JP6892635B2 - 感光性無電解めっき下地剤 - Google Patents

感光性無電解めっき下地剤 Download PDF

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Publication number
JP6892635B2
JP6892635B2 JP2018504518A JP2018504518A JP6892635B2 JP 6892635 B2 JP6892635 B2 JP 6892635B2 JP 2018504518 A JP2018504518 A JP 2018504518A JP 2018504518 A JP2018504518 A JP 2018504518A JP 6892635 B2 JP6892635 B2 JP 6892635B2
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Japan
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group
base material
meth
acrylate
compound
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JP2018504518A
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English (en)
Japanese (ja)
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JPWO2017154913A1 (ja
Inventor
小島　圭介
圭介 小島
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Nissan Chemical Corp
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Nissan Chemical Corp
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Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of JPWO2017154913A1 publication Critical patent/JPWO2017154913A1/ja
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials For Photolithography (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP2018504518A 2016-03-09 2017-03-07 感光性無電解めっき下地剤 Active JP6892635B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016045545 2016-03-09
JP2016045545 2016-03-09
PCT/JP2017/009029 WO2017154913A1 (ja) 2016-03-09 2017-03-07 感光性無電解めっき下地剤

Publications (2)

Publication Number Publication Date
JPWO2017154913A1 JPWO2017154913A1 (ja) 2019-01-10
JP6892635B2 true JP6892635B2 (ja) 2021-06-23

Family

ID=59790583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018504518A Active JP6892635B2 (ja) 2016-03-09 2017-03-07 感光性無電解めっき下地剤

Country Status (3)

Country Link
JP (1) JP6892635B2 (zh)
TW (1) TWI723141B (zh)
WO (1) WO2017154913A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113195788A (zh) * 2018-12-21 2021-07-30 日产化学株式会社 包含高分子和金属微粒的非电解镀基底剂
JP7323884B1 (ja) 2022-08-08 2023-08-09 株式会社イオックス 感光性を持つ無電解めっき用塗料組成物、パターン形状の無電解めっき層を有するめっき物、及びパターン形状の無電解めっき層を有するめっき物の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5537805B2 (ja) * 2005-05-18 2014-07-02 コンダクティブ・インクジェット・テクノロジー・リミテッド 基板上での層の形成
KR102157192B1 (ko) * 2012-09-13 2020-09-18 닛산 가가쿠 가부시키가이샤 무전해 도금 하지제
JP6108079B2 (ja) * 2013-02-20 2017-04-05 日産化学工業株式会社 スクリーン印刷用触媒インク

Also Published As

Publication number Publication date
JPWO2017154913A1 (ja) 2019-01-10
TWI723141B (zh) 2021-04-01
WO2017154913A1 (ja) 2017-09-14
TW201800610A (zh) 2018-01-01

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