JP6882236B2 - 珪素含有化合物、ウレタン樹脂、伸縮性膜、及びその形成方法 - Google Patents
珪素含有化合物、ウレタン樹脂、伸縮性膜、及びその形成方法 Download PDFInfo
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- JP6882236B2 JP6882236B2 JP2018152714A JP2018152714A JP6882236B2 JP 6882236 B2 JP6882236 B2 JP 6882236B2 JP 2018152714 A JP2018152714 A JP 2018152714A JP 2018152714 A JP2018152714 A JP 2018152714A JP 6882236 B2 JP6882236 B2 JP 6882236B2
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Images
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Description
下記式(1)で示される化合物と、イソシアネート基を有する化合物とを混合し、該混合物を製膜し、加熱によって硬化させる伸縮性膜の形成方法を提供する。
下記式(6)で示される、末端に(メタ)アクリレート基を有する化合物を製膜し、加熱及び/又は光照射によって硬化させる伸縮性膜の形成方法を提供する。
下記式(1)で示される化合物と、イソシアネート基を有する化合物とを混合し、該混合物を製膜し、加熱によって硬化させる伸縮性膜の形成方法である。
本発明のウレタン樹脂の作製方法としては、特に限定されないが、上述した本発明の珪素含有化合物を原料とし、この珪素含有化合物とイソシアネート基を有する化合物(イソシアネート化合物)と反応させて作製することが好ましい。
本発明の伸縮性膜は、本発明のウレタン樹脂を含有した組成物の硬化物である。含有するウレタン樹脂としては、上記で説明したものを用いることができる。
本発明では、伸縮性膜を形成する方法であって、
下記式(1)で示される化合物と、イソシアネート基を有する化合物とを混合し、該混合物を製膜し、加熱によって硬化させる伸縮性膜の形成方法を提供する。
下記式(6)で示される、末端に(メタ)アクリレート基を有する化合物を製膜し、加熱及び/又は光照射によって硬化させる伸縮性膜の形成方法を提供する。
(プロパンジオール(1−II)の合成)
下記式(7)に記載の反応式に示す反応を行った。2L2口フラスコにTHF(テトラヒドロフラン)480mLと水素化アルミニウムリチウム(LAH)17.4gを仕込み、窒素雰囲気下、室温で撹拌、溶解させた後、氷浴を用いて溶液を冷却した。続いて、500mL2口フラスコにジアリルマロン酸ジエチル(1−I)49.6gとTHF275mLを仕込んだ後、カニューレを用いて水素化アルミニウムリチウム溶液に1時間かけて滴下した。滴下終了後に氷浴を除去し、室温で1時間撹拌を行った。TLCで原料の消失を確認した後、200mLのTHFで希釈し、氷冷下で17.4mLの水を加えて反応を停止した。続いて15wt%の水酸化ナトリウム水溶液17.4mLと水52.2mLを加え、室温で撹拌した。得られた白色懸濁液をセライト濾過した後、減圧濃縮することで以下の性質のプロパンジオール(1−II)を31.9g(収率99%)得た。
無色液体
1H−NMR(500MHz,CDCl3):δ=5.84(2H,m),5.11(2H,m),5.09(2H,m),3.58(4H,s),2.32(2H,brs),2.07(4H,d)
下記式(8)に記載の反応式に示す反応を行った。200mL4口フラスコにプロパンジオール(1−II)16.3gとPL−50N(白金触媒溶液、信越化学工業製)を0.06gS仕込み、窒素雰囲気下、オイルバスを用いて55℃まで昇温した。続いて、100mL滴下漏斗を用いてへプタメチルトリシロキサン44.5gを2時間半かけて滴下した。滴下終了後3時間撹拌を行った後、オイルバスを外して室温まで戻した。得られた茶色溶液を減圧蒸留することで、以下の性質の珪素含有化合物1(1−III)を45.3g(収率75%)得た。
無色液体
1H−NMR(500MHz,Acetone−d6):δ=0.02(6H,m),0.11(36H,m),0.46(4H,m),1.30(8H,s),3.45(2H,dd),3.46(2H,s),3.57(2H,dd)
(珪素含有化合物2〜4、比較シリコーンペンダントジオール化合物1の合成)
用いたシロキサン以外は、合成例1と同様の反応によって、珪素含有化合物2〜4、比較シリコーンペンダントジオール化合物1を合成した。
(シリコーンペンダントウレタン(メタ)アクリレート1〜7、比較ウレタン(メタ)アクリレート1の合成)
末端に(メタ)アクリレート基を有する化合物として配合したシリコーンペンダントウレタン(メタ)アクリレートを以下のように合成した。
光ラジカル発生剤1:4,4’−ジメトキシベンジル
光ラジカル発生剤2:2,2−ジメトキシ−2−フェニルアセトフェノン
光ラジカル発生剤3:(±)−カンファーキノン
熱ラジカル発生剤1:2,2’−アゾビス(2−メチルプロピオン酸)ジメチル
有機溶剤:プロピレングリコールモノメチルエーテルアセテート(PGMEA)
表1に記載の組成で、珪素含有化合物、イソシアネート化合物、ヒドロキシ化合物、触媒を混合、脱泡し、伸縮性膜形成用組成物(伸縮性膜材料1−1〜1−6、比較伸縮性膜材料1−1)を調製した。脱気後、ポリエチレン基板上に、伸縮性膜材料1−1〜1−6、比較伸縮性膜材料1−1をバーコート法で塗布し、窒素雰囲気下、130℃で20分間ベークして基板上に伸縮性膜(Film1−1〜1−6、比較Film1−1)を作製した。また、伸縮性膜形成用組成物におけるヒドロキシ基とイソシアネート基のモル数の比を表1に併せて示す。
表2に記載の組成で、末端に(メタ)アクリレート基を有する化合物、光ラジカル発生剤1〜3、熱ラジカル発生剤1を混合し、伸縮性膜形成用組成物(伸縮性膜材料2−1〜2−6、比較伸縮性膜材料2−1)を調製した。伸縮性膜材料2−1、2−4〜2−6と比較伸縮性膜材料2−1には、(メタ)アクリレート基を有するモノマーとして、イソボロニルアクリレートを混合した。ポリエチレン基板上に、調製した伸縮性膜形成用組成物をバーコート法で塗布し、伸縮性膜材料2−1〜2−5、比較伸縮性膜材料2−1の場合は、窒素雰囲気下1,000Wのキセノンランプで500mJ/cm2の光を照射して組成物塗布膜を硬化させ、伸縮性膜(Film2−1〜2−5、比較Film2−1)を作製した。伸縮性膜材料2−6の場合は、ポリエチレン基板上に、調製した伸縮性膜形成用組成物をバーコート法で塗布し、窒素雰囲気下で120℃、20分間ベークして伸縮性膜(Film2−6)を作製した。
硬化後の伸縮性膜における膜厚、及び表面の水の接触角を測定した。また、伸縮性膜表面の水の接触角を測定した後に、伸縮性膜を基板から剥がし、JIS K 6251に準じた方法で伸縮率と強度を測定した。結果を表3に示す。
5…粘着部、 6,6’…伸縮性膜、 7…基板、 8…布。
Claims (13)
- 請求項4から請求項6のいずれか一項に記載のウレタン樹脂を含有する組成物の硬化物であることを特徴とする伸縮性膜。
- 前記伸縮性膜が、JIS K 6251に規定される引っ張り試験で伸縮率が40〜1000%のものであることを特徴とする請求項7に記載の伸縮性膜。
- 前記伸縮性膜が、伸縮性を有する導電性配線に接触する膜として用いられるものであることを特徴とする請求項7又は請求項8に記載の伸縮性膜。
- 伸縮性膜を形成する方法であって、
下記式(6)で示される、末端に(メタ)アクリレート基を有する化合物を製膜し、加熱及び/又は光照射によって硬化させることを特徴とする伸縮性膜の形成方法。
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