JP6788687B2 - Board detector - Google Patents

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JP6788687B2
JP6788687B2 JP2018555358A JP2018555358A JP6788687B2 JP 6788687 B2 JP6788687 B2 JP 6788687B2 JP 2018555358 A JP2018555358 A JP 2018555358A JP 2018555358 A JP2018555358 A JP 2018555358A JP 6788687 B2 JP6788687 B2 JP 6788687B2
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JPWO2018105031A1 (en
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ヒエウ ギヤ グエン
ヒエウ ギヤ グエン
朗 原
朗 原
伊藤 太郎
太郎 伊藤
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01VGEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
    • G01V8/00Prospecting or detecting by optical means
    • G01V8/10Detecting, e.g. by using light barriers
    • G01V8/12Detecting, e.g. by using light barriers using one transmitter and one receiver
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere

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Description

本発明は、機内の搬送路に沿って基板を搬送する基板生産機に設けられた基板検出装置に関する。 The present invention relates to a substrate detection device provided in a substrate production machine that conveys a substrate along an in-machine transport path.

多数の電子部品が実装された基板を生産する基板生産機として、半田印刷機、電子部品装着機、リフロー機、基板検査機などがある。これらの基板生産機を連結して基板生産ラインを構築することが一般的になっている。各基板生産機は、基板検出装置を備えて、搬送路における基板の搬送状況を確認する。基板検出装置として、検出光を用いる方式が多用されている。すなわち、基板検出装置は、搬送路の特定位置に向かって検出光を投光し、検出光が基板によって遮られ、または反射されることから基板の存在を判定する。この種の基板検出装置の一技術例が特許文献1に開示されている。 As a board production machine that produces a board on which a large number of electronic components are mounted, there are a solder printing machine, an electronic component mounting machine, a reflow machine, a board inspection machine, and the like. It has become common to connect these board production machines to construct a board production line. Each substrate production machine is equipped with a substrate detection device to check the transfer status of the substrate in the transfer path. As a substrate detection device, a method using detection light is often used. That is, the substrate detection device projects the detection light toward a specific position on the transport path, and determines the presence of the substrate from the fact that the detection light is blocked or reflected by the substrate. A technical example of this type of substrate detection device is disclosed in Patent Document 1.

特許文献1の基板割れ検出装置は、搬送される基板に対して光を照射する照射手段と、受光手段と、受光状態に基づいて信号を出力する信号出力手段と、信号に基づき基板の存在に加えて基板の割れも検知する手段とを有し、信号出力手段は、基板の割れに相当するよりも大きな時間幅の信号を出力する。これによれば、基板に割れがある場合に、受光状態が基板有りの状態から無しの状態に変化し、かつ大きな時間幅の信号が出力されるので、確実に割れが検知される、とされている。 The substrate crack detection device of Patent Document 1 includes an irradiation means for irradiating a conveyed substrate with light, a light receiving means, a signal output means for outputting a signal based on the light receiving state, and the presence of the substrate based on the signal. In addition, it has a means for detecting cracks in the substrate, and the signal output means outputs a signal having a time width larger than that corresponding to the cracks in the substrate. According to this, when the substrate is cracked, the light receiving state changes from the state with the substrate to the state without the substrate, and a signal with a large time width is output, so that the crack is reliably detected. ing.

特開2007−225323号公報JP-A-2007-225323

ところで、特許文献1の照射手段に例示される投光部は、電源投入の直後や一時的な動作中断によって温度が上下動し、これに伴って投光量が時間的に変動する。そのため、基板生産機で基板の生産を続けていると、基板の存在を判定する一定の閾光量に対し、投光量に依存する受光量が変動して、誤判定を引き起こす場合が生じ得る。その結果、基板の搬送異常と判定されて、基板の生産が停止してしまう。 By the way, the temperature of the light projecting unit exemplified by the irradiation means of Patent Document 1 fluctuates up and down immediately after the power is turned on or due to a temporary interruption of operation, and the light projecting amount fluctuates with time. Therefore, if the substrate production machine continues to produce the substrate, the amount of received light depending on the amount of projected light may fluctuate with respect to a certain amount of threshold light for determining the existence of the substrate, which may cause an erroneous determination. As a result, it is determined that the transfer of the substrate is abnormal, and the production of the substrate is stopped.

搬送異常を防止するために、従来技術では、一定時間間隔で搬送路に基板が存在しない状態を確保し、そのときの受光部の受光量を求めて閾光量を再設定する。しかしながら、この再設定は、基板の搬入を一時的に停止する動作中断を必要とする。さらに、従来技術では、基板生産機が動作を継続して投光部の温度および投光量が安定していても、不要な動作中断および閾光量の再設定を行っていた。このような動作中断により、基板生産機の生産効率が低下する。 In order to prevent a transport abnormality, in the prior art, a state in which the substrate does not exist in the transport path is ensured at regular time intervals, and the light receiving amount of the light receiving portion at that time is obtained and the threshold light amount is reset. However, this resetting requires an operation interruption to temporarily stop the loading of the substrate. Further, in the prior art, even if the substrate production machine continues to operate and the temperature and the amount of the light projecting are stable, the operation is interrupted unnecessarily and the amount of the threshold light is reset. Due to such an operation interruption, the production efficiency of the substrate production machine is lowered.

本発明は、上記背景技術の問題点に鑑みてなされたものであり、基板生産機の動作を妨げることなく閾光量の設定を行って、生産効率を低下させない基板検出装置を提供することを解決すべき課題とする。 The present invention has been made in view of the above-mentioned problems of the background technology, and has solved the problem of providing a substrate detection device that does not reduce the production efficiency by setting the threshold light amount without interfering with the operation of the substrate production machine. It is an issue to be done.

本明細書で開示する基板検出装置は、基板の搬送用の搬送路であって、前記基板に作業を行う基板生産機に設けられた前記搬送路の特定位置に臨んで配置され、前記特定位置に向かって検出光を投光する投光部と、前記特定位置に臨んで配置され、前記検出光を受光して受光量を求める受光部と、前記基板生産機が動作している動作時間帯の一部分であって、前記特定位置に前記基板が存在し得ない不在時間帯、および前記動作時間帯から前記不在時間帯を除外した判定時間帯を把握する時間帯把握部と、前記不在時間帯に求められた前記受光量に基づいて、前記特定位置に前記基板が存在するか否かを判定する閾光量を設定し、前記判定時間帯に前記閾光量を設定しない設定部と、前記判定時間帯に求められた前記受光量を前記閾光量と比較して、前記特定位置に前記基板が存在するか否かを判定し、前記不在時間帯に前記基板が存在するか否かを判定しない判定部と、を備え、前記特定位置は、前記搬送路の入口であり、前記不在時間帯は、前記判定部の判定結果が「前記基板が存在する」から「前記基板が存在しない」に変化した第1の前記基板の搬入終了時点から、第1の前記基板への前記作業に要する所定長さの既知の作業時間が経過するまでの時間帯、または、前記搬入終了時点から、前記作業時間よりも短めの一定時間が経過するまでの時間帯である。
また、基板検出装置は、基板の搬送用の搬送路であって、前記基板に作業を行う基板生産機に設けられた前記搬送路の特定位置に臨んで配置され、前記特定位置に向かって検出光を投光する投光部と、前記特定位置に臨んで配置され、前記検出光を受光して受光量を求める受光部と、前記基板生産機が動作している動作時間帯の一部分であって、前記特定位置に前記基板が存在し得ない不在時間帯、および前記動作時間帯から前記不在時間帯を除外した判定時間帯を把握する時間帯把握部と、前記不在時間帯に求められた前記受光量に基づいて、前記特定位置に前記基板が存在するか否かを判定する閾光量を設定し、前記判定時間帯に前記閾光量を設定しない設定部と、前記判定時間帯に求められた前記受光量を前記閾光量と比較して、前記特定位置に前記基板が存在するか否かを判定し、前記不在時間帯に前記基板が存在するか否かを判定しない判定部と、を備え、前記特定位置は、前記搬送路の出口であり、前記不在時間帯は、前記判定部の判定結果が「前記基板が存在する」から「前記基板が存在しない」に変化した第3の前記基板の搬出終了時点から、第4の前記基板への前記作業に要する所定長さの既知の作業時間が経過するまでの時間帯、または、前記搬出終了時点から、前記作業時間よりも短めの一定時間が経過するまでの時間帯であってもよい。
The substrate detection device disclosed in the present specification is a transport path for transporting a substrate, and is arranged so as to face a specific position of the transport path provided in a substrate production machine that works on the substrate. A light projecting unit that projects detection light toward the substrate, a light receiving unit that is arranged facing the specific position and receives the detected light to obtain the amount of light received, and an operating time zone during which the substrate production machine is operating. A time zone grasping unit for grasping an absent time zone in which the substrate cannot exist at the specific position, a determination time zone excluding the absent time zone from the operating time zone, and the absent time zone. A setting unit that sets a threshold light amount for determining whether or not the substrate exists at the specific position based on the received light amount obtained in the determination time zone and does not set the threshold light amount in the determination time zone, and the determination time. The amount of received light obtained in the band is compared with the amount of threshold light to determine whether or not the substrate exists at the specific position, and it is determined not to determine whether or not the substrate exists in the absence time zone. The specific position is the entrance of the transport path, and the determination result of the determination unit changes from "the substrate exists" to "the substrate does not exist" during the absence time zone. from the carry end of the first of said substrate, the time zone to a known working time predetermined length of required for the work to the first of said substrate has passed, or from the carry-end, when the work industry It is a time zone until a certain period of time, which is shorter than the interval, elapses.
Further, the substrate detection device is a transport path for transporting the substrate, and is arranged so as to face a specific position of the transport path provided in the substrate production machine that works on the substrate, and detects toward the specific position. A light projecting unit that emits light, a light receiving unit that is arranged facing the specific position and receives the detected light to obtain the amount of light received, and a part of an operating time zone in which the substrate production machine is operating. The time zone grasping unit for grasping the absence time zone in which the substrate cannot exist at the specific position and the determination time zone excluding the absence time zone from the operation time zone, and the absence time zone were obtained. Based on the received light amount, the threshold light amount for determining whether or not the substrate is present at the specific position is set, and the setting unit for not setting the threshold light amount in the determination time zone and the determination time zone are obtained. A determination unit that compares the amount of received light with the amount of threshold light, determines whether or not the substrate exists at the specific position, and does not determine whether or not the substrate exists during the absence time zone. The specific position is the exit of the transport path, and the third said in the absence time zone, the determination result of the determination unit changes from "the substrate exists" to "the substrate does not exist". short from the carry-out end of the substrate, the time zone to a known working time predetermined length of required for the working of the fourth of the substrate has passed, or, from the unloading end, than during the time of the operation industry It may be a time zone until a certain time elapses.

本明細書で開示する基板検出装置によれば、基板生産機が動作している動作時間帯の一部分であって搬送路の特定位置に基板が存在し得ない不在時間帯に、受光部の受光量を求めることができる。求めた受光量は、基板が存在しないと分かっているときの受光量であるので、この受光量に基づいて閾光量を適正に設定して、投光部の投光量の変動を補償できる。これにより、不在時間帯を除外した判定時間帯で、特定位置に基板が存在するか否かを正しく判定できる。かつ、基板生産機の動作を中断するのでなく、動作時間帯のうちの不在時間帯を利用して受光量を求めるので、基板生産機の動作を妨げることがなく、生産効率を低下させない。 According to the substrate detection device disclosed in the present specification, the light receiving portion of the light receiving unit receives light during the absence time zone in which the substrate cannot exist at a specific position of the transport path, which is a part of the operating time zone in which the substrate production machine is operating. The amount can be calculated. Since the obtained light receiving amount is the light receiving amount when it is known that the substrate does not exist, the threshold light amount can be appropriately set based on the light receiving amount to compensate for the fluctuation of the light emitting amount of the light emitting unit. As a result, it is possible to correctly determine whether or not the substrate exists at a specific position in the determination time zone excluding the absence time zone. Moreover, since the light receiving amount is obtained by using the absent time zone of the operating time zone without interrupting the operation of the substrate producing machine, the operation of the substrate producing machine is not hindered and the production efficiency is not lowered.

実施形態の基板検出装置が設けられる基板生産機の基板搬送装置の正面断面図である。It is a front sectional view of the substrate transfer apparatus of the substrate production machine provided with the substrate detection apparatus of embodiment. 基板搬送装置の側面断面図である。It is a side sectional view of the substrate transfer apparatus. 実施形態の基板検出装置の制御の構成を示すブロック図である。It is a block diagram which shows the control structure of the substrate detection apparatus of embodiment. 時間帯把握部および設定部の動作を説明するタイムチャートの図である。It is a figure of the time chart explaining the operation of the time zone grasping part and setting part. 設定部の演算処理および設定動作を含む基板検出装置の動作フロー図である。It is an operation flow diagram of the board detection apparatus which includes the arithmetic processing and setting operation of a setting part. 最も新しい閾光量を設定したときの受光量と比較して、今回の受光量が許容範囲の範囲内で変化した一例を示す棒グラフの図である。It is a figure of a bar graph which shows an example which the light-receiving amount this time changed within the permissible range as compared with the light-receiving amount when the latest threshold light amount was set. 最も新しい閾光量を設定したときの受光量と比較して、今回の受光量が許容範囲を超えて変化した一例を示す棒グラフの図である。It is a figure of a bar graph which shows an example which the received light amount of this time changed beyond the permissible range as compared with the received light amount when the latest threshold light amount was set. 図7で求められた新しい閾光量を示す棒グラフの図である。It is a figure of the bar graph which shows the new threshold light amount obtained in FIG. 7.

基板搬送装置9の構成および動作
実施形態の基板検出装置1について、図1〜図8を参考にして説明する。まず、基板検出装置1が設けられる基板生産機の基板搬送装置9について説明する。図1は、実施形態の基板検出装置1が設けられる基板生産機の基板搬送装置9の正面断面図である。さらに、図2は、基板搬送装置9の側面断面図である。基板Kの搬送方向は、図1では紙面の表側から裏側に向かい、図2では左方から右方に向かっている。基板搬送装置9は、基板生産機の代表例である電子部品装着機の機台99の上面に配設されており、他種の基板生産機に配設されてもよい。また、図3は、実施形態の基板検出装置1の制御の構成を示すブロック図である。図3には、基板検出装置1の一部となる基板搬送装置9の制御部2も示されている。
Configuration and Operation of the Substrate Transfer Device 9 The substrate detection device 1 of the embodiment will be described with reference to FIGS. 1 to 8. First, the substrate transfer device 9 of the substrate production machine provided with the substrate detection device 1 will be described. FIG. 1 is a front sectional view of a substrate transfer device 9 of a substrate production machine provided with the substrate detection device 1 of the embodiment. Further, FIG. 2 is a side sectional view of the substrate transfer device 9. The transport direction of the substrate K is from the front side to the back side of the paper surface in FIG. 1 and from the left side to the right side in FIG. The board transfer device 9 is arranged on the upper surface of the machine base 99 of the electronic component mounting machine, which is a typical example of the board producing machine, and may be arranged on another type of board producing machine. Further, FIG. 3 is a block diagram showing a control configuration of the substrate detection device 1 of the embodiment. FIG. 3 also shows a control unit 2 of the substrate transfer device 9 which is a part of the substrate detection device 1.

基板搬送装置9は、左右一対のガイドレール92およびコンベアベルト93、駆動モータ94、クランプ装置95、および制御部2などで構成される。図1に示されるように、立設された左右一対の支持板91の上側に、一対のガイドレール92が配設されている。一対のガイドレール92は、相互の離間距離が基板Kの幅に対応して設定される。この離間距離は、可変に調整されるようになっていてもよい。一対のガイドレール92の対向する内側に、搬送方向に延びるベルトガイド921が設けられている。各ガイドレール92に沿いつつベルトガイド921の上面に案内されるように、無端環状のコンベアベルト93が配設されている。コンベアベルト93の上面は、基板Kを搬送する搬送路3となる。 The substrate transfer device 9 includes a pair of left and right guide rails 92, a conveyor belt 93, a drive motor 94, a clamp device 95, a control unit 2, and the like. As shown in FIG. 1, a pair of guide rails 92 are arranged above the pair of left and right support plates 91 that are erected. The distance between the pair of guide rails 92 is set according to the width of the substrate K. This separation distance may be adjusted variably. A belt guide 921 extending in the transport direction is provided inside the pair of guide rails 92 so as to face each other. An endless annular conveyor belt 93 is arranged so as to be guided to the upper surface of the belt guide 921 along each guide rail 92. The upper surface of the conveyor belt 93 serves as a transport path 3 for transporting the substrate K.

図2に示されるように、コンベアベルト93は、前後一対の搬送ガイドプーリ922、前後一対の戻しプーリ923、方向変換プーリ924、駆動プーリ925、及びテンション付与プーリ926に巻装されている。駆動プーリ925は、スプライン軸927と一体回転されるように支持されている。スプライン軸927は、駆動モータ94から回転駆動される。テンション付与プーリ926は、コンベアベルト93に張力を付与して弛緩を防止する。これにより、コンベアベルト93は、輪転駆動され、その上面に基板Kを載置して搬送する。 As shown in FIG. 2, the conveyor belt 93 is wound around a pair of front and rear transfer guide pulleys 922, a pair of front and rear return pulleys 923, a direction changing pulley 924, a drive pulley 925, and a tension applying pulley 926. The drive pulley 925 is supported so as to be integrally rotated with the spline shaft 927. The spline shaft 927 is rotationally driven by the drive motor 94. The tension applying pulley 926 applies tension to the conveyor belt 93 to prevent it from loosening. As a result, the conveyor belt 93 is rotary-driven, and the substrate K is placed on the upper surface of the conveyor belt 93 and conveyed.

クランプ装置95は、複数の支持ピン951、台座952、および流体圧シリンダ96などで構成される。複数の支持ピン951は、搬送する基板Kの種類に対応して、適宜使用本数および配置が調整される。複数の支持ピン951は、矩形板状の台座952の上面に立設される。台座952は、複数のパイロットバー953により上下動可能に支持、および案内される。台座952は、流体圧シリンダ96によって、昇降駆動される。 The clamp device 95 is composed of a plurality of support pins 951, a pedestal 952, a fluid pressure cylinder 96, and the like. The number and arrangement of the plurality of support pins 951 are appropriately adjusted according to the type of the substrate K to be conveyed. The plurality of support pins 951 are erected on the upper surface of the rectangular plate-shaped pedestal 952. The pedestal 952 is supported and guided up and down by a plurality of pilot bars 953. The pedestal 952 is driven up and down by the fluid pressure cylinder 96.

図3に示されるように、制御部2は、搬送制御部21、および位置決め制御部22の機能を有する。搬送制御部21は、駆動モータ94の動作を制御する。位置決め制御部22は、流体圧シリンダ96の動作を制御する。後述するように、制御部2は、基板検出装置1の機能の一部を兼ねている。 As shown in FIG. 3, the control unit 2 has the functions of the transport control unit 21 and the positioning control unit 22. The transport control unit 21 controls the operation of the drive motor 94. The positioning control unit 22 controls the operation of the fluid pressure cylinder 96. As will be described later, the control unit 2 also serves as a part of the functions of the substrate detection device 1.

次に、基板搬送装置9の動作について説明する。搬送路3の入口31に基板Kが到着すると、搬送制御部21は、駆動モータ94を動作させる。これにより、コンベアベルト93が輪転し、基板Kは、搬送路3の略中央の装着実施位置32まで搬入される。次に、位置決め制御部22は、流体圧シリンダ96を上昇動作させる。これにより、台座952は上昇し、支持ピン951は基板Kを上方に押し上げる。基板Kは、ガイドレール92の上部から内向きに延びる押え部928と支持ピン951の間の高さKKに位置決めされる。 Next, the operation of the substrate transfer device 9 will be described. When the substrate K arrives at the inlet 31 of the transport path 3, the transport control unit 21 operates the drive motor 94. As a result, the conveyor belt 93 is rotated, and the substrate K is carried into the mounting execution position 32 at the substantially center of the transport path 3. Next, the positioning control unit 22 raises the fluid pressure cylinder 96. As a result, the pedestal 952 rises, and the support pin 951 pushes up the substrate K upward. The substrate K is positioned at a height KK between the presser portion 928 extending inward from the upper part of the guide rail 92 and the support pin 951.

次に、装着実施位置32の高さKKに位置決めされた基板Kに対して、電子部品の装着作業が行われる。装着作業が終了すると、位置決め制御部22は、流体圧シリンダ96を下降動作させる。これにより、台座952は下降し、基板Kは、コンベアベルト93の上面に戻される。次に、搬送制御部21は、駆動モータ94を動作させる。これにより、基板Kは、装着実施位置32から搬送路3の出口33を経由して、機外まで搬出される。なお、基板搬送装置9は、基板Kの搬出、および別の基板Kの搬入を同時に行うこともできる。 Next, the electronic component mounting work is performed on the substrate K positioned at the height KK of the mounting execution position 32. When the mounting work is completed, the positioning control unit 22 lowers the fluid pressure cylinder 96. As a result, the pedestal 952 is lowered, and the substrate K is returned to the upper surface of the conveyor belt 93. Next, the transport control unit 21 operates the drive motor 94. As a result, the substrate K is carried out of the machine from the mounting implementation position 32 via the outlet 33 of the transport path 3. The substrate transfer device 9 can also carry out the substrate K and carry in another substrate K at the same time.

実施形態の基板検出装置1の構成
実施形態の基板検出装置1の説明に移る。図3に示されるように、実施形態の基板検出装置1は、投光部4、受光部5、ならびに、制御部2の制御機能で実現された時間帯把握部23および設定部24などで構成されている。基板検出装置1は、搬送路3の特定位置で基板Kの存在を検出して、検出結果を基板Kの搬送制御に反映させるものである。本実施形態において、搬送路3の特定位置は、入口31および出口33に設定されており、これに限定されない。
Configuration of the Substrate Detection Device 1 of the Embodiment The description of the substrate detection device 1 of the embodiment moves to the description. As shown in FIG. 3, the substrate detection device 1 of the embodiment includes a light projecting unit 4, a light receiving unit 5, a time zone grasping unit 23 and a setting unit 24 realized by the control function of the control unit 2. Has been done. The substrate detection device 1 detects the presence of the substrate K at a specific position on the transfer path 3 and reflects the detection result in the transfer control of the substrate K. In the present embodiment, the specific positions of the transport path 3 are set at the inlet 31 and the outlet 33, and are not limited thereto.

図1および図2に示されるように、投光部4および受光部5は、搬送路3の入口31および出口33に臨んで二組設けられる。二つの投光部4は、図1の左側のガイドレール92に配置される。投光部4の点灯および消灯は、制御部2から制御される。投光部4は、電源投入の直後や一時的な動作中断によって温度が上下動し、これに伴って投光量が時間的に変動するという温度依存性をもつ。第一の投光部4は、入口31に向かって検出光Ldを投光する。第二の投光部4は、出口33に向かって検出光Ldを投光する。 As shown in FIGS. 1 and 2, two sets of the light emitting unit 4 and the light receiving unit 5 are provided facing the inlet 31 and the outlet 33 of the transport path 3. The two light projecting units 4 are arranged on the guide rail 92 on the left side of FIG. The lighting and extinguishing of the light projecting unit 4 is controlled by the control unit 2. The light projecting unit 4 has a temperature dependence that the temperature fluctuates up and down immediately after the power is turned on or due to a temporary interruption of operation, and the amount of light projected fluctuates with time. The first light projecting unit 4 projects the detection light Ld toward the inlet 31. The second light projecting unit 4 projects the detection light Ld toward the outlet 33.

二つの受光部5は、搬送路3の入口31および出口33を挟んで投光部4の反対側、すなわち図1の右側のガイドレール92に配置される。第一の受光部5は、第一の投光部4から入口31を通過して到来する検出光Ldを受光して受光量Rを求める。第二の受光部5は、第二の投光部4から出口33を通過して到来する検出光Ldを受光して受光量Rを求める。なお、検出光Ldは、可視光に限定されず、赤外線などの人に見えない光であってもよい。 The two light receiving units 5 are arranged on the opposite side of the light emitting unit 4, that is, the guide rail 92 on the right side of FIG. 1 with the inlet 31 and the outlet 33 of the transport path 3 interposed therebetween. The first light receiving unit 5 receives the detection light Ld arriving from the first light projecting unit 4 through the inlet 31, and obtains the light receiving amount R. The second light receiving unit 5 receives the detection light Ld arriving from the second light projecting unit 4 through the outlet 33 and obtains the light receiving amount R. The detection light Ld is not limited to visible light, and may be invisible light such as infrared light.

第一の投光部4からの検出光Ldは、入口31に基板Kが存在しない場合に、第一の受光部5に到達する。第一の投光部4からの検出光Ldは、入口31に基板Kが存在する場合に、基板Kによって少なくとも一部が遮られて第一の受光部5に到達しない。つまり、第一の受光部5の受光量Rが減少し、または無くなる。同様に、第二の投光部4からの検出光Ldは、出口33に基板Kが存在しない場合に、第二の受光部5に到達する。第二の投光部4からの検出光Ldは、出口33に基板Kが存在する場合に、基板Kによって少なくとも一部が遮られて第二の受光部5に到達しない。つまり、第二の受光部5の受光量Rが減少し、または無くなる。 The detected light Ld from the first light emitting unit 4 reaches the first light receiving unit 5 when the substrate K does not exist at the inlet 31. When the substrate K is present at the inlet 31, the detection light Ld from the first light projecting unit 4 is blocked at least partially by the substrate K and does not reach the first light receiving unit 5. That is, the light receiving amount R of the first light receiving unit 5 is reduced or eliminated. Similarly, the detected light Ld from the second light emitting unit 4 reaches the second light receiving unit 5 when the substrate K does not exist at the outlet 33. When the substrate K is present at the outlet 33, at least a part of the detected light Ld from the second light projecting unit 4 is blocked by the substrate K and does not reach the second light receiving unit 5. That is, the light receiving amount R of the second light receiving unit 5 is reduced or eliminated.

図3に示されるように、受光部5は、光電変換部51、閾光量記憶部52、判定部53、および出力部54を有する。光電変換部51は、入射した検出光Ldを光電変換して、受光量Rを表す電気信号を求める。閾光量記憶部52は、設定部24から設定された閾光量Sを記憶する。判定部53は、受光量Rを閾光量Sと大小比較して、判定結果Jを出力部54に送る。受光量Rが閾光量S未満のとき、判定結果Jは、「基板Kが存在する」を意味する「1」とされる。また、受光量Rが閾光量S以上のとき、判定結果Jは、「基板Kが存在しない」を意味する「0」とされる。出力部54は、受光量Rおよび判定結果Jを制御部2に出力する。受光量Rおよび判定結果Jの情報は、制御部2の内部で共有される。 As shown in FIG. 3, the light receiving unit 5 includes a photoelectric conversion unit 51, a threshold light amount storage unit 52, a determination unit 53, and an output unit 54. The photoelectric conversion unit 51 photoelectrically converts the incident detection light Ld to obtain an electric signal representing the received light amount R. The threshold light amount storage unit 52 stores the threshold light amount S set by the setting unit 24. The determination unit 53 compares the amount of received light R with the amount of threshold light S, and sends the determination result J to the output unit 54. When the light receiving amount R is less than the threshold light amount S, the determination result J is set to "1" which means "the substrate K exists". Further, when the light receiving amount R is equal to or more than the threshold light amount S, the determination result J is set to "0" which means "the substrate K does not exist". The output unit 54 outputs the received light amount R and the determination result J to the control unit 2. The information of the received light amount R and the determination result J is shared inside the control unit 2.

次に、制御部2内の時間帯把握部23および設定部24の機能について説明する。時間帯把握部23および設定部24は、投光部4および受光部5の二組を別々に独立して制御する。以降では、主に搬送路3の入口31側に配置された投光部4および受光部5を対象にして説明を進める。時間帯把握部23は、基板生産機が動作している動作時間帯を、不在時間帯Tnと判定時間帯Tjとに分けて把握する。不在時間帯Tnは、搬送路3の入口31に基板Kが存在し得ない時間帯である。また、判定時間帯Tjは、動作時間帯から不在時間帯Tnを除外した時間帯となる。 Next, the functions of the time zone grasping unit 23 and the setting unit 24 in the control unit 2 will be described. The time zone grasping unit 23 and the setting unit 24 separately and independently control the two sets of the light emitting unit 4 and the light receiving unit 5. In the following, the description will be made mainly for the light emitting unit 4 and the light receiving unit 5 arranged on the inlet 31 side of the transport path 3. The time zone grasping unit 23 grasps the operating time zone in which the substrate production machine is operating by dividing it into an absent time zone Tn and a determination time zone Tj. The absence time zone Tn is a time zone in which the substrate K cannot exist at the inlet 31 of the transport path 3. Further, the determination time zone Tj is a time zone in which the absence time zone Tn is excluded from the operation time zone.

図4は、時間帯把握部23および設定部24の動作を説明するタイムチャートの図である。図4において、横軸は時間の経過を示す。また上段のグラフは、判定部53の判定結果Jを示し、中段のグラフは、設定部24の演算処理の時間帯を示し、下段のグラフは、設定部24の設定動作の時間帯を示す。図4の時刻t1に、判定部53の判定結果Jが「1」から「0」に変化している。これは、第1の基板Kの後端が入口31を通過したこと、すなわち、時刻t1が第1の基板Kの搬入終了時点であることを意味する。時間帯把握部23は、時刻t1を不在時間帯Tnの始点とする。 FIG. 4 is a diagram of a time chart illustrating the operations of the time zone grasping unit 23 and the setting unit 24. In FIG. 4, the horizontal axis represents the passage of time. The upper graph shows the determination result J of the determination unit 53, the middle graph shows the time zone of the arithmetic processing of the setting unit 24, and the lower graph shows the time zone of the setting operation of the setting unit 24. At time t1 in FIG. 4, the determination result J of the determination unit 53 changes from “1” to “0”. This means that the rear end of the first substrate K has passed through the inlet 31, that is, the time t1 is the time point at which the first substrate K is brought in. The time zone grasping unit 23 sets the time t1 as the start point of the absence time zone Tn.

時刻t1の後、装着実施位置32で第1の基板Kへの装着作業が行われる。制御部2は、装着作業が終了した後の時刻t4に、第2の基板Kの搬入を開始する。このため、時刻t1から時刻t4までの間、入口31には基板Kが存在し得ない。したがって、時間帯把握部23は、時刻t4を不在時間帯Tnの終点とする。 After the time t1, the mounting operation on the first substrate K is performed at the mounting implementation position 32. The control unit 2 starts carrying in the second substrate K at time t4 after the mounting work is completed. Therefore, the substrate K cannot exist at the inlet 31 from the time t1 to the time t4. Therefore, the time zone grasping unit 23 sets the time t4 as the end point of the absence time zone Tn.

なお、不在時間帯Tnの終点は、別法により決定することもできる。詳述すると、第1の基板Kへの装着作業には、或る程度の装着時間が必要になる。このため、時間帯把握部23は、装着時間よりも短めの一定時間を設定し、第1の基板Kの搬入終了時点から一定時間が経過したときを不在時間帯Tnの終点にできる。 The end point of the absence time zone Tn can also be determined by another method. More specifically, the mounting work on the first substrate K requires a certain amount of mounting time. Therefore, the time zone grasping unit 23 can set a fixed time shorter than the mounting time, and set the end point of the absence time zone Tn when a fixed time has elapsed from the end of carrying in the first substrate K.

上述のようにして不在時間帯Tnが把握されると、時刻t4以降は、判定時間帯Tjとなる。判定時間帯Tjとなった後の時刻t5に、判定部53の判定結果Jが「0」から「1」に変化している。これは、第2の基板Kの先端が入口31に搬入されたことを意味する。したがって、時刻t5は、第2の基板Kの搬入開始時点となる。搬送制御部21は、この搬入開始時点に基づいて、第2の基板Kの搬送制御を正確に進めることができる。 When the absence time zone Tn is grasped as described above, the determination time zone Tj is set after the time t4. At time t5 after the determination time zone Tj, the determination result J of the determination unit 53 changes from "0" to "1". This means that the tip of the second substrate K has been carried into the inlet 31. Therefore, the time t5 is the time when the second substrate K is started to be carried in. The transfer control unit 21 can accurately advance the transfer control of the second substrate K based on the carry-in start time.

中段のグラフに示されるように、設定部24は、不在時間帯Tnとなった後の時刻t2に演算処理を開始する。設定部24の演算処理では、閾光量Sの再設定の要否の判定、および、再設定が必要である場合の閾光量Sの演算が実行される(詳細後述)。設定部24の演算処理は、不在時間帯Tnの終点(時刻t4)以前の時刻t3に終了する。時刻t3において、閾光量Sの再設定は不要と判定されている。このため、下段のグラフに示されるように、設定部24は、設定動作を実行しない。 As shown in the middle graph, the setting unit 24 starts the arithmetic processing at the time t2 after the absence time zone Tn. In the arithmetic processing of the setting unit 24, the determination of the necessity of resetting the threshold light amount S and the calculation of the threshold light amount S when the resetting is necessary are executed (details will be described later). The arithmetic processing of the setting unit 24 ends at time t3 before the end point (time t4) of the absence time zone Tn. At time t3, it is determined that the resetting of the threshold light amount S is unnecessary. Therefore, as shown in the lower graph, the setting unit 24 does not execute the setting operation.

設定部24は、所定時間Td以上の時間間隔で繰り返して動作する。すなわち、設定部24は、今回の演算処理を開始した時刻t2から所定時間Tdが経過した以降であって、不在時間帯Tnになった後の時刻t7に次回の演算処理を開始する。このときの不在時間帯Tnは、時刻t6を始点とし、時刻t11を終点としている。所定時間Tdとして、10分を例示でき、これに限定されない。なお、時刻t2から時刻t6までの間に、複数の基板Kへの装着作業が行われて、複数回の不在時間帯Tnおよび判定時間帯Tjが交互に発生している。 The setting unit 24 repeatedly operates at time intervals of Td or more for a predetermined time. That is, the setting unit 24 starts the next calculation process at the time t7 after the predetermined time Td has elapsed from the time t2 when the current calculation process is started and after the absence time zone Tn. The absence time zone Tn at this time has the time t6 as the start point and the time t11 as the end point. 10 minutes can be exemplified as the predetermined time Td, and the present invention is not limited to this. It should be noted that the mounting work on the plurality of substrates K is performed between the time t2 and the time t6, and the absence time zone Tn and the determination time zone Tj occur alternately a plurality of times.

設定部24の次回の演算処理は、不在時間帯Tnの終点(時刻t11)以前の時刻t8に終了する。時刻t8において、閾光量Sの再設定が必要と判定されている。このため、下段のグラフに示されるように、設定部24は、時刻t9から設定動作を実行する。設定部24の設定動作は、不在時間帯Tnの終点(時刻t11)以前の時刻t10に終了する。 The next arithmetic processing of the setting unit 24 ends at time t8 before the end point (time t11) of the absence time zone Tn. At time t8, it is determined that the threshold light amount S needs to be reset. Therefore, as shown in the lower graph, the setting unit 24 executes the setting operation from the time t9. The setting operation of the setting unit 24 ends at time t10 before the end point (time t11) of the absence time zone Tn.

実施形態の基板検出装置1の動作および作用
次に、実施形態の基板検出装置1の動作および作用について説明する。図5は、設定部24の演算処理および設定動作を含む基板検出装置1の動作フロー図である。この動作フロー図は、基板生産機が動作している動作時間帯に、生産動作と並行して実行される。図5のステップS1で、初期設定が行われる。詳述すると、次に生産する基板Kの種類に対応する段取り替えが終了してから基板Kが搬入されるまでの間に、受光量Rの手動測定が行われる。そして、手動測定の結果に基づいて、受光量Rおよび閾光量Sの初期値が設定される。また、次に生産する基板Kの幅寸法および厚みの情報に基づいて、後述する許容範囲Dおよび係数Aが自動設定される。
Operation and operation of the substrate detection device 1 of the embodiment Next, the operation and operation of the substrate detection device 1 of the embodiment will be described. FIG. 5 is an operation flow diagram of the substrate detection device 1 including the arithmetic processing and the setting operation of the setting unit 24. This operation flow diagram is executed in parallel with the production operation during the operation time zone in which the board production machine is operating. Initial setting is performed in step S1 of FIG. More specifically, the light receiving amount R is manually measured between the end of the setup change corresponding to the type of the substrate K to be produced next and the time when the substrate K is carried in. Then, the initial values of the received light amount R and the threshold light amount S are set based on the result of the manual measurement. Further, the allowable range D and the coefficient A, which will be described later, are automatically set based on the information on the width dimension and the thickness of the substrate K to be produced next.

次のステップS2で、受光部5は、受光量Rを求め、受光量Rおよび判定結果Jを制御部2に出力する。次のステップS3で、制御部2は、時間帯把握部23の把握結果を参照して、不在時間帯Tnの場合に動作フローの実行をステップS4に進め、判定時間帯Tjの場合に動作フローの実行をステップS11に進める。 In the next step S2, the light receiving unit 5 obtains the light receiving amount R, and outputs the light receiving amount R and the determination result J to the control unit 2. In the next step S3, the control unit 2 refers to the grasping result of the time zone grasping unit 23, advances the execution of the operation flow to step S4 in the case of the absence time zone Tn, and proceeds to the operation flow in the case of the determination time zone Tj. To step S11.

ステップS4で、設定部24は、前回の動作から所定時間Tdが経過しているか否か判定する。なお、基板検出装置1が始動した直後であって前回の動作が無い場合、設定部24は、始動時から所定時間Tdが経過しているか否か判定する。設定部24は、所定時間Tdが経過していない場合に動作フローの実行をステップS2に戻し、所定時間Tdが経過している場合に動作フローの実行をステップS5に進める。 In step S4, the setting unit 24 determines whether or not a predetermined time Td has elapsed since the previous operation. If the substrate detection device 1 has just started and there is no previous operation, the setting unit 24 determines whether or not Td has elapsed for a predetermined time from the start. The setting unit 24 returns the execution of the operation flow to step S2 when the predetermined time Td has not elapsed, and proceeds to the execution of the operation flow in step S5 when the predetermined time Td has elapsed.

ステップS5で、設定部24は、異常時であるか否かを調査する。本実施形態において、2種類の異常時を考慮する。第1の異常時は、前回の受光量Rと比較して今回の受光量Rが異常判定範囲を超えて変化した場合である。この場合、例えば、搬送路3の入口31に偶発的に異物が侵入して、検出光Ldが遮光された状態などが想定される。第2の異常時は、搬送路3で基板Kの搬送に支障が生じた場合である。2種類の異常時には、求められた受光量Rの信頼性に疑義がある。したがって、設定部24は、異常時であれば動作フローの実行をステップS2に戻し、異常時でなければ動作フローの実行をステップS6に進める。 In step S5, the setting unit 24 investigates whether or not it is an abnormal time. In this embodiment, two types of abnormalities are considered. The first abnormality is a case where the current light receiving amount R changes beyond the abnormality determination range as compared with the previous light receiving amount R. In this case, for example, it is assumed that a foreign substance accidentally enters the inlet 31 of the transport path 3 to block the detection light Ld. The second abnormality is a case where the transfer of the substrate K is hindered in the transfer path 3. At the time of two kinds of abnormalities, there is doubt about the reliability of the obtained light receiving amount R. Therefore, the setting unit 24 returns the execution of the operation flow to step S2 if it is abnormal, and proceeds to the execution of the operation flow to step S6 if it is not abnormal.

ステップS6で、設定部24は、最も新しい閾光量Sを設定したときの過去の受光量Rpstと比較して、今回の受光量Rが許容範囲Dを超えて変化したか否かを判定する。今回の受光量Rは、不在時間帯Tnに求められた量であり、換言すると搬送路3の入口31に基板Kが存在しない状態で求められた量である。最も新しい閾光量Sは、前回以前のステップS8で閾光量記憶部52に設定されたものである。なお、基板検出装置1が始動した初期の段階では、最も新しい閾光量Sおよび過去の受光量Rは、ステップS1で初期設定された初期値となる。許容範囲Dは、例えば過去の受光量Rpstの±10%に設定でき、これに限定されない。設定部24は、今回の受光量Rが許容範囲Dの範囲内で変化したときに動作フローの実行をステップS2に戻し、すなわち、閾光量Sを再設定しない。また、設定部24は、今回の受光量Rが許容範囲Dを超えて変化した場合に、動作フローの実行をステップS7に進める。 In step S6, the setting unit 24 determines whether or not the current light receiving amount R has changed beyond the permissible range D as compared with the past received light amount Rpst when the newest threshold light amount S is set. The light receiving amount R this time is the amount obtained in the absence time zone Tn, in other words, the amount obtained in the state where the substrate K does not exist at the inlet 31 of the transport path 3. The latest threshold light amount S is the one set in the threshold light amount storage unit 52 in step S8 before the previous time. In the initial stage when the substrate detection device 1 is started, the newest threshold light amount S and the past received light amount R are the initial values initially set in step S1. The permissible range D can be set to, for example, ± 10% of the past received light amount Rpst, and is not limited to this. The setting unit 24 returns the execution of the operation flow to step S2 when the received light amount R changes within the allowable range D, that is, does not reset the threshold light amount S. Further, when the light receiving amount R this time changes beyond the permissible range D, the setting unit 24 advances the execution of the operation flow to step S7.

ステップS7で、設定部24は、今回の受光量Rに1未満の係数Aを乗算して新しい閾光量Snewを求める。係数Aは、検出光Ldを遮光する基板Kの幅寸法および厚みなどに基づいて適切に設定される。係数Aとして、50%を例示でき、これに限定されない。なお、係数Aを乗算するのでなく、今回の受光量Rから一定量を減算して新しい閾光量Snewを求めてもよい。次のステップS8で、設定部24は、新しい閾光量Snewを閾光量記憶部52に設定する。閾光量記憶部52は、元の閾光量Sに加えて、新しい閾光量Snewをメモリに記憶し、変更履歴を残す。その後、設定部24は、動作フローの実行をステップS2に戻す。 In step S7, the setting unit 24 multiplies the light receiving amount R this time by a coefficient A less than 1, and obtains a new threshold light amount Snew. The coefficient A is appropriately set based on the width dimension and thickness of the substrate K that blocks the detection light Ld. 50% can be exemplified as the coefficient A, and the coefficient A is not limited to this. Instead of multiplying by the coefficient A, a certain amount may be subtracted from the received light amount R this time to obtain a new threshold light amount Snew. In the next step S8, the setting unit 24 sets a new threshold light amount Snew in the threshold light amount storage unit 52. The threshold light amount storage unit 52 stores a new threshold light amount Snew in the memory in addition to the original threshold light amount S, and leaves a change history. After that, the setting unit 24 returns the execution of the operation flow to step S2.

ここで、ステップS6およびステップS7の動作フローについて、具体例を示して説明する。図6は、最も新しい閾光量Sを設定したときの受光量Rpstと比較して、今回の受光量Rが許容範囲Dの範囲内で変化した一例を示す棒グラフの図である。また、図7は、最も新しい閾光量Sを設定したときの受光量Rpstと比較して、今回の受光量Rnowが許容範囲Dを超えて変化した一例を示す棒グラフの図である。さらに、図8は、図7で求められた新しい閾光量Snewを示す棒グラフの図である。 Here, the operation flow of step S6 and step S7 will be described with reference to specific examples. FIG. 6 is a bar graph showing an example in which the light receiving amount R this time is changed within the allowable range D as compared with the light receiving amount Rpst when the newest threshold light amount S is set. Further, FIG. 7 is a bar graph showing an example in which the received light amount Rnow changed beyond the permissible range D as compared with the received light amount Rpst when the newest threshold light amount S was set. Further, FIG. 8 is a bar graph showing the new threshold light amount Snew obtained in FIG. 7.

図6に例示されるように、過去の受光量Rpstに1未満の係数Aが乗算されて閾光量Sが設定されている。投光部4の動作状態が安定していて温度変化が小さい場合、今回の受光量Rは、統計的に多少変動しても、許容範囲Dを逸脱することはない。したがって、この場合、閾光量Sの再設定は不要である。 As illustrated in FIG. 6, the threshold light amount S is set by multiplying the past received light amount Rpst by a coefficient A less than 1. When the operating state of the light projecting unit 4 is stable and the temperature change is small, the light receiving amount R this time does not deviate from the allowable range D even if it fluctuates slightly statistically. Therefore, in this case, it is not necessary to reset the threshold light amount S.

ところが、投光部4の電源投入の直後や一時的な動作中断の際には、温度変化が大きくなって、投光量が変化する。これに伴い、図7に例示されるように、今回の受光量Rnowが許容範囲Dを超えて変化することが生じ得る。この場合、閾光量Sを再設定しないと、誤った判定結果Jのおそれが生じる。したがって、設定部24は、ステップS7で、今回の受光量Rnowに係数Aを乗算して新しい閾光量Snewを求める。新しい閾光量Snewは、元の閾光量Sに対して差分ΔSを有する。 However, immediately after the power of the light projecting unit 4 is turned on or when the operation is temporarily interrupted, the temperature change becomes large and the light projecting amount changes. Along with this, as illustrated in FIG. 7, the received light amount Rnow may change beyond the permissible range D. In this case, if the threshold light amount S is not reset, there is a risk of an erroneous determination result J. Therefore, in step S7, the setting unit 24 obtains a new threshold light amount Snew by multiplying the received light amount Rnow this time by the coefficient A. The new threshold light amount Snew has a difference ΔS with respect to the original threshold light amount S.

この結果、図8に示されるように、最も新しい閾光量Snewとなり、これを設定したのは今回の受光量Rnowとなる。そして、設定部24は、次回のステップS6で、次回に求められた受光量Rnextが今回の受光量Rnowの許容範囲Dの範囲内にあるか否かを判定する。また、判定部53は、次回に求められた受光量Rnextを新しい閾光量Snewと大小比較して、基板Kの存在を判定する。このようにして、投光部4の温度依存性を補償できる。 As a result, as shown in FIG. 8, the newest threshold light amount Snew is obtained, and this is set by the received light amount Rnow this time. Then, in the next step S6, the setting unit 24 determines whether or not the light receiving amount Rnext obtained next time is within the allowable range D of the light receiving amount Rnow this time. In addition, the determination unit 53 determines the presence of the substrate K by comparing the magnitude of the light receiving amount Rnext obtained next time with the new threshold light amount Snew. In this way, the temperature dependence of the light projecting unit 4 can be compensated.

図5の動作フローに戻り、判定時間帯Tjの場合のステップS11以降で、制御部2は、判定部53の機能の一部を分担する。つまり、制御部2は、判定時間帯Tjの間、判定結果Jにしたがって、搬送路3の入口31に基板Kが存在しているか否かを判定する。詳述すると、ステップS11で、制御部2は、判定結果Jの内容を調査する。判定結果J=「1」の場合のステップS12で、制御部2は、入口31に基板Kが存在すると判定する。また、判定結果J=「0」の場合のステップS13で、制御部2は、入口31に基板Kが存在しないと判定する。なお、制御部2は、不在時間帯Tnの間、判定結果Jに関係なく、入口31に基板Kが存在しないと判定する。 Returning to the operation flow of FIG. 5, in the case of the determination time zone Tj and after step S11, the control unit 2 shares a part of the functions of the determination unit 53. That is, the control unit 2 determines whether or not the substrate K exists at the inlet 31 of the transport path 3 according to the determination result J during the determination time zone Tj. More specifically, in step S11, the control unit 2 investigates the content of the determination result J. In step S12 when the determination result J = "1", the control unit 2 determines that the substrate K exists at the inlet 31. Further, in step S13 when the determination result J = "0", the control unit 2 determines that the substrate K does not exist at the inlet 31. The control unit 2 determines that the substrate K does not exist at the inlet 31 during the absence time zone Tn regardless of the determination result J.

ステップS12およびステップS13の後、制御部2は、動作フローの実行をステップS2に戻す。これで、動作フローの1サイクルが終了する。以降、所定の制御サイクル間隔で、ステップS2以降が繰り返して実行される。ステップS12およびステップS13で基板Kの存在が逐次判定されることにより、基板Kの先端および後端が搬送路3の入口31を通過するタイミングが明らかになる。搬送制御部21は、これらのタイミングに基づいて、基板Kの搬送制御を正確に進めることができる。 After step S12 and step S13, the control unit 2 returns the execution of the operation flow to step S2. This completes one cycle of the operation flow. After that, steps S2 and subsequent steps are repeatedly executed at predetermined control cycle intervals. By sequentially determining the presence of the substrate K in steps S12 and S13, the timing at which the front end and the rear end of the substrate K pass through the inlet 31 of the transport path 3 becomes clear. The transfer control unit 21 can accurately advance the transfer control of the substrate K based on these timings.

図5〜図8を用いて説明した基板検出装置1の動作は、搬送路3の出口33側に配置された投光部4および受光部5についても同様である。ただし、時間帯把握部23は、出口33側の受光部5の判定結果Jが「1」から「0」に変化した第3の基板Kの搬出終了時点を不在時間帯Tnの始点とする。そして、時間帯把握部23は、装着作業が終了した後の第4の基板Kの搬出を開始する時刻を不在時間帯Tnの終点とする。あるいは、時間帯把握部23は、装着時間よりも短めの一定時間を設定し、第3の基板Kの搬出終了時点から一定時間が経過したときを不在時間帯Tnの終点としてもよい。 The operation of the substrate detection device 1 described with reference to FIGS. 5 to 8 is the same for the light projecting unit 4 and the light receiving unit 5 arranged on the outlet 33 side of the transport path 3. However, the time zone grasping unit 23 sets the start point of the absence time zone Tn at the end point of carrying out the third substrate K in which the determination result J of the light receiving unit 5 on the outlet 33 side changes from “1” to “0”. Then, the time zone grasping unit 23 sets the time when the fourth substrate K is started to be carried out after the mounting work is completed as the end point of the absence time zone Tn. Alternatively, the time zone grasping unit 23 may set a fixed time shorter than the mounting time, and set the end point of the absence time zone Tn when a fixed time has elapsed from the end of carrying out the third substrate K.

実施形態の基板検出装置1の態様および効果
実施形態の基板検出装置1は、基板Kの搬送用に基板生産機に設けられた搬送路3の特定位置(入口31、出口33)に臨んで配置され、特定位置に向かって検出光Ldを投光する投光部4と、特定位置に臨んで配置され、検出光Ldを受光して受光量Rを求める受光部5と、基板生産機が動作している動作時間帯の一部分であって、特定位置に基板Kが存在し得ない不在時間帯Tn、および動作時間帯から不在時間帯Tnを除外した判定時間帯Tjを把握する時間帯把握部23と、不在時間帯Tnに求められた受光量Rに基づいて、特定位置に基板Kが存在するか否かを判定する閾光量Sを設定する設定部24と、判定時間帯Tjに求められた受光量Rを閾光量Sと比較して、特定位置に基板Kが存在するか否かを判定する判定部53および制御部2と、を備える。
Aspects and Effects of the Substrate Detection Device 1 of the Embodiment The substrate detection device 1 of the embodiment is arranged so as to face a specific position (inlet 31, outlet 33) of a transport path 3 provided in the substrate production machine for transporting the substrate K. The substrate production machine operates: a light projecting unit 4 that projects the detection light Ld toward a specific position, a light receiving unit 5 that is arranged facing the specific position and receives the detected light Ld to obtain the light receiving amount R. A time zone grasping unit that grasps the absent time zone Tn that is a part of the operating time zone and the substrate K cannot exist at a specific position, and the determination time zone Tj excluding the absence time zone Tn from the operating time zone. 23, the setting unit 24 for setting the threshold light amount S for determining whether or not the substrate K exists at a specific position based on the light receiving amount R obtained in the absence time zone Tn, and the determination time zone Tj. The light receiving amount R is compared with the threshold light amount S, and a determination unit 53 and a control unit 2 for determining whether or not the substrate K exists at a specific position are provided.

実施形態の基板検出装置1によれば、基板生産機が動作している動作時間帯の一部分であって搬送路3の特定位置に基板Kが存在し得ない不在時間帯Tnに、受光部5の受光量Rを求めることができる。求めた受光量Rは、基板Kが存在しないと分かっているときの受光量Rであるので、この受光量Rに基づいて閾光量Sを適正に設定して、投光部4の投光量の変動を補償できる。これにより、不在時間帯Tnを除外した判定時間帯Tjで、特定位置に基板Kが存在するか否かを正しく判定できる。かつ、基板生産機の動作を中断するのでなく、動作時間帯のうちの不在時間帯Tnを利用して受光量Rを求めるので、基板生産機の動作を妨げることがなく、生産効率を低下させない。 According to the substrate detection device 1 of the embodiment, the light receiving unit 5 is in the absence time zone Tn, which is a part of the operating time zone in which the substrate production machine is operating and the substrate K cannot exist at a specific position of the transport path 3. The amount of light received R can be obtained. Since the obtained light receiving amount R is the light receiving amount R when it is known that the substrate K does not exist, the threshold light amount S is appropriately set based on the light receiving amount R, and the light emitting amount of the light projecting unit 4 is set. Fluctuations can be compensated. As a result, it is possible to correctly determine whether or not the substrate K exists at a specific position in the determination time zone Tj excluding the absence time zone Tn. Moreover, since the light receiving amount R is obtained by using the absence time zone Tn in the operating time zone without interrupting the operation of the substrate producing machine, the operation of the substrate producing machine is not hindered and the production efficiency is not lowered. ..

さらに、受光部5は、特定位置(入口31、出口33)を挟んで投光部4の反対側に配置され、検出光Ldは、特定位置に基板Kが存在しない場合に、受光部5に到達し、特定位置に基板Kが存在する場合に、基板Kによって少なくとも一部が遮られて受光部5に到達しない。これによれば、検出光Ldが基板Kによって遮光される方式の基板検出装置1で、生産効率を低下させない効果が得られる。 Further, the light receiving unit 5 is arranged on the opposite side of the light projecting unit 4 with the specific positions (inlet 31, outlet 33) interposed therebetween, and the detection light Ld is transmitted to the light receiving unit 5 when the substrate K does not exist at the specific position. When it reaches and the substrate K is present at a specific position, at least a part of the substrate K is blocked by the substrate K and the light receiving portion 5 is not reached. According to this, in the substrate detection device 1 of the type in which the detection light Ld is shielded by the substrate K, the effect of not lowering the production efficiency can be obtained.

さらに、設定部24は、不在時間帯Tnに求められた受光量Rnowに1未満の係数Aを乗算して閾光量Snewを求め、判定部53は、判定時間帯Tjに求められた受光量Rnextが閾光量Snew未満のときに基板Kが存在すると判定し、判定時間帯Tjに求められた受光量Rnextが閾光量Snew以上のときに基板Kが存在しないと判定する。これによれば、係数Aを適切に設定して適正な閾光量Snewを求めることができ、基板Kの存在を高い精度で判定できる。 Further, the setting unit 24 obtains the threshold light amount Snew by multiplying the light receiving amount Rnow obtained in the absence time zone Tn by a coefficient A less than 1, and the determination unit 53 obtains the light receiving amount Rnext obtained in the judgment time zone Tj. When is less than the threshold light amount Snew, it is determined that the substrate K exists, and when the light receiving amount Rnext obtained in the determination time zone Tj is equal to or more than the threshold light amount Snew, it is determined that the substrate K does not exist. According to this, the coefficient A can be appropriately set to obtain an appropriate threshold light amount Snew, and the existence of the substrate K can be determined with high accuracy.

さらに、設定部24は、所定時間Td以上の時間間隔で繰り返して動作し、最も新しい閾光量Sを設定したときの受光量Rpstと比較して、今回の受光量Rnowが許容範囲Dを超えて変化したときに閾光量Snewを再設定し、今回の受光量Rが許容範囲Dの範囲内で変化したときに閾光量Sを再設定しない。 Further, the setting unit 24 repeatedly operates at time intervals of Td or more for a predetermined time, and the light receiving amount Rnow this time exceeds the allowable range D as compared with the light receiving amount Rpst when the newest threshold light amount S is set. When the amount of light changes, the threshold light amount Snew is reset, and when the amount of received light R this time changes within the allowable range D, the threshold light amount S is not reset.

これによれば、投光部4の温度依存性によって投光量が変化し、不在時間帯Tnにおける受光部5の受光量Rが大きく変化した場合に、閾光量Snewを再設定できる。したがって、投光部4の温度依存性を補償するように閾光量Snewが可変に調整され、基板Kの存在を極めて高い精度で判定できる。また、受光部5の不在時間帯Tnの受光量Rの変化が小さい場合に、不要な再設定動作を行わない。したがって、制御の冗長性を回避でき、閾光量記憶部52のメモリ容量の節約にもなる。 According to this, when the light projecting amount changes due to the temperature dependence of the light projecting unit 4 and the light receiving amount R of the light receiving unit 5 in the absence time zone Tn changes significantly, the threshold light amount Snew can be reset. Therefore, the threshold light amount Snew is variably adjusted so as to compensate for the temperature dependence of the light projecting unit 4, and the presence of the substrate K can be determined with extremely high accuracy. Further, when the change in the light receiving amount R of the light receiving unit 5 in the absence time zone Tn is small, unnecessary resetting operation is not performed. Therefore, control redundancy can be avoided, and the memory capacity of the threshold light amount storage unit 52 can be saved.

さらに、特定位置は、搬送路3の入口31であり、不在時間帯Tnは、判定部53の判定結果が「基板が存在する」から「基板が存在しない」に変化した第1の基板Kの搬入終了時点(時刻t1)から、第2の基板Kの搬入を開始する時刻t4までの時間帯、または、搬入終了時点から一定時間が経過するまでの時間帯である。これによれば、搬送路3の入口31において、基板Kの存在を高い精度で判定できる。したがって、第2の基板Kの先端の搬入を検出して、以降の搬送制御を正確に進めることができる。 Further, the specific position is the inlet 31 of the transport path 3, and in the absence time zone Tn, the determination result of the determination unit 53 changes from "the substrate exists" to "the substrate does not exist" of the first substrate K. It is a time zone from the end of carry-in (time t1) to the time t4 when the carry-in of the second substrate K is started, or a time zone from the end of carry-in until a certain time elapses. According to this, the presence of the substrate K can be determined with high accuracy at the inlet 31 of the transport path 3. Therefore, it is possible to detect the carry-in of the tip of the second substrate K and accurately proceed with the subsequent transport control.

また、特定位置は、搬送路3の出口33であり、不在時間帯Tnは、判定部53の判定結果が「基板が存在する」から「基板が存在しない」に変化した第3の基板Kの搬出終了時点から、第4の基板Kの搬出を開始するまでの時間帯、または、搬出終了時点から一定時間が経過するまでの時間帯である。これによれば、搬送路3の出口33において、基板Kの存在を高い精度で判定できる。 Further, the specific position is the outlet 33 of the transport path 3, and in the absence time zone Tn, the determination result of the determination unit 53 changes from "the substrate exists" to "the substrate does not exist" of the third substrate K. It is a time zone from the end of unloading to the start of unloading of the fourth substrate K, or a time zone from the end of unloading until a certain time elapses. According to this, the existence of the substrate K can be determined with high accuracy at the outlet 33 of the transport path 3.

さらに、設定部24は、所定時間Td以上の時間間隔で繰り返して動作し、前回の受光量と比較して今回の受光量が異常判定範囲を超えて変化した異常時に、閾光量Sの再設定をしない。これによれば、求められた受光量Rの信頼性に疑義がある場合に、閾光量Sの再設定をしないので、動作信頼性が高い。 Further, the setting unit 24 repeatedly operates at time intervals of Td or more for a predetermined time, and resets the threshold light amount S when the light receiving amount of this time changes beyond the abnormality determination range as compared with the previous light receiving amount. Do not do. According to this, when there is doubt about the reliability of the obtained light receiving amount R, the threshold light amount S is not reset, so that the operation reliability is high.

また、設定部24は、所定時間Td以上の時間間隔で繰り返して動作し、搬送路3で基板Kの搬送に支障が生じた異常時に、閾光量Sの再設定をしない。これによれば、求められた受光量Rの信頼性に疑義がある場合に、閾光量Sの再設定をしないので、動作信頼性が高い。 Further, the setting unit 24 repeatedly operates at time intervals of Td or more for a predetermined time, and does not reset the threshold light amount S when an abnormality occurs in the transfer of the substrate K on the transfer path 3. According to this, when there is doubt about the reliability of the obtained light receiving amount R, the threshold light amount S is not reset, so that the operation reliability is high.

実施形態の応用および変形
なお、投光部4および受光部5は、搬送路3の入口31および出口33の一方のみに配設されていてもよく、あるいは、装着実施位置32の辺りに一組が配設されていてもよい。また、閾光量記憶部52および判定部53を制御部2の側に設け、出力部54は受光量Rのみを出力する構成としてもよい。さらに、本実施形態において、検出光Ldは基板Kの幅方向に投光されているが、検出光Ldが基板Kの厚さ方向に投光されてもよい。
Application and Modification of the Embodiment The light projecting unit 4 and the light receiving unit 5 may be arranged only at one of the inlet 31 and the outlet 33 of the transport path 3, or a set around the mounting implementation position 32. May be disposed. Further, the threshold light amount storage unit 52 and the determination unit 53 may be provided on the side of the control unit 2, and the output unit 54 may be configured to output only the received light amount R. Further, in the present embodiment, the detection light Ld is projected in the width direction of the substrate K, but the detection light Ld may be projected in the thickness direction of the substrate K.

さらになお、本実施形態では、検出光Ldが基板Kによって遮光される方式を採用しているが、検出光Ldが基板Kによって反射される方式としてもよい。すなわち、基板の搬送用に基板生産装置に設けられた搬送路の特定位置に臨んで配置され、前記特定位置に向かって検出光を投光する投光部と、前記特定位置に臨んで配置され、前記検出光を受光して受光量を求める受光部と、前記基板生産装置が動作している動作時間帯の一部分であって、前記特定位置に前記基板が有り得ない不在時間帯、および前記動作時間帯から前記不在時間帯を除外した判定時間帯を把握する時間帯把握部と、前記不在時間帯に求められた前記受光量に基づいて、前記特定位置における前記基板の有無を判定する閾光量を設定する設定部と、前記判定時間帯に求められた前記受光量を前記閾光量と比較して、前記特定位置における前記基板の有無を判定する判定部と、を備え、前記受光部は前記投光部に並んで配置され、前記検出光は、前記特定位置に前記基板が無い場合に前記受光部に到達せず、前記特定位置に前記基板が有る場合に前記基板によって少なくとも一部が反射されて前記受光部に到達する、という態様を採用してもよい。本発明は、その他にも様々な応用や変形が可能である。 Further, in the present embodiment, the detection light Ld is shielded by the substrate K, but the detection light Ld may be reflected by the substrate K. That is, a light projecting unit that faces a specific position of a transport path provided in the board production apparatus for transporting the substrate and projects detection light toward the specific position and a light projecting unit that faces the specific position. A light receiving unit that receives the detected light to obtain the amount of received light, a part of the operating time zone in which the substrate production apparatus is operating, an absent time zone in which the substrate cannot be present at the specific position, and the operation. A time zone grasping unit that grasps a determination time zone excluding the absence time zone from the time zone, and a threshold light amount that determines the presence or absence of the substrate at the specific position based on the received light amount obtained during the absence time zone. The light receiving unit includes a setting unit for setting the above and a determination unit for determining the presence or absence of the substrate at the specific position by comparing the light receiving amount obtained in the determination time zone with the threshold light amount. Arranged side by side with the light projecting portion, the detected light does not reach the light receiving portion when the substrate is not present at the specific position, and at least a part thereof is reflected by the substrate when the substrate is present at the specific position. You may adopt the aspect that the light receiving part is reached. The present invention has various other applications and modifications.

1:基板検出装置 2:制御部 23:時間帯把握部 24:設定部 3:搬送路 31:入口 32:装着実施位置 33:出口 4:投光部 5:受光部 51:光電変換部 52:閾光量記憶部 53:判定部 54:出力部 9:基板搬送装置 K:基板 Ld:検出光 R:受光量 Rpst:過去の受光量 Rnow:今回の受光量 S:閾光量 Snew:新しい閾光量 J:判定結果 Tn:不在時間帯 Tj:判定時間帯 Td:所定時間 D:許容範囲 A:係数 1: Board detection device 2: Control unit 23: Time zone grasping unit 24: Setting unit 3: Transport path 31: Inlet 32: Mounting implementation position 33: Exit 4: Light emitting unit 5: Light receiving unit 51: Photoelectric conversion unit 52: Threshold light storage unit 53: Judgment unit 54: Output unit 9: Substrate carrier K: Substrate Ld: Detection light R: Received amount Rpst: Past received light amount Rnow: Current received light amount S: Threshold light amount Snew: New threshold light amount J : Judgment result Tn: Absence time zone Tj: Judgment time zone Td: Predetermined time D: Allowable range A: Coefficient

Claims (7)

基板の搬送用の搬送路であって、前記基板に作業を行う基板生産機に設けられた前記搬送路の特定位置に臨んで配置され、前記特定位置に向かって検出光を投光する投光部と、
前記特定位置に臨んで配置され、前記検出光を受光して受光量を求める受光部と、
前記基板生産機が動作している動作時間帯の一部分であって、前記特定位置に前記基板が存在し得ない不在時間帯、および前記動作時間帯から前記不在時間帯を除外した判定時間帯を把握する時間帯把握部と、
前記不在時間帯に求められた前記受光量に基づいて、前記特定位置に前記基板が存在するか否かを判定する閾光量を設定し、前記判定時間帯に前記閾光量を設定しない設定部と、
前記判定時間帯に求められた前記受光量を前記閾光量と比較して、前記特定位置に前記基板が存在するか否かを判定し、前記不在時間帯に前記基板が存在するか否かを判定しない判定部と、を備え、
前記特定位置は、前記搬送路の入口であり、
前記不在時間帯は、
前記判定部の判定結果が「前記基板が存在する」から「前記基板が存在しない」に変化した第1の前記基板の搬入終了時点から、第1の前記基板への前記作業に要する所定長さの既知の作業時間が経過するまでの時間帯、または、
前記搬入終了時点から、前記作業時間よりも短めの一定時間が経過するまでの時間帯である、
基板検出装置。
A transfer path for transporting a substrate, which is arranged facing a specific position of the transfer path provided in a substrate production machine that works on the substrate, and emits detection light toward the specific position. Department and
A light receiving unit that is arranged facing the specific position and receives the detected light to obtain the amount of received light.
A part of the operating time zone in which the substrate production machine is operating, an absent time zone in which the substrate cannot exist at the specific position, and a determination time zone in which the absent time zone is excluded from the operating time zone. Time zone grasping part to grasp and
A setting unit that sets a threshold light amount for determining whether or not the substrate exists at the specific position based on the received light amount obtained in the absence time zone, and does not set the threshold light amount in the determination time zone. ,
The amount of received light obtained in the determination time zone is compared with the threshold light amount to determine whether or not the substrate exists at the specific position, and whether or not the substrate exists in the absence time zone. Equipped with a judgment unit that does not judge
The specific position is the entrance of the transport path.
The absent time zone is
The predetermined length required for the work to the first substrate from the time when the determination result of the determination unit changes from "the substrate exists" to "the substrate does not exist" from the end of carrying in the first substrate. Time zone until the known work time elapses , or
From the carry-in at the end, which is the time period until the end of the short for a certain period of time than during the time of the operation industry,
Board detector.
基板の搬送用の搬送路であって、前記基板に作業を行う基板生産機に設けられた前記搬送路の特定位置に臨んで配置され、前記特定位置に向かって検出光を投光する投光部と、
前記特定位置に臨んで配置され、前記検出光を受光して受光量を求める受光部と、
前記基板生産機が動作している動作時間帯の一部分であって、前記特定位置に前記基板が存在し得ない不在時間帯、および前記動作時間帯から前記不在時間帯を除外した判定時間帯を把握する時間帯把握部と、
前記不在時間帯に求められた前記受光量に基づいて、前記特定位置に前記基板が存在するか否かを判定する閾光量を設定し、前記判定時間帯に前記閾光量を設定しない設定部と、
前記判定時間帯に求められた前記受光量を前記閾光量と比較して、前記特定位置に前記基板が存在するか否かを判定し、前記不在時間帯に前記基板が存在するか否かを判定しない判定部と、を備え、
前記特定位置は、前記搬送路の出口であり、
前記不在時間帯は、
前記判定部の判定結果が「前記基板が存在する」から「前記基板が存在しない」に変化した第3の前記基板の搬出終了時点から、第4の前記基板への前記作業に要する所定長さの既知の作業時間が経過するまでの時間帯、または、
前記搬出終了時点から、前記作業時間よりも短めの一定時間が経過するまでの時間帯である、
基板検出装置。
A transfer path for transporting a substrate, which is arranged facing a specific position of the transfer path provided in a substrate production machine that works on the substrate, and emits detection light toward the specific position. Department and
A light receiving unit that is arranged facing the specific position and receives the detected light to obtain the amount of received light.
A part of the operating time zone in which the substrate production machine is operating, an absent time zone in which the substrate cannot exist at the specific position, and a determination time zone in which the absent time zone is excluded from the operating time zone. Time zone grasping part to grasp and
A setting unit that sets a threshold light amount for determining whether or not the substrate exists at the specific position based on the received light amount obtained in the absence time zone, and does not set the threshold light amount in the determination time zone. ,
The amount of received light obtained in the determination time zone is compared with the threshold light amount to determine whether or not the substrate exists at the specific position, and whether or not the substrate exists in the absence time zone. Equipped with a judgment unit that does not judge
The specific position is the exit of the transport path.
The absent time zone is
A predetermined length required for the work on the fourth substrate from the time when the determination result of the determination unit changes from "the substrate exists" to "the substrate does not exist" from the end of carrying out the third substrate. Time zone until the known work time elapses , or
From the carry-out at the end, which is the time period until the end of the short for a certain period of time than during the time of the operation industry,
Board detector.
前記受光部は、前記特定位置を挟んで前記投光部の反対側に配置され、
前記検出光は、
前記特定位置に前記基板が存在しない場合に、前記受光部に到達し、
前記特定位置に前記基板が存在する場合に、前記基板によって少なくとも一部が遮られて前記受光部に到達しない、
請求項1または2に記載の基板検出装置。
The light receiving unit is arranged on the opposite side of the light projecting unit with the specific position in between.
The detection light is
When the substrate does not exist at the specific position, the light receiving portion is reached and the substrate is reached.
When the substrate is present at the specific position, at least a part of the substrate is blocked by the substrate and does not reach the light receiving portion.
The substrate detection device according to claim 1 or 2.
前記設定部は、前記不在時間帯に求められた前記受光量に1未満の係数を乗算して前記閾光量を求め、
前記判定部は、前記判定時間帯に求められた前記受光量が前記閾光量未満のときに前記基板が存在すると判定し、前記判定時間帯に求められた前記受光量が前記閾光量以上のときに前記基板が存在しないと判定する、
請求項3に記載の基板検出装置。
The setting unit obtains the threshold light amount by multiplying the received light amount obtained during the absence time zone by a coefficient of less than 1.
The determination unit determines that the substrate exists when the received light amount obtained during the determination time zone is less than the threshold light amount, and when the received light amount obtained during the determination time zone is equal to or greater than the threshold light amount. Judges that the substrate does not exist in
The substrate detection device according to claim 3.
前記設定部は、
所定時間以上の時間間隔で繰り返して動作し、
最も新しい前記閾光量を設定したときの前記受光量と比較して、今回の前記受光量が許容範囲を超えて変化したときに前記閾光量を再設定し、今回の前記受光量が前記許容範囲の範囲内で変化したときに前記閾光量を再設定しない、
請求項1〜4のいずれか一項に記載の基板検出装置。
The setting unit
It operates repeatedly at time intervals of a predetermined time or longer,
Compared with the received light amount when the latest threshold light amount is set, the threshold light amount is reset when the received light amount changes beyond the allowable range, and the received light amount this time is the allowable range. Do not reset the threshold light intensity when it changes within the range of
The substrate detection device according to any one of claims 1 to 4.
前記設定部は、所定時間以上の時間間隔で繰り返して動作し、前回の前記受光量と比較して今回の前記受光量が異常判定範囲を超えて変化した異常時に、前記閾光量の再設定をしない、請求項1〜5のいずれか一項に記載の基板検出装置。 The setting unit repeatedly operates at time intervals of a predetermined time or longer, and resets the threshold light amount when the light receiving amount of this time changes beyond the abnormality determination range as compared with the previous light receiving amount. The substrate detection device according to any one of claims 1 to 5. 前記設定部は、所定時間以上の時間間隔で繰り返して動作し、前記搬送路で前記基板の搬送に支障が生じた異常時に、前記閾光量の再設定をしない、請求項1〜6のいずれか一項に記載の基板検出装置。 Any one of claims 1 to 6, wherein the setting unit repeatedly operates at time intervals of a predetermined time or longer, and does not reset the threshold light amount when an abnormality occurs in the transfer of the substrate in the transfer path. The substrate detection device according to one item.
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