JP6814195B2 - 特にマイクロリソグラフィ投影露光装置用のミラー - Google Patents

特にマイクロリソグラフィ投影露光装置用のミラー Download PDF

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Publication number
JP6814195B2
JP6814195B2 JP2018501301A JP2018501301A JP6814195B2 JP 6814195 B2 JP6814195 B2 JP 6814195B2 JP 2018501301 A JP2018501301 A JP 2018501301A JP 2018501301 A JP2018501301 A JP 2018501301A JP 6814195 B2 JP6814195 B2 JP 6814195B2
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Japan
Prior art keywords
optical system
mirror
layer
protective layer
projection exposure
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JP2018501301A
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Japanese (ja)
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JP2018522281A5 (enExample
JP2018522281A (ja
Inventor
ディール オリバー
ディール オリバー
ハイド ケルスティン
ハイド ケルスティン
エンキッシュ ハルトムット
エンキッシュ ハルトムット
カリスキー マトゥス
カリスキー マトゥス
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2018501301A 2015-07-15 2016-07-07 特にマイクロリソグラフィ投影露光装置用のミラー Active JP6814195B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015213253.6A DE102015213253A1 (de) 2015-07-15 2015-07-15 Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102015213253.6 2015-07-15
PCT/EP2016/066178 WO2017009185A1 (de) 2015-07-15 2016-07-07 Spiegel, insbesondere für eine mikrolithographische projektionsbelichtungsanlage

Publications (3)

Publication Number Publication Date
JP2018522281A JP2018522281A (ja) 2018-08-09
JP2018522281A5 JP2018522281A5 (enExample) 2019-08-15
JP6814195B2 true JP6814195B2 (ja) 2021-01-13

Family

ID=56497732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018501301A Active JP6814195B2 (ja) 2015-07-15 2016-07-07 特にマイクロリソグラフィ投影露光装置用のミラー

Country Status (5)

Country Link
US (1) US10331048B2 (enExample)
EP (1) EP3323022A1 (enExample)
JP (1) JP6814195B2 (enExample)
DE (1) DE102015213253A1 (enExample)
WO (1) WO2017009185A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017200667A1 (de) 2017-01-17 2018-07-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage oder ein Inspektionssystem
EP3454119B1 (en) 2017-09-09 2023-12-27 IMEC vzw Euv absorbing alloys

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5086443A (en) * 1990-08-03 1992-02-04 The United States Of America As Represented By The United States Department Of Energy Background-reducing x-ray multilayer mirror
EP1333323A3 (en) * 2002-02-01 2004-10-06 Nikon Corporation Self-cleaning reflective optical elements for use in x-ray optical systems, and optical systems and microlithography systems comprising same
JP2007329368A (ja) * 2006-06-09 2007-12-20 Canon Inc 多層膜ミラー、評価方法、露光装置及びデバイス製造方法
WO2008065821A1 (en) * 2006-11-27 2008-06-05 Nikon Corporation Optical element, exposure unit utilizing the same and process for device production
EP2155932A2 (de) * 2007-05-31 2010-02-24 Carl Zeiss SMT AG Verfahren zur herstellung eines optischen elementes mit hilfe von abformung, optisches element hergestellt nach diesem verfahren, kollektor und beleuchtungssystem
NL2003299A (en) * 2008-08-28 2010-03-11 Asml Netherlands Bv Spectral purity filter and lithographic apparatus.
DE102009032779A1 (de) 2009-07-10 2011-01-13 Carl Zeiss Smt Ag Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
EP2463693A3 (de) * 2009-07-15 2013-02-20 Carl Zeiss SMT GmbH Mikrospiegelanordnung mit Beschichtung sowie Verfahren zu deren Herstellung
DE102009033511A1 (de) 2009-07-15 2011-01-20 Carl Zeiss Smt Ag Mikrospiegelanordnung mit Anti-Reflexbeschichtung sowie Verfahren zu deren Herstellung
DE102009049640B4 (de) 2009-10-15 2012-05-31 Carl Zeiss Smt Gmbh Projektionsobjektiv für eine mikrolithographische EUV-Projektionsbelichtungsanlage
EP2513686B1 (en) 2009-12-15 2019-04-10 Carl Zeiss SMT GmbH Reflective optical element for euv lithography
DE102009054653A1 (de) 2009-12-15 2011-06-16 Carl Zeiss Smt Gmbh Spiegel für den EUV-Wellenlängenbereich, Substrat für einen solchen Spiegel, Verwendung einer Quarzschicht für ein solches Substrat, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel oder einem solchen Substrat und Projetktionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
SG183528A1 (en) * 2010-03-24 2012-10-30 Asml Netherlands Bv Lithographic apparatus and spectral purity filter
DE102011003357A1 (de) 2011-01-31 2012-08-02 Carl Zeiss Smt Gmbh Spiegel für den EUV-Wellenlängenbereich, Herstellungsverfahren für einen solchen Spiegel, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
DE102011075579A1 (de) * 2011-05-10 2012-11-15 Carl Zeiss Smt Gmbh Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel
DE102011084117A1 (de) * 2011-10-07 2013-04-11 Carl Zeiss Smt Gmbh Reflektives optisches Element für den EUV-Wellenlängenbereich, Verfahren zur Erzeugung und zur Korrektur eines solchen Elements, Projektionsobjektiv für die Mikrolithographie mit einem solchen Element und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
DE102011085358B3 (de) 2011-10-28 2012-07-12 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Konfigurieren einer solchen optischen Anordnung
DE102012202675A1 (de) 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
DE102013215541A1 (de) * 2013-08-07 2015-02-12 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102014219755A1 (de) * 2013-10-30 2015-04-30 Carl Zeiss Smt Gmbh Reflektives optisches Element
DE102014204660A1 (de) 2014-03-13 2015-09-17 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102015213249A1 (de) 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Spiegels, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
US10331048B2 (en) 2019-06-25
US20180217507A1 (en) 2018-08-02
EP3323022A1 (de) 2018-05-23
JP2018522281A (ja) 2018-08-09
WO2017009185A1 (de) 2017-01-19
DE102015213253A1 (de) 2017-01-19

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