JP6988482B2 - Adhesive film and its manufacturing method, adhesive tape, and reel for adhesive film - Google Patents

Adhesive film and its manufacturing method, adhesive tape, and reel for adhesive film Download PDF

Info

Publication number
JP6988482B2
JP6988482B2 JP2017564179A JP2017564179A JP6988482B2 JP 6988482 B2 JP6988482 B2 JP 6988482B2 JP 2017564179 A JP2017564179 A JP 2017564179A JP 2017564179 A JP2017564179 A JP 2017564179A JP 6988482 B2 JP6988482 B2 JP 6988482B2
Authority
JP
Japan
Prior art keywords
conductive
adhesive
adhesive layer
adhesive film
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017564179A
Other languages
Japanese (ja)
Other versions
JPWO2017130789A1 (en
Inventor
貴 立澤
勝 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of JPWO2017130789A1 publication Critical patent/JPWO2017130789A1/en
Application granted granted Critical
Publication of JP6988482B2 publication Critical patent/JP6988482B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H75/00Storing webs, tapes, or filamentary material, e.g. on reels
    • B65H75/02Cores, formers, supports, or holders for coiled, wound, or folded material, e.g. reels, spindles, bobbins, cop tubes, cans, mandrels or chucks
    • B65H75/04Kinds or types
    • B65H75/08Kinds or types of circular or polygonal cross-section
    • B65H75/14Kinds or types of circular or polygonal cross-section with two end flanges
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/10Adhesives in the form of films or foils without carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • C09J9/02Electrically-conducting adhesives
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/831Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus
    • H01L2224/83101Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus as prepeg comprising a layer connector, e.g. provided in an insulating plate member

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Storage Of Web-Like Or Filamentary Materials (AREA)

Description

本発明は、接着剤フィルム及びその製造方法、接着剤テープ、並びに接着剤フィルム用リールに関する。 The present invention relates to an adhesive film and a method for producing the same, an adhesive tape, and a reel for an adhesive film.

従来、多数の電極を有する被接続部材同士を電気的に接続し、回路接続体を製造するための接続材料として、異方導電性フィルム(ACF(Anisotropic Conductive Film))が使用されている。異方導電性フィルムは、プリント配線基板、LCD用ガラス基板、フレキシブルプリント基板等の基板に、IC、LSI等の半導体素子、パッケージなどを接続する際、相対する電極同士の導通状態を保ち、隣接する電極同士の絶縁を保つように電気的接続と機械的固着とを行う接続材料である。また、接続材料としては、異方導電性フィルムの他にも、非導電性フィルム(NCF(Non-Conductive film))等が知られている。 Conventionally, an anisotropic conductive film (ACF) has been used as a connecting material for electrically connecting members having a large number of electrodes to each other to manufacture a circuit connector. When connecting semiconductor elements such as ICs and LSIs, packages, etc. to substrates such as printed wiring boards, LCD glass substrates, and flexible printed circuits, the anisotropic conductive film maintains the conduction state between the opposing electrodes and is adjacent to each other. It is a connection material that makes electrical connection and mechanical fixation so as to maintain the insulation between the electrodes. Further, as a connecting material, a non-conductive film (NCF (Non-Conductive film)) or the like is known in addition to the anisotropic conductive film.

接続材料は、例えば、熱硬化性樹脂等を含有する接着剤成分と、異方導電性フィルムにおいては必要により配合される導電性粒子とを含有し、ポリエチレンテレフタレート(PET)フィルム等の基材上に、接着剤層としてフィルム状に形成される。さらに、接着剤フィルムは、フィルム状の原反を用途に適した幅のテープ状に裁断し、このテープを巻芯に巻き付けて巻重体にしたリールの状態で使用される場合がある(例えば特許文献1参照)。 The connecting material contains, for example, an adhesive component containing a thermosetting resin or the like and conductive particles to be blended as necessary in an anisotropic conductive film on a substrate such as a polyethylene terephthalate (PET) film. In addition, it is formed in the form of a film as an adhesive layer. Further, the adhesive film may be used in the state of a reel in which a film-like raw fabric is cut into a tape having a width suitable for the intended use, and the tape is wound around a winding core to form a winding body (for example, a patent). See Document 1).

特開2003−34468号公報Japanese Unexamined Patent Publication No. 2003-34468

ところで、接続材料を用いてドライバーIC等をLCDモジュールに接続する場合、本来、接続材料のうち回路部材同士の接続に有効に寄与する部分はLCDモジュール全体のおよそ半分以下ではあるが、作業効率及び設備投資の面から、先にLCDモジュール全体にわたって接続材料を貼り付けた後、ドライバーIC等の実装を行うことが一般的である。しかしながら、近年、LCDの製造コスト削減を目的として、接続材料の使用量を低減させる動きがある。これに対し、COF、FPC等をLCDモジュールに接続する場合、先にCOF又はFPC側に接続材料を貼り付けた後、それをLCDモジュール側に実装することで、接続材料の使用量を低減させ、コスト削減を図ることが検討されている。 By the way, when a driver IC or the like is connected to an LCD module using a connection material, the portion of the connection material that effectively contributes to the connection between circuit members is less than about half of the entire LCD module, but the work efficiency and work efficiency are improved. From the viewpoint of capital investment, it is common to first attach the connection material to the entire LCD module and then mount the driver IC or the like. However, in recent years, there has been a movement to reduce the amount of connecting material used for the purpose of reducing the manufacturing cost of LCD. On the other hand, when connecting COF, FPC, etc. to the LCD module, the amount of connecting material used can be reduced by first pasting the connecting material on the COF or FPC side and then mounting it on the LCD module side. , Cost reduction is being considered.

一方で、高精細な回路を備えたLCDモジュールを用いる場合、回路間の短絡及び導電性粒子の捕捉効率の観点から、非導電性接着剤層と、導電性粒子を含有する導電性接着剤層との二層からなる接続材料を使用することが望ましい。二層構成の接続材料は、一般的に、基材上に非導電性接着剤層を形成し、その上に導電性接着剤層を更に形成して得られる。しかしながら、先にCOF又はFPC側に二層構成の接続材料を貼り付ける工程を採用する場合、非導電性接着剤層側の面がLCDモジュール側に向いて貼り付けられることになるため、充分な接続特性が得られないという問題が生じる。 On the other hand, when an LCD module equipped with a high-definition circuit is used, a non-conductive adhesive layer and a conductive adhesive layer containing conductive particles are used from the viewpoint of short circuit between circuits and efficiency of capturing conductive particles. It is desirable to use a connecting material consisting of two layers with. The two-layered connecting material is generally obtained by forming a non-conductive adhesive layer on a substrate and further forming a conductive adhesive layer on the non-conductive adhesive layer. However, when the step of first attaching the connection material having a two-layer structure to the COF or FPC side is adopted, the surface on the non-conductive adhesive layer side is attached toward the LCD module side, which is sufficient. There is a problem that connection characteristics cannot be obtained.

本発明者らは、上記の問題を解決するために、先にCOF又はFPC側に二層構成の接続材料を貼り付けた後、それをLCDモジュールに実装する工程を採用するにあたり、まず、基材上に導電性接着剤層を形成し、その上に非導電性接着剤層を更に形成して二層構成の接続材料を得ることを検討した。しかし、この場合、回路接続時に接続材料から基材を剥離する際に、導電性接着剤層が基材に転写してしまう現象(いわゆるブロッキング現象)が生じることが判明した。ブロッキング現象が生じると、被接続部材上の所定位置に必要量の導電性接着剤を配置できず、接続部の接続信頼性(電気的接続又は機械的固着)が不充分となるおそれがある。 In order to solve the above problems, the present inventors first attach a two-layered connecting material to the COF or FPC side, and then adopt a process of mounting it on the LCD module. It was examined to form a conductive adhesive layer on the material and further form a non-conductive adhesive layer on the conductive adhesive layer to obtain a connecting material having a two-layer structure. However, in this case, it has been found that a phenomenon (so-called blocking phenomenon) in which the conductive adhesive layer is transferred to the base material occurs when the base material is peeled off from the connecting material at the time of circuit connection. When the blocking phenomenon occurs, a required amount of the conductive adhesive cannot be placed at a predetermined position on the connected member, and the connection reliability (electrical connection or mechanical fixing) of the connection portion may be insufficient.

本発明は、上記実情に鑑みてなされたものであり、導電性接着剤層及び非導電性接着剤層を有しつつ、ブロッキング現象の発生を抑制でき、かつ回路接続体の製造に用いた場合に優れた接続信頼性を得ることができる接着剤フィルム及びその製造方法、接着剤テープ、並びに接着剤フィルム用リールを提供することを目的とする。 The present invention has been made in view of the above circumstances, and when it has a conductive adhesive layer and a non-conductive adhesive layer, can suppress the occurrence of a blocking phenomenon, and is used for manufacturing a circuit connection. It is an object of the present invention to provide an adhesive film and a method for producing the same, an adhesive tape, and a reel for the adhesive film, which can obtain excellent connection reliability.

本発明は、一態様として、第1の非導電性接着剤層と、導電性粒子を含有する導電性接着剤層と、第2の非導電性接着剤層とがこの順に積層されてなり、第1の非導電性接着剤層の厚みT1と導電性接着剤層の厚みTとが下記式(1)を満たす、接着剤フィルムを提供する。
T1<T …(1)
In one embodiment, the present invention comprises a first non-conductive adhesive layer, a conductive adhesive layer containing conductive particles, and a second non-conductive adhesive layer laminated in this order. Provided is an adhesive film in which the thickness T1 of the first non-conductive adhesive layer and the thickness T of the conductive adhesive layer satisfy the following formula (1).
T1 <T ... (1)

本発明は、他の一態様として、第1の非導電性接着剤層と、導電性粒子を含有する導電性接着剤層と、第2の非導電性接着剤層とをこの順に積層して接着剤フィルムを得る工程を備え、第1の非導電性接着剤層の厚みT1と導電性接着剤層の厚みTとが下記式(1)を満たす、接着剤フィルムの製造方法を提供する。
T1<T …(1)
As another aspect of the present invention, the first non-conductive adhesive layer, the conductive adhesive layer containing conductive particles, and the second non-conductive adhesive layer are laminated in this order. Provided is a method for producing an adhesive film, comprising a step of obtaining an adhesive film, wherein the thickness T1 of the first non-conductive adhesive layer and the thickness T of the conductive adhesive layer satisfy the following formula (1).
T1 <T ... (1)

T1と導電性粒子の平均粒径rとは、好ましくは下記式(2)を満たす。
T1≦0.8×r …(2)
T1 and the average particle size r of the conductive particles preferably satisfy the following formula (2).
T1 ≤ 0.8 × r ... (2)

T1と第2の非導電性接着剤層の厚みT2とは、好ましくは下記式(3)を満たす。
T1≦T2 …(3)
The T1 and the thickness T2 of the second non-conductive adhesive layer preferably satisfy the following formula (3).
T1 ≤ T2 ... (3)

本発明は、他の一態様として、導電性粒子を含有する接着剤フィルムであって、導電性粒子が存在しない第1の非導電性領域と、導電性粒子が存在する導電性領域と、導電性粒子が存在しない第2の非導電性領域とを、接着剤フィルムの厚み方向にこの順に備え、第1の非導電性領域の接着剤フィルムの厚み方向の長さL1と、導電性領域の接着剤フィルムの厚み方向の長さLとが下記式(4)を満たす、接着剤フィルムを提供する。
L1<L …(4)
As another aspect of the present invention, there is an adhesive film containing conductive particles, wherein the first non-conductive region in which the conductive particles do not exist, the conductive region in which the conductive particles exist, and the conductivity. A second non-conductive region in which no sex particles are present is provided in this order in the thickness direction of the adhesive film, and the length L1 in the thickness direction of the adhesive film in the first non-conductive region and the conductive region. Provided is an adhesive film in which the length L in the thickness direction of the adhesive film satisfies the following formula (4).
L1 <L ... (4)

L1と導電性粒子の平均粒径rとは、好ましくは下記式(5)を満たす。
L1≦0.8×r …(5)
L1 and the average particle size r of the conductive particles preferably satisfy the following formula (5).
L1 ≤ 0.8 × r ... (5)

L1と、第2の非導電性領域の接着剤フィルムの厚み方向の長さL2とは、好ましくは下記式(6)を満たす。
L1≦L2 …(6)
L1 and the length L2 in the thickness direction of the adhesive film in the second non-conductive region preferably satisfy the following formula (6).
L1 ≤ L2 ... (6)

本発明は、他の一態様として、テープ状の基材と、基材の一方面上に設けられた上記接着剤フィルムと、を備える接着剤テープを提供する。 The present invention provides, as another aspect, an adhesive tape comprising a tape-shaped substrate and the adhesive film provided on one surface of the substrate.

本発明は、他の一態様として、上記接着剤テープと、接着剤テープが巻かれた巻芯と、を備える接着剤フィルム用リールを提供する。 The present invention provides, as another aspect, a reel for an adhesive film including the above-mentioned adhesive tape and a winding core around which the adhesive tape is wound.

本発明によれば、導電性接着剤層及び非導電性接着剤層を有しつつ、ブロッキング現象の発生を抑制でき、かつ回路接続体の製造に用いた場合に優れた接続信頼性を得ることができる接着剤フィルム及びその製造方法、接着剤テープ、並びに接着剤フィルム用リールを提供することが可能となる。 According to the present invention, it is possible to suppress the occurrence of a blocking phenomenon while having a conductive adhesive layer and a non-conductive adhesive layer, and to obtain excellent connection reliability when used for manufacturing a circuit connector. It is possible to provide an adhesive film and a method for producing the same, an adhesive tape, and a reel for the adhesive film.

接着剤フィルムの一実施形態を示す模式断面図である。It is a schematic cross-sectional view which shows one Embodiment of an adhesive film. 接着剤フィルムの他の実施形態を示す模式断面図である。It is a schematic cross-sectional view which shows the other embodiment of an adhesive film. 接着剤フィルム用リールの一実施形態を示す斜視図である。It is a perspective view which shows one Embodiment of the reel for adhesive films. 図3に示した接着剤フィルム用リールにおける接着剤テープの拡大模式断面図である。FIG. 3 is an enlarged schematic cross-sectional view of an adhesive tape in the reel for an adhesive film shown in FIG. 回路接続体の製造方法の一実施形態を示す模式断面図である。It is a schematic cross-sectional view which shows one Embodiment of the manufacturing method of a circuit connection body.

以下、図面を参照しながら、本発明の実施形態について詳細に説明するが、本発明は下記実施形態に限定されるものではない。なお、図面の説明において、同一の要素には同一の符号を付し、重複する説明は省略する。また、図面の便宜上、図面の寸法比率は説明のものと必ずしも一致しない。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings, but the present invention is not limited to the following embodiments. In the description of the drawings, the same elements are designated by the same reference numerals, and duplicate description will be omitted. Also, for the convenience of the drawings, the dimensional ratios in the drawings do not always match those described.

[接着剤フィルム(第1実施形態)]
図1は、第1実施形態に係る接着剤フィルムを示す模式断面図である。図1に示すように、接着剤フィルム1は、第1の非導電性接着剤層2と、導電性接着剤層3と、第2の非導電性接着剤層4とがこの順に積層されてなる。
[Adhesive film (first embodiment)]
FIG. 1 is a schematic cross-sectional view showing an adhesive film according to the first embodiment. As shown in FIG. 1, in the adhesive film 1, the first non-conductive adhesive layer 2, the conductive adhesive layer 3, and the second non-conductive adhesive layer 4 are laminated in this order. Become.

第1及び第2の非導電性接着剤層2,4は、それぞれ接着剤成分2a,4aで構成されている。第1及び第2の非導電性接着剤層2,4を構成する接着剤成分2a,4aは、互いに同一であっても異なっていてもよい。 The first and second non-conductive adhesive layers 2 and 4 are composed of adhesive components 2a and 4a, respectively. The adhesive components 2a and 4a constituting the first and second non-conductive adhesive layers 2 and 4 may be the same as or different from each other.

接着剤成分2a,4aとしては、熱又は光によって硬化する成分であれば広く用いることができ、例えばエポキシ系接着剤又はアクリル系接着剤を使用できる。接着剤成分2a,4aは、硬化物の耐熱性及び耐湿性に優れる観点から、好ましくは架橋性の成分である。その中でも、熱硬化性樹脂であるエポキシ樹脂を主成分として含有するエポキシ系接着剤は、短時間での硬化が可能で接続作業性が良く、接着性にも優れている等の点で好ましい。加えて、エポキシ系接着剤は、エポキシ系接着剤と比較して、例えば基材上に接着剤フィルムを設けて接着剤テープとした場合(詳しくは後述)、接着剤成分の基材への転写を抑制できる点で好ましい。接着剤成分2a,4aとして、例えば国際公開第98/44067号に記載されているようなラジカル硬化系接着剤を使用することもできる。 As the adhesive components 2a and 4a, any component that can be cured by heat or light can be widely used, and for example, an epoxy adhesive or an acrylic adhesive can be used. The adhesive components 2a and 4a are preferably crosslinkable components from the viewpoint of excellent heat resistance and moisture resistance of the cured product. Among them, an epoxy-based adhesive containing an epoxy resin, which is a thermosetting resin, as a main component is preferable in that it can be cured in a short time, has good connection workability, and has excellent adhesiveness. In addition, the epoxy-based adhesive is compared with the epoxy-based adhesive, for example, when an adhesive film is provided on the base material to form an adhesive tape (details will be described later), the adhesive component is transferred to the base material. It is preferable in that it can suppress. As the adhesive components 2a and 4a, for example, a radical curing adhesive as described in International Publication No. 98/44067 can also be used.

エポキシ系接着剤の具体例としては、高分子量エポキシ樹脂(例えば重量平均分子量が10000〜100000)、固形エポキシ樹脂若しくは液状エポキシ樹脂、又は、これらのエポキシ樹脂がウレタン、ポリエステル、アクリルゴム、ニトリルゴム(NBR)、合成線状ポリアミド等で変性された変性エポキシ樹脂を主成分として含有する接着剤が挙げられる。エポキシ系接着剤は、上記エポキシ樹脂に加えて、硬化剤、触媒、カップリング剤、充填剤等の添加剤を更に含有していてよい。 Specific examples of the epoxy adhesive include a high molecular weight epoxy resin (for example, a weight average molecular weight of 1000 to 100,000), a solid epoxy resin or a liquid epoxy resin, or these epoxy resins are urethane, polyester, acrylic rubber, nitrile rubber (for example). Examples thereof include an adhesive containing a modified epoxy resin modified with NBR), synthetic linear polyamide or the like as a main component. The epoxy adhesive may further contain additives such as a curing agent, a catalyst, a coupling agent, and a filler in addition to the epoxy resin.

アクリル系接着剤の具体例としては、アクリル酸、アクリル酸エステル、メタクリル酸エステル及びアクリロニトリルの少なくとも1種をモノマー成分とするアクリル樹脂(単独重合体又は共重合体)を主成分として含有する接着剤が挙げられる。アクリル系接着剤は、上記アクリル樹脂に加えて、硬化剤、触媒、カップリング剤、充填剤等の添加剤を更に含有していてよい。 Specific examples of the acrylic adhesive include an adhesive containing an acrylic resin (homogeneous polymer or copolymer) containing at least one of acrylic acid, acrylic acid ester, methacrylic acid ester and acrylonitrile as a monomer component as a main component. Can be mentioned. In addition to the above-mentioned acrylic resin, the acrylic adhesive may further contain additives such as a curing agent, a catalyst, a coupling agent, and a filler.

回路部材同士を接続する場合、両回路部材間の線膨張係数との差から生じる回路部材の反りを抑制する観点から、接着剤成分2a,4aは、内部応力の緩和作用を発揮する成分を含有することが好ましい。具体的には、接着剤成分2a,4aは、アクリルゴム、エラストマ成分等を含有することが好ましい。 When the circuit members are connected to each other, the adhesive components 2a and 4a contain components that exert an internal stress relaxing action from the viewpoint of suppressing the warping of the circuit members caused by the difference in the coefficient of linear expansion between the two circuit members. It is preferable to do so. Specifically, the adhesive components 2a and 4a preferably contain an acrylic rubber, an elastomer component, or the like.

導電性接着剤層3は、接着剤成分3aと、導電性粒子5とを含有する。接着剤成分3aは、上述した第1及び第2の非導電性接着剤層2,4を構成する接着剤成分2a,4aとして説明した接着剤成分と同様であってよく、また、第1及び第2の非導電性接着剤層2,4を構成する接着剤成分2a,4aのそれぞれと同一であっても異なっていてもよい。 The conductive adhesive layer 3 contains an adhesive component 3a and conductive particles 5. The adhesive component 3a may be the same as the adhesive components described as the adhesive components 2a and 4a constituting the first and second non-conductive adhesive layers 2 and 4 described above, and the first and second adhesive components 3a may be the same. It may be the same as or different from each of the adhesive components 2a and 4a constituting the second non-conductive adhesive layers 2 and 4.

導電性粒子5は、接着剤成分3a中に分散している。導電性粒子5としては、Au、Ag、Pt、Ni、Cu、W、Sb、Sn、はんだ等の金属粒子、導電性カーボンの粒子などが挙げられる。あるいは、導電性粒子5は、非導電性のガラス、セラミック、プラスチック等の粒子を核とし、この核を上記の金属又は導電性カーボンで被覆した被覆導電性粒子であってもよい。導電性粒子5は、その表面が絶縁層で被覆されてなる絶縁被覆導電性粒子であってもよい。導電性接着剤層3は、隣接する電極同士の絶縁性を向上させる観点から、導電性粒子5に加えて、絶縁性粒子を更に含有していてもよい。 The conductive particles 5 are dispersed in the adhesive component 3a. Examples of the conductive particles 5 include metal particles such as Au, Ag, Pt, Ni, Cu, W, Sb, Sn, and solder, and particles of conductive carbon. Alternatively, the conductive particles 5 may be coated conductive particles in which particles such as non-conductive glass, ceramic, and plastic are used as nuclei, and the nuclei are coated with the above-mentioned metal or conductive carbon. The conductive particles 5 may be insulating coated conductive particles whose surface is coated with an insulating layer. The conductive adhesive layer 3 may further contain insulating particles in addition to the conductive particles 5 from the viewpoint of improving the insulating property between adjacent electrodes.

導電性粒子5の含有量は、導電性接着剤層3に含まれる接着剤成分3aの100体積部に対して、例えば0.1〜30体積部であり、好ましくは0.1〜10体積部である。含有量が0.1体積部以上であると、対向する電極間の接続抵抗が低くなる傾向にあり、30体積部以下であると、隣接する電極間の短絡を抑制できる。 The content of the conductive particles 5 is, for example, 0.1 to 30 parts by volume, preferably 0.1 to 10 parts by volume, based on 100 parts by volume of the adhesive component 3a contained in the conductive adhesive layer 3. Is. When the content is 0.1 part by volume or more, the connection resistance between the opposing electrodes tends to be low, and when it is 30 parts by volume or less, a short circuit between adjacent electrodes can be suppressed.

接着剤フィルム1において、第1の非導電性接着剤層2の厚みT1と導電性接着剤層3の厚みTとが下記式(1)を満たす。
T1<T …(1)
In the adhesive film 1, the thickness T1 of the first non-conductive adhesive layer 2 and the thickness T of the conductive adhesive layer 3 satisfy the following formula (1).
T1 <T ... (1)

T1とTとは、回路接続時の導電性粒子5の捕捉効率の点で更に優れる観点から、好ましくはT1<0.9×T、より好ましくはT1<0.8×T、更に好ましくはT1<0.7×Tの関係式を満たす。 T1 and T are preferably T1 <0.9 × T, more preferably T1 <0.8 × T, still more preferably T1 from the viewpoint of further excellent capture efficiency of the conductive particles 5 at the time of circuit connection. <Satisfy the relational expression of 0.7 × T.

接着剤フィルム1において、第1の非導電性接着剤層2の厚みT1と導電性粒子5の平均粒径rとは、回路接続時の導電性粒子5の捕捉効率に優れ、接続抵抗を更に低減できる観点から、好ましくは下記式(2)を満たす。
T1≦0.8×r …(2)
In the adhesive film 1, the thickness T1 of the first non-conductive adhesive layer 2 and the average particle size r of the conductive particles 5 are excellent in capturing efficiency of the conductive particles 5 at the time of circuit connection, and further increase the connection resistance. From the viewpoint of reduction, the following formula (2) is preferably satisfied.
T1 ≤ 0.8 × r ... (2)

T1とrとは、同様の観点から、より好ましくはT1≦0.7×rの関係式を満たす。 From the same viewpoint, T1 and r more preferably satisfy the relational expression of T1 ≦ 0.7 × r.

接着剤フィルム1において、第1の非導電性接着剤層2の厚みT1と第2の非導電性接着剤層4の厚みT2とは、回路部材への転写性及び回路接続時の回路部材間のスペースの充填性に優れる観点から、好ましくは下記式(3)を満たす。
T1≦T2 …(3)
In the adhesive film 1, the thickness T1 of the first non-conductive adhesive layer 2 and the thickness T2 of the second non-conductive adhesive layer 4 are transferable to circuit members and between circuit members at the time of circuit connection. From the viewpoint of excellent space filling property, the following formula (3) is preferably satisfied.
T1 ≤ T2 ... (3)

T1とT2とは、同様の観点から、より好ましくはT1≦0.5×T2、更に好ましくはT1≦0.4×T2、特に好ましくはT1≦0.3×T2の関係式を満たす。 From the same viewpoint, T1 and T2 more preferably satisfy the relational expression of T1 ≦ 0.5 × T2, further preferably T1 ≦ 0.4 × T2, and particularly preferably T1 ≦ 0.3 × T2.

第1の非導電性接着剤層2、導電性接着剤層3、又は第2の非導電性接着剤層4の厚みが不均一である場合には、各層の厚みの最大値をそれぞれ厚みT1、厚みT又は厚みT2とする。 When the thickness of the first non-conductive adhesive layer 2, the conductive adhesive layer 3, or the second non-conductive adhesive layer 4 is non-uniform, the maximum value of the thickness of each layer is set to the thickness T1. , Thickness T or thickness T2.

本発明における導電性粒子の平均粒径は、次のように定義される。すなわち、走査電子顕微鏡(SEM)により3000倍で導電性粒子像を観察して、複数個の導電性粒子をランダムに選択する。このとき、平均粒径を精度良く決定するために、30個以上の導電性粒子を選択することが好ましい。選択した導電性粒子について最大径及び最小径を測定し、その最大径と最小径との積の平方根を導電性粒子の粒径とする。このようにして算出される粒径を、測定した粒子個数で割ったものを平均粒径として定義する。 The average particle size of the conductive particles in the present invention is defined as follows. That is, a plurality of conductive particles are randomly selected by observing a conductive particle image at a magnification of 3000 with a scanning electron microscope (SEM). At this time, it is preferable to select 30 or more conductive particles in order to accurately determine the average particle size. The maximum diameter and the minimum diameter of the selected conductive particles are measured, and the square root of the product of the maximum diameter and the minimum diameter is defined as the particle size of the conductive particles. The average particle size is defined by dividing the particle size calculated in this way by the measured number of particles.

第1の非導電性接着剤層2の厚みT1、導電性接着剤層3の厚みT、第2の非導電性接着剤層4の厚みT2、及び導電性粒子5の平均粒径rは、それぞれ上記の関係を満たすことが好ましく、これらの具体的な厚み又は平均粒径は特に制限されない。 The thickness T1 of the first non-conductive adhesive layer 2, the thickness T of the conductive adhesive layer 3, the thickness T2 of the second non-conductive adhesive layer 4, and the average particle size r of the conductive particles 5 are determined. It is preferable to satisfy the above-mentioned relationship, and the specific thickness or average particle size thereof is not particularly limited.

第1の非導電性接着剤層2の厚みT1は、例えば0.5μm以上、又は1μm以上であってよく、例えば2.5μm以下、又は2μm以下であってよい。 The thickness T1 of the first non-conductive adhesive layer 2 may be, for example, 0.5 μm or more, or 1 μm or more, and may be, for example, 2.5 μm or less, or 2 μm or less.

導電性接着剤層3の厚みTは、例えば1.5μm以上、又は2μm以上であってよく、例えば4μm以下、又は3.5μm以下であってよい。 The thickness T of the conductive adhesive layer 3 may be, for example, 1.5 μm or more, or 2 μm or more, and may be, for example, 4 μm or less, or 3.5 μm or less.

第2の非導電性接着剤層4の厚みT2は、例えば5μm以上、又は7μm以上であってよく、例えば10μm以下、又は9μm以下であってよい。 The thickness T2 of the second non-conductive adhesive layer 4 may be, for example, 5 μm or more, or 7 μm or more, and may be, for example, 10 μm or less, or 9 μm or less.

導電性粒子5の平均粒径rは、例えば2μm以上、又は3μm以上であってよく、例えば5μm以下、又は4μm以下であってよい。 The average particle size r of the conductive particles 5 may be, for example, 2 μm or more, or 3 μm or more, and may be, for example, 5 μm or less, or 4 μm or less.

接着剤フィルム1は、第1の非導電性接着剤層2の導電性接着剤層3と反対側の面上、又は第2の非導電性接着剤層4の導電性接着剤層3と反対側の面上に、基材(図示せず)を更に備えていてもよい。基材の厚みは、例えば4〜200μmであってよい。 The adhesive film 1 is on the surface of the first non-conductive adhesive layer 2 opposite to the conductive adhesive layer 3 or opposite to the conductive adhesive layer 3 of the second non-conductive adhesive layer 4. A substrate (not shown) may be further provided on the side surface. The thickness of the base material may be, for example, 4 to 200 μm.

基材は、例えば、ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリエチレンイソフタレート、ポリブチレンテレフタレート、ポリオレフィン、ポリアセテート、ポリカーボネート、ポリフェニレンサルファイド、ポリアミド、エチレン・酢酸ビニル共重合体、ポリ塩化ビニル、ポリ塩化ビニリデン、合成ゴム系、液晶ポリマー等で形成された基材であってよい。基材の第1又は第2の非導電性接着剤層との接着面には、離型処理が施されていてもよい。 The substrate may be, for example, polyethylene terephthalate, polyethylene naphthalate, polyethylene isophthalate, polybutylene terephthalate, polyolefin, polyacetate, polycarbonate, polyphenylene sulfide, polyamide, ethylene / vinyl acetate copolymer, polyvinyl chloride, polyvinylidene chloride, synthetic. It may be a base material made of a rubber-based material, a liquid crystal polymer, or the like. The adhesive surface of the base material with the first or second non-conductive adhesive layer may be subjected to a mold release treatment.

[接着剤フィルム(第2実施形態)]
図2は、第2実施形態に係る接着剤フィルムを示す模式断面図である。図2に示すように、接着剤フィルム11は、接着剤成分11aと、導電性粒子5とを含有する。接着剤フィルム11は、導電性粒子5が存在しない第1の非導電性領域R1と、導電性粒子5が存在する導電性領域Rと、導電性粒子5が存在しない第2の非導電性領域R2とを、接着剤フィルム11の厚み方向にこの順に備える。
[Adhesive film (second embodiment)]
FIG. 2 is a schematic cross-sectional view showing the adhesive film according to the second embodiment. As shown in FIG. 2, the adhesive film 11 contains an adhesive component 11a and conductive particles 5. The adhesive film 11 has a first non-conductive region R1 in which the conductive particles 5 do not exist, a conductive region R in which the conductive particles 5 exist, and a second non-conductive region in which the conductive particles 5 do not exist. R2 is provided in this order in the thickness direction of the adhesive film 11.

接着剤成分11aは、上述の第1実施形態で説明した接着剤成分2a,3a,4aと同様の接着剤成分であってよく、導電性粒子5は、上述の第1実施形態で説明した導電性粒子5と同様の導電性粒子であってよい。接着剤成分11aは、接着剤フィルム11全体にわたって均一の成分を有していてもよく、接着剤フィルム11の位置によって異なる成分を有していてもよい。例えば、接着剤成分11aは、第1の非導電性領域R1、導電性領域R、及び第2の非導電性領域R2ごとに異なる成分を有していてよい。 The adhesive component 11a may be the same adhesive component as the adhesive components 2a, 3a, 4a described in the first embodiment described above, and the conductive particles 5 may be the conductive particles described in the first embodiment described above. It may be the same conductive particles as the sex particles 5. The adhesive component 11a may have a uniform component throughout the adhesive film 11 or may have a different component depending on the position of the adhesive film 11. For example, the adhesive component 11a may have a different component for each of the first non-conductive region R1, the conductive region R, and the second non-conductive region R2.

導電性領域Rは、導電性粒子5に接し、かつ接着剤フィルム11の第1の非導電性領域R1側の表面11bに略平行な平面のうち、該表面11bから最短距離に存在する平面である第1の接平面と、導電性粒子5に接し、かつ接着剤フィルム11の第2の非導電性領域R2側の表面11cと略平行な平面のうち、該表面11cから最短距離に存在する平面である第2の接平面との間の領域として定義される。 The conductive region R is a plane that is in contact with the conductive particles 5 and is substantially parallel to the surface 11b on the first non-conductive region R1 side of the adhesive film 11 and that exists at the shortest distance from the surface 11b. It exists at the shortest distance from a certain first tangent plane and a plane that is in contact with the conductive particles 5 and is substantially parallel to the surface 11c on the second non-conductive region R2 side of the adhesive film 11. It is defined as the area between the second tangent plane, which is a plane.

第1の非導電性領域R1は、第1の接平面から接着剤フィルム11の第1の非導電性領域R1側の表面11bへ向けて接着剤フィルム11の厚み方向に広がる、導電性領域R以外の領域として定義される。 The first non-conductive region R1 extends in the thickness direction of the adhesive film 11 from the first tangent plane toward the surface 11b on the first non-conductive region R1 side of the adhesive film 11. It is defined as an area other than.

第2の非導電性領域R2は、第2の接平面から接着剤フィルム11の第2の非導電性領域R2側の表面11cへ向けて接着剤フィルム11の厚み方向に広がる、導電性領域R以外の領域として定義される。 The second non-conductive region R2 extends in the thickness direction of the adhesive film 11 from the second tangent plane toward the surface 11c of the adhesive film 11 on the second non-conductive region R2 side. It is defined as an area other than.

接着剤フィルム11において、第1の非導電性領域R1の長さL1と導電性領域Rの長さLとが下記式(4)を満たす。
L1<L …(4)
In the adhesive film 11, the length L1 of the first non-conductive region R1 and the length L of the conductive region R satisfy the following formula (4).
L1 <L ... (4)

L1とLとは、回路接続時の導電性粒子5の捕捉効率の点で更に優れる観点から、好ましくはL1<0.9×L、より好ましくはL1<0.8×L、更に好ましくはL1<0.7×Lの関係式を満たす。 L1 and L are preferably L1 <0.9 × L, more preferably L1 <0.8 × L, still more preferably L1 from the viewpoint of further excellent capture efficiency of the conductive particles 5 at the time of circuit connection. <Satisfy the relational expression of 0.7 × L.

接着剤フィルム11において、第1の非導電性領域R1の長さL1と導電性粒子5の平均粒径rとは、回路接続時の導電性粒子5の捕捉効率に優れ、接続抵抗を更に低減できる観点から、好ましくは下記式(5)を満たす。
L1≦0.8×r …(5)
In the adhesive film 11, the length L1 of the first non-conductive region R1 and the average particle size r of the conductive particles 5 are excellent in capturing efficiency of the conductive particles 5 at the time of circuit connection, and further reduce the connection resistance. From the viewpoint of being able to do so, the following formula (5) is preferably satisfied.
L1 ≤ 0.8 × r ... (5)

L1とrとは、同様の観点から、より好ましくはL1≦0.7×rの関係式を満たす。 From the same viewpoint, L1 and r more preferably satisfy the relational expression of L1 ≦ 0.7 × r.

接着剤フィルム11において、第1の非導電性領域R1の長さL1と第2の非導電性領域R2の長さL2とは、回路部材への転写性及び回路接続時の回路部材間のスペースの充填性に優れる観点から、好ましくは下記式(6)を満たす。
L1≦L2 …(6)
In the adhesive film 11, the length L1 of the first non-conductive region R1 and the length L2 of the second non-conductive region R2 are transferability to the circuit member and a space between the circuit members at the time of circuit connection. From the viewpoint of excellent filling property, the following formula (6) is preferably satisfied.
L1 ≤ L2 ... (6)

L1とL2とは、同様の観点から、より好ましくはL1≦0.5×L2、更に好ましくはL1≦0.4×L2、特に好ましくはL1≦0.3×L2の関係式を満たす。 From the same viewpoint, L1 and L2 satisfy the relational expression of more preferably L1 ≦ 0.5 × L2, further preferably L1 ≦ 0.4 × L2, and particularly preferably L1 ≦ 0.3 × L2.

第1の非導電性領域R1の長さL1、導電性領域Rの長さL、第2の非導電性領域R2の長さL2、及び導電性粒子5の平均粒径rは、それぞれ上記の関係を満たすことが好ましく、これらの具体的な長さ又は平均粒径は特に制限されない。 The length L1 of the first non-conductive region R1, the length L of the conductive region R, the length L2 of the second non-conductive region R2, and the average particle size r of the conductive particles 5 are as described above. It is preferable to satisfy the relationship, and these specific lengths or average particle sizes are not particularly limited.

第1の非導電性領域R1の長さL1は、例えば0.5μm以上、又は1μm以上であってよく、例えば2.5μm以下、又は2μm以下であってよい。 The length L1 of the first non-conductive region R1 may be, for example, 0.5 μm or more, or 1 μm or more, and may be, for example, 2.5 μm or less, or 2 μm or less.

導電性領域Rの長さLは、例えば1.5μm以上、又は2μm以上であってよく、例えば4μm以下、又は3.5μm以下であってよい。 The length L of the conductive region R may be, for example, 1.5 μm or more, or 2 μm or more, and may be, for example, 4 μm or less, or 3.5 μm or less.

第2の非導電性領域R2の長さL2は、例えば5μm以上、又は7μm以上であってよく、例えば10μm以下、又は9μm以下であってよい。 The length L2 of the second non-conductive region R2 may be, for example, 5 μm or more, or 7 μm or more, and may be, for example, 10 μm or less, or 9 μm or less.

接着剤フィルム11は、第1の非導電性領域R1の導電性領域Rと反対側に、導電性粒子が存在する領域又は導電性粒子が存在しない領域を更に備えていてもよい。 The adhesive film 11 may further include a region in which conductive particles are present or a region in which conductive particles are not present on the opposite side of the first non-conductive region R1 from the conductive region R.

[接着剤フィルムの製造方法]
上述の第1及び第2実施形態に係る接着剤フィルム1,11は、例えば、第1の非導電性接着剤層2と、導電性粒子5を含有する導電性接着剤層3と、第2の非導電性接着剤層4とをこの順に積層することにより得られる。
[Manufacturing method of adhesive film]
The adhesive films 1 and 11 according to the first and second embodiments described above include, for example, a first non-conductive adhesive layer 2, a conductive adhesive layer 3 containing conductive particles 5, and a second. It is obtained by laminating the non-conductive adhesive layer 4 of the above in this order.

具体的には、例えば、まず、第1の非導電性接着剤層2と導電性接着剤層3とをラミネーター等を用いて積層して積層体を得て、次いで、同様にして、該積層体の導電性接着剤層3側に第2の非導電性接着剤層4を更に積層することにより、接着剤フィルム1,11を得ることができる。あるいは、まず、導電性接着剤層3と第2の非導電性接着剤層4とをラミネーター等を用いて積層して積層体を得て、次いで、同様にして、該積層体の導電性接着剤層3側に第1の非導電性接着剤層2を更に積層することにより、接着剤フィルム1,11を得ることもできる。 Specifically, for example, first, the first non-conductive adhesive layer 2 and the conductive adhesive layer 3 are laminated using a laminator or the like to obtain a laminate, and then the laminate is similarly obtained. Adhesive films 1 and 11 can be obtained by further laminating the second non-conductive adhesive layer 4 on the conductive adhesive layer 3 side of the body. Alternatively, first, the conductive adhesive layer 3 and the second non-conductive adhesive layer 4 are laminated using a laminator or the like to obtain a laminated body, and then similarly, the conductive adhesive of the laminated body is obtained. Adhesive films 1 and 11 can also be obtained by further laminating the first non-conductive adhesive layer 2 on the agent layer 3 side.

第1の非導電性接着剤層2、導電性接着剤層3、及び第2の非導電性接着剤層4の各層は、例えば以下の方法により作製される。まず、接着剤成分2a,4a、又は接着剤成分3aと導電性粒子5とを溶剤に溶解させて塗工液を調製する。次いで、この塗工液を、例えば基材の離型処理された表面上に塗布して、例えば接着剤成分2a,3a,4aに含有される硬化剤の活性温度以下(例えば100℃以下)で乾燥し、溶剤を除去することにより各層が得られる。溶剤は、芳香族炭化水素系溶剤、含酸素系溶剤等であってよい。溶剤の沸点は、150℃以下であってよく、60〜150℃又は70〜130℃であってもよい。 Each layer of the first non-conductive adhesive layer 2, the conductive adhesive layer 3, and the second non-conductive adhesive layer 4 is produced, for example, by the following method. First, the adhesive components 2a and 4a, or the adhesive component 3a and the conductive particles 5 are dissolved in a solvent to prepare a coating liquid. Next, this coating liquid is applied, for example, on the release-treated surface of the base material, and at, for example, at an active temperature or lower (for example, 100 ° C. or lower) of the curing agent contained in the adhesive components 2a, 3a, 4a. Each layer is obtained by drying and removing the solvent. The solvent may be an aromatic hydrocarbon solvent, an oxygen-containing solvent or the like. The boiling point of the solvent may be 150 ° C. or lower, and may be 60 to 150 ° C. or 70 to 130 ° C.

この製造方法において用いられる第1の非導電性接着剤層2の厚みT1、導電性接着剤層3の厚みT、第2の非導電性接着剤層4の厚みT2、及び導電性粒子5の平均粒径rは、それぞれ上述の第1実施形態で説明した式(1)、(2)、(3)等の関係を満たすことが好ましい。 The thickness T1 of the first non-conductive adhesive layer 2, the thickness T of the conductive adhesive layer 3, the thickness T2 of the second non-conductive adhesive layer 4, and the conductive particles 5 used in this manufacturing method. It is preferable that the average particle size r satisfies the relationships of the formulas (1), (2), (3) and the like described in the above-mentioned first embodiment, respectively.

[接着剤テープ及び接着剤フィルム用リール]
図3は、接着剤フィルム用リールの一実施形態を示す斜視図である。図3に示すように、接着剤フィルム用リール21は、筒状の巻芯22と、巻芯22の軸方向の両端面にそれぞれ設けられた円盤状の側板23とを備える。巻芯22の外面22aには、長尺の接着剤テープ24が巻かれており、これにより接着剤テープ24は巻重体にされている。接着剤テープ24は、テープ状の基材25と、該基材25の一方面上に設けられた接着剤フィルム26とを備えている。巻芯22の内面は、例えば回路接続時に用いる圧着装置の回転軸に装着するための軸穴22bとなっている。巻芯22の外径は、取扱い性に優れる観点から、例えば4〜15cmである。
[Adhesive tape and reel for adhesive film]
FIG. 3 is a perspective view showing an embodiment of an adhesive film reel. As shown in FIG. 3, the adhesive film reel 21 includes a cylindrical winding core 22 and disk-shaped side plates 23 provided on both end faces of the winding core 22 in the axial direction. A long adhesive tape 24 is wound around the outer surface 22a of the winding core 22, whereby the adhesive tape 24 is made into a wound body. The adhesive tape 24 includes a tape-shaped base material 25 and an adhesive film 26 provided on one surface of the base material 25. The inner surface of the winding core 22 is, for example, a shaft hole 22b for mounting on a rotating shaft of a crimping device used at the time of circuit connection. The outer diameter of the winding core 22 is, for example, 4 to 15 cm from the viewpoint of excellent handleability.

図4は、図3に示した接着剤フィルム用リール21における接着剤テープ24の拡大模式断面図である。図4(a)に示すように、接着剤テープ24Aは、一実施形態において、テープ状の基材25と、該基材25の一方面上に設けられた接着剤フィルム26として、第1実施形態に係る接着剤フィルム1とを備える。 FIG. 4 is an enlarged schematic cross-sectional view of the adhesive tape 24 in the adhesive film reel 21 shown in FIG. As shown in FIG. 4A, in one embodiment, the adhesive tape 24A is the first embodiment as a tape-shaped base material 25 and an adhesive film 26 provided on one surface of the base material 25. The adhesive film 1 according to the form is provided.

図4(b)に示すように、接着剤テープ24Bは、他の実施形態において、テープ状の基材25と、該基材25の一方面上に設けられた接着剤フィルム26として、第2実施形態に係る接着剤フィルム11とを備える。 As shown in FIG. 4B, the adhesive tape 24B is, in another embodiment, as a tape-shaped base material 25 and an adhesive film 26 provided on one surface of the base material 25 as a second. The adhesive film 11 according to the embodiment is provided.

基材25の長さは、例えば1〜400mであり、好ましくは50〜300mである。基材25の厚みは、例えば4〜200μmであり、好ましくは20〜100μmである。基材25の幅は、接着剤フィルム1,11の幅と同じであるか、接着剤フィルム1,11の幅よりも広いことが好ましく、具体的には、例えば0.5〜30mmであり、好ましくは0.5〜3.0mmである。基材25の長さ、厚さ及び幅は、上記の範囲に限定されるものではない。 The length of the base material 25 is, for example, 1 to 400 m, preferably 50 to 300 m. The thickness of the base material 25 is, for example, 4 to 200 μm, preferably 20 to 100 μm. The width of the base material 25 is preferably the same as the width of the adhesive films 1 and 11 or wider than the width of the adhesive films 1 and 11, specifically, for example, 0.5 to 30 mm. It is preferably 0.5 to 3.0 mm. The length, thickness and width of the base material 25 are not limited to the above range.

基材25としては、例えば、ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリエチレンイソフタレート、ポリブチレンテレフタレート、ポリオレフィン、ポリアセテート、ポリカーボネート、ポリフェニレンサルファイド、ポリアミド、エチレン・酢酸ビニル共重合体、ポリ塩化ビニル、ポリ塩化ビニリデン、合成ゴム系、液晶ポリマー等で形成されたテープ状の基材を使用することが可能である。基材25を構成する材質は、これらに限定されるものではない。基材25の接着剤フィルム26との接着面には、離型処理が施されていてもよい。 Examples of the base material 25 include polyethylene terephthalate, polyethylene naphthalate, polyethylene isophthalate, polybutylene terephthalate, polyolefin, polyacetate, polycarbonate, polyphenylene sulfide, polyamide, ethylene / vinyl acetate copolymer, polyvinyl chloride, polyvinylidene chloride. , Synthetic rubber-based, tape-shaped base material formed of liquid crystal polymer or the like can be used. The material constituting the base material 25 is not limited to these. The adhesive surface of the base material 25 with the adhesive film 26 may be subjected to a mold release treatment.

接着剤フィルム26の幅は、使用用途に合わせて調整すればよく、例えば0.5〜5mmであり、好ましくは0.5〜3.0mmである。 The width of the adhesive film 26 may be adjusted according to the intended use, for example, 0.5 to 5 mm, preferably 0.5 to 3.0 mm.

この接着剤フィルム用リール21では、接着剤テープ24A,24Bの基材25と、導電性接着剤層3又は導電性領域Rとの間に、第1の非導電性接着剤層2又は第1の非導電性領域R1が設けられているため、接着剤フィルム26を基材25から剥離して回路接続に用いる際に、導電性接着剤層3又は導電性領域Rの基材25への転写(ブロッキング現象)を抑制できる。 In the adhesive film reel 21, the first non-conductive adhesive layer 2 or the first is between the base material 25 of the adhesive tapes 24A and 24B and the conductive adhesive layer 3 or the conductive region R. Since the non-conductive region R1 of the above is provided, when the adhesive film 26 is peeled from the base material 25 and used for circuit connection, the transfer of the conductive adhesive layer 3 or the conductive region R to the base material 25 is performed. (Blocking phenomenon) can be suppressed.

なお、上述の実施形態では、接着剤テープ24が接着剤フィルム用リール21の形態で用いられているが、接着剤テープ24は、例えば枚葉の形態(予め所望の大きさ、形状に切り取られた形態)で用いられてもよい。 In the above-described embodiment, the adhesive tape 24 is used in the form of the adhesive film reel 21, but the adhesive tape 24 is, for example, in the form of a single sheet (preliminarily cut into a desired size and shape). It may be used in the form).

[回路接続体及びその製造方法]
上述した接着剤テープ24を用いて製造される回路接続体について説明する。図5は、回路接続体の製造方法の一実施形態を示す模式断面図である。
[Circuit connector and its manufacturing method]
A circuit connection body manufactured by using the above-mentioned adhesive tape 24 will be described. FIG. 5 is a schematic cross-sectional view showing an embodiment of a method for manufacturing a circuit connection.

まず、図5(a)に示すように、第1の回路基板31と、第1の回路基板31の主面31a上に形成された第1の回路電極32とを備える第1の回路部材33を用意する。そして、第1の回路部材33の第1の回路電極32と、接着剤テープ24Aの第2の非導電性接着剤層4とが対向するように、第1の回路部材33上に接着剤テープ24Aを載置する。 First, as shown in FIG. 5A, a first circuit member 33 including a first circuit board 31 and a first circuit electrode 32 formed on a main surface 31a of the first circuit board 31. Prepare. Then, the adhesive tape is placed on the first circuit member 33 so that the first circuit electrode 32 of the first circuit member 33 and the second non-conductive adhesive layer 4 of the adhesive tape 24A face each other. Place 24A.

第1の回路部材33の具体例としては、FPC基板、COF基板等が挙げられる。これらの回路部材は、一般的に多数の回路電極を有している。第1の回路電極32は、金、銀、錫、ルテニウム、ロジウム、パラジウム、オスミウム、イリジウム、白金及びインジウム錫酸化物(ITO)から選ばれる1種又は2種以上で構成されていてよい。複数存在する第1の回路電極32の材質は、互いに同一であってもよく異なっていてもよい。 Specific examples of the first circuit member 33 include an FPC board, a COF board, and the like. These circuit members generally have a large number of circuit electrodes. The first circuit electrode 32 may be composed of one or more selected from gold, silver, tin, ruthenium, rhodium, palladium, osmium, iridium, platinum and indium tin oxide (ITO). The materials of the plurality of first circuit electrodes 32 may be the same as or different from each other.

なお、上述の接着剤フィルム用リール21を用いる場合は、例えば、圧着装置の回転軸に接着剤フィルム用リール21を装着し、接着剤テープ24Aの第2の非導電性接着剤層4が第1の回路部材33の第1の回路電極32に対向するように、接着剤フィルム用リール21から接着剤テープ24Aを引き出した後、接着剤テープ24Aを所定の長さに切断して、第1の回路部材33上に載置すればよい。 When the above-mentioned adhesive film reel 21 is used, for example, the adhesive film reel 21 is attached to the rotating shaft of the crimping device, and the second non-conductive adhesive layer 4 of the adhesive tape 24A is the second. After pulling out the adhesive tape 24A from the adhesive film reel 21 so as to face the first circuit electrode 32 of the circuit member 33 of 1, the adhesive tape 24A is cut to a predetermined length, and the first It may be placed on the circuit member 33 of.

次に、第1の回路部材33及び接着剤テープ24Aを矢印A及びB方向に加圧し、接着剤フィルム26を第1の回路部材33に仮接続する。このときの圧力は、第1の回路部材33に損傷を与えない範囲であれば特に制限されないが、例えば0.1〜30.0MPaであることが好ましい。仮接続時には、加熱しながら加圧してもよい。この場合の加熱温度は、接着剤フィルム1が実質的に硬化しない温度であればよく、例えば50〜100℃であることが好ましい。加圧(及び加熱)は、0.1〜2秒間行うことが好ましい。 Next, the first circuit member 33 and the adhesive tape 24A are pressed in the directions of arrows A and B, and the adhesive film 26 is temporarily connected to the first circuit member 33. The pressure at this time is not particularly limited as long as it does not damage the first circuit member 33, but is preferably 0.1 to 30.0 MPa, for example. At the time of temporary connection, pressurization may be performed while heating. In this case, the heating temperature may be any temperature as long as the adhesive film 1 does not substantially cure, and is preferably 50 to 100 ° C., for example. Pressurization (and heating) is preferably performed for 0.1 to 2 seconds.

次に、図5(b)に示すように、第2の回路基板34と、第2の回路基板34の主面34a上に形成された第2の回路電極35とを備える第2の回路部材36を用意する。そして、接着剤テープ24Aの基材25を接着剤フィルム1から剥離した後、第1の回路電極32と第2の回路電極35とが対向するように、第1の回路部材33及び接着剤フィルム1を第2の回路部材36上に載置する。 Next, as shown in FIG. 5B, a second circuit member including a second circuit board 34 and a second circuit electrode 35 formed on the main surface 34a of the second circuit board 34. Prepare 36. Then, after the base material 25 of the adhesive tape 24A is peeled off from the adhesive film 1, the first circuit member 33 and the adhesive film so that the first circuit electrode 32 and the second circuit electrode 35 face each other. 1 is placed on the second circuit member 36.

第2の回路部材36の具体例としては、LCDモジュール等が挙げられる。第2の回路電極35は、金、銀、錫、ルテニウム、ロジウム、パラジウム、オスミウム、イリジウム、白金及びインジウム錫酸化物(ITO)から選ばれる1種又は2種以上で構成されていてよい。複数存在する第2の回路電極35の材質は、互いに同一であってもよく異なっていてもよい。 Specific examples of the second circuit member 36 include an LCD module and the like. The second circuit electrode 35 may be composed of one or more selected from gold, silver, tin, ruthenium, rhodium, palladium, osmium, iridium, platinum and indium tin oxide (ITO). The materials of the plurality of second circuit electrodes 35 may be the same as or different from each other.

そして、加熱しながら、矢印C及びD方向に全体を加圧する。このときの加熱温度は、接着剤フィルム1の接着剤成分2a,3a,4aが硬化可能な温度であればよく、好ましくは60〜180℃、より好ましくは70〜170℃、更に好ましくは80〜160℃である。加熱温度が60℃以上であると適切な硬化速度を維持でき、180℃以下であると望まない副反応を抑制できる。加熱時間は、好ましくは0.1〜180秒間、より好ましくは0.5〜180秒間、更に好ましくは1〜180秒間である。 Then, while heating, the whole is pressurized in the directions of arrows C and D. The heating temperature at this time may be any temperature as long as the adhesive components 2a, 3a, 4a of the adhesive film 1 can be cured, preferably 60 to 180 ° C, more preferably 70 to 170 ° C, and further preferably 80 to 80. It is 160 ° C. When the heating temperature is 60 ° C. or higher, an appropriate curing rate can be maintained, and when the heating temperature is 180 ° C. or lower, unwanted side reactions can be suppressed. The heating time is preferably 0.1 to 180 seconds, more preferably 0.5 to 180 seconds, and even more preferably 1 to 180 seconds.

上記の接続の条件は、得られる回路接続体の用途、並びに接着剤フィルム及び回路部材の種類に応じて適宜選択される。接着剤フィルム1の接着剤成分2a,3a,4aが光によって硬化する接着剤成分である場合には、接続時に接着剤フィルム1に対して活性光線又はエネルギー線を適宜照射すればよい。活性光線としては、紫外線、可視光、赤外線等が挙げられる。エネルギー線としては、電子線、エックス線、γ線、マイクロ波等が挙げられる。 The above connection conditions are appropriately selected depending on the use of the obtained circuit connection body and the types of the adhesive film and the circuit member. When the adhesive components 2a, 3a, 4a of the adhesive film 1 are adhesive components that are cured by light, the adhesive film 1 may be appropriately irradiated with active light or energy rays at the time of connection. Examples of the active light ray include ultraviolet rays, visible light, infrared rays and the like. Examples of energy rays include electron beams, X-rays, γ-rays, microwaves, and the like.

このようにして、接着剤成分2a,3a,4aが硬化することにより、接着剤成分2a,3a,4aの硬化物37と導電性粒子5とを含有する接続部38が形成されて、図5(c)に示すような回路接続体39が得られる。すなわち、回路接続体39は、第1の回路部材33と、第2の回路部材36と、第1の回路部材33及び第2の回路部材36の間に設けられた接続部38とを備えている。回路接続体39では、第1の回路電極32と第2の回路電極35とが導電性粒子5を介して電気的に接続されている。つまり、導電性粒子5が第1及び第2の回路電極32,35の双方に直接接触しているため、第1及び第2の回路電極32,35間の接続抵抗が充分に低減され、第1及び第2の回路電極32,35間の良好な電気的接続が可能となる。一方、硬化物37は電気絶縁性を有しているため、隣接する第1の回路電極32同士及び第2の回路電極35同士の絶縁性は確保される。したがって、この回路接続体39では、第1及び第2の回路電極32,35間の電気の流れが円滑になり、回路部材33,36の持つ機能が充分に発揮される。 By curing the adhesive components 2a, 3a, 4a in this way, a connecting portion 38 containing the cured product 37 of the adhesive components 2a, 3a, 4a and the conductive particles 5 is formed, and FIG. The circuit connection body 39 as shown in (c) is obtained. That is, the circuit connection body 39 includes a first circuit member 33, a second circuit member 36, and a connection portion 38 provided between the first circuit member 33 and the second circuit member 36. There is. In the circuit connection body 39, the first circuit electrode 32 and the second circuit electrode 35 are electrically connected via the conductive particles 5. That is, since the conductive particles 5 are in direct contact with both the first and second circuit electrodes 32 and 35, the connection resistance between the first and second circuit electrodes 32 and 35 is sufficiently reduced, and the first Good electrical connection between the first and second circuit electrodes 32 and 35 is possible. On the other hand, since the cured product 37 has electrical insulation, the insulation between the adjacent first circuit electrodes 32 and the second circuit electrodes 35 is ensured. Therefore, in this circuit connection body 39, the flow of electricity between the first and second circuit electrodes 32 and 35 becomes smooth, and the functions of the circuit members 33 and 36 are fully exhibited.

以上説明した回路接続体39の製造方法では、まず、FPC基板、COF基板等の第1の回路部材33に接着剤フィルム1を仮接続するため、先にLCDモジュール等の第2の回路部材36に接着剤フィルム1を仮接続する場合に比べて、接着剤フィルム1の使用量を最小限に抑えることができ、製造コストの低減が可能となる。また、この回路接続体39の製造方法では、第1の非導電性接着剤層2の厚みが導電性接着剤層3の厚み未満である接着剤フィルム1を用いるため、第1及び第2の回路部材33,36同士を接続したときに、導電性粒子5が第1及び第2の回路電極32,35間に捕捉されやすくなり、良好な電気的接続が可能となる。 In the method for manufacturing the circuit connector 39 described above, first, in order to temporarily connect the adhesive film 1 to the first circuit member 33 such as the FPC substrate and the COF substrate, the second circuit member 36 such as the LCD module is first used. Compared with the case where the adhesive film 1 is temporarily connected to the adhesive film 1, the amount of the adhesive film 1 used can be minimized, and the manufacturing cost can be reduced. Further, in this method of manufacturing the circuit connection 39, since the adhesive film 1 in which the thickness of the first non-conductive adhesive layer 2 is less than the thickness of the conductive adhesive layer 3 is used, the first and second When the circuit members 33 and 36 are connected to each other, the conductive particles 5 are easily captured between the first and second circuit electrodes 32 and 35, and good electrical connection is possible.

上述の実施形態では、接着剤テープとして、第1実施形態に係る接着剤フィルム1を備える接着剤テープ24Aを用いたが、接着剤テープとして、第2実施形態に係る接着剤フィルム11を備える接着剤テープ24Bを用いてもよい。 In the above-described embodiment, the adhesive tape 24A provided with the adhesive film 1 according to the first embodiment is used as the adhesive tape, but the adhesive tape 11 provided with the adhesive film 11 according to the second embodiment is used as the adhesive tape. The agent tape 24B may be used.

以下、実施例によって本発明を更に詳細に説明するが、本発明はこれらの実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples.

(実施例1)
[ウレタンアクリレートの合成]
重量平均分子量800のポリカプロラクトンジオール400質量部と、2−ヒドロキシプロピルアクリレート131質量部と、触媒としてジブチル錫ジラウレート0.5質量部と、重合禁止剤としてハイドロキノンモノメチルエーテル1.0質量部とを攪拌しながら50℃に加熱して混合した。次いで、イソホロンジイソシアネート222質量部を滴下し、更に攪拌しながら80℃に昇温してウレタン化反応を行った。イソシアネート基の反応率が99%以上になったことを確認後、反応温度を下げてウレタンアクリレートを得た。
(Example 1)
[Synthesis of urethane acrylate]
Stir 400 parts by mass of polycaprolactone diol with a weight average molecular weight of 800, 131 parts by mass of 2-hydroxypropyl acrylate, 0.5 parts by mass of dibutyltin dilaurate as a catalyst, and 1.0 part by mass of hydroquinone monomethyl ether as a polymerization inhibitor. While heating to 50 ° C., the mixture was mixed. Then, 222 parts by mass of isophorone diisocyanate was added dropwise, and the temperature was raised to 80 ° C. with further stirring to carry out a urethanization reaction. After confirming that the reaction rate of the isocyanate group was 99% or more, the reaction temperature was lowered to obtain urethane acrylate.

[ポリエステルウレタン樹脂の調製]
ジカルボン酸としてテレフタル酸、ジオールとしてプロピレングリコール、イソシアネートとして4,4’−ジフェニルメタンジイソシアネートをそれぞれ用い、テレフタル酸/プロピレングリコール/4,4’−ジフェニルメタンジイソシアネートのモル比を1.0/1.3/0.25又は1.0/2.0/0.25として、2種類のポリエステルウレタン樹脂A,Bを調製した。各ポリエステルウレタン樹脂をメチルエチルケトンに20質量%となるように溶解させた。各ポリエステルウレタン樹脂のメチルエチルケトン溶液を、片面を表面処理した厚み80μmのPETフィルムに塗工装置を用いて塗布し、70℃、10分間の熱風乾燥により、厚みが35μmのフィルムを得た。各フィルムについて、広域動的粘弾性測定装置を用いて、引っ張り荷重5g、周波数10Hzにて弾性率の温度依存性を測定した。そこから得られたポリエステルウレタン樹脂のガラス転移温度は、ポリエステルウレタン樹脂A:105℃、ポリエステルウレタン樹脂B:70℃であった。
[Preparation of polyester urethane resin]
Using terephthalic acid as the dicarboxylic acid, propylene glycol as the diol, and 4,4'-diphenylmethane diisocyanate as the isocyanate, the molar ratio of terephthalic acid / propylene glycol / 4,4'-diphenylmethane diisocyanate was 1.0 / 1.3 / 0. Two types of polyester urethane resins A and B were prepared as 0.25 or 1.0 / 2.0 / 0.25. Each polyester urethane resin was dissolved in methyl ethyl ketone so as to be 20% by mass. A methyl ethyl ketone solution of each polyester urethane resin was applied to a PET film having a thickness of 80 μm with one side surface-treated using a coating device, and dried with hot air at 70 ° C. for 10 minutes to obtain a film having a thickness of 35 μm. For each film, the temperature dependence of the elastic modulus was measured at a tensile load of 5 g and a frequency of 10 Hz using a wide-area dynamic viscoelasticity measuring device. The glass transition temperature of the polyester urethane resin obtained from the glass transition temperature was 105 ° C. for the polyester urethane resin A: 105 ° C. and 70 ° C. for the polyester urethane resin B.

[第1の非導電性接着剤層の作製]
ラジカル重合性物質として、上記ウレタンアクリレート20質量部、ビス(アクリロキシエチル)イソシアヌレート(製品名:M−325、東亞合成株式会社製)20質量部、ジメチロールトリシクロデカンジアクリレート(製品名:DCP−A、共栄社化学株式会社製)10質量部、及び2−メタクリロイロキシエチルアッシドフォスヘート(製品名:P−2M、共栄社化学株式会社製)1質量部を用い、遊離ラジカル発生剤としてベンゾイルパーオキサイド(製品名:ナイパーBMT−K、日油株式会社製)3質量部を用いた。これらの各成分と、トルエン/メチルエチルケトン=50/50の混合溶剤にポリエステルウレタン樹脂Bを溶解させて得られた23質量%の溶液50質量部とを混合し、攪拌して樹脂溶液を得た。この樹脂溶液を、片面を表面処理した厚み50μmのPETフィルムに塗工装置を用いて塗布し、70℃、10分間の熱風乾燥により、PETフィルムと厚み2μmの非導電性接着剤層A(第1の非導電性接着剤層)との積層体PA(幅15cm、長さ80m)を得た。
[Preparation of first non-conductive adhesive layer]
As the radically polymerizable substance, 20 parts by mass of the above urethane acrylate, 20 parts by mass of bis (acryloxyethyl) isocyanurate (product name: M-325, manufactured by Toa Synthetic Co., Ltd.), dimethylol tricyclodecandic acrylate (product name:: DCP-A, manufactured by Kyoeisha Chemical Co., Ltd., 10 parts by mass, and 2-methacryloxyethyl acid foshet (product name: P-2M, manufactured by Kyoeisha Chemical Co., Ltd.), 1 part by mass were used as a free radical generator. 3 parts by mass of benzoyl radical (product name: Niper BMT-K, manufactured by Nichiyu Co., Ltd.) was used. Each of these components was mixed with 50 parts by mass of a 23% by mass solution obtained by dissolving polyester urethane resin B in a mixed solvent of toluene / methyl ethyl ketone = 50/50, and stirred to obtain a resin solution. This resin solution is applied to a PET film having a thickness of 50 μm with one side surface-treated using a coating device, and dried with hot air at 70 ° C. for 10 minutes to form a PET film and a non-conductive adhesive layer A having a thickness of 2 μm. A laminated body PA (width 15 cm, length 80 m) with the non-conductive adhesive layer (1) was obtained.

[導電性接着剤層の作製]
ラジカル重合性物質として、上記ウレタンアクリレート25質量部、ビス(アクリロキシエチル)イソシアヌレート(製品名:M−325、東亞合成株式会社製)15質量部、及び2−メタクリロイロキシエチルアッシドフォスヘート(製品名:P−2M、共栄社化学株式会社製)1質量部を用い、遊離ラジカル発生剤としてベンゾイルパーオキサイド(製品名:ナイパーBMT−K40、日油株式会社製)3質量部を用いた。これらの各成分と、ポリエステルウレタン樹脂Aの20質量%メチルエチルケトン溶液60質量部とを混合し、攪拌してバインダ樹脂溶液を得た。一方、ポリスチレン粒子の表面上に、厚み0.1μmのニッケル層を設け、このニッケル層の外側に厚み0.04μmの金層を更に設けて平均粒径3μmの導電性粒子(20%圧縮弾性率(K値):500Kgf/mm)を得た。この導電性粒子をバインダ樹脂溶液に対して3体積%分散させ、片面を表面処理した厚み50μmのPETフィルムに塗工装置を用いて塗布し、70℃、10分間の熱風乾燥により、PETフィルムと厚み3μmの導電性接着剤層Bとの積層体PB(幅15cm、長さ80m)を得た。
[Preparation of conductive adhesive layer]
As radically polymerizable substances, 25 parts by mass of the above urethane acrylate, 15 parts by mass of bis (acryloxyethyl) isocyanurate (product name: M-325, manufactured by Toa Synthetic Co., Ltd.), and 2-methacryloyloxyethyl acidphoshet. (Product name: P-2M, manufactured by Kyoeisha Chemical Co., Ltd.) 1 part by mass was used, and 3 parts by mass of benzoyl peroxide (product name: Niper BMT-K40, manufactured by Nichiyu Co., Ltd.) was used as a free radical generator. Each of these components was mixed with 60 parts by mass of a 20 mass% methyl ethyl ketone solution of polyester urethane resin A and stirred to obtain a binder resin solution. On the other hand, a nickel layer having a thickness of 0.1 μm is provided on the surface of the polystyrene particles, and a gold layer having a thickness of 0.04 μm is further provided outside the nickel layer to provide conductive particles having an average particle size of 3 μm (20% compressive elastic modulus). (K value): 500 kgf / mm 2 ) was obtained. The conductive particles were dispersed in a binder resin solution in an amount of 3% by volume, coated on a PET film having a thickness of 50 μm with one side surface-treated using a coating device, and dried with hot air at 70 ° C. for 10 minutes to form a PET film. A laminated body PB (width 15 cm, length 80 m) with a conductive adhesive layer B having a thickness of 3 μm was obtained.

[第2の非導電性接着剤層の作製]
ラジカル重合性物質として、上記ウレタンアクリレート20質量部、ビス(アクリロキシエチル)イソシアヌレート(製品名:M−325、東亞合成株式会社製)20質量部、ジメチロールトリシクロデカンジアクリレート(製品名:DCP−A、共栄社化学株式会社製)10質量部、及び2−メタクリロイロキシエチルアッシドフォスヘート(製品名:P−2M、共栄社化学株式会社製)1質量部を用い、遊離ラジカル発生剤としてベンゾイルパーオキサイド(製品名:ナイパーBMT−K、日油株式会社製)3質量部を用いた。これらの各成分と、トルエン/メチルエチルケトン=50/50の混合溶剤にポリエステルウレタン樹脂Bを溶解させて得られた23質量%の溶液50質量部とを混合し、攪拌して樹脂溶液を得た。この樹脂溶液を、片面を表面処理した厚み50μmのPETフィルムに塗工装置を用いて塗布し、70℃、10分間の熱風乾燥により、PETフィルムと厚み8μmの非導電性接着剤層C(第2の非導電性接着剤層)との積層体PC(幅15cm、長さ70m)を得た。
[Preparation of second non-conductive adhesive layer]
As the radically polymerizable substance, 20 parts by mass of the above urethane acrylate, 20 parts by mass of bis (acryloxyethyl) isocyanurate (product name: M-325, manufactured by Toa Synthetic Co., Ltd.), dimethylol tricyclodecandic acrylate (product name:: DCP-A, manufactured by Kyoeisha Chemical Co., Ltd., 10 parts by mass, and 2-methacryloxyethyl acid foshet (product name: P-2M, manufactured by Kyoeisha Chemical Co., Ltd.), 1 part by mass were used as a free radical generator. 3 parts by mass of benzoyl radical (product name: Niper BMT-K, manufactured by Nichiyu Co., Ltd.) was used. Each of these components was mixed with 50 parts by mass of a 23% by mass solution obtained by dissolving polyester urethane resin B in a mixed solvent of toluene / methyl ethyl ketone = 50/50, and stirred to obtain a resin solution. This resin solution is applied to a PET film having a thickness of 50 μm with one side surface-treated using a coating device, and dried with hot air at 70 ° C. for 10 minutes to form a PET film and a non-conductive adhesive layer C having a thickness of 8 μm (No. 1). A laminated PC (width 15 cm, length 70 m) with the non-conductive adhesive layer (2) was obtained.

[接着剤フィルムの作製]
得られた積層体PAと積層体PBとを、非導電性接着剤層Aと導電性接着剤層Bとが互いに向き合うように貼り合わせ、ラミネーター(製品名:RISTON、モデル:HRL、Dupont社製、ロール圧力:バネ荷重のみ、ロール温度:40℃、速度:50cm/分)を用いてラミネートした。次いで、導電性接着剤層B側のPETフィルムを剥離し、PETフィルムと非導電性接着剤層Aと導電性接着剤層Bとがこの順で積層された積層体PAB(幅15cm、長さ70m)を得た。
[Preparation of adhesive film]
The obtained laminated body PA and the laminated body PB are bonded together so that the non-conductive adhesive layer A and the conductive adhesive layer B face each other, and a laminator (product name: RISTON, model: HRL, manufactured by Dupont) is bonded. , Roll pressure: spring load only, roll temperature: 40 ° C., speed: 50 cm / min) for laminating. Next, the PET film on the conductive adhesive layer B side was peeled off, and the laminated body PAB (width 15 cm, length) in which the PET film, the non-conductive adhesive layer A, and the conductive adhesive layer B were laminated in this order. 70m) was obtained.

続いて、得られた積層体PABと積層体PCとを、導電性接着剤層Bと非導電性接着剤層Cとが互いに向き合うように貼り合わせ、ラミネーター(製品名:RISTON、モデル:HRL、Dupont社製、ロール圧力:バネ荷重のみ、ロール温度:40℃、速度:50cm/分)を用いてラミネートした。次いで、非導電性接着剤層C側のPETフィルムを剥離し、PETフィルム(基材)と、非導電性接着剤層A、導電性接着剤層B及び非導電性接着剤層Cがこの順で積層された接着剤フィルムとの積層体PABC(幅15cm、長さ60m)を得た。 Subsequently, the obtained laminated body PAB and the laminated body PC are bonded together so that the conductive adhesive layer B and the non-conductive adhesive layer C face each other, and a laminator (product name: RISTON, model: HRL, Laminated using Dupont, roll pressure: spring load only, roll temperature: 40 ° C., speed: 50 cm / min). Next, the PET film on the non-conductive adhesive layer C side is peeled off, and the PET film (base material), the non-conductive adhesive layer A, the conductive adhesive layer B, and the non-conductive adhesive layer C are in this order. A laminated PABC (width 15 cm, length 60 m) with the adhesive film laminated in 1 was obtained.

得られた積層体PABCの端面を走査型電子顕微鏡(SEM)で観察し、導電性領域の長さL、第1の非導電性領域R1の長さL1、及び第2の非導電性領域R2の長さL2をそれぞれ以下のように測定した。
まず、積層体PABCにおいて、導電性粒子に接し、かつPETフィルムと非導電性接着剤層Aとの界面(SEM像上では線。以下同様。)に略平行な平面のうち、該界面から最短距離に存在する平面である第1の接平面と、導電性粒子に接し、かつ積層体PABCの非導電性接着剤層C側の表面と略平行な平面のうち、該表面から最短距離に存在する平面である第2の接平面との間の領域(導電性領域)の長さをLとして測定した。
また、第1の接平面から積層体PABCの非導電性接着剤層A側の表面へ向けて積層体PABCの厚み方向に広がる、導電性領域以外の領域(第1の非導電性領域)の長さをL1として測定した。
また、第2の接平面から積層体PABCの非導電性接着剤層C側の表面へ向けて積層体PABCの厚み方向に広がる、導電性領域以外の領域(第2の非導電性領域)の長さをL2として測定した。
その結果、L=3μm、L1=2μm、L2=8μmであった。
The end face of the obtained laminated body PABC was observed with a scanning electron microscope (SEM), and the length L of the conductive region, the length L1 of the first non-conductive region R1, and the second non-conductive region R2 were observed. The length L2 of each was measured as follows.
First, in the laminated PABC, the shortest of the planes in contact with the conductive particles and substantially parallel to the interface between the PET film and the non-conductive adhesive layer A (a line on the SEM image; the same applies hereinafter). Of the first tangent plane that exists at a distance and the plane that is in contact with the conductive particles and is substantially parallel to the surface of the laminated PABC on the non-conductive adhesive layer C side, it exists at the shortest distance from the surface. The length of the region (conductive region) between the second tangent plane, which is the plane to be formed, was measured as L.
Further, a region other than the conductive region (first non-conductive region) extending in the thickness direction of the laminated PABC from the first tangent plane toward the surface of the laminated PABC on the non-conductive adhesive layer A side. The length was measured as L1.
Further, a region other than the conductive region (second non-conductive region) extending in the thickness direction of the laminated PABC from the second tangent plane toward the surface of the laminated PABC on the non-conductive adhesive layer C side. The length was measured as L2.
As a result, L = 3 μm, L1 = 2 μm, and L2 = 8 μm.

[接着剤フィルム用リールの作製]
得られた積層体PABCを1.0mm幅のテープ状に裁断して接着剤テープとし、内径40mm、外径48mmのプラスチック製巻芯(幅1.7mm)に接着剤フィルム面を内側にして50m巻きつけ、接着剤フィルム用リールを得た。
[Making reels for adhesive films]
The obtained laminated PABC is cut into a tape having a width of 1.0 mm to form an adhesive tape, and a plastic winding core (width 1.7 mm) having an inner diameter of 40 mm and an outer diameter of 48 mm is 50 m with the adhesive film surface inside. It was wound to obtain a reel for an adhesive film.

(実施例2)
導電性接着剤層の作製において、ポリスチレン粒子の表面上に、厚み0.2μmのニッケル層を設け、このニッケル層の外側に厚み0.04μmの金層を更に設けて、平均粒径4μmの導電性粒子(20%圧縮弾性率(K値):410Kgf/mm)を得たこと、及び、導電性接着剤層の厚みを4μmとしたこと以外は、実施例1と同様にして基材と接着剤フィルム(厚み14μm)との積層体を得た。実施例1と同様にしてL、L1及びL2を測定したところ、L=4μm、L1=2μm、L2=8μmであった。また、この積層体を幅1.0mmのテープ状に裁断して接着剤テープとし、実施例1と同様にして接着剤フィルム用リールを得た。
(Example 2)
In the production of the conductive adhesive layer, a nickel layer having a thickness of 0.2 μm is provided on the surface of the polystyrene particles, and a gold layer having a thickness of 0.04 μm is further provided outside the nickel layer to conduct conductivity having an average particle size of 4 μm. The substrate was used in the same manner as in Example 1 except that the sex particles (20% compressive elasticity (K value): 410 Kgf / mm 2 ) were obtained and the thickness of the conductive adhesive layer was 4 μm. A laminate with an adhesive film (thickness 14 μm) was obtained. When L, L1 and L2 were measured in the same manner as in Example 1, L = 4 μm, L1 = 2 μm, and L2 = 8 μm. Further, this laminated body was cut into a tape having a width of 1.0 mm to obtain an adhesive tape, and a reel for an adhesive film was obtained in the same manner as in Example 1.

(実施例3)
第1の非導電性接着剤層の厚みを2.5μm、第2の非導電性接着剤層の厚みを8μmとした以外は、実施例2と同様にして基材と接着剤フィルム(厚み14.5μm)との積層体を得た。実施例1と同様にしてL、L1及びL2を測定したところ、L=4μm、L1=2.5μm、L2=8μmであった。また、この積層体を幅1.0mmのテープ状に裁断して接着剤テープとし、実施例1と同様にして接着剤フィルム用リールを得た。
(Example 3)
The substrate and the adhesive film (thickness 14) are the same as in Example 2 except that the thickness of the first non-conductive adhesive layer is 2.5 μm and the thickness of the second non-conductive adhesive layer is 8 μm. A laminated body with .5 μm) was obtained. When L, L1 and L2 were measured in the same manner as in Example 1, L = 4 μm, L1 = 2.5 μm, and L2 = 8 μm. Further, this laminated body was cut into a tape having a width of 1.0 mm to obtain an adhesive tape, and a reel for an adhesive film was obtained in the same manner as in Example 1.

(実施例4)
第1の非導電性接着剤層の厚みを2μm、第2の非導電性接着剤層の厚みを10μmとした以外は、実施例1と同様にして基材と接着剤フィルム(厚み15μm)との積層体を得た。実施例1と同様にしてL、L1及びL2を測定したところ、L=3μm、L1=2μm、L2=10μmであった。また、この積層体を幅1.0mmのテープ状に裁断して接着剤テープとし、実施例1と同様にして接着剤フィルム用リールを得た。
(Example 4)
The substrate and the adhesive film (thickness 15 μm) are the same as in Example 1 except that the thickness of the first non-conductive adhesive layer is 2 μm and the thickness of the second non-conductive adhesive layer is 10 μm. Was obtained. When L, L1 and L2 were measured in the same manner as in Example 1, L = 3 μm, L1 = 2 μm, and L2 = 10 μm. Further, this laminated body was cut into a tape having a width of 1.0 mm to obtain an adhesive tape, and a reel for an adhesive film was obtained in the same manner as in Example 1.

(実施例5)
第1の非導電性接着剤層の厚みを2.5μm、第2の非導電性接着剤層の厚みを10μmとした以外は、実施例1と同様にして基材と接着剤フィルム(厚み14.5μm)との積層体を得た。実施例1と同様にしてL、L1及びL2を測定したところ、L=3μm、L1=2.5μm、L2=10μmであった。また、この積層体を幅1.0mmのテープ状に裁断して接着剤テープとし実施例1と同様にして接着剤フィルム用リールを得た。
(Example 5)
The substrate and the adhesive film (thickness 14) are the same as in Example 1 except that the thickness of the first non-conductive adhesive layer is 2.5 μm and the thickness of the second non-conductive adhesive layer is 10 μm. A laminated body with .5 μm) was obtained. When L, L1 and L2 were measured in the same manner as in Example 1, L = 3 μm, L1 = 2.5 μm, and L2 = 10 μm. Further, this laminated body was cut into a tape having a width of 1.0 mm to obtain an adhesive tape, and an adhesive film reel was obtained in the same manner as in Example 1.

(比較例1)
ラジカル重合性物質として、上記ウレタンアクリレート20質量部、ビス(アクリロキシエチル)イソシアヌレート(製品名:M−325、東亞合成株式会社製)15質量部、及び2−メタクリロイロキシエチルアッシドフォスヘート(製品名:P−2M、共栄社化学株式会社製)1質量部を用い、遊離ラジカル発生剤としてベンゾイルパーオキサイド(製品名:ナイパーBMT−K40、日油株式会社製)3質量部を用いた。これらの各成分と、ポリエステルウレタン樹脂Aの20質量%メチルエチルケトン溶液60質量部とを混合し、攪拌して樹脂溶液を得た。一方、ポリスチレン粒子の表面上に、厚み0.1μmのニッケル層を設け、このニッケル層の外側に厚み0.04μmの金層を更に設けて平均粒径3μmの導電性粒子(20%圧縮弾性率(K値):500Kgf/mm)を得た。この導電性粒子をバインダ樹脂溶液に対して3体積%分散させ、片面を表面処理した厚み50μmのPETフィルムに塗工装置を用いて塗布し、70℃、10分間の熱風乾燥により、PETフィルムと厚み3μmの導電性接着剤層B’との積層体PB’(幅15cm、長さ70m)を得た。
(Comparative Example 1)
As radically polymerizable substances, 20 parts by mass of the above urethane acrylate, 15 parts by mass of bis (acryloxyethyl) isocyanurate (product name: M-325, manufactured by Toa Synthetic Co., Ltd.), and 2-methacryloyloxyethyl acid phosphate. (Product name: P-2M, manufactured by Kyoeisha Chemical Co., Ltd.) 1 part by mass was used, and 3 parts by mass of benzoyl peroxide (product name: Niper BMT-K40, manufactured by Nichiyu Co., Ltd.) was used as a free radical generator. Each of these components was mixed with 60 parts by mass of a 20 mass% methyl ethyl ketone solution of polyester urethane resin A and stirred to obtain a resin solution. On the other hand, a nickel layer having a thickness of 0.1 μm is provided on the surface of the polystyrene particles, and a gold layer having a thickness of 0.04 μm is further provided outside the nickel layer to provide conductive particles having an average particle size of 3 μm (20% compressive elastic modulus). (K value): 500 kgf / mm 2 ) was obtained. The conductive particles were dispersed in a binder resin solution in an amount of 3% by volume, coated on a PET film having a thickness of 50 μm with one side surface-treated using a coating device, and dried with hot air at 70 ° C. for 10 minutes to form a PET film. A laminated body PB'(width 15 cm, length 70 m) with a conductive adhesive layer B'with a thickness of 3 μm was obtained.

ラジカル重合性物質として、上記ウレタンアクリレート20質量部、ビス(アクリロキシエチル)イソシアヌレート(製品名:M−325、東亞合成株式会社製)20質量部、ジメチロールトリシクロデカンジアクリレート(製品名:DCP−A、共栄社化学株式会社製)10質量部、及び2−メタクリロイロキシエチルアッシドフォスヘート(製品名:P−2M、共栄社化学株式会社製)1質量部を用い、遊離ラジカル発生剤としてベンゾイルパーオキサイド(製品名:ナイパーBMT−K、日油株式会社製)3質量部を用いた。これらの各成分と、トルエン/メチルエチルケトン=50/50の混合溶剤にポリエステルウレタン樹脂Bを溶解させて得られた23質量%の溶液50質量部とを混合し、攪拌して樹脂溶液を得た。この樹脂溶液を、片面を表面処理した厚み50μmのPETフィルムに塗工装置を用いて塗布し、70℃、10分間の熱風乾燥により、PETフィルムと厚み12μmの非導電性接着剤層C’との積層体PC’(幅15cm、長さ70m)を得た。 As the radically polymerizable substance, 20 parts by mass of the above urethane acrylate, 20 parts by mass of bis (acryloxyethyl) isocyanurate (product name: M-325, manufactured by Toa Synthetic Co., Ltd.), dimethylol tricyclodecandic acrylate (product name:: DCP-A, manufactured by Kyoeisha Chemical Co., Ltd., 10 parts by mass, and 2-methacryloxyethyl acid foshet (product name: P-2M, manufactured by Kyoeisha Chemical Co., Ltd.), 1 part by mass were used as a free radical generator. 3 parts by mass of benzoyl radical (product name: Niper BMT-K, manufactured by Nichiyu Co., Ltd.) was used. Each of these components was mixed with 50 parts by mass of a 23% by mass solution obtained by dissolving polyester urethane resin B in a mixed solvent of toluene / methyl ethyl ketone = 50/50, and stirred to obtain a resin solution. This resin solution was applied to a PET film having a surface treatment of 50 μm on one side using a coating device, and dried with hot air at 70 ° C. for 10 minutes to form a PET film and a non-conductive adhesive layer C'with a thickness of 12 μm. PC'(width 15 cm, length 70 m) was obtained.

得られた積層体PB’と積層体PC’とを、導電性接着剤層B’と非導電性接着剤層C’とが互いに向き合うように貼り合わせ、ラミネーター(製品名:RISTON、モデル:HRL、Dupont社製、ロール圧力:バネ荷重のみ、ロール温度:40℃、速度:50cm/分)を用いてラミネートした。次いで、非導電性接着剤層C’側のPETフィルムを剥離し、PETフィルム(基材)と、導電性接着剤層B’及び非導電性接着剤層C’からなる接着剤との積層体PB’C’(幅15cm、長さ60m)を得た。実施例1と同様にしてL及びL2を測定したところ、L=3μm、L2=12μmであった。得られた積層体を幅1.0mm幅のテープ状に裁断して接着剤テープとし、内径40mm、外径48mmのプラスチック製巻芯(幅1.7mm)に接着剤フィルム面を内側にして50m巻きつけ、接着剤フィルム用リールを得た。 The obtained laminated body PB'and the laminated body PC' are bonded together so that the conductive adhesive layer B'and the non-conductive adhesive layer C'face each other, and a laminator (product name: RISTON, model: HRL) is bonded. , Dupont, roll pressure: spring load only, roll temperature: 40 ° C., speed: 50 cm / min). Next, the PET film on the non-conductive adhesive layer C'side is peeled off, and a laminate of the PET film (base material) and an adhesive composed of the conductive adhesive layer B'and the non-conductive adhesive layer C'. PB'C'(width 15 cm, length 60 m) was obtained. When L and L2 were measured in the same manner as in Example 1, L = 3 μm and L2 = 12 μm. The obtained laminate was cut into a tape having a width of 1.0 mm to form an adhesive tape, and a plastic winding core (width 1.7 mm) having an inner diameter of 40 mm and an outer diameter of 48 mm was 50 m with the adhesive film surface inside. It was wound to obtain a reel for an adhesive film.

(比較例2)
導電性接着剤層の作製において、ポリスチレン粒子の表面上に、厚み0.2μmのニッケル層を設け、このニッケル層の外側に厚み0.04μmの金層を更に設けて平均粒径4μmの導電性粒子(20%圧縮弾性率(K値):410Kgf/mm)を得たこと、及び、導電性接着剤層の厚みを4μmとしたこと以外は、比較例1と同様にして基材と接着剤フィルム(厚み16μm)との積層体を得た。実施例1と同様にしてL及びL2を測定したところ、L=4μm、L2=8μmであった。また、この積層体を幅1.0mmのテープ状に裁断して接着剤テープとし、比較例1と同様にして接着剤フィルム用リールを得た。
(Comparative Example 2)
In the production of the conductive adhesive layer, a nickel layer having a thickness of 0.2 μm is provided on the surface of the polystyrene particles, and a gold layer having a thickness of 0.04 μm is further provided outside the nickel layer to provide conductivity having an average particle size of 4 μm. Adhesion to the substrate in the same manner as in Comparative Example 1 except that particles (20% compressive elasticity (K value): 410 Kgf / mm 2) were obtained and the thickness of the conductive adhesive layer was 4 μm. A laminated body with an agent film (thickness 16 μm) was obtained. When L and L2 were measured in the same manner as in Example 1, L = 4 μm and L2 = 8 μm. Further, this laminated body was cut into a tape having a width of 1.0 mm to obtain an adhesive tape, and a reel for an adhesive film was obtained in the same manner as in Comparative Example 1.

(比較例3)
第1の非導電性接着剤層の厚みを4μm、第2の非導電性接着剤層の厚みを6μmとした以外は、実施例1と同様にして基材と接着剤フィルム(厚み13μm)との積層体を得た。実施例1と同様にしてL、L1及びL2を測定したところ、L=3μm、L1=4μm、L2=6μmであった。また、この積層体を幅1.0mmのテープ状に裁断して接着剤テープとし実施例1と同様にして接着剤フィルム用リールを得た。
(Comparative Example 3)
The substrate and the adhesive film (thickness 13 μm) are the same as in Example 1 except that the thickness of the first non-conductive adhesive layer is 4 μm and the thickness of the second non-conductive adhesive layer is 6 μm. Was obtained. When L, L1 and L2 were measured in the same manner as in Example 1, L = 3 μm, L1 = 4 μm, and L2 = 6 μm. Further, this laminated body was cut into a tape having a width of 1.0 mm to obtain an adhesive tape, and an adhesive film reel was obtained in the same manner as in Example 1.

(比較例4)
第1の非導電性接着剤層の厚みを4μm、第2の非導電性接着剤層の厚みを6μmとした以外は、実施例2と同様にして基材と接着剤フィルム(厚み14μm)との積層体を得た。実施例1と同様にしてL、L1及びL2を測定したところ、L=4μm、L1=4μm、L2=6μmであった。また、この積層体を幅1.0mmのテープ状に裁断して接着剤テープとし実施例1と同様にして接着剤フィルム用リールを得た。
(Comparative Example 4)
The substrate and the adhesive film (thickness 14 μm) are the same as in Example 2 except that the thickness of the first non-conductive adhesive layer is 4 μm and the thickness of the second non-conductive adhesive layer is 6 μm. Was obtained. When L, L1 and L2 were measured in the same manner as in Example 1, L = 4 μm, L1 = 4 μm, and L2 = 6 μm. Further, this laminated body was cut into a tape having a width of 1.0 mm to obtain an adhesive tape, and an adhesive film reel was obtained in the same manner as in Example 1.

(参考例)
比較例1において、積層体PB’と積層体PC’とのラミネート後に、導電性接着剤層C’側のPETフィルムに代えて導電性接着剤層B’側のPETフィルムを剥離した以外は、比較例1と同様にして基材と接着剤フィルム(厚み15μm)との積層体を得た。実施例1と同様にしてL及びL2を測定したところ、L=3μm、L2=12μmであった。また、この積層体を幅1.0mmのテープ状に裁断して接着剤テープとし、比較例1と同様にして接着剤フィルム用リールを得た。
(Reference example)
In Comparative Example 1, after laminating the laminated body PB'and the laminated body PC', the PET film on the conductive adhesive layer B'side was peeled off instead of the PET film on the conductive adhesive layer C'side. A laminate of the base material and the adhesive film (thickness 15 μm) was obtained in the same manner as in Comparative Example 1. When L and L2 were measured in the same manner as in Example 1, L = 3 μm and L2 = 12 μm. Further, this laminated body was cut into a tape having a width of 1.0 mm to obtain an adhesive tape, and a reel for an adhesive film was obtained in the same manner as in Comparative Example 1.

<ブロッキングの有無の評価>
30℃(湿度:40〜60%RH)の恒温槽中に、接着剤フィルム用リールを横にし、1日間(24時間)放置した。その後、引張圧縮試験機(製品名:STA−1150、株式会社オリエンテック製)を用いて、1m/分の速度で接着剤テープを終端部まで引き出した。接着剤フィルムがPETフィルムから途中で剥がれた場合をブロッキング「有」、接着剤フィルムがPETフィルムから剥がれずに接着剤テープを引き出せた場合をブロッキング「無」として評価した。評価結果を表1、2に示す。
<Evaluation of the presence or absence of blocking>
The reel for the adhesive film was laid down in a constant temperature bath at 30 ° C. (humidity: 40 to 60% RH) and left for 1 day (24 hours). Then, using a tensile compression tester (product name: STA-1150, manufactured by Orientec Co., Ltd.), the adhesive tape was pulled out to the end at a speed of 1 m / min. The case where the adhesive film was peeled off from the PET film in the middle was evaluated as blocking "Yes", and the case where the adhesive film could be pulled out without peeling from the PET film was evaluated as blocking "No". The evaluation results are shown in Tables 1 and 2.

<回路接続体の作製>
実施例及び比較例で得られた各接着剤テープ(幅1.0mm、長さ3cm)の接着剤フィルム面を、ピッチ40μm、厚み8μmのすずめっき銅回路を500本有するFPC基板上に載置した状態で、70℃、1MPaで1秒間加熱加圧した後、PETフィルムを剥離することで、接着剤フィルムとFPC基板とを仮接続した。次いで、厚み1.1mmのITOコートガラス基板(15Ω□)上に、接着剤フィルム及びFPC基板を載置し、50℃、0.5MPaで0.5秒間加圧して仮固定した。FPC基板が接着剤フィルムによって仮固定されたガラス基板を本圧着装置に設置し、厚み200μmのシリコーンゴムをクッション材として、FPC基板側から、ヒートツールによって170℃、3MPaで5秒間加熱加圧し、接着剤フィルムの幅1.0mmにわたり接続して回路接続体を得た。なお、参考例についてのみ、まず接着剤フィルムをITOコートガラス基板に仮接続し、次いで接着剤フィルムにFPC基板を仮固定した。それ以外は、上記の実施例及び比較例と同一条件により回路接続体を得た。
<Manufacturing of circuit connection>
The adhesive film surface of each adhesive tape (width 1.0 mm, length 3 cm) obtained in Examples and Comparative Examples is placed on an FPC substrate having 500 tin-plated copper circuits having a pitch of 40 μm and a thickness of 8 μm. In this state, the adhesive film and the FPC substrate were temporarily connected by peeling off the PET film after heating and pressurizing at 70 ° C. and 1 MPa for 1 second. Next, the adhesive film and the FPC substrate were placed on an ITO-coated glass substrate (15Ω □) having a thickness of 1.1 mm, and were temporarily fixed by applying pressure at 50 ° C. and 0.5 MPa for 0.5 seconds. A glass substrate to which the FPC substrate was temporarily fixed by an adhesive film was installed in this crimping device, and a silicone rubber having a thickness of 200 μm was used as a cushioning material, and the FPC substrate was heated and pressed at 170 ° C. and 3 MPa for 5 seconds from the FPC substrate side. A circuit connection was obtained by connecting the adhesive film over a width of 1.0 mm. Only for the reference example, the adhesive film was first temporarily connected to the ITO-coated glass substrate, and then the FPC substrate was temporarily fixed to the adhesive film. Other than that, a circuit connector was obtained under the same conditions as in the above Examples and Comparative Examples.

<接続抵抗の測定>
作製した各回路接続体について、接続部を含むFPC基板の隣接回路間の抵抗値をマルチメータ(装置名:TR6845、株式会社アドバンテスト製)で測定した。抵抗値は、異なる隣接回路間の抵抗30点を測定し、それらの平均値として求めた。評価結果を表1、2に示す。
<Measurement of connection resistance>
For each of the manufactured circuit connectors, the resistance value between the adjacent circuits of the FPC board including the connection portion was measured with a multimeter (device name: TR6485, manufactured by Advantest Co., Ltd.). The resistance value was obtained by measuring 30 points of resistance between different adjacent circuits and calculating them as an average value. The evaluation results are shown in Tables 1 and 2.

<接着力の測定>
作製した各回路接続体について、FPC基板を剥離速度50mm/分で該基板の主面に対して垂直に引っ張ること(90度剥離)により接着力の測定を行った。評価結果を表1、2に示す。
<Measurement of adhesive strength>
The adhesive strength of each of the manufactured circuit connectors was measured by pulling the FPC substrate perpendicularly to the main surface of the substrate at a peeling speed of 50 mm / min (peeling at 90 degrees). The evaluation results are shown in Tables 1 and 2.

Figure 0006988482
Figure 0006988482

Figure 0006988482
Figure 0006988482

表1に示すように、実施例1〜5では、いずれもブロッキングは発生せず、また、良好な接続抵抗及び接着力が得られた。 As shown in Table 1, in Examples 1 to 5, blocking did not occur, and good connection resistance and adhesive strength were obtained.

表2に示すように、比較例1、2では、いずれもブロッキングが発生した(そのため、接続抵抗及び接着力の評価は実施しなかった)。一方、基材上に非導電性接着剤層が形成され、その上に導電性接着剤層が更に形成された一般的な二層構成の接着剤フィルム(参考例)では、ブロッキングは発生せず、接続抵抗及び接着力の評価結果も良好であった。また、比較例3、4では、接続抵抗の上昇がみられた。 As shown in Table 2, blocking occurred in both Comparative Examples 1 and 2 (therefore, the connection resistance and the adhesive strength were not evaluated). On the other hand, in a general two-layer adhesive film (reference example) in which a non-conductive adhesive layer is formed on a base material and a conductive adhesive layer is further formed on the non-conductive adhesive layer, blocking does not occur. The evaluation results of connection resistance and adhesive strength were also good. Further, in Comparative Examples 3 and 4, an increase in connection resistance was observed.

以上より、本発明によれば、例えばFPC基板側に貼り付けが可能で、ブロッキングの発生を抑制することができ、かつ回路接続体を製造に用いた場合に優れた接続信頼性が得られることが確認された。 From the above, according to the present invention, for example, it can be attached to the FPC substrate side, the occurrence of blocking can be suppressed, and excellent connection reliability can be obtained when the circuit connector is used for manufacturing. Was confirmed.

1,11,26…接着剤フィルム、2…第1の非導電性接着剤層、3…導電性接着剤層、4…第2の非導電性接着剤層、5…導電性粒子、21…接着剤フィルム用リール、22…巻芯、24,24A,24B…接着剤テープ、25…基材、R…導電性領域、R1…第1の非導電性領域、R2…第2の非導電性領域。 1,11,26 ... Adhesive film, 2 ... First non-conductive adhesive layer, 3 ... Conductive adhesive layer, 4 ... Second non-conductive adhesive layer, 5 ... Conductive particles, 21 ... Adhesive film reel, 22 ... winding core, 24, 24A, 24B ... adhesive tape, 25 ... substrate, R ... conductive region, R1 ... first non-conductive region, R2 ... second non-conductive region region.

Claims (7)

テープ状の基材と、
前記基材の一方面上に設けられた接着剤フィルムと、を備える接着剤テープであって、
前記接着剤フィルムが、前記基材側から、第1の非導電性接着剤層と、導電性粒子を含有する導電性接着剤層と、第2の非導電性接着剤層とをこの順に積層させてなり、
前記基材が前記接着剤フィルムの前記第1の非導電性接着剤層側のみに設けられ、
前記第1の非導電性接着剤層の厚みT1と前記導電性接着剤層の厚みTとが下記式(1)を満たし、
前記T1と前記第2の非導電性接着剤層の厚みT2とが下記式(3A)を満たす、接着剤テープ。
T1<T …(1)
T1≦0.5×T2 …(3A)
With a tape-shaped base material,
An adhesive tape comprising an adhesive film provided on one surface of the substrate.
The adhesive film laminates a first non-conductive adhesive layer, a conductive adhesive layer containing conductive particles, and a second non-conductive adhesive layer in this order from the base material side. Let me
The base material is provided only on the first non-conductive adhesive layer side of the adhesive film.
The thickness T1 of the first non-conductive adhesive layer and the thickness T of the conductive adhesive layer satisfy the following formula (1).
An adhesive tape in which the T1 and the thickness T2 of the second non-conductive adhesive layer satisfy the following formula (3A).
T1 <T ... (1)
T1 ≤ 0.5 × T2 ... (3A)
前記T1と前記導電性粒子の平均粒径rとが下記式(2)を満たす、請求項1に記載の接着剤テープ。
T1≦0.8×r …(2)
The adhesive tape according to claim 1, wherein the T1 and the average particle size r of the conductive particles satisfy the following formula (2).
T1 ≤ 0.8 × r ... (2)
テープ状の基材と、
前記基材の一方面上に設けられた接着剤フィルムと、を備える接着剤テープであって、
前記接着剤フィルムが、導電性粒子を含有する接着剤フィルムであり、
前記接着剤フィルムが、前記基材側から、前記導電性粒子が存在しない第1の非導電性領域と、前記導電性粒子が存在する導電性領域と、前記導電性粒子が存在しない第2の非導電性領域とを、前記接着剤フィルムの厚み方向にこの順に備え、
前記基材が前記接着剤フィルムの前記第1の非導電性領域側のみに設けられ、
前記第1の非導電性領域の前記接着剤フィルムの厚み方向の長さL1と、前記導電性領域の前記接着剤フィルムの厚み方向の長さLとが下記式(4)を満たし、
前記L1と、前記第2の非導電性領域の前記接着剤フィルムの厚み方向の長さL2とが下記式(6A)を満たす、接着剤テープ。
L1<L …(4)
L1≦0.5×L2 …(6A)
With a tape-shaped base material,
An adhesive tape comprising an adhesive film provided on one surface of the substrate.
The adhesive film is an adhesive film containing conductive particles.
From the base material side, the adhesive film has a first non-conductive region in which the conductive particles do not exist, a conductive region in which the conductive particles exist, and a second region in which the conductive particles do not exist. Non-conductive regions are provided in this order in the thickness direction of the adhesive film.
The base material is provided only on the first non-conductive region side of the adhesive film.
The length L1 in the thickness direction of the adhesive film in the first non-conductive region and the length L in the thickness direction of the adhesive film in the conductive region satisfy the following formula (4).
An adhesive tape in which the L1 and the length L2 in the thickness direction of the adhesive film in the second non-conductive region satisfy the following formula (6A).
L1 <L ... (4)
L1 ≦ 0.5 × L2… (6A)
前記L1と前記導電性粒子の平均粒径rとが下記式(5)を満たす、請求項に記載の接着剤テープ。
L1≦0.8×r …(5)
The adhesive tape according to claim 3 , wherein the L1 and the average particle size r of the conductive particles satisfy the following formula (5).
L1 ≤ 0.8 × r ... (5)
請求項1〜のいずれか一項に記載の接着剤テープと、
前記接着剤テープが巻かれた巻芯と、を備える接着剤フィルム用リール。
The adhesive tape according to any one of claims 1 to 4,
An adhesive film reel comprising a winding core around which the adhesive tape is wound.
テープ状の基材と、
前記基材の一方面上に設けられた接着剤フィルムと、を備える接着剤テープの製造方法であって、
前記基材の一方面上に、第1の非導電性接着剤層と、導電性粒子を含有する導電性接着剤層と、第2の非導電性接着剤層とをこの順に積層して前記接着剤フィルムを得る工程を備え、
前記接着剤テープにおいて、前記基材が前記接着剤フィルムの前記第1の非導電性接着剤層側のみに設けられ、
前記第1の非導電性接着剤層の厚みT1と前記導電性接着剤層の厚みTとが下記式(1)を満たし、
前記T1と前記第2の非導電性接着剤層の厚みT2とが下記式(3A)を満たす、接着剤テープの製造方法。
T1<T …(1)
T1≦0.5×T2 …(3A)
With a tape-shaped base material,
A method for manufacturing an adhesive tape comprising an adhesive film provided on one surface of the base material.
The first non-conductive adhesive layer, the conductive adhesive layer containing conductive particles, and the second non-conductive adhesive layer are laminated in this order on one surface of the base material. With the process of obtaining an adhesive film,
In the adhesive tape, the base material is provided only on the first non-conductive adhesive layer side of the adhesive film.
The thickness T1 of the first non-conductive adhesive layer and the thickness T of the conductive adhesive layer satisfy the following formula (1).
A method for producing an adhesive tape, wherein the T1 and the thickness T2 of the second non-conductive adhesive layer satisfy the following formula (3A).
T1 <T ... (1)
T1 ≤ 0.5 × T2 ... (3A)
前記T1と前記導電性粒子の平均粒径rとが下記式(2)を満たす、請求項に記載の接着剤テープの製造方法。
T1≦0.8×r …(2)
The method for producing an adhesive tape according to claim 6 , wherein the T1 and the average particle size r of the conductive particles satisfy the following formula (2).
T1 ≤ 0.8 × r ... (2)
JP2017564179A 2016-01-29 2017-01-17 Adhesive film and its manufacturing method, adhesive tape, and reel for adhesive film Active JP6988482B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016015470 2016-01-29
JP2016015470 2016-01-29
PCT/JP2017/001366 WO2017130789A1 (en) 2016-01-29 2017-01-17 Adhesive film, production process therefor, adhesive tape, and reel for adhesive film

Publications (2)

Publication Number Publication Date
JPWO2017130789A1 JPWO2017130789A1 (en) 2018-11-22
JP6988482B2 true JP6988482B2 (en) 2022-01-05

Family

ID=59397691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017564179A Active JP6988482B2 (en) 2016-01-29 2017-01-17 Adhesive film and its manufacturing method, adhesive tape, and reel for adhesive film

Country Status (5)

Country Link
JP (1) JP6988482B2 (en)
KR (1) KR20180111858A (en)
CN (3) CN114196334A (en)
TW (1) TWI750149B (en)
WO (1) WO2017130789A1 (en)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60218628A (en) * 1984-04-13 1985-11-01 Sharp Corp Connecting method of liquid crystal display element electrode
JP5196703B2 (en) * 2004-01-15 2013-05-15 デクセリアルズ株式会社 Adhesive film
KR101090561B1 (en) * 2006-04-12 2011-12-08 히다치 가세고교 가부시끼가이샤 Circuit connecting adhesive film, circuit member connecting structure and circuit member connecting method
JP2011003924A (en) * 2006-08-25 2011-01-06 Hitachi Chem Co Ltd Circuit connecting material, connection structure for circuit member using the same, and method for production thereof
EP2222146A1 (en) * 2007-12-17 2010-08-25 Hitachi Chemical Company, Ltd. Circuit connecting material and structure for connecting circuit member
JP2009194359A (en) * 2008-01-16 2009-08-27 Hitachi Chem Co Ltd Adhesive film for circuit connection, and connection structure of circuit member and method of connecting circuit member using the same
CN102017816A (en) * 2008-04-28 2011-04-13 日立化成工业株式会社 Circuit connecting material, film-like adhesive, adhesive reel, and circuit connecting structural body
CN104403589B (en) * 2010-03-12 2017-01-11 日立化成株式会社 Adhesive reel
KR101659128B1 (en) * 2013-09-30 2016-09-22 제일모직주식회사 Anisotropic conductive film and the semiconductor device using thereof
KR101628440B1 (en) * 2013-10-31 2016-06-08 제일모직주식회사 Anisotropic conductive film and the semiconductor device using thereof
JP6297381B2 (en) * 2014-03-26 2018-03-20 デクセリアルズ株式会社 Method for manufacturing adhesive film, film winding body, and connection body

Also Published As

Publication number Publication date
CN108603078A (en) 2018-09-28
KR20180111858A (en) 2018-10-11
WO2017130789A1 (en) 2017-08-03
TW201739864A (en) 2017-11-16
CN114196334A (en) 2022-03-18
JPWO2017130789A1 (en) 2018-11-22
CN114262577A (en) 2022-04-01
TWI750149B (en) 2021-12-21

Similar Documents

Publication Publication Date Title
JP4421161B2 (en) Wiring connecting material and wiring board manufacturing method using the same
KR101025128B1 (en) Adhesive composition, and connection structure for circuit member
JP4985700B2 (en) Adhesive reel
JP5509542B2 (en) Wiring member connection structure and wiring member connection method
WO2010110094A1 (en) Adhesive material reel
WO2010098354A1 (en) Adhesive material reel
KR102517498B1 (en) Conductive material and manufacturing method of connection body
KR101551758B1 (en) Composition for use of an anisotropic conductive film and an anisotropic conductive film thereof
JP6988482B2 (en) Adhesive film and its manufacturing method, adhesive tape, and reel for adhesive film
JP4605184B2 (en) Wiring connecting material and wiring board manufacturing method using the same
JP2008303067A (en) Adhesive reel and circuit connector manufacturing method using it
JP5024117B2 (en) Circuit member mounting method
JP4513147B2 (en) Circuit connection method
WO2015093362A1 (en) Mounting body manufacturing method and anisotropic conductive film
KR100961589B1 (en) Adhesive rill and circuit connector manufacturing method using the same
KR20140049976A (en) Tape for connecting circuits, reel of adhesive, use of laminated tape as circuit connecting material, use of laminated tape for manufacture of circuit connecting material, and method for manufacturing circuit-connected body
JP2009004354A (en) Adhesive reel and method of manufacturing circuit connector using the same
JP3783791B2 (en) Connection member and electrode connection structure and connection method using the connection member
JP2010212706A (en) Circuit connecting material and method of manufacturing circuit board using the same, and circuit board
JP2009038347A (en) Method of mounting circuit member
JP2009135093A (en) Anisotropic conductive film, reel for anisotropic conductive film, anisotropic conductive film roll, and connection structure of circuit member

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20191217

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210224

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20210419

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210604

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210817

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20211013

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20211102

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20211115

R151 Written notification of patent or utility model registration

Ref document number: 6988482

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350