JP7087357B2 - Pod and purge device - Google Patents

Description

The present invention relates to a storage pod (FOUP) used when a wafer is transported between a plurality of processing devices in a semiconductor manufacturing process. The present invention also relates to a purging device for cleaning the inside of the pod.

In the semiconductor manufacturing process, wafers are stored in pods called FOUPs and transported to each processing device.

The environment inside the pod in which the wafer is housed is preferably maintained in an inert state and cleanliness above a predetermined level in order to protect the wafer surface from oxidation and contamination. Here, normally, the inside of the pod in a state where the wafer is housed is filled with nitrogen or the like managed to be highly clean, and the invasion of pollutants, oxidizing gas, etc. into the pod is prevented. However, the surface of the wafer in the pod may be contaminated by external gas that invades the inside of the pod when the wafer in the pod is inserted or removed, out gas released from the wafer after processing, or the like. Therefore, in the wafer processing process, it is necessary to appropriately purge the inside of the pod to clean the inside of the pod.

As a method for purging the inside of the pod, the pod is communicated with a bottom hole arranged at the bottom of the pod and via a gas supply nozzle (tower type nozzle) formed so as to protrude into the pod. It is known to introduce purge gas inside. Further, Patent Document 1 discloses that a planar purge member is provided between a pair of tower type nozzles in order to more efficiently introduce the purge gas into the pod.

Japanese Unexamined Patent Publication No. 2015-162531

As a result of the recent progress in miniaturization of wiring in semiconductor devices, there is a demand for a technique for purging the inside of a pod more efficiently and with high cleanliness in order to protect the wafer surface from oxidation and contamination.

When a purge nozzle having a shape that stands upright from the bottom surface to the top surface of the pod as disclosed in Patent Document 1, the gas supply in the height direction is affected by the influence of the gradient of the gas supply pressure near the bottom surface and the top surface of the pod. Variations in quantity can occur.

The present invention has been made in view of such circumstances, and an object of the present invention is to provide a pod capable of suppressing variation in the purge gas supply pressure inside the pod and evenly introducing the purge gas.

In order to solve the above problems, the pod according to the first aspect of the present invention is provided on a pod body capable of accommodating flat plate-shaped objects arranged side by side in the height direction and on one side surface of the pod body. The pod is provided with an opening, a lid detachably attached to the opening so as to seal the pod body, and a plurality of ventilation holes for ejecting purge gas toward the contained object juxtaposed in the height direction. A planar purge portion arranged on at least one surface of an inner surface facing the opening of the main body and a pair of inner surfaces adjacent thereto, or between the at least one surface and the object to be contained. The purge gas is provided upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside, and the purge gas is supplied to the planar purge portion via the first passage. It has a gas supply unit for supplying, and a pressure regulating member is arranged in the first passage.

In the pod according to this aspect, when the purge gas flows from the gas supply section to the planar purge section, the purge gas passes through a pressure regulating member having a predetermined ventilation resistance. Therefore, it is possible to suppress variations in the purge gas supply pressure in the height direction of the gas supply section and evenly supply the purge gas to the planar purge section in the height direction. As a result, the supply amount of the purge gas supplied from the planar purge portion to the inside of the pod can be equalized, and the inside of the pod can be purged efficiently and with high cleanliness.

The pod according to the second aspect of the present invention includes a pod body capable of accommodating flat plate-shaped objects arranged side by side in the height direction, an opening provided on one side surface of the pod body, and the pod body. A lid detachably attached to the opening so as to be hermetically provided, and a plurality of ventilation holes for ejecting purge gas toward the contained object juxtaposed in the height direction, the inner surface of the pod body facing the opening. A planar purge portion arranged on at least one surface of a pair of inner surfaces adjacent thereto, or between the at least one surface and the contained object, and an inner bottom surface of the pod body. It has a gas supply unit that stands upright toward the inside of the pod body from a gas supply hole for supplying the purge gas from the outside and supplies the purge gas to the planar purge unit via the first passage. However, the first passage is arranged at a substantially central portion of the planar purge portion in the height direction.

In the pod according to this aspect, the purge gas flows into the gas supply section in the height direction, then changes the direction of the flow, and flows into the planar purge section through the first passage in the central portion. Therefore, it is possible to suppress the variation in the purge gas supply pressure in the height direction of the gas supply section and evenly supply the purge gas to the planar purge section. As a result, the supply amount of the purge gas supplied from the planar purge portion to the inside of the pod can be equalized, and the inside of the pod can be purged efficiently and with high cleanliness.

The pod according to the third aspect of the present invention includes a pod body capable of accommodating flat plate-shaped objects arranged side by side in the height direction, an opening provided on one side surface of the pod body, and the pod body. The inner surface of the pod body facing the opening is provided with a lid detachably attached to the opening so as to be hermetically sealed, and a plurality of ventilation holes for ejecting purge gas toward the contained object juxtaposed in the height direction. A planar purge portion arranged on at least one surface of the pair of inner surfaces adjacent thereto, or between the at least one surface and the contained object, and an inner bottom surface of the pod body. It has a gas supply unit that stands upright toward the inside of the pod body from a gas supply hole for supplying the purge gas from the outside and supplies the purge gas to the planar purge unit via the first passage. The planar purge section communicates with the gas supply section via the first chamber, and communicates with the first chamber and the second passage, and has the plurality of ventilation holes. The second chamber is provided with a second chamber having the second chamber, and the second passage is arranged at a substantially central portion in the width direction of the planar purge portion.

In the pod according to this aspect, when the purge gas flows into the first chamber to the second chamber of the planar purge portion, the purge gas flows in from the substantially central portion in the width direction of the planar purge portion, so that the purge gas flows in the width direction of the planar purge portion. It is possible to prevent the gas supply amount to be relatively small to the ventilation holes which are arranged in the central portion and have a long distance from the gas supply part, and to suppress the variation in the gas supply amount in the horizontal direction. As a result, the supply amount of the purge gas supplied from the planar purge portion to the inside of the pod can be equalized, and the inside of the pod can be purged efficiently and with high cleanliness.

Further, for example, the planar purge section communicates with the gas supply section via the first chamber, and communicates with the first chamber and the second passage, and communicates with the plurality of passages. It may be provided with a second chamber having pores. Further, for example, the second passage may be arranged at a substantially central portion in the width direction of the planar purge portion.

When the purge gas flows from the gas supply section to the planar purge section, it passes through the pressure regulating member having a ventilation resistance, so that the variation in the purge gas supply pressure in the height direction of the gas supply section can be suppressed. Further, when the purge gas flows from the first chamber to the second chamber of the planar purge portion, the purge gas flows in from the substantially central portion in the width direction of the planar purge portion, so that the purge gas has a long distance from the gas supply portion. It is possible to prevent the gas supply amount from becoming relatively small and suppress the variation in the gas supply amount in the horizontal direction.

Further, for example, a pressure regulating member may be arranged in the second passage.

When the purge gas flows from the gas supply section to the planar purge section, it passes through the pressure regulating member having a ventilation resistance, so that the variation in the purge gas supply pressure in the height direction of the gas supply section can be suppressed. Further, when the purge gas flows into the first chamber to the second chamber of the planar purge portion, the purge gas passes through a pressure regulating member having a predetermined ventilation resistance, so that the purge gas in the height direction and the width direction of the planar purge portion. Variations in supply pressure can be suppressed.

Further, for example, a pressure regulating member may be arranged in the first passage.

When the purge gas flows from the gas supply section to the planar purge section, it passes through the pressure regulating member having a ventilation resistance, so that the variation in the purge gas supply pressure in the height direction of the gas supply section can be suppressed. Further, when the purge gas flows into the first chamber to the second chamber of the planar purge portion, the purge gas passes through a pressure regulating member having a predetermined ventilation resistance, so that the purge gas in the height direction and the width direction of the planar purge portion. Variations in supply pressure can be suppressed.

Further, for example, at least two gas supply units may be arranged inside the pod body, and the planar purge unit is arranged between the pair of gas supply units and the pair of the gas supply units. It may be communicated from both gas supply units.

By using two or more gas supply units, it is possible to suppress the variation in the purge gas supply pressure more effectively than when one gas supply unit is used.

The purging device according to the present invention is a purging device in which two gas supply units supply purge gas to a pod arranged inside the pod body, and the gas supply source and a pair of the gas from the gas supply source. It has a pipe connected to each of the supply units and a flow rate adjusting means for adjusting the flow rate of the purge gas supplied to each of the pair of gas supply units via the pipe.

By controlling the purge gas supply to each of the pair of gas supply units, it is possible to more effectively suppress the variation in the purge gas supply pressure.

FIG. 1 is a schematic view of a pod according to the present invention. FIG. 2 is a schematic view showing how the purge process is performed in the pod according to the present invention. FIG. 3 is a perspective view of a purge nozzle included in the pod according to the present invention. FIG. 4A is a schematic front view of a purge nozzle included in the pod according to the first embodiment of the present invention, and FIG. 4B is a cut of the purge nozzle shown in FIG. 4A in a cross section taken along the line AA'. It is a schematic plan sectional view. It is a schematic diagram which shows the purging apparatus which has the mounting stand on which the pod which concerns on this invention is placed. FIG. 6A is a schematic front view of a purge nozzle included in the pod according to the second embodiment of the present invention, and FIG. 6B is a cut of the purge nozzle shown in FIG. 6A in a cross section taken along the line AA'. It is a schematic plan sectional view. FIG. 7A is a schematic front view of the purge nozzle included in the pod according to the third embodiment of the present invention, and FIG. 7B is a cut of the purge nozzle shown in FIG. 7A in a cross section taken along the line AA'. It is a schematic plan sectional view. FIG. 7 (c) is a schematic plan sectional view of the purge nozzle shown in FIG. 7 (a) cut in a BB'cross section. FIG. 8A is a schematic front view of the purge nozzle included in the pod according to the fourth embodiment of the present invention, and FIG. 8B is a cut of the purge nozzle shown in FIG. 8A in a cross section taken along the line AA'. It is a schematic plan sectional view.

First Embodiment Hereinafter, the pod according to the first embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a schematic view of a pod 1 according to the present invention. FIG. 2 is a schematic view showing how the purge process is performed in the pod 1 according to the present invention. FIG. 3 is a perspective view of the purge nozzle 10 included in the pod 1 according to the present invention.

As shown in FIGS. 1 to 3, the pod 1 according to the first embodiment of the present invention includes a pod main body 3 for accommodating a wafer 2, an opening 3a provided on one side surface of the pod main body 3, and a pod. It has a lid 4 for sealing the main body 3 and a surface-type purge nozzle 10 for introducing purge gas into the pod 1. The wafer 2 is housed in the pod body 3 from the outside of the pod 1 through the opening 3a. Inside the pod body 3, a plurality of flat plate-shaped wafers 2 extend in the horizontal direction (direction parallel to the extending direction of the inner bottom surface 3c of the pod body 3) and in the height direction (opening 3a). They are housed side by side so that they are parallel to each other in the extending direction). After accommodating the wafer 2, the pod body 3 is sealed by attaching the removable lid 4 to the opening 3a.

FIG. 2 shows how the purge process is performed by the purge nozzle 10 provided inside the pod body 3. As shown by the arrow A in the figure, the purge gas (for example, an inert gas such as nitrogen) is introduced from the purge nozzle 10 substantially parallel to the extending surface of the wafer 2 into the inside of the pod body 3. The purge gas introduced into the pod body 3 is discharged from the opening 3a or the exhaust hole provided in the pod body 3 together with the gas existing inside the pod body 3. As a result, the gas inside the pod 1 is purified. The purge gas is supplied to the purge nozzle 10 via the gas supply port 31 provided on the mounting table 30 for mounting the pod 1.

As shown in FIG. 3, the purge nozzle 10 has a gas supply unit 11 and a planar purge unit 13. The gas supply unit 11 supplies the purge gas that has flowed in from the gas supply port 31 of the mounting table 30 to the planar purge unit 13. The planar purge unit 13 introduces the purge gas supplied from the gas supply unit 11 into the inside of the pod main body 3.

As shown in FIG. 3, the gas supply unit 11 communicates with the gas supply hole 5 provided in the inner bottom surface 3c of the pod body 3 and stands upright from the gas supply hole 5 toward the inside of the pod body 3. The gas supply hole 5 and the gas supply unit 11 are in the vicinity of the inner surface (opening facing surface 3b) facing the opening 3a of the pod body 3, and the wafer 2 accommodated in the pod body 3 when viewed from the opening 3a direction. It is placed in pairs in both corners that were avoided. By connecting the gas supply port 31 of the mounting table 30 to the gas supply hole 5, the gas supply port 31 and the gas supply unit 11 communicate with each other through the gas supply hole 5. The purge gas supplied from the gas supply port 31 through the gas supply hole 5 flows into the hollow portion 12 (see FIG. 4B) provided inside the gas supply portion 11, and then enters the planar purge portion 13. Will be supplied.

Here, a purge device for supplying purge gas to the purge nozzle 10 will be described. FIG. 5 is a schematic view showing a purge device 32 having a mounting table 30 on which the pod 1 is mounted. A gas supply port 31 embedded in the upper surface of the mounting table 30 is connected to the gas supply hole 5 of the gas supply unit 11. The gas supply port 31 is a part of the purge device 32 that controls the gas pressure and the flow rate to supply or stop the gas supply port 31, and the gas supply port 31 is supplied with the purge gas from another part of the purge device 32. The purge device 32 has a gas supply source 33, a pipe 34 connected to the pair of gas supply units 11 from the gas supply source 33, and a flow rate of purge gas supplied to the pair of gas supply units 11 via the pipe 34, respectively. It has a flow rate adjusting means 35 for adjusting the above. The pipe 34 is provided with a gas supply port 31 at the upper end thereof, and the gas supply port 31 airtightly connects the pipe 34 of the purge device 32 and the gas supply hole 5 of the pod 1. It is preferable that the supply amount of the purge gas to the pair of gas supply units 11 is adjusted so as to be equal to each other by the flow rate adjusting means 35. Although this figure illustrates the case where one gas supply source 33 and the flow rate adjusting means 35 are used for the pair of gas supply units 11, the purging device is not limited to this. For example, the purging device according to the modification may have one gas supply source 33 and a flow rate adjusting means 35 for each gas supply unit 11. Further, the above-mentioned purging device 32 may be configured as an independent device or may be configured as a part of a load port device or the like.

As shown in FIG. 3, the planar purge portion 13 has a plate-like shape extending from one of the pair of gas supply portions 11 to the other, and has an opening facing surface 3b and a wafer 2 housed in the pod body 3. Placed in between. The planar purge unit 13 includes an internal chamber 17 (see FIG. 4B) that communicates with the hollow portion 12 of the gas supply unit 11 via the first passage 20. A plurality of ventilation holes 15 are formed on the ejection surface 14 facing the opening 3a in the planar purge portion 13 to eject the purge gas in the inner chamber 17 toward the wafer 2 in a direction substantially perpendicular to the ejection surface 14. .. The ventilation holes 15 are arranged on the ejection surface 14 so as to form a gas flow A (see FIG. 2) substantially parallel to the extending surface of the wafer 2 toward the opening 3a. Therefore, the purge gas that has flowed from the hollow portion 12 of the gas supply portion 11 into the inner chamber 17 of the planar purge portion 13 is introduced into the inside of the pod body 3 as a gas flow A through the ventilation holes 15.

As shown in FIG. 4B, the ejection surface 14 of the planar purge portion 13 has a curved shape curved in the edge direction of the wafer 2, so that the average distance between the wafer 2 and the ejection surface 14 is small. Purge gas can be efficiently supplied to the periphery of the wafer 2. However, the shape of the ejection surface 14 is not limited to this, and the ejection surface 14 may be planar. The length H1 in the height direction of the ejection surface 14 is not particularly limited, but is, for example, the length in the height direction from the wafer 2 accommodated in the lowermost stage to the wafer 2 arranged in the uppermost stage in the height direction. It is preferably 0.5 to 1.5 times. In particular, in order to supply the purge gas to the periphery of the entire wafer 2, H1 is preferably larger than 1.0 times. If it exceeds 1.0 times, the wafer does not exist in the traveling direction of the supplied purge gas, so that the purge gas may cause turbulence inside the pod. Therefore, it is preferable to make it 1.5 times at the maximum. The length W1 in the width direction of the ejection surface 14 is not particularly limited, but is preferably 0.3 to 1.3 times the diameter in the width direction of the wafers 2 juxtaposed and accommodated in the height direction, for example. .. In particular, in order to supply the purge gas to the periphery of the entire wafer 2, W1 is preferably larger than 1.0 times. For the same reason as in H1 described above, from the viewpoint of preventing the occurrence of turbulent flow in the wafer absent region, it is preferable to set the value to 1.3 times at the maximum when the value is larger than 1.0 times.

The ventilation holes 15 may be capable of ejecting purge gas, and the shape, size, number, and arrangement of the ventilation holes 15 are not particularly limited, but it is preferable that the ventilation holes 15 are formed substantially evenly on the entire ejection surface 14. .. The ventilation hole 15 may be a simple opening in which a filter or the like is not arranged, an opening in which a filter is arranged, or the entire ejection surface 14 may be a filter-like ventilation hole 15. ..

FIG. 4A is a schematic front view of the purge nozzle 10 included in the pod 1 according to the present embodiment, and FIG. 4B is a cut of the purge nozzle 10 shown in FIG. 4A in a cross section taken along the line AA'. It is a schematic plan sectional view.

As shown in FIG. 4B, in the present embodiment, the first pressure adjusting member 22 is arranged in the first passage 20 that communicates the hollow portion 12 of the gas supply portion 11 and the internal chamber 17 of the planar purge portion 13. Has been done. As the first pressure adjusting member 22, for example, a filter having a predetermined ventilation resistance can be used.

As shown in FIG. 4A, the length of the first passage 20 in the height direction is shorter than that of the hollow portion 12, and is substantially the same as the internal chamber 17 of the planar purge portion 13. The first pressure adjusting member 22 is provided in the entire first passage 20, and the shape of the first pressure adjusting member 22 is the same as that of the first passage 20. By providing the first pressure adjusting member 22 in the entire first passage 20, the purge gas supply pressure from the hollow portion 12 to the inner chamber 17 can be surely equalized. The first pressure adjusting member 22 arranged in the first passage 20 is not limited to a specific filter, and the flow path is cut off from the non-woven fabric filter, the porous filter, the mesh filter, the internal chamber 17, and the hollow portion 12. Examples thereof include a narrowing hole having a small area and a punching plate.

Further, as shown in FIG. 4B, in the first passage 20 and the first pressure adjusting member 22, the portion of the first pressure adjusting member 22 on the center side of the planar purge portion 13 is outside when viewed from above. It is preferable that the portion is inclined so as to be closer to the opening 3a than the portion of. As a result, even when the planar purge portion 13 is curved in the edge direction of the wafer 2, the purge gas can be efficiently supplied toward the internal space (cross section of the flow path) of the internal chamber 17.

In the pod 1 of the present embodiment, when the purge gas flows from the hollow portion 12 of the gas supply portion 11 into the inner chamber 17 of the planar purge portion 13, the purge gas passes through the first pressure adjusting member 22 having a predetermined ventilation resistance. .. Therefore, the pod 1 can suppress variations in the purge gas supply pressure in the height direction of the gas supply unit 11 and can evenly supply the purge gas to the internal chamber 17 of the planar purge unit 13 in the height direction. As a result, the supply amount of the purge gas supplied from the planar purge unit 13 to the inside of the pod 1 can be equalized, and the inside of the pod can be purged efficiently and with high cleanliness. Further, by ejecting the purge gas toward the entire wafer 2 accommodated side by side in the height direction, it is possible to prevent the problem that the wafer 2 is deteriorated because the purge gas is not supplied to the periphery of a part of the wafer 2. ..

2nd Embodiment FIG. 6A is a schematic front view of the purge nozzle 100 included in the pod according to the 2nd embodiment of the present invention, and FIG. 6B is the purge nozzle 100 shown in FIG. 6A. -A' is a schematic plan sectional view cut along a cross section. The pod according to the present embodiment has the same configuration as the pod 1 according to the first embodiment, except that the internal structure of the purge nozzle 100 is different. Therefore, the same components as those of the pod 1 according to the first embodiment are designated by the same reference numerals, and the description thereof will be omitted.

As shown in FIG. 6B, in the present embodiment, the internal chamber 17a of the planar purge portion 13a has a first chamber 18 and a second chamber 19. That is, the internal chamber 17a is divided into a first chamber 18 arranged on the back surface 16 side of the planar purge portion 13a and a second chamber 19 arranged on the ejection surface 14 side by the second pressure adjusting member 23. ing.

The first chamber 18 communicates with the hollow portion 12a of the gas supply portion 11a via the first passage 20. The first chamber 18 is formed so as to include the back surface 16 of the planar purge portion 13a on the opening facing surface 3b side as a part of the side wall of the first chamber 18. Further, the second chamber 19 communicates with the first chamber 18 via a second passage 21 in which the second pressure adjusting member 23 is arranged. The second chamber 19 is formed so as to include the ejection surface 14 on the opening 3a side of the planar purge portion 13a in which the vent hole 15 for ejecting the purge gas is formed inside the pod as a part of the side wall of the second chamber 19. ing. Further, the second pressure adjusting member 23 arranged in the second passage 21 has higher ventilation resistance than the inside of the first chamber 18 and the inside of the second chamber 19.

As shown in FIG. 6A, the length of the second passage 21 in the height direction is substantially the same as the internal chamber 17a of the planar purge portion 13a. The length of the second passage 21 in the width direction is not particularly limited, but is preferably at least the length in the width direction of the ejection surface 14. The second pressure adjusting member 23 is provided in the entire second passage 21, and the shape of the second pressure adjusting member 23 is the same as that of the second passage 21. By providing the second pressure adjusting member 23 in the entire second passage 21, the purge gas supply pressure from the first chamber 18 to the second chamber 19 can be surely equalized. The second pressure adjusting member 23 arranged in the second passage 21 is not limited to a specific filter as in the first pressure adjusting member 22, but is not limited to a specific filter, a non-woven fabric filter, a porous filter, a mesh filter, and an internal chamber. Examples thereof include a narrowing hole having a narrower flow path cross-sectional area than the 17a and the hollow portion 12a, a punching plate, and the like. Further, the ventilation resistance of the second pressure adjusting member 23 may be different from that of the first pressure adjusting member 22.

As shown in FIG. 6B, the second pressure adjusting member 23 is curved with the same curvature as the ejection surface 14 when viewed from above, and is in contact with the ejection surface 14 in the thickness direction of the planar purge portion 13a. It is arranged in a substantially central portion of the back surface 16. Further, as shown in FIG. 6B, a partition wall 24 is provided between the second chamber 19 and the gas supply unit 11a, and the purge gas is directly supplied from the gas supply unit 11a to the second chamber 19. It has a structure that cannot flow in. The partition wall 24 is provided so as to connect the end portion of the second pressure adjusting member 23 in the width direction and the end portion of the ejection surface 14 in the width direction when viewed from above. The length of the partition wall 24 in the height direction is substantially the same as that of the second pressure adjusting member 23. Further, it is preferable that the partition wall 24 is provided outside the ejection surface 14 in the width direction so that the partition wall 24 does not obstruct the supply of the purge gas to the inside of the pod.

According to the present embodiment, when the purge gas flows from the first chamber 18 to the second chamber 19 of the planar purge portion 13a, the purge gas passes through the second pressure adjusting member 23 having a predetermined ventilation resistance, so that the purge gas is planar. It is possible to suppress variations in the purge gas supply pressure in the height direction and the width direction of the purge portion 13a. As a result, the supply amount of the purge gas supplied from the planar purge portion 13a to the inside of the pod can be equalized, and the inside of the pod can be purged efficiently and with high cleanliness.

In this embodiment, in addition to the above configuration, a pressure regulating member may be arranged in the first passage 20. Thereby, the above-mentioned effect can be further enhanced.

Third Embodiment FIG. 7A is a schematic front view of a purge nozzle 110 included in the pod according to the third embodiment of the present invention, and FIG. 7B is an A of the purge nozzle 110 shown in FIG. 7A. -A' is a schematic plan sectional view cut along a cross section. 7 (c) is a schematic plan sectional view of the purge nozzle 110 shown in FIG. 7 (a) cut in a BB'cross section. The pod according to the present embodiment has the same configuration as the pod 1 according to the first embodiment, except that the internal structure of the purge nozzle 110 is different. Therefore, the same components as those of the pod 1 according to the first embodiment are designated by the same reference numerals, and the description thereof will be omitted.

As shown in FIGS. 7 (b) and 7 (c), in the present embodiment, a partition wall 25 is provided between the hollow portion 12b of the gas supply portion 11b and the internal chamber 17b of the planar purge portion 13b. .. A hole is formed in a substantially central portion of the planar purge portion 13b of the partition wall 25 in the height direction, and the hole is a first passage 20a that communicates the hollow portion 12b and the inner chamber 17b.

As shown in FIG. 7A, the length of the partition wall 25 in the height direction is shorter than that of the hollow portion 12b, and is substantially the same as the internal chamber 17b of the planar purge portion 13b. Further, the partition wall 25 is provided outside the ejection surface 14 in the width direction.

The length of the first passage 20a in the width direction is not particularly limited, but is preferably 20 to 150% of the length in the thickness direction of the planar purge portion 13b. The length of the first passage 20a in the height direction is not particularly limited, but is preferably 20 to 150% of the length of the planar purge portion 13b in the height direction. Further, as shown in FIG. 7B, the first passage 20a is arranged so that the central portion of the planar purge portion 13 when viewed from above is inclined so as to be closer to the opening 3a than the outer portion. It is preferable to be done.

According to the present embodiment, the purge gas that has reached the upper end of the hollow portion 12b of the gas supply portion 11b collides with the partition wall 24 and is depressurized, and then the internal chamber 17b of the planar purge portion 13b is passed through the first passage 20a. Inflow to. Therefore, it is possible to suppress the variation in the purge gas supply pressure in the height direction of the gas supply unit 11b and evenly supply the purge gas to the inner chamber 17b of the planar purge unit 13b. As a result, the supply amount of the purge gas supplied from the planar purge portion 13b to the inside of the pod can be equalized, and the inside of the pod can be purged efficiently and with high cleanliness.

In this embodiment, in addition to the above configuration, a pressure regulating member may be arranged in the first passage 20a. Thereby, the above-mentioned effect can be further enhanced.

Fourth Embodiment FIG. 8A is a schematic front view of the purge nozzle 120 included in the pod according to the fourth embodiment of the present invention, and FIG. 8B is the purge nozzle 120 shown in FIG. 8A. -A' is a schematic plan sectional view cut along a cross section. The pod according to the present embodiment has the same configuration as the pod 1 according to the first embodiment, except that the internal structure of the purge nozzle 120 is different. Therefore, the same components as those of the pod 1 according to the first embodiment are designated by the same reference numerals, and the description thereof will be omitted.

As shown in FIG. 8B, the internal chamber 17c of the planar purge portion 13c has a first chamber 18a arranged on the back surface 16 side of the planar purge portion 13c and a second chamber 18a arranged on the ejection surface 14 side. It is divided into a chamber 19a by a partition wall 26.

The first chamber 18a of the planar purge portion 13c communicates with the hollow portion 12c of the gas supply portion 11c via the first passage 20. Further, the first chamber 18a includes the back surface 16 of the planar purge portion 13c on the opening facing surface 3b side as a side wall of the first chamber 18a. The second chamber 19a includes a ejection surface 14 on the opening 3a side of the planar purge portion 13c provided with a ventilation hole 15 for ejecting the purge gas inside the pod as a side wall of the second chamber 19a.

As shown in FIG. 8B, the partition wall 26 has an L-shaped cross-sectional shape, and a part thereof is arranged between the first chamber 18a and the second chamber 19a, and the other one. The portion is arranged between the second chamber 19a and the hollow portion 12c of the gas supply portion 11c. Therefore, the partition wall 26 partitions the hollow portion 12c of the gas supply portion 11c and the second chamber 19a in the inner chamber 17c of the planar purge portion 13c. The partition wall 26 constitutes a wall surface through which the purge gas does not pass, and the purge gas of the gas supply unit 11c is supplied to the second chamber 19a via the first chamber 18a instead of directly flowing into the second chamber 19a. ..

The planar purge portion 13c has two partition walls 26 arranged substantially symmetrically in the width direction. A gap is formed between the two partition walls 26, and the gap between the two partition walls 26 is the second passage 21a. The second passage 21a is arranged at a substantially central portion in the width direction of the planar purge portion 13c of the partition wall 26. The second passage 21a communicates the first chamber 18a and the second chamber 19a of the planar purge portion 13c.

As shown in FIG. 8A, the length of the second passage 21a in the height direction is substantially the same as the internal chamber 17c of the planar purge portion 13c. The length of the second passage 21a in the width direction is not particularly limited, but is preferably 5 to 85% of the length W1 of the ejection surface 14 in the width direction.

As shown in FIG. 8B, the partition wall 26 arranged between the first chamber 18a and the second chamber 19a is curved with the same curvature as the ejection surface 14 when viewed from above, and is a surface. It is arranged at a substantially central portion of the ejection surface 14 and the back surface 16 in the thickness direction of the shape purge portion 13a. The length of the partition wall 26 in the height direction is substantially the same as the internal chamber 17c of the planar purge portion 13c. It is preferable that the partition wall 26 arranged between the second chamber 19a and the hollow portion 12c is provided outside the ejection surface 14 in the width direction so that a part thereof protrudes.

According to the present embodiment, when the purge gas flows from the first chamber 18a to the second chamber 19a of the planar purge portion 13c, the purge gas flows in from the substantially central portion in the width direction of the planar purge portion 13c. As a result, the purge nozzle 120 is arranged in the central portion in the width direction of the planar purge portion 13c, and prevents the gas supply amount to the ventilation hole 15 having a long distance from the gas supply portion 11c from becoming relatively small, and is horizontal. It is possible to suppress variations in the amount of gas supplied in the direction. As a result, the supply amount of the purge gas supplied from the planar purge portion 13c to the inside of the pod can be equalized, and the inside of the pod can be purged efficiently and with high cleanliness.

In this embodiment, in addition to the above configuration, a pressure regulating member may be arranged in the second passage 21a. Thereby, the above-mentioned effect can be further enhanced.

Although the pod and the purging device according to the present invention have been described above by showing embodiments, the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention. ..

For example, in the above-described embodiment, gas is supplied to the purge nozzle 10 through the pair of gas supply units 11 and the gas supply hole 5, but the number of the gas supply unit 11 and the gas supply hole 5 is limited to this. It is not a thing, and may be one or three or more.

Further, the shape and dimensions of the planar purge portion 13 and the shape, number and arrangement of the ventilation holes 15 provided in the planar purge portion 13 are not limited to the description of the embodiment and the drawings, and the wafer 2 is accommodated. It can be appropriately changed according to the number, the internal volume of the pod 1, the required cleanliness, the purging efficiency, the ease of processing, and the like.

Further, in the above-described embodiment, the case where the planar purge portion 13 is arranged between the opening facing surface 3b of the pod body and the wafer 2 is illustrated, but the arrangement of the planar purge portion 13 is not limited to this. For example, the planar purge portion 13 may be arranged on the opening facing surface 3b (that is, the ventilation hole 15 may be directly formed on the opening facing surface 3b). Further, the planar purge portion 13 is a pair of inner surface surfaces 3d adjacent to the opening facing surface 3b of the pod body (in FIG. 3, among the surfaces adjacent to the opening facing surface 3b of the pod body, the inner bottom surface 3c and the ceiling surface 3e). It may be arranged on one surface (a surface excluding) or between this and the wafer 2. Further, the planar purge portion 13 may be arranged on a plurality of surfaces of the opening facing surface 3b of the pod body and the pair of inner surface surfaces 3d, or between these and the wafer 2. In this case, each planar purge portion is configured to eject purge gas from the ventilation holes 15 substantially in parallel with the extending surface of the wafer 2 juxtaposed in the height direction.

Further, in the above-described embodiment, the case where the gas supply unit 11 is arranged so as to stand upright from the inner bottom surface 3c of the pod body toward the inside of the pod is illustrated, but the gas supply unit 11 is arranged from the ceiling surface 3e of the pod body. It may be placed upright toward the inside of the pod. Further, if it is possible to evenly supply the purge gas from the ventilation holes 15 of the planar purge portion 13, the gas supply port 31 of the mounting table is connected to the lower end of the planar purge portion 13 without going through the gas supply unit 11. It is also possible to construct a configuration in which the purge gas is introduced.

Further, in the above-described embodiment, the FOUP preferably used for the semiconductor processing apparatus is exemplified as the pod according to the present invention, but the present invention is not limited to the FOUP or the like used for the semiconductor processing apparatus, for example, a liquid crystal display. It can also be applied to pods used in various processing devices that perform processing similar to semiconductors, such as processing devices that handle display panels. Further, the object to be accommodated in the pod is not limited to the wafer, and may be a glass substrate used for a display device, a photoelectric conversion device, or the like.

1: Pod 2: Wafer 3: Pod body 3a: Opening 3b: Opening facing surface 3c: Inner bottom surface 3d: Inner side surface 3e: Ceiling surface 4: Lid 5: Gas supply holes 10, 100, 110, 120: Purge nozzles 11, 11a ~ 11c: Gas supply parts 12, 12a ~ 12c: Hollow parts 13, 13a ~ 13c: Planar purge part 14: Ejection surface 15: Vent holes 16: Back 17, 17a ~ 17c: Internal chambers 18, 18a: First chamber
19, 19a: 2nd chamber 20, 20a: 1st passage 21, 21a: 2nd passage 22: 1st pressure adjusting member 23: 2nd pressure adjusting member 24-26: partition wall 30: mounting table 31: gas supply port 32 : Purge device 33: Gas supply source
34: Piping 35: Flow rate adjusting means

Claims (17)

A pod body that can accommodate flat plates of objects placed side by side in the height direction,
An opening provided on one side of the pod body and
A lid that can be detachably attached to the opening so as to seal the pod body,
At least one of an inner surface facing the opening of the pod body and a pair of inner surfaces adjacent thereto having a plurality of ventilation holes for ejecting purge gas toward the contained object juxtaposed in the height direction. A planar purge section arranged on one surface or between the at least one surface and the contained object.
The purge gas is supplied to the planar purge portion through a first passage while standing upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside. Has a gas supply unit
A pressure regulating member is arranged in the first passage.
The pressure adjusting member is a pod made of a filter-shaped member and partitioning the gas supply section and the planar purge section . A pod body that can accommodate flat plates of objects placed side by side in the height direction,
An opening provided on one side of the pod body and
A lid that can be detachably attached to the opening so as to seal the pod body,
At least one of an inner surface facing the opening of the pod body and a pair of inner surfaces adjacent thereto having a plurality of ventilation holes for ejecting purge gas toward the contained object juxtaposed in the height direction. A planar purge section arranged on one surface or between the at least one surface and the contained object.
The purge gas is supplied to the planar purge portion through a first passage while standing upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside. Gas supply unit and
It has a partition wall that separates the gas supply unit and the planar purge unit .
The first passage is arranged at a substantially central portion of the planar purge portion in the height direction.
The partition wall separates the adjacent gas supply section and the planar purge section above the first passage, and below the first passage, the adjacent gas supply section and the surface thereof. A pod that separates from the purging section . A pod body that can accommodate flat plates of objects placed side by side in the height direction,
An opening provided on one side of the pod body and
A lid that can be detachably attached to the opening so as to seal the pod body,
At least one of an inner surface facing the opening of the pod body and a pair of inner surfaces adjacent thereto having a plurality of ventilation holes for ejecting purge gas toward the contained object juxtaposed in the height direction. A planar purge section arranged on one surface or between the at least one surface and the contained object.
The purge gas is supplied to the planar purge portion through a first passage while standing upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside. Has a gas supply unit
The planar purge section is a first chamber that communicates with the gas supply section via the first passage, and a first chamber that communicates with the first chamber and the second passage and has a plurality of ventilation holes. It is provided with two chambers and a partition wall separating the first chamber and the second chamber .
The second passage is composed of a hole arranged at a substantially central portion in the width direction of the planar purge portion.
The partition wall is a pod characterized by blocking the movement of the purge gas from the first chamber to the second chamber on both sides of the second passage . The planar purge section is a first chamber that communicates with the gas supply section via the first passage, and a first chamber that communicates with the first chamber and the second passage and has a plurality of ventilation holes. The pod according to claim 1 or 2, characterized in that it comprises two chambers. The pod according to claim 4, wherein the second passage is arranged at a substantially central portion in the width direction of the planar purge portion. The pod according to any one of claims 3 to 5, wherein a pressure regulating member is arranged in the second passage. The pod according to any one of claims 2 to 6, wherein a pressure regulating member is arranged in the first passage. At least two gas supply units are arranged inside the pod body.
The pod according to any one of claims 1 to 7, wherein the planar purge section is arranged between the pair of gas supply sections and is communicated with both of the pair of gas supply sections. The pod purging device according to claim 8.
Gas source and
Piping connected to each of the pair of gas supply units from the gas supply source, and
A purging device comprising: a flow rate adjusting means for adjusting the flow rate of the purge gas supplied to each of the pair of gas supply units via the pipe. A pod body that can accommodate flat plates of objects placed side by side in the height direction,
An opening provided on one side of the pod body and
A lid that can be detachably attached to the opening so as to seal the pod body,
At least one of an inner surface facing the opening of the pod body and a pair of inner surfaces adjacent thereto having a plurality of ventilation holes for ejecting purge gas toward the contained object juxtaposed in the height direction. A planar purge section arranged on one surface or between the at least one surface and the contained object.
The purge gas is supplied to the planar purge portion through a first passage while standing upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside. Has a gas supply unit
A pressure regulating member is arranged in the first passage.
The planar purge section is a first chamber that communicates with the gas supply section via the first passage, and a first chamber that communicates with the first chamber and the second passage and has a plurality of ventilation holes. A pod characterized by having two rooms. A pod body that can accommodate flat plates of objects placed side by side in the height direction,
An opening provided on one side of the pod body and
A lid that can be detachably attached to the opening so as to seal the pod body,
At least one of an inner surface facing the opening of the pod body and a pair of inner surfaces adjacent thereto having a plurality of ventilation holes for ejecting purge gas toward the contained object juxtaposed in the height direction. A planar purge section arranged on one surface or between the at least one surface and the contained object.
The purge gas is supplied to the planar purge portion through a first passage while standing upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside. Has a gas supply unit
The first passage is characterized in that it is arranged at a substantially central portion of the planar purge portion in the height direction.
The planar purge section is a first chamber that communicates with the gas supply section via the first passage, and a first chamber that communicates with the first chamber and the second passage and has a plurality of ventilation holes. A pod characterized by having two rooms. The pod according to claim 10 or 11, wherein the second passage is arranged at a substantially central portion in the width direction of the planar purge portion. The pod according to any one of claims 10 to 12, wherein a pressure regulating member is arranged in the second passage. A pod body that can accommodate flat plates of objects placed side by side in the height direction,
An opening provided on one side of the pod body and
A lid that can be detachably attached to the opening so as to seal the pod body,
At least one of an inner surface facing the opening of the pod body and a pair of inner surfaces adjacent thereto having a plurality of ventilation holes for ejecting purge gas toward the contained object juxtaposed in the height direction. A planar purge section arranged on one surface or between the at least one surface and the contained object.
The purge gas is supplied to the planar purge portion through a first passage while standing upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside. Has a gas supply unit
The planar purge section is a first chamber that communicates with the gas supply section via the first passage, and a first chamber that communicates with the first chamber and the second passage and has a plurality of ventilation holes. With 2 rooms
The second passage is arranged at a substantially central portion in the width direction of the planar purge portion.
A pod characterized in that a pressure regulating member is arranged in the second passage. A purge device having a purge body for supplying purge gas to the pod.
The pod is
A pod body that can accommodate flat plates of objects placed side by side in the height direction,
An opening provided on one side of the pod body and
A lid that can be detachably attached to the opening so as to seal the pod body,
At least one of an inner surface facing the opening of the pod body and a pair of inner surfaces adjacent thereto is provided with a plurality of ventilation holes for ejecting the purge gas toward the contained object juxtaposed in the height direction. A planar purge section arranged on one surface or between the at least one surface and the object to be contained.
The purge gas is supplied to the planar purge portion through a first passage while standing upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside. Has a gas supply unit
A pressure regulating member is arranged in the first passage.
At least two gas supply units are arranged inside the pod body.
The planar purge section is arranged between the pair of gas supply sections and communicates with both of the pair of gas supply sections.
The purge body is
Gas source and
Piping connected to each of the pair of gas supply units from the gas supply source, and
A purge device having a flow rate adjusting means for adjusting the flow rate of the purge gas supplied to each of the pair of gas supply units via the pipe. A purge device having a purge body for supplying purge gas to the pod.
The pod is
A pod body that can accommodate flat plates of objects placed side by side in the height direction,
An opening provided on one side of the pod body and
A lid that can be detachably attached to the opening so as to seal the pod body,
At least one of an inner surface facing the opening of the pod body and a pair of inner surfaces adjacent thereto is provided with a plurality of ventilation holes for ejecting the purge gas toward the contained object juxtaposed in the height direction. A planar purge section arranged on one surface or between the at least one surface and the object to be contained.
The purge gas is supplied to the planar purge portion through a first passage while standing upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside. Has a gas supply unit
The first passage is arranged at a substantially central portion of the planar purge portion in the height direction.
At least two gas supply units are arranged inside the pod body.
The planar purge section is arranged between the pair of gas supply sections and communicates with both of the pair of gas supply sections.
The purge body is
Gas source and
Piping connected to each of the pair of gas supply units from the gas supply source, and
A purge device having a flow rate adjusting means for adjusting the flow rate of the purge gas supplied to each of the pair of gas supply units via the pipe. A purge device having a purge body for supplying purge gas to the pod.
The pod is
A pod body that can accommodate flat plates of objects placed side by side in the height direction,
An opening provided on one side of the pod body and
A lid that can be detachably attached to the opening so as to seal the pod body,
At least one of an inner surface facing the opening of the pod body and a pair of inner surfaces adjacent thereto is provided with a plurality of ventilation holes for ejecting the purge gas toward the contained object juxtaposed in the height direction. A planar purge section arranged on one surface or between the at least one surface and the object to be contained.
The purge gas is supplied to the planar purge portion through a first passage while standing upright toward the inside of the pod body from a gas supply hole provided on the inner bottom surface of the pod body and to which the purge gas is supplied from the outside. Has a gas supply unit
The planar purge section is a first chamber that communicates with the gas supply section via the first passage, and a first chamber that communicates with the first chamber and the second passage and has a plurality of ventilation holes. With 2 rooms
The second passage is arranged at a substantially central portion in the width direction of the planar purge portion.
At least two gas supply units are arranged inside the pod body.
The planar purge section is arranged between the pair of gas supply sections and communicates with both of the pair of gas supply sections.
The purge body is
Gas source and
Piping connected to each of the pair of gas supply units from the gas supply source, and
A purge device having a flow rate adjusting means for adjusting the flow rate of the purge gas supplied to each of the pair of gas supply units via the pipe.

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