JP6690214B2 - パターン描画装置 - Google Patents
パターン描画装置 Download PDFInfo
- Publication number
- JP6690214B2 JP6690214B2 JP2015240116A JP2015240116A JP6690214B2 JP 6690214 B2 JP6690214 B2 JP 6690214B2 JP 2015240116 A JP2015240116 A JP 2015240116A JP 2015240116 A JP2015240116 A JP 2015240116A JP 6690214 B2 JP6690214 B2 JP 6690214B2
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- substrate
- scanning
- pattern
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- Mechanical Optical Scanning Systems (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015240116A JP6690214B2 (ja) | 2015-12-09 | 2015-12-09 | パターン描画装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015240116A JP6690214B2 (ja) | 2015-12-09 | 2015-12-09 | パターン描画装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017107036A JP2017107036A (ja) | 2017-06-15 |
| JP2017107036A5 JP2017107036A5 (enExample) | 2018-12-06 |
| JP6690214B2 true JP6690214B2 (ja) | 2020-04-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015240116A Active JP6690214B2 (ja) | 2015-12-09 | 2015-12-09 | パターン描画装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6690214B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7169746B2 (ja) * | 2018-02-06 | 2022-11-11 | Jswアクティナシステム株式会社 | レーザ剥離装置、レーザ剥離方法、及び有機elディスプレイの製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59178072A (ja) * | 1983-03-29 | 1984-10-09 | Nippon Kogaku Kk <Nikon> | パタ−ン描画装置 |
| US6178031B1 (en) * | 1999-12-20 | 2001-01-23 | Xerox Corporation | Raster output scanning system having scan line non-linearity compensation means |
| JP2004004510A (ja) * | 2002-04-17 | 2004-01-08 | Ricoh Co Ltd | 光走査装置及び画像形成装置 |
| JP4182515B2 (ja) * | 2003-05-08 | 2008-11-19 | 株式会社オーク製作所 | パターン描画装置 |
| TWI684836B (zh) * | 2014-04-01 | 2020-02-11 | 日商尼康股份有限公司 | 圖案描繪裝置 |
| CN109212748B (zh) * | 2014-04-28 | 2021-05-18 | 株式会社尼康 | 光束扫描装置及光束扫描方法 |
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- 2015-12-09 JP JP2015240116A patent/JP6690214B2/ja active Active
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| Publication number | Publication date |
|---|---|
| JP2017107036A (ja) | 2017-06-15 |
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