JP6877948B2 - 酸化物を金属基材から除去する方法および装置 - Google Patents
酸化物を金属基材から除去する方法および装置 Download PDFInfo
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- JP6877948B2 JP6877948B2 JP2016205593A JP2016205593A JP6877948B2 JP 6877948 B2 JP6877948 B2 JP 6877948B2 JP 2016205593 A JP2016205593 A JP 2016205593A JP 2016205593 A JP2016205593 A JP 2016205593A JP 6877948 B2 JP6877948 B2 JP 6877948B2
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- boron trifluoride
- temperature
- metal substrate
- metal
- oxide
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- 239000000758 substrate Substances 0.000 title claims description 46
- 229910052751 metal Inorganic materials 0.000 title claims description 43
- 239000002184 metal Substances 0.000 title claims description 43
- 238000000034 method Methods 0.000 title claims description 20
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims description 66
- 229910015900 BF3 Inorganic materials 0.000 claims description 33
- 238000010438 heat treatment Methods 0.000 claims description 21
- 239000007789 gas Substances 0.000 claims description 18
- 229910000601 superalloy Inorganic materials 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 10
- 239000002243 precursor Substances 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 5
- -1 hexafluorosilicic acid Chemical compound 0.000 claims description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 10
- 229910052759 nickel Inorganic materials 0.000 description 8
- 229910017052 cobalt Inorganic materials 0.000 description 7
- 239000010941 cobalt Substances 0.000 description 7
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910000856 hastalloy Inorganic materials 0.000 description 2
- 229910001026 inconel Inorganic materials 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910001347 Stellite Inorganic materials 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- AHICWQREWHDHHF-UHFFFAOYSA-N chromium;cobalt;iron;manganese;methane;molybdenum;nickel;silicon;tungsten Chemical compound C.[Si].[Cr].[Mn].[Fe].[Co].[Ni].[Mo].[W] AHICWQREWHDHHF-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910001235 nimonic Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 229910001495 sodium tetrafluoroborate Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
[例]
以下の実施例は、クレームした本発明を実施する際に当業者にさらなるガイダンスを与えるために含まれる。これらの実施例は、添付の特許請求の範囲内で定められるような本発明の範囲を限定しない。
比較実施例1
約50ミクロンの厚さの酸化物層が表面上にある酸化されたNI基のGTD−222超合金基材は、管状炉内に置かれた。三フッ化ホウ素流は、アルゴン流と共に管状炉中に供給された。
実施例1
約50ミクロンの厚さの酸化物層が表面上にそれぞれある酸化されたNI基のGTD−111、GTD−222、GTD−444、またはRene−108超合金基材は、管状炉内に置かれた。三フッ化ホウ素流が、アルゴン流と共に管状炉中に供給された。
2 三フッ化ホウ素流を供給するステップ
3 金属基材を第1の温度で加熱するステップ
4 金属基材を第1の温度とは異なる第2の温度で加熱するステップ
Claims (9)
- 酸化物を金属基材から除去する方法であって、
三フッ化ホウ素流を供給するステップと、
三フッ化ホウ素の存在下で、前記金属基材を第1の温度で加熱するステップと、
三フッ化ホウ素の存在下で、前記金属基材を前記第1の温度とは異なる第2の温度で加熱するステップであって、前記第1の温度が300℃〜700℃の範囲内であり、前記第2の温度が750℃〜1150℃の範囲内である、ステップと、
処理表面を露出させるため、前記金属基材を酸及び/又は超音波で洗浄するステップと
を含む方法。 - 三フッ化ホウ素流を供給するステップが、前記酸化物とは別に位置する三フッ化ホウ素の前駆体から三フッ化ホウ素流を供給するステップを含む、請求項1に記載の方法。
- 三フッ化ホウ素流を供給するステップが、ガス貯蔵装置及び/又はガス輸送装置から三フッ化ホウ素流を供給するステップを含む、請求項1に記載の方法。
- 前記酸化物が、金属酸化物の混合物を含む、請求項1乃至請求項3のいずれか1項に記載の方法。
- 前記金属基材が、10wt%を超えるクロムを含有する合金を含む、請求項1乃至請求項4のいずれか1項に記載の方法。
- 前記酸化物が、金属基材の表面上にあるか、或いは金属基材の亀裂又は金属基材の穴の中にある、請求項1乃至請求項5のいずれか1項に記載の方法。
- 前記金属基材が超合金からなる、請求項1乃至請求項6のいずれか1項に記載の方法。
- 前記金属基材が、ガスタービン内のエーロフォイル部品を含む、請求項1乃至請求項7のいずれか1項に記載の方法。
- 前記酸が、塩化水素、ヘキサフルオロケイ酸、リン酸又はこれらの組合せを含む、請求項1乃至請求項8のいずれか1項に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510715694.1 | 2015-10-28 | ||
CN201510715694.1A CN106637267A (zh) | 2015-10-28 | 2015-10-28 | 用于从金属基材去除氧化物的方法和装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017101321A JP2017101321A (ja) | 2017-06-08 |
JP6877948B2 true JP6877948B2 (ja) | 2021-05-26 |
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016205593A Active JP6877948B2 (ja) | 2015-10-28 | 2016-10-20 | 酸化物を金属基材から除去する方法および装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9822456B2 (ja) |
EP (1) | EP3162910B1 (ja) |
JP (1) | JP6877948B2 (ja) |
CN (1) | CN106637267A (ja) |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB863051A (en) * | 1957-09-18 | 1961-03-15 | Aluminum Co Of America | Thermal treatment of articles composed of an aluminum base alloy |
FR2450286A1 (fr) * | 1979-02-27 | 1980-09-26 | Armines | Procede et dispositif de boruration de pieces en metal |
US4448847A (en) | 1982-05-28 | 1984-05-15 | Shell Oil Company | Process for improving steel-epoxy adhesion |
JP2501925B2 (ja) | 1989-12-22 | 1996-05-29 | 大同ほくさん株式会社 | 金属材の前処理方法 |
EP0408168B1 (en) | 1989-07-10 | 1994-06-08 | Daidousanso Co., Ltd. | Method of pretreating metallic works and method of nitriding steel |
JP2842712B2 (ja) * | 1990-11-30 | 1999-01-06 | 大同ほくさん株式会社 | めつき方法 |
US5685917A (en) | 1995-12-26 | 1997-11-11 | General Electric Company | Method for cleaning cracks and surfaces of airfoils |
US5843239A (en) | 1997-03-03 | 1998-12-01 | Applied Materials, Inc. | Two-step process for cleaning a substrate processing chamber |
CA2282771A1 (en) * | 1999-09-17 | 2001-03-17 | Dale William Mackenzie | Method and apparatus for boronizing a metal workpiece |
US6232241B1 (en) | 2000-04-11 | 2001-05-15 | Taiwan Semiconductor Manufacturing Company | Pre-oxidation cleaning method for reducing leakage current of ultra-thin gate oxide |
US6863738B2 (en) | 2001-01-29 | 2005-03-08 | General Electric Company | Method for removing oxides and coatings from a substrate |
CA2465195C (en) | 2003-04-28 | 2012-06-19 | Air Products And Chemicals, Inc. | Electrode assembly for the removal of surface oxides by electron attachment |
JP2005260356A (ja) | 2004-03-09 | 2005-09-22 | Fujitsu Ltd | 復調装置及び復調方法 |
US20080245845A1 (en) | 2007-04-04 | 2008-10-09 | Lawrence Bernard Kool | Brazing formulation and method of making the same |
US20110120972A1 (en) | 2009-11-20 | 2011-05-26 | Meyer Tool, Inc. | Replacement process for fluoride ion cleaning |
US9061375B2 (en) | 2009-12-23 | 2015-06-23 | General Electric Company | Methods for treating superalloy articles, and related repair processes |
-
2015
- 2015-10-28 CN CN201510715694.1A patent/CN106637267A/zh active Pending
-
2016
- 2016-10-20 JP JP2016205593A patent/JP6877948B2/ja active Active
- 2016-10-25 US US15/333,872 patent/US9822456B2/en active Active
- 2016-10-26 EP EP16195818.6A patent/EP3162910B1/en active Active
Also Published As
Publication number | Publication date |
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EP3162910A1 (en) | 2017-05-03 |
US20170121829A1 (en) | 2017-05-04 |
JP2017101321A (ja) | 2017-06-08 |
CN106637267A (zh) | 2017-05-10 |
EP3162910B1 (en) | 2020-08-05 |
US9822456B2 (en) | 2017-11-21 |
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