JP6807659B2 - レシピセットの実行を同期化するためのシステム及び方法 - Google Patents

レシピセットの実行を同期化するためのシステム及び方法 Download PDF

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Publication number
JP6807659B2
JP6807659B2 JP2016109685A JP2016109685A JP6807659B2 JP 6807659 B2 JP6807659 B2 JP 6807659B2 JP 2016109685 A JP2016109685 A JP 2016109685A JP 2016109685 A JP2016109685 A JP 2016109685A JP 6807659 B2 JP6807659 B2 JP 6807659B2
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Japan
Prior art keywords
subsystem
controller
recipe
recipe set
execution
Prior art date
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Active
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JP2016109685A
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English (en)
Japanese (ja)
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JP2017037831A5 (zh
JP2017037831A (ja
Inventor
ジョン・シー．・バルコア・ジュニア
トニー・サン
ボストジャン・パスト
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Lam Research Corp
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Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from US14/974,915 external-priority patent/US9667303B2/en
Priority claimed from US15/148,414 external-priority patent/US10191466B2/en
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of JP2017037831A publication Critical patent/JP2017037831A/ja
Publication of JP2017037831A5 publication Critical patent/JP2017037831A5/ja
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    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L7/00—Arrangements for synchronising receiver with transmitter
    • H04L7/0008—Synchronisation information channels, e.g. clock distribution lines
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/4185—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by the network communication
    • G05B19/4186—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by the network communication by protocol, e.g. MAP, TOP
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Signal Processing (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Automation & Control Theory (AREA)
  • General Physics & Mathematics (AREA)
  • Quality & Reliability (AREA)
  • Manufacturing & Machinery (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
JP2016109685A 2015-06-05 2016-06-01 レシピセットの実行を同期化するためのシステム及び方法 Active JP6807659B2 (ja)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201562171941P 2015-06-05 2015-06-05
US62/171,941 2015-06-05
US14/974,915 US9667303B2 (en) 2015-01-28 2015-12-18 Dual push between a host computer system and an RF generator
US14/974,915 2015-12-18
US15/148,414 US10191466B2 (en) 2015-01-28 2016-05-06 Systems and methods for synchronizing execution of recipe sets
US15/148,414 2016-05-06

Publications (3)

Publication Number Publication Date
JP2017037831A JP2017037831A (ja) 2017-02-16
JP2017037831A5 JP2017037831A5 (zh) 2019-07-11
JP6807659B2 true JP6807659B2 (ja) 2021-01-06

Family

ID=57575464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016109685A Active JP6807659B2 (ja) 2015-06-05 2016-06-01 レシピセットの実行を同期化するためのシステム及び方法

Country Status (4)

Country Link
JP (1) JP6807659B2 (zh)
KR (2) KR102613970B1 (zh)
CN (1) CN106249701B (zh)
TW (1) TWI676357B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10217654B1 (en) * 2018-02-12 2019-02-26 Varian Semiconductor Equipment Associates, Inc. Embedded features for interlocks using additive manufacturing
WO2022072234A1 (en) * 2020-09-29 2022-04-07 Lam Research Corporation Synchronization of rf generators

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4570217A (en) * 1982-03-29 1986-02-11 Allen Bruce S Man machine interface
US7292906B2 (en) * 2004-07-14 2007-11-06 Tokyo Electron Limited Formula-based run-to-run control
US7477711B2 (en) * 2005-05-19 2009-01-13 Mks Instruments, Inc. Synchronous undersampling for high-frequency voltage and current measurements
KR20080040070A (ko) * 2006-11-02 2008-05-08 삼성전자주식회사 스퍼터링을 이용한 반도체 제조장치
US7838432B2 (en) * 2007-04-16 2010-11-23 Applied Materials, Inc. Etch process with controlled critical dimension shrink
KR20080105579A (ko) * 2007-05-31 2008-12-04 엘지전자 주식회사 플라즈마 디스플레이 장치
US7831315B2 (en) * 2007-08-21 2010-11-09 Asm Japan K.K. Method for controlling semiconductor-processing apparatus
CN101403913B (zh) * 2007-09-21 2013-07-24 费舍-柔斯芒特系统股份有限公司 实时批执行程序环境中的联机配方同步
EP2081034B1 (en) * 2008-01-16 2014-03-12 ISMECA Semiconductor Holding SA Arrangement and method for handling electronic components
EP2233387A1 (en) * 2009-03-24 2010-09-29 Disney Enterprises, Inc. Systems and methods for tracking and balancing robots for imitating motion capture data
US8331865B2 (en) * 2009-11-18 2012-12-11 Motorola Solutions, Inc. High speed minimal interference adaptive tranceiver interface and method thereof
US20110222561A1 (en) * 2010-03-11 2011-09-15 General Electric Company Systems and methods for providing time synchronization
US10031531B2 (en) * 2011-02-25 2018-07-24 Mks Instruments, Inc. System for and method of multiple channel fast pulse gas delivery
US10126760B2 (en) * 2011-02-25 2018-11-13 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US8692467B2 (en) * 2011-07-06 2014-04-08 Lam Research Corporation Synchronized and shortened master-slave RF pulsing in a plasma processing chamber
GB2499816A (en) * 2012-02-29 2013-09-04 Oxford Instr Nanotechnology Tools Ltd Controlling deposition and etching in a chamber with fine time control of parameters and gas flow
US9312106B2 (en) * 2013-03-13 2016-04-12 Applied Materials, Inc. Digital phase controller for two-phase operation of a plasma reactor

Also Published As

Publication number Publication date
JP2017037831A (ja) 2017-02-16
TWI676357B (zh) 2019-11-01
CN106249701B (zh) 2020-03-17
CN106249701A (zh) 2016-12-21
KR20230171417A (ko) 2023-12-20
TW201731218A (zh) 2017-09-01
KR102613970B1 (ko) 2023-12-13
KR20160143539A (ko) 2016-12-14

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