JP6909776B2 - 結晶格子内の空孔を捕捉する方法 - Google Patents
結晶格子内の空孔を捕捉する方法 Download PDFInfo
- Publication number
- JP6909776B2 JP6909776B2 JP2018500316A JP2018500316A JP6909776B2 JP 6909776 B2 JP6909776 B2 JP 6909776B2 JP 2018500316 A JP2018500316 A JP 2018500316A JP 2018500316 A JP2018500316 A JP 2018500316A JP 6909776 B2 JP6909776 B2 JP 6909776B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- crystal lattice
- lattice
- laser
- modifying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/04—After-treatment of single crystals or homogeneous polycrystalline material with defined structure using electric or magnetic fields or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/65—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials
- H10P14/6516—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials
- H10P14/6536—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials by exposure to radiation, e.g. visible light
- H10P14/6542—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials by exposure to radiation, e.g. visible light by using coherent radiation, e.g. using a laser
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
- C01B32/28—After-treatment, e.g. purification, irradiation, separation or recovery
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/10—Heating of the reaction chamber or the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/02—Heat treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1511677.5 | 2015-07-03 | ||
| GB1511677.5A GB2540537A (en) | 2015-07-03 | 2015-07-03 | Crystal defects |
| PCT/GB2016/052004 WO2017006092A1 (en) | 2015-07-03 | 2016-07-01 | Method for trapping vacancies in a crystal lattice |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018520085A JP2018520085A (ja) | 2018-07-26 |
| JP2018520085A5 JP2018520085A5 (enExample) | 2019-03-14 |
| JP6909776B2 true JP6909776B2 (ja) | 2021-07-28 |
Family
ID=54013442
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018500316A Active JP6909776B2 (ja) | 2015-07-03 | 2016-07-01 | 結晶格子内の空孔を捕捉する方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10934635B2 (enExample) |
| EP (1) | EP3317439A1 (enExample) |
| JP (1) | JP6909776B2 (enExample) |
| KR (1) | KR102231517B1 (enExample) |
| GB (1) | GB2540537A (enExample) |
| WO (1) | WO2017006092A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB201712639D0 (en) * | 2017-08-07 | 2017-09-20 | Univ Oxford Innovation Ltd | Method for laser machining inside materials |
| US11559858B2 (en) | 2017-08-22 | 2023-01-24 | Diamtech Ltd. | System and method for creation of a predetermined structure from a diamond bulk |
| US12391553B2 (en) | 2017-09-18 | 2025-08-19 | The Trustees Of Princeton University | Synthetic engineered diamond materials with spin impurities and methods of making the same |
| GB201808367D0 (en) * | 2018-05-22 | 2018-07-11 | Univ Oxford Innovation Ltd | Laser writing of colour centres in crystals |
| EP3803746B1 (en) | 2018-06-02 | 2024-07-31 | Scarselli, Bruno | Asset identification, registration, tracking and commercialization apparatuses and methods |
| CN109384222B (zh) * | 2018-09-29 | 2020-08-07 | 河南省力量钻石股份有限公司 | 一种金刚石的提取方法 |
| GB2577928A (en) * | 2018-10-11 | 2020-04-15 | Univ Oxford Innovation Ltd | Laser method and apparatus for analysing crystals |
| RU2720100C1 (ru) * | 2019-03-26 | 2020-04-24 | Акционерная Компания "АЛРОСА" (публичное акционерное общество) (АК "АЛРОСА" (ПАО)) | Способ создания и детектирования оптически проницаемого изображения внутри алмаза и системы для детектирования (варианты) |
| DE102019205217A1 (de) * | 2019-04-11 | 2020-10-15 | Robert Bosch Gmbh | Verfahren zum Aufbringen einer Filterschicht auf einen Kristallkörper |
| IL307512B2 (en) | 2021-04-06 | 2025-01-01 | Bruno Scarselli | Property Verification System and Methods of Using It |
| FR3121926B1 (fr) * | 2021-04-19 | 2024-02-09 | Thales Sa | Procede de fabrication d'un dispositif comprenant un cristal de diamant |
| GB2620414A (en) * | 2022-07-06 | 2024-01-10 | Univ Warwick | A device |
| CN120395114A (zh) * | 2025-07-03 | 2025-08-01 | 浙江大学杭州国际科创中心 | 一种基于飞秒激光直写的碳化硅自旋缺陷制备方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0648892A (ja) * | 1992-07-30 | 1994-02-22 | Matsushita Electric Ind Co Ltd | ダイヤモンドの格子欠陥制御方法 |
| US7284396B2 (en) * | 2005-03-01 | 2007-10-23 | International Gemstone Registry Inc. | Method and system for laser marking in the volume of gemstones such as diamonds |
| EP1990313A1 (en) * | 2007-05-10 | 2008-11-12 | INSERM (Institut National de la Santé et de la Recherche Médicale) | Method to produce light-emitting nano-particles of diamond |
| US8138756B2 (en) * | 2009-04-24 | 2012-03-20 | Hewlett-Packard Development Company, L.P. | Microfiber magnetometer |
| US8455332B2 (en) * | 2009-05-01 | 2013-06-04 | Bridgelux, Inc. | Method and apparatus for manufacturing LED devices using laser scribing |
| WO2010149777A1 (en) * | 2009-06-26 | 2010-12-29 | Element Six Limited | Method for making fancy orange coloured single crystal cvd diamond and product obtained |
| WO2012100167A2 (en) * | 2011-01-21 | 2012-07-26 | President & Fellows Of Harvard College | Micro-and nano-fabrication of connected and disconnected metallic structures in three-dimensions using ultrafast laser pulses |
| GB201121642D0 (en) * | 2011-12-16 | 2012-01-25 | Element Six Ltd | Single crtstal cvd synthetic diamond material |
-
2015
- 2015-07-03 GB GB1511677.5A patent/GB2540537A/en not_active Withdrawn
-
2016
- 2016-07-01 EP EP16736600.4A patent/EP3317439A1/en active Pending
- 2016-07-01 WO PCT/GB2016/052004 patent/WO2017006092A1/en not_active Ceased
- 2016-07-01 JP JP2018500316A patent/JP6909776B2/ja active Active
- 2016-07-01 KR KR1020187003547A patent/KR102231517B1/ko active Active
- 2016-07-01 US US15/740,340 patent/US10934635B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20180026530A (ko) | 2018-03-12 |
| JP2018520085A (ja) | 2018-07-26 |
| GB201511677D0 (en) | 2015-08-19 |
| WO2017006092A1 (en) | 2017-01-12 |
| EP3317439A1 (en) | 2018-05-09 |
| US10934635B2 (en) | 2021-03-02 |
| GB2540537A (en) | 2017-01-25 |
| US20180187333A1 (en) | 2018-07-05 |
| KR102231517B1 (ko) | 2021-03-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6909776B2 (ja) | 結晶格子内の空孔を捕捉する方法 | |
| Bude et al. | High fluence laser damage precursors and their mitigation in fused silica | |
| US11414783B2 (en) | Laser writing for colour centres in crystals | |
| Chambonneau et al. | Competing nonlinear delocalization of light for laser inscription inside silicon with a 2-µ m picosecond laser | |
| JP4631044B2 (ja) | レーザ加工方法および装置 | |
| US7943533B2 (en) | Method for surface modification | |
| JP2018520085A5 (enExample) | ||
| JP2011514664A (ja) | パルスレーザ照射を介してドープされる材料の平坦面の工学 | |
| US20140138359A1 (en) | Method and system for damage reduction in optics using short pulse pre-exposure | |
| JP5002808B2 (ja) | レーザ加工装置及びレーザ加工方法 | |
| Hobbs et al. | Contamination resistant antireflection nano-textures in fused silica for laser optics | |
| KR20210024008A (ko) | 하나 이상의 투명 워크피스 및 블랙 매트릭스 층을 가진 기판 스택을 레이저 가공하는 방법 | |
| JP2020189777A (ja) | 空孔欠陥形成方法 | |
| KR20220110566A (ko) | 레이저 재료 가공을 위한 방법 및 레이저 가공 설비 | |
| JP2009541065A (ja) | フェムト秒レーザービームを用いてターゲットを加工するための方法及び装置 | |
| EP3789157B1 (de) | Verfahren zur behandlung einer festkörperoberfläche | |
| TW201444703A (zh) | 借助聚焦離子束的突出標記 | |
| Malshe et al. | Nano and microscale surface and sub-surface modifications induced in optical materials by femtosecond laser machining | |
| JP2005293735A (ja) | レーザ加工方法および装置 | |
| Nolte et al. | Light in Slices: How to Enable Precise Laser Processing? | |
| Wren Carr | Laser‐Induced Damage Mechanisms | |
| Gruzdev et al. | Photo-ionization and modification of nanoparticles on transparent substrates by ultrashort laser pulses | |
| Dresvyanskiy et al. | Synthesis and optical properties of lithium nanoparticles in wide-gap dielectrics | |
| Parrish | The Creation of Micropatterns through the Femtosecond Laser Ablation of Diamond Materials | |
| Day | Silicon Dioxide Planarization: Impacts on Optical Coatings for High Energy Laser |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190130 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190130 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200114 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20200414 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200707 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20201222 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210315 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210629 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210705 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6909776 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |