JP6749056B2 - Electrolytic plating equipment - Google Patents

Electrolytic plating equipment Download PDF

Info

Publication number
JP6749056B2
JP6749056B2 JP2016189292A JP2016189292A JP6749056B2 JP 6749056 B2 JP6749056 B2 JP 6749056B2 JP 2016189292 A JP2016189292 A JP 2016189292A JP 2016189292 A JP2016189292 A JP 2016189292A JP 6749056 B2 JP6749056 B2 JP 6749056B2
Authority
JP
Japan
Prior art keywords
end side
power supply
current collector
plating
pressing mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016189292A
Other languages
Japanese (ja)
Other versions
JP2018053294A (en
Inventor
大輔 眞下
大輔 眞下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2016189292A priority Critical patent/JP6749056B2/en
Publication of JP2018053294A publication Critical patent/JP2018053294A/en
Application granted granted Critical
Publication of JP6749056B2 publication Critical patent/JP6749056B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Electroplating Methods And Accessories (AREA)

Description

本発明は、電解めっき装置に関するものである。 The present invention relates to an electrolytic plating device.

電解めっき技術は、例えば配線基板の配線形成用途として広く用いられている。 The electrolytic plating technique is widely used, for example, for wiring formation of a wiring board.

ここで、図3に従来の電解めっき装置30を概略図で示す。従来の電解めっき装置30においては、被めっき物を浸漬するための長尺のめっき槽31と、めっき槽31の長手方向に沿って敷設されており被めっき物に電解めっき用の電流を供給するための帯状の給電用電極32と、被めっき物をめっき槽31内の長手方向の一端側から他端側に向けて搬送しながら移動する搬送キャリア33と、搬送キャリア33に取着されており、搬送キャリア33の移動に伴って給電用電極32上を摺動することにより給電用電極32から電解めっき用の電流を取り出す集電子34とを備えている。 Here, FIG. 3 schematically shows a conventional electrolytic plating apparatus 30. In the conventional electroplating apparatus 30, a long plating tank 31 for immersing the object to be plated and a long plating tank 31 laid along the longitudinal direction of the plating tank 31 are provided with an electric current for electrolytic plating. The belt-shaped power supply electrode 32 for attachment, the transport carrier 33 that moves while transporting the object to be plated from one end side to the other end side in the longitudinal direction in the plating tank 31, and the transport carrier 33 are attached. And a current collector 34 that draws a current for electrolytic plating from the power supply electrode 32 by sliding on the power supply electrode 32 as the transport carrier 33 moves.

次に、図4に従来の電解めっき装置30における集電子34周辺部の概略拡大図を示す。ここで、図3と同一の箇所には、同じ符号を付して説明する。
集電子34は、下側に摺動面34aを有しており、かかる摺動面34aを給電用電極32上に押圧された状態で搬送キャリア33に取着されている。集電子34は、集電子34の上面に垂直に固定され、圧縮状態のバネ35を装着した2本の支柱36の他端を、搬送キャリア33に形成された貫通孔に挿入して搬送キャリア33の上面でナット37により固定することで取着されている。そして、搬送キャリア33の移動に伴って、集電子34が給電用電極32上を摺動することによって給電用電極32から電解めっき用の電流を取り出している。
Next, FIG. 4 shows a schematic enlarged view of the periphery of the current collector 34 in the conventional electrolytic plating apparatus 30. Here, the same parts as those in FIG. 3 will be described with the same reference numerals.
The current collector 34 has a sliding surface 34a on the lower side, and is attached to the transport carrier 33 with the sliding surface 34a being pressed against the power supply electrode 32. The current collector 34 is fixed vertically to the upper surface of the current collector 34, and the other ends of the two columns 36 with the springs 35 in a compressed state are inserted into the through holes formed in the carrier 33 to transport the carrier 33. It is attached by fixing with a nut 37 on the upper surface of. Then, as the carrier 33 moves, the current collector 34 slides on the power supply electrode 32 to extract an electric current for electrolytic plating from the power supply electrode 32.

しかしながら、集電子34の摺動に伴い、給電用電極32との間で大きな摩擦が加わる摺動方向側の摺動面34aに磨耗が生じている場合、搬送キャリア33の移動に伴って集電子34が給電用電極32から受ける抗力によって前のめり状態となり、例えば給電用電極32の継ぎ目等にひっかかってしまうことがある。
このため、集電子34が給電用電極32と十分に接触できず電解めっき用の電流を安定して取り出すことができなくなり被めっき物の品質に不具合をきたすという問題がある。
However, if the sliding surface 34a on the sliding direction side, where a large amount of friction is applied to the power supply electrode 32 due to the sliding of the current collector 34, is abraded, the current collection is accompanied by the movement of the carrier 33. The drag force applied to the power feeding electrode 32 causes the wire 34 to be in a forward leaning state, and may be caught in, for example, a joint of the power feeding electrode 32.
Therefore, there is a problem that the current collector 34 cannot sufficiently contact with the power supply electrode 32 and the current for electrolytic plating cannot be stably taken out, which causes a problem in the quality of the object to be plated.

特開平5−207608号公報JP-A-5-207608

本発明の課題は、集電子に磨耗による傾きが生じた場合でも、集電子が給電用電極上を滑動して電解めっき用の電流を安定して取り出すことができ、良好な品質の被めっき物を供給できる電解めっき装置を提供することにある。 An object of the present invention is that even if the current collector is tilted due to wear, the current collector can slide on the power supply electrode to stably take out an electric current for electrolytic plating. An object of the present invention is to provide an electroplating apparatus that can supply the.

本発明に係る電解めっき装置は、被めっき物を浸漬するための長尺のめっき槽と、めっき槽の長手方向に沿って敷設されており、被めっき物に電解めっき用の電流を供給するための帯状の給電用電極と、被めっき物をめっき槽内の長手方向の摺動方向に対して後側である一端側から、摺動方向に対して前側である他端側に向けて搬送しながら移動する搬送キャリアと、下側に給電用電極に沿った長尺状の摺動面を有しており摺動面を給電用電極上へ押圧した状態で搬送キャリアに取着されるとともに、搬送キャリアの移動に伴って摺動面が給電用電極上を摺動することにより給電用電極から電解めっき用の電流を取り出す集電子と、を具備して成るめっき装置であって、集電子は、集電子における一端側および他端側のそれぞれに設けられた少なくとも一つのバネを有する押圧機構によって給電用電極上へ押圧されるとともに、一端側の押圧機構の押圧力が、他端側の押圧機構の押圧力よりも大きいことを特徴とするものである。 The electrolytic plating apparatus according to the present invention is provided with a long plating bath for immersing the object to be plated, and is laid along the longitudinal direction of the plating tank to supply an electric current for electrolytic plating to the object to be plated. The strip-shaped power supply electrode and the object to be plated are conveyed from one end side, which is the rear side in the longitudinal sliding direction in the plating tank, to the other end side, which is the front side in the sliding direction. While having a carrier carrier that moves while having a long sliding surface along the power supply electrode on the lower side, while being attached to the carrier carrier while pressing the sliding surface onto the power supply electrode, A current collector for collecting current for electrolytic plating from the power supply electrode by sliding the sliding surface on the power supply electrode with the movement of the carrier. , Is pressed onto the power supply electrode by a pressing mechanism having at least one spring provided on each of the one end side and the other end side of the current collector, and the pressing force of the pressing mechanism on the one end side is pressed on the other end side. It is characterized by being larger than the pressing force of the mechanism.

本発明の電解めっき装置によれば、集電子における一端側に設けられた押圧機構の押圧力が、他端側に設けられた押圧機構の押圧力よりも大きくなるように設定されている。
このため、他端側の摺動面が摩耗しても、集電子の一端側を他端側よりも大きな力で給電用電極上に押圧することで、集電子が前傾することを抑制できる。これにより、集電子が給電用電極上を滑動して給電用電極から電解めっき用の電流を安定して取り出すことができ、その結果、良好な品質の被めっき物を供給することが可能な電解めっき装置を提供することができる。
According to the electrolytic plating apparatus of the present invention, the pressing force of the pressing mechanism provided on one end side of the current collector is set to be larger than the pressing force of the pressing mechanism provided on the other end side.
Therefore, even if the sliding surface on the other end side is worn, by pressing one end side of the current collector onto the power supply electrode with a force larger than that of the other end side, it is possible to prevent the current collector from tilting forward. .. This allows the current collector to slide on the power supply electrode to stably extract the current for electrolytic plating from the power supply electrode, and as a result, it is possible to supply an object to be plated of good quality. A plating apparatus can be provided.

図1は、本発明に係る電解めっき装置の実施形態の一例を示す概略図である。FIG. 1 is a schematic diagram showing an example of an embodiment of an electrolytic plating apparatus according to the present invention. 図2は、図1に示す電解めっき装置の要部拡大図である。FIG. 2 is an enlarged view of a main part of the electrolytic plating apparatus shown in FIG. 図3は、従来の電解めっき装置を示す概略図である。FIG. 3 is a schematic diagram showing a conventional electrolytic plating apparatus. 図4は、図3に示す電解めっき装置の要部拡大図である。FIG. 4 is an enlarged view of a main part of the electrolytic plating apparatus shown in FIG.

次に、本発明の電解めっき装置の実施形態の一例を図1および図2を基にして説明する。なお、図1と図2において同一の箇所には、同じ符号を付して説明する。
本例の電解めっき装置10は、被めっき物を浸漬するための長尺のめっき槽11と、めっき槽11の長手方向に沿って敷設されており被めっき物に電解めっき用の電流を供給するための帯状の給電用電極12と、被めっき物をめっき槽11内の長手方向の一端側から他端側に向けて搬送しながら移動する搬送キャリア13と、搬送キャリア13に、給電用電極12に押圧された状態で取着されており、搬送キャリア13の移動に伴って給電用電極12上を摺動することにより給電用電極12から電解めっき用の電流を取り出す集電子14と、を備えている。
Next, an example of the embodiment of the electrolytic plating apparatus of the present invention will be described based on FIGS. 1 and 2. The same parts in FIGS. 1 and 2 are designated by the same reference numerals in the description.
The electroplating apparatus 10 of the present example is a long plating tank 11 for immersing the object to be plated, and is laid along the longitudinal direction of the plating tank 11, and supplies a current for electrolytic plating to the object to be plated. Band-shaped power supply electrode 12, a carrier 13 that moves while transporting the object to be plated from one end side to the other end side in the longitudinal direction in the plating tank 11, and the power supply electrode 12 to the carrier carrier 13. A current collector 14 that is attached in a state of being pressed by and that slides on the power feeding electrode 12 as the transport carrier 13 moves to take out an electric current for electrolytic plating from the power feeding electrode 12. ing.

めっき槽11は、例えば塩化ビニルから成る複数の平板同士を溶接によって接合することで容器状に形成される。めっき槽11内にはめっき液が入れられるとともに、例えばラックに装着された状態の被めっき物が浸漬される。さらに、めっき用電源の陰極(不図示)と接続された被めっき物と対向する位置に、めっき用電源の陽極と接続された電極(不図示)が配設される。 The plating tank 11 is formed in a container shape by joining a plurality of flat plates made of vinyl chloride, for example, by welding. A plating solution is placed in the plating tank 11 and, for example, an object to be plated mounted on a rack is immersed. Further, an electrode (not shown) connected to the anode of the plating power source is arranged at a position facing the object to be plated connected to the cathode (not shown) of the plating power source.

給電用電極12は、例えば銅などの良導電性の金属から成り、前述のめっき槽11に沿って敷設される。給電用電極12は、めっき用電源の陰極と接続されている。給電用電極12の上面は平滑に研磨されており、集電子14が給電用電極12上を摺動することで電解めっき用の電流を取り出している。 The power supply electrode 12 is made of a metal having good conductivity such as copper, and is laid along the plating bath 11 described above. The power supply electrode 12 is connected to the cathode of the plating power supply. The upper surface of the power supply electrode 12 is polished smoothly, and the current collector 14 slides on the power supply electrode 12 to extract a current for electrolytic plating.

搬送キャリア13は、めっき液による腐食に強いステンレスから成り、被めっき物をめっき槽11内に浸漬するためのアーム構造15を有するとともに、めっき槽11内に浸漬された被めっき物を長手方向に搬送しながら移動するための移動装置を具備している。 The transport carrier 13 is made of stainless steel that is resistant to corrosion by the plating solution, has an arm structure 15 for immersing the object to be plated in the plating tank 11, and moves the object to be plated immersed in the plating tank 11 in the longitudinal direction. It is equipped with a moving device for moving while conveying.

集電子14は、例えば銅などの良導電性の金属から成る。また、図2に示すように集電子14は、下側に設けられた摺動面14aが給電用電極12上に接触するとともに、集電子14の摺動方向に対して前側である他端側、および後側である一端側に設けられた押圧機構16を介して搬送キャリア13に取着されている。押圧機構16は、バネ17と支柱18とナット19とを含んでいる。圧縮状態のバネ17を装着した支柱18の下端は、集電子14の上面に垂直に固定されている。そして、支柱18の上端は、搬送キャリア13に形成された貫通孔に挿入されて搬送キャリア13の上面でブッシュを介してナット19により固定されている。
他端側の押圧機構16は一つのバネを備えているのに対して、一端側の押圧機構16は二つのバネを備えており、一端側の押圧機構16が集電子14を給電用電極12へ押圧する力が、他端側の押圧機構16が集電子14を給電用電極12へ押圧する力よりも大きく設定されている。集電子14は、これらの押圧機構16により給電用電極12に向けて付勢されており、それにより搬送キャリア13の移動に伴い給電用電極12上を良好に密着しながら摺動して電解めっき用の電流を給電用電極12から取り出す機能を有している。
なお本発明においては、他端側の押圧機構16の押圧力よりも、一端側の押圧機構16の押圧力の方が大きくなるように設定されている。このため、摺動方向に対して前側の摺動面14aが摩耗しても、集電子14の一端側を他端側よりも大きな力で給電用電極12上に押圧することで、集電子14が前傾することを抑制できる。これにより、集電子14が給電用電極12上を滑動して給電用電極12から電解めっき用の電流を安定して取り出すことが可能になり、その結果、良好な品質の被めっき物を供給することが可能な電解めっき装置を提供することができる。
The current collector 14 is made of a highly conductive metal such as copper. As shown in FIG. 2, the current collector 14 has the sliding surface 14 a provided on the lower side in contact with the power supply electrode 12 and the other end side which is the front side with respect to the sliding direction of the current collector 14. , And via the pressing mechanism 16 provided on the rear end side. The pressing mechanism 16 includes a spring 17, a column 18, and a nut 19. The lower end of the column 18 having the compressed spring 17 mounted thereon is fixed vertically to the upper surface of the current collector 14. The upper end of the column 18 is inserted into a through hole formed in the carrier 13 and fixed by a nut 19 on the upper surface of the carrier 13 via a bush.
The pressing mechanism 16 on the other end side is provided with one spring, whereas the pressing mechanism 16 on one end side is provided with two springs, and the pressing mechanism 16 on the one end side supplies the current collector 14 to the power supply electrode 12 The force for pressing to is set to be larger than the force for pressing the current collector 14 to the power supply electrode 12 by the pressing mechanism 16 on the other end side. The current collector 14 is urged toward the power supply electrode 12 by these pressing mechanisms 16, and as a result of the movement of the carrier 13, the current collector 14 slides on the power supply electrode 12 while adhering well to the electrolytic plating. It has the function of taking out the current for power supply from the power supply electrode 12.
In the present invention, the pressing force of the pressing mechanism 16 on the one end side is set to be larger than the pressing force of the pressing mechanism 16 on the other end side. Therefore, even if the sliding surface 14a on the front side with respect to the sliding direction is worn, one end side of the current collector 14 is pressed onto the power supply electrode 12 with a larger force than the other end side, so that the current collector 14 is Can be prevented from leaning forward. This allows the current collector 14 to slide on the power supply electrode 12 to stably extract the current for electrolytic plating from the power supply electrode 12, and as a result, to supply an object to be plated of good quality. It is possible to provide an electrolytic plating apparatus capable of performing the above.

なお、本発明は、上述の実施形態の一例に限定されるものではなく、本発明の要旨を逸脱しない範囲であれば種々の変更は可能である。例えば、本例では他端側の押圧機構16は一つのバネ17を備えているのに対して、一端側の押圧機構16は二つのバネ17を備えている例を示したが、両方の押圧機構16がバネ17を一つずつ備えており、かつ一端側の押圧機構16に用いるバネ17のバネ定数を、他端側の押圧機構16に用いるバネ17のバネ定数より大きくしても構わない。 The present invention is not limited to the example of the above-described embodiment, and various modifications can be made without departing from the gist of the present invention. For example, in this example, the pressing mechanism 16 on the other end side has one spring 17, whereas the pressing mechanism 16 on the one end side has two springs 17. The mechanism 16 includes the springs 17 one by one, and the spring constant of the spring 17 used for the pressing mechanism 16 on the one end side may be larger than the spring constant of the spring 17 used for the pressing mechanism 16 on the other end side. ..

10 めっき装置
11 めっき槽
12 給電用電極
13 搬送キャリア
14 集電子
16 押圧機構
17 バネ
10 Plating Device 11 Plating Tank 12 Power Supply Electrode 13 Carrier Carrier 14 Current Collector 16 Pressing Mechanism 17 Spring

Claims (2)

被めっき物を浸漬するための長尺のめっき槽と、前記めっき槽の長手方向に沿って敷設されており、前記被めっき物に電解めっき用の電流を供給するための帯状の給電用電極と、被めっき物を前記めっき槽内の長手方向の摺動方向に対して後側である一端側から、摺動方向に対して前側である他端側に向けて搬送しながら移動する搬送キャリアと、
下側に前記給電用電極に沿った長尺状の摺動面を有しており該摺動面を前記給電用電極上へ押圧した状態で前記搬送キャリアに取着されるとともに、前記搬送キャリアの移動に伴って前記摺動面が前記給電用電極上を摺動することにより前記給電用電極から前記電解めっき用の電流を取り出す集電子と、を具備して成るめっき装置であって、
前記集電子は、該集電子における前記一端側および他端側のそれぞれに設けられた少なくとも一つのバネを有する押圧機構によって前記給電用電極上へ押圧されるとともに、前記一端側の押圧機構の押圧力が、前記他端側の押圧機構の押圧力よりも大きいことを特徴とするめっき装置。
A long plating tank for immersing the object to be plated, and a strip-shaped power supply electrode that is laid along the longitudinal direction of the plating tank and supplies a current for electrolytic plating to the object to be plated. A carrier that moves while moving the object to be plated from one end side that is the rear side with respect to the longitudinal sliding direction in the plating tank to the other end side that is the front side with respect to the sliding direction. ,
It has a long sliding surface along the power feeding electrode on the lower side, and is attached to the transport carrier in a state where the sliding surface is pressed onto the power feeding electrode, and the transport carrier. A current collector for extracting the current for the electrolytic plating from the power feeding electrode by sliding the sliding surface on the power feeding electrode with the movement of the plating device,
The current collector is pressed onto the power supply electrode by a pressing mechanism having at least one spring provided on each of the one end side and the other end side of the current collector, and is pressed by the pressing mechanism on the one end side. The plating apparatus is characterized in that the pressure is larger than the pressing force of the pressing mechanism on the other end side.
前記他端側の押圧機構は一つのバネを有しているとともに、前記一端側の押圧機構は二つのバネを有していることを特徴とする請求項1に記載のめっき装置。 The plating apparatus according to claim 1, wherein the pressing mechanism on the other end side has one spring, and the pressing mechanism on the one end side has two springs.
JP2016189292A 2016-09-28 2016-09-28 Electrolytic plating equipment Active JP6749056B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2016189292A JP6749056B2 (en) 2016-09-28 2016-09-28 Electrolytic plating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016189292A JP6749056B2 (en) 2016-09-28 2016-09-28 Electrolytic plating equipment

Publications (2)

Publication Number Publication Date
JP2018053294A JP2018053294A (en) 2018-04-05
JP6749056B2 true JP6749056B2 (en) 2020-09-02

Family

ID=61832973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016189292A Active JP6749056B2 (en) 2016-09-28 2016-09-28 Electrolytic plating equipment

Country Status (1)

Country Link
JP (1) JP6749056B2 (en)

Also Published As

Publication number Publication date
JP2018053294A (en) 2018-04-05

Similar Documents

Publication Publication Date Title
JP6448494B2 (en) Suction plating equipment
JP2009503263A (en) Equipment for processing substrates, especially for electroplating substrates
KR20160038553A (en) A hanger for use in electroplanting of PCB
JP6749056B2 (en) Electrolytic plating equipment
JP2006117979A (en) Workpiece hanger in electroplating device
JP2007023348A (en) Electroplating treatment system
JP2016180148A (en) Electrolytic plating apparatus
TW201113400A (en) Plating jig
US10808331B2 (en) Electroplating system and pressure device thereof
JP6117891B2 (en) Surface treatment equipment
JP2013091817A (en) Electrolytic plating apparatus
KR100949795B1 (en) A plating device for a flexible flat cable and the using method thereof
KR101237833B1 (en) Jig device for plating apparatus of pcb
CN203333803U (en) Adjustable insoluble anode device
KR101630379B1 (en) Low wastewater type valuable metal electrolysis device
CN210657187U (en) Vertical continuous electroplating equipment for circuit board
JP2018115352A (en) Electroplating apparatus and electroplating method
JP2015063717A (en) Workpiece holding frame body and plating treatment apparatus using the same
JP6533652B2 (en) Terminal member plating method and plating apparatus
JP6687592B2 (en) Surface treatment device and work holding jig
CN103305896B (en) Continuous electroplating liquid conduction device and continuous liq electro-plating method
KR101605136B1 (en) Apparatus for supplying and collecting grease
CN207713845U (en) the conductive mechanism of electroplating device
KR100778129B1 (en) An equipment for gilding
JP6342538B2 (en) Surface treatment equipment

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20190620

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200317

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20200318

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200420

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20200716

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20200808

R150 Certificate of patent or registration of utility model

Ref document number: 6749056

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150