JP6679413B2 - Cleaning equipment for vapor phase growth equipment - Google Patents

Description

  The present invention relates to a device for cleaning a vapor phase growth apparatus component, and more particularly, to a component used in a vapor phase growth apparatus for producing a thin film such as a compound semiconductor used in a light emitting device such as a light emitting diode or a laser diode. The present invention relates to a cleaning device for cleaning.

  A vapor phase growth apparatus is known as an apparatus for manufacturing thin films of various compound semiconductors. As a vapor phase growth apparatus, a substrate is placed on a susceptor provided in a flow channel, the substrate is heated via the susceptor, a source gas is supplied into the flow channel, and the source gas is supplied above the substrate. What is made to react and forms a thin film on a board | substrate is generally used. In such a vapor phase growth apparatus, the reaction products adhere to the parts located around the portion where the raw material gas reacts, so the vapor phase growth apparatus is periodically disassembled to clean and adhere the respective parts. The reaction product is removed (see, for example, Patent Document 1).

JP 2012-186311 A

  However, in the conventional apparatus for cleaning a vapor phase growth apparatus component, it is necessary to prepare a support tool or a container corresponding to the shape of each component, and one cleaning apparatus is associated with one vapor phase growth apparatus. In many cases, it has been difficult to collectively clean the components for the vapor phase growth apparatus of various shapes for processing substrates of different sizes.

  Then, the present invention has an object to provide a cleaning apparatus for components of a vapor phase growth apparatus having a structure capable of collectively cleaning components of the vapor phase growth apparatus of various shapes for processing substrates having different sizes. I am trying.

  In order to achieve the above-mentioned object, a cleaning apparatus for a component for a vapor phase growth apparatus of the present invention has, as a first configuration, a cleaning furnace main body having an opening only in the lower side, and a vertically movable unit provided below the cleaning furnace main body. Cleaning furnace lid member, a cleaning gas supply path and a cleaning exhaust gas discharge path provided through the central portion of the cleaning furnace lid member, and cleaning that is detachably mounted on the cleaning furnace lid member. And a container, and the cleaning container is mounted on the cleaning container support member provided on the cleaning furnace lid member so as to be detachably mounted on the cleaning container support, and mounted on the inner peripheral portion of the bottom plate. A small-diameter ring-shaped inner peripheral side support member, a large-diameter ring-shaped outer peripheral side support member laminated on the outer peripheral portion of the bottom plate, and a component support provided between the inner peripheral side support member and the outer peripheral side support member. , A cleaning container top plate placed on the outer peripheral side supporting member located at the uppermost stage, Inner peripheral side concave and convex engaging portions for positioning vertically adjacent inner peripheral side supporting members are provided on the inner peripheral side lower part and the inner peripheral side upper part of the side supporting member, and the outer peripheral side lower part of the outer peripheral side supporting member and The outer peripheral side upper part is provided with an outer peripheral side concave-convex engaging portion for positioning vertically adjacent outer peripheral side supporting members, and on the outer peripheral side of the inner peripheral side supporting member and the inner peripheral side of the outer peripheral side supporting member, Component mounting for mounting a component for vapor phase growth apparatus between the inner peripheral side supporting member and the outer peripheral side supporting member, or between the inner peripheral side supporting member or the outer peripheral side supporting member and the component supporting tool. And a cleaning gas flow path communicating with the cleaning gas supply path through an opening provided in the central portion of the bottom plate is provided on the inner peripheral side of the inner peripheral side support member. An exhaust hole communicating with the cleaning exhaust gas discharge passage is provided on the inner peripheral portion of the bottom plate on the outer peripheral side. Both, between the inner peripheral side support member located at the uppermost stage and the cleaning container top plate, and between the upper surface of the component mounting portion and the lower surface of the component for vapor phase growth apparatus, a gas flow path, respectively. It is characterized by being formed.

  A second configuration of the apparatus for cleaning a vapor phase growth apparatus component according to the present invention is a cleaning furnace main body having an opening only in the lower side, and a cleaning furnace lid member provided below the cleaning furnace main body so as to be capable of moving up and down. A cleaning gas supply path and a cleaning exhaust gas discharge path that are provided through the central portion of the cleaning furnace lid member, and a cleaning container that is detachably mounted on the cleaning furnace lid member, The cleaning container includes a disc-shaped bottom plate removably mounted on a cleaning container support provided on the cleaning furnace lid member, and a small-diameter ring-shaped inner periphery mounted on the inner peripheral portion of the bottom plate. Side support member, a large-diameter ring-shaped outer peripheral side support member laminated on the outer peripheral portion of the bottom plate, a component support tool provided between the inner peripheral side support member and the outer peripheral side support member, and the uppermost stage. An inner circumference of the inner circumference side support member, which comprises a cleaning container top plate placed on the outer circumference side support member Inner peripheral concave and convex engaging portions for positioning vertically adjacent inner peripheral side supporting members are provided on the lower portion and the inner peripheral side upper portion. An outer peripheral side concave-convex engaging portion for positioning the outer peripheral side supporting members adjacent to each other is provided, and an inner peripheral side supporting member and an outer peripheral side are provided on the outer peripheral side of the inner peripheral side supporting member and the inner peripheral side of the outer peripheral side supporting member. Between the side support member or between the inner peripheral side support member or the outer peripheral side support member and the component supporter, a component mounting portion for mounting a component for a vapor phase growth apparatus is provided, and the inner periphery is provided. On the inner peripheral side of the side support member, a cleaning gas flow path communicating with the cleaning gas supply path through an opening provided at the center of the bottom plate is provided, and on the inner peripheral side support member, the cleaning gas flow path and A cleaning gas flow channel is provided to circulate the outer peripheral side of the inner peripheral side support member, and The side support member is provided with a cleaning exhaust gas flow passage that circulates the inner peripheral side of the outer peripheral side support member and the external side of the cleaning container, and the cleaning exhaust gas discharge path allows suction and discharge of gas outside the cleaning container. It is characterized by being provided.

  Further, the cleaning furnace lid member elevating and lowering the cleaning furnace lid member to a raised position for closing the opening of the cleaning furnace body and a lowered position for positioning the cleaning container below the opening of the cleaning furnace body. In addition, the cleaning container placed on the cleaning furnace lid member lowered to the descending position is transferred from the cleaning furnace lid member and conveyed to the side position of the cleaning furnace lid member. It is characterized in that it is provided with a cleaning container transporting means.

  According to the apparatus for cleaning a component for a vapor phase growth apparatus of the present invention, a cleaning container in which a plurality of components for a vapor phase growth apparatus are supported and housed by using an inner peripheral side support member, an outer peripheral side support member and a component support tool. With the cleaning furnace placed on the cleaning furnace lid member, the opening of the cleaning furnace main body is closed by the cleaning furnace lid member and the cleaning gas is supplied into the cleaning container, so that a plurality of parts for the vapor phase growth apparatus can be installed. Can be efficiently washed. Further, the cleaning furnace lid member elevating means for raising and lowering the cleaning furnace lid member and the cleaning container transporting means for transporting the cleaning container to the side position of the cleaning furnace lid member are grounded, so that the cleaning container can be put in and out of the cleaning furnace. It can be done easily.

FIG. 1 is a sectional front view of a main part showing an example of a vapor phase growth apparatus including a component to be cleaned by a vapor phase growth apparatus component cleaning apparatus of the present invention. It is a cross-sectional front view showing a first embodiment of a cleaning apparatus for vapor phase growth apparatus parts of the present invention. It is explanatory drawing which shows the relationship between a cleaning furnace main body, a cleaning container, and a cleaning furnace lid member. It is a cross-sectional front view of the main part showing the relationship between the cleaning furnace body and the cleaning furnace lid member. It is a cross-sectional front view of a main part showing the relationship between the cleaning furnace lid member and the cleaning container. It is explanatory drawing which shows an example of the arrangement | positioning state of the components for vapor phase growth apparatuses in a cleaning container. It is a sectional front view showing a state where a cleaning furnace lid member on which a cleaning container is placed is lowered. It is a top view showing an example of a cleaning container transportation means. It is a sectional front view showing a state in which the cleaning container is transferred to the cleaning container transfer means. It is a sectional side view similarly. Similarly, it is a top view. It is a cross-sectional front view showing a state where the cleaning furnace lid member is further lowered and the cleaning container is conveyed to a side position of the cleaning furnace lid member. Similarly, it is a top view. It is a cross-sectional front view showing a state in which the cleaning container is transferred to the carrier. Similarly, it is a top view. It is a cross-sectional front view which shows the 2nd example of the cleaning apparatus of the components for vapor phase growth apparatuses of this invention.

  The cleaning apparatus for vapor phase growth apparatus components shown in the present embodiment is for cleaning various components used in a vapor phase growth apparatus for forming thin films of various compound semiconductors on a substrate. FIG. 1 shows an example of a vapor phase growth apparatus, and shows a main part on the right side of a rotation center line. In this vapor phase growth apparatus, a disk-shaped susceptor 12 holding a plurality of substrates 11 is rotatably provided in a flat cylindrical chamber, and the substrate 11 is heated to a predetermined temperature by a heating means 13 while rotating the susceptor 12. In addition, the gas supply unit 14 provided at the center of rotation of the susceptor 12 is configured to radially supply a predetermined source gas.

  A disc-shaped susceptor cover 15 having a circular opening is provided on the upper surface of the susceptor 12, and the substrate 11 is arranged in the circular opening of the susceptor cover 15 via a plate ring 16. A disc-shaped ceiling plate 17 having a circular opening in the center is provided above the susceptor 12.

  When forming a thin film, the source gas reacts or decomposes above the substrate 11 heated to a predetermined temperature to form a predetermined thin film on the upper surface of the substrate 11. At the same time, part of the raw material gas and reaction products also adhere to the susceptor cover 15, the plate ring 16, and the ceiling plate 17.

  2 to 6 show a first embodiment of a cleaning apparatus for vapor phase growth apparatus parts according to the present invention. This cleaning apparatus includes a cleaning container 21 having a component housing 21a for housing components for a vapor phase growth apparatus such as the susceptor cover 15, plate ring 16, and ceiling plate 17, and a cleaning furnace 31 housing the cleaning container 21. The cleaning furnace 31 includes a cleaning furnace main body 32 and a cleaning furnace lid member 33 provided below the cleaning furnace main body 32 so as to be movable up and down.

  The cleaning furnace body 32 has a dome portion 32a formed of a material that has corrosion resistance to cleaning gas and reaction products and that allows radiant heat to pass therethrough, for example, quartz glass, and is hermetically attached to the lower opening edge of the dome portion 32a. The first seal member 32b made of metal is formed into a shape having an opening 32c only in the lower part, and the case member 34 provided with a heating means 34a and a heat insulating material 34b is provided around and above the cleaning furnace main body 32. Is covered by. Further, the first seal member 32b is provided with a seal gas supply path 35 for supplying a seal gas, for example, nitrogen gas from the outside, and the inner circumference of the first seal member 32b is along the inner circumference of the dome portion 32a. The second cylindrical seal member 32d is provided upright.

  The cleaning furnace lid member 33 includes a disk-shaped lid body 33a capable of closing the lower opening of the cleaning furnace body 32, and a pedestal portion 33b provided on the lid body 33a and penetrating into the cleaning furnace body 32. have. A gas passage portion 36 formed of a vertical through hole is provided at the center of the lid body 33a and the pedestal portion 33b, and an outer peripheral portion of the upper end of the gas passage portion 36 supports the cleaning container 21. A cleaning container support 37 is provided.

  A cleaning gas supply path 38 for supplying a cleaning gas to the inside of the cleaning container 21 is provided at the center of the gas passage portion 36, and the inside of the gas passage portion 36 around the cleaning gas supply passage 38 is cleaned. It serves as a cleaning exhaust gas discharge path 39 for sucking and discharging the cleaning exhaust gas and the purge gas from the inside of the container 21 and the inside of the cleaning furnace main body 32. An exhaust path 40 equipped with a vacuum pump or the like is connected to a lower portion of the cleaning exhaust gas discharge path 39.

  The cleaning container support 37 has a tubular portion 37a continuous to the upper end of the gas passage portion 36, and a top plate portion 37b that covers the upper portion of the tubular portion 37a. Is provided with a cleaning gas discharge portion 38a of the cleaning gas supply path 38. Further, a plurality of in-furnace exhaust holes 37c communicating with the cleaning exhaust gas discharge path 39 are provided on the peripheral wall of the cylindrical portion 37a, and the cleaning exhaust gas is discharged to the bottom of the peripheral groove formed on the outer peripheral portion of the top plate portion 37b. A plurality of in-container exhaust holes 37d communicating with the path 39 are provided.

  A pair of inner and outer O-rings 42a and 42b are provided on the outer peripheral portion of the lid main body 33a as a flexible sealing material that abuts the first sealing material abutment surface 41 provided on the first sealing member 32b. An abutting portion 33c that abuts the abutting member 43 provided at the upper end of the second seal member 32d is provided at the upper end corner portion of the outer peripheral portion of the pedestal portion 33b.

  Further, the cleaning furnace lid member 33 is provided so as to be vertically movable by a plurality of cleaning furnace lid member elevating means 44 provided around the cleaning furnace lid member 33, and the cleaning furnace lid member 33 is lowered. When the cleaning container 21 is located below the lower end of the first sealing member 32b, the O-rings 42a and 42b contact the first sealing material contact surface 41 when the cleaning container 21 rises. The seal portion is formed so that the contact portion 33c contacts the contact member 43 to form the second seal portion. Since the second seal portion is formed by the solid contact between the contact member 43 and the contact portion 33c made of a solid such as metal, quartz glass, or graphite, the first seal using the O-rings 42a and 42b is used. The sealability is lower than that of the seal part.

  The seal gas supply path 35 supplies the seal gas to the first gas passage 45 between the inner circumference of the first seal member 32b and the outer circumference of the lid body 33a. The seal gas supplied to the first gas passage 45 flows into the lower end of the second gas passage 46 through a slight gap generated in the solid contact portion 45a where solids are in contact with each other, and the second gas passage 46 The internal pressure is maintained at a pressure higher than the operating pressure in the cleaning furnace 31.

  The cleaning container 21 includes a disc-shaped bottom plate 22 placed on the cleaning container support 37, a small-diameter ring-shaped inner peripheral side support member 23 laminated on an inner peripheral portion of the bottom plate 22, and a bottom plate. A large-diameter ring-shaped outer peripheral side support member 24 laminated on the outer peripheral part of 22, a component support tool 25 provided between the inner peripheral side support member 23 and the outer peripheral side support member 24, and an outermost peripheral side support. The cleaning container top plate 26 is mounted on the member 24. As the component support tool 25, one corresponding to the shape and size of the component to be cleaned is appropriately used. A plurality of exhaust holes 22a communicating with the circumferential groove of the in-container exhaust hole 37d are provided on the inner peripheral portion of the bottom plate 22. In addition, a ring-shaped protrusion 22b having an outer diameter larger than the outer diameter of the cleaning container support 37 is formed on the bottom surface of the bottom plate 22, and the top plate portion 37b is provided on the inner periphery of the ring-shaped protrusion 22b. An engagement step portion 22c that engages with and is positioned is provided.

  A plurality of component supports 25 having shapes corresponding to the shapes of the susceptor cover 15 and the plate ring 16 are arranged at predetermined positions on the bottom plate 22 forming the bottom surface of the component storage section at the bottom. The susceptor using the support portion and the support step portion provided on the tool 25, the support step portion provided on the outer periphery of the inner peripheral side support member 23, and the support step portion provided on the inner periphery of the outer peripheral side support member 24 as appropriate. The cover 15 and the plate ring 16 are supported. Further, the ceiling plate 17, which is the largest component, uses a support step portion provided on the outer periphery of the upper end portion of the inner peripheral side support member 23 and a support step portion provided on the inner periphery of the upper end portion of the outer peripheral side support member 24. Supported.

  In the component storage part from the second stage to the upper part, the component support 25 is placed on the upper surface of the ceiling plate 17 stored in the lower component storage part that does not require cleaning. The susceptor cover 15 and the plate ring 16 are supported by 25, the inner peripheral side support member 23, and the outer peripheral side support member 24 in the same manner as described above. Further, the cleaning container top plate 26 mounted on the outermost support member 24 at the uppermost portion covers the entire component storage portion 21a, so that the component storage portion 21a is partitioned from the cleaning furnace 31. Further, groove-like gas passages for circulating the cleaning gas are formed on the component contact surfaces of the inner peripheral side support member 23, the outer peripheral side support member 24, and the component supporter 25, respectively. It is formed so that the cleaning gas and the like can flow through the flow path. Further, the cleaning container top plate 26 mounted on the outermost support member 24 at the uppermost portion covers the entire component storage portion 21a, so that the component storage portion 21a is partitioned from the cleaning furnace 31. By storing each component in this way, it is possible to simultaneously clean a plurality of types of vapor phase growth apparatus components.

  The cleaning gas discharged from the cleaning gas discharge part 38a rises in the gas flow path formed on the inner peripheral side of the inner peripheral side support member 23 to the lower surface of the cleaning container top plate 26, and the groove shape of the component contact surface is formed. While flowing down through the gas flow path to the lower component storage portion 21a in sequence, it comes into contact with reaction products and the like attached to the surface of each component, and reacts with the reaction products and the like attached to each component to remove them. The cleaning exhaust gas after cleaning the components is discharged from the lowermost component housing portion 21a to the cleaning exhaust gas discharge path 39 through the exhaust holes 22a provided in the bottom plate 22 and the in-container exhaust holes 37d.

  Further, the gas in the cleaning furnace 31 is discharged to the cleaning exhaust gas discharge path 39 through the furnace exhaust hole 37c. As a result, the pressure in the cleaning furnace 31 is reduced due to the gas being sucked into the cleaning exhaust gas discharge path 39, so that the contact member 43 and the contact portion 33c are brought into contact with each other by solids. Since the sealing gas in the second gas passage 46 flows into the cleaning furnace 31 through the gap formed in the second sealing portion, the cleaning gas and the cleaning exhaust gas in the component storage portion 21a leak into the cleaning furnace 31. Can also be exhausted together with the seal gas from the in-furnace exhaust hole 37c. Further, since the seal gas is in a state of flowing out from the gap of the second seal portion, the cleaning exhaust gas hardly contacts the second sealing portion, and the cleaning exhaust gas is prevented from flowing into the second gas passage 46. It can be prevented.

  In particular, since the cleaning gas in the component storage portion 21a is exhausted from the exhaust hole 22a of the bottom plate 22, the cleaning gas in the component storage portion 21a hardly leaks into the cleaning furnace 31, and the cleaning exhaust gas is not generated. It is possible to more reliably avoid contact with the second seal portion. Further, since it is only necessary to supply the necessary amount of cleaning gas into the component storage portion 21a, it is possible to reduce the amount of cleaning gas used as compared with the case where the cleaning gas is supplied to the entire cleaning furnace main body 32.

  Therefore, it is possible to reliably prevent the cleaning exhaust gas from reaching the first seal portion located on the gas flow upstream side of the second gas passage 46, and the O-ring formed of a flexible material such as synthetic resin. 42a and 42b are not damaged by the cleaning exhaust gas, and stable sealing performance can be maintained for a long period of time.

  Further, as shown in FIGS. 7 to 15, below the cleaning furnace 31, a cleaning container transfer means 51 for transferring the cleaning container 21 is provided. The cleaning container transfer means 51 includes a pair of guide rails 52, 52 arranged at an interval larger than the maximum diameter of the cleaning furnace lid member 33, and a cleaning container guided by the guide rails 52, 52 so as to be horizontally movable. It has a lateral movement member 53 and a cleaning container support member 54 provided on the cleaning container lateral movement member 53. As shown in FIGS. 7 and 8, the cleaning container lateral movement member 53 is provided on one end side of the guide rails 52, 52 from a standby position that does not affect the lifting and lowering of the cleaning furnace lid member 33, as shown in FIGS. As shown, a transfer position where the cleaning container 21 can be transferred from the cleaning furnace lid member 33 to the cleaning container support member 54, and as shown in FIGS. 12 to 15, the cleaning container 21 can be transferred to the transport carriage 55. It is formed so as to be movable to any other take-out position.

  The cleaning container support member 54 has a thickness that allows it to enter between the upper surface of the pedestal portion 33 b of the cleaning furnace lid member 33 and the lower surface of the bottom plate 22 of the cleaning container 21, and the center of the cleaning container support member 54. The portion is provided with a stepped support portion 56 that is U-shaped in plan view and is open in the direction of the extraction position. The opening width of the stepped support portion 56 is formed larger than the outer diameter of the cleaning container support 37, and the ring-shaped protrusion protruding from the lower surface of the bottom plate 22 is formed on the upward stepped portion 56a of the stepped support portion 56. 22b is formed so as to be positioned and placed. In addition, a fork portion 57 having a shape capable of transferring the cleaning container 21 to and from the cleaning container support member 54 is provided on the upper portion of the carriage 55 at the take-out position.

  After cleaning the components for the vapor phase growth apparatus, the cleaning container 21 first moves the cleaning furnace lid member 33 to a preset position by operating the cleaning furnace lid member elevating means 44, and then moves laterally in the cleaning container. The member 53 is moved from the standby position to the transfer position, and the cleaning container support 37 is moved into the stepped support 56. In this state, by further lowering the cleaning furnace lid member 33 by the cleaning furnace lid member elevating means 44, the cleaning container 21 is transferred from the cleaning furnace lid member 33 to the cleaning container support member 54. After the cleaning furnace lid member 33 is sufficiently lowered, the cleaning container lateral movement member 53 is moved to the extraction position, the fork portion 57 of the carriage 55 is inserted below the cleaning container 21, and the cleaning container 21 is moved by the fork portion 57. After that, the cleaning container lateral movement member 53 is moved to the standby position. As a result, the cleaning container 21 containing the components for the vapor phase growth apparatus that have been cleaned can be moved to an appropriate position by the carriage 55, and can be assembled into the vapor phase growth apparatus. In addition, by performing this procedure in reverse, the components for the vapor phase growth apparatus, which are detached from the vapor phase growth apparatus and stored in the cleaning container 21, can be carried into the cleaning furnace 31.

  FIG. 16 shows a second embodiment of the cleaning apparatus for vapor phase growth apparatus parts of the present invention. In the following description, the same components as those of the cleaning apparatus for a vapor phase growth apparatus component shown in the first embodiment will be designated by the same reference numerals, and detailed description thereof will be omitted.

  In the cleaning container 71 in the cleaning apparatus shown in the present embodiment, the inner peripheral side support member 73 laminated on the inner peripheral portion of the bottom plate 72 is provided with the cleaning gas introduction hole 73a in the radial direction, and is laminated on the outer peripheral portion of the bottom plate 72. A cleaning exhaust gas lead-out hole 74a is provided in the outer peripheral side support member 74. As shown by the arrow in FIG. 7, the cleaning gas flowing from the cleaning gas discharge part 38 a into the inner peripheral side of the inner peripheral side supporting member 73 passes through the cleaning gas introducing hole 73 a of the inner peripheral side supporting member 73 and the component housing part. 21a respectively flows into each stage. The cleaning exhaust gas in the component housing portion 21a after reacting with the reaction products and the like attached to each component and removing them, flows out of the cleaning container 71 through the cleaning exhaust gas lead-out hole 74a of the outer peripheral side support member 74. Then, the gas is discharged from the cleaning furnace 31 into the cleaning exhaust gas discharge path 39 through the furnace exhaust hole 37c together with the seal gas. As described above, even when the cleaning container 71 having a structure in which the cleaning gas is discharged from the cleaning container 71 into the cleaning furnace main body 32, the cleaning exhaust gas is reliably prevented from reaching the second sealing part from the first sealing part. can do.

  Further, the installation position of each component in the cleaning device is close to the position in the vapor phase growth device, and the gas flow is also simulated. Therefore, a large amount of the cleaning gas is applied to a portion having a large amount of the adhered matter, and the cleaning can be performed efficiently evenly. Further, by increasing / decreasing the outer peripheral and inner peripheral supporting members in accordance with the number of parts to be cleaned at that time, the cleaning can be always performed under the same gas flow condition, and therefore uniform and efficient cleaning can be performed. Furthermore, it is possible to prevent the reaction products, which are difficult to process, such as gallium chloride from diffusing into the peripheral portion of the furnace, and to discharge the reaction product to the subsequent collector while maintaining the temperature above the boiling point.

  Further, the reaction product attached to each component is gallium nitride, and when this is cleaned with chlorine, gallium chloride is generated as a cleaning reaction product. It has a boiling point of 201 ° C. and precipitates when there is a low temperature place such as in a furnace. Although it vaporizes even at low temperature if the pressure is reduced, it has deliquescent properties, so if the cleaning furnace is opened while it adheres, it reacts with moisture in the atmosphere to generate hydrogen chloride. Hydrogen chloride further reacts with water to become hydrochloric acid, which corrodes the metal parts of the cleaning furnace. Furthermore, the deliquescent deposits do not evaporate even when heated to 200 ° C., and therefore remain in the furnace, damaging the O-ring and hindering the sealing of the furnace. A complicated mechanism such as a beater mechanism is required to guide gallium chloride to the downstream collector so as not to be exposed to the atmosphere. Therefore, by heating the inside of the cleaning furnace to a temperature equal to or higher than the boiling point, it is possible to prevent gallium chloride generated during cleaning from being deposited. In addition, by forming the second seal portion, which is in contact with the gas in the furnace, with metal, quartz glass, graphite or the like, particularly graphite having high heat conductivity, the second seal portion can have the boiling point or higher. Therefore, a substance having a high vapor pressure such as gallium chloride will not be deposited on the second seal portion. In addition, by forming the dome portion of the main body of the cleaning furnace with quartz glass that transmits radiant heat, the inside of the cleaning furnace can be effectively heated, and the temperature of the constituent members in the lower layer rises. It is possible to reliably remove high substances.

  DESCRIPTION OF SYMBOLS 11 ... Substrate, 12 ... Susceptor, 13 ... Heating means, 14 ... Gas supply part, 15 ... Susceptor cover, 16 ... Plate ring, 17 ... Ceiling plate, 21 ... Cleaning container, 21a ... Component storage part, 22 ... Bottom plate, 22a ... Exhaust hole, 22b ... Ring-shaped protrusion, 22c ... Engaging step, 23 ... Inner peripheral side supporting member, 24 ... Outer peripheral side supporting member, 25 ... Component support, 26 ... Cleaning container top plate, 31 ... Cleaning furnace , 32 ... Cleaning furnace body, 32a ... Dome portion, 32b ... First sealing member, 32c ... Opening portion, 32d ... Second sealing member, 33 ... Cleaning furnace lid member, 33a ... Lid body, 33b ... Pedestal portion, 33c ... Abutting part, 34 ... Case member, 34a ... Heating means, 34b ... Insulating material, 35 ... Seal gas supply path, 36 ... Gas passage part, 37 ... Cleaning container support, 37a ... Cylindrical part, 37b ... Top plate part , 37c ... Exhaust hole in furnace, 37d Exhaust hole in container, 38 ... Cleaning gas supply path, 38a ... Cleaning gas discharge part, 39 ... Cleaning exhaust gas discharge path, 40 ... Exhaust path, 41 ... First seal member contacting surface, 42a, 42b ... O ring, 43 ... Abutting member, 44 ... Cleaning furnace lid member raising / lowering means, 45 ... First gas passage, 45a ... Solid contact portion, 46 ... Second gas passage, 51 ... Cleaning container conveying means, 52 ... Guide rail, 53 ... Cleaning container Lateral movement member, 54 ... Washing container support member, 55 ... Carrier, 56 ... Stepped support part, 56a ... Upward step part, 57 ... Fork part, 71 ... Washing container, 72 ... Bottom plate, 73 ... Inner peripheral side support member , 73a ... Cleaning gas introduction hole, 74 ... Outer peripheral side support member, 74a ... Cleaning exhaust gas discharge hole

Claims (4)

  A cleaning furnace main body having an opening only in the lower side, a cleaning furnace lid member provided below the cleaning furnace main body so as to be able to move up and down, and a cleaning gas supply path provided through the central portion of the cleaning furnace lid member. And a cleaning exhaust gas discharge path, and a cleaning container detachably mounted on the cleaning furnace lid member, the cleaning container being attached to and detached from a cleaning container support provided on the cleaning furnace lid member. A disk-shaped bottom plate that can be mounted, a small-diameter ring-shaped inner peripheral side support member that is mounted on the inner peripheral part of the bottom plate, and a large-diameter ring-shaped outer peripheral side support that is laminated on the outer peripheral part of the bottom plate. A member, a component supporter provided between the inner peripheral side supporting member and the outer peripheral side supporting member, and a cleaning container top plate mounted on the outer peripheral side supporting member located at the uppermost stage, Position the vertically adjacent inner peripheral side support members on the inner peripheral side lower part and the inner peripheral side upper part of the side support member. And an outer peripheral side concave-convex engaging portion for positioning vertically adjacent outer peripheral side supporting members on the outer peripheral side lower portion and the outer peripheral side upper portion of the outer peripheral side supporting member. The outer peripheral side of the inner peripheral side supporting member and the inner peripheral side of the outer peripheral side supporting member, between the inner peripheral side supporting member and the outer peripheral side supporting member, or the inner peripheral side supporting member or the outer peripheral side supporting member. A component mounting portion for mounting a component for vapor phase growth apparatus is provided between the component support and the inner peripheral side of the inner peripheral side support member, and an opening provided in the central portion of the bottom plate. A cleaning gas flow path communicating with the cleaning gas supply path is provided, and an exhaust hole communicating with the cleaning exhaust gas discharge path is provided in the innermost portion of the bottom plate on the outer peripheral side of the inner peripheral side support member, and at the uppermost stage. Between the inner support member located and the cleaning container top plate, and the component mounting portion To the lower surface of said vapor deposition apparatus parts for cleaning apparatus vapor deposition apparatus parts for being characterized in that formed the gas flow path, respectively.   A cleaning furnace main body having an opening only in the lower side, a cleaning furnace lid member provided below the cleaning furnace main body so as to be able to move up and down, and a cleaning gas supply path provided through the central portion of the cleaning furnace lid member. And a cleaning exhaust gas discharge path, and a cleaning container detachably mounted on the cleaning furnace lid member, the cleaning container being attached to and detached from a cleaning container support provided on the cleaning furnace lid member. A disk-shaped bottom plate that can be mounted, a small-diameter ring-shaped inner peripheral side support member that is mounted on the inner peripheral part of the bottom plate, and a large-diameter ring-shaped outer peripheral side support that is laminated on the outer peripheral part of the bottom plate. A member, a component supporter provided between the inner peripheral side supporting member and the outer peripheral side supporting member, and a cleaning container top plate mounted on the outer peripheral side supporting member located at the uppermost stage, Position the vertically adjacent inner peripheral side support members on the inner peripheral side lower part and the inner peripheral side upper part of the side support member. And an outer peripheral side concave-convex engaging portion for positioning vertically adjacent outer peripheral side supporting members on the outer peripheral side lower portion and the outer peripheral side upper portion of the outer peripheral side supporting member. The outer peripheral side of the inner peripheral side supporting member and the inner peripheral side of the outer peripheral side supporting member, between the inner peripheral side supporting member and the outer peripheral side supporting member, or the inner peripheral side supporting member or the outer peripheral side supporting member. A component mounting portion for mounting a component for vapor phase growth apparatus is provided between the component support and the inner peripheral side of the inner peripheral side support member, and an opening provided in the central portion of the bottom plate. A cleaning gas flow path communicating with the cleaning gas supply path is provided, and an inner peripheral side support member is provided with a cleaning gas flow path that circulates the cleaning gas flow path and the outer peripheral side of the inner peripheral side support member, Circulates to the outer peripheral side support member between the inner peripheral side of the outer peripheral side support member and the outer side of the cleaning container. The washed exhaust gas channel provided for the cleaning exhaust gas discharge path, the cleaning container external side of the gas cleaning device the gas phase growth apparatus parts for which characterized in that it is arranged to be discharged aspirated.   Cleaning furnace lid member elevating means for raising and lowering the cleaning furnace lid member to a raised position for closing the opening of the cleaning furnace body and a lowered position for positioning the cleaning container below the opening of the cleaning furnace body. The apparatus for cleaning a component for a vapor phase growth apparatus according to claim 1 or 2, further comprising:   Cleaning container transfer means for transferring the cleaning container placed on the cleaning furnace cover member lowered to the descending position from the cleaning furnace cover member and transferring the cleaning container to a side position of the cleaning furnace cover member The cleaning apparatus for parts for a vapor phase growth apparatus according to claim 3.

Images