JP6714530B2 - Photocatalyst composition, photocatalyst coating film and photocatalyst coating product - Google Patents

Photocatalyst composition, photocatalyst coating film and photocatalyst coating product Download PDF

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JP6714530B2
JP6714530B2 JP2017044307A JP2017044307A JP6714530B2 JP 6714530 B2 JP6714530 B2 JP 6714530B2 JP 2017044307 A JP2017044307 A JP 2017044307A JP 2017044307 A JP2017044307 A JP 2017044307A JP 6714530 B2 JP6714530 B2 JP 6714530B2
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photocatalyst
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太田 一也
一也 太田
雄 印南
雄 印南
小熊 淳一
淳一 小熊
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Asahi Kasei Corp
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本発明は、光触媒組成物、光触媒塗膜及び光触媒塗装製品に関する。 The present invention relates to a photocatalyst composition, a photocatalyst coating film and a photocatalyst coating product.

近年、住宅及びビルなどの建築外壁に防汚性能を付与するために、光触媒塗料が実用化され、その光触媒塗料を建築外壁に塗布して光触媒塗膜を形成している。この光触媒塗料には、光触媒活性を発揮すべく光触媒活性を有する無機化合物材料が配合されている。そのような無機化合物材料のうち最もよく使われるのは二酸化チタン(TiO2)である。この二酸化チタンに光(紫外線)が当たると、励起電子と正孔が生成し、生成した励起電子と正孔により、触媒表面での酸素と水分の存在下で、・O2-及び・OH(「・」は不対電子を示し、これを付した化学種がラジカル種であることを意味する。)等の活性酸素種を生成する。正孔や生成した活性酸素種は、汚れ分解機能及び窒素酸化物除去機能等の重要な光触媒活性を発現している。また、光が当たることにより表面超親水性を発揮し、外壁に付着した汚れを洗い流すことも知られている。 In recent years, photocatalyst paints have been put into practical use in order to impart antifouling performance to the outer walls of buildings such as houses and buildings, and the photocatalyst paints have been applied to the outer walls of buildings to form photocatalytic coating films. An inorganic compound material having photocatalytic activity is blended in this photocatalytic coating material so as to exhibit photocatalytic activity. The most commonly used inorganic compound material is titanium dioxide (TiO 2 ). When this titanium dioxide is exposed to light (ultraviolet rays), excited electrons and holes are generated. Due to the generated excited electrons and holes, .O 2 -and ・OH (in the presence of oxygen and water on the catalyst surface). "." represents an unpaired electron, which means that the chemical species with this is a radical species.) and other active oxygen species are generated. The holes and the generated active oxygen species exhibit important photocatalytic activities such as a stain decomposition function and a nitrogen oxide removal function. It is also known that when exposed to light, it exerts superhydrophilicity on the surface to wash away stains adhering to the outer wall.

一方、建築外壁には様々な汚れが存在し、カビや藻等の生物汚染による汚れも例外ではなく、光触媒活性による分解でカビや藻等の生物汚染を防ぐことが提案されている。しかし、光触媒による分解反応がカビや藻等の生長に追いつかないことも考えられ、光触媒塗膜材料に有機系防藻防カビ剤を配合することが提案されている(特許文献1及び2参照)。また、防汚塗料としての無機系化合物を含む塗膜も提案されている(特許文献3及び4参照)。 On the other hand, there are various stains on the outer wall of the building, and stains caused by bio-contamination such as mold and algae are no exception, and it has been proposed to prevent bio-contamination such as mold and algae by decomposition by photocatalytic activity. However, it is also considered that the decomposition reaction by the photocatalyst cannot catch up with the growth of mold, algae, etc., and it has been proposed to blend an organic anti-algae/mold agent into the photocatalyst coating material (see Patent Documents 1 and 2). .. A coating film containing an inorganic compound as an antifouling paint has also been proposed (see Patent Documents 3 and 4).

前述のように、活性酸素種は、光触媒塗料を塗布する基材(基体)上に形成された塗膜(以下、「光触媒塗膜直下塗膜」又は「下地塗膜」ともいう。)が有機塗膜の場合、この有機塗膜に損傷を与えることがある。そこで、光触媒塗膜直下塗膜と光触媒塗膜との間に、シリコーン樹脂に代表される保護層を設ける2層コートタイプの光触媒塗料が提案されている。 As described above, the active oxygen species are organic in the coating film (hereinafter, also referred to as “coating film directly below the photocatalytic coating film” or “undercoating film”) formed on the base material (base body) to which the photocatalytic coating material is applied. In the case of a coating film, this organic coating film may be damaged. Therefore, a two-layer coat type photocatalyst paint in which a protective layer typified by a silicone resin is provided between the photocatalyst coat and the photocatalyst coat is proposed.

特許第4092434号Patent No. 4092434 特開2016−808号公報JP, 2016-808, A 特許第4011705号Patent No. 4011705 特許第5361513号Patent No. 5361513

特許文献1(特許第4092434号)には、基材と、該基材上に設けられる中間層と、該中間層上に設けられる光触媒層とを備えた光触媒塗装体であって、中間層が、シリコーン変性樹脂と有機防カビ剤とを含んでなり、光触媒層が、光触媒粒子と、無機酸化物粒子と、加水分解性シリコーンとを所定の割合で含む光触媒塗装体が開示されている。特許文献2(特開2016−808号公報)の実施例29〜31では、所定の重合体の水分散体と、水分散コロイダルシリカと、光触媒活性を有する無機酸化物と、フルオロカーボン界面活性剤と、退色性色素と、防藻剤(防カビ剤)とを含有する水系コーティング剤を用いて形成された塗装体が開示されている。特許文献3(特許4011705号)には、基材と、表面層とを少なくとも有してなる、前記表面層が親水性でかつ自己浄化能を備えてなる、表面に時折雨が降り注ぐ環境において大気中の窒素酸化物、アンモニア、および/ または二酸化硫黄を削減するために用いられる複合材であって、前記表面層が、成分(i)光の照射を受けると触媒として機能する光触媒と、成分(ii)A123、ZnO、SrO、BaO、MgO、CaO、Rb2O、Na2O、およびK2Oからなる群から選択される少なくとも一の金属酸化物と成分(iii)SiO2、ZrO2、GeO2、およびThO2からなる群から選択される少なくとも一の金属酸化物と、成分(iv)AgおよびCuからなる群から選択される少なくとも一の抗菌性を発揮する金属とを含んでなり、前記成分(iv)が前記(i)の光触媒に担持されてなり、前記成分(iv)の重量をc、前記(i)の光触媒の重量をbと表したとき、c/bが0.00001〜0.05である、複合材が開示されている。特許文献4(特許5361513号)には、基材と、該基材上に設けられる中間層と、該中間層上に設けられた光触媒層とを備えた光触媒塗装体であって、前記光触媒層には、紫外線で励起される金属酸化物からなる光触媒粒子とイオン状態の銅元素とが含まれており、前記中間層には、耐候性樹脂と、ヒドロキシフェニルトリアジン化合物とが含まれていることを特徴とする光触媒塗装体が開示されている。 Patent Document 1 (Japanese Patent No. 4092434) describes a photocatalyst-coated body including a base material, an intermediate layer provided on the base material, and a photocatalyst layer provided on the intermediate layer. There is disclosed a photocatalyst-coated body comprising a silicone-modified resin and an organic antifungal agent, wherein the photocatalyst layer contains photocatalyst particles, inorganic oxide particles, and hydrolyzable silicone in a predetermined ratio. In Examples 29 to 31 of Patent Document 2 (JP-A-2016-808), an aqueous dispersion of a predetermined polymer, aqueous colloidal silica, an inorganic oxide having photocatalytic activity, and a fluorocarbon surfactant are used. , A coated body formed by using an aqueous coating agent containing a discoloring dye and an algae-proofing agent (antifungal agent). Patent Document 3 (Japanese Patent No. 4011705) discloses that at least the base material and the surface layer are contained, the surface layer is hydrophilic and has a self-cleaning ability, and the surface is exposed to occasional rain. A composite material used for reducing nitrogen oxides, ammonia, and/or sulfur dioxide therein, wherein the surface layer comprises a photocatalyst that functions as a catalyst when exposed to light of component (i), and a component ( ii) at least one metal oxide selected from the group consisting of A1 2 O 3 , ZnO, SrO, BaO, MgO, CaO, Rb 2 O, Na 2 O, and K 2 O and a component (iii) SiO 2 , At least one metal oxide selected from the group consisting of ZrO 2 , GeO 2 , and ThO 2 and at least one metal exhibiting antibacterial properties selected from the group (iv) consisting of Ag and Cu. When the component (iv) is supported on the photocatalyst of (i), the weight of the component (iv) is represented by c, and the weight of the photocatalyst of (i) is represented by b, then c/b is A composite is disclosed that is 0.00001-0.05. Patent Document 4 (Japanese Patent No. 5361513) discloses a photocatalyst-coated body including a substrate, an intermediate layer provided on the substrate, and a photocatalyst layer provided on the intermediate layer. Contains photocatalyst particles composed of a metal oxide that is excited by ultraviolet rays and an ionic copper element, and the intermediate layer contains a weather-resistant resin and a hydroxyphenyltriazine compound. A photocatalyst-coated body characterized by the above is disclosed.

しかし、いずれの引用文献の実施例においても、長期的に防藻性及び防カビ性を持続できることについては実証されていない。また、特許文献4では、中間層を基材と、光触媒層との間に形成しないと、基材(光触媒直下塗膜)にダメージ(損傷)を与える虞がある。 However, none of the examples of the cited documents has demonstrated that the anti-algae and anti-fungal properties can be maintained for a long period of time. Further, in Patent Document 4, if the intermediate layer is not formed between the base material and the photocatalyst layer, the base material (coating directly under the photocatalyst) may be damaged.

そこで、本発明においては、塗膜とする際、防藻性(防カビ性)の優れた長期持続性と、優れた耐候性と、光触媒直下塗膜(下地塗膜)に対する優れた低損傷性とを同時に満たすことが可能な光触媒組成物、光触媒塗膜、及び光触媒塗装製品を提供することを目的とする。 Therefore, in the present invention, when it is used as a coating film, it has excellent long-term durability of anti-algal property (antifungal property), excellent weather resistance, and excellent low damage property to a film directly below the photocatalyst (undercoating film). An object of the present invention is to provide a photocatalyst composition, a photocatalyst coating film, and a photocatalyst coating product that can simultaneously satisfy the following conditions.

本発明者らは上記課題を解決すべく鋭意検討した結果、抗菌性金属化合物と非抗菌性の光触媒不活性無機化合物とを所定の割合で含み、かつ過酸化水素の発生量を所定値以下に抑えることができる光触媒活性無機化合物を含めると、上記課題を解決できることを見出し、本発明をするに至った。 As a result of intensive studies to solve the above problems, the inventors of the present invention contained an antibacterial metal compound and a non-antibacterial photocatalytically inert inorganic compound in a predetermined ratio, and generated hydrogen peroxide to a predetermined value or less. It has been found that the above problems can be solved by including a photocatalytically active inorganic compound that can be suppressed, and the present invention has been completed.

すなわち、本発明は、以下の通りである。
[1]
抗菌性金属化合物(A1)と、抗菌性を有しない非抗菌性無機化合物(AA)とを含む
光触媒組成物であって、
前記非抗菌性無機化合物(AA)が、光触媒活性を有しない光触媒不活性無機化合物(
A2)と、光触媒活性を有する光触媒活性無機化合物(B)とを含み、
前記抗菌性金属化合物(A1)の前記光触媒不活性無機化合物(A2)に対する質量比
(A1/A2)が、0.001以上0.25以下であり、
前記抗菌性金属化合物(A1)に含まれる金属が、銅及び亜鉛からなる群より選択され
る少なくとも1種であり、前記光触媒不活性無機化合物(A2)の含有量が、前記抗菌性
金属化合物(A1)を除く前記光触媒組成物の固形分全体に対し、46.1質量%以上9
9質量%以下であり、
前記光触媒不活性無機化合物(A2)が、二酸化ケイ素であり、
前記光触媒活性無機化合物(B)が、以下の(i)の条件を満たすか、以下の(i)及
び以下の(ii)両方の条件を満たす、光触媒組成物。

(i)前記光触媒活性無機化合物(B)を含む懸濁液に、波長380nm以下、強度5m
W/cm2の紫外光を60秒間照射した際に発生する過酸化水素量([H22])が、80
μM以下である;
(ii)前記光触媒活性無機化合物(B)を含む懸濁液に、波長380nm以下、強度5m
W/cm2の紫外光を60秒間照射した際に発生するヒドロキシラジカル量[・OH]が、
1.0μM以下である:
[]
前記光触媒活性無機化合物(B)が、酸化チタンである、前項[1]に記載の光触媒組成物。
[]
前記光触媒活性無機化合物(B)の粒子表面が、金属酸化物(C)により、修飾処理されている、前項[1]又は[2]に記載の光触媒組成物。
[]
前記金属酸化物(C)が、二酸化ケイ素である、前項[]に記載の光触媒組成物。
[]
前記光触媒活性無機化合物(B)の含有量が、前記抗菌性金属化合物(A1)を除く前
記光触媒組成物の固形分全体に対し、1質量%以上20質量%以下である、前項[1]〜
[]のいずれかに記載の光触媒組成物。
[]
重合体粒子(D)をさらに含む、前項[1]〜[]のいずれかに記載の光触媒組成物。
[]
前記重合体粒子(D)の含有量が、前記抗菌性金属化合物(A1)を除く前記光触媒組成物全体に対し、40質量%以下である、前項[]に記載の光触媒組成物。
[]
フルオロカーボン界面活性剤(E)をさらに含む、前項[1]〜[]のいずれかに記載の光触媒組成物。
[]
退色性色素(F)をさらに含む、前項[1]〜[]のいずれかに記載の光触媒組成物。
[10]
前項[1]〜[]のいずれかに記載の光触媒組成物から形成された、光触媒塗膜。
[11]
前項[10]に記載の光触媒塗膜を備える、光触媒塗装製品。
That is, the present invention is as follows.
[1]
A photocatalyst composition comprising an antibacterial metal compound (A1) and a non-antibacterial inorganic compound (AA) having no antibacterial property,
The non-antibacterial inorganic compound (AA) is a photocatalytically inactive inorganic compound having no photocatalytic activity (
A2) and a photocatalytically active inorganic compound (B) having photocatalytic activity,
The mass ratio (A1/A2) of the antibacterial metal compound (A1) to the photocatalytically inactive inorganic compound (A2) is 0.001 or more and 0.25 or less,
The metal contained in the antibacterial metal compound (A1) is at least one selected from the group consisting of copper and zinc, and the content of the photocatalytically inactive inorganic compound (A2) is the antibacterial metal compound ( 46.1% by mass or more based on the total solid content of the photocatalyst composition excluding A1) 9
9 mass% or less,
The photocatalytically inactive inorganic compound (A2) is silicon dioxide,
A photocatalyst composition in which the photocatalytically active inorganic compound (B) satisfies the following condition (i), or both the following (i) and the following (ii).

(I) In the suspension containing the photocatalytically active inorganic compound (B), a wavelength of 380 nm or less and an intensity of 5 m
The amount of hydrogen peroxide ([H 2 O 2 ]) generated when irradiated with UV light of W/cm 2 for 60 seconds is 80
μM or less;
(Ii) In the suspension containing the photocatalytically active inorganic compound (B), a wavelength of 380 nm or less and an intensity of 5 m
The amount of hydroxy radicals [.OH] generated when UV light of W/cm 2 is irradiated for 60 seconds is
1.0 μM or less:
[ 2 ]
The photocatalyst composition according to the above item [1] , wherein the photocatalytically active inorganic compound (B) is titanium oxide.
[ 3 ]
The photocatalyst composition according to the above [1] or [2] , wherein the particle surface of the photocatalytically active inorganic compound (B) is modified with a metal oxide (C).
[ 4 ]
The photocatalyst composition according to the above item [ 3 ], wherein the metal oxide (C) is silicon dioxide.
[ 5 ]
The content of the photocatalytically active inorganic compound (B) is 1% by mass or more and 20% by mass or less based on the total solid content of the photocatalytic composition excluding the antibacterial metal compound (A1), [1] to
[ 4 ] The photocatalyst composition according to any one of [ 4 ].
[ 6 ]
The photocatalyst composition according to any one of items [1] to [ 5 ] above, further including polymer particles (D).
[ 7 ]
The photocatalyst composition according to the above item [ 6 ], wherein the content of the polymer particles (D) is 40% by mass or less based on the entire photocatalyst composition excluding the antibacterial metal compound (A1).
[ 8 ]
The photocatalyst composition according to any one of items [1] to [ 7 ] above, further containing a fluorocarbon surfactant (E).
[ 9 ]
The photocatalyst composition according to any one of the above items [1] to [ 8 ], further including a fading dye (F).
[ 10 ]
A photocatalyst coating film formed from the photocatalyst composition according to any one of items [1] to [ 9 ].
[ 11 ]
A photocatalyst-coated product comprising the photocatalyst coating according to the above [ 10 ].

本発明は、塗膜とする際、防藻性(防カビ性)の優れた長期持続性と、優れた耐候性と、光触媒直下塗膜(下地塗膜)に対する優れた低損傷性とを同時に満たすことが可能な光触媒組成物、光触媒塗膜、及び光触媒塗装製品を提供できる。 The present invention, when used as a coating film, simultaneously exhibits excellent long-term durability of anti-algal properties (antifungal properties), excellent weather resistance, and excellent low damage to the photocatalyst directly undercoat (undercoating). A photocatalyst composition, a photocatalyst coating film, and a photocatalyst coating product that can be filled can be provided.

以下、本発明を実施するための形態(以下、単に「本実施形態」という。)について詳細に説明する。本実施形態は、本発明を説明するための例示であり、本発明はその実施の形態のみに限定されるものではない。すなわち、本発明は、その要旨を逸脱しない範囲で様々な変形が可能である。 Hereinafter, modes for carrying out the present invention (hereinafter, simply referred to as “the present embodiment”) will be described in detail. The present embodiment is an example for explaining the present invention, and the present invention is not limited to the embodiment. That is, the present invention can be variously modified without departing from the gist thereof.

本明細書において、「防藻剤(防カビ剤)」とは、防藻剤及び防カビ剤の少なくとも一方をいい、「防藻性(防カビ性)」とは、防藻性及び防カビ性の少なくとも一方をいう。また、本明細書において、「長期持続性」、「耐候性」、及び「低損傷性」は、例えば、本実施形態の光触媒組成物から形成された塗膜の長期持続性、耐候性、及び低損傷性をいう。 In the present specification, the "algae-proofing agent (antifungal agent)" means at least one of an anti-algae agent and an antifungal agent, and the "algae-proofing (mold-proofing)" means anti-algae and anti-mold. At least one of sex. In addition, in the present specification, “long-term durability”, “weather resistance”, and “low damage” refer to, for example, long-term durability, weather resistance of a coating film formed from the photocatalyst composition of the present embodiment, and Refers to low damage.

[光触媒組成物(コーティング剤)]
本実施形態の光触媒組成物(コーティング剤)は、抗菌性無機化合物(A1)と、抗菌性を有しない非抗菌性無機化合物(AA)とを含む光触媒組成物であって、前記非抗菌性無機化合物(AA)が、光触媒活性を有しない光触媒不活性無機化合物(A2)と、光触媒活性を有する光触媒活性無機化合物(B)とを含み、前記抗菌性無機化合物(A1)の前記光触媒不活性無機化合物(A2)に対する質量比(A1/A2)が、0.001以上0.25以下であり、前記光触媒活性無機化合物(B)が、以下の(i)の条件を満たすか、以下の(i)及び以下の(ii)両方の条件を満たす。

(i)前記光触媒活性無機化合物(B)を含む懸濁液に、波長380nm以下、強度5mW/cm2の紫外光を60秒間照射した際に発生する過酸化水素量([H22])が、80μM以下である;
(ii)前記光触媒活性無機化合物(B)を含む懸濁液に、波長380nm以下、強度5mW/cm2の紫外光を60秒間照射した際に発生するヒドロキシラジカル量[・OH]が、1.0μM以下である:
[Photocatalyst composition (coating agent)]
The photocatalyst composition (coating agent) of the present embodiment is a photocatalyst composition containing an antibacterial inorganic compound (A1) and a non-antibacterial inorganic compound (AA) having no antibacterial property. The compound (AA) includes a photocatalytically inactive inorganic compound (A2) having no photocatalytic activity and a photocatalytically active inorganic compound (B) having photocatalytic activity, and the photocatalytically inactive inorganic material of the antibacterial inorganic compound (A1) The mass ratio (A1/A2) to the compound (A2) is 0.001 or more and 0.25 or less, and the photocatalytically active inorganic compound (B) satisfies the following condition (i), or the following (i) ) And (ii) below.

(I) The amount of hydrogen peroxide ([H 2 O 2 ] generated when the suspension containing the photocatalytically active inorganic compound (B) is irradiated with ultraviolet light having a wavelength of 380 nm or less and an intensity of 5 mW/cm 2 for 60 seconds. ) Is 80 μM or less;
(Ii) The amount of hydroxy radicals [.OH] generated when the suspension containing the photocatalytically active inorganic compound (B) was irradiated with ultraviolet light having a wavelength of 380 nm or less and an intensity of 5 mW/cm 2 for 60 seconds was 1. 0 μM or less:

本実施形態の光触媒組成物は、抗菌性金属化合物(A1)と、非抗菌性金属化合物の光触媒不活性無機化合物(A2)とを上記の質量比で含むことにより、防藻性(防カビ性)の長期持続性が優れる。また、本実施形態の光触媒組成物は、以下の(i)の測定条件における過酸化水素の発生量を下記上限値以下である光触媒活性無機化合物(B)を含むことにより、光触媒直下塗膜(下地塗膜)に対する低損傷性が優れる。さらに、本実施形態の光触媒組成物は、抗菌性金属化合物(A1)と、非抗菌性金属化合物の光触媒不活性無機化合物(A2)とを上記の質量比で含む光触媒不活性無機化合物(A)と、少なくとも以下の(i)の測定条件における過酸化水素発生量を下記上限値以下である光触媒活性無機化合物(B)とを組み合わせることにより、耐候性が優れる。 The photocatalyst composition of the present embodiment contains the antibacterial metal compound (A1) and the photocatalytically inactive inorganic compound (A2) of the non-antibacterial metal compound in the above-mentioned mass ratio, whereby the antialgal property (antifungal property) is obtained. ) Is excellent in long-term sustainability. Further, the photocatalyst composition of the present embodiment contains a photocatalytically active inorganic compound (B) having a hydrogen peroxide generation amount of the following upper limit value or less under the following measurement conditions (i), so that the coating film directly under the photocatalyst ( Excellent low damage to the base coating). Furthermore, the photocatalyst composition of this embodiment is a photocatalyst inactive inorganic compound (A) containing the antibacterial metal compound (A1) and the photocatalyst inactive inorganic compound (A2) of a non-antibacterial metal compound in the above mass ratio. And the photocatalytically active inorganic compound (B) whose hydrogen peroxide generation amount is at least the following upper limit value under the following measurement conditions (i), the weather resistance is excellent.

[抗菌性金属化合物(A1)]
本実施形態の光触媒組成物は、抗菌性を有する抗菌性金属化合物(A1)を含む。本明細書にいう「抗菌性を有する」)とは、例えば、大腸菌細胞に対して、菌の増殖を阻止するために、金属化合物の金属イオンを薬剤として投入した際、必要な最小濃度(最小発育阻止濃度(MIC))が20mM以下のものをいう。
[Antibacterial metal compound (A1)]
The photocatalyst composition of this embodiment contains an antibacterial metal compound (A1) having antibacterial properties. The term “having antibacterial properties” as used herein refers to, for example, a minimum concentration (minimum concentration) required when a metal ion of a metal compound is added as a drug to E. coli cells in order to prevent bacterial growth. It has a growth inhibitory concentration (MIC) of 20 mM or less.

本実施形態の抗菌性金属化合物(A1)に含まれる金属は、例えば、水銀、銀、金、パラジウム、白金、カドミウム、コバルト、ニッケル、銅、亜鉛、タリウム、鉛、マンガンなどの重金属が挙げられる。これらの金属は、1種を単独で、又は2種以上を組み合わせて用いることができる。これらの金属の中でも、安全性及び実用性が優れる観点から銅、銀、金、白金、及び亜鉛からなる群より選択される少なくとも1種であることが好ましく、銅、銀、及び金からなる群より選択される少なくとも1種であることがより好ましい。 Examples of the metal contained in the antibacterial metal compound (A1) of the present embodiment include heavy metals such as mercury, silver, gold, palladium, platinum, cadmium, cobalt, nickel, copper, zinc, thallium, lead and manganese. .. These metals can be used alone or in combination of two or more. Among these metals, at least one selected from the group consisting of copper, silver, gold, platinum, and zinc is preferable from the viewpoint of excellent safety and practicality, and the group consisting of copper, silver, and gold. More preferably, it is at least one selected from the above.

本実施形態の抗菌性金属化合物(A1)は、金属酸化物の形態であることが好ましい本実施形態の抗菌性金属化合物(A1)が、金属酸化物の形態であることにより、水に対する溶解度が小さく、光触媒組成物から形成される塗膜(光触媒塗膜)中に持続的に又は長期的に存在する可能性があり、耐生物汚染性(例えば、防藻性、防カビ性など)の長期持続性がより一層優れる傾向にある。 The antibacterial metal compound (A1) of the present embodiment is preferably in the form of a metal oxide. Since the antibacterial metal compound (A1) of the present embodiment is in the form of a metal oxide, the solubility in water is high. It is small and may exist in the coating film formed from the photocatalyst composition (photocatalyst coating film) continuously or in the long term, and has long-term resistance to biofouling (for example, algae resistance, mold resistance, etc.). Persistence tends to be even better.

金属酸化物としては、特に限定されないが、例えば、酸化銅、酸化銀、酸化亜鉛などが挙げられる。これらの金属酸化物は、1種を単独で、又は2種以上を組み合わせて用いることができる。これらの中でも、長期持続性がより一層優れる観点から、酸化銅、酸化銀、及び酸化亜鉛からなる群より選択される少なくとも1種であることが好ましく、酸化銅であることがより好ましい。 The metal oxide is not particularly limited, but examples thereof include copper oxide, silver oxide, and zinc oxide. These metal oxides may be used alone or in combination of two or more. Among these, at least one selected from the group consisting of copper oxide, silver oxide, and zinc oxide is preferable, and copper oxide is more preferable, from the viewpoint of further excellent long-term sustainability.

[非抗菌性無機化合物(AA)]
本実施形態の光触媒組成物は、非抗菌性無機化合物(AA)を含み、非抗菌性無機化合物(AA)は、光触媒活性を有しない光触媒不活性無機化合物(A2)と、光触媒活性を有する光触媒活性無機化合物(B)とを含む。本明細書にいう「光触媒活性を有しない」とは、光照射により、酸化反応及び還元反応のいずれもが起こらないことをいう。
[Non-antibacterial inorganic compound (AA)]
The photocatalyst composition of the present embodiment contains a non-antibacterial inorganic compound (AA), and the non-antibacterial inorganic compound (AA) is a photocatalytically inactive inorganic compound (A2) having no photocatalytic activity and a photocatalyst having a photocatalytic activity. And an active inorganic compound (B). The phrase “having no photocatalytic activity” as used herein means that neither an oxidation reaction nor a reduction reaction occurs due to light irradiation.

[光触媒不活性無機化合物(A2)]
本実施形態の非抗菌性の光触媒不活性無機化合物(A2)としては、特に限定されず、例えば、二酸化ケイ素(シリカ)、酸化アルミニウム(アルミナ)、珪酸カルシウム、酸化マグネシウム、酸化アンチモン、酸化ジルコニウム及びこれらの複合酸化物等の無機酸化物が挙げられる。これらの中でも、表面水酸基が多い観点から、二酸化ケイ珪素、酸化アルミニウム、酸化アンチモン、及びこれらの複合酸化物からなる群より選択される少なくとも1種の無機酸化物であることが好ましく、二酸化ケイ素であることがより好ましい。
[Photocatalytically inactive inorganic compound (A2)]
The non-antibacterial photocatalytically inactive inorganic compound (A2) of the present embodiment is not particularly limited, and examples thereof include silicon dioxide (silica), aluminum oxide (alumina), calcium silicate, magnesium oxide, antimony oxide, zirconium oxide and Inorganic oxides such as these complex oxides can be mentioned. Among these, at least one inorganic oxide selected from the group consisting of silicon dioxide, aluminum oxide, antimony oxide, and complex oxides thereof is preferable from the viewpoint of having many surface hydroxyl groups. More preferably.

本実施形態の非抗菌性の光触媒不活性金属化合物(A2)として用いられる無機化合物は、水和物等のコロイド粒子として存在していることが好ましい。すなわち、無機化合物(好ましくは無機酸化物)コロイド粒子であることにより、後述する光触媒活性無機化合物(B)及び重合体粒子(D)などの他の成分とのさらなる複合化が可能となり、本実施形態の光触媒組成物を水系コーティング剤として用いた際の安定性がより一層向上する。 The inorganic compound used as the non-antibacterial photocatalytically inactive metal compound (A2) of the present embodiment is preferably present as colloidal particles such as a hydrate. That is, by being an inorganic compound (preferably an inorganic oxide) colloidal particle, further complexation with other components such as the photocatalytically active inorganic compound (B) and polymer particles (D) described later becomes possible, and the present embodiment When the photocatalyst composition in the form is used as an aqueous coating agent, the stability is further improved.

二酸化ケイ素は、コロイダルシリカであることが好ましい。コロイダルシリカとしては、二酸化ケイ素を基本単位とするシリカの水又は水溶性溶媒の分散体であるコロイダルシリカ等が挙げられる。 The silicon dioxide is preferably colloidal silica. Examples of the colloidal silica include colloidal silica, which is a dispersion of silica having silicon dioxide as a basic unit in water or a water-soluble solvent.

コロイダルシリカの製造方法は、特に限定されず、例えば、ゾル−ゲル法で調製できる。ゾル−ゲル法で調製する場合には、Werner Stober et al.; Journal of Colloid And Interface Science, vol. 26, pp. 62−69 (1968)や、Rickey D.Badley et al.; Langmuir 6, 792−801 (1990)や、「色材協会誌」、61[9]488−493(1988)等を参照できる。 The method for producing colloidal silica is not particularly limited, and for example, it can be prepared by a sol-gel method. When prepared by the sol-gel method, Werner Stober et al. Journal of Colloid And Interface Science, vol. 26, pp. 62-69 (1968) and Rickey D. et al. Badley et al. Langmuir 6, 792-801 (1990), "Coloring Material Association Magazine", 61 [9] 488-493 (1988), and the like.

コロイダルシリカは、例えば、水性分散液に分散された状態で、酸性のコロイダルシリカであってもよく、塩基性のコロイダルシリカであってもよい。水を分散媒体とする酸性のコロイダルシリカとしては、市販品を用いることもでき、市販品としては、例えば、日産化学工業社製品「スノーテックス(商標)−OXS」、「スノーテックス−OS」、「スノーテックス−O」、「スノーテックス−O−40」、「スノーテックス−OL」及び「スノーテックス−OYL」、旭電化工業社製品「アデライト(商標)AT−20Q」、クラリアントジャパン社製品「クレボゾール(商標)20H12」及び「クレボゾール30CAL25」等が挙げられる。 The colloidal silica may be, for example, acidic colloidal silica or basic colloidal silica in a state of being dispersed in an aqueous dispersion. As the acidic colloidal silica having water as a dispersion medium, commercially available products may be used, and examples of the commercially available products include "Snowtex (trademark)-OXS" and "Snowtex-OS" manufactured by Nissan Chemical Industries, Ltd., "Snowtex-O", "Snowtex-O-40", "Snowtex-OL" and "Snowtex-OYL", Asahi Denka Co., Ltd. product "Adelite (trademark) AT-20Q", Clariant Japan company product " "Clevozole (trademark) 20H12" and "Clevozole 30CAL25" and the like can be mentioned.

塩基性のコロイダルシリカとしては、アルカリ金属イオン、アンモニウムイオン、アミン等の添加により安定化されたコロイダルシリカが挙げられる。これらは市販品を用いることもでき、市販品としては、例えば、日産化学工業社製品「スノーテックス−XS」、「スノーテックス−S」、「スノーテックス−30」、「スノーテックス−50」、「スノーテックス−20L」、「スノーテックス−XL」、「スノーテックス−YL」、「スノーテックス−ZL」、「スノーテックス−NXS」、「スノーテックス−NS」、「スノーテックス−N」、「スノーテックス−N40」、「スノーテックス−CXS」、「スノーテックス−C」、「スノーテックス−CM」、「スノーテックス−PS−S」及び「スノーテックスPS−M」;旭電化工業社製品「アデライトAT−20」、「アデライトAT−30」、「アデライトAT−20N」、「アデライトAT−30N」、「アデライトAT−20A」、「アデライトAT−30A」、「アデライトAT−40」及び「アデライトAT−50」;クラリアントジャパン社製品「クレボゾール30R9」、「クレボゾール30R50」、「クレボゾール50R50」、デュポン社製品「ルドックス(商標)HS−40」、「ルドックスHS−30」、「ルドックスLS」及び「ルドックスSM−30」等が挙げられる。 Examples of the basic colloidal silica include colloidal silica stabilized by addition of alkali metal ions, ammonium ions, amines and the like. These may be commercially available products, and examples of commercially available products include "Snowtex-XS", "Snowtex-S", "Snowtex-30", "Snowtex-50", manufactured by Nissan Chemical Industries, Ltd., "Snowtex-20L", "Snowtex-XL", "Snowtex-YL", "Snowtex-ZL", "Snowtex-NXS", "Snowtex-NS", "Snowtex-N", "Snowtex-N", "Snowtex-N40", "Snowtex-CXS", "Snowtex-C", "Snowtex-CM", "Snowtex-PS-S" and "Snowtex PS-M"; Asahi Denka Kogyo KK product Adelite AT-20", "Adelite AT-30", "Adelite AT-20N", "Adelite AT-30N", "Adelite AT-20A", "Adelite AT-30A", "Adelite AT-40" and "Adelite AT-40" AT-50"; "Clevosol 30R9", "Clevozole 30R50", "Clevozole 50R50" manufactured by Clariant Japan Ltd., "Ludox (trademark) HS-40", "Ludox HS-30", "Ludox LS" and "Ludox LS" and "Ludox LS" and "Ludox LS". Ludox SM-30" and the like.

水溶性溶媒を分散媒体とするコロイダルシリカとしては、市販品を用いることもでき、市販品としては、例えば、日産化学工業社製品「MA−ST−M(粒子径20〜25nmのメタノール分散タイプ)」、「IPAST(粒子径10〜15nmのイソプロピルアルコール分散タイプ)」、「EG−ST(粒子径10〜15nmのエチレングリコール分散タイプ)」、「EG−ST−ZL(粒子径70〜100nmのエチレングリコール分散タイプ)」、「NPC−ST(粒子径10〜15nmのエチレングリコールモノプロピルエーテル分散タイプ)」等が挙げられる。 As the colloidal silica having a water-soluble solvent as a dispersion medium, a commercially available product may be used, and as the commercially available product, for example, a product “MA-ST-M (dispersion type of methanol having a particle diameter of 20 to 25 nm) manufactured by Nissan Chemical Industries, Ltd.” may be used. , "IPAST (dispersion type of isopropyl alcohol having a particle size of 10 to 15 nm)", "EG-ST (dispersion type of ethylene glycol having a particle size of 10 to 15 nm)", "EG-ST-ZL (ethylene having a particle size of 70 to 100 nm) Glycol dispersion type)", "NPC-ST (ethylene glycol monopropyl ether dispersion type having a particle diameter of 10 to 15 nm)" and the like.

これらのコロイダルシリカは、1種を単独で、又は2種以上を組み合わせて用いることができる。これらのコロイダルシリカは、さらに、コロイダルシリカは、アルミナやアルミン酸ナトリウム等を少量含んでもよい。また、コロイダルシリカは、安定剤として、無機塩基(例えば、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、アンモニア等)や有機塩基(例えば、テトラメチルアンモニウム等)を含んでもよい。 These colloidal silica can be used individually by 1 type or in combination of 2 or more types. These colloidal silicas may further contain a small amount of alumina, sodium aluminate or the like. The colloidal silica may also contain an inorganic base (eg, sodium hydroxide, potassium hydroxide, lithium hydroxide, ammonia, etc.) or an organic base (eg, tetramethylammonium, etc.) as a stabilizer.

本実施形態の非抗菌性無機化合物(A2)の数平均粒子径は、好ましくは1.0〜400nmであり、より好ましくは1.0〜100nmであり、さらに好ましくは1.0〜30nmである。非抗菌性無機化合物(A2)の数平均粒子径が、1nm以上であることにより、光触媒組成物(水系コーティング剤)の貯蔵安定性がより一層向上する傾向にあり、数平均粒子径が、400nm以下であることにより、得られる塗膜の透明性がより一層向上する傾向にある。なお、数平均粒子径は、湿式粒度分析計を用いて測定することができる。 The number average particle diameter of the non-antibacterial inorganic compound (A2) of the present embodiment is preferably 1.0 to 400 nm, more preferably 1.0 to 100 nm, and further preferably 1.0 to 30 nm. .. When the number average particle diameter of the non-antibacterial inorganic compound (A2) is 1 nm or more, the storage stability of the photocatalyst composition (water-based coating agent) tends to be further improved, and the number average particle diameter is 400 nm. By the following, the transparency of the obtained coating film tends to be further improved. The number average particle diameter can be measured using a wet particle size analyzer.

非抗菌性の光触媒不活性無機化合物(A2)の含有量は、抗菌性金属化合物(A1)を
除く前記光触媒組成物の固形分全体(又は、塗膜とする際の抗菌性金属化合物を除く塗膜
全体)(100質量%)に対し、46.1質量%以上99.9質量%以下であることが好ましく、46.1質量%以上99質量%以下であることがより好ましく、46.1質量%以上85質量%以下であることがさらに好ましい。含有量が、46.1質量%以上であることにより、塗膜とする際の耐生物汚染性(例えば、防藻性、防カビ性)がより一層向上する傾向にあり、99.9質量%以下であることにより、塗膜とする際の耐候性がより一層向上する傾向にある。
The content of the non-antibacterial photocatalytically inactive inorganic compound (A2) is the whole solid content of the photocatalyst composition excluding the antibacterial metal compound (A1) (or the coating excluding the antibacterial metal compound when forming the coating film). with respect to the total film) (100 mass%), preferably at most 99.9 mass% or more 46.1% by weight, more preferably at most 46.1% by weight to 99% by weight, 46.1 wt % To 85% by mass is more preferable. When the content is 46.1 % by mass or more, the biofouling resistance (eg, algae-proofing property and mold-proofing property) in forming a coating film tends to be further improved, and is 99.9% by mass. By being the following, the weather resistance when forming a coating film tends to be further improved.

本実施形態の光触媒組成物中の抗菌性金属化合物(A1)の光触媒不活性無機化合物(A2)に対する質量比(A1)/(A2)は、0.001以上0.25以下であることが好ましく、0.004以上0.15以下であることがより好ましく、0.005以上0.05以下であることがさらに好ましい。質量比が、0.001以上であることにより、耐生物汚染性(防カビ性、防藻性)がより一層優れる傾向にあり、0.25以下であることにより、着色、白化等による塗膜外観不良が抑制され、優れた外観を維持できる傾向にある。 The mass ratio (A1)/(A2) of the antibacterial metal compound (A1) to the photocatalytically inactive inorganic compound (A2) in the photocatalyst composition of the present embodiment is preferably 0.001 or more and 0.25 or less. , 0.004 or more and 0.15 or less, more preferably 0.005 or more and 0.05 or less. When the mass ratio is 0.001 or more, the biofouling resistance (mold resistance, algae resistance) tends to be further excellent, and when it is 0.25 or less, the coating film due to coloring, whitening, etc. Poor appearance tends to be suppressed, and an excellent appearance tends to be maintained.

[光触媒活性無機化合物(B)]
本実施形態の光触媒組成物は、光触媒活性を有する光触媒活性無機化合物(B)を含む。これにより、本実施形態の光触媒組成物から形成される塗膜は、光触媒活性を有することができ、光が照射されることにより、塗膜に光触媒活性、親水性を発現できる。
[Photocatalytically active inorganic compound (B)]
The photocatalyst composition of this embodiment contains a photocatalytically active inorganic compound (B) having photocatalytic activity. As a result, the coating film formed from the photocatalyst composition of the present embodiment can have photocatalytic activity, and can be exposed to light to exhibit photocatalytic activity and hydrophilicity.

本実施形態の光触媒活性無機化合物(B)は、以下の(i)の条件を満たすか、以下の(i)及び以下の(ii)両方の条件を満たす。本実施形態の光触媒活性無機化合物(B)は、以下の(i)の条件を満たすことにより、光触媒直下塗膜(下地塗膜)に対する低損傷性が優れ、以下の(i)の条件及び以下の(ii)両方の条件を満たすことにより、より一層低損傷性が優れる傾向にある。

(i)前記光触媒活性無機化合物(B)を含む懸濁液に、波長380nm以下、強度5mW/cm2の紫外光を60秒間照射した際に発生する過酸化水素量([H22])が、80μM以下である;
(ii)前記光触媒活性無機化合物(B)を含む懸濁液に、波長380nm以下、強度5mW/cm2の紫外光を60秒間照射した際に発生するヒドロキシラジカル量[・OH]が、1.0μM以下である:
The photocatalytically active inorganic compound (B) of the present embodiment satisfies the following condition (i) or both the following (i) and (ii) conditions. The photocatalytically active inorganic compound (B) of the present embodiment is excellent in low damage to the coating directly under the photocatalyst (base coating) by satisfying the following condition (i). By satisfying both conditions of (ii), the low damage tends to be more excellent.

(I) The amount of hydrogen peroxide ([H 2 O 2 ] generated when the suspension containing the photocatalytically active inorganic compound (B) is irradiated with ultraviolet light having a wavelength of 380 nm or less and an intensity of 5 mW/cm 2 for 60 seconds. ) Is 80 μM or less;
(Ii) The amount of hydroxy radicals [.OH] generated when the suspension containing the photocatalytically active inorganic compound (B) was irradiated with ultraviolet light having a wavelength of 380 nm or less and an intensity of 5 mW/cm 2 for 60 seconds was 1. 0 μM or less:

本明細書にいう「懸濁液」は、例えば、実施例に記載の条件により調製した懸濁液をいう。 The “suspension” used herein refers to, for example, a suspension prepared under the conditions described in the examples.

本実施形態の光触媒活性無機化合物(B)は、特定紫外光を60秒間照射した際に発生する活性酸素種量の内、過酸化水素量[H22]が、80μM以下であり、好ましくは20μM以下、より好ましくは10μM以下である。過酸化水素量[H22]が80μM以下であることにより、光触媒直下塗膜(下地塗膜)の損傷を抑制することができる。なお、本明細書にいう「特定紫外光」とは380nm以下の波長領域であり、5mW/cm2の強度を有する紫外光のことをいい、「μM」は、マイクロモーラーを表し、1μM=10-6M=10-6mol/Lである。 The photocatalytically active inorganic compound (B) of the present embodiment has a hydrogen peroxide amount [H 2 O 2 ] of 80 μM or less among the amount of active oxygen species generated when the specific ultraviolet light is irradiated for 60 seconds, and is preferable. Is 20 μM or less, more preferably 10 μM or less. When the amount of hydrogen peroxide [H 2 O 2 ] is 80 μM or less, damage to the coating film (undercoating film) directly under the photocatalyst can be suppressed. The "specific ultraviolet light" referred to in the present specification means ultraviolet light having a wavelength region of 380 nm or less and an intensity of 5 mW/cm 2 , "μM" represents micromolar, and 1 μM=10. -6 M=10 -6 mol/L.

活性酸素種のうち、過酸化水素(H22)は、ヒドロキシラジカル(・OH)のようなラジカル種に比べて、安定な物質であり、ラジカル種の寿命(1秒以下)に比べて長寿命であり、遠距離まで移動して光触媒塗膜直下塗膜に損傷を与えるようである。これに対し、本実施形態の光触媒活性無機化合物(B)は、過酸化水素量(過酸化水素発生量)[H22]を80μM以下と比較的小さくできるため、光触媒塗膜直下塗膜の損傷を抑制できる。 Among the active oxygen species, hydrogen peroxide (H 2 O 2 ) is a stable substance compared to radical species such as hydroxy radical (.OH), and compared to the life of the radical species (1 second or less). It has a long life, and it seems to move to a long distance and damage the coating directly below the photocatalytic coating. On the other hand, in the photocatalytically active inorganic compound (B) of the present embodiment, the hydrogen peroxide amount (hydrogen peroxide generation amount) [H 2 O 2 ] can be made relatively small at 80 μM or less. The damage of can be suppressed.

本実施形態の光触媒活性無機化合物(B)は、前記特定紫外光を60秒間照射した際に発生する活性酸素種量の内、ヒドロキシラジカル量[・OH]が、1.0μM以下であることが好ましく、1.0μM未満であることがより好ましく、0.5μM未満(又は以下)であることがさらに好ましい。ヒドロキシラジカル(・OH)は、下地塗膜に損傷を与える作用を有する。これに対し、ヒドロキシラジカル量(ヒドロキシラジカル発生量)[・OH]が1.0μM以下とすることにより、光触媒直下塗膜の損傷をより一層抑制できる傾向にある。 The photocatalytically active inorganic compound (B) of the present embodiment has a hydroxy radical amount [.OH] of 1.0 μM or less in the amount of active oxygen species generated when the specific ultraviolet light is irradiated for 60 seconds. It is preferably less than 1.0 μM, more preferably less than 0.5 μM (or less). Hydroxy radicals (.OH) have the effect of damaging the underlying coating film. On the other hand, when the amount of hydroxy radicals (amount of hydroxy radicals generated) [.OH] is 1.0 μM or less, damage to the coating film directly under the photocatalyst tends to be further suppressed.

本実施形態の光触媒活性無機化合物(B)は、本発明の作用効果(特に耐候性及び下地塗膜に対する低損傷性)をより有効かつ確実に奏する観点から、前記(i)の条件及び(ii)の条件の両方を満たすことが好ましい。 From the viewpoint that the photocatalytically active inorganic compound (B) of the present embodiment more effectively and reliably exhibits the effects of the present invention (particularly weather resistance and low damage to the underlying coating film), the condition (i) and (ii) It is preferable that both of the conditions of 1) are satisfied.

上述した各活性酸素種量([H22]及び[・OH])を上記特定値以下(又は未満)に調整する方法としては、特に限定されないが、例えば、後述する光触媒活性無機化合物(B)の粒子表面に修飾処理を施す方法などが挙げられる。光触媒活性無機化合物(B)の粒子表面に修飾処理することにより、各活性酸素種量を上記特定値以下にできる要因は、表面修飾処理された光触媒活性無機化合物により、活性酸素種を失活したり、トラップしたりすることができると考えられる。但し、この要因により本発明は何ら限定されるものではい。 The method for adjusting the amount of each active oxygen species ([H 2 O 2 ] and [.OH]) described above to be less than (or less than) the specific value is not particularly limited, but, for example, a photocatalytically active inorganic compound (described later) ( Examples thereof include a method of applying a modification treatment to the particle surface of B). By modifying the particle surface of the photocatalytically active inorganic compound (B), the amount of each active oxygen species can be reduced to the above specified value or less by the reason that the surface-modified photocatalytically active inorganic compound deactivates the active oxygen species. It is thought that it can be trapped. However, the present invention is not limited to this factor.

本実施形態の光触媒活性無機化合物(B)としては、例えば、酸化チタン(TiO2)、チタン酸ストロンチウム(SrTiO3)、リン化ガリウム(GaP)、リン化インジウム(InP)、ヒ化ガリウム(GaAs)、チタン酸バリウム(BaTiO3、BaTiO4、BaTi49)、ニオブ酸カリウム(K2NbO3)、ニオブ酸(Nb25)、酸化鉄(Fe23)、五酸化タンタル(Ta25)、K3Ta3Si23、酸化タングステン(WO3)、酸化スズ(SnO2)、酸化ビスマス(Bi23)、バナジン酸ビスマス(BiVO4)、炭化ケイ素(SiC)、二硫化モリブデン(MoS2)、鉛化インジウム(InPb)、二酸化ルテニウム(RuO2)、及び二酸化セシウム(CeO2)、Nb、Ta、及びVからなる群より選ばれる少なくとも1種の元素を有する層状酸化物(例えば、特開昭62−074452号公報、特開平02−172535号公報、特開平07−024329号公報、特開平08−089799号公報、特開平08−089800号公報、特開平08−089804号公報、特開平09−248465号公報、特開平10−099694号公報、特開平10−244165号公報等)が挙げられる。 Examples of the photocatalytically active inorganic compound (B) of this embodiment include titanium oxide (TiO 2 ), strontium titanate (SrTiO 3 ), gallium phosphide (GaP), indium phosphide (InP), gallium arsenide (GaAs). ), barium titanate (BaTiO 3 , BaTiO 4 , BaTi 4 O 9 ), potassium niobate (K 2 NbO 3 ), niobate (Nb 2 O 5 ), iron oxide (Fe 2 O 3 ), tantalum pentoxide ( Ta 2 O 5 ), K 3 Ta 3 Si 2 O 3 , tungsten oxide (WO 3 ), tin oxide (SnO 2 ), bismuth oxide (Bi 2 O 3 ), bismuth vanadate (BiVO 4 ), silicon carbide (SiC) ), molybdenum disulfide (MoS 2 ), indium lead (InPb), ruthenium dioxide (RuO 2 ), and cesium dioxide (CeO 2 ), at least one element selected from the group consisting of Nb, Ta, and V. Layered oxides having (for example, JP-A-62-074452, JP-A-02-172535, JP-A-07-024329, JP-A-08-087999, JP-A-08-089800, and JP-A-08-0889800). 08-089804, JP-A 09-248465, JP-A 10-099694, JP-A 10-244165 and the like).

これらの光触媒活性無機化合物(B)は、1種を単独で、又は2種以上を組み合わせて用いることができる。これらの中でも、本発明の作用効果をより有効かつ確実に奏する観点から、光触媒活性を有する無機酸化物(光触媒無機酸化物(B))であることが好ましく、安全性及びコストが優れる観点から、酸化チタンであることがより好ましい。酸化チタンの結晶構造としては、例えば、アナターゼ型、ルチル型、ブルッカイト型が挙げられ、これらの中でもルチル型であることが好ましい。
い。
These photocatalytically active inorganic compounds (B) can be used alone or in combination of two or more. Among these, from the viewpoint of more effectively and reliably exhibiting the action and effect of the present invention, an inorganic oxide having photocatalytic activity (photocatalytic inorganic oxide (B)) is preferable, and from the viewpoint of excellent safety and cost, It is more preferably titanium oxide. Examples of the crystal structure of titanium oxide include anatase type, rutile type, and brookite type, and of these, the rutile type is preferable.
Yes.

本実施形態の光触媒活性無機酸化物(B)の粒子表面は、金属酸化物(又は修飾剤)(C)により、修飾処理されていることが好ましい。粒子表面が修飾剤により修飾処理されていることにより、H22や・OH等の活性酸素種の発生量をより一層低減でき、下地塗膜の損傷をより一層抑制できる傾向にある。金属酸化物(修飾剤)としては、例えば、二酸化ケイ素、アルミ、銅酸化物、鉄酸化物等の金属酸化物が挙げられる。 The particle surface of the photocatalytically active inorganic oxide (B) of the present embodiment is preferably modified with a metal oxide (or modifier) (C). By modifying the surface of the particles with a modifier, the amount of active oxygen species such as H 2 O 2 and .OH generated can be further reduced, and damage to the base coating film can be further suppressed. Examples of the metal oxide (modifier) include metal oxides such as silicon dioxide, aluminum, copper oxide, and iron oxide.

これらの金属酸化物は1種を単独で、又は2種以上を組み合わせて用いることができる。これらの中でも、二酸化ケイ素であることが好ましい。金属酸化物として二酸化ケイ素を用いることにより、光触媒活性無機化合物(B)を含む水分散体や水系ゾルのような組成物でのpHを中性に保てることができ、光触媒活性無機化合物(B)粒子が凝集しにくく、微粒子の形態を安定に維持できることに起因して塗膜の外観特性(例えば、低白濁性など)がより一層向上できる傾向にある。
二酸化ケイ素を修飾する方法としては、例えば、酸化チタンを光触媒活性無機化合物(A)として用いる場合、酸化チタンのスラリーにケイ素化合物を添加し、中和処理等してケイ素の含水酸化物を析出させる方法が挙げられる。ケイ素化合物としては、ケイ酸ナトリウム等の水溶性ケイ酸アルカリ金属塩が挙げられ、無色であり、酸化チタンゾルが着色しない観点から、ケイ酸ナトリウムであることが好ましい。ケイ素の含水酸化物の処理量は、酸化チタンに対して酸化物基準で3質量%以上25質量%以下であることが好ましく、5質量%以上20質量%以下であることがより好ましい。処理量が3質量%未満であると、活性酸素種量が多くなり光触媒塗膜直下塗膜(下地塗膜)に損傷を与える虞がある。また、処理量が25質量%を超えると、酸化チタンが凝集し、ゾルの粘度が上昇しやすく、分散性が悪化し、透明性が不十分になる虞がある。
These metal oxides may be used alone or in combination of two or more. Of these, silicon dioxide is preferable. By using silicon dioxide as the metal oxide, the pH of a composition such as an aqueous dispersion or an aqueous sol containing the photocatalytically active inorganic compound (B) can be kept neutral, and the photocatalytically active inorganic compound (B) can be maintained. Since the particles are less likely to aggregate and the morphology of the particles can be stably maintained, the appearance characteristics of the coating film (for example, low cloudiness) tend to be further improved.
As a method of modifying silicon dioxide, for example, when titanium oxide is used as the photocatalytically active inorganic compound (A), a silicon compound is added to a slurry of titanium oxide and neutralized to precipitate a hydrous oxide of silicon. There is a method. Examples of the silicon compound include water-soluble alkali metal silicates such as sodium silicate, which is colorless and is preferably sodium silicate from the viewpoint of not coloring the titanium oxide sol. The amount of hydrous oxide of silicon to be treated is preferably 3% by mass or more and 25% by mass or less, more preferably 5% by mass or more and 20% by mass or less, based on the oxide based on titanium oxide. If the treatment amount is less than 3% by mass, the amount of active oxygen species increases, and the coating film (undercoating film) directly below the photocatalytic coating film may be damaged. On the other hand, if the treatment amount exceeds 25% by mass, titanium oxide may agglomerate, the viscosity of the sol tends to increase, the dispersibility may deteriorate, and the transparency may become insufficient.

前記金属酸化物(C)は、抗菌性金属が担持されている形態であってもよい。このような形態である金属酸化物(C)で光触媒活性無機化合物(B)を表面修飾処理すると、光触媒活性無機化合物(B)に、抗菌性金属が担持され、耐生物汚染性(防藻性、防カビ性など)がより一層優れる傾向にある。抗菌性金属としては、例えば、水銀、銀、金、パラジウム、白金、カドミウム、コバルト、ニッケル、銅、亜鉛、タリウム、鉛、マンガンなどの重金属が挙げられる。これらの抗菌性金属は、一種を単独で、又は二種以上を組み合わせて用いることができる。これらの中でも、安全性、実用性が優れる観点から銅、銀、金、白金、及び亜鉛からなる群より選択される少なくとも1種であることが好ましく、銅、銀、及び金からなる群より選択される少なくとも1種であることがより好ましい。 The metal oxide (C) may be in the form of supporting an antibacterial metal. When the photocatalytically active inorganic compound (B) is surface-modified with the metal oxide (C) having such a form, the photocatalytically active inorganic compound (B) is loaded with an antibacterial metal, and thus has a biofouling resistance (algae resistance). , Mold resistance, etc.) tends to be more excellent. Examples of the antibacterial metal include heavy metals such as mercury, silver, gold, palladium, platinum, cadmium, cobalt, nickel, copper, zinc, thallium, lead and manganese. These antibacterial metals can be used alone or in combination of two or more. Among these, at least one selected from the group consisting of copper, silver, gold, platinum, and zinc is preferable from the viewpoint of excellent safety and practicality, and selected from the group consisting of copper, silver, and gold. More preferably, it is at least one kind.

本実施形態の光触媒活性無機酸化物(B)は、光触媒性能をより一層向上したり、塗膜透明性特に塗膜の白濁度をより一層低下させたり、分散性をより一層向上したりする観点から、その一次平均粒子径(相加平均)で1〜400nmの範囲にあることが好ましく、1〜100nmの範囲にあることがより好ましい。さらに好ましくは、40〜70nmの範囲にあることが好ましい。なお、光触媒活性無機酸化物(B)の粒子形状がロッド形状等の長径と短径とを有する場合、その長径及び短径の相加平均が上記範囲内にあることが好ましい。光触媒活性無機酸化物(B)の一次平均粒子径は、例えば、任意に選択された50個の粒子を電子顕微鏡観察により測定し、それらの相加平均として導出してもよい。 The photocatalytically active inorganic oxide (B) of the present embodiment has a viewpoint of further improving the photocatalytic performance, further reducing the transparency of the coating film, especially the white turbidity of the coating film, and further improving the dispersibility. Therefore, the primary average particle diameter (arithmetic average) thereof is preferably in the range of 1 to 400 nm, and more preferably in the range of 1 to 100 nm. More preferably, it is in the range of 40 to 70 nm. When the particle shape of the photocatalytically active inorganic oxide (B) has a major axis and a minor axis such as a rod shape, the arithmetic mean of the major axis and the minor axis is preferably within the above range. The primary average particle diameter of the photocatalytically active inorganic oxide (B) may be derived as an arithmetic average of, for example, 50 particles selected arbitrarily and observed by an electron microscope.

光触媒活性無機化合物(B)の含有量は、抗菌性金属化合物(A1)を除く前記光触媒組成物の固形分全体(又は塗膜とする際の抗菌性金属化合物(A1)を除く塗膜全体)(100質量%)に対し、1質量%以上20質量%以下であることが好ましく、5質量%以上15質量%以下であることがより好ましく、10質量%以上15質量%以下であることがさらに好ましい。光触媒活性無機化合物(B)の含有量を上記範囲内とすることにより、耐生物汚染性(防藻性、防カビ性)や透明性がより一層優れる傾向にある。 The content of the photocatalytically active inorganic compound (B) is the total solid content of the photocatalyst composition excluding the antibacterial metal compound (A1) (or the entire coating film excluding the antibacterial metal compound (A1) when forming a coating film). It is preferably 1% by mass or more and 20% by mass or less, more preferably 5% by mass or more and 15% by mass or less, and further preferably 10% by mass or more and 15% by mass or less with respect to (100% by mass). preferable. By setting the content of the photocatalytically active inorganic compound (B) within the above range, the biofouling resistance (algae resistance, mold resistance) and transparency tend to be further excellent.

本実施形態において、非抗菌性の光触媒不活性無機化合物(A2)の含有量は、前記抗菌性金属化合物(A1)を除く前記光触媒組成物の固形分全体に対し、40質量%以上99質量%以下であること好ましく、前記光触媒活性無機化合物(B)の含有量は、前記抗菌性金属化合物(A1)を除く前記光触媒組成物の固形分全体に対し、1質量%以上20質量%以下であることが好ましい。前記非抗菌性の光触媒不活性金属化合物(A2)の含有量及び光触媒活性無機化合物(B)の含有量が上記範囲内を同時に満たすことにより、耐候性、耐生物汚染性(防藻性、防カビ性)、及び透明性をより一層バランスよく同時に満たすことができる。 In the present embodiment, the content of the non-antibacterial photocatalytically inactive inorganic compound (A2) is 40% by mass or more and 99% by mass or more based on the entire solid content of the photocatalytic composition excluding the antibacterial metal compound (A1). The content of the photocatalytically active inorganic compound (B) is preferably 1% by mass or more and 20% by mass or less based on the total solid content of the photocatalytic composition excluding the antibacterial metal compound (A1). It is preferable. When the content of the non-antibacterial photocatalytically inactive metal compound (A2) and the content of the photocatalytically active inorganic compound (B) simultaneously satisfy the above ranges, weather resistance and biofouling resistance (algae resistance, protection against (Moldiness) and transparency can be satisfied at the same time in a more balanced manner.

<重合体粒子(D)>
本実施形態の光触媒組成物は、耐候性がより一層優れる観点から、さらに重合体粒子(D)を含むことが好ましい。
<Polymer particles (D)>
The photocatalyst composition of the present embodiment preferably further contains polymer particles (D) from the viewpoint of further excellent weather resistance.

重合体粒子(D)としては、特に限定されず、例えば、合成樹脂及び天然樹脂からなる群より選択される少なくとも1種が挙げられる。重合体粒子(D)の形態としては、特に限定されず、ペレットの形態であっても、溶媒に溶解又は分散した形態であってもよいが、コーティング用としての樹脂塗料の形態であることが好ましい。 The polymer particles (D) are not particularly limited and include, for example, at least one selected from the group consisting of synthetic resins and natural resins. The form of the polymer particles (D) is not particularly limited and may be a form of pellets or a form dissolved or dispersed in a solvent, but a form of a resin paint for coating. preferable.

樹脂塗料の例としては、油性塗料、ラッカー、溶剤系合成樹脂塗料(アクリル樹脂系、エポキシ樹脂系、ウレタン樹脂系、フッ素樹脂系、シリコーン樹脂系、シリコーン−アクリル樹脂系、アルキド樹脂系、アミノアルキド樹脂系、ビニル樹脂系、不飽和ポリエステル樹脂系、塩化ゴム系等の塗料)、水系合成樹脂塗料(エマルジョン系、水性樹脂系等の塗料)、無溶剤合成樹脂塗料(粉体塗料等)、無機質塗料、及び電気絶縁塗料からなる群より選択される少なくとも1種が挙げられる。 Examples of resin paints include oil paints, lacquers, solvent-based synthetic resin paints (acrylic resin-based, epoxy resin-based, urethane resin-based, fluororesin-based, silicone resin-based, silicone-acrylic resin-based, alkyd resin-based, aminoalkyd Resin-based, vinyl resin-based, unsaturated polyester resin-based, chlorinated rubber-based paints, etc., water-based synthetic resin paints (emulsion-based, water-based resin-based paints, etc.), solvent-free synthetic resin paints (powder paints, etc.), inorganic substances At least one selected from the group consisting of paints and electrically insulating paints can be mentioned.

これらの樹脂塗料の中でも、光触媒に対し難分解性であるシリコーン樹脂系塗料及び/又はフッ素樹脂系塗料であることが好ましく、シリコーン樹脂系塗料及びフッ素樹脂系塗料の併用系の樹脂塗料であることがより好ましい。 Among these resin paints, a silicone resin-based paint and/or a fluororesin-based paint, which are hardly decomposable to a photocatalyst, are preferable, and a resin paint of a combination type of a silicone resin-based paint and a fluororesin-based paint Is more preferable.

樹脂塗料に含まれるシリコーン系樹脂としては、例えば、アルコキシシラン及び/又はオルガノアルコキシシラン由来の構造単位を含む共重合体、アルコキシシラン及び/又はオルガノアルコキシシランの加水分解生成物(ポリシロキサン)、及びこれらの樹脂とコロイダルシリカとの混合物、さらにはシリコーン含有量が1〜80質量%である、アクリル−シリコーン樹脂、エポキシ−シリコーン樹脂、ウレタン−シリコーン樹脂、アルコキシシラン及び/又はオルガノアルコキシシラン由来の構造単位を含む共重合体、又はアルコキシシラン及び/又はオルガノアルコキシシランの加水分解生成物(ポリシロキサン)、及びこれらの樹脂とコロイダルシリカとの混合物が挙げられる。これらのシリコーン系樹脂は、溶剤に溶けたタイプ、分散タイプ、粉体タイプのいずれであっても良く、また架橋剤、触媒等の添加剤が含まれていてもよい。 Examples of the silicone-based resin contained in the resin coating include, for example, a copolymer containing a structural unit derived from alkoxysilane and/or organoalkoxysilane, a hydrolysis product of alkoxysilane and/or organoalkoxysilane (polysiloxane), and A mixture of these resins and colloidal silica, and further a structure derived from an acryl-silicone resin, an epoxy-silicone resin, a urethane-silicone resin, an alkoxysilane and/or an organoalkoxysilane, which has a silicone content of 1 to 80% by mass. Examples thereof include copolymers containing units, or hydrolysis products (polysiloxanes) of alkoxysilanes and/or organoalkoxysilanes, and mixtures of these resins with colloidal silica. These silicone resins may be of any type dissolved in a solvent, dispersion type, or powder type, and may contain additives such as a crosslinking agent and a catalyst.

重合体粒子(D)の含有量は、前記抗菌性金属化合物(A1)を除く前記光触媒組成物の固形分全体(又は塗膜とする際の抗菌性金属化合物(A1)を除く塗膜全体)(100質量%)に対し、0質量%を超え、40質量%以下であることが好ましく、0質量%を超え、30質量%以下であることがより好ましく、0質量%を超え、20質量%以下であることがさらに好ましい。重合体粒子(D)の含有量が、上記範囲内にあることにより、防生物汚染性(防藻性、防カビ性)がより一層優れる傾向にある。 The content of the polymer particles (D) is the entire solid content of the photocatalyst composition excluding the antibacterial metal compound (A1) (or the entire coating film excluding the antibacterial metal compound (A1) when forming a coating film). With respect to (100 mass %), it is preferably more than 0 mass% and 40 mass% or less, more preferably more than 0 mass% and 30 mass% or less, more than 0 mass% and 20 mass%. The following is more preferable. When the content of the polymer particles (D) is within the above range, the biofouling resistance (algae resistance, mold resistance) tends to be further excellent.

<フルオロカーボン界面活性剤(E)>
本実施形態の光触媒組成物は、さらにフルオロカーボン界面活性剤(E)を含むことが好ましい。本実施形態の光触媒組成物は、フルオロカーボン界面活性剤(E)を含むことにより、水系コーティング剤又は水系コーティング剤を含む水系塗料として用いて塗装する際、基材(例えば、有機基材)等に対する濡れ性がより一層向上し、はじき等による外観上の問題をより一層抑制できる傾向にあり、塗膜の均一性がより一層向上する傾向にある。この要因は、フルオロカーボン界面活性剤(E)を含むことにより、水系コーティング剤の表面張力を低下できることに起因すると考えられるが、本発明は、この要因に何ら限定されるものではない。
<Fluorocarbon surfactant (E)>
The photocatalyst composition of the present embodiment preferably further contains a fluorocarbon surfactant (E). The photocatalyst composition of the present embodiment contains a fluorocarbon surfactant (E), so that when it is used as a water-based coating agent or a water-based paint containing the water-based coating agent, it is applied to a substrate (for example, an organic substrate). There is a tendency that the wettability is further improved, problems in appearance due to cissing and the like can be further suppressed, and the uniformity of the coating film is further improved. It is considered that this factor is due to the fact that the inclusion of the fluorocarbon surfactant (E) can reduce the surface tension of the water-based coating agent, but the present invention is not limited to this factor.

フルオロカーボン界面活性剤(E)としては、特に限定されないが、例えば、両性界面活性剤などが挙げられ、少ない添加量で塗膜の均一性を向上できる観点から、両性界面活性剤であることが好ましい。両性界面活性剤としては、例えば、非イオン性両性界面活性剤、陰イオン性両性界面活性剤、陽イオン性両性界面活性剤等が挙げられる。これらの両性界面活性剤は、1種を単独で、又は2種以上を組み合わせて用いることができる。これらの中でも、特に入手容易性の観点から、炭素数3〜20のパーフルオロアルキル基を有する両性界面活性剤であることが好ましい。 The fluorocarbon surfactant (E) is not particularly limited, but examples thereof include an amphoteric surfactant, and the amphoteric surfactant is preferable from the viewpoint of improving the uniformity of the coating film with a small addition amount. .. Examples of the amphoteric surfactant include nonionic amphoteric surfactants, anionic amphoteric surfactants, and cationic amphoteric surfactants. These amphoteric surfactants may be used alone or in combination of two or more. Among these, from the viewpoint of easy availability, an amphoteric surfactant having a perfluoroalkyl group having 3 to 20 carbon atoms is preferable.

炭素数3〜20のパーフルオロアルキル基を有する両性界面活性剤としては、特に限定されないが、例えば、パーフルオロアルキルスルホン酸塩、パーフルオロアルキルカルボン酸塩(例えば、AGCセイミケミカル社製品「サーフロンS−211」など)、パーフルオロアルキルアミンオキシド(例えば、AGCセイミケミカル社製品「サーフロンS−241」など)、パーフルオロアルキルエチレンオキシド付加物、及び陰イオン性基と陽イオン性基とを有するパーフルオロアルキル化合物等が挙げられる。これらの両性界面活性剤は、1種を単独で、又は2種以上を組み合わせて用いることができる。これらの中でも、光触媒組成物(塗料)の表面張力がより一層低下する観点から、パーフルオロアルキルエチレンオキシド付加物、陰イオン性基と陽イオン性基とを有するパーフルオロアルキル化合物であることが好ましい。 The amphoteric surfactant having a perfluoroalkyl group having 3 to 20 carbon atoms is not particularly limited, and examples thereof include perfluoroalkyl sulfonates and perfluoroalkyl carboxylates (for example, "Surflon S, a product of AGC Seimi Chemical Co., Ltd." -211"), perfluoroalkylamine oxide (for example, "Surflon S-241" manufactured by AGC Seimi Chemical Co., Ltd.), perfluoroalkylethylene oxide adduct, and perfluoro having an anionic group and a cationic group. Examples thereof include alkyl compounds. These amphoteric surfactants may be used alone or in combination of two or more. Among these, perfluoroalkylethylene oxide adducts and perfluoroalkyl compounds having an anionic group and a cationic group are preferable from the viewpoint of further reducing the surface tension of the photocatalyst composition (paint).

パーフルオロアルキルエチレンオキシド付加物としては、特に限定されず、例えば、市販品を用いることもでき、市販品としては、例えば、DIC社製品「メガファックF−444」、AGCセイミケミカル社製品「サーフロンS−242」等が挙げられる。これらの市販品は、1種を単独で、又は2種以上を組み合わせて用いることができる。 The perfluoroalkyl ethylene oxide adduct is not particularly limited and, for example, a commercially available product may be used. Examples of the commercially available product include DIC's product “Megafuck F-444” and AGC Seimi Chemical's product “Surflon S”. -242" and the like. These commercially available products may be used alone or in combination of two or more.

陰イオン性基と陽イオン性基とを有するパーフルオロアルキル化合物としては、特に限定されず、例えば、市販品を用いることもでき、市販品としては、AGCセイミケミカル社製品「サーフロンS−231」、「サーフロンS−232」、「サーフロンS−233」等が挙げられる。これらの市販品は、1種を単独で、又は2種以上を組み合わせて用いることができる。 The perfluoroalkyl compound having an anionic group and a cationic group is not particularly limited, and, for example, a commercially available product may be used, and the commercially available product is "Surflon S-231" manufactured by AGC Seimi Chemical Co., Ltd. , "Surflon S-232", "Surflon S-233" and the like. These commercially available products may be used alone or in combination of two or more.

フルオロカーボン界面活性剤(E)の含有量は、抗菌性金属化合物(A1)を除く前記光触媒組成物の固形分全体(又は塗膜とする際の抗菌性金属化合物(A1)を除く塗膜全体)(100質量%)に対し、1質量%以上6質量%以下であることが好ましく、2質量%以上5質量%以下であることがより好ましく、3質量%以上4質量%であることがさらに好ましい。フルオロカーボン界面活性剤(E)の含有量が、1質量%以上であることにより、得られる塗膜の均一性がより一層向上する傾向にあり、フルオロカーボン界面活性剤(E)の含有量が、6質量%以下であることにより、得られる塗膜の耐候性がより一層向上する傾向にある。 The content of the fluorocarbon surfactant (E) is the total solid content of the photocatalyst composition excluding the antibacterial metal compound (A1) (or the entire coating film excluding the antibacterial metal compound (A1) when forming a coating film). It is preferably 1% by mass or more and 6% by mass or less, more preferably 2% by mass or more and 5% by mass or less, and further preferably 3% by mass or more and 4% by mass or less with respect to (100% by mass). .. When the content of the fluorocarbon surfactant (E) is 1% by mass or more, the uniformity of the resulting coating film tends to be further improved, and the content of the fluorocarbon surfactant (E) is 6 When it is at most mass%, the weather resistance of the resulting coating film will tend to be further improved.

<退色性色素(F)>
本実施形態の光触媒組成物は、さらに退色性色素(F)含むことが好ましい。本実施形態の光触媒組成物は、退色性色素(F)を含むことにより、塗装忘れ、重複塗装、塗装むら等の問題を防ぐことができる。
<Fadeable dye (F)>
The photocatalyst composition of the present embodiment preferably further contains a fading dye (F). The photocatalyst composition of the present embodiment can prevent problems such as forgetting to paint, overlapping coating, and uneven coating by including the fading dye (F).

退色性色素(F)としては、特に限定されないが、例えば、太陽光の照射により失色し、基材又は下地塗膜の意匠性を損なうことがない色素が挙げられる。退色性色素(F)が失色するまでの時間は、季節や照射方角等により異なるが、通常、目視で失色が確認されるまでの期間が、20日以下であることが好ましく、より好ましくは10日以下であり、さらに好ましくは3日以下である。 The fading dye (F) is not particularly limited, and examples thereof include dyes that are discolored by irradiation of sunlight and do not impair the design of the base material or the base coating film. The time until the fading dye (F) loses color varies depending on the season, the direction of irradiation, etc., but normally the period until visual confirmation of discoloration is preferably 20 days or less, more preferably 10 days. It is not more than one day, and more preferably not more than 3 days.

代表的な退色性色素(F)としては、メチレンブルー、クリスタルバイオレット、マラカイトグリーン、ブリリアントブルーFCF、エリスロシン、ニューコクシン、フロキシン、ローズベンガル、アシッドレッド、及びファーストグリーンFCFからなる群より選択される少なくとも1種が挙げられる。これらの中でも、発色性が良く、失色速度が速い観点から、メチレンブルーであることが好ましい。これらの退色性色素(F)は、1種を単独で、又は2種以上を組み合わせて用いることができる。 As a typical fading dye (F), at least selected from the group consisting of methylene blue, crystal violet, malachite green, brilliant blue FCF, erythrosine, new coccin, phloxine, rose bengal, acid red, and fast green FCF. There is one kind. Among these, methylene blue is preferable from the viewpoints of good color development and a high rate of color loss. These fading dyes (F) can be used alone or in combination of two or more.

退色性色素(F)の含有量は、前記抗菌性金属化合物(A1)を除く前記光触媒組成物の固形分全体(又は塗膜とする際の抗菌性金属化合物(A1)を除く前記光触媒組成物)(100質量%)に対し、0.01質量%以上0.5質量%以下であることが好ましく、0.05質量%以上0.2質量%以下であることがより好ましく、0.1質量%以上0.2質量%以下であることがさらに好ましい。退色性色素(F)の含有量が、0.01質量%以上であることにより、塗膜とする際の発色性がより一層向上する傾向にあり、含有量が、0.5質量%以下であることにより、塗膜とする際の退色性がより一層向上する傾向にある。本明細書にいう「発色性」とは、塗装面と未塗装面との色の違いから、目視で区別される程度まで発色する性質をいい、本明細書にいう「退色性」とは、基材又は下地塗膜の意匠性を損なわない色の程度まで退色する性質をいう。 The content of the fading dye (F) is the whole solid content of the photocatalyst composition excluding the antibacterial metal compound (A1) (or the photocatalyst composition excluding the antibacterial metal compound (A1) when forming a coating film). ) (100 mass %), preferably 0.01 mass% or more and 0.5 mass% or less, more preferably 0.05 mass% or more and 0.2 mass% or less, and 0.1 mass% or less. % Or more and 0.2 mass% or less is more preferable. When the content of the discolorable dye (F) is 0.01% by mass or more, the color developability in forming a coating film tends to be further improved, and the content is 0.5% by mass or less. When it exists, there is a tendency that the fading property in forming a coating film is further improved. As used herein, the term "colorability" refers to the property of developing color to the extent that it can be visually distinguished from the difference in color between the painted surface and the unpainted surface, and the "fading property" as used herein means It is the property of fading to the extent of a color that does not impair the design of the base material or base coating film.

本実施形態の光触媒組成物は、さらに有機系防藻剤(防カビ剤)を含んでもよい。防藻剤(防カビ剤)としては、例えば、有機ヨウ素系化合物、アルコール系化合物、ニトリル化合物、ジスルフィド系化合物、チオカーバメート系化合物、尿素系化合物及び含窒素環化合物からなる群より選択される少なくとも1種が挙げられる。これらの中でも、尿素系化合物及び/又は含窒素環化合物であることが好ましい。含窒素環化合物としては、チアゾリン系化合物、イソチアゾリン系化合物、トリアジン系化合物、及びイミダゾール系化合物からなる群より選択される少なくとも1種が挙げられる。これらの中でもイソチアゾリン系化合物、トリアジン系化合物、イミダゾール系化合物からなる群より選択される少なくとも1種であることが好ましく、イソチアゾリン系化合物、及びトリアジン系化合物からなる群より選択される少なくとも1種であることがより好ましい。特に防藻性が優れる観点から、トリアジン系化合物が好ましく、防カビ性が優れる観点から、チアゾリン系化合物、イソチアゾリン系化合物、及びイミダゾール系化合物からなる群より選択される少なくとも1種が好ましい。防藻性及び防カビ性が優れる観点から、分子中に塩素原子を含むイソチアゾリン系化合物であることがより好ましい。これらの防藻剤(防カビ剤)は、1種を単独で、又は2種以上を組み合わせて用いることができる。 The photocatalyst composition of the present embodiment may further contain an organic antialgal agent (antifungal agent). As the algae-proofing agent (antifungal agent), for example, at least selected from the group consisting of organic iodine compounds, alcohol compounds, nitrile compounds, disulfide compounds, thiocarbamate compounds, urea compounds and nitrogen-containing ring compounds. There is one kind. Among these, urea compounds and/or nitrogen-containing ring compounds are preferable. Examples of the nitrogen-containing ring compound include at least one selected from the group consisting of thiazoline compounds, isothiazoline compounds, triazine compounds, and imidazole compounds. Among these, at least one selected from the group consisting of isothiazoline compounds, triazine compounds and imidazole compounds is preferable, and at least one selected from the group consisting of isothiazoline compounds and triazine compounds. Is more preferable. In particular, a triazine-based compound is preferable from the viewpoint of excellent algae resistance, and at least one selected from the group consisting of thiazoline-based compounds, isothiazoline-based compounds, and imidazole-based compounds is preferable from the viewpoint of excellent antifungal properties. From the viewpoint of excellent anti-algal and antifungal properties, it is more preferable to use an isothiazoline compound containing a chlorine atom in the molecule. These algae inhibitors (antifungal agents) can be used alone or in combination of two or more.

チアゾリン系化合物としては、市販品を用いることもでき、市販品としては、例えば、日本曹達社製品「ミルカット−180」、「バイオカット−LC3」、大和化学工業社製品「アモルデンALK」等が挙げられる。 As the thiazoline-based compound, a commercially available product may be used, and examples of the commercially available product include Nippon Soda's product "Milcut-180", "Biocut-LC3", and Daiwa Chemical Industry's product "Amorden ALK". To be

イソチアゾリン系化合物としては、市販品を用いることもでき、市販品としては、例えば、日本曹達社製品「バイオカット−TR120」、アーチケミカルズ社製品「PROXEL GXL」、「PROXEL BDN」、ダウケミカル社製品「KLARIX 4000」、「ROZONE 2000」、「ROCIMA 252」、「ROCIMA 200」、「ROCIMA 345」、「ROCIMA 350」、「ROCIMA 553」、「BIOBAN 551S」、「スケーンM−8」等が挙げられる。 As the isothiazoline-based compound, a commercially available product may be used. Examples of the commercially available product include "Biocut-TR120", a product of Nippon Soda Co., Ltd., "PROXEL GXL", "PROXEL BDN", a product of Arch Chemicals, a product of Dow Chemical Co., Ltd. "KLARIX 4000", "ROZONE 2000", "ROCIMA 252", "ROCIMA 200", "ROCIMA 345", "ROCIMA 350", "ROCIMA 553", "BIOBAN 551S", "Scene M-8" and the like can be mentioned. ..

トリアジン系化合物としては、市販品を用いることもでき、市販品としては、例えば、日本曹達社製品「バイオカット−N35」、「DP−2159」、「DP−2615」。「DP−2619」、「DP−2623」、大和化学工業社製品「アモルデンNBP−8」、「アモルデンNBPconc」、三協化成社製品「サンアルガ1907」等が挙げられる。 As the triazine-based compound, a commercially available product may be used, and examples of the commercially available product include Nippon Bio Soda Co., Ltd. products "Biocut-N35", "DP-2159", and "DP-2615". Examples include "DP-2618", "DP-2623", "Amorden NBP-8", "Amorden NBPconc" manufactured by Daiwa Chemical Industry Co., Ltd., "San Alga 1907" manufactured by Sankyo Kasei Co., Ltd., and the like.

イミダゾール系化合物としては、市販品を用いることもでき、市販品としては、例えば、日本曹達社製品「バイオカット−N35」、「バイオカット−AF40」、「DX−2」、ダウケミカル社製の「ROCIMA 363」等が挙げられる。 As the imidazole compound, a commercially available product may be used, and examples of the commercially available product include Nippon Bio Soda Co., Ltd. products "Biocut-N35", "Biocut-AF40", "DX-2", and Dow Chemical Co. "ROCIMA 363" etc. are mentioned.

本実施形態の光触媒組成物は、各成分を構成する粒子の分散性を安定にする観点から、分散安定剤を含んでもよい。分散安定剤としては、例えば、ポリカルボン酸及びスルホン酸塩からなる群から選ばれる各種の水溶性オリゴマー類、ポリビニルアルコール、ヒドロキシエチルセルロース、澱粉、マレイン化ポリブタジエン、マレイン化アルキッド樹脂、ポリアクリル酸(塩)、ポリアクリルアミド、及びアクリル樹脂などの合成又は天然の各種の高分子物質が挙げられる。分散安定剤は、1種を単独で、又は2種以上を組み合わせて用いることができる。 The photocatalyst composition of the present embodiment may contain a dispersion stabilizer from the viewpoint of stabilizing the dispersibility of particles constituting each component. Examples of the dispersion stabilizer include various water-soluble oligomers selected from the group consisting of polycarboxylic acid and sulfonate, polyvinyl alcohol, hydroxyethyl cellulose, starch, maleated polybutadiene, maleated alkyd resin, polyacrylic acid (salt ), polyacrylamide, and various synthetic or natural polymer substances such as acrylic resin. The dispersion stabilizers may be used alone or in combination of two or more.

本実施形態の光触媒組成物は、その用途及び使用方法などに応じて、通常の塗料や成形用樹脂に添加配合される成分、例えば、溶剤、増粘剤、レベリング剤、チクソ化剤、消泡剤、凍結安定剤、艶消し剤、架橋反応触媒、顔料、硬化触媒、架橋剤、充填剤、皮張り防止剤、分散剤、湿潤剤、光安定剤、酸化防止剤、紫外線吸収剤、レオロジーコントロール剤、消泡剤、成膜助剤、防錆剤、染料、可塑剤、潤滑剤、還元剤、防腐剤、防黴剤、消臭剤、黄変防止剤、静電防止剤又は帯電調製剤等を含んでもよい。 The photocatalyst composition of the present embodiment, depending on its application and method of use, etc., components added and blended with usual paints and molding resins, for example, solvents, thickeners, leveling agents, thixotropic agents, defoaming agents. Agents, freeze stabilizers, matting agents, crosslinking reaction catalysts, pigments, curing catalysts, crosslinking agents, fillers, anti-skin agents, dispersants, wetting agents, light stabilizers, antioxidants, UV absorbers, rheology control Agents, defoaming agents, film forming aids, rust preventives, dyes, plasticizers, lubricants, reducing agents, preservatives, antifungal agents, deodorants, anti-yellowing agents, antistatic agents or antistatic agents. Etc. may be included.

[光触媒塗膜]
本実施形態の光触媒塗膜は、本実施形態の光触媒組成物から形成されている。
[Photocatalyst coating]
The photocatalyst coating film of this embodiment is formed from the photocatalyst composition of this embodiment.

本実施形態の光触媒塗膜の膜厚は、特に限定されない。膜厚は、0.05μm以上50μm以下であることが好ましく、0.1μm以上10μm以下であることがより好ましく、0.2μm以上2.0μm以下であることがさらに好ましい。膜厚が、0.05μm以上であることにより、防藻性、防カビ性を含む防汚染性、光触媒活性をより有効に発現できる傾向にあり、膜厚が50μm以下であることにより、透明性がより一層良好なものとすることができる。 The film thickness of the photocatalyst coating film of this embodiment is not particularly limited. The film thickness is preferably 0.05 μm or more and 50 μm or less, more preferably 0.1 μm or more and 10 μm or less, and further preferably 0.2 μm or more and 2.0 μm or less. When the film thickness is 0.05 μm or more, there is a tendency that the antifouling property including antialgae and antifungal property and the photocatalytic activity can be more effectively exhibited, and when the film thickness is 50 μm or less, the transparency is Can be further improved.

[光触媒直下塗膜(下地塗膜)]
本実施形態の光触媒塗膜は、本発明の作用効果をより有効に奏する観点から、基体(基材)上に形成された下地塗膜(光触媒直下塗膜)に形成することが好ましい。下地塗膜は、例えば、シリコーン塗料、アクリル−シリコーン塗料、シリコーン−アルキド塗料、アクリル塗料、フッ素系塗料、ウレタン塗料、アクリルウレタン塗料、エポキシ塗料、塩化ビニル塗料、酢酸ビニル塗料、フタル酸塗料、アルキド塗料などの樹脂塗料から形成される。これらの中でも、耐候性がより一層優れる観点から、シリコーン塗料、アクリル−シリコーン塗料、及びフッ素系塗料からなる群より選択される少なくとも一種から形成されることが好ましい。
[Coating film directly under photocatalyst (base coating)]
From the viewpoint of more effectively exhibiting the effects of the present invention, the photocatalyst coating film of the present embodiment is preferably formed as a base coating film (coating film directly under the photocatalyst) formed on a substrate (base material). The base coating film is, for example, silicone paint, acrylic-silicone paint, silicone-alkyd paint, acrylic paint, fluorine-based paint, urethane paint, acrylic urethane paint, epoxy paint, vinyl chloride paint, vinyl acetate paint, phthalic acid paint, alkyd. It is formed from resin paint such as paint. Among these, from the viewpoint of further excellent weather resistance, it is preferably formed from at least one selected from the group consisting of silicone paints, acrylic-silicone paints, and fluorine-based paints.

[光触媒塗膜の製造方法]
本実施形態の光触媒塗膜は、例えば、下地塗膜上に、光触媒組成物(光触媒コーティング剤)を塗布形成し、固形化し膜を形成することにより得られる。塗布方法としては、例えば、スプレー吹き付け法、フローコーティング法、ロールコート法、刷毛塗り法、ディップコーティング法、スピンコーティング法、スクリーン印刷法、キャスティング法、グラビア印刷法、フレキソ印刷法が挙げられる。塗布形成後、乾燥して揮発分を除去することにより、固形化した膜が得られる。この際、例えば、20℃〜80℃の低温で乾燥した後、所望により、好ましくは20℃〜500℃、より好ましくは40℃〜250℃の熱処理を行ってもよく、紫外線照射等を行ってもよい。
[Method for producing photocatalytic coating film]
The photocatalyst coating film of the present embodiment can be obtained, for example, by coating and forming a photocatalyst composition (photocatalyst coating agent) on a base coating film and solidifying to form a film. Examples of the coating method include a spraying method, a flow coating method, a roll coating method, a brush coating method, a dip coating method, a spin coating method, a screen printing method, a casting method, a gravure printing method, and a flexographic printing method. After coating and forming, a solidified film is obtained by drying and removing volatile matter. At this time, for example, after drying at a low temperature of 20° C. to 80° C., if desired, a heat treatment of preferably 20° C. to 500° C., more preferably 40° C. to 250° C. may be performed, and ultraviolet irradiation or the like may be performed. Good.

[光触媒塗装製品]
本実施形態の光触媒塗装製品(塗装体)は、光触媒塗膜を備えていればよい。塗装体は、例えば、基体(基材)と、この基体(基材)上に配置(形成)された下地塗膜と、この下地塗膜上に配置(形成)された本実施形態の光触媒塗膜とで構成されてもよい。本実施形態の光触媒塗装製品の具体例としては、例えば、建材、建物外装、建物内装、窓枠、窓ガラス、構造部材、住宅等建築設備、車両用照明灯のカバー、窓ガラス、機械装置や物品の外装、防塵カバー及び塗装、表示機器、そのカバー、交通標識、各種表示装置、広告塔等の表示物、道路用、鉄道用等の遮音壁、橋梁、ガードレールの外装及び塗装、トンネル内装及び塗装、碍子、太陽電池カバー、太陽熱温水器集熱カバー等の外部で用いられる電子、電気機器の外装部、特に透明部材、ビニールハウス、温室等の外装が挙げられる。この光触媒塗装製品の製造方法としては、特に限定されないが、例えば、基体(基材)の表面に、下地塗膜を形成するための組成物(コーティング剤)及び光触媒組成物を前記順序で塗布した後に乾燥して、前記基体(基材)上に複層塗膜を形成することが挙げられる。基体(基材)及び下地塗膜と光触媒塗膜とを同時に成形してもよく、一体成形してもよい。
[Photocatalyst coating products]
The photocatalyst-coated product (painted body) of the present embodiment may have a photocatalyst coating film. The coated body is, for example, a substrate (base material), a base coating film arranged (formed) on the base body (base material), and the photocatalytic coating of the present embodiment arranged (formed) on the base coating film. It may be composed of a membrane. Specific examples of the photocatalyst coated product of the present embodiment include, for example, building materials, building exteriors, building interiors, window frames, window glasses, structural members, building equipment such as houses, covers for vehicle lighting, window glasses, mechanical devices, and the like. Exterior of articles, dust-proof covers and coatings, display equipment, covers, traffic signs, various display devices, display materials such as advertising towers, sound insulation walls for roads and railways, exterior and coating of bridges, guardrails, tunnel interiors and coatings. Examples include exterior parts of electronic and electric devices used outside, such as insulators, solar cell covers, and solar water heater heat collection covers, especially exterior parts of transparent members, vinyl houses, greenhouses, and the like. The method for producing this photocatalyst-coated product is not particularly limited, but, for example, a composition (coating agent) for forming a base coating film and a photocatalyst composition were applied to the surface of a substrate (base material) in the above order. Examples of the method include subsequent drying to form a multilayer coating film on the substrate (base material). The substrate (base material) and the base coating film and the photocatalyst coating film may be simultaneously molded, or may be integrally molded.

また、本実施形態の光触媒塗膜をある基体上に成形した後、その光触媒塗膜をその基体から剥離させた又はその基体と密着させた状態で、別の基体に接着、融着等により密着させてもよい。 Further, after the photocatalyst coating film of the present embodiment is formed on a certain substrate, the photocatalyst coating film is peeled from the substrate or adhered to the substrate, and then adhered to another substrate by adhesion, fusion, or the like. You may let me.

以上、本発明を実施するための形態について説明したが、本発明は上記本実施形態に限定されるものではない。本発明は、その要旨を逸脱しない範囲で様々な変形が可能である。 Although the embodiments for carrying out the present invention have been described above, the present invention is not limited to the above embodiments. The present invention can be variously modified without departing from the gist thereof.

以下の実施例、参考例及び比較例により本発明を具体的に説明するが、これらは本発明の範囲を限定するものではない。各種の物性は以下に示す方法で測定した。 The present invention will be specifically described with reference to the following examples, reference examples and comparative examples, but these do not limit the scope of the present invention. Various physical properties were measured by the methods described below.

1.[H22]の定量
[H22]の定量は、ルシゲニン化学発光法を用いて行った。
まず、暗箱内のマグネティックスターラ上に設置した石英セル(光路(長さ)1cm×幅1cm)に、3.5mLの0.01M NaOH水溶液を添加し、pH9に調整し、そこにさらに15mgのゾルを乾燥して得られた光触媒活性無機化合物(B)の粉末を投入し、懸濁させて懸濁液を得た。
次に、LED(Hamamatsu Photonics(浜松ホトニクス)社製、型番「LC−L2」、波長:365nm、強度5mW/cm2)を光源として、懸濁液が入った上記セルに60秒間の紫外光照射を行った。照射後、0.7mMのルシゲニン溶液を50μL添加し、H22によって生じた化学発光をバンドパスフィルターに通した後、電子冷却光電子増倍管で検出した。化学発光の検出量から、[H22]を導出した。
1. Quantification Quantification [H 2 O 2] in the [H 2 O 2] was performed using lucigenin chemiluminescence method.
First, to a quartz cell (optical path (length) 1 cm×width 1 cm) installed on a magnetic stirrer in a dark box, 3.5 mL of 0.01 M NaOH aqueous solution was added to adjust pH to 9, and further 15 mg of sol was added thereto. The powder of the photocatalytically active inorganic compound (B) obtained by drying was added and suspended to obtain a suspension.
Next, using an LED (Hamamatsu Photonics (Hamamatsu Photonics), model “LC-L2”, wavelength: 365 nm, intensity 5 mW/cm 2 ) as a light source, the cell containing the suspension was irradiated with ultraviolet light for 60 seconds. I went. After the irradiation, 50 μL of 0.7 mM lucigenin solution was added, and the chemiluminescence generated by H 2 O 2 was passed through a bandpass filter and then detected by an electron-cooled photomultiplier tube. [H 2 O 2 ] was derived from the detected amount of chemiluminescence.

2.[・OH]の定量
[・OH]の測定は、クマリン蛍光プローブ法を用いて行った。
まず、0.1mMのクマリン水溶液を調製し、上記石英セル中に15mgのゾルを乾燥して得られた光触媒活性無機化合物(B)粉末とクマリン水溶液35mLとを懸濁させて懸濁液を得た。この懸濁液に波長365nm、強度5mW/cm2のLED光を60秒照射した。次に、懸濁液からTiO2などの金属化合物(光触媒)粉末を分離するために、照射終了後の懸濁液にKClを0.5g添加し、24時間暗所に静置した。その後、上澄み液をとりサンプルとし、Fluorescence spectrophotometer(850型、HITACHI社製)で蛍光の測定をした(この時、KCl添加による蛍光測定時の光散乱は影響しないことを確認した。)。既知濃度のクマリンの蛍光強度を、上記サンプルの蛍光強度と比較することで[・OH]を定量した。
2. Quantification of [.OH] [.OH] was measured using the coumarin fluorescent probe method.
First, a 0.1 mM coumarin aqueous solution was prepared, and a photocatalytically active inorganic compound (B) powder obtained by drying 15 mg of a sol in the quartz cell and 35 mL of a coumarin aqueous solution were suspended to obtain a suspension. It was This suspension was irradiated with LED light having a wavelength of 365 nm and an intensity of 5 mW/cm 2 for 60 seconds. Next, in order to separate the metal compound (photocatalyst) powder such as TiO 2 from the suspension, 0.5 g of KCl was added to the suspension after the irradiation, and the mixture was left standing for 24 hours in the dark. Then, the supernatant was taken as a sample, and the fluorescence was measured with a Fluorescence spectrophotometer (Model 850, manufactured by HITACHI) (at this time, it was confirmed that the light scattering at the time of fluorescence measurement by the addition of KCl did not affect). [.OH] was quantified by comparing the fluorescence intensity of coumarin of known concentration with the fluorescence intensity of the above sample.

3.表面修飾物の定量
蛍光X線分析装置を用いて、理論と基礎定数Fundamental Parameter(FP)により定量分析を行なうFP法にて定量を行った。
3. Quantification of surface modified material Quantification was carried out by the FP method, in which quantitative analysis was carried out using a theoretical X and fundamental constant Fundamental Parameter (FP) using a fluorescent X-ray analyzer.

4.数平均粒子径
試料中の固形分含有量が1〜20質量%となるよう適宜溶媒を加えて希釈し、湿式粒度分析計(日本国日機装製マイクロトラックUPA−9230)を用いて測定した。
4. Number average particle diameter It was measured by using a wet particle size analyzer (Microtrac UPA-9230 manufactured by Nikkiso Japan Co., Ltd.) by appropriately adding a solvent so that the solid content in the sample becomes 1 to 20% by mass.

5.塗膜の膜厚
塗膜の膜厚を、ハロゲン光源装置(MORITEX社製、商品名「MHF−G100LR」)を装着した膜厚測定装置(SPECTRA・COOP社製、商品名「HanGyLambGa II THICKNESS」)を用いて測定した。
5. Film thickness of coating film The film thickness of the coating film was measured by a film thickness measuring device (manufactured by SPECTRA/COOP, product name "HanGyLambGa II THICKNESS") equipped with a halogen light source device (manufactured by MORITEX, product name "MHF-G100LR"). Was measured using.

6.塗装性
試験板を走査型電子顕微鏡(日本電子株式会社製、NeoScope JCM-5000)にて塗膜表面状態を観察、撮影し、光触媒塗膜率を算出した。評価基準は、以下の通りである。

○:塗装率が80%以上
△:塗装率が50%以上80%未満
×:塗装率が50%未満
6. The coatability test plate was observed and photographed with a scanning electron microscope (NeoScope JCM-5000, manufactured by JEOL Ltd.), and the photocatalyst coating rate was calculated. The evaluation criteria are as follows.

◯: The coating rate is 80% or more Δ: The coating rate is 50% or more and less than 80% ×: The coating rate is less than 50%

7.透明性(塗膜の白濁度)
ガラス板((株)テストピース製 並板ガラス;60mm×60mm×2mm)の下に黒紙を敷いた状態での色差を測定した。その後、ディップコーター(アイデン社製 DC4200、昇降速度:下降時 10mm/秒、上昇時 10mm/秒)にて光触媒組成物を塗布し、塗布後2日間乾燥した。その後、照度5000Lxに調整した蛍光灯下で10日間放置し着色剤を脱色させた試験体の色彩色差を測定した。塗布前後での色差(明度差ΔL)を評価した。評価基準は以下の通りである。

◎:色差ΔL=0.8未満
○:色差ΔL=0.8以上1.6未満
△:色差ΔL=1.6以上〜3.0未満
×:色差ΔL=3.0以上
7. Transparency (whiteness of coating film)
The color difference was measured when a black paper was laid under a glass plate (a normal plate glass manufactured by Test Piece Co., Ltd.; 60 mm×60 mm×2 mm). Then, the photocatalyst composition was applied with a dip coater (DC4200 manufactured by Aiden Co., Ltd., ascending/descending speed: descending 10 mm/sec, ascending 10 mm/sec), and dried for 2 days after coating. After that, the specimen was left under a fluorescent lamp adjusted to an illuminance of 5000 Lx for 10 days to decolorize the colorant, and the color difference was measured. The color difference (brightness difference ΔL) before and after coating was evaluated. The evaluation criteria are as follows.

⊚: Color difference ΔL=less than 0.8 ○: Color difference ΔL=0.8 or more and less than 1.6 Δ: Color difference ΔL=1.6 or more and less than 3.0 ×: Color difference ΔL=3.0 or more

8.光触媒活性(色素分解活性)
JIS R1703-2に準拠して分解活性指数を求めた.試験片浄化条件は照度1mW/cm2で24時間照射、メチレンブルー吸着条件は吸着液濃度0.02mMで吸着時間24時間、メチレンブルーの分解測定条件は照度1mW/cm2、試験液濃度0.01mM、注入量35mL、照射後に採取した試験液の吸光スペクトルを分光光度計で測定した。吸光度測定波長は664nmとした。評価基準は、以下の通りである。

◎ :分解活性指数が10nM/min以上
○ :分解活性指数が5nM/min以上10nM/min未満
× :分解活性指数が5nM/min未満
8. Photocatalytic activity (dye decomposition activity)
The decomposition activity index was determined according to JIS R1703-2. The test piece purification conditions were irradiation at an illuminance of 1 mW/cm 2 for 24 hours, methylene blue adsorption conditions were an adsorbent concentration of 0.02 mM and an adsorption time of 24 hours.Methylene blue decomposition measurement conditions were illuminance of 1 mW/cm 2 , test solution concentration of 0.01 mM and injection amount. The absorption spectrum of 35 mL of the test solution collected after irradiation was measured with a spectrophotometer. The absorbance measurement wavelength was 664 nm. The evaluation criteria are as follows.

◎: Degradation activity index is 10 nM/min or more ○: Degradation activity index is 5 nM/min or more and less than 10 nM/min ×: Degradation activity index is less than 5 nM/min

9.光触媒塗膜直下塗膜(下地塗膜)の劣化観察
試料をエポキシ樹脂(商品名、Quetol812)に包埋後、独国Reichert社製品「ULTRACUT−N型ミクロトーム(商品名)」により50〜60nmの厚さの超薄切片を作成し、支持膜を張ったメッシュに積載した後、カーボン蒸着を行い、検鏡用試料とし、TEM(日立製HF2000型、加速電圧:125kV)により塗膜断面の観察を行い、下地塗膜の劣化状態を評価した。評価基準は以下の通りである。

◎:下地塗膜の劣化が観察されなかった
○:下地塗膜の劣化が極僅かに観察されたが、全体的には問題なかった
△:下地塗膜の劣化が一部観察された
×:下地塗膜の劣化が全体的に観察された
9. Deterioration observation of the coating film (undercoating film) directly under the photocatalyst coating film After embedding the sample in an epoxy resin (trade name, Quetol 812), a 50 to 60 nm film was obtained using a product "ULTRACUT-N type microtome (trade name)" manufactured by Reichert in Germany. After making an ultrathin section with a thickness and loading it on a mesh with a support film, carbon deposition is performed and it is used as a speculum sample, and the cross section of the coating film is observed by TEM (HF2000 type manufactured by Hitachi, accelerating voltage: 125 kV). Then, the deterioration state of the base coating film was evaluated. The evaluation criteria are as follows.

⊚: No deterioration of the base coating film was observed. ◯: A slight deterioration of the base coating film was observed, but there was no problem overall. Δ: Some deterioration of the base coating film was observed. Deterioration of the underlying coating film was generally observed

10.防藻性、防カビ性(短期)
藻類が存在しているシャーレー中に各試験板を入れた後、試験板を入れたシャーレを一定温度に保った恒温槽中に入れ、試験を実施した。判定は試験開始後4週間目で判定した。評価基準は、以下の通りである。

○:藻の生育が見られなかった
△:わずかな藻の生育が見られたが、全体的には問題なかった
×:藻の生育が明らかに見られた

また、防カビ性はJIS Z2911:2010に準拠してカビ抵抗性試験を実施した。判定は試験開始後2週間目で判定した。評価基準は、以下の通りである。

○:カビの生育が見られなかった
△:わずかなカビの生育が見られたが、全体的には問題なかった
×:カビの生育が明らかに見られた
10. Anti-algal and anti-mold (short term)
After placing each test plate in a petri dish containing algae, the petri dish containing the test plate was placed in a constant temperature bath kept at a constant temperature to carry out the test. The judgment was made 4 weeks after the start of the test. The evaluation criteria are as follows.

A: Growth of algae was not observed. B: Slight growth of algae was observed, but there was no problem overall.: Growth of algae was clearly observed.

As for mold resistance, a mold resistance test was carried out in accordance with JIS Z2911:2010. The judgment was made two weeks after the start of the test. The evaluation criteria are as follows.

◯: No mold growth was observed Δ: A slight mold growth was observed, but there was no problem overall ×: Mold growth was clearly observed

11.防藻性、防カビ性(長期)
千葉県銚子市の近隣に森林があり、芝生の生えている土地に各試験板を北面90°にて屋外曝露試験を実施した。判定は曝露後6年で判定した。評価基準は、以下の通りである。

○:目視観察及び顕微鏡観察(40倍)のいずれも藻、カビの生育は見られなかった
△:目視観察で藻、カビの生育はみられないが、顕微鏡観察(40倍)では生育が見られた
×:目視観察で藻、カビの生育が見られた
11. Anti-algal, anti-mold (long-term)
An outdoor exposure test was carried out on each test plate on the land where there is a forest and lawn growing near Choshi City, Chiba Prefecture, at 90° north face. The judgment was made 6 years after the exposure. The evaluation criteria are as follows.

◯: No growth of algae and mold was observed in both visual observation and microscopic observation (40 times). Δ: Growth of algae and mold was not observed by visual observation, but growth was observed in microscopic observation (40 times). X: Growth of algae and mold was observed by visual observation

12.耐候性(SWOM5000時間曝露後の色差)
スガ試験機社製品「サンシャインウエザーメーター」を用いて曝露試験(ブラックパネル温度63℃、降雨18分/2時間)を行い、試験板の曝露前と曝露開始5000時間後との間での色差を、カラーガイド(BYK GarDner社製品)を用いる標準板からの色差を求める方法で測定し、曝露前の色差を標準とし、曝露前後の状態変化をΔEとして評価した。評価基準は、以下の通りである。

○ :ΔE*が3未満
× :ΔE*が3以上。
12. Weather resistance (color difference after exposure to SWOM 5000 hours)
An exposure test (black panel temperature 63° C., rainfall 18 minutes/2 hours) was performed using the product "Sunshine Weather Meter" manufactured by Suga Test Instruments Co., Ltd., and the color difference between before exposure of the test plate and after 5000 hours of exposure was measured. , A color guide (product of BYK GarDner) was used to determine the color difference from the standard plate, and the color difference before and after exposure was used as the standard, and the change in state before and after exposure was evaluated as ΔE. The evaluation criteria are as follows.

◯: ΔE* is less than 3 ×: ΔE* is 3 or more.

[参考例1]シリカ修飾ルチル型酸化チタン(B−1)
TiO2として200g/Lの濃度の四塩化チタン水溶液700mLと、Na2Oとして100g/Lの濃度の水酸化ナトリウム水溶液を、系のpHを5〜9に維持するように水中に並行添加した。その後、系のpHを7に調整した後、濾過し、濾液の導電率が100μS/cmとなるまで洗浄し、固形分濃度28.3質量%の酸化チタン湿ケーキ1を得た。この酸化チタン微粒子はルチル型構造を有し、その平均粒径は8nmであった。
得られたルチル型酸化チタン湿ケーキ1を純水で希釈して、1モル/Lのスラリーを調製した。このスラリー1Lを3Lのフラスコに仕込み、さらに、1規定の硝酸を酸化チタン/硝酸のモル比が1/Lとなるよう1L添加し、95℃の温度に加熱し、この温度で2時間保持して、酸加熱処理を行った。次いで、酸加熱処理後のスラリーを室温まで冷却し、28%アンモニア水を用いて中和(pH= 6.7)して、濾過した後、濾液の導電率が100μS/cmとなるまで洗浄し固形分濃度25質量%の酸化チタン湿ケーキ2を得た。
得られた酸化チタン湿ケーキ2に、10%の濃度の水酸化ナトリウム水溶液を添加し、リパルプし、その後、超音波洗浄機で3時間分散して、pH=10.5、固形分濃度10質量%のアルカリ性酸化チタンゾルを得た。このアルカリ性酸化チタンゾル2Lを3Lのフラスコに仕込み、70℃の温度に昇温し、SiO2 として432g/Lの濃度のケイ酸ナトリウム水溶液69.4mlを添加し、その後90 ℃ に昇温して1時間熟成した後、10%の硫酸を添加してpHを6に調整して、酸化チタンの表面をケイ素の含水酸化物で表面処理した。
得られた酸化チタンゾルを室温まで冷却し、5.4Lの純水を添加し、脱塩濃縮装置を用いて、不純物の除去及び濃縮を行ない、pH=7.3、固形分濃度29質量%、導電率1.18mS/cmの中性ルチル型酸化チタンゾルを得た。TiO2に対してSiO2基準で15質量%のケイ素の含水酸化物を含有していた。このゾル中の酸化チタンの平均粒径は60nmであった。
[Reference Example 1] Silica-modified rutile type titanium oxide (B-1)
700 mL of an aqueous titanium tetrachloride solution having a concentration of 200 g/L as TiO 2 and an aqueous sodium hydroxide solution having a concentration of 100 g/L as Na 2 O were added in parallel to water so as to maintain the pH of the system at 5-9. Then, after adjusting the pH of the system to 7, the system was filtered and washed until the conductivity of the filtrate reached 100 μS/cm to obtain titanium oxide wet cake 1 having a solid content concentration of 28.3 mass %. The titanium oxide fine particles had a rutile structure, and the average particle diameter was 8 nm.
The obtained rutile-type titanium oxide wet cake 1 was diluted with pure water to prepare a 1 mol/L slurry. 1 L of this slurry was charged into a 3 L flask, 1 L of 1N nitric acid was further added so that the molar ratio of titanium oxide/nitric acid was 1/L, and the mixture was heated to a temperature of 95° C. and kept at this temperature for 2 hours. Then, an acid heat treatment was performed. Then, the slurry after the acid heat treatment was cooled to room temperature, neutralized (pH=6.7) with 28% ammonia water, filtered, and washed until the filtrate had a conductivity of 100 μS/cm. Titanium oxide wet cake 2 having a solid content concentration of 25 mass% was obtained.
An aqueous solution of sodium hydroxide having a concentration of 10% was added to the obtained titanium oxide wet cake 2, repulped, and then dispersed for 3 hours with an ultrasonic cleaner to have a pH of 10.5 and a solid content concentration of 10 mass. % Alkaline titanium oxide sol was obtained. 2 L of this alkaline titanium oxide sol was charged into a 3 L flask, the temperature was raised to 70° C., 69.4 ml of an aqueous sodium silicate solution having a concentration of 432 g/L as SiO 2 was added, and then the temperature was raised to 90° C. for 1 hour. After aging, 10% sulfuric acid was added to adjust the pH to 6, and the surface of titanium oxide was surface-treated with hydrous oxide of silicon.
The obtained titanium oxide sol was cooled to room temperature, 5.4 L of pure water was added, impurities were removed and concentrated using a desalting concentrator, pH=7.3, solid content concentration 29 mass %, A neutral rutile-type titanium oxide sol having an electrical conductivity of 1.18 mS/cm was obtained. It contained 15 wt% of silicon oxide hydroxide with SiO 2 basis relative to TiO 2. The average particle size of titanium oxide in this sol was 60 nm.

[参考例2]シリカ修飾アナタース型酸化チタン(B−2)の調製
チタン鉱石を硫酸とを反応させ、得られた硫酸チタン溶液を加熱加水分解して生成させた凝集メタチタン酸をTiO2換算30質量%の水性スラリーとし、このスラリーをアンモニア水でpH7に中和し、その後濾過洗浄して硫酸根を除去した。得られた脱水ケーキに硝酸を加えて解膠処理して、アナタース型結晶構造を含む酸化チタン微粒子(一次粒子径7nm)からなるpH1.5の酸性酸化チタンゾルを得た。得られた酸性酸化チタンゾルを純水で希釈して、TiO2換算200 g/Lの酸化チタンゾル600mlとした後、70℃に昇温し、次いで、SiO2換算濃度432g/Lのケイ酸ナトリウム水溶液20.8mlを20%硫酸と同時に添加し、その後、30分間熟成した。次いで、10% 水酸化ナトリウム水溶液でpH を8に調整した後、2%硫酸水溶液でpHを6に調整し、濾過・洗浄を行い、湿ケーキを得た。この湿ケーキを純水中にリパルプした後、超音波分散して、中性域で安定な酸化チタンゾル( 固形分濃度20質量%。pH=7.5)を得た。この試料には、酸化チタン微粒子の表面に凝集シリカが多孔質の状態で被着しており、その含有量は、TiO2100質量部に対してSiO2換算で7質量部であった。
[Reference Example 2] Preparation of silica-modified anatase-type titanium oxide (B-2) Aggregated metatitanic acid produced by reacting titanium ore with sulfuric acid and heating and hydrolyzing the obtained titanium sulfate solution was converted into TiO 2 30 A mass% aqueous slurry was prepared, which was neutralized to pH 7 with aqueous ammonia, and then filtered and washed to remove sulfate radicals. Nitric acid was added to the obtained dehydrated cake to perform deflocculation treatment to obtain acidic titanium oxide sol having a pH of 1.5 and comprising titanium oxide fine particles (primary particle diameter 7 nm) containing an anatase type crystal structure. The obtained acidic titanium oxide sol was diluted with pure water to obtain 600 ml of titanium oxide sol having a TiO 2 conversion of 200 g/L, heated to 70° C., and then an aqueous solution of sodium silicate having a SiO 2 conversion concentration of 432 g/L. 20.8 ml was added at the same time as 20% sulfuric acid and then aged for 30 minutes. Next, the pH was adjusted to 8 with a 10% aqueous sodium hydroxide solution, the pH was adjusted to 6 with a 2% aqueous sulfuric acid solution, and filtration and washing were performed to obtain a wet cake. This wet cake was repulped in pure water and then ultrasonically dispersed to obtain a titanium oxide sol (solid content concentration 20% by mass, pH=7.5) that was stable in the neutral range. In this sample, agglomerated silica was adhered to the surface of the titanium oxide fine particles in a porous state, and the content thereof was 7 parts by mass in terms of SiO 2 with respect to 100 parts by mass of TiO 2 .

[参考例3]銀担持シリカ修飾ルチル型酸化チタン(B−3)の調製
[参考例1]で得られた酸化チタン水分散体(固形分=2%)400gを500mLフラスコに仕込み、80℃に加温し、この温度に達したとき、硝酸銀水溶液(濃度=5%)を担持量に応じて1.26g〜5.04g添加し、その直後クエン酸三ナトリウム水溶液(濃度=10%)を0.85g〜3.4gとタンニン酸水溶液(濃度=1%)を3.18g〜12.72gを添加した。添加後、1時間撹拌し、撹拌後室温まで冷却したものを合成物とした。得られた合成物中の酸化チタンの平均粒子径は約80nm前後であった。
[Reference Example 3] Preparation of silver-supported silica-modified rutile type titanium oxide (B-3)
400 g of the titanium oxide aqueous dispersion (solid content=2%) obtained in [Reference Example 1] was charged into a 500 mL flask and heated to 80° C., and when this temperature was reached, an aqueous silver nitrate solution (concentration=5%) 1.26 g to 5.04 g was added according to the supported amount, and immediately after that, 0.85 g to 3.4 g of trisodium citrate aqueous solution (concentration = 10%) and tannic acid aqueous solution (concentration = 1%) were added. 18g-12.72g was added. After the addition, the mixture was stirred for 1 hour, cooled to room temperature after stirring, and used as a synthetic product. The average particle size of titanium oxide in the obtained composite was about 80 nm.

参考例1、参考例2、参考例3、市販品1(石原産業(株)製、アナターゼ型酸化チタンST−01)、及び市販品2(テイカ(株)製、ルチル型酸化チタンMT150A)の[H22]、[・OH]を表1に示す。なお、[参考例3]は[参考例1]で得られた酸化チタンを使用しており、[H22]、[・OH]は[参考例1]と同じである。 Reference Example 1, Reference Example 2, Reference Example 3, commercial product 1 (manufactured by Ishihara Sangyo Co., Ltd., anatase type titanium oxide ST-01), and commercial product 2 (manufactured by Teika Co., Ltd., rutile titanium oxide MT150A). Table 1 shows [H 2 O 2 ] and [.OH]. Note that [Reference Example 3] uses the titanium oxide obtained in [Reference Example 1], and [H 2 O 2 ] and [.OH] are the same as in [Reference Example 1].

[参考例4]重合体エマルジョン粒子(C−1)水分散体の合成
還流冷却器、滴下槽、温度計及び撹拌装置を有する反応器に、イオン交換水830g、10重量%のドデシルベンゼンスルホン酸水溶液40g、水20gを投入した後、撹拌下で反応器中の温度を80℃に加温した。この反応器中に、ジメチルジメトキシシラン90.7g、メチルトリメトキシシラン83.5gからなる混合液と水10gとを反応器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。その際、ジメチルジメトキシシラン及びメチルトリメトキシシランからなる混合液を滴下後1時間経過した時点で10重量%のドデシルベンゼンスルホン酸水溶液2gを投入した。ジメチルジメトキシシラン及びメチルトリメトキシシランからなる混合液を全量滴下後、反応器中の温度を80℃に維持して約30分撹拌を続けた後、10重量%のドデシルベンゼンスルホン酸水溶液14.8gを投入し、反応器中の温度を80℃に維持して2.5時間撹拌を続けた。次に過硫酸アンモニウムの0.5重量%水溶液26.4gを投入し、アクリル酸n−ブチル0.1g、フェニルトリメトキシシラン36.7g、テトラエトキシシラン27.8g、及び3−メタクリロキシプロピルトリメトキシシラン1.1gからなる混合液及び水10gとジエチルアクリルアミド0.1g、アクリル酸0.9g、反応性乳化剤(商品名「アデカリアソープSR−1025」、旭電化(株)製、固形分25%水溶液)4.5g、反応性乳化剤(商品名「アクアロンKH−1025」、第一工業製薬(株)製、固形分25%水溶液)2.3g、過硫酸アンモニウムの0.5重量%水溶液120g、及びイオン交換水256.4gからなる混合液とを、反応器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに、反応器中の温度を80℃に維持して約2時間撹拌を続けた後、室温まで冷却し、100メッシュの金網で濾過した。イオン交換水で固形分を10.0質量%に調整し、重合体粒子として数平均粒子径20nmの重合体エマルジョン粒子(BB)の水分散体を得た。
[Reference Example 4] Synthesis of Polymer Emulsion Particle (C-1) Aqueous Dispersion A reactor having a reflux condenser, a dropping tank, a thermometer and a stirrer was charged with 830 g of ion-exchanged water and 10% by weight of dodecylbenzenesulfonic acid. After adding 40 g of an aqueous solution and 20 g of water, the temperature in the reactor was heated to 80° C. under stirring. A mixture of 90.7 g of dimethyldimethoxysilane and 83.5 g of methyltrimethoxysilane and 10 g of water were simultaneously added dropwise to this reactor over about 2 hours while maintaining the temperature in the reactor at 80°C. .. At that time, 2 hours after the addition of a mixed solution of dimethyldimethoxysilane and methyltrimethoxysilane, 2 g of a 10% by weight aqueous dodecylbenzenesulfonic acid solution was added. After the total amount of a mixed solution of dimethyldimethoxysilane and methyltrimethoxysilane was dropped, the temperature in the reactor was maintained at 80° C. and stirring was continued for about 30 minutes, and then 14.8 g of a 10 wt% dodecylbenzenesulfonic acid aqueous solution was added. Was charged, the temperature in the reactor was maintained at 80° C., and stirring was continued for 2.5 hours. Next, 26.4 g of a 0.5 wt% aqueous solution of ammonium persulfate was added, and 0.1 g of n-butyl acrylate, 36.7 g of phenyltrimethoxysilane, 27.8 g of tetraethoxysilane, and 3-methacryloxypropyltrimethoxy. Mixed liquid consisting of 1.1 g of silane, 10 g of water, 0.1 g of diethyl acrylamide, 0.9 g of acrylic acid, reactive emulsifier (trade name "Adekaria Soap SR-1025", manufactured by Asahi Denka Co., Ltd., solid content 25%) Aqueous solution) 4.5 g, reactive emulsifier (trade name "Aqualon KH-1025", manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., solid content 25% aqueous solution) 2.3 g, 0.5% by weight aqueous solution of ammonium persulfate 120 g, and A mixed solution of 256.4 g of ion-exchanged water was added dropwise at the same time while keeping the temperature in the reactor at 80° C. over about 2 hours. Furthermore, the temperature in the reactor was maintained at 80° C. and stirring was continued for about 2 hours, then cooled to room temperature and filtered through a 100 mesh wire mesh. The solid content was adjusted to 10.0 mass% with ion-exchanged water to obtain an aqueous dispersion of polymer emulsion particles (BB) having a number average particle diameter of 20 nm as polymer particles.

[参考例5]重合体エマルジョン粒子(C−2)水分散体の合成
還流冷却器、滴下槽、温度計及び攪拌装置を有する反応器に、イオン交換水850g、10質量%のドデシルベンゼンスルホン酸水溶液10.0gを投入した後、攪拌下で反応器中の温度を80℃に加温した。この反応器中に、ジメチルジメトキシシラン140.0g、フェニルトリメトキシシラン20.0g、メチルトリメトキシシラン5.0gからなる混合液を、反応器中の温度を80℃に保った状態で約2時間かけて滴下した。その後、反応器中の温度を80℃に維持して30分攪拌を続けた。次に、10質量%のドデシルベンゼンスルホン酸水溶液16.8gを投入した後、反応器中の温度を80℃に維持して2時間攪拌を続けた。そこに、2質量%の過硫酸アンモニウム水溶液6.6gを投入した後、フェニルトリメトキシシラン26.8g、テトラエトキシシラン28.6g、3−メタクリロキシプロピルトリメトキシシラン1.1gからなる混合液と、アクリル酸0.9g、反応性乳化剤(AGEKA社製、「アデカリアソープSR−1025」;固形分量25質量%水溶液)2.3g、反応性乳化剤(第一工業製薬社製、「アクアロンKH−1025」;固形分量25質量%水溶液)2.3g、過硫酸アンモニウムの2.0質量%水溶液30g、イオン交換水170.0gからなる混合液を、反応器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに、反応器中の温度を80℃に維持して約1時間攪拌を続けた後、室温まで冷却し、25%アンモニア水溶液を反応液に添加してpHを8に調整した後、100メッシュの金網で濾過した。イオン交換水で固形分量を10.0質量%に調整し、重合体として数平均粒子径119nmの重合体(E2)の水分散体を得た。
Reference Example 5 Synthesis of Polymer Emulsion Particle (C-2) Aqueous Dispersion In a reactor having a reflux condenser, a dropping tank, a thermometer and a stirrer, 850 g of ion-exchanged water and 10% by mass of dodecylbenzenesulfonic acid were added. After adding 10.0 g of the aqueous solution, the temperature in the reactor was heated to 80° C. under stirring. A mixture of 140.0 g of dimethyldimethoxysilane, 20.0 g of phenyltrimethoxysilane, and 5.0 g of methyltrimethoxysilane was placed in this reactor for about 2 hours while maintaining the temperature in the reactor at 80°C. It dripped over. Then, the temperature in the reactor was maintained at 80° C. and stirring was continued for 30 minutes. Next, after adding 16.8 g of a 10% by mass dodecylbenzenesulfonic acid aqueous solution, the temperature in the reactor was maintained at 80° C. and stirring was continued for 2 hours. After adding 6.6 g of a 2 mass% ammonium persulfate aqueous solution thereto, a mixed solution of 26.8 g of phenyltrimethoxysilane, 28.6 g of tetraethoxysilane, and 1.1 g of 3-methacryloxypropyltrimethoxysilane, Acrylic acid 0.9 g, reactive emulsifier (made by AGEKA, "Adecaria Soap SR-1025"; solid content 25 mass% aqueous solution) 2.3 g, reactive emulsifier (made by Dai-ichi Kogyo Seiyaku Co., Ltd., "Aqualon KH-1025") 2.3 g of solid content 25% by weight aqueous solution), 30 g of 2.0% by weight aqueous solution of ammonium persulfate, and 170.0 g of ion-exchanged water, while maintaining the temperature in the reactor at 80° C. It dripped simultaneously over 2 hours. Furthermore, the temperature in the reactor was maintained at 80° C. and stirring was continued for about 1 hour, then cooled to room temperature, 25% aqueous ammonia solution was added to the reaction solution to adjust the pH to 8, and then 100 mesh It was filtered through a wire mesh. The solid content was adjusted to 10.0 mass% with ion-exchanged water to obtain an aqueous dispersion of a polymer (E2) having a number average particle diameter of 119 nm as a polymer.

[参考例6]重合体エマルジョン粒子(C−3)水分散体の合成
還流冷却器、滴下槽、温度計及び攪拌装置を有する反応器に、イオン交換水850g、10質量%のドデシルベンゼンスルホン酸水溶液5.6gを投入した後、攪拌下で反応器中の温度を80℃に加温した。この反応器中に、ジメチルジメトキシシラン110.0g、フェニルトリメトキシシラン73.0g、メチルトリメトキシシラン29.4gからなる混合液を、反応器中の温度を80℃に保った状態で約2時間かけて滴下した。その後、反応器中の温度を80℃に維持して30分攪拌を続けた。次に、10質量%のドデシルベンゼンスルホン酸水溶液5.6gを投入した後、反応器中の温度を80℃に維持して2時間攪拌を続けた。そこに、2質量%の過硫酸アンモニウム水溶液6.6gを投入した後、メタクリル酸メチル22.5g、アクリル酸n−ブチル11.2g、フェニルトリメトキシシラン12.3g、テトラエトキシシラン28.6g、3−メタクリロキシプロピルトリメトキシシラン1.1gからなる混合液と、アクリル酸0.9g、反応性乳化剤(ADEKA社製、「アデカリアソープSR−1025」;固形分量25質量%水溶液)1.2g、反応性乳化剤(第一工業製薬社製、「アクアロンKH−1025」;固形分量25質量%水溶液)1.2g、過硫酸アンモニウムの2.0質量%水溶液30g、イオン交換水286.4gからなる混合液とを、反応器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに、反応器中の温度を80℃に維持して約1時間攪拌を続けた後、室温まで冷却し、25%アンモニア水溶液を反応液に添加してpHを8に調整した後、100メッシュの金網で濾過した。イオン交換水で固形分量を10.0質量%に調整し、重合体として数平均粒子径155nmの重合体(E3)の水分散体を得た。
Reference Example 6 Synthesis of Polymer Emulsion Particles (C-3) Aqueous Dispersion A reactor having a reflux condenser, a dropping tank, a thermometer and a stirrer was charged with 850 g of ion-exchanged water and 10% by mass of dodecylbenzenesulfonic acid. After adding 5.6 g of the aqueous solution, the temperature in the reactor was heated to 80° C. under stirring. A mixture of 110.0 g of dimethyldimethoxysilane, 73.0 g of phenyltrimethoxysilane and 29.4 g of methyltrimethoxysilane was placed in this reactor for about 2 hours while maintaining the temperature in the reactor at 80°C. It dripped over. Then, the temperature in the reactor was maintained at 80° C. and stirring was continued for 30 minutes. Next, after adding 5.6 g of a 10 mass% dodecylbenzenesulfonic acid aqueous solution, the temperature in the reactor was maintained at 80° C. and stirring was continued for 2 hours. After adding 6.6 g of a 2% by mass aqueous ammonium persulfate solution thereto, 22.5 g of methyl methacrylate, 11.2 g of n-butyl acrylate, 12.3 g of phenyltrimethoxysilane, 28.6 g of tetraethoxysilane and 38.6. -A mixed solution consisting of 1.1 g of methacryloxypropyltrimethoxysilane, 0.9 g of acrylic acid, 1.2 g of a reactive emulsifier ("ADEKA REASOAP SR-1025" manufactured by ADEKA; solid content 25 mass% aqueous solution), 1.2 g of reactive emulsifier (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., "Aqualon KH-1025"; solid content 25% by weight aqueous solution), 2.0% by weight ammonium persulfate aqueous solution 30 g, ion-exchanged water 286.4 g And were simultaneously added dropwise over a period of about 2 hours while maintaining the temperature in the reactor at 80°C. Furthermore, the temperature in the reactor was maintained at 80° C. and stirring was continued for about 1 hour, then cooled to room temperature, 25% aqueous ammonia solution was added to the reaction solution to adjust the pH to 8, and then 100 mesh It was filtered through a wire mesh. The solid content was adjusted to 10.0 mass% with ion-exchanged water to obtain an aqueous dispersion of a polymer (E3) having a number average particle diameter of 155 nm as a polymer.

[実施例1]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1)0.37gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水656.54gとを混合攪拌することにより光触媒組成物(F−1)を得た。
[Example 1]
Copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1) 0.37 g, and silica-modified rutile titanium oxide (solid content=5. 5%) (photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd., solid content 20 mass) %) (non-antibacterial photocatalytic inactive metal compound (A2-1)) 120.6 g, and fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., Ltd., "Surflon S-232") 0.99 g , 140 g of a fading dye (E) whose solid content was adjusted to 1.0% by mass with ion-exchanged water (“Methylene Blue” manufactured by Kishida Chemical Co., Ltd.) and 656.54 g of water were mixed and stirred to obtain a photocatalyst composition ( F-1) was obtained.

[実施例2]
抗菌性金属化合物(A1−1)の添加量を0.37gとすることに代えて、0.93gとすること以外は、実施例1と同様にして光触媒組成物(F−2)を得た。
[Example 2]
A photocatalyst composition (F-2) was obtained in the same manner as in Example 1 except that the addition amount of the antibacterial metal compound (A1-1) was set to 0.93 g instead of 0.37 g. ..

[実施例3]
抗菌性金属化合物(A1−1)の添加量を0.37gとすることに代えて、1.86gとすること以外は、実施例1と同様にして光触媒組成物(F−3)を得た。
[Example 3]
A photocatalyst composition (F-3) was obtained in the same manner as in Example 1 except that the addition amount of the antibacterial metal compound (A1-1) was changed to 0.37 g and changed to 1.86 g. ..

[実施例4]
抗菌性金属化合物(A1−1)の添加量を0.37gとすることに代えて、3.73gとすること以外は、実施例1と同様にして光触媒組成物(F−4)を得た。
[Example 4]
A photocatalyst composition (F-4) was obtained in the same manner as in Example 1 except that the amount of the antibacterial metal compound (A1-1) added was 3.73 g instead of 0.37 g. ..

[実施例5]
抗菌性金属化合物(A1−1)の添加量を0.37gとすることに代えて、5.59gとすること以外は、実施例1と同様にして光触媒組成物(F−5)を得た。
[Example 5]
A photocatalyst composition (F-5) was obtained in the same manner as in Example 1 except that the addition amount of the antibacterial metal compound (A1-1) was changed to 0.37 g and changed to 5.59 g. ..

[実施例6]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))0.47gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))104.0gと、参考例4に示す重合体エマルジョン粒子(C−1)水分散体(固形分8.5重量%)38.7gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水634.44gとを混合攪拌することにより光触媒組成物(F−6)を得た。
[Example 6]
0.47 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified rutile titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (photocatalytically active inorganic compound (B-1)) and 59.56 g of water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd., solid content 20). (% by mass) (non-antibacterial photocatalytically inactive metal compound (A2-1)) 104.0 g, and polymer emulsion particles (C-1) aqueous dispersion (solid content 8.5% by weight) shown in Reference Example 4. 38.7 g, fluorocarbon surfactant (D-1) (manufactured by AGC Seimi Chemical Co., Ltd., "Surflon S-232") 0.99 g, and fading property in which the solid content was adjusted to 1.0% by mass with ion-exchanged water. A photocatalyst composition (F-6) was obtained by mixing 140 g of the dye (E) (“Methylene blue” manufactured by Kishida Chemical Co., Ltd.) and 634.44 g of water with stirring.

[実施例7]
抗菌性金属化合物(A1−1)の添加量を0.47gとすることに代えて、0.93gとすること以外は、実施例6と同様にして光触媒組成物(F−7)を得た。
[Example 7]
A photocatalyst composition (F-7) was obtained in the same manner as in Example 6 except that the addition amount of the antibacterial metal compound (A1-1) was changed to 0.43 g, and changed to 0.93 g. ..

[実施例8]
抗菌性金属化合物(A1−1)の添加量を0.47gとすることに代えて、1.86gとすること以外は、実施例6と同様にして光触媒組成物(F−8)を得た。
[Example 8]
A photocatalyst composition (F-8) was obtained in the same manner as in Example 6 except that the addition amount of the antibacterial metal compound (A1-1) was changed to 0.47 g and changed to 1.86 g. ..

[実施例9]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))90.4gと、参考例4に示す重合体エマルジョン粒子(C−1)水分散体(固形分8.5重量%)70.9gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水614.44gとを混合攪拌することにより光触媒組成物(F−9)を得た。
[Example 9]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified rutile titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20 mass%) (non-antibacterial photocatalytically inactive metal compound (A2-1)) 90.4 g, and polymer emulsion particles (C-1) aqueous dispersion (solid content 8. 5 wt%) 70.9 g, fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., "Surflon S-232") 0.99 g, and ion-exchanged water to a solid content of 1.0 wt %. A photocatalyst composition (F-9) was obtained by mixing 140 g of the adjusted fading dye (E) ("Methylene blue" manufactured by Kishida Chemical Co., Ltd.) and 614.44 g of water with stirring.

[実施例10]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))65.7gと、参考例4に示す重合体エマルジョン粒子(C−1)水分散体(固形分8.5重量%)128.71gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水585.05gとを混合攪拌することにより光触媒組成物(F−10)を得た。
[Example 10]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified rutile titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20 mass%) (non-antibacterial photocatalytically inactive metal compound (A2-1)) 65.7 g, and polymer emulsion particles (C-1) aqueous dispersion (solid content 8. 5 wt.%) 128.71 g, fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., "Surflon S-232") 0.99 g, and ion-exchanged water to a solid content of 1.0 wt. A photocatalyst composition (F-10) was obtained by mixing 140 g of the adjusted fading dye (E) ("Methylene blue" manufactured by Kishida Chemical Co., Ltd.) and 585.05 g of water with stirring.

[実施例11]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))0.93gと、参考例2で作成したシリカ修飾アナターゼ型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−2))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水656.54gとを混合攪拌することにより光触媒組成物(F−11)を得た。
[Example 11]
0.93 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified anatase-type titanium oxide (solid content=5) prepared in Reference Example 2 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-2)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20% by mass) (non-antibacterial photocatalytic inactive metal compound (A2-1)) 120.6 g, and fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., Ltd., "Surflon S-232"). ) 0.99 g, 140 g of fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") in which the solid content is adjusted to 1.0% by mass with ion-exchanged water, and 656.54 g of water are mixed and stirred. To obtain a photocatalyst composition (F-11).

[実施例12]
抗菌性金属化合物(A1−1)の添加量を0.93gとすることに代えて、1.86gとすること以外は、実施例11と同様にして光触媒組成物(F−12)を得た。
[Example 12]
A photocatalyst composition (F-12) was obtained in the same manner as in Example 11 except that the amount of the antibacterial metal compound (A1-1) added was changed to 0.93 g to 1.86 g. ..

[実施例13]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))0.93gと、参考例3で作成した銀担持(担持量1%)シリカ修飾ルチル型酸化チタン(固形分=2%)(非抗菌性の光触媒活性無機化合物(B−3))163.82gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水552.28gとを混合攪拌することにより光触媒組成物(F−13)を得た。
[Example 13]
0.93 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silver-supported (supported amount 1%) silica-modified rutile prepared in Reference Example 3 Type titanium oxide (solid content = 2%) (non-antibacterial photocatalytically active inorganic compound (B-3)) 163.82 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", Nissan Chemical Industry Co., Ltd., solid content 20 mass%) (non-antibacterial photocatalytic inactive metal compound (A2-1)) 120.6 g and fluorocarbon surfactant (D-1) (manufactured by AGC Seimi Chemical Co., "Surflon S-232") 0.99 g, 140 g of fading dye (E) whose solid content is adjusted to 1.0% by mass with ion-exchanged water ("Methylene Blue" manufactured by Kishida Chemical Co., Ltd.), and water 552.28 g A photocatalyst composition (F-13) was obtained by mixing and stirring.

[実施例14]
抗菌性金属化合物(A1−1)の添加量を0.93gとすることに代えて、1.86gとすること以外は実施例13と同様にして光触媒組成物(F−14)を得た。
[Example 14]
A photocatalyst composition (F-14) was obtained in the same manner as in Example 13 except that the addition amount of the antibacterial metal compound (A1-1) was changed to 0.93 g and changed to 1.86 g.

[実施例15]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例3で作成した銀担持(担持量1%)シリカ修飾ルチル型酸化チタン(固形分=2%)(非抗菌性の光触媒活性無機化合物(B−3))163.8gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))104.0gと、参考例4に示す重合体エマルジョン粒子(C−1)水分散体(固形分8.5重量%)38.7gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水530.2gとを混合攪拌することにより光触媒組成物(F−15)を得た。
[Example 15]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silver-supported (supported amount 1%) silica-modified rutile prepared in Reference Example 3 Type titanium oxide (solid content = 2%) (non-antibacterial photocatalytically active inorganic compound (B-3)) 163.8 g, and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", Nissan Chemical Industry Co., Ltd., solid content 20 mass%) (non-antibacterial photocatalytic inactive metal compound (A2-1)) 104.0 g, and polymer emulsion particles (C-1) water dispersion shown in Reference Example 4 Body (solid content 8.5% by weight) 38.7 g, fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., "Surflon S-232") 0.99 g, and the solid content by ion exchange water. A photocatalyst composition (F-15) was obtained by mixing 140 g of the fading dye (E) (“Methylene blue” manufactured by Kishida Chemical Co., Ltd.) adjusted to 1.0% by mass and 530.2 g of water with stirring.

[実施例16]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスOS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−2))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水656.54gとを混合攪拌することにより光触媒組成物(F−16)を得た。
[Example 16]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified rutile titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex OS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20 mass%) (non-antibacterial photocatalytically inactive metal compound (A2-2)) 120.6 g, fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., "Surflon S-232") ) 0.99 g, 140 g of fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") in which the solid content is adjusted to 1.0% by mass with ion-exchanged water, and 656.54 g of water are mixed and stirred. To obtain a photocatalyst composition (F-16).

[実施例17]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径25nmの水分散コロイダルシリカ(商品名「スノーテックスO−40」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−3))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水656.54gとを混合攪拌することにより光触媒組成物(F−17)を得た。
[Example 17]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified rutile titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g, and water-dispersed colloidal silica having a number average particle diameter of 25 nm (trade name "Snowtex O-40", Nissan Chemical Industries, Ltd. ), solid content 20% by mass) (non-antibacterial photocatalytically inactive metal compound (A2-3)) 120.6 g, and fluorocarbon surfactant (D-1) (manufactured by AGC Seimi Chemical Co., "Surflon S-. 232"), 0.99 g, 140 g of fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") whose solid content is adjusted to 1.0% by mass with ion-exchanged water, and 656.54 g of water are mixed and stirred. By doing so, a photocatalyst composition (F-17) was obtained.

[実施例18]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例3で作成した銀担持(担持量1%)シリカ修飾ルチル型酸化チタン(固形分=2%)(非抗菌性の光触媒活性無機化合物(B−3))163.82gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスOS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−2))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水552.28gとを混合攪拌することにより光触媒組成物(F−18)を得た。
[Example 18]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silver-supported (supported amount 1%) silica-modified rutile prepared in Reference Example 3 Type titanium oxide (solid content=2%) (non-antibacterial photocatalytically active inorganic compound (B-3)) 163.82 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex OS", Nissan Chemical Industry Co., Ltd., solid content 20% by mass) (non-antibacterial photocatalytic inactive metal compound (A2-2)) 120.6 g and fluorocarbon surfactant (D-1) (manufactured by AGC Seimi Chemical Co., "Surflon S-232") 0.99 g, 140 g of fading dye (E) whose solid content is adjusted to 1.0% by mass with ion-exchanged water ("Methylene Blue" manufactured by Kishida Chemical Co., Ltd.), and water 552.28 g A photocatalyst composition (F-18) was obtained by mixing and stirring.

[実施例19]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例3で作成した銀担持(担持量1%)シリカ修飾ルチル型酸化チタン(固形分=2%)(非抗菌性の光触媒活性無機化合物(B−3))163.82gと、数平均粒子径25nmの水分散コロイダルシリカ(商品名「スノーテックスO−40」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−3))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水552.28gとを混合攪拌することにより光触媒組成物(F−19)を作成した。
[Example 19]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silver-supported (supported amount 1%) silica-modified rutile prepared in Reference Example 3 Type titanium oxide (solid content=2%) (non-antibacterial photocatalytically active inorganic compound (B-3)) 163.82 g and water-dispersed colloidal silica having a number average particle diameter of 25 nm (trade name “Snowtex O-40”) Manufactured by NISSAN CHEMICAL INDUSTRIES CO., LTD., solid content 20% by mass (non-antibacterial photocatalytic inactive metal compound (A2-3)) 120.6 g, and fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., Ltd. Manufactured by "Surflon S-232") 0.99 g, 140 g of fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") having a solid content adjusted to 1.0% by mass with ion-exchanged water, and water 552. A photocatalyst composition (F-19) was prepared by mixing and stirring 0.28 g with.

[実施例20]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))104.0gと、参考例5に示す重合体エマルジョン粒子(C−2)水分散体(固形分10.0重量%)32.9gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水640.24gとを混合攪拌することにより光触媒組成物(F−20)を得た。
[Example 20]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified rutile titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20% by mass) (non-antibacterial photocatalytically inactive metal compound (A2-1)) 104.0 g, and polymer emulsion particles (C-2) aqueous dispersion (solid content 10. 0 wt%) 32.9 g, fluorocarbon surfactant (D-1) (manufactured by AGC Seimi Chemical Co., "Surflon S-232") 0.99 g, and ion-exchanged water to a solid content of 1.0% by mass. A photocatalyst composition (F-20) was obtained by mixing 140 g of the adjusted fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") and 640.24 g of water with stirring.

[実施例21]
参考例5に示す重合体エマルジョン粒子(C−2)水分散体に代えて、参考例6に示す重合体エマルジョン粒子(C−3)水分散体(固形分10.0重量%)32.9gを混合する以外は、実施例20と同様にして光触媒組成物(F−21)を得た。
を準備した。
[Example 21]
32.9 g of the polymer emulsion particle (C-3) water dispersion (solid content 10.0% by weight) shown in Reference Example 6 instead of the polymer emulsion particle (C-2) water dispersion shown in Reference Example 5. A photocatalyst composition (F-21) was obtained in the same manner as in Example 20 except that the above was mixed.
Prepared.

[実施例22]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性無機化合物(A2−1))120.6gと、フルオロカーボン界面活性剤(D−2)(DIC社製、「メガファックF−444」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水656.54gとを混合攪拌することにより光触媒組成物(F−22)を得た。
[Example 22]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified rutile titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20% by mass) (non-antibacterial photocatalytically inactive inorganic compound (A2-1)) 120.6 g and fluorocarbon surfactant (D-2) (manufactured by DIC, "Megafuck F-444"). By mixing and stirring 0.99 g, 140 g of the fading dye (E) whose solid content was adjusted to 1.0% by mass with ion-exchanged water (“Methylene Blue” manufactured by Kishida Chemical Co., Ltd.), and 656.54 g of water. A photocatalyst composition (F-22) was obtained.

[実施例23]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))104.0gと、参考例4に示す重合体エマルジョン粒子(C−1)水分散体(固形分8.5重量%)38.7gと、フルオロカーボン界面活性剤(D−2)(DIC社製、「メガファックF−444」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水634.44gとを混合攪拌することにより光触媒組成物(F−23)を得た。
[Example 23]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified rutile titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20% by mass) (non-antibacterial photocatalytically inactive metal compound (A2-1)) 104.0 g, and polymer emulsion particles (C-1) aqueous dispersion (solid content 8. 5% by weight) 38.7 g, fluorocarbon surfactant (D-2) (manufactured by DIC, "Megafuck F-444") 0.99 g, and the solid content is adjusted to 1.0% by weight with ion-exchanged water. The photocatalyst composition (F-23) was obtained by mixing 140 g of the fading dye (E) (“Methylene Blue” manufactured by Kishida Chemical Co., Ltd.) and 634.44 g of water with stirring.

[実施例24]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))0.93gと、参考例3で作成した銀担持(担持量1%)シリカ修飾ルチル型酸化チタン(固形分=2%)(非抗菌性の光触媒活性無機化合物(B−3))163.82gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒無機化合物(A2−1))120.6gと、フルオロカーボン界面活性剤(D−2)(DIC社製、「メガファックF−444」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水552.28gとを混合攪拌することにより光触媒組成物(F−24)を得た。
[Example 24]
0.93 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silver-supported (supported amount 1%) silica-modified rutile prepared in Reference Example 3 Type titanium oxide (solid content = 2%) (non-antibacterial photocatalytically active inorganic compound (B-3)) 163.82 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", Nissan Chemical Industry Co., Ltd., solid content 20 mass%) (non-antibacterial photocatalyst inorganic compound (A2-1)) 120.6 g and fluorocarbon surfactant (D-2) (manufactured by DIC, "Megafuck F"). -444"), 0.99 g, 140 g of the fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") having a solid content adjusted to 1.0% by mass with ion-exchanged water, and 552.28 g of water. A photocatalyst composition (F-24) was obtained by stirring.

[実施例25]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、参考例3で作成した銀担持(担持量1%)シリカ修飾ルチル型酸化チタン(固形分=2%)(非抗菌性の光触媒活性無機化合物(B−3))163.8gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性無機化合物(A2−1))104.0gと、参考例4に示す重合体エマルジョン粒子(C−1)水分散体(固形分8.5重量%)38.7gと、フルオロカーボン界面活性剤(D−2)(DIC社製、「メガファックF−444」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水530.2gとを混合攪拌することにより光触媒組成物(F−25)を作成した。
[Example 25]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silver-supported (supported amount 1%) silica-modified rutile prepared in Reference Example 3 Type titanium oxide (solid content = 2%) (non-antibacterial photocatalytically active inorganic compound (B-3)) 163.8 g, and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", Nissan Chemical Industry Co., Ltd., solid content 20 mass%) (non-antibacterial photocatalytically inactive inorganic compound (A2-1)) 104.0 g, and polymer emulsion particles (C-1) water dispersion shown in Reference Example 4 Body (solid content 8.5% by weight) 38.7 g, fluorocarbon surfactant (D-2) (manufactured by DIC, "Megafuck F-444") 0.99 g, and ion-exchanged water to give a solid content of 1 A photocatalyst composition (F-25) was prepared by mixing and stirring 140 g of the fading dye (E) (“Methylene blue” manufactured by Kishida Chemical Co., Ltd.) adjusted to 0.0% by mass and 530.2 g of water with stirring.

[実施例26]
酸化亜鉛(CIKナノテック(株)製、固形分30.2%)(抗菌性金属化合物(A1−2))1.86gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性無機化合物(A2−1))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水656.54gとを混合攪拌することにより光触媒組成物(F−26)を得た。
[Example 26]
1.86 g of zinc oxide (manufactured by CIK Nanotech Co., Ltd., solid content 30.2%) (antibacterial metal compound (A1-2)) and silica-modified rutile type titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20% by mass) (non-antibacterial photocatalytically inactive inorganic compound (A2-1)) 120.6 g, fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., Ltd., "Surflon S-232") ) 0.99 g, 140 g of fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") in which the solid content is adjusted to 1.0% by mass with ion-exchanged water, and 656.54 g of water are mixed and stirred. To obtain a photocatalyst composition (F-26).

[実施例27]
抗菌性金属化合物(A1−2)を1.86gとすることに代えて、3.73gとすること以外は、実施例26と同様にして光触媒組成物(F−27)を得た。
[Example 27]
A photocatalyst composition (F-27) was obtained in the same manner as in Example 26 except that the amount of the antibacterial metal compound (A1-2) was changed to 1.86 g and was set to 3.73 g.

[実施例28]
酸化亜鉛(CIKナノテック(株)製、固形分30.2%)(抗菌性金属化合物(A1−2))1.86gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性無機化合物(A2−1))104.0gと、参考例4に示す重合体エマルジョン粒子(C−1)水分散体(固形分8.5重量%)38.7gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水634.44gとを混合攪拌することにより光触媒組成物(F−28)を得た。
[Example 28]
1.86 g of zinc oxide (manufactured by CIK Nanotech Co., Ltd., solid content 30.2%) (antibacterial metal compound (A1-2)) and silica-modified rutile type titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20% by mass) (non-antibacterial photocatalytically inactive inorganic compound (A2-1)) 104.0 g, and polymer emulsion particles (C-1) aqueous dispersion (solid content 8. 5% by weight) 38.7 g, fluorocarbon surfactant (D-1) (manufactured by AGC Seimi Chemical Co., "Surflon S-232") 0.99 g, and ion-exchanged water to a solid content of 1.0% by mass. A photocatalyst composition (F-28) was obtained by mixing 140 g of the adjusted fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") and 634.44 g of water with stirring.

[実施例29]
酸化亜鉛(CIKナノテック(株)製、固形分30.2%)(抗菌性金属化合物(A1−2))1.86gと、参考例3で作成した銀担持(担持量1%)シリカ修飾ルチル型酸化チタン(固形分=2%)(非抗菌性の光触媒活性無機化合物(B−3))163.82gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒無機化合物(A2−1))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水552.28gとを混合攪拌することにより光触媒組成物(F−29)を得た。
[Example 29]
1.86 g of zinc oxide (manufactured by CIK Nanotech Co., Ltd., solid content 30.2%) (antibacterial metal compound (A1-2)) and silver-supported (supported amount 1%) silica-modified rutile prepared in Reference Example 3 Type titanium oxide (solid content = 2%) (non-antibacterial photocatalytically active inorganic compound (B-3)) 163.82 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", Nissan Chemical Industry Co., Ltd., solid content 20 mass%) (non-antibacterial photocatalyst inorganic compound (A2-1)) 120.6 g, fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., "surflon S-232"), 0.99 g, 140 g of the fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") having a solid content adjusted to 1.0% by mass with ion-exchanged water, and 552.28 g of water. A photocatalyst composition (F-29) was obtained by mixing and stirring.

[実施例30]
酸化亜鉛(CIKナノテック(株)製、固形分30.2%)(抗菌性金属化合物(A1−2))1.86gと、参考例3で作成した銀担持(担持量1%)シリカ修飾ルチル型酸化チタン(固形分=2%)(非抗菌性の光触媒活性無機化合物(B−3))163.8gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性無機化合物(A2−1))104.0gと、参考例4に示す重合体エマルジョン粒子(C−1)水分散体(固形分8.5重量%)38.7gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水530.2gとを混合攪拌することにより光触媒組成物(F−30)を作成した。
[Example 30]
1.86 g of zinc oxide (manufactured by CIK Nanotech Co., Ltd., solid content 30.2%) (antibacterial metal compound (A1-2)) and silver-supported (supported amount 1%) silica-modified rutile prepared in Reference Example 3 Type titanium oxide (solid content = 2%) (non-antibacterial photocatalytically active inorganic compound (B-3)) 163.8 g, and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", Nissan Chemical Industry Co., Ltd., solid content 20 mass%) (non-antibacterial photocatalytically inactive inorganic compound (A2-1)) 104.0 g, and polymer emulsion particles (C-1) water dispersion shown in Reference Example 4 Body (solid content 8.5% by weight) 38.7 g, fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., "Surflon S-232") 0.99 g, and the solid content by ion exchange water. A photocatalyst composition (F-30) was prepared by mixing 140 g of the fading dye (E) (“Methylene blue” manufactured by Kishida Chemical Co., Ltd.) adjusted to 1.0% by mass and 530.2 g of water with stirring.

[比較例1]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))0.09gと、参考例1で作成したシリカ修飾ルチル型酸化チタン(固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−1))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性無機化合物(A2−1))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水656.54gとを混合攪拌することにより光触媒組成物(F−31)を得た。
[Comparative Example 1]
0.09 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)) and silica-modified rutile titanium oxide (solid content=5) prepared in Reference Example 1 0.5%) (non-antibacterial photocatalytically active inorganic compound (B-1)) 59.56 g and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", manufactured by Nissan Chemical Industries, Ltd.) , Solid content 20% by mass) (non-antibacterial photocatalytically inactive inorganic compound (A2-1)) 120.6 g, fluorocarbon surfactant (D-1) (AGC Seimi Chemical Co., Ltd., "Surflon S-232") ) 0.99 g, 140 g of fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") in which the solid content is adjusted to 1.0% by mass with ion-exchanged water, and 656.54 g of water are mixed and stirred. To obtain a photocatalyst composition (F-31).

[比較例2]
抗菌性金属化合物(A1−1)0.09gとすることに代えて、41gとすること以外は、比較例1と同様にして光触媒組成物(F−32)を得た。
[Comparative example 2]
A photocatalyst composition (F-32) was obtained in the same manner as in Comparative Example 1 except that the amount was 41 g instead of the antibacterial metal compound (A1-1) being 0.09 g.

[比較例3]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))1.86gと、市販品の酸化チタン(石原産業(株)製アナターゼ型酸化チタンST−01、固形分5.5%)(非抗菌性の光触媒活性無機化合物(B−4))59.56gと、数平均粒子径8nmの水分散コロイダルシリカ(商品名「スノーテックスNS」、日産化学工業(株)製、固形分20質量%)(非抗菌性の光触媒不活性金属化合物(A2−1))120.6gと、フルオロカーボン界面活性剤(D−1)(AGCセイミケミカル社製、「サーフロンS−232」)0.99gと、イオン交換水により固形分量を1.0質量%に調整した退色性色素(E)(キシダ化学社製、「メチレンブルー」)140gと、水656.54gとを混合攪拌することにより光触媒組成物(F−33)を得た。
[Comparative Example 3]
1.86 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content 15.3%) (antibacterial metal compound (A1-1)), and commercially available titanium oxide (Anatase type titanium oxide ST manufactured by Ishihara Sangyo Co., Ltd.) -01, solid content 5.5%) (non-antibacterial photocatalytically active inorganic compound (B-4)) 59.56 g, and water-dispersed colloidal silica having a number average particle diameter of 8 nm (trade name "Snowtex NS", Nissan Chemical Industry Co., Ltd., solid content 20 mass%) (non-antibacterial photocatalytic inactive metal compound (A2-1)) 120.6 g and fluorocarbon surfactant (D-1) (manufactured by AGC Seimi Chemical Co., "Surflon S-232"), 0.99 g, 140 g of fading dye (E) (manufactured by Kishida Chemical Co., Ltd., "methylene blue") whose solid content is adjusted to 1.0% by mass with ion-exchanged water, and 656.54 g of water. A photocatalyst composition (F-33) was obtained by mixing and stirring.

[比較例4]
比較例3の市販品の酸化チタンに代えて、市販品の酸化チタン(テイカ(株)製ルチル型酸化チタンMT150A、固形分5.5%)(非抗菌性の光触媒活性無機化合物(B−5))59.56gとすること以外は、比較例3と同様にして光触媒組成物(F−34)を得た。
[Comparative Example 4]
Instead of the commercially available titanium oxide of Comparative Example 3, commercially available titanium oxide (Rutile titanium oxide MT150A manufactured by Teika Co., Ltd., solid content 5.5%) (non-antibacterial photocatalytically active inorganic compound (B-5 )) A photocatalyst composition (F-34) was obtained in the same manner as in Comparative Example 3 except that the amount was 59.56 g.

[比較例5]
酸化銅(CIKナノテック(株)製、固形分15.3%)(抗菌性金属化合物(A1−1))0.1gと、市販品の酸化チタン(石原産業(株)製「STS−11」;固形分=5.5%)(非抗菌性の光触媒活性無機化合物(B−6))77.7gと、数平均粒子径30nmの水分散コロイダルシリカ(商品名「スノーテックス50」、日産化学工業(株)製、固形分48質量%)(非抗菌性の光触媒不活性無機化合物(A2−4))50.5gと、ポリエーテル変性シリコーン系界面活性剤(D”)(商品名「KF−643」、信越化学工業製)1.7gと、水850.1gとを混合攪拌することにより光触媒組成物(F−35)を得た。
[Comparative Example 5]
0.1 g of copper oxide (manufactured by CIK Nanotech Co., Ltd., solid content: 15.3%) (antibacterial metal compound (A1-1)) and commercially available titanium oxide (“STS-11” manufactured by Ishihara Sangyo Co., Ltd.) Solid content = 5.5%) (non-antibacterial photocatalytically active inorganic compound (B-6)) 77.7 g, and water-dispersed colloidal silica having a number average particle diameter of 30 nm (trade name "Snowtex 50", Nissan Chemical Co., Ltd.). 50.5 g (manufactured by Kogyo Co., Ltd., solid content: 48% by mass) (non-antibacterial photocatalytically inactive inorganic compound (A2-4)), and polyether-modified silicone surfactant (D") (trade name "KF -643", manufactured by Shin-Etsu Chemical Co., Ltd.) and 850.1 g of water were mixed and stirred to obtain a photocatalyst composition (F-35).

[光触媒塗膜の製造]
片面(裏面)に白色印刷が施されたガラス板の別の片面(表面)にアクリルシリコーン樹脂を予め100μmの膜厚で塗工した10cm×10cmのガラス板を準備した。このガラス板の片面(表面)に各光触媒組成物(F−1〜F−35)をスプレー法にて塗布した。その後、塗布した各光触媒組成物(F−1〜F−35)を常温で1時間乾燥することにより、光触媒塗膜が形成された試験板(G−1〜G−35)を得た。
[Production of photocatalytic coating]
A glass plate having a size of 10 cm×10 cm was prepared by coating an acrylic silicone resin with a film thickness of 100 μm on another surface (front surface) of a glass plate having one surface (back surface) white-printed. Each photocatalyst composition (F-1 to F-35) was applied to one surface (front surface) of this glass plate by a spray method. Then, the coated photocatalyst compositions (F-1 to F-35) were dried at room temperature for 1 hour to obtain test plates (G-1 to G-35) having a photocatalyst coating film formed thereon.

各試験板(G−1〜G−35)の各種評価結果を表2及び表3に示す。 Tables 2 and 3 show various evaluation results of the test plates (G-1 to G-35).

本実施形態の光触媒組成物は、塗装の際、防藻性(防カビ性)の長期持続性、耐候性、及び下地塗膜に対する低損傷性に優れるため、光触媒塗膜直下塗膜(下地塗膜)上に、保護層を不要とせず、形成することができるため、セルフクリーニング性に優れ、建築外装、内装材、外装表示用途、自動車、ディスプレイ等に適用できる。 The photocatalyst composition of the present embodiment is excellent in long-term durability of algae-proof property (antifungal property), weather resistance, and low damage to the underlying coating film during coating, and therefore, the coating film directly under the photocatalyst coating film (primer coating Since a protective layer can be formed on a film without needing it, it has excellent self-cleaning properties and can be applied to building exteriors, interior materials, exterior display applications, automobiles, displays and the like.

Claims (11)

抗菌性金属化合物(A1)と、抗菌性を有しない非抗菌性無機化合物(AA)とを含む
光触媒組成物であって、
前記非抗菌性無機化合物(AA)が、光触媒活性を有しない光触媒不活性無機化合物(
A2)と、光触媒活性を有する光触媒活性無機化合物(B)とを含み、
前記抗菌性金属化合物(A1)の前記光触媒不活性無機化合物(A2)に対する質量比
(A1/A2)が、0.001以上0.25以下であり、
前記抗菌性金属化合物(A1)に含まれる金属が、銅及び亜鉛からなる群より選択され
る少なくとも1種であり、前記光触媒不活性無機化合物(A2)の含有量が、前記抗菌性
金属化合物(A1)を除く前記光触媒組成物の固形分全体に対し、46.1質量%以上9
9質量%以下であり、
前記光触媒不活性無機化合物(A2)が、二酸化ケイ素であり、
前記光触媒活性無機化合物(B)が、以下の(i)の条件を満たすか、以下の(i)及
び以下の(ii)両方の条件を満たす、光触媒組成物。

(i)前記光触媒活性無機化合物(B)を含む懸濁液に、波長380nm以下、強度5m
W/cm2の紫外光を60秒間照射した際に発生する過酸化水素量([H22])が、80
μM以下である;
(ii)前記光触媒活性無機化合物(B)を含む懸濁液に、波長380nm以下、強度5m
W/cm2の紫外光を60秒間照射した際に発生するヒドロキシラジカル量[・OH]が、
1.0μM以下である:
A photocatalyst composition comprising an antibacterial metal compound (A1) and a non-antibacterial inorganic compound (AA) having no antibacterial property,
The non-antibacterial inorganic compound (AA) is a photocatalytically inactive inorganic compound having no photocatalytic activity (
A2) and a photocatalytically active inorganic compound (B) having photocatalytic activity,
The mass ratio (A1/A2) of the antibacterial metal compound (A1) to the photocatalytically inactive inorganic compound (A2) is 0.001 or more and 0.25 or less,
The metal contained in the antibacterial metal compound (A1) is at least one selected from the group consisting of copper and zinc, and the content of the photocatalytically inactive inorganic compound (A2) is the antibacterial metal compound ( 46.1% by mass or more based on the total solid content of the photocatalyst composition excluding A1) 9
9 mass% or less,
The photocatalytically inactive inorganic compound (A2) is silicon dioxide,
A photocatalyst composition in which the photocatalytically active inorganic compound (B) satisfies the following condition (i) or both the following (i) and (ii) conditions are satisfied.

(I) In the suspension containing the photocatalytically active inorganic compound (B), a wavelength of 380 nm or less and an intensity of 5 m
The amount of hydrogen peroxide ([H 2 O 2 ]) generated when irradiated with UV light of W/cm 2 for 60 seconds is 80
μM or less;
(Ii) In the suspension containing the photocatalytically active inorganic compound (B), a wavelength of 380 nm or less and an intensity of 5 m
The amount of hydroxy radicals [.OH] generated when UV light of W/cm 2 is irradiated for 60 seconds is
1.0 μM or less:
前記光触媒活性無機化合物(B)が、酸化チタンである、請求項に記載の光触媒組成物。 The photocatalyst composition according to claim 1 , wherein the photocatalytically active inorganic compound (B) is titanium oxide. 前記光触媒活性無機化合物(B)の粒子表面が、金属酸化物(C)により、修飾処理さ
れている、請求項1又は2に記載の光触媒組成物。
Particle surface of the photocatalytic activity inorganic compound (B) is a metal oxide (C), has been modified process, the photocatalytic composition as claimed in claim 1 or 2.
前記金属酸化物(C)が、二酸化ケイ素である、請求項に記載の光触媒組成物。 The photocatalyst composition according to claim 3 , wherein the metal oxide (C) is silicon dioxide. 前記光触媒活性無機化合物(B)の含有量が、前記抗菌性金属化合物(A1)を除く前
記光触媒組成物の固形分全体に対し、1質量%以上20質量%以下である、請求項1〜
のいずれか一項に記載の光触媒組成物。
The content of the photocatalytic activity inorganic compound (B) is, overall solid content of the photocatalytic composition excluding the antimicrobial metal compound (A1) with respect to, 20 mass% or less 1 wt%, claim 1-4
The photocatalyst composition according to any one of 1.
重合体粒子(D)をさらに含む、請求項1〜のいずれか一項に記載の光触媒組成物。 Further comprising polymer particles (D), the photocatalytic composition according to any one of claims 1-5. 前記重合体粒子(D)の含有量が、前記抗菌性金属化合物(A1)を除く前記光触媒組
成物全体に対し、40質量%以下である、請求項に記載の光触媒組成物。
The photocatalyst composition according to claim 6 , wherein the content of the polymer particles (D) is 40% by mass or less based on the entire photocatalyst composition excluding the antibacterial metal compound (A1).
フルオロカーボン界面活性剤(E)をさらに含む、請求項1〜のいずれか一項に記載の光触媒組成物。 Fluorocarbon further comprises a surfactant (E), the photocatalytic composition according to any one of claims 1-7. 退色性色素(F)をさらに含む、請求項1〜のいずれか一項に記載の光触媒組成物。 Fading dye (F) further comprises, photocatalyst composition according to any one of claims 1-8. 請求項1〜のいずれか一項に記載の光触媒組成物から形成された、光触媒塗膜。 It formed from the photocatalyst composition according to any one of claim 1 to 9 photocatalytic coating. 請求項10に記載の光触媒塗膜を備える、光触媒塗装製品。 A photocatalyst coating product, comprising the photocatalyst coating according to claim 10 .
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