JP6642309B2 - Organosilicon compound and surface treatment composition - Google Patents

Organosilicon compound and surface treatment composition Download PDF

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JP6642309B2
JP6642309B2 JP2016133567A JP2016133567A JP6642309B2 JP 6642309 B2 JP6642309 B2 JP 6642309B2 JP 2016133567 A JP2016133567 A JP 2016133567A JP 2016133567 A JP2016133567 A JP 2016133567A JP 6642309 B2 JP6642309 B2 JP 6642309B2
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正博 雨宮
正博 雨宮
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Shin Etsu Chemical Co Ltd
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    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • C07F7/1872Preparation; Treatments not provided for in C07F7/20
    • C07F7/1892Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
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    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
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    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

Description

本発明は、有機ケイ素化合物および表面処理剤組成物に関し、さらに詳述すると、加熱することなく室温で硬化して、撥水性、滑水性(水滴の落下性)、および耐久性に優れた撥水膜を与える有機ケイ素化合物およびそれを用いた表面処理剤組成物、並びに当該組成物による表面処理にて形成された撥水膜付き基材、および当該組成物を用いた撥水膜の形成方法に関する。   TECHNICAL FIELD The present invention relates to an organosilicon compound and a surface treating agent composition, and more particularly to a water-repellent material which cures at room temperature without heating and has excellent water repellency, water-sliding property (dropping property of water droplets), and durability. The present invention relates to an organosilicon compound that gives a film, a surface treatment agent composition using the same, a substrate with a water-repellent film formed by surface treatment with the composition, and a method for forming a water-repellent film using the composition. .

従来、ガラスの撥水処理剤として、フルオロアルキルシランやアミノ変性ポリシロキサンを配合した撥水剤組成物が提案されている(特許文献1〜6参照)。
これら各特許文献に開示された撥水剤組成物から作製された撥水膜は、撥水性には優れるものの、膜表面における水滴の滑水性が不十分である。
したがって、当該撥水膜を自動車のウィンドウガラスに適用する場合には、降雨時における良好な視界を確保するため、さらなる滑水性の改善が求められる。
Conventionally, as a water repellent for glass, a water repellent composition containing a fluoroalkylsilane or an amino-modified polysiloxane has been proposed (see Patent Documents 1 to 6).
The water-repellent films produced from the water-repellent compositions disclosed in these patent documents are excellent in water repellency, but have insufficient water-sliding properties of water droplets on the film surface.
Therefore, when the water-repellent film is applied to a window glass of an automobile, further improvement in water slippage is required in order to secure a good visibility during rainfall.

この点、良好な撥水性と滑水性とを兼ね備えた撥水塗膜を与える組成物として、特許文献7には、直鎖片末端官能性ポリジメチルシロキサン化合物とシランカップリング剤とを含む組成物が提案されている。
しかし、特許文献7の組成物から形成された撥水膜は、耐久性が十分でないという問題があり、耐水性や耐摩耗性を十分に発現させることができず、また長期にわたり撥水性を維持することが困難であった。
In this regard, Patent Document 7 discloses a composition containing a linear one-terminal functional polydimethylsiloxane compound and a silane coupling agent as a composition for providing a water-repellent coating film having both good water repellency and good water repellency. Has been proposed.
However, the water-repellent film formed from the composition of Patent Document 7 has a problem that the durability is not sufficient, it is not possible to sufficiently exhibit water resistance and abrasion resistance, and the water-repellent film is maintained for a long time. It was difficult to do.

特開2012−224668号公報JP 2012-224668 A 特開2009−137775号公報JP 2009-137775 A 特開2009−173491号公報JP 2009-173491 A 特開平10−102046号公報JP-A-10-102046 特開2003−160361号公報JP 2003-160361 A 特開平09−176622号公報JP-A-09-176622 特開平11−315276号公報JP-A-11-315276

本発明は、上記事情に鑑みなされたもので、撥水性、滑水性および耐久性に優れる皮膜を形成しうる有機ケイ素化合物およびそれを含む表面処理剤組成物、並びに当該組成物による表面処理にて形成された撥水膜付き基材および当該組成物を用いた撥水膜の形成方法を提供することを目的とする。   The present invention has been made in view of the above circumstances, an organic silicon compound capable of forming a film having excellent water repellency, water slippage and durability, and a surface treating agent composition containing the same, and surface treatment with the composition. An object of the present invention is to provide a formed substrate having a water-repellent film and a method for forming a water-repellent film using the composition.

本発明者は、上記課題を解決すべく鋭意検討した結果、特定の連結基、加水分解性基、およびシロキシ基を有する有機ケイ素化合物を含む組成物が、加熱することなく室温で硬化して、撥水性、滑水性および耐久性に優れる皮膜を与えることを見出し、本発明を完成した。   The present inventor has conducted intensive studies to solve the above problems, and as a result, a composition containing a specific linking group, a hydrolyzable group, and an organosilicon compound having a siloxy group, is cured at room temperature without heating, The present inventors have found that a film having excellent water repellency, water slip and durability can be provided, and have completed the present invention.

すなわち、本発明は、
1. 一般式(1)で表されることを特徴とする有機ケイ素化合物、

Figure 0006642309
{式中、R1は、互いに独立して、炭素原子数1〜12のアルキル基または式(2)で表される基を表し、
Figure 0006642309
〔式中、R4は、互いに独立して、炭素原子数1〜12のアルキル基または式(3)で表される基を表す。
Figure 0006642309
(式中、R5は、互いに独立して炭素原子数1〜12のアルキル基を表す。)〕
2は、互いに独立して炭素原子数1〜12のアルキル基を表し、R3は、互いに独立して炭素原子数1〜4のアルキル基を表し、Xは、互いに独立してヒドロキシ基または加水分解性基を表し、Yは、アリーレン基またはフッ化アルキレン基を含有する2価連結基を表し、aは、1〜100の数を表し、bは、0〜2の数を表す。}
2. 前記Yが、式(4)で表される2価連結基である1の有機ケイ素化合物、
Figure 0006642309
〔式中、Zは、式(5)〜(7)から選ばれるいずれか1つの2価連結基を表し、R6およびR7は、互いに独立して、単結合またはZと異なる2価連結基を表す。
Figure 0006642309
(式(5)中、cは、1〜10の数を表し、式(7)中、R8は、互いに独立して炭素原子数1〜12のアルキル基を表す。)〕
3. 式(8)または式(9)で表される2の有機ケイ素化合物、
Figure 0006642309
〔式中、Zは、式(5)〜(7)から選ばれるいずれか1つの2価連結基を表し、R3、R6、R7、X、aおよびbは、前記と同じ意味を表す。
Figure 0006642309
(式(5)中、cは、前記と同じ意味を表し、式(7)中、R8は、メチル基を表す。)〕
4. 前記R6およびR7が、互いに独立して式(10)で表される2または3の有機ケイ素化合物、
Figure 0006642309
(式中、dは、0〜10の数を表す。)
5. 前記Xが、ヒドロキシ基、アルコキシ基、ハロゲン原子またはイソシアネート基である1〜4のいずれかの有機ケイ素化合物、
6. 1〜5のいずれかの有機ケイ素化合物の加水分解縮合物、
7. 1〜5のいずれかの有機ケイ素化合物、その加水分解縮合物、またはそれらの混合物と、有機溶剤とを含む表面処理剤組成物、
8. メタンスルホン酸、p−トルエンスルホン酸および硫酸から選ばれる少なくとも1種の加水分解触媒を含有する7の表面処理剤組成物、
9. 1〜5のいずれかの有機ケイ素化合物以外の、その他の加水分解性基を有する有機ケイ素化合物、その加水分解縮合物、またはそれらの混合物を含有する7または8の表面処理剤組成物、
10. 輸送機用ガラスの撥水処理用である7〜9のいずれかの表面処理剤組成物、
11. 輸送機用ボディーの撥水処理用である7〜9のいずれかの表面処理剤組成物、
12. 基材と、この基材上に設けられた、7〜9のいずれかの表面処理剤組成物を用いてなる撥水膜とを有する撥水膜付き基材、
13. 前記基材と撥水膜との間に介在する下地層を備え、前記下地層が、1〜5のいずれかの有機ケイ素化合物以外の、その他の加水分解性基を有する有機ケイ素化合物の加水分解生成物からなる11の撥水膜付き基材、
14. 前記基材が、ガラス、金属、セラミックまたは樹脂である12または13の撥水膜付き基材、
15. 基材上に、7〜9のいずれかの表面処理剤組成物を塗布して塗膜を形成し、この塗膜表面を水で拭き上げ処理した後、5〜35℃で硬化皮膜を形成する撥水膜の形成方法
を提供する。 That is, the present invention
1. An organosilicon compound represented by the general formula (1),
Figure 0006642309
In the formula, R 1 independently represents an alkyl group having 1 to 12 carbon atoms or a group represented by the formula (2),
Figure 0006642309
[In the formula, R 4 independently represents an alkyl group having 1 to 12 carbon atoms or a group represented by the formula (3).
Figure 0006642309
(In the formula, R 5 independently represents an alkyl group having 1 to 12 carbon atoms.)]
R 2 independently represents an alkyl group having 1 to 12 carbon atoms, R 3 independently represents an alkyl group having 1 to 4 carbon atoms, X represents a hydroxy group or Represents a hydrolyzable group, Y represents a divalent linking group containing an arylene group or a fluorinated alkylene group, a represents a number of 1 to 100, and b represents a number of 0 to 2. }
2. 1 is an organosilicon compound in which Y is a divalent linking group represented by the formula (4),
Figure 0006642309
[In the formula, Z represents any one divalent linking group selected from formulas (5) to (7), and R 6 and R 7 are each independently a single bond or a divalent link different from Z. Represents a group.
Figure 0006642309
(In the formula (5), c represents a number of 1 to 10, and in the formula (7), R 8 independently represents an alkyl group having 1 to 12 carbon atoms.)]
3. 2 organosilicon compounds represented by the formula (8) or the formula (9),
Figure 0006642309
[Wherein, Z represents any one divalent linking group selected from the formulas (5) to (7), and R 3 , R 6 , R 7 , X, a and b have the same meanings as described above. Represent.
Figure 0006642309
(In the formula (5), c has the same meaning as described above, and in the formula (7), R 8 represents a methyl group.)
4. R 6 and R 7 independently of one another, 2 or 3 organosilicon compounds represented by formula (10):
Figure 0006642309
(In the formula, d represents a number from 0 to 10.)
5. Wherein X is a hydroxy group, an alkoxy group, a halogen atom or an isocyanate group;
6. A hydrolyzed condensate of the organosilicon compound of any of 1 to 5,
7. A surface treatment agent composition comprising any one of the organosilicon compounds of 1 to 5, a hydrolyzed condensate thereof, or a mixture thereof, and an organic solvent;
8. 7, a surface treating agent composition containing at least one hydrolysis catalyst selected from methanesulfonic acid, p-toluenesulfonic acid and sulfuric acid,
9. Other than the organosilicon compound of any one of 1 to 5, an organosilicon compound having another hydrolyzable group, a hydrolysis condensate thereof, or a surface treatment agent composition of 7 or 8 containing a mixture thereof,
10. The surface treatment agent composition according to any one of 7 to 9, which is for water-repellent treatment of glass for a transport machine,
11. The surface treatment agent composition according to any one of 7 to 9, which is for water-repellent treatment of a body for a transport machine,
12. A substrate having a water-repellent film, comprising: a substrate;
13. An underlayer interposed between the base material and the water-repellent film, wherein the underlayer is a compound other than the organosilicon compound of any of 1 to 5, and hydrolyzes an organosilicon compound having another hydrolyzable group. 11 substrates with a water-repellent film comprising a product,
14. The substrate is a substrate with a water-repellent film of 12 or 13, which is glass, metal, ceramic or resin,
15. A coating film is formed by applying any one of the surface treatment agent compositions 7 to 9 on a substrate, and after wiping the surface of the coating film with water, a cured film is formed at 5 to 35 ° C. Provided is a method for forming a water-repellent film.

本発明によれば、室温硬化が可能で、撥水性、滑水性および耐久性に優れる皮膜を形成しうる有機ケイ素化合物およびこれを含む表面処理剤組成物を提供することができる。
本発明の表面処理剤組成物を用いることで、撥水性、滑水性および耐久性に優れる撥水膜付き基材を簡便な方法で作製することができる。
特に、車両用、船舶用および航空機用のウィンドウガラスやミラー等として用いられる透明基材に本発明の撥水膜を適用することで、優れた撥水性および滑水性を付与することができる結果、降雨時にも良好な視界を確保することができるようになる。
ADVANTAGE OF THE INVENTION According to this invention, the organosilicon compound which can be hardened | cured at room temperature, and can form a film excellent in water repellency, water lubricity and durability, and a surface treating agent composition containing the same can be provided.
By using the surface treatment agent composition of the present invention, a substrate with a water-repellent film having excellent water repellency, water slippage and durability can be produced by a simple method.
In particular, by applying the water-repellent film of the present invention to a transparent substrate used as a window glass, a mirror, or the like for vehicles, ships, and aircraft, it is possible to impart excellent water repellency and water slip, Good visibility can be ensured even during rainfall.

以下、本発明について具体的に説明する。
本発明に係る有機ケイ素化合物は、式(1)で表される。
Hereinafter, the present invention will be described specifically.
The organosilicon compound according to the present invention is represented by the formula (1).

Figure 0006642309
Figure 0006642309

式(1)において、R1は、互いに独立して、炭素原子数1〜12のアルキル基または式(2)で表される基を表し、R2は、互いに独立して炭素原子数1〜12のアルキル基を表し、R3は、互いに独立して炭素原子数1〜4のアルキル基を表す。
また、aは、1〜100の数であるが、硬化皮膜の滑水性向上の観点より、aは5〜50の数が好ましい。なお、aが100を超えると、得られる硬化皮膜の耐久性が低下する。
bは、0〜2の数であるが、0または1が好ましく、0がより好ましい。なお、bが2を超えると、得られる硬化皮膜の耐久性が不十分となる。
In the formula (1), R 1 independently represents an alkyl group having 1 to 12 carbon atoms or a group represented by the formula (2), and R 2 independently represents a C 1 to C 1 atom. 12 represents an alkyl group, and R 3 independently represents an alkyl group having 1 to 4 carbon atoms.
A is a number of 1 to 100, and a is preferably a number of 5 to 50 from the viewpoint of improving the lubricity of the cured film. When a exceeds 100, the durability of the obtained cured film decreases.
b is a number of 0 to 2, preferably 0 or 1, and more preferably 0. When b exceeds 2, the durability of the obtained cured film becomes insufficient.

Figure 0006642309
(R4は、互いに独立して、炭素原子数1〜12のアルキル基または式(3)で表される基を表す。)
Figure 0006642309
(R 4 independently represents an alkyl group having 1 to 12 carbon atoms or a group represented by the formula (3).)

Figure 0006642309
(R5は、互いに独立して炭素原子数1〜12のアルキル基を表す。)
Figure 0006642309
(R 5 independently represents an alkyl group having 1 to 12 carbon atoms.)

上記R1、R2、R4およびR5における炭素原子数1〜12のアルキル基としては、直鎖状、環状、分枝状のいずれでもよく、その具体例としては、メチル、エチル、n−プロピル、i−プロピル、n−ブチル、s−ブチル、t−ブチル、n−ペンチル、n−ヘキシル、n−ヘプチル、n−オクチル、n−ノニル、n−デシル、n−ウンデシル、n−ドデシル、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシル、シクロヘプチル、シクロオクチル基等が挙げられる。
上記R3における炭素原子数1〜4のアルキル基としては、直鎖状、環状、分枝状のいずれでもよく、その具体例としては、メチル、エチル、n−プロピル、i−プロピル、n−ブチル、s−ブチル、t−ブチル、シクロプロピル、シクロブチル基等が挙げられる。
The alkyl group having 1 to 12 carbon atoms in R 1 , R 2 , R 4 and R 5 may be linear, cyclic, or branched, and specific examples thereof include methyl, ethyl, n -Propyl, i-propyl, n-butyl, s-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl , Cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl and the like.
The alkyl group having 1 to 4 carbon atoms in R 3 may be linear, cyclic, or branched, and specific examples thereof include methyl, ethyl, n-propyl, i-propyl, n- Butyl, s-butyl, t-butyl, cyclopropyl, cyclobutyl and the like.

本発明において、上記R1、R2、R4およびR5としては、撥水性、滑水性および原料入手の容易さの観点から、炭素原子数が8以下のアルキル基が好ましく、特にメチル基が好ましい。なお、これらの炭素原子数が12を超えると、撥水性および滑水性が低下することがある。
また、R3は、メチル、エチル基が好ましく、特にメチル基が好ましい。
In the present invention, the above R 1 , R 2 , R 4 and R 5 are preferably an alkyl group having 8 or less carbon atoms, particularly preferably a methyl group, from the viewpoints of water repellency, water slippage and availability of raw materials. preferable. If the number of these carbon atoms exceeds 12, the water repellency and the water slippage may decrease.
R 3 is preferably a methyl or ethyl group, particularly preferably a methyl group.

Xは、互いに独立してヒドロキシ基または加水分解性基を表し、Xが、加水分解性基の場合、本発明の有機ケイ素化合物は、分子末端のSi原子に結合した加水分解性基が加水分解することで形成されるシラノール基(≡Si−OH)により、耐久性のある皮膜を形成する。
このような加水分解性基の具体例としては、メトキシ、エトキシ、n−プロポキシ、n−ブトキシ基等のアルコキシ基、塩素原子等のハロゲン原子、イソシアネート基等が挙げられるが、これらの中でも、特にメトキシ基、塩素原子が好ましい。
X represents a hydroxy group or a hydrolyzable group independently of each other, and when X is a hydrolyzable group, the organosilicon compound of the present invention has a hydrolyzable group bonded to a Si atom at a molecular terminal. A durable film is formed by the silanol group (≡Si—OH) formed by the heat treatment.
Specific examples of such a hydrolyzable group include methoxy, ethoxy, n-propoxy, an alkoxy group such as n-butoxy group, a halogen atom such as a chlorine atom, and an isocyanate group. A methoxy group and a chlorine atom are preferred.

Yは、得られる塗膜における分子の配向性を向上させ、硬化皮膜の緻密化、均一化を促進させるための基であり、特に、π−πスタックや水素結合等による相互作用性のある官能基や、剛直構造をとる原子団を含有する2価連結基が好適に使用できる。これらの2価連結基を分子内の特定位置に導入することにより、硬化皮膜の撥水性および滑水性を良好に維持しつつ、かつ耐久性を向上させることができる。
本発明では、このような2価連結基として、アリーレン基またはフッ化アルキレン基を含有する2価連結基を採用する。
Y is a group for improving the orientation of molecules in the obtained coating film, and for promoting the densification and uniformity of the cured film, and particularly, a functional group having an interactive property such as a π-π stack or a hydrogen bond. A divalent linking group containing a group or an atomic group having a rigid structure can be suitably used. By introducing these divalent linking groups at specific positions in the molecule, the durability of the cured film can be improved while maintaining good water repellency and water slippage.
In the present invention, a divalent linking group containing an arylene group or a fluorinated alkylene group is employed as such a divalent linking group.

アリーレン基の具体例としては、フェニレン、ビフェニレン、ナフチレン基等が挙げられる。
フッ化アルキレン基の具体例としては、−(CHF)c−、−(CF2c−(cは、1〜100の数を表す。)等が挙げられる。
Specific examples of the arylene group include a phenylene, biphenylene, and naphthylene group.
Specific examples of the fluorinated alkylene group include-(CHF) c -,-(CF 2 ) c- (c represents a number of 1 to 100), and the like.

本発明において、皮膜中の分子の配向性をより高め、硬化皮膜の緻密化、均一化をより一層促進させることを考慮すると、上記Yとしては、特に、式(4)で表される2価連結基が好適である。   In the present invention, considering that the orientation of the molecules in the film is further increased and the densification and uniformity of the cured film are further promoted, the above-mentioned Y is particularly a divalent compound represented by the formula (4). Linking groups are preferred.

Figure 0006642309
Figure 0006642309

ここで、Zは、式(5)〜(7)から選ばれるいずれか1つの2価連結基を表し、基材上での分子の配向性を向上させ、硬化皮膜の緻密化、均一化を促進させる基である。これらの連結基を分子内の特定位置に導入することにより、硬化皮膜の撥水性および滑水性を良好に維持しつつ、かつ耐久性を向上できる。
中でも、式(5)で表されるパーフルオロアルキレン基が好ましい。式(5)において、cは1〜10の数であるが、1〜8が好ましく、1〜6がより好ましい。
また、式(7)における、R8の炭素原子数1〜12のアルキル基としては、上記と同様のものが挙げられるが、特にメチル基が好ましい。
Here, Z represents any one divalent linking group selected from the formulas (5) to (7), improves the orientation of molecules on the substrate, and makes the cured film dense and uniform. It is a group that promotes. By introducing these linking groups at specific positions in the molecule, the durability can be improved while maintaining the water repellency and the lubricity of the cured film satisfactorily.
Among them, a perfluoroalkylene group represented by the formula (5) is preferable. In the formula (5), c is a number of 1 to 10, preferably 1 to 8, and more preferably 1 to 6.
In the formula (7), examples of the alkyl group having 1 to 12 carbon atoms of R 8 include the same as described above, and a methyl group is particularly preferable.

Figure 0006642309
(式(7)中、R8は、互いに独立して炭素原子数1〜12のアルキル基を表し、cは、1〜10の数を表す。)
Figure 0006642309
(In the formula (7), R 8 independently represents an alkyl group having 1 to 12 carbon atoms, and c represents a number of 1 to 10.)

6およびR7は、互いに独立して、単結合またはZと異なる2価連結基を表し、このような2価連結基としては、上述したZと異なるものであれば特に限定されるものではなく、その具体例としては、エーテル結合(−O−)、チオエーテル結合(−S−)、イミノ基(−NH−)等のヘテロ原子を介在してもよいアルキレン基などが挙げられる。
これらの中でも、R6およびR7としては、共に式(10)で表される基が好適である。
式(10)において、dは、0〜10の数であるが、0〜5が好ましく、0〜3がより好ましく、1〜3がより一層好ましく、上記有機ケイ素化合物の製造の容易性および入手の安価性を考慮すると、エチレン、トリメチレン基が好適である。
R 6 and R 7 independently represent a single bond or a divalent linking group different from Z, and such a divalent linking group is not particularly limited as long as it is different from Z described above. However, specific examples thereof include an alkylene group which may include a hetero atom such as an ether bond (-O-), a thioether bond (-S-), and an imino group (-NH-).
Among these, a group represented by the formula (10) is preferable as R 6 and R 7 .
In the formula (10), d is a number from 0 to 10, preferably from 0 to 5, more preferably from 0 to 3, and still more preferably from 1 to 3. Ease of production and availability of the organosilicon compound Considering the low cost of ethylene, ethylene and trimethylene groups are preferred.

Figure 0006642309
(式中、dは、0〜10の数を表す。)
Figure 0006642309
(In the formula, d represents a number from 0 to 10.)

したがって、本発明の有機ケイ素化合物は、一般式(1′)で表されるものが好ましく、式(8)、(9)および(11)で表されるものがより好ましい。   Therefore, the organosilicon compound of the present invention is preferably represented by the general formula (1 ′), and more preferably represented by the formulas (8), (9) and (11).

Figure 0006642309
(式中、R1〜R3、R6、R7、X、Z、aおよびbは、上記と同じ意味を表す。)
Figure 0006642309
(In the formula, R 1 to R 3 , R 6 , R 7 , X, Z, a and b represent the same meaning as described above.)

Figure 0006642309
Figure 0006642309

式中、Zは、式(5)〜(7)から選ばれるいずれか1つの2価連結基を表し、R3、R6、R7、X、aおよびbは、上記と同じ意味を表す。 In the formula, Z represents any one divalent linking group selected from the formulas (5) to (7), and R 3 , R 6 , R 7 , X, a and b represent the same meaning as described above. .

Figure 0006642309
(式(5)中、cは、上記と同じ意味を表し、式(7)中、R8は、メチル基を表す。)〕
Figure 0006642309
(In the formula (5), c represents the same meaning as described above, and in the formula (7), R 8 represents a methyl group.)]

好適な有機ケイ素化合物として、例えば、以下のような化合物が挙げられるが、これらに限定されるものではない。   Suitable organosilicon compounds include, for example, the following compounds, but are not limited thereto.

Figure 0006642309
Figure 0006642309

本発明の有機ケイ素化合物は、公知の方法で合成することができる。例えば、上記式(1′)で表される有機ケイ素化合物は、下記スキーム(A),(B)に示されるように、公知のヒドロシリル化反応によって合成することができる。   The organosilicon compound of the present invention can be synthesized by a known method. For example, the organosilicon compound represented by the above formula (1 ') can be synthesized by a known hydrosilylation reaction as shown in the following schemes (A) and (B).

Figure 0006642309
Figure 0006642309

上記ヒドロシリル化反応に用いられる白金化合物含有触媒としては、特に限定されるものではなく、その具体例としては、塩化白金酸、塩化白金酸のアルコール溶液、白金−1,3−ジビニル−1,1,3,3−テトラメチルジシロキサン錯体のトルエンまたはキシレン溶液、テトラキストリフェニルホスフィン白金、ジクロロビストリフェニルホスフィン白金、ジクロロビスアセトニトリル白金、ジクロロビスベンゾニトリル白金、ジクロロシクロオクタジエン白金等や、白金−炭素、白金−アルミナ、白金−シリカ等の担持触媒などが挙げられる。
ヒドロシリル化の際の選択性の面から、0価の白金錯体が好ましく、白金−1,3−ジビニル−1,1,3,3−テトラメチルジシロキサン錯体のトルエンまたはキシレン溶液がより好ましい。
白金化合物含有触媒の使用量は特に限定されるものではないが、反応性や、生産性等の点から、Si−H基を有する有機ケイ素化合物1molに対し、含有される白金原子が1×10-7〜1×10-2molとなる量が好ましく、1×10-7〜1×10-3molとなる量がより好ましい。
The platinum compound-containing catalyst used in the hydrosilylation reaction is not particularly limited, and specific examples thereof include chloroplatinic acid, an alcohol solution of chloroplatinic acid, platinum-1,3-divinyl-1,1 , 3,3-tetramethyldisiloxane complex in toluene or xylene, tetrakistriphenylphosphine platinum, dichlorobistriphenylphosphine platinum, dichlorobisacetonitrile platinum, dichlorobisbenzonitrile platinum, dichlorocyclooctadiene platinum, platinum-carbon , Platinum-alumina, supported catalysts such as platinum-silica, and the like.
From the viewpoint of selectivity in hydrosilylation, a zero-valent platinum complex is preferred, and a toluene or xylene solution of a platinum-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex is more preferred.
The amount of the platinum compound-containing catalyst used is not particularly limited, but from the viewpoint of reactivity, productivity and the like, the platinum atom contained is 1 × 10 5 per mol of the organosilicon compound having a Si—H group. The amount is preferably -7 to 1 × 10 -2 mol, more preferably 1 × 10 -7 to 1 × 10 -3 mol.

なお、上記反応は無溶媒でも進行するが、溶媒を用いることもできる。
使用可能な溶媒の具体例としては、ペンタン、ヘキサン、シクロヘキサン、ヘプタン、イソオクタン、ベンゼン、トルエン、キシレン等の炭化水素系溶媒;ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル系溶媒;酢酸エチル、酢酸ブチル等のエステル系溶媒;N,N−ジメチルホルムアミド等の非プロトン性極性溶媒;ジクロロメタン、クロロホルム等の塩素化炭化水素系溶媒などが挙げられ、これらの溶媒は、1種を単独で用いても、2種以上を混合して用いてもよい。
Note that the above reaction proceeds even without solvent, but a solvent can also be used.
Specific examples of usable solvents include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene and xylene; ether solvents such as diethyl ether, tetrahydrofuran and dioxane; ethyl acetate, butyl acetate and the like. Ester solvents; aprotic polar solvents such as N, N-dimethylformamide; chlorinated hydrocarbon solvents such as dichloromethane, chloroform and the like. Mixtures of more than one species may be used.

上記ヒドロシリル化反応における反応温度は特に限定されるものではなく、0℃から加熱下で行うことができるが、0〜200℃が好ましい。
適度な反応速度を得るためには加熱下で反応させることが好ましく、このような観点から、反応温度は40〜110℃がより好ましく、60〜100℃がより一層好ましい。
また、反応時間も特に限定されるものではなく、通常、1〜60時間程度であるが、1〜30時間が好ましく、1〜20時間がより好ましい。
The reaction temperature in the above hydrosilylation reaction is not particularly limited, and the reaction can be carried out under heating from 0 ° C, but is preferably 0 to 200 ° C.
In order to obtain an appropriate reaction rate, it is preferable to carry out the reaction under heating, and from such a viewpoint, the reaction temperature is more preferably from 40 to 110 ° C, and still more preferably from 60 to 100 ° C.
The reaction time is not particularly limited, and is usually about 1 to 60 hours, preferably 1 to 30 hours, more preferably 1 to 20 hours.

本発明の表面処理剤組成物は、上述した有機ケイ素化合物、その加水分解縮合物、またはそれらの混合物と、有機溶剤とを含んで構成される。
使用可能な有機溶剤の具体例としては、酢酸エチル、酢酸プロピル、酢酸イソプロピル、酢酸ブチル、酢酸イソブチル等のエステル類;ヘキサン、シクロヘキサン、ヘプタン、オクタン、デカン、ドデカン、トルエン、キシレン等の炭化水素類;ジクロロメタン、1,1−ジクロロエタン、1,2−ジクロロエタン等のハロゲン化炭化水素類;メチルエチルケトン、2−ペンタノン、メチルイソブチルケトン等のケトン類;ジエチレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル等のエーテル類;エタノール、1−プロパノール、2−プロパノール、1−ブタノール、2−ブタノール、イソブチルアルコール等のアルコール類などが挙げられ、これらは、1種単独で用いても、2種以上を組み合わせて用いてもよい。
The surface treatment composition of the present invention comprises the above-mentioned organosilicon compound, its hydrolytic condensate, or a mixture thereof, and an organic solvent.
Specific examples of usable organic solvents include esters such as ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate and isobutyl acetate; hydrocarbons such as hexane, cyclohexane, heptane, octane, decane, dodecane, toluene and xylene. Halogenated hydrocarbons such as dichloromethane, 1,1-dichloroethane and 1,2-dichloroethane; ketones such as methyl ethyl ketone, 2-pentanone and methyl isobutyl ketone; ethers such as diethylene glycol monomethyl ether and dipropylene glycol monomethyl ether; Examples include alcohols such as ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, and isobutyl alcohol, and these may be used alone or in combination of two or more. Good.

表面処理剤組成物中に含まれる本発明の有機ケイ素化合物の濃度は、特に限定されるものではないが、組成物全体に対し、0.1〜20質量%が好ましく、0.5〜10質量%がより好ましく、0.5〜5.0質量%がより一層好ましく、この範囲とすることで、塗膜自体に均一で優れた撥水性、滑水性を与えることができる。   The concentration of the organosilicon compound of the present invention contained in the surface treating agent composition is not particularly limited, but is preferably 0.1 to 20% by mass, and 0.5 to 10% by mass based on the whole composition. % Is more preferable, and 0.5 to 5.0% by mass is even more preferable. When the content is within this range, uniform and excellent water repellency and water slip can be imparted to the coating film itself.

また、本発明の表面処理剤組成物には、有機ケイ素化合物が有する加水分解性基と水との反応を促進し、シラノール基の生成を促進する目的で加水分解触媒が含まれていてもよい。
加水分解触媒の具体例としては、酢酸、蟻酸、メタンスルホン酸、p−トルエンスルホン酸等の有機酸;塩酸、硝酸、硫酸等の無機酸が挙げられ、これらは単独で用いても、2種以上組み合わせて用いてもよい。
これらの中でも、メタンスルホン酸、p−トルエンスルホン酸、硫酸が好ましく、特に硫酸が好ましい。
触媒の濃度は、有機ケイ素化合物に対し、0.1〜15.0質量%が好ましく、1.0〜10.0質量%がより好ましい。
Further, the surface treating agent composition of the present invention may contain a hydrolysis catalyst for the purpose of promoting the reaction between the hydrolyzable group of the organosilicon compound and water and promoting the production of a silanol group. .
Specific examples of the hydrolysis catalyst include organic acids such as acetic acid, formic acid, methanesulfonic acid, and p-toluenesulfonic acid; and inorganic acids such as hydrochloric acid, nitric acid, and sulfuric acid. These may be used in combination.
Among these, methanesulfonic acid, p-toluenesulfonic acid, and sulfuric acid are preferred, and sulfuric acid is particularly preferred.
The concentration of the catalyst is preferably from 0.1 to 15.0% by mass, more preferably from 1.0 to 10.0% by mass, based on the organosilicon compound.

さらに、本発明の表面処理剤組成物は、硬化触媒を含んでいてもよい。
硬化触媒の具体例としては、チタンテトライソプロポキシド、チタンテトラノルマルブトキシド、チタンテトラ−2−エチルヘキソキシド、チタンテトラアセチルアセトネート等のチタン触媒;ジブチル錫ジラウレート、ジブチル錫ジアセテート、ジオクチル錫ジアセテート等の錫触媒;アルミニウムセカンダリーブトキシド、アルミニウムトリスアセチルアセトネート、アルミニウムビスエチルアセトアセテート、モノアセチルアセトネート、アルミニウムトリスエチルアセトアセテート等のアルミニウム触媒;ノルマルプロピルジルコネート、ノルマルブチルジルコネート、ジルコニウムテトラアセチルアセトネート、ジルコニウムテトラアセチルアセトネート、ジルコニウムモノアセチルアセトネート、ジルコニウムテトラアセチルアセトネート等のジルコニウム触媒などが挙げられる。
触媒の濃度は、有機ケイ素化合物に対し、0.1〜15.0質量%が好ましく、1.0〜10.0質量%がより好ましい。
Further, the surface treating agent composition of the present invention may contain a curing catalyst.
Specific examples of the curing catalyst include titanium catalysts such as titanium tetraisopropoxide, titanium tetranormal butoxide, titanium tetra-2-ethylhexoxide, and titanium tetraacetylacetonate; dibutyltin dilaurate, dibutyltin diacetate, and dioctyltin. Tin catalysts such as diacetate; aluminum catalysts such as aluminum secondary butoxide, aluminum trisacetylacetonate, aluminum bisethylacetoacetate, monoacetylacetonate, aluminum trisethylacetoacetate; normal propyl zirconate, normal butyl zirconate, zirconium tetra Acetylacetonate, zirconium tetraacetylacetonate, zirconium monoacetylacetonate, zirconium tetraacetylacetonate And zirconium catalysts such Toneto like.
The concentration of the catalyst is preferably from 0.1 to 15.0% by mass, more preferably from 1.0 to 10.0% by mass, based on the organosilicon compound.

本発明の表面処理剤組成物は、上述した本発明の有機ケイ素化合物以外の、Si原子に結合したヒドロキシ基または加水分解性基を有するその他の有機ケイ素化合物、その加水分解縮合物、またはそれらの混合物をさらに含んでいてもよい。
加水分解性基としては、アルコキシ基、ハロゲン原子、アシロキシ基、イソシアネート基等が挙げられる。
その他の有機ケイ素化合物の具体例としては、アルコキシシリル基を有するシラン化合物として、テトラメトキシシラン、テトラエトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、ジメチルジメトキシシラン、ジメチルジエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、ジフェニルジメトキシシラン、ヘキシルトリメトキシシラン、ヘキシルトリエトキシシラン、デシルトリメトキシシラン、トリフルオロプロピルトリメトキシシラン、ヘキサメチルジシラザン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−メタクリロキシプロピルトリメトキシシラン、3−アクリロキシプロピルトリメトキシシラン、3−アミノプロピルトリメトキシシラン、3−ウレイドプロピルトリエトキシシラン、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルメチルジメトキシシラン、ビス(トリエトキシシリルプロピル)テトラスルフィド、3−イソシアネートプロピルトリエトキシシラン等が挙げられ、ハロゲン化シリル基を有するシラン化合物として、メチルトリクロロシラン、エチルトリクロロシラン、ジメチルジクロロシラン、トリメチルクロロシラン、フェニルトリクロロシラン、ジフェニルジクロロシラン、トリフルオロエチルトリクロロシラ等が挙げられる。
その他の有機ケイ素化合物の添加量は、得られる硬化皮膜の撥水性および滑水性に影響を及ぼさない量であれば特に制限はないが、本発明の有機ケイ素化合物に対し、20質量%以下が好ましい。
The surface treating agent composition of the present invention, other than the above-described organosilicon compound of the present invention, other organosilicon compounds having a hydroxy group or a hydrolyzable group bonded to a Si atom, a hydrolysis condensate thereof, or a condensate thereof It may further comprise a mixture.
Examples of the hydrolyzable group include an alkoxy group, a halogen atom, an acyloxy group, and an isocyanate group.
Specific examples of other organosilicon compounds include silane compounds having an alkoxysilyl group, such as tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, and phenyltrimethoxysilane. Silane, phenyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, diphenyldimethoxysilane, hexyltrimethoxysilane, hexyltriethoxysilane, decyltrimethoxysilane, trifluoropropyltrimethoxysilane, hexamethyldi Silazane, vinyltrimethoxysilane, vinyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane 3-acryloxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropylmethyldimethoxysilane, bis (triethoxysilylpropyl) Tetrasulfide, 3-isocyanatopropyltriethoxysilane, and the like.Examples of the silane compound having a silyl halide group include methyltrichlorosilane, ethyltrichlorosilane, dimethyldichlorosilane, trimethylchlorosilane, phenyltrichlorosilane, diphenyldichlorosilane, and trifluorosilane. Ethyltrichlorosila and the like can be mentioned.
The addition amount of the other organosilicon compound is not particularly limited as long as it does not affect the water repellency and lubricity of the obtained cured film, but is preferably 20% by mass or less based on the organosilicon compound of the present invention. .

なお、本発明の表面処理剤組成物は、以上説明した各成分に加え、各種添加剤を添加することができる。
添加剤としては、金属酸化物、樹脂、染料、顔料、紫外線吸収剤、酸化防止剤等が挙げられ、具体的には、シリカゾル、チタニアゾル、アルミナゾル等が挙げられる。
添加剤の添加量は、得られる硬化皮膜の撥水性および滑水性に影響を及ぼさない量であれば特に制限はないが、本発明の有機ケイ素化合物に対して30質量%以下が好ましい。
The surface treatment composition of the present invention may contain various additives in addition to the components described above.
Examples of the additives include metal oxides, resins, dyes, pigments, ultraviolet absorbers, antioxidants, and the like, and specific examples include silica sol, titania sol, and alumina sol.
The amount of the additive is not particularly limited as long as it does not affect the water repellency and the lubricity of the obtained cured film, but is preferably 30% by mass or less based on the organosilicon compound of the present invention.

以上説明した本発明の表面処理剤組成物を基材に塗布し、乾燥させることで、基材上に撥水膜を形成することができる。
基材としては、ガラス、金属、セラミック、樹脂等を好適に用いることができる。金属としては、鉄、ステンレス等が挙げられ、セラミックとしては、チタニア、アルミナ、ジルコニア等が挙げられ、樹脂としては、ポリエチレン、ポリプロピレン、ポリエチレンテレフタレート、ポリカーボネート、塩化ビニル、ポリスチレン、ABS樹脂、フェノール樹脂、エポキシ樹脂、アクリル等が挙げられる。
A water-repellent film can be formed on a substrate by applying the surface treating agent composition of the present invention described above to a substrate and drying it.
As the substrate, glass, metal, ceramic, resin, or the like can be preferably used. Examples of the metal include iron and stainless steel, and examples of the ceramic include titania, alumina and zirconia, and examples of the resin include polyethylene, polypropylene, polyethylene terephthalate, polycarbonate, vinyl chloride, polystyrene, ABS resin, and phenol resin. Epoxy resins, acrylics and the like can be mentioned.

塗布方法としては、拭き付け塗布、スピンコート、バーコート、浸漬塗布、スキージ塗布、スプレー塗布等の従来公知の方法を適宜採用することができる。
塗布後の乾燥は、自然乾燥、加熱乾燥のいずれでもよいが、5〜150℃の範囲で行うことが好ましい。5℃未満では基材への本発明の有機ケイ素化合物の反応速度が小さくなり、反応に時間を要し、十分な耐久性が得られないことがある。150℃を超えると塗布した表面処理剤組成物の変成や熱分解が起こり易く、十分な撥水性、滑水性が得られないことがある。
特に、表面処理剤組成物を基材上に塗布した後、塗膜表面を水で拭き上げ処理することが好ましく、硬化皮膜を形成する温度は、室温近傍(5〜35℃)が好ましい。
As a coating method, a conventionally known method such as wiping coating, spin coating, bar coating, dip coating, squeegee coating, or spray coating can be appropriately adopted.
Drying after application may be either natural drying or heat drying, but is preferably performed in the range of 5 to 150 ° C. If the temperature is lower than 5 ° C., the reaction rate of the organosilicon compound of the present invention on the base material becomes low, the reaction requires a long time, and sufficient durability may not be obtained. If it exceeds 150 ° C., denaturation and thermal decomposition of the applied surface treating agent composition tend to occur, and sufficient water repellency and lubricity may not be obtained.
In particular, it is preferable that the surface of the coating film is wiped up with water after the surface treatment agent composition is applied on the substrate, and the temperature at which a cured film is formed is preferably around room temperature (5 to 35 ° C.).

撥水膜の膜厚は、特に限定されるものではないが、透明性および膜の機械的強度等を考慮すると、100nm以下が好ましい。
また、上記撥水膜は、2μl水滴で100°以上の水接触角、30°以下の転落角を有することが好ましく、ヘイズ値(曇価)が好ましくは5以下、より好ましくは1以下、より一層好ましくは0.5以下の透明性を有することが好ましい。
The thickness of the water-repellent film is not particularly limited, but is preferably 100 nm or less in consideration of transparency, mechanical strength of the film, and the like.
The water-repellent film preferably has a water contact angle of 100 ° or more and a falling angle of 30 ° or less in a 2 μl water droplet, and has a haze value (cloudiness value) of preferably 5 or less, more preferably 1 or less. More preferably, it has a transparency of 0.5 or less.

本発明の表面処理剤組成物は、基材表面に直接塗布して撥水膜(硬化皮膜)を形成することもできるが、基材表面と撥水膜との間に、本発明の有機ケイ素化合物以外の、加水分解性基を有するケイ素化合物の加水分解生成物から形成される下地層を介在させることが好ましい。このような下地層を設けることにより、撥水膜と基材との結合がより強固となり、本発明の撥水膜の耐久性が向上する。   The surface treating agent composition of the present invention can be applied directly to the surface of a substrate to form a water-repellent film (cured film). It is preferable to interpose an underlayer formed from a hydrolysis product of a silicon compound having a hydrolyzable group other than the compound. By providing such an underlayer, the bond between the water-repellent film and the substrate becomes stronger, and the durability of the water-repellent film of the present invention is improved.

下地層形成に用いられる有機ケイ素化合物としては、加水分解性が高く、室温近傍(5〜35℃)で基材上へ薄膜を形成するという点を考慮すると、下記一般式(12)で表されるイソシアネートシラン化合物が好適である。   The organosilicon compound used for forming the underlayer has high hydrolyzability and is represented by the following general formula (12) in consideration of forming a thin film on a substrate at around room temperature (5 to 35 ° C.). Isocyanate silane compounds are preferred.

Figure 0006642309
(式中、kは、0または1を表す。)
Figure 0006642309
(In the formula, k represents 0 or 1.)

以上説明した本発明の表面処理剤組成物からなる膜は、撥水性、滑水性および透明性に優れるため、輸送機用のガラスや車体の撥水処理に好適に用いることができる。特に、窓ガラスやミラーに適用した場合、雨天時における水滴付着による視認性低下を効率的に防止することができる。   The film comprising the surface treating agent composition of the present invention described above is excellent in water repellency, water slippage, and transparency, and thus can be suitably used for water repellent treatment of glass for a transport machine or a vehicle body. In particular, when the present invention is applied to a window glass or a mirror, it is possible to efficiently prevent a decrease in visibility due to adhesion of water droplets in rainy weather.

以下、実施例および比較例を挙げて本発明をより具体的に説明するが、本発明はこれらの実施例に限定されるものではない。   Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples.

[1]有機ケイ素化合物の合成
[実施例1−1]有機ケイ素化合物(13)の合成

Figure 0006642309
[1] Synthesis of organosilicon compound [Example 1-1] Synthesis of organosilicon compound (13)
Figure 0006642309

撹拌機、温度計、エステルアダプターおよびジムロート冷却管を備えた1リットルの3つ口フラスコに、トルエン23.8g、化合物(14)5.05g(0.0225mol)、およびビニルシロキサン配位Ptのトルエン溶液(Pt濃度:0.5質量%)0.3gを加え、80℃まで昇温し、次に、80〜90℃に維持しながら、化合物(15)50.0g(0.0225mol)を滴下し、さらに、90℃で5時間反応を行った。アルカリ水添加による水素ガス発生量測定およびIR測定を行い、≡Si−H基の反応完結を確認した。
続いて、ジムロート冷却管を排ガス管につなぎかえ、窒素ガスバブリング下、系内圧力10mmHg、150℃で3時間加熱した後、25℃まで冷却し、圧力を常圧に復圧した後、得られた液体をろ過精製し、有機ケイ素化合物(13)49.5gを得た。
In a 1-liter three-necked flask equipped with a stirrer, thermometer, ester adapter and Dimroth condenser, 23.8 g of toluene, 5.05 g (0.0225 mol) of compound (14), and toluene of vinylsiloxane coordinated Pt were placed. 0.3 g of a solution (Pt concentration: 0.5% by mass) was added, the temperature was raised to 80 ° C., and 50.0 g (0.0225 mol) of compound (15) was added dropwise while maintaining the temperature at 80 to 90 ° C. Then, the reaction was further performed at 90 ° C. for 5 hours. Measurement of the amount of hydrogen gas generated by addition of alkaline water and IR measurement were performed to confirm the completion of the reaction of the ≡Si-H group.
Subsequently, the Dimroth cooling pipe was connected to the exhaust gas pipe, and the system was heated at 150 ° C. for 3 hours under an internal pressure of 10 mmHg under nitrogen gas bubbling, then cooled to 25 ° C., and the pressure was restored to normal pressure. The resulting liquid was purified by filtration to obtain 49.5 g of an organosilicon compound (13).

[実施例1−2]有機ケイ素化合物(16)の合成

Figure 0006642309
[Example 1-2] Synthesis of organosilicon compound (16)
Figure 0006642309

撹拌機、温度計、エステルアダプターおよびジムロート冷却管を備えた1リットルの3つ口フラスコに、トルエン17.1g、化合物(18)31.7g(0.0146mol)、およびビニルシロキサン配位Ptのトルエン溶液(Pt濃度:0.5質量%)0.3gを加え、80℃まで昇温し、次に、80〜90℃に維持しながら、化合物(17)5.0g(0.0146mol)を滴下し、さらに90℃で5時間反応を行った。ここで、合成例1と同様の方法で、Si−H基の反応完結を確認した。
ジムロート冷却管を排ガス管につなぎかえ、窒素ガスバブリング下、系内圧力10mmHg、150℃で3時間加熱した後、25℃まで冷却し、圧力を常圧に復圧した後、得られた液体をろ過精製し、有機ケイ素化合物(16)33.0gを得た。
In a 1 liter three-necked flask equipped with a stirrer, thermometer, ester adapter and Dimroth condenser, 17.1 g of toluene, 31.7 g (0.0146 mol) of compound (18), and toluene of vinylsiloxane coordinated Pt were placed. 0.3 g of a solution (Pt concentration: 0.5% by mass) was added, the temperature was raised to 80 ° C, and then 5.0 g (0.0146 mol) of compound (17) was added dropwise while maintaining the temperature at 80 to 90 ° C. Then, the reaction was further performed at 90 ° C. for 5 hours. Here, the completion of the reaction of the Si—H group was confirmed in the same manner as in Synthesis Example 1.
After connecting the Dimroth cooling pipe to the exhaust gas pipe and heating at 150 ° C. for 3 hours under a system pressure of 10 mmHg under nitrogen gas bubbling, it was cooled to 25 ° C., and the pressure was restored to normal pressure. After filtration and purification, 33.0 g of organosilicon compound (16) was obtained.

[実施例1−3]有機ケイ素化合物(19)の合成

Figure 0006642309
[Example 1-3] Synthesis of organosilicon compound (19)
Figure 0006642309

撹拌機、温度計、エステルアダプターおよびジムロート冷却管を備えた1リットルの3つ口フラスコに、トルエン29.6g、化合物(20)10.0g(0.0266mol)、およびビニルシロキサン配位Ptのトルエン溶液(Pt濃度:0.5質量%)0.3gを加え、80℃まで昇温し、80〜90℃に維持しながら、化合物(15)59.1g(0.0266mol)を滴下し、さらに90℃で5時間反応を行った。ここで、合成例1と同様の方法で、Si−H基の反応完結を確認した。
ジムロート冷却管を排ガス管につなぎかえ、窒素ガスバブリング下、系内圧力10mmHg、150℃で3時間加熱した後、25℃まで冷却し、圧力を常圧に復圧した後、得られた液体をろ過精製し、有機ケイ素化合物(29)62.2gを得た。
In a 1-liter three-necked flask equipped with a stirrer, thermometer, ester adapter and Dimroth condenser, 29.6 g of toluene, 10.0 g (0.0266 mol) of compound (20), and toluene of vinylsiloxane coordinated Pt were placed. 0.3 g of a solution (Pt concentration: 0.5% by mass) was added, the temperature was raised to 80 ° C, and 59.1 g (0.0266 mol) of compound (15) was added dropwise while maintaining the temperature at 80 to 90 ° C. The reaction was performed at 90 ° C. for 5 hours. Here, the completion of the reaction of the Si—H group was confirmed in the same manner as in Synthesis Example 1.
After connecting the Dimroth cooling pipe to the exhaust gas pipe and heating at 150 ° C. for 3 hours under a system pressure of 10 mmHg under nitrogen gas bubbling, it was cooled to 25 ° C., and the pressure was restored to normal pressure. After filtration and purification, 62.2 g of an organosilicon compound (29) was obtained.

[実施例1−4]有機ケイ素化合物(21)の合成

Figure 0006642309
[Example 1-4] Synthesis of organosilicon compound (21)
Figure 0006642309

撹拌機、温度計、エステルアダプターおよびジムロート冷却管を備えた1リットルの3つ口フラスコに、トルエン22.4g、化合物(20)8.57g(0.0228mol)、およびビニルシロキサン配位Ptのトルエン溶液(Pt濃度:0.5質量%)0.3gを加え、80℃まで昇温し、80〜90℃に維持しながら、化合物(22)54.0g(0.0228mol)を滴下し、さらに90℃で5時間反応した。ここで、合成例1と同様の方法で、Si−H基の反応完結を確認した。
ジムロート冷却管を排ガス管につなぎかえ、窒素ガスバブリング下、系内圧力10mmHg、150℃で3時間加熱した後、25℃まで冷却し、圧力を常圧に復圧した後、得られた液体をろ過精製し、有機ケイ素化合物(21)56.7gを得た。
In a 1 liter three-necked flask equipped with a stirrer, thermometer, ester adapter and Dimroth condenser, 22.4 g of toluene, 8.57 g (0.0228 mol) of compound (20), and toluene of vinylsiloxane coordinated Pt were placed. 0.3 g of a solution (Pt concentration: 0.5% by mass) was added, the temperature was raised to 80 ° C, and 54.0 g (0.0228 mol) of compound (22) was added dropwise while maintaining the temperature at 80 to 90 ° C. The reaction was performed at 90 ° C. for 5 hours. Here, the completion of the reaction of the Si—H group was confirmed in the same manner as in Synthesis Example 1.
After connecting the Dimroth cooling pipe to the exhaust gas pipe and heating at 150 ° C. for 3 hours under a system pressure of 10 mmHg under nitrogen gas bubbling, it was cooled to 25 ° C., and the pressure was restored to normal pressure. After filtration and purification, 56.7 g of an organosilicon compound (21) was obtained.

[実施例1−5]有機ケイ素化合物(23)の合成

Figure 0006642309
[Example 1-5] Synthesis of organosilicon compound (23)
Figure 0006642309

撹拌機、温度計、エステルアダプターおよびジムロート冷却管を備えた1リットルの3つ口フラスコに、トルエン30.1g、化合物(20)10.0g(0.0266mol)、およびビニルシロキサン配位Ptのトルエン溶液(Pt濃度:0.5質量%)0.3gを加え、80℃まで昇温し、80〜90℃に維持しながら、化合物(24)60.2g(0.0266mol)を滴下し、さらに90℃で5時間反応を行った。ここで、合成例1と同様の方法で、Si−H基の反応完結を確認した。
ジムロート冷却管を排ガス管につなぎかえ、窒素ガスバブリング下、系内圧力10mmHg、150℃で3時間加熱した後、25℃まで冷却し、圧力を常圧に復圧した後、得られた液体をろ過精製し、有機ケイ素化合物(23)63.1gを得た。
In a 1-liter three-necked flask equipped with a stirrer, thermometer, ester adapter and Dimroth condenser, 30.1 g of toluene, 10.0 g (0.0266 mol) of compound (20), and toluene of vinylsiloxane coordinated Pt were placed. 0.3 g of a solution (Pt concentration: 0.5% by mass) was added, the temperature was raised to 80 ° C, and 60.2 g (0.0266 mol) of compound (24) was added dropwise while maintaining the temperature at 80 to 90 ° C. The reaction was performed at 90 ° C. for 5 hours. Here, the completion of the reaction of the Si—H group was confirmed in the same manner as in Synthesis Example 1.
After connecting the Dimroth cooling pipe to the exhaust gas pipe and heating at 150 ° C. for 3 hours under a system pressure of 10 mmHg under nitrogen gas bubbling, it was cooled to 25 ° C., and the pressure was restored to normal pressure. After filtration and purification, 63.1 g of an organosilicon compound (23) was obtained.

[2]表面処理剤組成物の調製
[実施例2−1]
酢酸エチル19.0gに、実施例1−1で得られた有機ケイ素化合物(13)0.920g、および98質量%硫酸0.080gを加えて混合し、表面処理剤組成物を得た。
[2] Preparation of surface treatment agent composition [Example 2-1]
0.920 g of the organosilicon compound (13) obtained in Example 1-1 and 0.080 g of 98% by mass sulfuric acid were added to 19.0 g of ethyl acetate and mixed to obtain a surface treating agent composition.

[実施例2−2]
有機ケイ素化合物(13)を実施例1−2で得られた有機ケイ素化合物(16)へ変更した以外は、実施例2−1と同様にして表面処理剤組成物を得た。
[Example 2-2]
A surface treating agent composition was obtained in the same manner as in Example 2-1 except that the organosilicon compound (13) was changed to the organosilicon compound (16) obtained in Example 1-2.

[実施例2−3]
有機ケイ素化合物(13)を実施例1−3で得られた有機ケイ素化合物(19)へ変更した以外は、実施例2−1と同様にして表面処理剤組成物を得た。
[Example 2-3]
A surface treating agent composition was obtained in the same manner as in Example 2-1 except that the organosilicon compound (13) was changed to the organosilicon compound (19) obtained in Example 1-3.

[実施例2−4]
有機ケイ素化合物(13)を実施例1−4で得られた有機ケイ素化合物(21)へ変更した以外は、実施例2−1と同様にして表面処理剤組成物を得た。
[Example 2-4]
A surface treating agent composition was obtained in the same manner as in Example 2-1 except that the organosilicon compound (13) was changed to the organosilicon compound (21) obtained in Example 1-4.

[実施例2−5]
有機ケイ素化合物(13)を実施例1−5で得られた有機ケイ素化合物(23)へ変更した以外は、実施例2−1と同様にして表面処理剤組成物を得た。
[Example 2-5]
A surface treating agent composition was obtained in the same manner as in Example 2-1 except that the organosilicon compound (13) was changed to the organosilicon compound (23) obtained in Example 1-5.

[比較例2−1]
有機ケイ素化合物(13)を下記式で示される有機ケイ素化合物へ変更した以外は、実施例2−1と同様にして表面処理剤組成物を得た。
[Comparative Example 2-1]
A surface treating agent composition was obtained in the same manner as in Example 2-1 except that the organosilicon compound (13) was changed to an organosilicon compound represented by the following formula.

Figure 0006642309
Figure 0006642309

[比較例2−2]
有機ケイ素化合物(13)を下記式で示される有機ケイ素化合物へ変更した以外は、実施例2−1と同様にして表面処理剤組成物を得た。
[Comparative Example 2-2]
A surface treating agent composition was obtained in the same manner as in Example 2-1 except that the organosilicon compound (13) was changed to an organosilicon compound represented by the following formula.

Figure 0006642309
Figure 0006642309

上記実施例2−1〜2−5および比較例2−1,2−2で調製した各表面処理剤組成物をティッシュペーパーへ含浸し、ガラス基板へ拭き付け塗工を行った。1分間、自然乾燥した後、ティッシュペーパーへ水を含浸し、ガラス基板の塗工面の拭き上げ処理を行った。25℃で1時間、自然乾燥を行い、撥水膜付きガラス基板を得た。
得られた撥水膜付きガラス基板を用いて、下記(1)〜(4)の評価試験を行った。結果を表1に示す。
なお、水接触角および水滴滑落角度(転落角)は、滑落ユニットを備えた接触角計(協和界面科学(株)製Drop Master DM−701)により測定した。
(1)撥水性
撥水膜付きガラス基板の被処理面上に2μlの水を滴下し、水接触角を測定した。
(2)滑水性
撥水膜付きガラス基板の被処理面上に体積2μlの水滴を滴下し、転落角を測定した。
(3)耐水性試験
撥水膜付きガラス基板を1質量%界面活性剤(ライポンF、ライオンハイジーン(株)製)水溶液中に浸漬し、超音波(100W、42kHz)を30分間照射した。試験前後の撥水膜付きガラス基板に関し、撥水性、滑水性を評価した。
(4)耐摩耗性試験
撥水膜付きガラス基板の被処理面上に対し、2cm×2cmネル布、1.2kg荷重、1,200回往復の条件で摩耗試験を実施した。試験前後の撥水膜付きガラス基板に関し、撥水性、滑水性を評価した。
Each surface treating agent composition prepared in Examples 2-1 to 2-5 and Comparative Examples 2-1 and 2-2 was impregnated in tissue paper, and wiped and applied to a glass substrate. After air-drying for 1 minute, the tissue paper was impregnated with water, and the coated surface of the glass substrate was wiped off. Air drying was performed at 25 ° C. for 1 hour to obtain a glass substrate with a water-repellent film.
Using the obtained glass substrate with a water-repellent film, the following evaluation tests (1) to (4) were performed. Table 1 shows the results.
The water contact angle and the water drop sliding angle (fall angle) were measured by a contact angle meter (Drop Master DM-701, manufactured by Kyowa Interface Science Co., Ltd.) equipped with a sliding unit.
(1) Water repellency 2 μl of water was dropped on the surface to be treated of the glass substrate with a water repellent film, and the water contact angle was measured.
(2) Water Slidability A water droplet having a volume of 2 μl was dropped on the surface to be treated of the glass substrate having a water-repellent film, and the falling angle was measured.
(3) Water resistance test A glass substrate with a water-repellent film was immersed in an aqueous solution of 1% by mass of a surfactant (Lipon F, manufactured by Lion Hygene Co., Ltd.) and irradiated with ultrasonic waves (100 W, 42 kHz) for 30 minutes. The water repellency and the water slip were evaluated for the glass substrate with the water repellent film before and after the test.
(4) Abrasion resistance test A wear test was performed on the surface of the glass substrate with a water-repellent film under the conditions of 2 cm × 2 cm flannel cloth, 1.2 kg load, and 1,200 reciprocations. The water repellency and the water slip were evaluated for the glass substrate with the water repellent film before and after the test.

Figure 0006642309
Figure 0006642309

表1に示されるように、実施例2−1〜2−5で得られた撥水膜付きガラス基板は、初期、耐水性試験後および耐摩耗性試験後における撥水性、滑水性が良好であることがわかる。
一方、比較例2−1,2−2で得られた撥水膜付きガラス基板は、耐水性試験後や耐摩耗性試験後において、特に滑水性が著しく低下していることがわかる。
As shown in Table 1, the glass substrates with a water-repellent film obtained in Examples 2-1 to 2-5 had good water repellency and water slip in the initial stage, after the water resistance test and after the abrasion resistance test. You can see that there is.
On the other hand, it can be seen that the glass substrates with water-repellent films obtained in Comparative Examples 2-1 and 2-2 have remarkably reduced particularly the water slip after the water resistance test or the abrasion resistance test.

Claims (15)

一般式(1)で表されることを特徴とする有機ケイ素化合物。
Figure 0006642309
{式中、R1は、互いに独立して、炭素原子数1〜12のアルキル基または式(2)で表される基を表し、
Figure 0006642309
〔式中、R4は、互いに独立して、炭素原子数1〜12のアルキル基または式(3)で表される基を表す。
Figure 0006642309
(式中、R5は、互いに独立して炭素原子数1〜12のアルキル基を表す。)〕
2は、互いに独立して炭素原子数1〜12のアルキル基を表し、
3は、互いに独立して炭素原子数1〜4のアルキル基を表し、
Xは、互いに独立してヒドロキシ基または加水分解性基を表し、
Yは、アリーレン基またはフッ化アルキレン基を含有する2価連結基を表し、
aは、1〜100の数を表し、bは、0〜2の数を表す。}
An organosilicon compound represented by the general formula (1).
Figure 0006642309
In the formula, R 1 independently represents an alkyl group having 1 to 12 carbon atoms or a group represented by the formula (2),
Figure 0006642309
[In the formula, R 4 independently represents an alkyl group having 1 to 12 carbon atoms or a group represented by the formula (3).
Figure 0006642309
(In the formula, R 5 independently represents an alkyl group having 1 to 12 carbon atoms.)]
R 2 independently represents an alkyl group having 1 to 12 carbon atoms,
R 3 independently represents an alkyl group having 1 to 4 carbon atoms,
X independently represents a hydroxy group or a hydrolyzable group,
Y represents a divalent linking group containing an arylene group or a fluorinated alkylene group,
a represents a number of 1 to 100, and b represents a number of 0 to 2. }
前記Yが、式(4)で表される2価連結基である請求項1記載の有機ケイ素化合物。
Figure 0006642309
〔式中、Zは、式(5)〜(7)から選ばれるいずれか1つの2価連結基を表し、R6およびR7は、互いに独立して、単結合またはZと異なる2価連結基を表す。
Figure 0006642309
(式(5)中、cは、1〜10の数を表し、式(7)中、R8は、互いに独立して炭素原子数1〜12のアルキル基を表す。)〕
The organosilicon compound according to claim 1, wherein Y is a divalent linking group represented by the formula (4).
Figure 0006642309
[In the formula, Z represents any one divalent linking group selected from formulas (5) to (7), and R 6 and R 7 are each independently a single bond or a divalent link different from Z. Represents a group.
Figure 0006642309
(In the formula (5), c represents a number of 1 to 10, and in the formula (7), R 8 independently represents an alkyl group having 1 to 12 carbon atoms.)]
式(8)または式(9)で表される請求項2記載の有機ケイ素化合物。
Figure 0006642309
〔式中、Zは、式(5)〜(7)から選ばれるいずれか1つの2価連結基を表し、R3、R6、R7、X、aおよびbは、前記と同じ意味を表す。
Figure 0006642309
(式(5)中、cは、前記と同じ意味を表し、式(7)中、R8は、メチル基を表す。)〕
The organosilicon compound according to claim 2, represented by formula (8) or (9).
Figure 0006642309
[Wherein, Z represents any one divalent linking group selected from the formulas (5) to (7), and R 3 , R 6 , R 7 , X, a and b have the same meanings as described above. Represent.
Figure 0006642309
(In the formula (5), c has the same meaning as described above, and in the formula (7), R 8 represents a methyl group.)
前記R6およびR7が、互いに独立して式(10)で表される請求項2または3記載の有機ケイ素化合物。
Figure 0006642309
(式中、dは、0〜10の数を表す。)
4. The organosilicon compound according to claim 2, wherein R 6 and R 7 are independently represented by the formula (10).
Figure 0006642309
(In the formula, d represents a number from 0 to 10.)
前記Xが、ヒドロキシ基、アルコキシ基、ハロゲン原子またはイソシアネート基である請求項1〜4のいずれか1項記載の有機ケイ素化合物。   5. The organosilicon compound according to claim 1, wherein X is a hydroxy group, an alkoxy group, a halogen atom, or an isocyanate group. 6. 請求項1〜5のいずれか1項記載の有機ケイ素化合物の加水分解縮合物。   A hydrolyzed condensate of the organosilicon compound according to claim 1. 請求項1〜5のいずれか1項記載の有機ケイ素化合物、その加水分解縮合物、またはそれらの混合物と、有機溶剤とを含む表面処理剤組成物。   A surface treating agent composition comprising the organosilicon compound according to any one of claims 1 to 5, its hydrolytic condensate, or a mixture thereof, and an organic solvent. メタンスルホン酸、p−トルエンスルホン酸および硫酸から選ばれる少なくとも1種の加水分解触媒を含有する請求項7記載の表面処理剤組成物。   The surface treatment composition according to claim 7, comprising at least one hydrolysis catalyst selected from methanesulfonic acid, p-toluenesulfonic acid and sulfuric acid. 請求項1〜5のいずれか1項記載の有機ケイ素化合物以外の、その他の加水分解性基を有する有機ケイ素化合物、その加水分解縮合物、またはそれらの混合物を含有する請求項7または8記載の表面処理剤組成物。   The organic silicon compound having another hydrolyzable group other than the organic silicon compound according to any one of claims 1 to 5, a hydrolysis condensate thereof, or a mixture thereof. Surface treatment composition. 輸送機用ガラスの撥水処理用である請求項7〜9のいずれか1項記載の表面処理剤組成物。   The surface treating agent composition according to any one of claims 7 to 9, which is used for water repellent treatment of glass for a transport machine. 輸送機用ボディーの撥水処理用である請求項7〜9のいずれか1項記載の表面処理剤組成物。   The surface treating agent composition according to any one of claims 7 to 9, which is used for water repellent treatment of a body for a transport machine. 基材と、この基材上に設けられた、請求項7〜9のいずれか1項記載の表面処理剤組成物を用いてなる撥水膜とを有する撥水膜付き基材。   A substrate with a water-repellent film, comprising: a substrate; and a water-repellent film formed on the substrate using the surface treatment agent composition according to any one of claims 7 to 9. 前記基材と撥水膜との間に介在する下地層を備え、
前記下地層が、請求項1〜5のいずれか1項記載の有機ケイ素化合物以外の、その他の加水分解性基を有する有機ケイ素化合物の加水分解生成物からなる請求項12記載の撥水膜付き基材。
A base layer interposed between the base material and the water-repellent film,
The water-repellent film according to claim 12 , wherein the underlayer comprises a hydrolysis product of an organosilicon compound having another hydrolyzable group, other than the organosilicon compound according to any one of claims 1 to 5. Base material.
前記基材が、ガラス、金属、セラミックまたは樹脂である請求項12または13記載の撥水膜付き基材。   14. The substrate with a water-repellent film according to claim 12, wherein the substrate is glass, metal, ceramic or resin. 基材上に、請求項7〜9のいずれか1項記載の表面処理剤組成物を塗布して塗膜を形成し、この塗膜表面を水で拭き上げ処理した後、5〜35℃で硬化皮膜を形成する撥水膜の形成方法。   A substrate is coated with the surface treating agent composition according to any one of claims 7 to 9 to form a coating film, and after wiping the coating film surface with water, the coating solution is heated at 5 to 35 ° C. A method for forming a water-repellent film for forming a cured film.
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