JP6787974B2 - Method for manufacturing polarizing plate, image display device and polarizing plate - Google Patents
Method for manufacturing polarizing plate, image display device and polarizing plate Download PDFInfo
- Publication number
- JP6787974B2 JP6787974B2 JP2018209166A JP2018209166A JP6787974B2 JP 6787974 B2 JP6787974 B2 JP 6787974B2 JP 2018209166 A JP2018209166 A JP 2018209166A JP 2018209166 A JP2018209166 A JP 2018209166A JP 6787974 B2 JP6787974 B2 JP 6787974B2
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- Prior art keywords
- polarizing plate
- recess
- polarizer
- resin layer
- optical film
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Links
- 238000000034 method Methods 0.000 title claims description 25
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- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
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- 238000010538 cationic polymerization reaction Methods 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- WOZVHXUHUFLZGK-UHFFFAOYSA-N dimethyl terephthalate Chemical compound COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
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- 238000012545 processing Methods 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- WTDBQJMMOXGIQZ-UHFFFAOYSA-N 3,4-dimethylnaphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=C2C(C(O)=O)=C(C(O)=O)C(C)=C(C)C2=C1 WTDBQJMMOXGIQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- ORLQHILJRHBSAY-UHFFFAOYSA-N [1-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1(CO)CCCCC1 ORLQHILJRHBSAY-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
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- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001299 aldehydes Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
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- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
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- 229920001971 elastomer Polymers 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- HTEAGOMAXMOFFS-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C HTEAGOMAXMOFFS-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 150000004291 polyenes Chemical class 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920002215 polytrimethylene terephthalate Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000012192 staining solution Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
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- 229920006352 transparent thermoplastic Polymers 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/10—Removing layers, or parts of layers, mechanically or chemically
- B32B38/105—Removing layers, or parts of layers, mechanically or chemically on edges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/50—OLEDs integrated with light modulating elements, e.g. with electrochromic elements, photochromic elements or liquid crystal elements
Description
本発明は、偏光板、画像表示装置及び偏光板の製造方法に関する。 The present invention relates to a polarizing plate, an image display device, and a method for manufacturing a polarizing plate.
偏光板は、液晶テレビ、有機ＥＬテレビ、スマートフォン、スマートウォッチ、又は自動四輪車若しくは自動二輪車のメーターパネル等の画像表示装置に用いられる。偏光板は、フィルム状の偏光子と、偏光子に重なる光学フィルム（例えば、保護フィルム）と、を備える。画像表示装置の設計上の理由から、偏光板の外周に凹部が形成されることがある。例えば、下記特許文献１には、液晶の注入口として、凹部（切欠き部）を偏光板の外周に形成することが記載されている。 The polarizing plate is used in an image display device such as a liquid crystal television, an organic EL television, a smartphone, a smart watch, or a meter panel of a motorcycle or a motorcycle. The polarizing plate includes a film-shaped polarizing element and an optical film (for example, a protective film) that overlaps the polarizing element. For design reasons of the image display device, recesses may be formed on the outer periphery of the polarizing plate. For example, Patent Document 1 below describes that a recess (notch) is formed on the outer periphery of a polarizing plate as a liquid crystal injection port.
偏光板は湿度又は温度の変化に伴い、膨張又は収縮する。偏光板の膨張又は収縮に伴う応力は凹部に集中し易く、凹部において亀裂が形成され易い。 The polarizing plate expands or contracts with changes in humidity or temperature. The stress associated with the expansion or contraction of the polarizing plate tends to be concentrated in the recesses, and cracks are likely to be formed in the recesses.
本発明は、上記事情に鑑みてなされたものであり、凹部における亀裂を抑制することができる偏光板、当該偏光板を含む画像表示装置、及び偏光板の製造方法を提供することを目的とする。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a polarizing plate capable of suppressing cracks in recesses, an image display device including the polarizing plate, and a method for manufacturing the polarizing plate. ..
本発明の一側面に係る偏光板は、フィルム状の偏光子と、樹脂を含む少なくとも一対の光学フィルムと、を備え、偏光子が、一対の光学フィルムの間に位置し、且つ一対の光学フィルムと重なり、凹部が、偏光板の外周に形成されており、凹部に沿う偏光子の端部が、偏光板の外周の内側に位置し、一対の光学フィルムと連続する樹脂層が、凹部に沿う偏光子の端部から偏光板の外周にかけて形成されている。 The polarizing plate according to one aspect of the present invention includes a film-shaped polarizing element and at least a pair of optical films containing a resin, and the polarizing elements are located between the pair of optical films, and the pair of optical films. A recess is formed on the outer periphery of the polarizing plate, the end of the polarizing element along the recess is located inside the outer periphery of the polarizing plate, and a resin layer continuous with the pair of optical films is along the recess. It is formed from the end of the polarizer to the outer periphery of the polarizing plate.
凹部の内側の隅（ｃоｒｎｅｒ）が曲面であってよい。 The inner corner of the recess may be a curved surface.
偏光子の端部から偏光板の外周にかけて形成された樹脂層の幅が、１０μｍ以上１０００μｍ以下であってよい。 The width of the resin layer formed from the end of the polarizer to the outer periphery of the polarizing plate may be 10 μm or more and 1000 μm or less.
樹脂層が、凹部に沿う偏光子の端部に密着していてよい。 The resin layer may be in close contact with the end of the polarizer along the recess.
樹脂層が、凹部において露出していてよい。 The resin layer may be exposed in the recess.
本発明の一側面に係る画像表示装置は、上記の偏光板を含む。 The image display device according to one aspect of the present invention includes the above-mentioned polarizing plate.
本発明の一側面に係る偏光板の製造方法は、上記の偏光板を製造する方法であって、フィルム状の偏光子と少なくとも一対の光学フィルムを重ねて、積層体を形成する積層工程と、エンドミルを積層体の外周に接触させて、エンドミル（ｅｎｄｍｉｌｌ）を積層体の外周に沿って移動させる切削工程と、を備え、積層体において、偏光子が一対の光学フィルムの間に位置し、切削工程におけるエンドミルの送り速度（ｆｅｅｄ ｒａｔｅ）が、１００ｍｍ／分以上１０００ｍｍ／分未満であり、切削工程におけるエンドミルの回転速度が、５００ｒｐｍ以上６００００ｒｐｍ以下であり、切削工程により、凹部及び樹脂層を形成する。 The method for manufacturing a polarizing plate according to one aspect of the present invention is the method for manufacturing the above-mentioned polarizing plate, which comprises a laminating step of laminating a film-shaped polarizer and at least a pair of optical films to form a laminated body. A cutting step of bringing the end mill into contact with the outer periphery of the laminate and moving the end mill along the outer periphery of the laminate is provided, in which the polarizer is located between the pair of optical films for cutting. The feed rate of the end mill in the process is 100 mm / min or more and less than 1000 mm / min, the rotation speed of the end mill in the cutting process is 500 rpm or more and 60,000 rpm or less, and the recess and the resin layer are formed by the cutting process. ..
切削工程を少なくとも二回繰り返すことにより、凹部及び樹脂層を形成してよい。 The recess and the resin layer may be formed by repeating the cutting process at least twice.
本発明によれば、凹部における亀裂を抑制することができる偏光板、当該偏光板を含む画像表示装置、及び偏光板の製造方法が提供される。 According to the present invention, there is provided a polarizing plate capable of suppressing cracks in recesses, an image display device including the polarizing plate, and a method for manufacturing the polarizing plate.
以下、図面を参照しながら、本発明の好適な実施形態について説明する。図面において、同等の構成要素には同等の符号を付す。本発明は下記実施形態に限定されるものではない。各図に示すＸ，Ｙ及びＺは、互いに直交する３つの座標軸を意味する。各図中のＸＹＺ座標軸其々が示す方向は各図に共通する。 Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. In the drawings, equivalent components are designated by the same reference numerals. The present invention is not limited to the following embodiments. X, Y and Z shown in each figure mean three coordinate axes orthogonal to each other. The directions indicated by the XYZ coordinate axes in each figure are common to each figure.
（偏光板）
図１は、本実施形態に係る偏光板１の表面（受光面）を示す。図２に示される偏光板１の断面は、偏光板１の表面（受光面）に垂直であり、且つ凹部２の内側に位置する偏光板１の外周１ｐと直交する。
(Polarizer)
FIG. 1 shows the surface (light receiving surface) of the polarizing plate 1 according to the present embodiment. The cross section of the polarizing plate 1 shown in FIG. 2 is perpendicular to the surface (light receiving surface) of the polarizing plate 1 and orthogonal to the outer circumference 1p of the polarizing plate 1 located inside the recess 2.
図１及び図２に示されるように、本実施形態に係る偏光板１は、少なくとも一対の光学フィルム（５，９）と、一対の光学フィルム（５，９）の間に位置するフィルム状の偏光子７を備える。以下では、説明の便宜上、偏光子７と一対の光学フィルム（５，９）から構成される偏光板１が主に説明される。ただし後述の通り、偏光板が備える光学フィルムの数は二枚に限定されない。 As shown in FIGS. 1 and 2, the polarizing plate 1 according to the present embodiment is in the form of a film located between at least a pair of optical films (5, 9) and a pair of optical films (5, 9). It includes a polarizer 7. In the following, for convenience of explanation, the polarizing plate 1 composed of the polarizer 7 and the pair of optical films (5, 9) will be mainly described. However, as described later, the number of optical films included in the polarizing plate is not limited to two.
「光学フィルム」とは、偏光板１を構成するフィルム状の部材（偏光子７自体を除く。）を意味する。例えば、光学フィルムは、保護フィルム及び離型フィルムを含意する。個々の光学フィルムは単独で特定の光学的機能を有していなくてもよい。「フィルム」（光学フィルム）は、「層」（光学層）と言い換えられてよい。一対の光学フィルム（５，９）其々は樹脂を含む。ただし、光学フィルム（５，９）其々の組成は限定されない。 The “optical film” means a film-like member (excluding the polarizing element 7 itself) that constitutes the polarizing plate 1. For example, optical film implies a protective film and a release film. Each optical film may not have a specific optical function by itself. The "film" (optical film) may be paraphrased as the "layer" (optical layer). Each pair of optical films (5, 9) contains resin. However, the composition of each of the optical films (5, 9) is not limited.
偏光子７は、光学フィルム（５，９）其々と直接的又は間接的に重なっている。例えば、偏光子７と光学フィルム（５，９）との間に別の光学フィルムがあってよい。偏光子７が接着層を介して光学フィルム（５，９）其々と重なっていてもよい。 The polarizer 7 directly or indirectly overlaps the optical films (5, 9), respectively. For example, there may be another optical film between the polarizer 7 and the optical film (5, 9). The polarizer 7 may overlap the optical films (5, 9) with the adhesive layer.
図１に示されるように、凹部２が、偏光板１の外周１ｐに形成されている。つまり、偏光板１の外周１ｐには凹部２がある。凹部２は、窪み、切欠き（ｃｕｔоｕｔ）又はノッチ（ｎоｔｃｈ）と言い換えられてよい。凹部２は、偏光板１の表面（受光面）に垂直な方向（Ｚ軸方向）において偏光板１を貫通していてよい。偏光板１の外周１ｐとは、偏光板１の受光面に垂直な方向から見られる偏光板１（受光面）の外縁又は輪郭と言い換えられてよい。凹部２に沿う偏光子７の端部７ｅの一部又は全体は、偏光板１の外周１ｐの内側に位置する。一対の光学フィルム（５，９）と連続する樹脂層４が、凹部２に沿う偏光子７の端部７ｅから偏光板１の外周１ｐにかけて形成されている。つまり樹脂層４は、一対の光学フィルム（５，９）其々と継ぎ目なく（ｓｅａｍｌｅｓｓに）繋がっている。樹脂層４は凹部２において露出していてよい。つまり、凹部２に位置する偏光板１の端面の一部又は全体が樹脂層４であってよい。一方、凹部２に沿う偏光子７の端部７ｅ（端面）は、凹部２において露出する樹脂層４で覆われていてよい。 As shown in FIG. 1, the recess 2 is formed on the outer circumference 1p of the polarizing plate 1. That is, there is a recess 2 on the outer circumference 1p of the polarizing plate 1. The recess 2 may be paraphrased as a recess, a cut, or a notch. The recess 2 may penetrate the polarizing plate 1 in a direction (Z-axis direction) perpendicular to the surface (light receiving surface) of the polarizing plate 1. The outer circumference 1p of the polarizing plate 1 may be rephrased as the outer edge or contour of the polarizing plate 1 (light receiving surface) seen from the direction perpendicular to the light receiving surface of the polarizing plate 1. A part or the whole of the end portion 7e of the polarizer 7 along the concave portion 2 is located inside the outer peripheral 1p of the polarizing plate 1. A resin layer 4 continuous with the pair of optical films (5, 9) is formed from the end portion 7e of the polarizing element 7 along the concave portion 2 to the outer peripheral 1p of the polarizing plate 1. That is, the resin layer 4 is seamlessly (seamlessly) connected to each of the pair of optical films (5, 9). The resin layer 4 may be exposed in the recess 2. That is, a part or the whole of the end face of the polarizing plate 1 located in the recess 2 may be the resin layer 4. On the other hand, the end portion 7e (end face) of the polarizer 7 along the recess 2 may be covered with the resin layer 4 exposed in the recess 2.
仮に樹脂層４がない場合、偏光子７及び光学フィルム（５，９）其々の端部が凹部２において露出する。湿度又は温度の変化に伴う偏光子７及び光学フィルム（５，９）其々の収縮率又は膨張率は異なる。したがって、湿度又は温度の変化に伴って、偏光子７及び光学フィルム（５，９）其々の端部が露出した凹部２に応力が集中し易く、応力に起因する亀裂が凹部２に形成され易い。さらに、偏光子７がポリビニルアルコールとヨウ素とから構成される錯体を含む場合、凹部２に露出した偏光子７は湿気、熱又は光（紫外線）に曝されることによって劣化し易く、凹部２に露出した偏光子７において亀裂が形成され易い。また仮に樹脂層４がない場合、偏光子７と光学フィルム（５，９）との境界（偏光子７と光学フィルム（５，９）との間の界面）が凹部２において露出する。応力が凹部２に集中することにより、偏光子７と光学フィルム（５，９）との境界近傍に亀裂が形成され易い。また、偏光子７と光学フィルム（５，９）との境界を介して、湿気が凹部２から偏光板１内に侵入することにより、偏光子７及び光学フィルム（５，６）其々が劣化し易く、偏光子７及び光学フィルム（５，６）の剥離が起き易く、偏光板１の凹部２における亀裂が形成され易い。 If the resin layer 4 is not provided, the ends of the polarizer 7 and the optical films (5, 9) are exposed in the recess 2. The shrinkage or expansion rate of the polarizer 7 and the optical film (5, 9) due to changes in humidity or temperature is different. Therefore, with changes in humidity or temperature, stress tends to concentrate in the recesses 2 where the ends of the polarizer 7 and the optical films (5, 9) are exposed, and cracks due to the stress are formed in the recesses 2. easy. Further, when the polarizer 7 contains a complex composed of polyvinyl alcohol and iodine, the polarizer 7 exposed in the recess 2 is easily deteriorated by being exposed to moisture, heat or light (ultraviolet rays), and the recess 2 is formed. Cracks are likely to be formed in the exposed polarizer 7. If the resin layer 4 is not provided, the boundary between the polarizer 7 and the optical film (5, 9) (the interface between the polarizer 7 and the optical film (5, 9)) is exposed in the recess 2. Since the stress is concentrated in the recess 2, cracks are likely to be formed near the boundary between the polarizer 7 and the optical film (5, 9). Further, the polarizing element 7 and the optical film (5, 6) are deteriorated by the moisture entering the polarizing plate 1 from the recess 2 through the boundary between the polarizing element 7 and the optical film (5, 9). The polarizer 7 and the optical film (5, 6) are easily peeled off, and cracks are easily formed in the recess 2 of the polarizing plate 1.
一方、本実施形態では、凹部２に沿う偏光子７の端部７ｅは偏光板１の外周１ｐの内側に位置し、樹脂層４が偏光子７の端部７ｅから偏光板１の外周１ｐにかけて形成されている。つまり本実施形態では、偏光子７の端部７ｅは凹部２において露出せず、偏光子７の端部７ｅは樹脂層４によって偏光板１の内部に封止されている。つまり樹脂層４が偏光子７の端部７ｅを保護している。したがって本実施形態では、偏光子７の端部７ｅが凹部２に露出している場合に比べて、偏光子７及び光学フィルム（５，９）其々の収縮率又は膨張率の差に起因する応力が凹部２に作用し難く、応力に起因する亀裂が凹部２に形成され難い。また偏光子７の端部７ｅが凹部２に露出せずに樹脂層４で覆われているので、偏光子７が湿気、熱又は光（紫外線）に直接曝され難く、偏光子７が劣化し難く、偏光子７における亀裂が抑制される。さらに本実施形態では、樹脂層４が凹部２において露出しているので、偏光子７と光学フィルム（５，９）との境界は凹部２において露出しない。したがって、偏光子７と光学フィルム（５，９）との境界近傍において亀裂が形成され難い。また偏光子７と光学フィルム（５，９）との境界が凹部２に露出せず、樹脂層４が凹部２において露出しているので、湿気が凹部２から偏光板１内に侵入し難い。しがって、偏光子７及び光学フィルム（５，６）其々の劣化が抑制され、偏光子７及び光学フィルム（５，６）の剥離が抑制され、偏光板１の凹部２において亀裂が形成され難い。以上の理由から、本実施形態によれば、凹部２（特に凹部２の内側の隅２ｃ）における亀裂を抑制することが可能になる。 On the other hand, in the present embodiment, the end 7e of the polarizer 7 along the recess 2 is located inside the outer circumference 1p of the polarizing plate 1, and the resin layer 4 extends from the end 7e of the polarizer 7 to the outer circumference 1p of the polarizing plate 1. It is formed. That is, in the present embodiment, the end portion 7e of the polarizer 7 is not exposed in the recess 2, and the end portion 7e of the polarizer 7 is sealed inside the polarizing plate 1 by the resin layer 4. That is, the resin layer 4 protects the end portion 7e of the polarizer 7. Therefore, in the present embodiment, it is caused by the difference in the contraction rate or the expansion rate of the polarizer 7 and the optical film (5, 9) as compared with the case where the end portion 7e of the polarizer 7 is exposed in the recess 2. It is difficult for stress to act on the recess 2, and it is difficult for cracks due to stress to be formed in the recess 2. Further, since the end portion 7e of the polarizer 7 is covered with the resin layer 4 without being exposed to the recess 2, the polarizer 7 is less likely to be directly exposed to humidity, heat or light (ultraviolet rays), and the polarizer 7 deteriorates. It is difficult to suppress cracks in the polarizer 7. Further, in the present embodiment, since the resin layer 4 is exposed in the recess 2, the boundary between the polarizer 7 and the optical film (5, 9) is not exposed in the recess 2. Therefore, it is difficult for cracks to be formed near the boundary between the polarizer 7 and the optical film (5, 9). Further, since the boundary between the polarizer 7 and the optical film (5, 9) is not exposed in the recess 2 and the resin layer 4 is exposed in the recess 2, it is difficult for moisture to enter the polarizing plate 1 from the recess 2. Therefore, deterioration of the polarizer 7 and the optical film (5, 6) is suppressed, peeling of the polarizer 7 and the optical film (5, 6) is suppressed, and cracks are formed in the recess 2 of the polarizing plate 1. Hard to form. For the above reasons, according to the present embodiment, it is possible to suppress cracks in the recess 2 (particularly, the inner corner 2c of the recess 2).
偏光子７の全体が偏光板１の外周１ｐの内側に位置してよく、偏光子７の端部７ｅの全域が樹脂層４で覆われていてよい。つまり偏光子７の全体が樹脂層４で囲まれていてよい。偏光子７の全体が偏光板１の外周１ｐの内側に位置し、偏光子７の全体が樹脂層４で囲まれることにより、偏光板１の外周１ｐの全域において亀裂が抑制される。 The entire polarizing element 7 may be located inside the outer peripheral 1p of the polarizing plate 1, and the entire end portion 7e of the polarizing element 7 may be covered with the resin layer 4. That is, the entire polarizer 7 may be surrounded by the resin layer 4. Since the entire polarizing element 7 is located inside the outer peripheral 1p of the polarizing plate 1 and the entire polarizing element 7 is surrounded by the resin layer 4, cracks are suppressed in the entire outer peripheral 1p of the polarizing plate 1.
凹部２の内側の隅２ｃが曲面であってよい。つまり、凹部２の内側の隅２ｃに位置する偏光板１の端面が曲面であってよい。つまり、凹部の内側の隅２ｃが面取り（ｃｈａｍｆｅｒ）されていてよい。凹部２の内側の隅２ｃが曲面であることにより、凹部２の内側の隅２ｃにおける亀裂が抑制され易い。図１に示されるように、凹部２の両端に位置する角部、及び偏光板１の四隅に位置する角部其々も面取りされていてよい。 The inner corner 2c of the recess 2 may be a curved surface. That is, the end face of the polarizing plate 1 located at the inner corner 2c of the recess 2 may be a curved surface. That is, the inner corner 2c of the recess may be chamfered. Since the inner corner 2c of the recess 2 is a curved surface, cracks in the inner corner 2c of the recess 2 are easily suppressed. As shown in FIG. 1, the corners located at both ends of the recess 2 and the corners located at the four corners of the polarizing plate 1 may also be chamfered.
凹部２に沿う偏光子７の端部７ｅから偏光板１の外周１ｐにかけて形成された樹脂層４の幅４ｗは、１０μｍ以上１０００μｍ以下であってよい。樹脂層４の幅４ｗとは、偏光板１の外周１ｐ（凹部２に位置する偏光板１の端面）に対して垂直であり、且つ偏光板１の表面（受光面）に平行な方向における樹脂層４の幅と言い換えられてよい。樹脂層４の幅４ｗが１０μｍ以上であることにより、偏光板１の凹部２における亀裂が抑制され易い。同様の理由から、樹脂層４の幅４ｗは、１５μｍ以上１００μｍ以下、又は２７μｍ以上４６μｍ以下であってもよい。 The width 4w of the resin layer 4 formed from the end 7e of the polarizing element 7 along the recess 2 to the outer circumference 1p of the polarizing plate 1 may be 10 μm or more and 1000 μm or less. The width 4w of the resin layer 4 is a resin in a direction perpendicular to the outer peripheral 1p of the polarizing plate 1 (the end surface of the polarizing plate 1 located in the recess 2) and parallel to the surface (light receiving surface) of the polarizing plate 1. It may be paraphrased as the width of the layer 4. When the width 4w of the resin layer 4 is 10 μm or more, cracks in the recess 2 of the polarizing plate 1 are easily suppressed. For the same reason, the width 4w of the resin layer 4 may be 15 μm or more and 100 μm or less, or 27 μm or more and 46 μm or less.
樹脂層４は、凹部２に沿う偏光子７の端部７ｅの一部又は全体に密着していてよい。樹脂層４が偏光子７の端部７ｅに密着することにより、偏光子７の端部７ｅにおける亀裂が抑制され易い。ただし、樹脂層４と偏光子７の端部７ｅとの間に隙間が形成されていてもよい。 The resin layer 4 may be in close contact with a part or the whole of the end portion 7e of the polarizer 7 along the recess 2. Since the resin layer 4 is in close contact with the end portion 7e of the polarizer 7, cracks at the end portion 7e of the polarizer 7 are easily suppressed. However, a gap may be formed between the resin layer 4 and the end portion 7e of the polarizer 7.
樹脂層４において、光学フィルム（５，９）其々の端部が互いに接着又は融着していてよい。接着とは、接着剤を介して上下の光学フィルム（５，９）が密着している状態をいう。融着とは、接着剤を介さず上下の光学フィルム（５，９）が直接密着している状態をいう。つまり樹脂層４は、互いに接着又は融着した光学フィルム（５，９）の端部から構成されていてよい。樹脂層４を構成する光学フィルム（５，９）の端部が互いに接着又は融着していることにより、偏光子７の端部７ｅが凹部２に露出し難く、偏光子７の端部７ｅが偏光板１の内部に封止され易く、凹部２における亀裂が抑制され易い。樹脂層４は、光学フィルム（５，９）に含まれる成分のみならなっていてよい。樹脂層４は、光学フィルム（５，９）に含まれる成分に加えて他の成分を更に含んでもよい。他の成分とは、例えば、偏光子７及び接着層のうち一方又は両方に由来する成分であってよい。樹脂層４において、一対の光学フィルム（５，９）其々の端部が一体化又は融合されていてよい。つまり樹脂層４において、一対の光学フィルム（５，９）の間の境界（界面）はなくてよい。 In the resin layer 4, the ends of the optical films (5, 9) may be adhered or fused to each other. Adhesion refers to a state in which the upper and lower optical films (5, 9) are in close contact with each other via an adhesive. Fusing refers to a state in which the upper and lower optical films (5, 9) are in direct contact with each other without using an adhesive. That is, the resin layer 4 may be composed of the ends of the optical films (5, 9) bonded or fused to each other. Since the ends of the optical films (5, 9) constituting the resin layer 4 are adhered to each other or fused to each other, the end 7e of the polarizer 7 is hardly exposed to the recess 2, and the end 7e of the polarizer 7 is hard to be exposed. Is easily sealed inside the polarizing plate 1, and cracks in the recess 2 are easily suppressed. The resin layer 4 may be composed of only the components contained in the optical film (5, 9). The resin layer 4 may further contain other components in addition to the components contained in the optical film (5, 9). The other component may be, for example, a component derived from one or both of the polarizer 7 and the adhesive layer. In the resin layer 4, the ends of the pair of optical films (5, 9) may be integrated or fused. That is, in the resin layer 4, there is no need for a boundary (interface) between the pair of optical films (5, 9).
凹部２の幅（Ｘ軸方向における凹部２の幅）は、特に限定されないが、例えば、３ｍｍ以上１６０ｍｍ以下であってよい。凹部２の深さ（Ｙ軸方向における凹部２の幅）は、特に限定されないが、例えば、０．５ｍｍ以上１６０ｍｍ以下であってよい。凹部２が形成されている偏光板１の辺（短辺）の長さは、特に限定されないが、例えば、３０ｍｍ以上９０ｍｍ以下であってよい。凹部２が形成されていない偏光板１の辺（長辺）の長さは、特に限定されないが、例えば、３０ｍｍ以上１７０ｍｍ以下であってよい。偏光板１全体の厚みは、特に限定されないが、例えば、３０μｍ以上３００μｍ以下であってよい。 The width of the recess 2 (the width of the recess 2 in the X-axis direction) is not particularly limited, but may be, for example, 3 mm or more and 160 mm or less. The depth of the recess 2 (the width of the recess 2 in the Y-axis direction) is not particularly limited, but may be, for example, 0.5 mm or more and 160 mm or less. The length of the side (short side) of the polarizing plate 1 on which the recess 2 is formed is not particularly limited, but may be, for example, 30 mm or more and 90 mm or less. The length of the side (long side) of the polarizing plate 1 in which the recess 2 is not formed is not particularly limited, but may be, for example, 30 mm or more and 170 mm or less. The thickness of the entire polarizing plate 1 is not particularly limited, but may be, for example, 30 μm or more and 300 μm or less.
図１に示される凹部２は四角形状（長方形状）である。ただし、凹部２の形状は限定されない。例えば、凹部２は正方形状であってもよい。凹部２は、四角形及び三角形以外の他の多角形であってもよい。例えば図７中の（ａ）に示すように、凹部２の形状は、半円であってもよい。図７中の（ｂ）に示すように、凹部２の形状は、三角形であってもよい。凹部２全体が曲線状であってもよい。凹部２が直線と曲線とから構成されていてもよい。図１、図７中の（ａ）及び図７中の（ｂ）に示される偏光板１の形状はいずれも対称性を有しているが、偏光板１の形状は非対称的であってもよい。複数の凹部２が偏光板１の外周１ｐに形成されていてもよい。複数の凹部２が、偏光板１の外周１ｐを構成する一つの辺に形成されてもよい。四角形状の偏光板１の四つの角部のうち少なくとも一つの角部が切り欠かれることにより、凹部２が形成されてよい。 The recess 2 shown in FIG. 1 has a rectangular shape (rectangular shape). However, the shape of the recess 2 is not limited. For example, the recess 2 may be square. The recess 2 may be a polygon other than a quadrangle and a triangle. For example, as shown in (a) in FIG. 7, the shape of the recess 2 may be a semicircle. As shown in (b) in FIG. 7, the shape of the recess 2 may be triangular. The entire recess 2 may be curved. The recess 2 may be composed of a straight line and a curved line. The shapes of the polarizing plate 1 shown in FIGS. 1 and 7 (a) and FIG. 7 (b) are all symmetrical, but even if the shape of the polarizing plate 1 is asymmetrical. Good. A plurality of recesses 2 may be formed on the outer circumference 1p of the polarizing plate 1. A plurality of recesses 2 may be formed on one side forming the outer circumference 1p of the polarizing plate 1. The recess 2 may be formed by cutting out at least one of the four corners of the rectangular polarizing plate 1.
凹部２を除く偏光板１の全体的な形状は、ほぼ四角形（長方形）である。ただし、偏光板１の形状は限定されない。たとえば、偏光板１の形状は正方形であってもよい。偏光板１の形状は、四角形以外の多角形、円形、又は楕円形であってもよい。偏光子７及び光学フィルム（５，９）其々の全体的な形状は、偏光板１の形状と略同じであってよい。図１に示される長方形状の偏光板１の場合、凹部２は偏光板１の短辺に形成されているが、凹部２は偏光板１の長辺に形成されていてもよい。 The overall shape of the polarizing plate 1 excluding the recess 2 is substantially quadrangular (rectangular). However, the shape of the polarizing plate 1 is not limited. For example, the shape of the polarizing plate 1 may be square. The shape of the polarizing plate 1 may be a polygon other than a quadrangle, a circle, or an ellipse. The overall shapes of the polarizer 7 and the optical films (5, 9) may be substantially the same as the shape of the polarizing plate 1. In the case of the rectangular polarizing plate 1 shown in FIG. 1, the recess 2 is formed on the short side of the polarizing plate 1, but the recess 2 may be formed on the long side of the polarizing plate 1.
偏光子７は、延伸、染色及び架橋等の工程によって作製されたフィルム状のポリビニルアルコール系樹脂（ＰＶＡフィルム）であってよい。偏光子７の作成方法の詳細は以下の通りである。 The polarizer 7 may be a film-like polyvinyl alcohol-based resin (PVA film) produced by steps such as stretching, dyeing, and crosslinking. The details of the method for producing the polarizer 7 are as follows.
例えば、まず、ＰＶＡフィルムを、一軸方向又は二軸方向に延伸する。一軸方向に延伸された偏光子７の二色比は高い傾向がある。延伸に続いて、染色液を用いて、ＰＶＡフィルムをヨウ素、二色性色素（ポリヨウ素）又は有機染料によって染色する。染色液は、ホウ酸、硫酸亜鉛、又は塩化亜鉛を含んでいてもよい。染色前にＰＶＡフィルムを水洗してもよい。水洗により、ＰＶＡフィルムの表面から、汚れ及びブロッキング防止剤が除去される。また水洗によってＰＶＡフィルムが膨潤する結果、染色の斑（不均一な染色）が抑制され易い。染色後のＰＶＡフィルムを、架橋のために、架橋剤の溶液（例えば、ホウ酸の水溶液）で処理する。架橋剤による処理後、ＰＶＡフィルムを水洗し、続いて乾燥する。以上の手順を経て、偏光子７が得られる。ポリビニルアルコール（ＰＶＡ）系樹脂は、ポリ酢酸ビニル系樹脂をケン化することにより得られる。ポリ酢酸ビニル系樹脂は、例えば、酢酸ビニルの単独重合体であるポリ酢酸ビニル、又は、酢酸ビニルと他の単量体との共重合体（例えば、エチレン−酢酸ビニル共重合体）であってよい。酢酸ビニルと共重合する他の単量体は、エチレンの他に、不飽和カルボン酸類、オレフィン類、ビニルエーテル類、不飽和スルホン酸類、又はアンモニウム基を有するアクリルアミド類であってよい。ポリビニルアルコール系樹脂は、アルデヒド類で変性されていてもよい。変性されたポリビニルアルコール系樹脂は、例えば、部分ホルマール化ポリビニルアルコール、ポリビニルアセタール、又はポリビニルブチラールであってよい。ポリビニルアルコール系樹脂は、ポリビニルアルコールの脱水処理物、又はポリ塩化ビニルの脱塩酸処理物等のポリエン系配向フィルムであってよい。延伸前に染色を行ってもよく、染色液中で延伸を行ってもよい。延伸された偏光子７の長さは、例えば、延伸前の長さの３〜７倍であってよい。 For example, first, the PVA film is stretched in the uniaxial direction or the biaxial direction. The bicolor ratio of the polarizer 7 stretched in the uniaxial direction tends to be high. Following stretching, the PVA film is dyed with iodine, a dichroic dye (polyiodine) or an organic dye using a dye solution. The staining solution may contain boric acid, zinc sulfate, or zinc chloride. The PVA film may be washed with water before dyeing. Washing with water removes stains and anti-blocking agents from the surface of the PVA film. Further, as a result of swelling of the PVA film by washing with water, stain spots (non-uniform dyeing) are likely to be suppressed. The dyed PVA film is treated with a solution of cross-linking agent (eg, an aqueous solution of boric acid) for cross-linking. After treatment with a cross-linking agent, the PVA film is washed with water and then dried. The polarizer 7 is obtained through the above procedure. The polyvinyl alcohol (PVA) -based resin is obtained by saponifying a polyvinyl acetate-based resin. The polyvinyl acetate-based resin is, for example, polyvinyl acetate, which is a homopolymer of vinyl acetate, or a copolymer of vinyl acetate and another monomer (for example, an ethylene-vinyl acetate copolymer). Good. In addition to ethylene, the other monomer copolymerized with vinyl acetate may be unsaturated carboxylic acids, olefins, vinyl ethers, unsaturated sulfonic acids, or acrylamides having an ammonium group. The polyvinyl alcohol-based resin may be modified with aldehydes. The modified polyvinyl alcohol-based resin may be, for example, partially formalized polyvinyl alcohol, polyvinyl acetal, or polyvinyl butyral. The polyvinyl alcohol-based resin may be a polyene-based oriented film such as a dehydrated product of polyvinyl alcohol or a dehydrochlorinated product of polyvinyl chloride. Staining may be performed before stretching, or stretching may be performed in a dyeing solution. The length of the stretched polarizer 7 may be, for example, 3 to 7 times the length before stretching.
偏光子７の厚みは、例えば、１μｍ以上５０μｍ以下、又は３μｍ以上１５μｍ以下であってよい。偏光子７が薄いほど、温度変化に伴う偏光子７自体の収縮又は膨張が抑制され、偏光子７自体の寸法の変化が抑制される。その結果、応力が偏光子７に作用し難く、偏光子７における亀裂が抑制され易い。 The thickness of the polarizer 7 may be, for example, 1 μm or more and 50 μm or less, or 3 μm or more and 15 μm or less. The thinner the polarizer 7, the more the contraction or expansion of the polarizer 7 due to the temperature change is suppressed, and the change in the dimensions of the polarizer 7 itself is suppressed. As a result, stress is less likely to act on the polarizer 7, and cracks in the polarizer 7 are likely to be suppressed.
以下では、説明の便宜上、一対の光学フィルム（５，９）のうち一方は第一光学フィルム５と表記され、他方は第二光学フィルム９と表記される。 In the following, for convenience of explanation, one of the pair of optical films (5, 9) is referred to as the first optical film 5, and the other is referred to as the second optical film 9.
第一光学フィルム５及び第二光学フィルム９其々は、透光性を有する熱可塑性樹脂であってよい。第一光学フィルム５及び第二光学フィルム９其々は、光学的に透明な熱可塑性樹脂であってもよい。第一光学フィルム５及び第二光学フィルム９其々を構成する樹脂は、例えば、鎖状ポリオレフィン系樹脂、環状オレフィンポリマー系樹脂（ＣＯＰ系樹脂）、セルロースエステル系樹脂、ポリエステル系樹脂、ポリカーボネート系樹脂、（メタ）アクリル系樹脂、ポリスチレン系樹脂、又はこれらの混合物若しくは共重合体であってよい。第一光学フィルム５の組成は、第二光学フィルム９の組成と全く同じであってよい。例えば、第一光学フィルム５及び第二光学フィルム９其々が環状オレフィンポリマー系樹脂（ＣＯＰ系樹脂）を含んでよい。第一光学フィルム５及び第二光学フィルム９其々が環状オレフィンポリマー系樹脂（ＣＯＰ系樹脂）を含む場合、本発明の効果が得られ易い。第一光学フィルム５の組成は、第二光学フィルム９の組成と異なっていてもよい。第一光学フィルム５及び第二光学フィルム９其々のガラス転移温度は、１００℃以上２００℃以下、又は１２０℃以上１５０℃以下であることが好ましい。第一光学フィルム５及び第二光学フィルム９其々のガラス転移温度が上記範囲である場合、各光学フィルムの端部の研磨によって発生する熱により、第一光学フィルム５及び第二光学フィルム９が互いに融着し易い。 The first optical film 5 and the second optical film 9 may each be a translucent thermoplastic resin. The first optical film 5 and the second optical film 9 may each be an optically transparent thermoplastic resin. The resins constituting the first optical film 5 and the second optical film 9 are, for example, a chain polyolefin resin, a cyclic olefin polymer resin (COP resin), a cellulose ester resin, a polyester resin, and a polycarbonate resin. , (Meta) acrylic resin, polystyrene resin, or a mixture or copolymer thereof. The composition of the first optical film 5 may be exactly the same as the composition of the second optical film 9. For example, the first optical film 5 and the second optical film 9 may each contain a cyclic olefin polymer-based resin (COP-based resin). When the first optical film 5 and the second optical film 9 each contain a cyclic olefin polymer-based resin (COP-based resin), the effects of the present invention can be easily obtained. The composition of the first optical film 5 may be different from the composition of the second optical film 9. The glass transition temperature of each of the first optical film 5 and the second optical film 9 is preferably 100 ° C. or higher and 200 ° C. or lower, or 120 ° C. or higher and 150 ° C. or lower. When the glass transition temperature of each of the first optical film 5 and the second optical film 9 is in the above range, the heat generated by polishing the edge of each optical film causes the first optical film 5 and the second optical film 9 to move. Easy to fuse with each other.
鎖状ポリオレフィン系樹脂は、例えば、ポリエチレン樹脂又はポリプロピレン樹脂のような鎖状オレフィンの単独重合体であってよい。鎖状ポリオレフィン系樹脂は、二種以上の鎖状オレフィンからなる共重合体であってもよい。 The chain polyolefin resin may be, for example, a homopolymer of a chain olefin such as a polyethylene resin or a polypropylene resin. The chain polyolefin resin may be a copolymer composed of two or more kinds of chain olefins.
環状オレフィンポリマー系樹脂（環状ポリオレフィン系樹脂）は、例えば、環状オレフィンの開環（共）重合体、又は環状オレフィンの付加重合体であってよい。環状オレフィンポリマー系樹脂は、例えば、環状オレフィンと鎖状オレフィンとの共重合体（例えば、ランダム共重合体）であってよい。共重合体を構成する鎖状オレフィンは、例えば、エチレン又はプロピレンであってよい。環状オレフィンポリマー系樹脂は、上記の重合体を不飽和カルボン酸若しくはその誘導体で変性したグラフト重合体、又はそれらの水素化物であってもよい。環状オレフィンポリマー系樹脂は、例えば、ノルボルネン又は多環ノルボルネン系モノマー等のノルボルネン系モノマーを用いたノルボルネン系樹脂であってよい。 The cyclic olefin polymer resin (cyclic polyolefin resin) may be, for example, a ring-opening (co) polymer of cyclic olefin or an addition polymer of cyclic olefin. The cyclic olefin polymer-based resin may be, for example, a copolymer of a cyclic olefin and a chain olefin (for example, a random copolymer). The chain olefin constituting the copolymer may be, for example, ethylene or propylene. The cyclic olefin polymer resin may be a graft polymer obtained by modifying the above polymer with an unsaturated carboxylic acid or a derivative thereof, or a hydride thereof. The cyclic olefin polymer-based resin may be, for example, a norbornene-based resin using a norbornene-based monomer such as norbornene or a polycyclic norbornene-based monomer.
セルロースエステル系樹脂は、例えば、セルローストリアセテート（トリアセチルセルロース（ＴＡＣ））、セルロースジアセテート、セルローストリプロピオネート又はセルロースジプロピオネートであってよい。これらの共重合物を用いてもよい。水酸基の一部が他の置換基で修飾されたセルロースエステル系樹脂を用いてもよい。 The cellulosic ester-based resin may be, for example, cellulose triacetate (triacetyl cellulose (TAC)), cellulose diacetate, cellulose tripropionate or cellulose dipropionate. These copolymers may be used. A cellulosic ester resin in which a part of the hydroxyl group is modified with another substituent may be used.
セルロースエステル系樹脂以外のポリエステル系樹脂を用いてもよい。ポリエステル系樹脂は、例えば、多価カルボン酸又はその誘導体と多価アルコールとの重縮合体であってよい。多価カルボン酸又はその誘導体は、ジカルボン酸又はその誘導体であってよい。多価カルボン酸又はその誘導体は、例えば、テレフタル酸、イソフタル酸、ジメチルテレフタレート、又はナフタレンジカルボン酸ジメチルであってよい。多価アルコールは、例えば、ジオールであってよい。多価アルコールは、例えば、エチレングリコール、プロパンジオール、ブタンジオール、ネオペンチルグリコール、又はシクロヘキサンジメタノールであってよい。 A polyester resin other than the cellulose ester resin may be used. The polyester resin may be, for example, a polycondensate of a polyvalent carboxylic acid or a derivative thereof and a polyhydric alcohol. The polyvalent carboxylic acid or a derivative thereof may be a dicarboxylic acid or a derivative thereof. The polyvalent carboxylic acid or a derivative thereof may be, for example, terephthalic acid, isophthalic acid, dimethyl terephthalate, or dimethyl naphthalenedicarboxylic acid. The polyhydric alcohol may be, for example, a diol. The polyhydric alcohol may be, for example, ethylene glycol, propanediol, butanediol, neopentyl glycol, or cyclohexanedimethanol.
ポリエステル系樹脂は、例えば、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンナフタレート、ポリトリメチレンテレフタレート、ポリトリメチレンナフタレート、ポリシクロへキサンジメチルテレフタレート、又はポリシクロヘキサンジメチルナフタレートであってよい。 The polyester resin may be, for example, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polytrimethylene terephthalate, polytrimethylene naphthalate, polycyclohexanedimethylterephthalate, or polycyclohexanedimethylnaphthalate. ..
ポリカーボネート系樹脂は、カルボナート基を介して重合単位（モノマー）が結合された重合体である。ポリカーボネート系樹脂は、修飾されたポリマー骨格を有する変性ポリカーボネートであってよく、共重合ポリカーボネートであってもよい。 The polycarbonate-based resin is a polymer in which a polymerization unit (monomer) is bonded via a carbonate group. The polycarbonate-based resin may be a modified polycarbonate having a modified polymer skeleton, or may be a copolymerized polycarbonate.
（メタ）アクリル系樹脂は、例えば、ポリ（メタ）アクリル酸エステル（例えば、ポリメタクリル酸メチル（ＰＭＭＡ））；メタクリル酸メチル−（メタ）アクリル酸共重合体；メタクリル酸メチル−（メタ）アクリル酸エステル共重合体；メタクリル酸メチル−アクリル酸エステル−（メタ）アクリル酸共重合体；（メタ）アクリル酸メチル−スチレン共重合体（例えば、ＭＳ樹脂）；メタクリル酸メチルと脂環族炭化水素基を有する化合物との共重合体（例えば、メタクリル酸メチル−メタクリル酸シクロヘキシル共重合体、メタクリル酸メチル−（メタ）アクリル酸ノルボルニル共重合体等）であってよい。 The (meth) acrylic resin is, for example, a poly (meth) acrylic acid ester (for example, polymethyl methacrylate (PMMA)); a methyl methacrylate- (meth) acrylic acid copolymer; a methyl methacrylate- (meth) acrylic. Acid ester copolymer; Methyl methacrylate-acrylic acid ester- (meth) acrylic acid copolymer; (meth) methyl acrylate-styrene copolymer (eg, MS resin); methyl methacrylate and alicyclic hydrocarbon It may be a copolymer with a compound having a group (for example, methyl methacrylate-cyclohexyl methacrylate copolymer, methyl methacrylate- (meth) acrylate norbornyl copolymer, etc.).
第一光学フィルム５又は第二光学フィルム９其々は、滑剤、可塑剤、分散剤、熱安定剤、紫外線吸収剤、赤外線吸収剤、帯電防止剤、及び酸化防止剤からな群より選ばれる少なくとも一種の添加剤を含んでよい。 The first optical film 5 or the second optical film 9 is at least selected from the group consisting of lubricants, plasticizers, dispersants, heat stabilizers, ultraviolet absorbers, infrared absorbers, antistatic agents, and antioxidants. It may contain a kind of additive.
第一光学フィルム５の厚みは、例えば、５μｍ以上９０μｍ以下、又は１０μｍ以上６０μｍ以下であってよい。第二光学フィルム９の厚みも、例えば、５μｍ以上９０μｍ以下、又は１０μｍ以上６０μｍ以下であってよい。 The thickness of the first optical film 5 may be, for example, 5 μm or more and 90 μm or less, or 10 μm or more and 60 μm or less. The thickness of the second optical film 9 may also be, for example, 5 μm or more and 90 μm or less, or 10 μm or more and 60 μm or less.
第一光学フィルム５及び第二光学フィルム９のうち少なくとも一方は、光学機能を有するフィルムであってよい。光学機能を有するフィルムとは、例えば、位相差フィルム又は輝度向上フィルムであってよい。例えば、上記熱可塑性樹脂からなるフィルムを延伸したり、該フィルム上に液晶層等を形成したりすることにより、任意の位相差値が付与された位相差フィルムが得られる。 At least one of the first optical film 5 and the second optical film 9 may be a film having an optical function. The film having an optical function may be, for example, a retardation film or a brightness improving film. For example, by stretching a film made of the above-mentioned thermoplastic resin or forming a liquid crystal layer or the like on the film, a retardation film to which an arbitrary retardation value is given can be obtained.
第一光学フィルム５は、接着層を介して、偏光子７に重ねられてよい。第二光学フィルム９も、接着層を介して、偏光子７に重ねられてよい。接着層は、ポリビニルアルコール等の水系接着剤を含んでよい。接着層は、後述する活性エネルギー線硬化性樹脂を含んでもよい。 The first optical film 5 may be superposed on the polarizer 7 via an adhesive layer. The second optical film 9 may also be superimposed on the polarizer 7 via an adhesive layer. The adhesive layer may contain a water-based adhesive such as polyvinyl alcohol. The adhesive layer may contain an active energy ray-curable resin described later.
活性エネルギー線硬化性樹脂は、活性エネルギー線を照射されることにより、硬化する樹脂である。活性エネルギー線は、例えば、紫外線、可視光、電子線、又はＸ線であってよい。例えば、活性エネルギー線硬化性樹脂は、紫外線硬化性樹脂であってよい。 The active energy ray-curable resin is a resin that is cured by being irradiated with active energy rays. The active energy ray may be, for example, ultraviolet light, visible light, electron beam, or X-ray. For example, the active energy ray-curable resin may be an ultraviolet curable resin.
活性エネルギー線硬化性樹脂は、一種の樹脂であってよく、複数種の樹脂を含んでもよい。例えば、活性エネルギー線硬化性樹脂は、カチオン重合性の硬化性化合物、又はラジカル重合性の硬化性化合物を含んでよい。活性エネルギー線硬化性樹脂は、上記硬化性化合物の硬化反応を開始させるためのカチオン重合開始剤又はラジカル重合開始剤を含んでよい。 The active energy ray-curable resin may be a kind of resin and may contain a plurality of kinds of resins. For example, the active energy ray-curable resin may contain a cationically polymerizable curable compound or a radically polymerizable curable compound. The active energy ray-curable resin may contain a cationic polymerization initiator or a radical polymerization initiator for initiating the curing reaction of the curable compound.
カチオン重合性の硬化性化合物は、例えば、エポキシ系化合物（分子内に少なくとも一つのエポキシ基を有する化合物）、又はオキセタン系化合物（分子内に少なくとも一つのオキセタン環を有する化合物）であってよい。ラジカル重合性の硬化性化合物は、例えば、（メタ）アクリル系化合物（分子内に少なくとも一つの（メタ）アクリロイルオキシ基を有する化合物）であってよい。ラジカル重合性の硬化性化合物は、ラジカル重合性の二重結合を有するビニル系化合物であってもよい。 The cationically polymerizable curable compound may be, for example, an epoxy-based compound (a compound having at least one epoxy group in the molecule) or an oxetane-based compound (a compound having at least one oxetane ring in the molecule). The radically polymerizable curable compound may be, for example, a (meth) acrylic compound (a compound having at least one (meth) acryloyloxy group in the molecule). The radically polymerizable curable compound may be a vinyl compound having a radically polymerizable double bond.
活性エネルギー線硬化性樹脂は、必要に応じて、カチオン重合促進剤、イオントラップ剤、酸化防止剤、連鎖移動剤、粘着付与剤、熱可塑性樹脂、充填剤、流動調整剤、可塑剤、消泡剤、帯電防止剤、レベリング剤、又は溶剤等を含んでよい。 The active energy ray-curable resin may be a cationic polymerization accelerator, an ion trapping agent, an antioxidant, a chain transfer agent, a tackifier, a thermoplastic resin, a filler, a flow conditioner, a plasticizer, or a defoaming agent, if necessary. It may contain an agent, an antistatic agent, a leveling agent, a solvent and the like.
（画像表示装置）
本実施形態に係る画像表示装置は、上記の偏光板１を含む。画像表示装置は、例えば、液晶表示装置又は有機ＥＬ表示装置等であってよい。例えば、液晶表示装置が有する液晶パネルが、液晶セルと、液晶セルの一方の表面に重なる上記偏光板１を備えてよい。または、液晶表示装置が有する液晶パネルが、一対の上記偏光板１と、一対の上記偏光板１の間に配置され、各偏光板１と重なる液晶セルを備えていてもよい。偏光板１は、接着層又は粘着層を介して液晶セルに重ねられてよい。
(Image display device)
The image display device according to the present embodiment includes the above-mentioned polarizing plate 1. The image display device may be, for example, a liquid crystal display device, an organic EL display device, or the like. For example, the liquid crystal panel of the liquid crystal display device may include the liquid crystal cell and the polarizing plate 1 that overlaps one surface of the liquid crystal cell. Alternatively, the liquid crystal panel included in the liquid crystal display device may be arranged between the pair of the polarizing plates 1 and the pair of polarizing plates 1 and may include a liquid crystal cell that overlaps with each polarizing plate 1. The polarizing plate 1 may be superposed on the liquid crystal cell via an adhesive layer or an adhesive layer.
（偏光板の製造方法）
本実施形態に係る偏光板１の製造方法は、フィルム状の偏光子と少なくとも一対の光学フィルムを重ねて、積層体を形成する積層工程と、エンドミルを積層体の外周に接触させて、エンドミルを積層体の外周に沿って移動させる切削工程と、を備える。
(Manufacturing method of polarizing plate)
The method for manufacturing the polarizing plate 1 according to the present embodiment includes a laminating step of superimposing a film-shaped polarizing element and at least a pair of optical films to form a laminated body, and an end mill in contact with the outer periphery of the laminated body to form an end mill. It includes a cutting step of moving along the outer periphery of the laminate.
積層工程では、長尺な帯状の偏光子フィルムと、少なくとも一対の長尺な帯状の光学フィルムを重ねて互いに貼合することにより、積層体（第一積層体）を作製する。長尺な帯状の偏光子フィルムとは、加工・成形前の偏光子７である。長尺な帯状の複数の光学フィルムとは、加工・成形前の光学フィルム（５，９）である。積層工程では、偏光子フィルムが一対の光学フィルムの間に配置されるように、偏光子フィルム及び一対の光学フィルムが重ねられる。つまり図４に示されるように、第一積層体１０において、偏光子７は一対の光学フィルム（５，９）の間に位置する。第一積層体１０の切断により、第一積層体１０の寸法が、加工し易い寸法へ調整されてよい。図４に示されるように、切削工程前の第一積層体１０の外周全域において、偏光子７及び光学フィルム（５，９）其々の端部の位置は揃っていてよい。 In the laminating step, a laminated body (first laminated body) is produced by laminating a long strip-shaped polarizing film and at least a pair of long strip-shaped optical films and laminating them to each other. The long strip-shaped polarizer film is the polarizer 7 before processing and molding. The plurality of long strip-shaped optical films are optical films (5, 9) before processing and molding. In the laminating step, the polarizing film and the pair of optical films are laminated so that the polarizing film is arranged between the pair of optical films. That is, as shown in FIG. 4, in the first laminated body 10, the polarizer 7 is located between the pair of optical films (5, 9). By cutting the first laminated body 10, the dimensions of the first laminated body 10 may be adjusted to dimensions that are easy to process. As shown in FIG. 4, the positions of the ends of the polarizer 7 and the optical film (5, 9) may be aligned with each other over the entire outer circumference of the first laminated body 10 before the cutting process.
切削工程の前に、打ち抜き加工、又は切断加工によって、第一積層体の外周に凹部を形成してもよい。切断加工の手段としては、刃物又はレーザーが用いられてよい。ただし、打ち抜き加工又は切断加工だけでは、上述の樹脂層を形成することは困難であり、偏光子が凹部において露出し易い。 Prior to the cutting step, a recess may be formed on the outer periphery of the first laminated body by punching or cutting. A cutting tool or a laser may be used as a means for cutting. However, it is difficult to form the above-mentioned resin layer only by punching or cutting, and the polarizer is easily exposed in the recess.
図５及び図６に示されるように、切削工程に用いられるエンドミル５０は、その回転軸線５０ａに略平行な側面において突出する刃（エッジ）５０ｅを有している。切削工程では、エンドミル５０の側面を第一積層体１０の外周（端面）に接触させて、回転するエンドミル５０を第一積層体１０の外周に沿って移動させる。例えば、回転するエンドミル５０を図６中の矢印で示される経路に沿って移動させてよい。その結果、第一積層体１０の外周（端面）が刃５０ｅによって切削又は研磨され、第一積層体１０の外周（端面）が平滑になり、凹部２が形成され、凹部２の内側の隅が面取りされる。図５に示されるように、複数の第一積層体１０を重ねて、第二積層体１００を形成した後、エンドミル５０の側面を第二積層体１００の外周（端面）に接触させて、回転するエンドミル５０を第二積層体１００の外周に沿って移動させてもよい。つまり切削工程では、第二積層体１００を構成する複数の第一積層体１０の外周をエンドミル５０で一括して切削又は研磨してよい。切削工程では、凹部２の両端に位置する角部、及び第一積層体１０の四隅に位置する角部其々が面取りされていてよい。 As shown in FIGS. 5 and 6, the end mill 50 used in the cutting process has a blade (edge) 50e protruding on a side surface substantially parallel to the rotation axis 50a. In the cutting step, the side surface of the end mill 50 is brought into contact with the outer circumference (end face) of the first laminated body 10, and the rotating end mill 50 is moved along the outer circumference of the first laminated body 10. For example, the rotating end mill 50 may be moved along the path indicated by the arrow in FIG. As a result, the outer circumference (end face) of the first laminated body 10 is cut or polished by the blade 50e, the outer circumference (end face) of the first laminated body 10 is smoothed, the recess 2 is formed, and the inner corner of the recess 2 is formed. Be chamfered. As shown in FIG. 5, a plurality of first laminated bodies 10 are stacked to form a second laminated body 100, and then the side surface of the end mill 50 is brought into contact with the outer periphery (end face) of the second laminated body 100 to rotate. The end mill 50 may be moved along the outer circumference of the second laminated body 100. That is, in the cutting step, the outer circumferences of the plurality of first laminated bodies 10 constituting the second laminated body 100 may be collectively cut or polished by the end mill 50. In the cutting step, the corners located at both ends of the recess 2 and the corners located at the four corners of the first laminated body 10 may be chamfered.
切削工程では、エンドミル５０と第一積層体１０の端面との摩擦によって、摩擦熱が発生する。この摩擦熱によって、凹部２に露出する光学フィルム（５，９）其々の端部が互いに融着して、樹脂層４が形成される。切削工程を少なくとも二回繰り返すことにより、凹部２及び樹脂層４が形成されてもよい。切削工程が繰り返される場合、一回目の切削工程により、第一積層体１０が粗く加工されてよい。つまり、一回目の切削工程によって、凹部２の寸法及び形状が粗く調整されたり、凹部２の内側の隅２ｃが面取されたりしてよい。二回目の切削工程により、第一積層体１０が偏光板１へ仕上げられてよい。切削工程が少なくとも二回繰り返されることにより、樹脂層４が形成され易く、第一積層体１０の端面にある凹凸（亀裂の一因）が低減され、第一積層体１０の端面が十分に平滑になり易い。その結果、偏光板１の凹部２におけるクラックを抑制し易い。 In the cutting process, frictional heat is generated by friction between the end mill 50 and the end face of the first laminated body 10. Due to this frictional heat, the ends of the optical films (5, 9) exposed in the recess 2 are fused to each other to form the resin layer 4 . The recess 2 and the resin layer 4 may be formed by repeating the cutting process at least twice. When the cutting process is repeated, the first laminated body 10 may be roughly processed by the first cutting process. That is, the size and shape of the recess 2 may be roughly adjusted by the first cutting step, or the inner corner 2c of the recess 2 may be chamfered. The first laminated body 10 may be finished into the polarizing plate 1 by the second cutting step. By repeating the cutting process at least twice, the resin layer 4 is easily formed, the unevenness (a cause of cracks) on the end face of the first laminated body 10 is reduced, and the end face of the first laminated body 10 is sufficiently smooth. It is easy to become. As a result, it is easy to suppress cracks in the recess 2 of the polarizing plate 1.
切削工程は三回以上繰り返されてもよい。例えば、三回目の切削工程では、第一積層体１０を殆ど切削することになく、二回目の切削工程において生じた切り屑を第一積層体１０の端面から除去してよい。各切削工程では、複数のエンドミルを用いてよい。 The cutting process may be repeated three or more times. For example, in the third cutting step, the chips generated in the second cutting step may be removed from the end face of the first laminated body 10 without cutting the first laminated body 10. A plurality of end mills may be used in each cutting process.
切削工程におけるエンドミルの送り速度は、１００ｍｍ／分以上１０００ｍｍ／分未満であってよい。エンドミルの送り速度が１００ｍｍ／分以上である場合、樹脂層４が形成され易い。ただしエンドミルの送り速度１０００ｍｍ／分以上である場合、樹脂層４が形成され難く、偏光子７が凹部において露出し易い。樹脂層４が形成され易いことから、切削工程におけるエンドミルの送り速度は、１００ｍｍ／分以上５００ｍｍ／分以下、又は１００ｍｍ／分以上３００ｍｍ／分以下であってもよい。 The feed rate of the end mill in the cutting step may be 100 mm / min or more and less than 1000 mm / min. When the feed rate of the end mill is 100 mm / min or more, the resin layer 4 is likely to be formed. However, when the feed rate of the end mill is 1000 mm / min or more, the resin layer 4 is difficult to be formed, and the polarizer 7 is easily exposed in the recess. Since the resin layer 4 is easily formed, the feed rate of the end mill in the cutting step may be 100 mm / min or more and 500 mm / min or less, or 100 mm / min or more and 300 mm / min or less.
樹脂層４が形成され易く、偏光板１の凹部２における亀裂を抑制し易いことから、切削工程におけるエンドミルの回転速度は、例えば、５００ｒｐｍ以上６００００ｒｐｍ以下、好ましくは１００００ｒｐｍ以上６００００ｒｐｍ以下であってよい。樹脂層４が形成され易く、偏光板１の凹部２における亀裂を抑制し易いことから、切削工程における切削角度は、例えば、３０°以上７０°以下、好ましくは４５°以上６５°以下であってよい。エンドミル５０のねじれ角がαである場合、切削角度βは９０°−αと定義される。図５に示されるように、エンドミル５０のねじれ角αは、エンドミル５０の側面において刃５０ｅが延びる方向ｄ１とエンドミル５０の回転軸線５０ａがなす角度である。切削角度βは、刃５０ｅが延びる方向ｄ１と回転軸線５０ａに垂直な方向ｄ２がなす角度と言い換えられてもよい。樹脂層４が形成され易く、偏光板１の凹部２における亀裂を抑制し易いことから、切削工程に用いるエンドミル５０の直径φ（太さ）は、例えば、３．０ｍｍ以上６．０ｍｍ以下であってよい。 Since the resin layer 4 is easily formed and cracks in the recess 2 of the polarizing plate 1 are easily suppressed, the rotation speed of the end mill in the cutting step may be, for example, 500 rpm or more and 60,000 rpm or less, preferably 10,000 rpm or more and 60,000 rpm or less. Since the resin layer 4 is easily formed and cracks in the recess 2 of the polarizing plate 1 are easily suppressed, the cutting angle in the cutting step is, for example, 30 ° or more and 70 ° or less, preferably 45 ° or more and 65 ° or less. Good. When the twist angle of the end mill 50 is α, the cutting angle β is defined as 90 ° −α. As shown in FIG. 5, the twist angle α of the end mill 50 is an angle formed by the direction d1 in which the blade 50e extends on the side surface of the end mill 50 and the rotation axis 50a of the end mill 50. The cutting angle β may be rephrased as the angle formed by the direction d1 in which the blade 50e extends and the direction d2 perpendicular to the rotation axis 50a. Since the resin layer 4 is easily formed and cracks in the recess 2 of the polarizing plate 1 are easily suppressed, the diameter φ (thickness) of the end mill 50 used in the cutting process is, for example, 3.0 mm or more and 6.0 mm or less. You can.
切削工程におけるエンドミル５０の送り速度は、Ｖ［ｍ／分］又はＶ／６０［ｍ／秒］と表されてよい。切削工程におけるエンドミル５０の回転速度は、Ｒ［ｒｐｍ］又はＲ／６０［ｒｐｓ］と表されてよい。切削工程におけるエンドミル５０の当接回数は、Ｒ／Ｖ［回／ｍ］と定義される。当接回数は、第一積層体１０の外周の単位長さ（１ｍ）にエンドミル５０が接触する回数を意味する。当接回数Ｒ／Ｖが大きいほど、エンドミル５０と第一積層体１０との摩擦によって生じる熱が大きく、光学フィルム（５，９）其々の端部が互いに融着し易く、樹脂層４が形成され易い。以上の理由から、切削工程におけるエンドミル５０の当接回数Ｒ／Ｖは、４０，０００回／ｍ以上５００，０００回／ｍ以下、８０，０００回／ｍ以上４００，０００回／ｍ以下、又は１００，０００回／ｍ以上３００，０００回／ｍ以下であることが好ましい。 The feed rate of the end mill 50 in the cutting process may be expressed as V [m / min] or V / 60 [m / sec]. The rotational speed of the end mill 50 in the cutting process may be expressed as R [rpm] or R / 60 [rps]. The number of contacts of the end mill 50 in the cutting process is defined as R / V [times / m]. The number of contacts means the number of times that the end mill 50 contacts the unit length (1 m) of the outer circumference of the first laminated body 10. The larger the number of contacts R / V, the greater the heat generated by the friction between the end mill 50 and the first laminated body 10, the ends of the optical films (5, 9) are easily fused to each other, and the resin layer 4 is formed. Easy to form. For the above reasons, the number of contacts R / V of the end mill 50 in the cutting process is 40,000 times / m or more and 500,000 times / m or less, 80,000 times / m or more and 400,000 times / m or less, or It is preferably 100,000 times / m or more and 300,000 times / m or less.
樹脂層４の幅４ｗは、上記の切削工程において制御され得る。樹脂層４の幅４ｗは、切削工程以外の方法によって制御されてもよい。例えば、高温の金属製工具を第一積層体１０の外周へ接触させる方法によって、樹脂層４の幅４ｗが制御されてよい。この方法の場合、金属製工具の温度は、１００℃以上３００℃以下、又は１５０℃以上２５０℃以下であってよい。高温の金属製工具を第一積層体１０の外周へ接触させる方法によれば、樹脂層４の幅４ｗを大きくし易い。 The width 4w of the resin layer 4 can be controlled in the above cutting process. The width 4w of the resin layer 4 may be controlled by a method other than the cutting process. For example, the width 4w of the resin layer 4 may be controlled by a method of bringing a high-temperature metal tool into contact with the outer periphery of the first laminated body 10. In the case of this method, the temperature of the metal tool may be 100 ° C. or higher and 300 ° C. or lower, or 150 ° C. or higher and 250 ° C. or lower. According to the method of bringing a high-temperature metal tool into contact with the outer periphery of the first laminated body 10, it is easy to increase the width 4w of the resin layer 4.
以上の方法により、本実施形態に係る偏光板１が得られる。 By the above method, the polarizing plate 1 according to the present embodiment can be obtained.
（他の実施形態）
本発明は上記実施形態に限定されるものではない。
(Other embodiments)
The present invention is not limited to the above embodiment.
例えば、偏光板は、一対の光学フィルム加えて、樹脂を含む別の光学フィルムを更に備えてよい。つまり、偏光板は、３枚以上の光学フィルムを備えていてよい。樹脂層は、一対の光学フィルムに加えて更に別の光学フィルムと連続していてよい。換言すれば、樹脂層は３枚以上の光学フィルムと連続していてよい。例えば、図３に示されるように、偏光板が、第一光学フィルム５及び第二光学フィルム９と、第一光学フィルム５及び第二光学フィルム９の間に位置する偏光子７と、第一光学フィルム５に重なる第三光学フィルム３を備えてよく、樹脂層４が、第一光学フィルム５、第二光学フィルム９及び第三光学フィルム３と連続していてよい。第三光学フィルム３は、上述の接着層を介して第一光学フィルム５に重ねられてよい。第三光学フィルム３に含まれる樹脂は、第一光学フィルム５及び第二光学フィルム９其々に含まれる樹脂として列挙された上記の樹脂のうち少なくともいずれかであってよい。第三光学フィルム３の組成は、第一光学フィルム５の組成と同じであってよい。第三光学フィルム３の組成は、第一光学フィルム５の組成と異なってもよい。第三光学フィルム３の組成は、第二光学フィルム９の組成と同じであってよい。第三光学フィルム３の組成は、第二光学フィルム９の組成と異なってもよい。第三光学フィルム３の厚みは、例えば、５μｍ以上２００μｍ以下であってよい。第三光学フィルム３が樹脂層４と連続していない場合、第三光学フィルム３は、画像表示装置の製造過程において、偏光板から剥離され、除去されてよい。つまり、第三光学フィルム３は、仮の保護フィルムであってよい。 For example, the polarizing plate may further include another optical film containing a resin in addition to the pair of optical films. That is, the polarizing plate may include three or more optical films. The resin layer may be continuous with yet another optical film in addition to the pair of optical films. In other words, the resin layer may be continuous with three or more optical films. For example, as shown in FIG. 3, the polarizing plate includes the first optical film 5 and the second optical film 9, the polarizer 7 located between the first optical film 5 and the second optical film 9, and the first. A third optical film 3 that overlaps the optical film 5 may be provided, and the resin layer 4 may be continuous with the first optical film 5, the second optical film 9, and the third optical film 3. The third optical film 3 may be superposed on the first optical film 5 via the adhesive layer described above. The resin contained in the third optical film 3 may be at least one of the above-mentioned resins listed as the resin contained in each of the first optical film 5 and the second optical film 9. The composition of the third optical film 3 may be the same as the composition of the first optical film 5. The composition of the third optical film 3 may be different from the composition of the first optical film 5. The composition of the third optical film 3 may be the same as the composition of the second optical film 9. The composition of the third optical film 3 may be different from the composition of the second optical film 9. The thickness of the third optical film 3 may be, for example, 5 μm or more and 200 μm or less. When the third optical film 3 is not continuous with the resin layer 4, the third optical film 3 may be peeled off from the polarizing plate and removed in the manufacturing process of the image display device. That is, the third optical film 3 may be a temporary protective film.
偏光板は、一対の光学フィルムのうち一方に重なる粘着層と、粘着層に重なる離型フィルムを更に備えてよい。例えば、図３に示される偏光板は、第二光学フィルム９に重なる粘着層と、粘着層に重なる離型フィルムを更に備えてよい。粘着層は、例えば、アクリル系感圧型接着剤、ゴム系感圧型接着剤、シリコーン系感圧型接着剤、又はウレタン系感圧型接着剤などの感圧型接着剤を含んでよい。粘着層の厚みは、例えば、２μｍ以上１００μｍ以下であってよい。離型フィルムに含まれる樹脂は、第一光学フィルム５及び第二光学フィルム９其々に含まれる樹脂として列挙された上記の樹脂のうち少なくともいずれかであってよい。離型フィルムの組成は、第一光学フィルム５の組成と同じであってよい。離型フィルムの組成は、第一光学フィルム５の組成と異なってもよい。離型フィルムの組成は、第二光学フィルム９の組成と同じであってよい。離型フィルムの組成は、第二光学フィルム９の組成と異なってもよい。離型フィルムの厚みは、例えば、１０μｍ以上１００μｍ以下であってよい。離型フィルムは、画像表示装置の製造過程において、偏光板から剥離され、除去されてよい。離型フィルムが、粘着層を介して、偏光板の両面に配置されていてもよい。 The polarizing plate may further include an adhesive layer that overlaps one of the pair of optical films and a release film that overlaps the adhesive layer. For example, the polarizing plate shown in FIG. 3 may further include an adhesive layer that overlaps the second optical film 9 and a release film that overlaps the adhesive layer. The pressure-sensitive adhesive layer may contain, for example, a pressure-sensitive adhesive such as an acrylic pressure-sensitive adhesive, a rubber-based pressure-sensitive adhesive, a silicone-based pressure-sensitive adhesive, or a urethane-based pressure-sensitive adhesive. The thickness of the adhesive layer may be, for example, 2 μm or more and 100 μm or less. The resin contained in the release film may be at least one of the above-mentioned resins listed as the resin contained in each of the first optical film 5 and the second optical film 9. The composition of the release film may be the same as the composition of the first optical film 5. The composition of the release film may be different from the composition of the first optical film 5. The composition of the release film may be the same as the composition of the second optical film 9. The composition of the release film may be different from the composition of the second optical film 9. The thickness of the release film may be, for example, 10 μm or more and 100 μm or less. The release film may be peeled off and removed from the polarizing plate in the manufacturing process of the image display device. The release film may be arranged on both sides of the polarizing plate via the adhesive layer.
偏光板は、光学フィルム又は層として、反射型偏光フィルム、防眩機能付フィルム、表面反射防止機能付フィルム、反射フィルム、半透過反射フィルム、視野角補償フィルム、ウインドウフィルム、帯電防止層、ハードコート層、光学補償層、タッチセンサー層、及び防汚層からなる群より選ばれる少なくとも一種を更に備えてよい。 As an optical film or layer, the polarizing plate may be a reflective polarizing film, a film with an antiglare function, a film with a surface antireflection function, a reflection film, a transflective reflective film, a viewing angle compensation film, a window film, an antistatic layer, or a hard coat. It may further include at least one selected from the group consisting of a layer, an optical compensation layer, a touch sensor layer, and an antifouling layer.
以下では実施例及び比較例により本発明をさらに詳細に説明するが、本発明はこれらの例によって何ら限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to these examples.
（実施例１）
一対の光学フィルムを、接着層を介して偏光子に貼合することにより、第一積層体を形成した。第一積層体の長方形状であった。第一積層体において、偏光子は一対の光学フィルムの間に配置された。一対の光学フィルムはいずれも、環状オレフィンポリマー系樹脂から構成されていた。偏光子は、延伸され、且つ染色されたフィルム状のポリビニルアルコールであった。
(Example 1)
The first laminated body was formed by adhering the pair of optical films to the polarizer via the adhesive layer. It had a rectangular shape in the first laminated body. In the first laminate, the polarizer was placed between a pair of optical films. Each of the pair of optical films was composed of a cyclic olefin polymer-based resin. The polarizer was stretched and dyed film-like polyvinyl alcohol.
偏光子の一方の表面に貼合された光学フィルムの厚みは、５２μｍであった。偏光子の他方の表面に貼合された光学フィルムの厚みは、２１μｍであった。偏光子の厚みは、８μｍであった。偏光板全体の厚みは、１０１μｍであった。厚みが５２μｍである光学フィルムと偏光子との間に介在する接着層は、ポリビニルアルコール系樹脂（水糊）であった。厚みが２１μｍである光学フィルムと偏光子との間に介在する接着層は、ＵＶ硬化性エポキシ樹脂であった。 The thickness of the optical film attached to one surface of the polarizer was 52 μm. The thickness of the optical film attached to the other surface of the polarizer was 21 μm. The thickness of the polarizer was 8 μm. The total thickness of the polarizing plate was 101 μm. The adhesive layer interposed between the optical film having a thickness of 52 μm and the polarizer was a polyvinyl alcohol-based resin (water glue). The adhesive layer interposed between the optical film having a thickness of 21 μm and the polarizer was a UV curable epoxy resin.
４７枚の第一積層体其々の打ち抜き加工により、各第一積層体の短辺に凹部を形成した。凹部が形成された４７枚の第一積層体を重ね合わせることにより、第二積層体を作製した。 By punching each of the 47 first laminated bodies, recesses were formed on the short sides of each first laminated body. A second laminated body was produced by superimposing 47 first laminated bodies having recesses formed therein.
打ち抜き加工後、下記の三回の切削工程を実施した。いずれの切削工程においても、第二積層体をクランプで固定して、エンドミルの側面を第二積層体の外周（端面）に接触させた状態で、回転するエンドミルを第二積層体の外周（凹部を含む外周）に沿って移動させた。つまり、４７枚の第一積層体其々の外周全体を一括してエンドミルで切削した。各切削工程に用いたエンドミルは、日進工具株式会社製のＤＸＬ‐４であった。切削角度βは、下記表１に示される値であった。エンドミルの直径φは、４ｍｍであった。 After the punching process, the following three cutting steps were carried out. In any cutting process, the rotating end mill is moved to the outer circumference (recess) of the second laminate while the second laminate is fixed with a clamp and the side surface of the end mill is in contact with the outer circumference (end face) of the second laminate. It was moved along the outer circumference including. That is, the entire outer circumference of each of the 47 first laminated bodies was cut together with an end mill. The end mill used in each cutting process was DXL-4 manufactured by NS TOOL Co., Ltd. The cutting angle β was a value shown in Table 1 below. The diameter φ of the end mill was 4 mm.
一回目の切削工程におけるエンドミルの回転速度（Ｒ）は、下記表１に示される値であった。一回目の切削工程におけるエンドミルの送り速度（Ｖ）は、下記表１に示される値であった。一回目の切削工程におけるエンドミルの当接回数（Ｒ／Ｖ）は、下記表１に示される値であった。一回目の切削工程における削り量は、下記表１に示される値であった。 The rotation speed (R) of the end mill in the first cutting step was the value shown in Table 1 below. The feed rate (V) of the end mill in the first cutting step was the value shown in Table 1 below. The number of contact times (R / V) of the end mill in the first cutting step was the value shown in Table 1 below. The amount of cutting in the first cutting step was the value shown in Table 1 below.
二回目の切削工程におけるエンドミルの回転速度（Ｒ）は、下記表１に示される値であった。二回目の切削工程におけるエンドミルの送り速度（Ｖ）は、下記表１に示される値であった。二回目の切削工程におけるエンドミルの当接回数（Ｒ／Ｖ）は、下記表１に示される値であった。二回目の切削工程における削り量は、下記表１に示される値であった。 The rotation speed (R) of the end mill in the second cutting step was the value shown in Table 1 below. The feed rate (V) of the end mill in the second cutting step was the value shown in Table 1 below. The number of contact times (R / V) of the end mill in the second cutting step was the value shown in Table 1 below. The amount of cutting in the second cutting step was the value shown in Table 1 below.
三回目の切削工程におけるエンドミルの回転速度（Ｒ）は、３００００ｒｐｍであった。三回目の切削工程におけるエンドミルの送り速度（Ｖ）は、７００ｍｍ／分であった。三回目の切削工程におけるエンドミルの当接回数（Ｒ／Ｖ）は約４２８５７回／ｍであった。三回目の切削工程における削り量は、０μｍであった。 The rotation speed (R) of the end mill in the third cutting step was 30,000 rpm. The feed rate (V) of the end mill in the third cutting step was 700 mm / min. The number of contact times (R / V) of the end mill in the third cutting step was about 42857 times / m. The amount of cutting in the third cutting step was 0 μm.
以上の方法により、４７枚の実施例１の偏光板を作製した。各偏光板の形状、寸法及び積層構造は同じであった。各偏光板の全体の形状は、長方形であった。図１に示されるように、四角形状の凹部２が、偏光板１の短辺に形成されていた。偏光板１の短辺の長さは７０ｍｍであった。偏光板１の長辺の長さは１４０ｍｍであった。凹部２の幅は、３０ｍｍであった。凹部２の深さは、５ｍｍであった。 By the above method, 47 polarizing plates of Example 1 were produced. The shape, dimensions and laminated structure of each polarizing plate were the same. The overall shape of each polarizing plate was rectangular. As shown in FIG. 1, a quadrangular concave portion 2 was formed on the short side of the polarizing plate 1. The length of the short side of the polarizing plate 1 was 70 mm. The length of the long side of the polarizing plate 1 was 140 mm. The width of the recess 2 was 30 mm. The depth of the recess 2 was 5 mm.
偏光板１の表面（受光面）に垂直であり、且つ凹部２の内側に直交する方向において、偏光板１を切断した。この偏光板１の断面を走査型電子顕微鏡（ＳＥＭ）で観察した。ＳＥＭで撮影された断面は、図８及び図９に示される。図８及び図９のいずれも、同じ断面の写真であり、図１に示されるＩＩ‐ＩＩ線方向における断面の矢視図に相当する。図８及び図９其々に示される偏光板の左端は、凹部における偏光板の端面に相当する。ＳＥＭを用いた観察の結果、凹部２に沿う偏光子７の端部７ｅが、偏光板１の外周１ｐの内側に位置していることが確認された。また、一対の光学フィルム（５，９）と連続する樹脂層４が、凹部２に沿う偏光子７の端部７ｅから偏光板１の外周１ｐにかけて形成されていることが確認された。樹脂層４は、一対の光学フィルム（５，９）が融着することにより、形成されていた。図９に示される樹脂層４の幅４ｗは、下記表１に示される。 The polarizing plate 1 was cut in a direction perpendicular to the surface (light receiving surface) of the polarizing plate 1 and orthogonal to the inside of the recess 2. The cross section of the polarizing plate 1 was observed with a scanning electron microscope (SEM). The cross sections taken by SEM are shown in FIGS. 8 and 9. Both FIGS. 8 and 9 are photographs of the same cross section, and correspond to the arrow view of the cross section in the direction of line II-II shown in FIG. The left end of the polarizing plate shown in FIGS. 8 and 9 corresponds to the end face of the polarizing plate in the recess. As a result of observation using an SEM, it was confirmed that the end portion 7e of the polarizer 7 along the concave portion 2 is located inside the outer peripheral 1p of the polarizing plate 1. Further, it was confirmed that the resin layer 4 continuous with the pair of optical films (5, 9) was formed from the end portion 7e of the polarizing element 7 along the recess 2 to the outer peripheral 1p of the polarizing plate 1. The resin layer 4 was formed by fusing a pair of optical films (5, 9). The width 4w of the resin layer 4 shown in FIG. 9 is shown in Table 1 below.
以下、ヒートサイクル試験を行った。ヒートサイクル試験では、下記のステップ１と、ステップ１に続くステップ２と、ステップ２に続くステップ３とからなるサイクルを１０回繰り返した。
ステップ１： 上記の偏光板を第一雰囲気中に３０分保持するステップ。
ステップ２： 上記の偏光板を第二雰囲気中に５分保持するステップ。
ステップ３： 上記の偏光板を第三雰囲気中に３０分保持するステップ。
第一雰囲気の温度は−４０℃であり、第一雰囲気の相対湿度は、１１％であった。
第二雰囲気の温度は２３℃であり、第二雰囲気の相対湿度は、９％であった。
第三雰囲気の温度は８５℃であり、第二雰囲気の相対湿度は、７％であった。
Hereinafter, a heat cycle test was conducted. In the heat cycle test, the cycle consisting of the following step 1, step 2 following step 1, and step 3 following step 2 was repeated 10 times.
Step 1: A step of holding the above polarizing plate in the first atmosphere for 30 minutes.
Step 2: The step of holding the above polarizing plate in the second atmosphere for 5 minutes.
Step 3: A step of holding the above polarizing plate in the third atmosphere for 30 minutes.
The temperature of the first atmosphere was −40 ° C., and the relative humidity of the first atmosphere was 11%.
The temperature of the second atmosphere was 23 ° C. and the relative humidity of the second atmosphere was 9%.
The temperature of the third atmosphere was 85 ° C. and the relative humidity of the second atmosphere was 7%.
ヒートサイクル試験後、偏光板の凹部に沿って偏光板の表面を光学顕微鏡で観察することにより、偏光板の凹部に形成されている亀裂の数を数えた。亀裂の数は、下記表１に示される。 After the heat cycle test, the number of cracks formed in the concave portions of the polarizing plate was counted by observing the surface of the polarizing plate along the concave portions of the polarizing plate with an optical microscope. The number of cracks is shown in Table 1 below.
（実施例２）
実施例２の場合、打ち抜き加工後、二回の切削工程を実施したが、三回目の切削工程は実施しなかった。一回目の切削工程の諸条件は下記表１に示される。二回目の切削工程の諸条件は下記表１に示される。切削工程を除いて実施例１と同様の方法で、実施例２の偏光板を作製した。実施例１と同様の方法で、実施例２の偏光板の断面を観察した。実施例２の偏光板の断面は、図１０に示される。観察の結果、凹部に沿う偏光子の端部が、偏光板の外周の内側に位置していることが確認された。また、一対の光学フィルムと連続する樹脂層が、凹部に沿う偏光子の端部から偏光板の外周にかけて形成されていることが確認された。樹脂層４は、一対の光学フィルム（５，９）が融着することにより、形成されていた。図１０に示される樹脂層４の幅４ｗは、下記表１に示される。実施例１と同様の方法で実施例２のヒートサイクル試験を実施した。ヒートサイクル試験後の実施例２の偏光板の凹部に形成されている亀裂の数は、下記表１に示される。
(Example 2)
In the case of Example 2, the cutting process was performed twice after the punching process, but the third cutting process was not performed. The conditions of the first cutting process are shown in Table 1 below. The conditions of the second cutting process are shown in Table 1 below. The polarizing plate of Example 2 was produced in the same manner as in Example 1 except for the cutting step. The cross section of the polarizing plate of Example 2 was observed in the same manner as in Example 1. A cross section of the polarizing plate of Example 2 is shown in FIG. As a result of observation, it was confirmed that the end portion of the polarizer along the recess was located inside the outer circumference of the polarizing plate. Further, it was confirmed that a resin layer continuous with the pair of optical films was formed from the end of the polarizer along the recess to the outer periphery of the polarizing plate. The resin layer 4 was formed by fusing a pair of optical films (5, 9). The width 4w of the resin layer 4 shown in FIG. 10 is shown in Table 1 below. The heat cycle test of Example 2 was carried out in the same manner as in Example 1. The number of cracks formed in the recesses of the polarizing plate of Example 2 after the heat cycle test is shown in Table 1 below.
（比較例３）
比較例３の場合、打ち抜き加工後、二回の切削工程を実施したが、三回目の切削工程は実施しなかった。一回目の切削工程の諸条件は下記表１に示される。二回目の切削工程の諸条件は下記表１に示される。切削工程を除いて実施例１と同様の方法で、比較例３の偏光板を作製した。実施例１と同様の方法で、比較例３の偏光板の断面を観察した。比較例３の偏光板の断面は、図１１に示される。観察の結果、偏光子の端部が凹部において露出していることが確認された。つまり比較例３の場合、一対の光学フィルムと連続する樹脂層が、凹部に沿う偏光子の端部から偏光板の外周にかけて形成されていなかった。実施例１と同様の方法で比較例３のヒートサイクル試験を実施した。ヒートサイクル試験後の比較例３の偏光板の凹部に形成されている亀裂の数は、下記表１に示される。
(Comparative Example 3)
In the case of Comparative Example 3, the cutting process was performed twice after the punching process, but the third cutting process was not performed. The conditions of the first cutting process are shown in Table 1 below. The conditions of the second cutting process are shown in Table 1 below. The polarizing plate of Comparative Example 3 was produced in the same manner as in Example 1 except for the cutting step. The cross section of the polarizing plate of Comparative Example 3 was observed in the same manner as in Example 1. The cross section of the polarizing plate of Comparative Example 3 is shown in FIG. As a result of observation, it was confirmed that the end of the polarizer was exposed in the recess. That is, in the case of Comparative Example 3, the resin layer continuous with the pair of optical films was not formed from the end of the polarizer along the recess to the outer periphery of the polarizing plate. The heat cycle test of Comparative Example 3 was carried out in the same manner as in Example 1. The number of cracks formed in the recesses of the polarizing plate of Comparative Example 3 after the heat cycle test is shown in Table 1 below.
（実施例４）
実施例４の場合、打ち抜き加工後、二回の切削工程を実施したが、三回目の切削工程は実施しなかった。各切削工程に用いたエンドミルは、ツールドインターナショナル株式会社製の７Ｌｅａｄｅｒｓであった。切削角度βは、下記表１に示される値であった。一回目の切削工程の諸条件は下記表１に示される。二回目の切削工程の諸条件は下記表１に示される。切削工程を除いて実施例１と同様の方法で、実施例４の偏光板を作製した。実施例１と同様の方法で、実施例４の偏光板の断面を観察した。実施例４の偏光板の断面は、図１２に示される。観察の結果、凹部に沿う偏光子の端部が、偏光板の外周の内側に位置していることが確認された。また、一対の光学フィルムと連続する樹脂層が、凹部に沿う偏光子の端部から偏光板の外周にかけて形成されていることが確認された。樹脂層４は、一対の光学フィルム（５，９）が融着することにより、形成されていた。図１２に示される樹脂層４の幅４ｗは、下記表１に示される。実施例１と同様の方法で実施例４のヒートサイクル試験を実施した。ヒートサイクル試験後の実施例４の偏光板の凹部に形成されている亀裂の数は、下記表１に示される。
(Example 4)
In the case of Example 4, the cutting process was performed twice after the punching process, but the third cutting process was not performed. The end mill used for each cutting process was 7Leaders manufactured by Tooled International Co., Ltd. The cutting angle β was a value shown in Table 1 below. The conditions of the first cutting process are shown in Table 1 below. The conditions of the second cutting process are shown in Table 1 below. The polarizing plate of Example 4 was produced in the same manner as in Example 1 except for the cutting step. The cross section of the polarizing plate of Example 4 was observed in the same manner as in Example 1. A cross section of the polarizing plate of Example 4 is shown in FIG. As a result of observation, it was confirmed that the end portion of the polarizer along the recess was located inside the outer circumference of the polarizing plate. Further, it was confirmed that a resin layer continuous with the pair of optical films was formed from the end of the polarizer along the recess to the outer periphery of the polarizing plate. The resin layer 4 was formed by fusing a pair of optical films (5, 9). The width 4w of the resin layer 4 shown in FIG. 12 is shown in Table 1 below. The heat cycle test of Example 4 was carried out in the same manner as in Example 1. The number of cracks formed in the recesses of the polarizing plate of Example 4 after the heat cycle test is shown in Table 1 below.
（比較例５）
比較例５の場合、打ち抜き加工後、二回の切削工程を実施したが、三回目の切削工程は実施しなかった。各切削工程に用いたエンドミルは、ツールドインターナショナル株式会社製の７Ｌｅａｄｅｒｓであった。切削角度βは、下記表１に示される値であった。一回目の切削工程の諸条件は下記表１に示される。二回目の切削工程の諸条件は下記表１に示される。切削工程を除いて実施例１と同様の方法で、比較例５の偏光板を作製した。実施例１と同様の方法で、比較例５の偏光板の断面を観察した。比較例５の偏光板の断面は、図１３に示される。観察の結果、偏光子の端部が凹部において露出していることが確認された。つまり比較例３の場合、一対の光学フィルムと連続する樹脂層が、凹部に沿う偏光子の端部から偏光板の外周にかけて形成されていなかった。実施例１と同様の方法で比較例５のヒートサイクル試験を実施した。ヒートサイクル試験後の比較例５の偏光板の凹部に形成されている亀裂の数は、下記表１に示される。
(Comparative Example 5)
In the case of Comparative Example 5, the cutting process was performed twice after the punching process, but the third cutting process was not performed. The end mill used for each cutting process was 7Leaders manufactured by Tooled International Co., Ltd. The cutting angle β was a value shown in Table 1 below. The conditions of the first cutting process are shown in Table 1 below. The conditions of the second cutting process are shown in Table 1 below. The polarizing plate of Comparative Example 5 was produced in the same manner as in Example 1 except for the cutting step. The cross section of the polarizing plate of Comparative Example 5 was observed in the same manner as in Example 1. The cross section of the polarizing plate of Comparative Example 5 is shown in FIG. As a result of observation, it was confirmed that the end of the polarizer was exposed in the recess. That is, in the case of Comparative Example 3, the resin layer continuous with the pair of optical films was not formed from the end of the polarizer along the recess to the outer periphery of the polarizing plate. The heat cycle test of Comparative Example 5 was carried out in the same manner as in Example 1. The number of cracks formed in the recesses of the polarizing plate of Comparative Example 5 after the heat cycle test is shown in Table 1 below.
本発明に係る偏光板は、例えば、液晶ディスプレイ又は有機ＥＬディスプレイ等の画像表示装置に適用される。 The polarizing plate according to the present invention is applied to an image display device such as a liquid crystal display or an organic EL display, for example.
１…偏光板、１ｐ…偏光板の外周、２…凹部、２ｃ…凹部の隅、３…第三光学フィルム、４…樹脂層、４ｗ…樹脂層の幅、５…第一光学フィルム、７…偏光子、７ｅ…偏光子の端部、９…第二光学フィルム、１０…第一積層体、５０…エンドミル、５０ａ…エンドミルの回転軸線、５０ｅ…エンドミルの刃、１００…第二積層体、ｄ１…エンドミルの側面において刃が延びる方向、ｄ２…エンドミルの回転軸線に垂直な方向、α…エンドミルのねじれ角、β…切削角度。 1 ... Polarizing plate, 1p ... Outer circumference of the polarizing plate, 2 ... Recessed part, 2c ... Corner of the concave part, 3 ... Third optical film, 4 ... Resin layer, 4w ... Resin layer width, 5 ... First optical film, 7 ... Polarizer, 7e ... Polarizer end, 9 ... Second optical film, 10 ... First laminate, 50 ... End mill, 50a ... End mill rotation axis, 50e ... End mill blade, 100 ... Second laminate, d1 ... the direction in which the blade extends on the side surface of the end mill, d2 ... the direction perpendicular to the rotation axis of the end mill, α ... the twist angle of the end mill, β ... the cutting angle.
Claims (7)
樹脂を含む少なくとも一対の光学フィルムと、
を備える偏光板であって、
前記偏光子が、前記一対の光学フィルムの間に位置し、且つ前記一対の光学フィルムと重なり、
凹部が、前記偏光板の外周に形成されており、
前記凹部に沿う前記偏光子の端部が、前記偏光板の外周の内側に位置し、
前記一対の光学フィルムと連続する樹脂層が、前記凹部に沿う前記偏光子の端部から前記偏光板の外周にかけて形成され、
前記樹脂層は、互いに融着した前記光学フィルム其々の端部から構成されている、
偏光板。 With a film-like polarizer,
With at least a pair of optical films containing resin,
It is a polarizing plate provided with
The polarizer is located between the pair of optical films and overlaps the pair of optical films.
A recess is formed on the outer circumference of the polarizing plate.
The end of the polarizer along the recess is located inside the outer circumference of the polarizing plate.
A resin layer continuous with the pair of optical films is formed from the end of the polarizing element along the recess to the outer periphery of the polarizing plate.
The resin layer is composed of the ends of the optical films fused to each other.
Polarizer.
請求項１に記載の偏光板。 The inner corner of the recess is a curved surface,
The polarizing plate according to claim 1.
請求項１又は２に記載の偏光板。 The width of the resin layer formed from the end of the polarizer to the outer periphery of the polarizing plate is 10 μm or more and 1000 μm or less.
The polarizing plate according to claim 1 or 2.
請求項１〜３のいずれか一項に記載の偏光板。 The resin layer is in close contact with the end of the polarizer along the recess.
The polarizing plate according to any one of claims 1 to 3.
請求項１〜４のいずれか一項に記載の偏光板。 The resin layer is exposed in the recess.
The polarizing plate according to any one of claims 1 to 4.
画像表示装置。 The polarizing plate according to any one of claims 1 to 5 is included.
Image display device.
フィルム状の偏光子と少なくとも一対の光学フィルムを重ねて、積層体を形成する積層工程と、
エンドミルを前記積層体の外周に接触させて、前記エンドミルを前記積層体の外周に沿って移動させる切削工程と、
を備え、
前記積層体において、前記偏光子が前記一対の光学フィルムの間に位置し、
前記切削工程を少なくとも二回繰り返すことにより、前記凹部及び前記樹脂層が形成され、
一回目の前記切削工程における前記エンドミルの送り速度が、１００ｍｍ／分以上３０００ｍｍ／分以下であり、
二回目の前記切削工程における前記エンドミルの送り速度が、１００ｍｍ／分以上３００ｍｍ／分以下であり、
前記一回目の前記切削工程における前記エンドミルの回転速度が、５００ｒｐｍ以上６００００ｒｐｍ以下であり、
前記二回目の前記切削工程における前記エンドミルの回転速度が、１００００ｒｐｍ以上６００００ｒｐｍ以下である、
偏光板の製造方法。 The method for producing a polarizing plate according to any one of claims 1 to 5.
A laminating step of superimposing a film-shaped polarizer and at least a pair of optical films to form a laminated body,
A cutting step in which the end mill is brought into contact with the outer periphery of the laminate to move the end mill along the outer circumference of the laminate.
With
In the laminate, the polarizer is located between the pair of optical films.
By repeating the cutting process at least twice, the recess and the resin layer are formed.
The feed rate of the end mill in the first cutting step is 100 mm / min or more and 3000 mm / min or less.
The feed rate of the end mill in the second cutting step is 100 mm / min or more and 300 mm / min or less.
Rotational speed of the end mill definitive to as the cutting Engineering of the first time is state, and are more 60000rpm less 500 rpm,
Rotational speed of the end mill before Symbol second time of the cutting process is less 10000 rpm or more 60000 rpm,
Method for manufacturing a polarizing plate.
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| PCT/JP2019/038871 WO2020095579A1 (en) | 2018-11-06 | 2019-10-02 | Polarizing plate |
| CN201980070920.1A CN112969938A (en) | 2018-11-06 | 2019-10-02 | Polarizing plate |
| KR1020217010489A KR20210084455A (en) | 2018-11-06 | 2019-10-02 | Polarizer |
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| JPS5827107A (en) * | 1981-08-11 | 1983-02-17 | Matsushita Electric Ind Co Ltd | Cutting method for polarizing plate |
| JPS59176709A (en) * | 1983-03-26 | 1984-10-06 | Sharp Corp | Polarizing plate |
| JP2000155325A (en) | 1998-11-19 | 2000-06-06 | Ricoh Co Ltd | Liquid crystal display device and its manufacture |
| JP6370190B2 (en) * | 2014-10-24 | 2018-08-08 | 住友化学株式会社 | Polarizing plate roll |
| JP6502059B2 (en) * | 2014-10-24 | 2019-04-17 | 住友化学株式会社 | Polarizer roll |
| JP6647753B2 (en) * | 2015-04-17 | 2020-02-14 | 日東電工株式会社 | Polarizing plate and manufacturing method thereof |
| JP6495374B2 (en) * | 2016-05-30 | 2019-04-03 | 住友化学株式会社 | Polarizing plate for image display device, image display device, and method for producing polarizing plate for image display device |
| EP3264147B1 (en) * | 2016-06-30 | 2024-05-08 | LG Display Co., Ltd. | Method of fabricating a polarizer |
| JP6899721B2 (en) * | 2016-07-22 | 2021-07-07 | 日東電工株式会社 | Polarizing plate manufacturing method and its manufacturing equipment |
| JP2018012182A (en) * | 2016-07-22 | 2018-01-25 | 日東電工株式会社 | Method and apparatus for manufacturing polarization plate |
| WO2018016520A1 (en) * | 2016-07-22 | 2018-01-25 | 日東電工株式会社 | Method for manufacturing polarizing plate and apparatus for manufacturing same |
| JP2018025630A (en) * | 2016-08-09 | 2018-02-15 | 日東電工株式会社 | Polarizing plate |
| JP2018159911A (en) * | 2017-01-27 | 2018-10-11 | 住友化学株式会社 | Polarizing plate and image display device |
| JP7018349B2 (en) * | 2018-04-13 | 2022-02-10 | 日東電工株式会社 | Manufacturing method of machined optical laminate with adhesive layer |
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2018
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| JP2020076839A (en) | 2020-05-21 |
| KR20210084455A (en) | 2021-07-07 |
| CN112969938A (en) | 2021-06-15 |
| TW202026138A (en) | 2020-07-16 |
| WO2020095579A1 (en) | 2020-05-14 |
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