JP7023538B2 - Surface plate for finish polishing, finish polishing equipment and polishing method - Google Patents

Description

The present invention relates to a surface plate for finish polishing, a finish polishing device, and a polishing method, and particularly to a technique suitable for use when finishing polishing a single-sided polishing sample and when polishing a composite material made of materials having significantly different wear resistance.

Conventionally, as a polishing device in which a polishing film is provided on a surface plate, a polishing device in which the polishing film is fixed on the surface plate via an elastic body and a polishing device in which the polishing film is directly fixed on the surface plate are known. ing. As this known polishing apparatus, for example, as described in Patent Document 1, two types of polishing films, a polishing film for roughing and a polishing film for finish polishing, are mounted on a polishing platen. If necessary, an elastic body is mounted between the polishing platen and the polishing film.

When an elastic body is mounted between the polishing surface plate and the polishing film, or when a polishing cloth on which free abrasive grains are sprayed is used, the free abrasive grains may intervene and the soft part of the polishing sample is used. There is a problem that the surface plate is excessively polished and dug, and the peripheral portion of the hard portion surrounded by the soft portion is also excessively polished, causing a border dripping phenomenon.

Also, when the fixed abrasive grain film is mounted on a flat polishing surface plate, if the lubricating material, for example, a film of water is thick, water may intervene between the fixed abrasive grain film and the polishing sample and polish at all. Alternatively, there is a problem that the polished surface of the polished sample sticks to the fixed abrasive grain film like a suction plate and is difficult to polish. Further, there is also a problem that shavings enter between the polishing surface of the polishing sample and the fixed abrasive grain film and damage the polishing surface of the polishing sample.

As a technique for solving these problems, as described in Patent Document 2, a surface plate for finish polishing in which a number of grooves having a width of several millimeters parallel to a flat glass plate are formed is known.

Japanese Unexamined Patent Publication No. 2007-185754 Japanese Patent No. 5317095

However, the above-mentioned polishing wrapping film, which is a conventional technique, is an excellent film for smoothly polishing a material and is widely distributed. However, when a flat polishing sample is prepared by using a polishing wrapping film, the polishing wrapping film is used. Since the polishing lapping film is placed on a hard plate (glass plate) with high flatness and the sample is manually polished while sprinkling a lubricating liquid such as water, the smaller the abrasive grain size, the closer the sample to be polished and the film, and the resistance The problem that the polished sample does not slide smoothly on the polishing film and may not be polished cleanly has not been solved, and this problem becomes more remarkable as the polished surface of the polished sample becomes larger.
At the same time, the problem that shavings may cause a large number of scratches on the polished surface of the polished sample has not been solved, and this problem becomes more pronounced as the polished surface of the polished sample becomes larger.

Further, in the technique described in Patent Document 2, since manual polishing requires a long time to make a sample mirror-finished, there is a demand for shortening this, and this problem is solved. It became more prominent as the polished surface of the polished sample became larger.
In addition, since it is polished in a certain direction (vertical direction), it has skill in polishing the sample surface evenly. Therefore, there is a problem that the polishing state may differ depending on the skill level of the operator. This problem also becomes more prominent as the polished surface of the polished sample becomes larger.

Further, when the polished surface of the polished sample is analyzed by SIMS (secondary ion mass analysis method), the soft part of the polished sample is excessively polished and dug, and the peripheral edge of the hard part surrounded by the soft part is obtained. When the edge dripping phenomenon occurs in which the portion is also excessively polished, there is a problem that the flatness of the analysis surface (polished surface) is insufficient and the analysis may not be performed well. This problem also became more remarkable as the processing time increased as the polished surface of the polished sample became larger.

Further, if the polishing sample is small, the time required for the flattening treatment by polishing is short, but if the polishing sample is large, the time required for the flattening treatment by polishing becomes long, and there is a demand for shortening this. Furthermore, as the size of the polished sample becomes large, the flattening process by polishing becomes difficult, and the efficiency and accuracy of sample preparation depend on the skill level of the worker. Was occurring.

The present invention has been made in view of the above circumstances, and is intended to achieve the following object.
1. 1. Prevention of sagging on polished samples.
2. 2. Prevention of uneven polishing in each area due to difference in hardness.
3. 3. Prevents sticking of polished samples.
4. Prevents scratches on the surface of the polished sample.
5. Prevents damage to the polishing film.
6. Achieves the possibility of handling depending on the size of the polished sample.
7. Realization of polishing sample creation regardless of the skill level of the operator.

The platen for finish polishing of the present invention has a flexible polishing film and a flat polishing surface on which the polishing film is mounted, and a plurality of island-shaped island-shaped convex portions and the island-shaped protrusions are formed on the polishing surface. It is provided with a platen provided with a groove-shaped concave portion having a continuous groove shape between the convex portions, and the island-shaped convex portion has a hexagonal shape in a plan view, and the island-shaped convex portions are adjacent to each other. The distance between the two is arranged in a plane so as to be equal to the width dimension of the groove-shaped recess, and the diameter dimension of the island-shaped convex portion is 1.5 to 2.5 times the width dimension of the groove-shaped recess. The problem is that the corner portion of the boundary between the groove-shaped concave portion and the island-shaped convex portion is rounded to the same degree as the radius of curvature of half the depth of the groove-shaped concave portion. Was solved .
The finish polishing apparatus of the present invention can have a rotating means for rotating the surface plate in the surface plate for finish polishing according to any one of the above with respect to a rotation axis orthogonal to the polishing surface.
In the finish polishing apparatus of the present invention, the rotating means may have a rotating plate that rotates around the rotating axis, and the rotating plate may have a holding means for holding the surface plate.
In the finish polishing apparatus of the present invention, it is preferable that the surface plate is made of stainless steel having magnetism, and the holding means is capable of magnetizing the rotating plate and the surface plate.
The polishing method of the present invention is a method of polishing using the finishing polishing apparatus according to any one of the above.
The first step of generating edge sagging on the polished sample using a flat surface plate and polishing abrasive grains,
After the first step, a means having a second step of using the surface plate of the finish polishing apparatus and the polishing film to eliminate the edge sagging and to make the polished surface of the polishing sample a flat surface. Alternatively, a means in which the polishing abrasive grains are made into an alumina paste can be adopted.

The platen for finish polishing of the present invention has a flexible polishing film and a flat polishing surface on which the polishing film is mounted, and a plurality of island-shaped island-shaped convex portions and the island-shaped protrusions are formed on the polishing surface. By providing a platen with a continuous groove-shaped concave portion between the convex portions, the drainage effect is efficiently exhibited from the groove-shaped concave portion extending in multiple directions instead of one direction. Therefore, it is possible to improve the ease of draining the lubricating material (for example, water), and the polished surface of the polishing sample and the polishing film can easily come into contact with each other, and the polishing efficiency can be improved. Further, by easily discharging the shavings generated from the polished sample to the recesses of the polishing film on the groove-shaped recesses of the surface plate, the frequency of damaging the polished surface is significantly reduced.
Further, since the island-shaped convex portion is divided by the groove-shaped concave portion, the edge portion of the island-shaped convex portion corresponding to the region where polishing is performed extends not in one direction but in multiple directions, and the polishing sample. Even when the surfaces have regions with different hardness, it is possible to prevent the occurrence of sagging.
At the same time, since the island-shaped convex portion is divided by the groove-shaped concave portion extending in multiple directions instead of one direction, the polishing surface of the polishing sample and the polishing film move relatively to perform polishing. It is possible to prevent the polishing surface of the polishing sample and the polishing film from coming into close contact with each other and making polishing impossible.
Further, since the drainage of the lubricating material is easily performed by the groove-shaped recesses, the polished surface of the polished sample and the polishing film can be easily contacted, the polishing efficiency is improved, and the polished surface of the polished sample becomes large. Even if this is the case, the processing time can be shortened.
Further, since the island-shaped convex portion has a hexagonal shape in a plan view, the island-shaped convex portion is divided into groove-shaped concave portions extending in multiple directions instead of one direction, and the lubricant can be used. It is possible to effectively prevent drainage, adhesion of the polished sample, and sagging.
Further, by arranging them in a plane so that the distance between the adjacent island-shaped convex portions is equal to the width dimension of the groove-shaped concave portions, the lubricant can be drained and the polishing sample can be prevented from sticking. It is possible to effectively prevent sagging.
Further, by setting the diameter dimension of the island-shaped convex portion to a range of 1.5 to 2.5 times the width dimension of the groove-shaped concave portion, drainage of the lubricant and prevention of sticking of the polishing sample can be achieved. It is possible to effectively prevent sagging.

The finish polishing apparatus of the present invention has a rotating means for rotating the surface plate of the finish polishing surface plate according to any one of the above with respect to a rotation axis orthogonal to the polishing surface, whereby the polishing surface of the polishing sample is obtained. Since the state of contact between the polishing film and the polishing film can be changed by rotation to perform polishing, the rotation makes it easier to drain the lubricant, which is effective in preventing the polishing sample from sticking and dripping. Can be realized.

In the finish polishing apparatus of the present invention, the rotating means has a rotating plate that rotates around the rotating axis, and the rotating plate has a holding means for holding the surface plate, so that the lubricant can be drained. By effectively preventing the polishing sample from sticking and sagging, it is possible to perform the polishing process without depending on the skill level of the operator.

In the finish polishing apparatus of the present invention, the surface plate is made of magnetic stainless steel, and the holding means is capable of magnetizing the rotating plate and the surface plate, so that the polishing film can be easily replaced. And, the adhesion of the polishing film to the surface plate can be improved.

The polishing method of the present invention is a method of polishing using the finishing polishing apparatus according to any one of the above.
The first step of generating edge sagging on the polished sample using a flat surface plate and polishing abrasive grains,
After the first step, a means having a second step of using the surface plate of the finish polishing apparatus and the polishing film to eliminate the edge sagging and to make the polished surface of the polishing sample a flat surface. mosquito,
A means in which the abrasive grains are made into an alumina paste can be adopted, whereby the amount (surface area) to be ground by the polishing film can be reduced by the first step, so that the working time required for flattening can be further reduced. It can be shortened and polished quickly.
Further, since a further gap can be formed between the polishing film and the polishing sample, the shavings can be more easily escaped and discharged to the outside, and the rate of damaging the sample surface can be reduced.

According to the present invention, it is possible to prevent the occurrence of sagging in the polished sample, prevent the occurrence of uneven polishing in each region due to the difference in hardness on the polished surface of the polished sample, and prevent the occurrence of sticking of the polished sample to the polishing film. However, it prevents scratches on the surface of the polished sample due to shavings, prevents sticking and damage to the polishing film due to other causes, realizes the possibility of handling depending on the size of the polished sample, and is skilled by the operator. It is possible to achieve the effect that it is possible to prepare a polished sample regardless of the degree.

It is a top view which shows 1st Embodiment of the surface plate for finish polishing which concerns on this invention. It is an enlarged sectional view which shows the 1st Embodiment of the surface plate for finish polishing which concerns on this invention. It is a schematic front view which shows 1st Embodiment of the finish polishing apparatus which concerns on this invention. It is a figure explaining the state which the polishing film made from the fixed abrasive grain film is mounted on the 1st Embodiment of the finish polishing apparatus which concerns on this invention, and the polishing sample is polished. It is a top view which shows the 2nd Embodiment of the surface plate for finish polishing which concerns on this invention. It is an image which shows the sample polishing surface in the polishing example by the surface plate for finish polishing which concerns on this invention. It is an image which shows the sample polishing surface in the polishing example by the surface plate for finish polishing which concerns on this invention. It is an image which shows the sample polishing surface in the polishing example by the surface plate for finish polishing which concerns on this invention. It is an image which shows the sample polishing surface in the polishing example by the surface plate for finish polishing which concerns on this invention.

Hereinafter, the first embodiment of the finish polishing surface plate and the finish polishing apparatus according to the present invention will be described with reference to the drawings. The present invention is not limited to this, and various changes, modifications, and improvements can be made based on the knowledge of those skilled in the art without departing from the scope of the present invention.
FIG. 1 is a plan view showing a surface plate for finish polishing in the present embodiment, FIG. 2 is an enlarged cross-sectional view showing a surface plate for finish polishing in the present embodiment, and FIG. 3 is a finish in the present embodiment. It is a schematic front view which shows the polishing apparatus, and in the figure, reference numeral 1 is a surface plate for finish polishing.

The finish polishing surface plate 1 according to the present embodiment is specified for polishing composite materials having different hardness into sample flakes, and as shown in FIGS. 1 and 2, for example, a plate 2 On the surface of the above, a plurality of island-shaped convex portions 5 and groove-shaped concave portions 4 having a continuous groove shape between the island-shaped convex portions 5 are provided.

As the plate body 2, for example, a known metal plate having magnetism or the like is used, and it can be preferably made of a stainless steel plate having magnetism. The plate body 2 has a flat disk shape of about φ100 to 300 mm, preferably about φ150 mm (± 15 mm) or 200 mm (± 20 mm), and a thickness of about 1.5 to 3 mm, preferably about 2 mm (± 0.2 mm). It is supposed to be. Further, those in the SUS200 series can be applied.

As shown in FIGS. 1 and 2, the island-shaped convex portions 5 are hexagonal in a plan view, and the individual island-shaped convex portions 5 are separated from each other so as to be in a close-packed state. Have been placed.
The diameter dimension T1 of the island-shaped convex portion 5 can be set according to the size of the polishing surface in the polishing sample 8, but is 1/2 to 3/3/3/3 with respect to the polishing sample surface diameter dimension of the polishing sample 8. It is set in the range of 2. Specifically, the diameter dimension T1 of the island-shaped convex portion 5 can be set to about 12 mm (± 1.2 mm), which is in the range of 8 mm to 20 mm. The diameter dimension T1 of the island-shaped convex portion 5 is the distance between the opposite sides of the island-shaped convex portion 5.

The separation distances of the adjacent island-shaped convex portions 5 are set to be equal to each other. At the edge position of the plate body 2, the contour of the island-shaped convex portion 5 is not hexagonal, but it may be formed so that the distance between the adjacent island-shaped convex portions 5 is equal.

The planar contour of the island-shaped convex portion 5 is hexagonal in the present embodiment, but the present invention is not limited to this as long as it can be arranged in the most dense state on the plane, and the shape is circular, elliptical, or the number of angles. Polygons larger than 6 can also be adopted. In this case, the width dimension of the groove-shaped concave portion 4 described later becomes uneven depending on the location, but it is sufficient that the arrangement state of the island-shaped convex portion 5 is maintained in the same manner as in the case of a hexagon.

At the contour position of the island-shaped convex portion 5, the end portion thereof is in a state where the groove-shaped concave portion 4 is formed by grinding, that is, the side surface of the island-shaped convex portion 5 or the groove-shaped concave portion 4 is in the normal direction of the main surface of the plate body 2. It is formed in a steep state so as to be equal to.

As shown in FIGS. 1 and 2, the groove-shaped concave portion 4 is formed between the adjacent island-shaped convex portion 5 and the island-shaped convex portion 5, and the width dimension T2 of the groove-shaped concave portion 4 is the island-shaped convex portion. It is provided so as to be equal to the separation distance between the five. The width dimension T2 of the groove recess 4 is set to be equal to the entire surface of the plate body 2, and is set to be equal to about half of the diameter dimension T1 of the island-shaped convex portion 5. Specifically, the width dimension T2 of the groove recess 4 can be set to about 6 mm (± 0.6 mm), which is in the range of 4 mm to 10 mm.

Further, the groove recess 4 is carved so that the depth dimension from the top of the island-shaped convex portion 5 is in the range of 50 to 300 μm, preferably about 100 to 200 μm (± 10 μm). The groove-shaped concave portion 4 extends between the adjacent island-shaped convex portions 5 and the island-shaped convex portions 5, and all the groove-shaped concave portions 4 are continuously connected on the surface of the plate body 2. ..

The groove-shaped recess 4 can be formed on the surface of a plate body 2 made of metal by a known method such as etching, grinding, or cutting.

The corner portion 6 at the boundary between the groove-shaped concave portion 4 and the island-shaped convex portion 5 can be rounded to the same degree as the radius of curvature of half the depth of the groove-shaped concave portion 4.

The polishing film 7 mounted on the finish polishing surface plate 1 in the present embodiment is not particularly described, but for example, a known fixed abrasive grain film is used, and a finishing application having an abrasive particle size of about 0.3 μm to 3 μm is used. It is supposed to be.

The polished sample 8 has regions having different hardness on the surface of the polished sample, and the difference in Mohs hardness between the high hardness region and the low hardness region on the polished sample surface can be 3 or more. If there is a difference in hardness on the surface of the polished sample, sagging is likely to occur, but in the finish polishing surface plate 1 of the present embodiment, even such a polished sample can be suitably polished.
Further, the high hardness region has a Mohs hardness of about 4 to 8, and can include glass, minerals, metals and the like, and the low hardness region can include viscosity minerals softer than the resin. As a low hardness region, indium, which has a Mohs hardness of about 1 to 3, can be mentioned.
As the polishing sample, for example, a plurality of polishing samples such as rocks may be embedded in the surface of a resin cylindrical base material having a diameter of about 25 mm.

As shown in FIG. 3, the finish polishing apparatus 10 in the present embodiment rotates around the rotation axis C as a rotation means for rotating the finish polishing platen 1 with respect to the rotation axis C orthogonal to the main surface to be the polishing surface. A rotary plate 11 and a drive source 12 such as a motor for rotating the rotary plate 11 are provided, and as a holding means for holding the finish polishing platen 1 on the rotary plate 11, the rotary plate 11 and the finish polishing are performed. It has a magnetized portion 13 capable of magnetizing the platen 1, and a supply means 14 capable of supplying, for example, a lubricant 9 as water to the polished surface from a position above the rotating plate 11.

As shown in FIG. 3, the rotary plate 11 has a diameter dimension similar to that of the finish polishing surface plate 1 or a disk larger than the finish polishing surface plate 1, and the upper surface thereof is a flat surface and a magnetized portion. 13 is embedded. The rotary plate 11 is connected to the drive source 12 via the rotary shaft 11a, and the rotary shaft 11a is erected at the center position of the lower surface of the rotary plate 11.
As shown in FIG. 3, the magnetized portion 13 is provided on the entire surface of the rotating plate 11 to have a uniform thickness, and is an anisotropic rubber magnet sheet having a flat upper surface thereof, or the rotating plate 11 is provided with an anisotropic rubber magnet sheet. It can also be an electromagnet that is flush with the top surface and can switch magnetism on and off.

As shown in FIG. 4, the finish polishing apparatus 10 places a finish polishing surface plate 1 on which a polishing film 7 is mounted on a rotating plate 11, rotates the rotating plate 11 by a drive source 12, and supplies means 14. The lubricant 9 is supplied to the upper surface of the polishing film 7 and the polishing sample 8 is pressed against the polishing film 7 to perform the polishing treatment. Then, the excess lubricating material 9 is discharged from any of the groove-shaped recesses 3 continuous on the entire surface of the plate material 2, and the polishing film 7 drops into the groove-shaped recesses 3 at the groove-shaped recesses 3 of the finish polishing surface plate 1. In the packed state, an arc-shaped recess 4a is formed on the surface of the polishing film 7 in a shape corresponding to the groove-shaped recess 3.

As described above, due to the discharge of the excess lubricating material 9 from the groove-shaped recess 3 and the arc-shaped recess 10 formed on the surface of the polishing film 7, the drainage effect of the groove-shaped recess 3 of the finish polishing surface plate 1 For example, the excess lubricant 9 made of water is discharged, and the lubricant 9 is hardly interposed between the polishing surface of the polishing sample 8 and the polishing film 7 above the island-shaped convex portion 5. As a result, the polishing surface of the polishing sample 8 and the polishing film 7 can easily come into contact with each other above the island-shaped convex portion 5, and the polishing efficiency can be improved.

Further, since the contact area between the polishing surface of the polishing sample 8 and the polishing film 7 is limited by the formation of the arcuate concave portion 4a, the polishing surface of the polishing sample 8 is difficult to adhere to the polishing film 7, and thus the action required for polishing. The force can be reduced or the polishing process time can be shortened. Since the shavings K generated from the polishing sample 8 are discharged to the arc-shaped recess 4a of the polishing film on the groove-shaped recess 3 of the surface plate, the frequency of damaging the polished surface is significantly reduced.
Even when polishing a polishing sample 8 made of a composite material having a difference in hardness on the surface of the polishing sample, it is possible to perform polishing with high flatness and flatness by preventing sagging and partial difference in polishing state.

According to this embodiment, the polishing sample 8 itself may be destroyed. Therefore, even if the work skill level is low, the requirement that a valuable sample without a substitute, such as a single item, is not to be mechanically squeezed is satisfied. It is possible to easily prepare a polished sample 8 having high flatness and flatness in a short time.

Hereinafter, a second embodiment of the surface plate for finish polishing according to the present invention will be described with reference to the drawings.
FIG. 5 is a plan view showing a surface plate for finish polishing in this embodiment.
In this embodiment, the difference from the first and second embodiments described above is in terms of the dimensions of the island-shaped convex portion 5 and the groove-shaped concave portion 3, and the other corresponding components are designated by the same reference numerals. And the explanation is omitted.

In the present embodiment, the width dimension T2 of the groove-shaped concave portion 3 is smaller than the diameter dimension T1 of the island-shaped convex portion 5, and the diameter dimension T1 of the island-shaped convex portion 5 is in the range of 2 to 8 mm. It can be set to about 4 mm (± 4 mm).
The width dimension T2 of the groove recess 4 is provided so as to be equal to the separation distance between the island-shaped convex portions 5. The width dimension T2 of the groove recess 4 is set to be equal on the entire surface of the plate body 2. Specifically, the width dimension T2 of the groove recess 4 can be set to about 2 mm (± 0.2 mm), which is in the range of 1 to 4 mm.

The polished sample 8 has regions having different hardness on the surface of the polished sample, and the difference in Mohs hardness between the high hardness region and the low hardness region on the polished sample surface can be 3 or more. If there is a difference in hardness on the surface of the polished sample, sagging is likely to occur, but in the finish polishing surface plate 1 of the present embodiment, even such a polished sample can be suitably polished.
As the polishing sample, for example, a plurality of polishing samples such as rocks may be embedded in the surface of a resin cylindrical base material having a diameter of about 5 to 10 mm.

In the present embodiment, the width dimension T2 of the groove recess 4 and the diameter dimension T1 of the island-shaped convex portion 5 are set as described above, so that they are smaller than the polishing sample 8 in the first embodiment. Polishing can be performed corresponding to the polishing sample 8.

Further, in the present embodiment, first, the alumina paste is supplied to a normal surface plate without groove recesses 4 to perform the first polishing step, and then the finish polishing surface plate 1 and the polishing film 7 of the present embodiment are performed. The second polishing step was performed using.

In the first polishing step, a surface plate having no groove concave portion 4 and an island-shaped convex portion 5 is used for processing, so that a high hardness region and a low hardness region having a difference in hardness on the surface of the polished sample are included. In that case, sagging may occur. In addition, the low hardness region may be over-polished.
However, in the present embodiment, by performing the second polishing step after the first polishing step, the amount (surface surface) to be polished by the polishing film can be reduced by the first polishing step (first step). The second polishing step (second step) makes it possible to further shorten the work time required for flattening and to perform polishing quickly.

Further, since a further gap can be formed between the polishing film 7 and the polishing sample 8, the shavings K can be more easily escaped and discharged to the outside to reduce the rate of damaging the sample surface. Can be done.

Hereinafter, examples of the present invention will be described.

FIG. 6 is an image showing a polished sample obtained by performing the first step in the second embodiment using a surface plate having no groove-shaped recess 4.
Here, the polishing treatment was performed using an alumina paste of 0.3 μm as the free abrasive grains. As shown in the figure, it can be seen that significant edge sagging occurs due to the difference in material hardness.
In the figure, the hardness of the polished sample is
Hardness: Clay mineral (black part) <volcanic glass (light gray) <igneous mineral (white polygon).

FIG. 7 is an image showing a polishing sample obtained by performing a second step on the polishing sample shown in FIG. 6 using the finish polishing surface plate 1 in the above-mentioned second embodiment.
Here, using a polishing film (wrapping film) having an abrasive particle size of 3 μm, the rotating plate 11 is rotated at 300 rpm for 1 minute, and then the polishing film (wrapping film) has an abrasive particle size of 0.5 μm. Finish polishing was performed for 2 minutes in a state where the rotating plate 11 was rotated at 300 rpm.
As shown in the figure, it can be seen that even if the difference in material hardness is matched, sagging does not occur and the material is flattened.

FIG. 8 is an image showing a polished sample obtained by performing the first step in the second embodiment using a surface plate having no groove-shaped recess 4.
Here, the polishing treatment was performed using an alumina paste of 0.3 μm as the free abrasive grains. As shown in the figure, it can be seen that significant edge sagging occurs due to the difference in material hardness.
In the figure, the hardness of the polished sample is
Hardness: Clay mineral (black part) <volcanic glass (light gray) <igneous mineral (white polygon).

FIG. 9 is an image showing a polishing sample obtained by performing a second step on the polishing sample shown in FIG. 8 using the finish polishing surface plate 1 in the above-mentioned second embodiment.
Here, using a polishing film (wrapping film) having an abrasive particle size of 0.5 μm, polishing was performed for 3 minutes in a state where the rotating plate 11 was rotated at 300 rpm.
As shown in the figure, it can be seen that even if the difference in material hardness is matched, sagging does not occur and the material is flattened.
As the polishing sample 8, bright stone (Mohs hardness 6.5-7) canlan stone (same hardness 7) spinel (Mohs hardness 8) indium metal (Mohs hardness 1.2) kaolinite; clay (ore Mohs hardness 1-2). ) An iron-nickel alloy (Mohs hardness 4) can be included.

From these results, it can be seen that the polishing sample subjected to the second step using the finish polishing surface plate 1 in the embodiment can realize sufficient flattening and flattening.
This makes it possible for the polished sample 8 flattened in the present invention to sufficiently satisfy the smoothness required for application to SIMS (secondary ion mass spectrometry). Specifically, the sample surface is suitably observed using an objective lens (Nikon L Plan 2.5x0.075 EPI) with a relatively shallow depth of focus using the reflected light of a polarizing microscope, which is a guideline for determining whether analysis by SIMS is possible. You can meet the conditions that you can.

INDUSTRIAL APPLICABILITY The present invention makes it possible to quickly and smoothly polish composite materials having significantly different hardnesses, and can be widely used in various fields involved in the processing of difficult-to-process materials, including the field of materials science.

1 ... Surface plate for finish polishing 2 ... Plate body 3 ... Groove-shaped concave portion 4a ... Arc-shaped concave portion 5 ... Island-shaped convex portion 6 ... Corner portion 7 ... Polishing film 8 ... Polishing sample 9 ... Lubricating material 10 ... Finish polishing device 11 ... Rotating plate 11a ... Rotating shaft 12 ... Drive source 13 ... Magnetized portion (anisotropic rubber magnet sheet)
K ... Shavings

Claims (6)

With a flexible polishing film ,
It has a flat-shaped polished surface on which the polishing film is mounted, and the polished surface is provided with a plurality of island-shaped island-shaped convex portions and groove-shaped concave portions that form a continuous groove between the island-shaped convex portions. With the surface plate
Equipped with
The island-shaped convex portion has a hexagonal shape when viewed in a plane.
The distance between the adjacent island-shaped convex portions is arranged in a plane so as to be equal to the width dimension of the groove-shaped concave portion.
The diameter dimension of the island-shaped convex portion is set in the range of 1.5 to 2.5 times the width dimension of the groove-shaped concave portion.
A surface plate for finishing polishing, wherein the corner portion of the boundary between the groove-shaped concave portion and the island-shaped convex portion is rounded to the same degree as the radius of curvature of half the depth of the groove-shaped concave portion. A finish polishing apparatus according to claim 1 , further comprising a rotating means for rotating the surface plate of the finish polishing surface plate with respect to a rotation axis orthogonal to the polishing surface. The finish polishing apparatus according to claim 2 , wherein the rotating means has a rotating plate that rotates around the rotating axis, and the rotating plate has a holding means for holding the surface plate. The surface plate is made of magnetic stainless steel.
The finish polishing apparatus according to claim 3 , wherein the holding means is capable of magnetizing the rotating plate and the surface plate. A method of polishing using the finishing polishing apparatus according to any one of claims 2 to 4 .
The first step of generating edge sagging on the polished sample using a flat surface plate and polishing abrasive grains,
After the first step, there is a second step of using the surface plate of the finish polishing apparatus and the polishing film to eliminate the edge sagging and to make the polished surface of the polishing sample a flat surface. A polishing method characterized by. The polishing method according to claim 5 , wherein the polishing abrasive grains are made of alumina paste.

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