent substrate 20 has a second base material 21 made of glass, for example. The second base material 21 may be a resin such as polyethylene terephthalate as long as it has translucency. A common electrode 22 is provided on the second base material 21 . The common electrode 22 is made of a translucent conductive material such as ITO. A second alignment film 56 is provided on the surface of the common electrode 22 .

FIG. 12 is a diagram for explaining incident light from the light emitting section. When the light from the light emitting section 31 is incident on the first side surface 20C of the second translucent substrate 20 at an angle θ0, it is incident on the first main surface 20A of the second translucent substrate 20 at an angle i1. If the angle i1 is larger than the critical angle, the light source light L totally reflected at the angle i2 on the first main surface 20A of the second translucent substrate 20 propagates through the second translucent substrate 20. become. Since the space G is provided between the light emitting portion 31 and the first side surface 20C (light incident surface) shown in FIG. Light is not guided to the first side surface 20C of the optical substrate 20 .

As shown in FIG. 11, the multilayer film 7 has a reflective layer 71 and a light absorbing layer 72 laminated in order from the second translucent substrate 20 side. The reflective layer 71 is on the first major surface 20A of the second translucent substrate 20 . Thus, the multilayer film 7 of this embodiment is arranged in a layer different from that of the scanning lines 12, the signal lines 13, and the switching elements Tr.

The reflective layer 71 shown in FIG. 11 reflects the light propagating through the second translucent substrate 20 and reaching the reflective layer 71 into the second translucent substrate 20 . The light absorption layer 72 absorbs light that propagates from the outside of the second translucent substrate 20 and reaches the multilayer film 7 . The reflective layer 71 is, for example, chromium or a chromium alloy. The light absorption layer 72 is blacker than the reflection layer 71 and is, for example, chromium oxide.

In FIG. 10 , the two-dot chain line indicates the portion occupied by the overlapping multilayer film 7 . As shown in FIG. 10, in the multilayer film 7 of this embodiment, the width 7W1 in the PX direction is wider than the width of the scanning line 12 in the PX direction. Further, in the multilayer film 7 of the present embodiment, the width 7W2 in the PY direction is wider than the width of the signal line 13 in the PY direction. Moreover, the multilayer film 7 of the present embodiment covers the area occupied by the switching element Tr. As described above, the multilayer film 7 of the present embodiment overlaps the scanning lines 12, the signal lines 13, and the switching elements Tr and covers the scanning lines 12, the signal lines 13, and the switching elements Tr in plan view.

13A and 13B are explanatory diagrams for schematically explaining internal scattering caused by a metal layer inside the display device of Comparative Example 1. FIG. FIG. 14 is an explanatory diagram for schematically explaining internal scattering caused by an internal metal layer in the display device of Comparative Example 2. FIG. FIG. 15 is an explanatory diagram for schematically explaining internal scattering caused by a metal layer inside the display device of the present embodiment. 15 is also a cross-sectional view schematically explaining cross sections of the first translucent substrate 10 and the second translucent substrate 20 at the position of XV-XV' in FIG.

13, 14 and 15, the action of the multilayer film 7 of the present embodiment will be described in comparison with Comparative Example 1 shown in FIG. 13 and Comparative Example 2 shown in FIG. 13, 14 and 15, the signal line 13 is used to describe the internal metal layer. Even if the internal metal layer is the scanning line 12, the source electrode 13S, the drain electrode 14D, or the gate electrode 12G, the effects described below are the same. 13, 14 and 15, lights L1, L2, and L3 are light based on the light source light L and the outside light 69 entering the display panel 2 described above.

The display device of the comparative example shown in FIG. 13 does not have the multilayer film 7 of this embodiment. As shown in FIG. 13, there are the above-described translucent area TA of the pixel Pix and the wiring area PA including the above-described metal layer such as the signal line 13 . As shown in FIG. 13, out of the light source light L (see FIG. 12), when the light L1 reaches the signal line 13 in the wiring area PA, the signal line 13 has a metallic luster. produce SL. A part of the scattered light SL has an incident angle smaller than the critical angle at the interface between the second translucent substrate 20 and the air layer, and leaked light LL is emitted to the outside from the first main surface 20A. .

In order to suppress the leakage light LL, the display device of Comparative Example 2 shown in FIG. A shielding layer 79 is provided. As shown in FIG. 14, when the light L1 of the light source light L (see FIG. 12) described above reaches the signal line 13 in the wiring area PA, the signal line 13 has metallic luster, so scattered light produce SL. Here, the shielding layer 79 suppresses the scattered light SL whose incident angle is smaller than the critical angle at the interface between the second translucent substrate 20 and the air layer. However, the shielding layer 79 also shields the light L3 out of the light source light L (see FIG. 12) propagating inside the first translucent substrate 10 and the second translucent substrate 20 . Therefore, there is a possibility that the amount of light guided in the wiring area PA adjacent to the light-transmitting area TA in the non-scattering state may decrease. As a result, the amount of light propagating inside the first translucent substrate 10 and the second translucent substrate 20 may decrease as a whole. Although the output of the side light source device 3 may be increased in order to compensate for the amount of light propagating inside the first translucent substrate 10 and the second translucent substrate 20, the power consumption of the display device will increase.

In contrast, the multilayer film 7 of this embodiment shown in FIG. 15 can reflect the scattered light SL into the second translucent substrate 20 . In addition, since the multilayer film 7 can reflect the light L3 on the reflective layer 71 as well, it is possible to suppress a decrease in the amount of light propagating inside the first translucent substrate 10 and the second translucent substrate 20 . As a result, the display device of this embodiment can reduce power consumption.

Even if the multilayer film 7 has the reflective layer 71 , the external light 69 that propagates from the outside of the second translucent substrate 20 and reaches the multilayer film 7 is absorbed by the light absorption layer 72 . Therefore, the reflected light of the external light 69 reflected by the multilayer film 7 is suppressed.

16A to 16E are explanatory diagrams for explaining the manufacturing method of the display device according to this embodiment.

<Sealing process>
As shown in FIG. 16A, first, the first translucent substrate 10 and the second translucent substrate 20 are bonded together.

<Multilayer film deposition process>
Next, a single layer of chromium is formed by sputtering on one surface of the sealed first translucent substrate 10 and the second translucent substrate 20 . Next, as shown in FIG. 16B, a multilayer film 7 is formed by sputtering chromium oxide on the surface of the formed chromium single layer.

Since the deposited chromium oxide is black, it becomes the light absorbing layer 72 described above. According to the above-described process, chromium with metallic luster remains on the second translucent substrate 20 side. Chromium with metallic luster serves as the reflective layer 71 .

In the present embodiment, the reflective layer 71 is pure chromium, but it may contain chromium and may be a chromium alloy.

<Lithography process>
Next, a resist is applied onto the multilayer film 7, and the applied resist is subjected to pattern exposure. By developing the pattern-exposed resist, a patterned resist layer 99 remains on the multilayer film 7, as shown in FIG. 16C.

<Etching process>
Next, as shown in FIG. 16D, portions of the multilayer film 7 where the resist layer 99 is not adhered are etched.

<Resist removal step>
Next, as shown in FIG. 16E, the resist layer 99 after etching is removed. After that, there may be a dicing step in which it is cut into appropriate sizes as appropriate.

Although the example in which the multilayer film 7 is formed on the second translucent substrate 20 has been described, the multilayer film 7 is formed on the main surface 10A of the first translucent substrate 10 instead of the second translucent substrate 20. It is the same even if it is formed.

As described above, the display device 1 of the present embodiment includes the first translucent substrate 10, the second translucent substrate 20 arranged to face the first translucent substrate 10, and the first translucent substrate 20. It includes a liquid crystal layer 50 having a polymer-dispersed liquid crystal enclosed between the optical substrate 10 and the second translucent substrate 20 and a multilayer film 7 . The multilayer film 7 is on the outer surface of at least one of the first translucent substrate 10 and the second translucent substrate 20 . The multilayer film 7 reflects light from the first light-transmitting substrate 10 or the second light-transmitting substrate 20, and reflects light from outside the first light-transmitting substrate 10 or the second light-transmitting substrate 20. Absorb.

Inside the first light-transmitting substrate 10 and the second light-transmitting substrate 20, scattered light SL is generated by metal layers such as the signal lines 13, the scanning lines 12, and the switching elements Tr. The scattered light SL is also caused by the outside light 69 described above. In the display device 1 of the present embodiment, even if the scattered light SL is generated, it is reflected by the multilayer film 7 and the scattered light SL is less likely to leak out of the first translucent substrate 10 and the second translucent substrate 20 . When the scattered light SL leaks out of the first translucent substrate 10 and the second translucent substrate 20, the transmittance is lowered, and the display device 1 can appear white. On the other hand, the display device 1 of the present embodiment can suppress the decrease in transmittance in the non-display state, so that the background on the opposite side of the display panel can be more visually recognized from one side of the display panel.

Scattered light SL also occurs in light source light L. FIG. In the display state, even if scattered light SL is generated by metal layers such as the signal lines 13, the scanning lines 12, and the switching elements Tr, it is reflected by the multilayer film 7, and the scattered light SL is reflected by the first transparent substrate 10 and the second transparent substrate. Leakage to the outside of the optical substrate 20 is difficult. As a result, in the display state of the display device 1 of the present embodiment, the background on the other side of the display panel can be more visually recognized from one side of the display panel. .

In the present embodiment, an example in which the multilayer film 7 is provided on the first main surface 20A of the second translucent substrate 20 has been described. The same effect can be obtained even on the first main surface 10A of the translucent substrate 10. FIG.

(Modification 1)
FIG. 17 is a cross-sectional view showing an example of the cross section of the display device according to Modification 1 of the present embodiment. The same reference numerals are assigned to the same components as those described in the above-described embodiment, and duplicate descriptions are omitted.

As shown in FIG. 17, the first main surface 20A of the second translucent substrate 20 and the multilayer film 7 are covered with a protective layer 79 having translucency. For the protective layer 79, for example, an organic film containing acrylic as a main ingredient, or an inorganic film such as a silicon oxide film or a silicon nitride film is used. The protective layer 79 can suppress damage to the multilayer film 7 .

(Modification 2)
FIG. 18 is a cross-sectional view showing an example of a cross section of a display device according to Modification 2 of the present embodiment. The same reference numerals are assigned to the same components as those described in the above-described embodiment and modification, and overlapping descriptions are omitted.

As shown in FIG. 18 , the display device 1 according to Modification 2 of the present embodiment includes a multilayer film 7 on the outer surface of the first translucent substrate 10 . As shown in FIG. 18, the multilayer film 7 has a reflective layer 71 and a light absorbing layer 72 laminated in order from the first translucent substrate 10 side. The reflective layer 71 is on the first main surface 10A of the first translucent substrate 10 . The light that propagates through the first light-transmitting substrate 10 and reaches the multilayer film 7 is reflected into the first light-transmitting substrate 10 at the multilayer film 7 and propagates from the outside of the first light-transmitting substrate 10. External light reaching the multilayer film 7 is absorbed by the multilayer film 7 . In this embodiment, the multilayer film 7 is arranged at a position overlapping the plurality of scanning lines 12 and the plurality of signal lines 13 (see FIG. 1) in a plan view. Therefore, the multilayer film 7 has a lattice shape in plan view.

19A to 19E are explanatory diagrams for explaining the manufacturing method of the display device according to Modification 2 of the present embodiment. Also in the manufacturing method of the display device according to Modification 2 of the present embodiment, the sealing step, the multilayer film forming step, the lithography step, the etching step, and the resist removing step described above are sequentially processed, and the display device shown in FIG. 19E is obtained. obtain.

<Process of forming protective layer>
Next, a protective layer 98 is formed on the first main surface 20A of the second translucent substrate 20 and the multilayer film 7 . In this state, when the manufacturing is completed, the display device 1 according to Modification 1 of the present embodiment described above is completed. In Modification 2 of the present embodiment, the protective layer 98 is a resist. The protective layer 98 prevents the multilayer film 7 from being damaged in subsequent steps.

<Multilayer film deposition process>
Next, a single layer of chromium is deposited on the first translucent substrate 10 by sputtering. Next, as shown in FIG. 19B, a multilayer film 7 is formed by sputtering chromium oxide on the surface of the formed chromium single layer.

Since the deposited chromium oxide is black, it becomes the light absorbing layer 72 described above. According to the above-described process, chromium with metallic luster remains on the first translucent substrate 10 side. Chromium with metallic luster serves as the reflective layer 71 .

<Lithography process>
Next, a resist is applied onto the multilayer film 7, and the applied resist is subjected to pattern exposure. By developing the pattern-exposed resist, a patterned resist layer 99 remains on the multilayer film 7, as shown in FIG. 19C.

<Etching process>
Next, as shown in FIG. 19D, portions of the multilayer film 7 where the resist layer 99 is not adhered are etched.

<Resist removal step>
Next, as shown in FIG. 19E, the resist layer 99 and protective layer 98 after etching are removed. After that, there may be a dicing step in which it is cut into appropriate sizes as appropriate.

As in Modified Example 1 of the present embodiment, the first main surface 10A of the first translucent substrate 10, the first main surface 20A of the second translucent substrate 20, and the multilayer film 7 are protected against translucency. It may be covered with a layer.

(Modification 3)
FIG. 20 is a plan view showing a plane of a display device according to Modification 3 of the present embodiment. The same reference numerals are assigned to the same components as those described in the above-described embodiment and modification, and overlapping descriptions are omitted.

In Modified Example 3 of the present embodiment, the multilayer film 7 is not grid-like but linear. The area P1 and the area P2 shown in FIG. 20 are different in distance from the light emitting section 31, and thus have different in-plane light amounts. The light emitting section 31 emits light in the PY direction. The multilayer film 7 extends in a direction crossing the PY direction in which the light emitting section 31 emits light. As a result, light from the light source propagates while being reflected by the multilayer film 7, the first main surface 10A of the first translucent substrate 10, and the first main surface 20A of the second translucent substrate 20. The in-plane light amount difference from P2 becomes smaller.

(Modification 4)
FIG. 21 is a cross-sectional view for explaining a multilayer film according to Modification 4 of the present embodiment. The same reference numerals are assigned to the same components as those described in the above-described embodiment and modification, and overlapping descriptions are omitted.

In Modified Example 4 of the present embodiment, the multilayer film 7 has a reflective layer 71 and a light absorbing layer 72 laminated in order from the second translucent substrate 20 side. An edge portion 71 e of the reflective layer 71 is covered with the light absorbing layer 72 . In Modified Example 4 of the present embodiment, after the reflective layer 71 is formed, the light absorption layer 72 is formed with another material so as to cover the edge portion 71e of the reflective layer 71 .

This structure makes it difficult for external light to be reflected at the edge 71 e of the reflective layer 71 . As a result, it becomes difficult for an observer to visually recognize the multilayer film 7, and the multilayer film 7 becomes invisible.

The reflective layer 71 is aluminum or an aluminum alloy that has a higher light reflectance than chromium. Reflective layer 71 may be silver or a silver alloy. The light absorption layer 72 is resin or chromium oxide that absorbs more light than the reflection layer 71 . The light absorbing layer 72 may be titanium oxide.

(Modification 5)
FIG. 22 is a plan view showing a plane of a display device according to Modification 5 of the present embodiment. 23 is a cross-sectional view taken along line XXIII-XXIII' of FIG. 22. FIG. The same reference numerals are assigned to the same components as those described in the above-described embodiment, and duplicate descriptions are omitted. 22 is the same as that of the display device of the present embodiment shown in FIG. 5, so redundant description will be omitted.

As shown in FIGS. 22 and 23, the light emitting section 31 is provided so as to face the fourth side surface 20F of the second translucent substrate 20. As shown in FIGS. As shown in FIG. 23 , the light emitting section 31 irradiates the fourth side surface 20F of the second translucent substrate 20 with the light source light L. As shown in FIG. A fourth side surface 20F of the second translucent substrate 20 facing the light emitting section 31 serves as a light incident surface. A space G is provided between the light emitting portion 31 and the light incident surface. The space G is an air layer.

As shown in FIG. 23, the light source light L emitted from the light emitting section 31 is reflected by the first major surface 10A of the first translucent substrate 10 and the first major surface 20A of the second translucent substrate 20. , propagate away from the fourth side surface 20F.

A display device 1 according to Modification 5 of the present embodiment includes a first translucent substrate 10 , a second translucent substrate 20 , a liquid crystal layer 50 , and a light emitting section 31 . The two light emitting units 31 are arranged to face the first side surface 20C and the fourth side surface 20F of the second translucent substrate 20, respectively. The amount of in-plane light emitted from the two light emitting portions 31 and propagated within the display panel 2 increases. Further, the uniformity of in-plane light propagating within the display panel 2 is also improved. The area P1 and the area P2 shown in FIG. 6 are different in distance from the light emitting section 31, and thus have different in-plane light amounts. On the other hand, in the display device 1 according to Modification 5 of the present embodiment, light propagates from two intersecting directions, so the in-plane light amount difference is small.

(Modification 6)
FIG. 24 is a plan view showing a plane of a display device according to Modification 6 of the present embodiment. 25 is a cross-sectional view taken along line XXV-XXV' of FIG. 24. FIG. 26 is a cross-sectional view taken along line XXVI-XXVI' of FIG. 24. FIG. The same reference numerals are assigned to the same components as those described in the above-described embodiment and modification, and overlapping descriptions are omitted.

As shown in FIGS. 24 and 25, the light emitting section 31 is provided so as to face the second side surface 20D of the second translucent substrate 20. As shown in FIGS. As shown in FIG. 25 , the light emitting section 31 irradiates the second side surface 20</b>D of the second translucent substrate 20 with the light source light L. As shown in FIG. A second side surface 20D of the second translucent substrate 20 facing the light emitting section 31 serves as a light incident surface. A space G is provided between the light emitting portion 31 and the light incident surface. The space G is an air layer.

As shown in FIG. 25, the light source light L emitted from the light emitting section 31 is reflected by the first major surface 10A of the first translucent substrate 10 and the first major surface 20A of the second translucent substrate 20. , propagate away from the second side surface 20D.

As shown in FIGS. 24 and 26, the light emitting section 31 is provided so as to face the third side surface 20E of the second translucent substrate 20. As shown in FIGS. As shown in FIG. 26 , the light emitting section 31 irradiates the third side surface 20E of the second translucent substrate 20 with the light source light L. As shown in FIG. A third side surface 20E of the second translucent substrate 20 facing the light emitting section 31 serves as a light incident surface. A space G is provided between the light emitting portion 31 and the light incident surface. The space G is an air layer.

As shown in FIG. 26, the light source light L emitted from the light emitting section 31 is reflected by the first major surface 10A of the first translucent substrate 10 and the first major surface 20A of the second translucent substrate 20. , propagate away from the third side surface 20E.

A display device 1 according to Modification 6 of the present embodiment includes a first translucent substrate 10 , a second translucent substrate 20 , a liquid crystal layer 50 , and a light emitting section 31 . The two light emitting units 31 are arranged to face the second side surface 20D and the third side surface 20E of the second translucent substrate 20, respectively. The amount of in-plane light emitted from the two light emitting portions 31 and propagated within the display panel 2 increases. Further, the uniformity of in-plane light propagating within the display panel 2 is also improved. The area P1 and the area P2 shown in FIG. 6 are different in distance from the light emitting section 31, and thus have different in-plane light amounts. On the other hand, in the display device 1 according to Modification 6 of the present embodiment, light propagates from two intersecting directions, so the in-plane light amount difference is small.

Further, in the display device 1 according to Modification Example 6 of the present embodiment, as in the present embodiment, the backlight device or the reflector is the first main surface 10A of the first translucent substrate 10 or the second translucent substrate. 20 is not on the side of the first main surface 20A. Therefore, the background on the side of the first main surface 20A of the second translucent substrate 20 can be visually recognized from the first main surface 10A of the first translucent substrate 10, or the first main surface of the second translucent substrate 20 can be seen. The background of the first main surface 10A side of the first translucent substrate 10 is visible from 20A.

Although the embodiments have been described above, the present disclosure is not limited to such embodiments. The content disclosed in the embodiment is merely an example, and various modifications are possible without departing from the gist of the present disclosure. Appropriate changes that do not deviate from the spirit of the present disclosure also naturally belong to the technical scope of the present disclosure. All inventions that a person skilled in the art can carry out by appropriately designing and modifying the invention described above also belong to the technical scope of the present disclosure as long as they include the gist of the present disclosure.

For example, the display panel 2 may be a passive matrix panel that does not have switching elements. The passive matrix panel type panel has first electrodes extending in the PX direction in plan view, second electrodes extending in the PY direction, and wiring electrically connected to the first electrodes or the second electrodes. The first electrode, the second electrode, and the wiring are made of ITO, for example. For example, the first translucent substrate 10 having the first electrode and the second translucent substrate 20 having the second electrode are arranged to face each other with the liquid crystal layer 50 interposed therebetween. .

Also, although the first alignment film 55 and the second alignment film 56 are vertical alignment films, the first alignment film 55 and the second alignment film 56 may be horizontal alignment films, respectively. The first alignment film 55 and the second alignment film 56 may have a function of orienting the monomers in a predetermined direction when polymerizing the monomers. As a result, the monomer becomes a polymer polymerized in a state of being oriented in a predetermined direction. When the first alignment film 55 and the second alignment film 56 are horizontal alignment films, the optical axis Ax1 of the bulk 51 and the light of the fine particles 52 are aligned with no voltage applied between the pixel electrode 16 and the common electrode 22 . The directions of the axes Ax2 are equal to each other and perpendicular to the PZ direction. The direction perpendicular to the PX direction corresponds to the PX direction or PY direction along the sides of the first translucent substrate 10 in plan view.

1 display device 2 display panel 3 side light source device 4 drive circuit 7 multilayer film 9 host controller 10A first main surface 10B second main surface 10C first side surface 10D second side surface 10E third side surface 10F fourth side surface 10 first transparent Optical substrate 12 Scanning line 12G Gate electrode 13S Source electrode 13 Signal line 14D Drain electrode 14 Conductive wiring 15 Semiconductor layer 16 Pixel electrode 19 Sealing portion 20 Second translucent substrate 20A First main surface 20B Second main surface 20C First side surface 20D Second side surface 20E Third side surface 20F Fourth side surface 22 Common electrode 31 Light emitting unit 32 Light source control unit 33 Light source substrate 34R Light emitter 34G Light emitter 34B Light emitter 41 Analysis unit 42 Pixel control unit 43 Gate driver 44 Source Drive unit 45 Common potential drive unit 50 Liquid crystal layer 51 Bulk 52 Fine particles 55 First alignment film 56 Second alignment film 71 Reflection layer 72 Light absorption layer 91 Image output unit 92 Flexible substrate 93 External light setting unit

Claims (9)

a first translucent substrate comprising a first principal surface and a second principal surface which is a plane parallel to the first principal surface ;
a second translucent substrate arranged to face the first translucent substrate and comprising a first main surface and a second main surface which is a plane parallel to the first main surface ;
a liquid crystal layer having a polymer-dispersed liquid crystal between the first translucent substrate and the second translucent substrate;
The outer surface of at least one of the first light-transmitting substrate and the second light-transmitting substrate reflects the light from the first light-transmitting substrate or the second light-transmitting substrate, a multilayer film that absorbs light from the outside of the optical substrate or the second translucent substrate ,
When the polymer-dispersed liquid crystal is in a non-scattering state, the background on the side of the first main surface of the second translucent substrate can be visually recognized from the first main surface of the first translucent substrate, or the second A display device , wherein the background on the side of the first main surface of the first light-transmitting substrate is visible from the first main surface of the light-transmitting substrate . 2. The display device according to claim 1, wherein the multilayer film has a reflective layer and a light absorbing layer. 3. A display device according to claim 2 , wherein said reflective layer is on the first main surface of said second translucent substrate. 4. The display device according to claim 2 , wherein said reflective layer is on the first main surface of said first translucent substrate. 5. A display device according to any one of claims 2 to 4, wherein the reflective layer comprises chromium and the light absorbing layer is chromium oxide. 5. The display device according to any one of claims 2 to 4 , wherein the reflective layer contains aluminum, and the light absorbing layer is resin or chromium oxide. 7. The display device according to any one of claims 2 to 6 , wherein an edge of said reflective layer is covered with said light absorbing layer. The first translucent substrate includes a plurality of signal lines, a plurality of scanning lines that intersect the signal lines in plan view, and a switching element at the intersecting portion where the signal lines and the scanning lines intersect. and
8. The display device according to any one of claims 1 to 7 , wherein the multilayer film overlaps any one of the signal lines, the scanning lines, and the switching elements in plan view. The first translucent substrate has a plurality of signal lines and a plurality of scanning lines that three-dimensionally intersect with the signal lines in a plan view,
8. The display device according to any one of claims 1 to 7 , wherein the multilayer film overlaps the signal lines and the scanning lines in plan view, and has a lattice shape.

Images