JP6601634B2 - Modified resin and curable resin composition containing the same - Google Patents
Modified resin and curable resin composition containing the same Download PDFInfo
- Publication number
- JP6601634B2 JP6601634B2 JP2017070658A JP2017070658A JP6601634B2 JP 6601634 B2 JP6601634 B2 JP 6601634B2 JP 2017070658 A JP2017070658 A JP 2017070658A JP 2017070658 A JP2017070658 A JP 2017070658A JP 6601634 B2 JP6601634 B2 JP 6601634B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- group represented
- represented
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229920005989 resin Polymers 0.000 title claims description 155
- 239000011347 resin Substances 0.000 title claims description 155
- 239000011342 resin composition Substances 0.000 title description 31
- 239000003822 epoxy resin Substances 0.000 claims description 110
- 229920000647 polyepoxide Polymers 0.000 claims description 110
- -1 1-methylvinyl groups Chemical group 0.000 claims description 77
- 150000001875 compounds Chemical class 0.000 claims description 60
- 125000003700 epoxy group Chemical group 0.000 claims description 37
- 125000004432 carbon atom Chemical group C* 0.000 claims description 36
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 claims description 35
- 125000000217 alkyl group Chemical group 0.000 claims description 30
- 125000003118 aryl group Chemical group 0.000 claims description 30
- 125000003342 alkenyl group Chemical group 0.000 claims description 25
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 claims description 22
- 239000004973 liquid crystal related substance Substances 0.000 claims description 21
- 125000000304 alkynyl group Chemical group 0.000 claims description 20
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 20
- 239000003505 polymerization initiator Substances 0.000 claims description 19
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 16
- 125000002947 alkylene group Chemical group 0.000 claims description 15
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 15
- 125000000732 arylene group Chemical group 0.000 claims description 13
- 239000004593 Epoxy Substances 0.000 claims description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 12
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 claims description 11
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 11
- 229920001187 thermosetting polymer Polymers 0.000 claims description 11
- 150000003573 thiols Chemical class 0.000 claims description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 7
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 6
- 125000004434 sulfur atom Chemical group 0.000 claims description 6
- 238000007789 sealing Methods 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 125000001072 heteroaryl group Chemical group 0.000 claims description 4
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 74
- 239000000126 substance Substances 0.000 description 69
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 48
- 230000015572 biosynthetic process Effects 0.000 description 40
- 238000003786 synthesis reaction Methods 0.000 description 40
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 29
- 230000000052 comparative effect Effects 0.000 description 24
- 238000004519 manufacturing process Methods 0.000 description 21
- 239000011345 viscous material Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical group OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 16
- 239000000203 mixture Substances 0.000 description 16
- DCUFMVPCXCSVNP-UHFFFAOYSA-N methacrylic anhydride Chemical compound CC(=C)C(=O)OC(=O)C(C)=C DCUFMVPCXCSVNP-UHFFFAOYSA-N 0.000 description 12
- 238000003756 stirring Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 239000000945 filler Substances 0.000 description 8
- 239000003999 initiator Substances 0.000 description 8
- 239000012074 organic phase Substances 0.000 description 8
- 239000000565 sealant Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000003377 acid catalyst Substances 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- 239000003504 photosensitizing agent Substances 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 239000006087 Silane Coupling Agent Substances 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 5
- 238000010538 cationic polymerization reaction Methods 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000007870 radical polymerization initiator Substances 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- OEBXWWBYZJNKRK-UHFFFAOYSA-N 1-methyl-2,3,4,6,7,8-hexahydropyrimido[1,2-a]pyrimidine Chemical compound C1CCN=C2N(C)CCCN21 OEBXWWBYZJNKRK-UHFFFAOYSA-N 0.000 description 4
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 4
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 4
- 125000004414 alkyl thio group Chemical group 0.000 description 4
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 4
- 230000001588 bifunctional effect Effects 0.000 description 4
- PVEOYINWKBTPIZ-UHFFFAOYSA-N but-3-enoic acid Chemical compound OC(=O)CC=C PVEOYINWKBTPIZ-UHFFFAOYSA-N 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 125000002950 monocyclic group Chemical group 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 125000006017 1-propenyl group Chemical group 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- VJDDQSBNUHLBTD-GGWOSOGESA-N [(e)-but-2-enoyl] (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC(=O)\C=C\C VJDDQSBNUHLBTD-GGWOSOGESA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 125000004450 alkenylene group Chemical group 0.000 description 3
- 125000004419 alkynylene group Chemical group 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000011258 core-shell material Substances 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- LSACYLWPPQLVSM-UHFFFAOYSA-N isobutyric acid anhydride Chemical compound CC(C)C(=O)OC(=O)C(C)C LSACYLWPPQLVSM-UHFFFAOYSA-N 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 229920000768 polyamine Polymers 0.000 description 3
- 125000003367 polycyclic group Chemical group 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 125000006019 1-methyl-1-propenyl group Chemical group 0.000 description 2
- XUVKSPPGPPFPQN-UHFFFAOYSA-N 10-Methyl-9(10H)-acridone Chemical compound C1=CC=C2N(C)C3=CC=CC=C3C(=O)C2=C1 XUVKSPPGPPFPQN-UHFFFAOYSA-N 0.000 description 2
- FRPZMMHWLSIFAZ-UHFFFAOYSA-N 10-undecenoic acid Chemical compound OC(=O)CCCCCCCCC=C FRPZMMHWLSIFAZ-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000006020 2-methyl-1-propenyl group Chemical group 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- FVKFHMNJTHKMRX-UHFFFAOYSA-N 3,4,6,7,8,9-hexahydro-2H-pyrimido[1,2-a]pyrimidine Chemical compound C1CCN2CCCNC2=N1 FVKFHMNJTHKMRX-UHFFFAOYSA-N 0.000 description 2
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 2
- YYPNJNDODFVZLE-UHFFFAOYSA-N 3-methylbut-2-enoic acid Chemical compound CC(C)=CC(O)=O YYPNJNDODFVZLE-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 229920002565 Polyethylene Glycol 400 Polymers 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- IBVAQQYNSHJXBV-UHFFFAOYSA-N adipic acid dihydrazide Chemical compound NNC(=O)CCCCC(=O)NN IBVAQQYNSHJXBV-UHFFFAOYSA-N 0.000 description 2
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 2
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- KHAVLLBUVKBTBG-UHFFFAOYSA-N caproleic acid Natural products OC(=O)CCCCCCCC=C KHAVLLBUVKBTBG-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- 125000002993 cycloalkylene group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 150000002314 glycerols Chemical class 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- 125000000654 isopropylidene group Chemical group C(C)(C)=* 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 125000004957 naphthylene group Chemical group 0.000 description 2
- KPADFPAILITQBG-UHFFFAOYSA-N non-4-ene Chemical compound CCCCC=CCCC KPADFPAILITQBG-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 239000012766 organic filler Substances 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- JLFNLZLINWHATN-UHFFFAOYSA-N pentaethylene glycol Chemical compound OCCOCCOCCOCCOCCO JLFNLZLINWHATN-UHFFFAOYSA-N 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 150000003459 sulfonic acid esters Chemical class 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- VJDDQSBNUHLBTD-UHFFFAOYSA-N trans-crotonic acid-anhydride Natural products CC=CC(=O)OC(=O)C=CC VJDDQSBNUHLBTD-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- 229960002703 undecylenic acid Drugs 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- 0 *CC(*)(CO*ON)O* Chemical compound *CC(*)(CO*ON)O* 0.000 description 1
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- HLVFKOKELQSXIQ-UHFFFAOYSA-N 1-bromo-2-methylpropane Chemical compound CC(C)CBr HLVFKOKELQSXIQ-UHFFFAOYSA-N 0.000 description 1
- MPPPKRYCTPRNTB-UHFFFAOYSA-N 1-bromobutane Chemical compound CCCCBr MPPPKRYCTPRNTB-UHFFFAOYSA-N 0.000 description 1
- MYMSJFSOOQERIO-UHFFFAOYSA-N 1-bromodecane Chemical compound CCCCCCCCCCBr MYMSJFSOOQERIO-UHFFFAOYSA-N 0.000 description 1
- MNDIARAMWBIKFW-UHFFFAOYSA-N 1-bromohexane Chemical compound CCCCCCBr MNDIARAMWBIKFW-UHFFFAOYSA-N 0.000 description 1
- VMKOFRJSULQZRM-UHFFFAOYSA-N 1-bromooctane Chemical compound CCCCCCCCBr VMKOFRJSULQZRM-UHFFFAOYSA-N 0.000 description 1
- SQCZQTSHSZLZIQ-UHFFFAOYSA-N 1-chloropentane Chemical compound CCCCCCl SQCZQTSHSZLZIQ-UHFFFAOYSA-N 0.000 description 1
- OEZKDMYTQDZSAZ-UHFFFAOYSA-N 1-hydroxythioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2O OEZKDMYTQDZSAZ-UHFFFAOYSA-N 0.000 description 1
- QFDDZIRGHKFRMR-UHFFFAOYSA-N 10-butylacridin-9-one Chemical compound C1=CC=C2N(CCCC)C3=CC=CC=C3C(=O)C2=C1 QFDDZIRGHKFRMR-UHFFFAOYSA-N 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- DVVXXHVHGGWWPE-UHFFFAOYSA-N 2-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=CC=C1C(O)=O DVVXXHVHGGWWPE-UHFFFAOYSA-N 0.000 description 1
- UIERETOOQGIECD-ARJAWSKDSA-M 2-Methyl-2-butenoic acid Natural products C\C=C(\C)C([O-])=O UIERETOOQGIECD-ARJAWSKDSA-M 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000000069 2-butynyl group Chemical group [H]C([H])([H])C#CC([H])([H])* 0.000 description 1
- 125000006040 2-hexenyl group Chemical group 0.000 description 1
- ANHLDZMOXDYFMQ-UHFFFAOYSA-N 2-hydroxythioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(O)=CC=C3SC2=C1 ANHLDZMOXDYFMQ-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 125000006024 2-pentenyl group Chemical group 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- AGIJRRREJXSQJR-UHFFFAOYSA-N 2h-thiazine Chemical group N1SC=CC=C1 AGIJRRREJXSQJR-UHFFFAOYSA-N 0.000 description 1
- XYXBMCIMPXOBLB-UHFFFAOYSA-N 3,4,5-tris(dimethylamino)-2-methylphenol Chemical compound CN(C)C1=CC(O)=C(C)C(N(C)C)=C1N(C)C XYXBMCIMPXOBLB-UHFFFAOYSA-N 0.000 description 1
- 125000000474 3-butynyl group Chemical group [H]C#CC([H])([H])C([H])([H])* 0.000 description 1
- 125000006041 3-hexenyl group Chemical group 0.000 description 1
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- YDIYEOMDOWUDTJ-UHFFFAOYSA-N 4-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(C(O)=O)C=C1 YDIYEOMDOWUDTJ-UHFFFAOYSA-N 0.000 description 1
- 125000006042 4-hexenyl group Chemical group 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- UIERETOOQGIECD-UHFFFAOYSA-N Angelic acid Natural products CC=C(C)C(O)=O UIERETOOQGIECD-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 239000007848 Bronsted acid Chemical class 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical class NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 235000002597 Solanum melongena Nutrition 0.000 description 1
- LINDOXZENKYESA-UHFFFAOYSA-N TMG Natural products CNC(N)=NC LINDOXZENKYESA-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-O Thiophenium Chemical class [SH+]1C=CC=C1 YTPLMLYBLZKORZ-UHFFFAOYSA-O 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- RYXZOQOZERSHHQ-UHFFFAOYSA-N [2-(2-diphenylphosphanylphenoxy)phenyl]-diphenylphosphane Chemical compound C=1C=CC=C(P(C=2C=CC=CC=2)C=2C=CC=CC=2)C=1OC1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RYXZOQOZERSHHQ-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- FZEYVTFCMJSGMP-UHFFFAOYSA-N acridone Chemical class C1=CC=C2C(=O)C3=CC=CC=C3NC2=C1 FZEYVTFCMJSGMP-UHFFFAOYSA-N 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- GUNJVIDCYZYFGV-UHFFFAOYSA-K antimony trifluoride Chemical compound F[Sb](F)F GUNJVIDCYZYFGV-UHFFFAOYSA-K 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- UENWRTRMUIOCKN-UHFFFAOYSA-N benzyl thiol Chemical class SCC1=CC=CC=C1 UENWRTRMUIOCKN-UHFFFAOYSA-N 0.000 description 1
- WGQKYBSKWIADBV-UHFFFAOYSA-O benzylaminium Chemical compound [NH3+]CC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-O 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- YHASWHZGWUONAO-UHFFFAOYSA-N butanoyl butanoate Chemical compound CCCC(=O)OC(=O)CCC YHASWHZGWUONAO-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical class [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- UURSXESKOOOTOV-UHFFFAOYSA-N dec-5-ene Chemical compound CCCCC=CCCCC UURSXESKOOOTOV-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical class C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical class OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- RXFZJKXZSLVQJV-UHFFFAOYSA-N icosa-8,12-dienedihydrazide Chemical compound NNC(=O)CCCCCCC=CCCC=CCCCCCCC(=O)NN RXFZJKXZSLVQJV-UHFFFAOYSA-N 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- MGKYTFDYDXZTEM-UHFFFAOYSA-N n,n-dibutyl-2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepin-10-amine Chemical compound CCCCN(CCCC)C1CCCCN2CCCN=C12 MGKYTFDYDXZTEM-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 229940105570 ornex Drugs 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-N pent-4-enoic acid Chemical compound OC(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- FAQJJMHZNSSFSM-UHFFFAOYSA-N phenylglyoxylic acid Chemical class OC(=O)C(=O)C1=CC=CC=C1 FAQJJMHZNSSFSM-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 125000001325 propanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 125000005920 sec-butoxy group Chemical group 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000004334 sorbic acid Substances 0.000 description 1
- 235000010199 sorbic acid Nutrition 0.000 description 1
- 229940075582 sorbic acid Drugs 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000012222 talc Nutrition 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- RAOIDOHSFRTOEL-UHFFFAOYSA-O thiolan-1-ium Chemical class C1CC[SH+]C1 RAOIDOHSFRTOEL-UHFFFAOYSA-O 0.000 description 1
- UIERETOOQGIECD-ONEGZZNKSA-N tiglic acid Chemical compound C\C=C(/C)C(O)=O UIERETOOQGIECD-ONEGZZNKSA-N 0.000 description 1
- UAXOELSVPTZZQG-UHFFFAOYSA-N tiglic acid Natural products CC(C)=C(C)C(O)=O UAXOELSVPTZZQG-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- 150000005691 triesters Chemical class 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- KCTAHLRCZMOTKM-UHFFFAOYSA-N tripropylphosphane Chemical compound CCCP(CCC)CCC KCTAHLRCZMOTKM-UHFFFAOYSA-N 0.000 description 1
- CMLWFCUAXGSMBB-UHFFFAOYSA-N tris(2,6-dimethoxyphenyl)phosphane Chemical compound COC1=CC=CC(OC)=C1P(C=1C(=CC=CC=1OC)OC)C1=C(OC)C=CC=C1OC CMLWFCUAXGSMBB-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- LFNXCUNDYSYVJY-UHFFFAOYSA-N tris(3-methylphenyl)phosphane Chemical compound CC1=CC=CC(P(C=2C=C(C)C=CC=2)C=2C=C(C)C=CC=2)=C1 LFNXCUNDYSYVJY-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
- C08G59/1461—Unsaturated monoacids
- C08G59/1466—Acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Nonlinear Science (AREA)
- General Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Emergency Medicine (AREA)
- Epoxy Resins (AREA)
- Liquid Crystal (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Description
本発明は、変性樹脂及びそれを含む硬化性樹脂組成物に関する。 The present invention relates to a modified resin and a curable resin composition containing the same.
液晶表示素子の製造方法において、滴下工法は真空下でシール剤の閉ループ内に液晶を直接滴下、貼り合わせ、真空開放を行うことでパネルを作成することができる工法である。この滴下工法では、液晶の使用量の低減、液晶のパネルへの注入時間の短縮等のメリットが数多くあり、現在の大型基板を使った液晶パネルの製造方法として主流となっている。滴下工法を含む方法では、シール剤を例えばディスペンサーを用いて塗布し、液晶を滴下して、貼り合わせた後、ギャップだし、位置あわせを行い、シール剤の硬化をエネルギー線硬化及び/又は熱硬化により行っている。 In the manufacturing method of a liquid crystal display element, the dropping method is a method in which a panel can be formed by directly dropping and bonding liquid crystal in a closed loop of a sealing agent under vacuum and releasing the vacuum. This dripping method has many merits such as a reduction in the amount of liquid crystal used and a time required for injecting the liquid crystal into the panel, and has become the mainstream method for manufacturing a liquid crystal panel using a large substrate. In the method including the dripping method, for example, a sealant is applied using, for example, a dispenser, liquid crystal is dropped and bonded, a gap is formed, alignment is performed, and the sealant is cured by energy ray curing and / or heat curing. It is done by.
特許文献1には、シール剤の原料として、二官能のフェノールノボラック型エポキシ樹脂を(メタ)アクリル酸誘導体で部分変性することにより、液晶の配向特性を改善することが提案されている。また、特許文献2には、シール剤の原料として、二官能のビスフェノールA型エポキシ樹脂とエチレングリコールとを反応させて得られるエポキシ樹脂のエチレングリコール開環体の水酸基をグリシジルオキシ化した、下記式で示されるエポキシ樹脂、及びこのエポキシ樹脂を(メタ)アクリル酸誘導体で部分変性した(メタ)アクリレート樹脂が提案されている。 Patent Document 1 proposes improving the alignment characteristics of liquid crystal by partially modifying a bifunctional phenol novolac type epoxy resin with a (meth) acrylic acid derivative as a raw material of the sealing agent. Patent Document 2 discloses that, as a raw material for a sealing agent, a hydroxyl group of an ethylene glycol ring-opened product of an epoxy resin obtained by reacting a bifunctional bisphenol A type epoxy resin and ethylene glycol is glycidyloxylated. And a (meth) acrylate resin obtained by partially modifying the epoxy resin with a (meth) acrylic acid derivative.
本発明者らの知見によれば、特許文献1及び2に記載された(メタ)アクリレート樹脂は、液晶表示素子の基材同士を貼り合せたときに、接着強度が低いという問題があった。本発明は、基材同士を貼り合せたときに、高い接着強度を発揮する、変性樹脂及びそれを含む硬化性樹脂組成物を提供することを課題とする。 According to the knowledge of the present inventors, the (meth) acrylate resin described in Patent Documents 1 and 2 has a problem that the adhesive strength is low when the substrates of the liquid crystal display element are bonded together. An object of the present invention is to provide a modified resin and a curable resin composition containing the same that exhibit high adhesive strength when substrates are bonded to each other.
本発明は以下の構成を有する。
[1]分子中に、下記式(1−1)で表される基及び下記式(1−2)で表される基からなる群より選択される1以上の基を有し、且つ、下記式(2−1)で表される基、下記式(2−2)で表される基及び下記式(2−3)で表される基からなる群より選択される1以上の基を有する、変性樹脂と、
熱硬化剤及び/又は重合開始剤と
を含有することを特徴とする、硬化性樹脂組成物。
〔式中、
R1、R2、R3、R4、R5、R6及びR7は、それぞれ独立に、水素原子又はメチル基であり、
R21は、アルキル基、アルケニル基、アルキニル基又はアリール基であり、
R22及びR23は、それぞれ独立に、アルキル基、アルケニル基、アルキニル基又はアリール基であるか、R22及びR23は、一緒になって、環構造を形成し、
X1は、酸素原子又は硫黄原子であり、
R24は、アルキル基、アルケニル基、アルキニル基又はアリール基であるが、
但し、R21、R22及びR23は、ビニル基又は1−メチルビニル基ではない。〕
[2]下記式(3)で表される、変性樹脂。
Ar1(−O−A1)n1 (3)
〔式中、
Ar1は、炭素原子数、及びヘテロ原子数の合計が5以上であり、且つ1つ以上の芳香環、又はヘテロ芳香環を含むn1価の基であり、
n1は、1以上であり、
A1は、独立に、水素原子、下記式(1−1)で表される基、下記式(1−2)で表される基、下記式(2−1)で表される基、下記式(2−2)で表される基、下記式(2−3)で表される基、式(4−1)で表される基、又は、式(4−2)で表される基であるが、
但し、分子中に、式(1−1)で表される基又は式(1−2)で表される基を有する式(4−1)で表される基;式(1−1)で表される基及び/又は式(1−2)で表される基を有する式(4−2)で表される基;式(1−1)で表される基;及び式(1−2)で表される基からなる群より選択される1以上の基を有し、且つ、
式(2−1)で表される基、式(2−2)で表される基又は式(2−3)で表される基を有する式(4−1)で表される基;式(2−1)で表される基、式(2−2)で表される基及び/又は式(2−3)で表される基を有する式(4−2)で表される基;式(2−1)で表される基;式(2−2)で表される基;及び式(2−3)で表される基からなる群より選択される1以上の基を有する。〕
R1、R2、R3、R4、R5、R6、R7及びR8は、それぞれ独立に、水素原子又はメチル基であり、
R21は、アルキル基、アルケニル基、アルキニル基又はアリール基であり、
R22及びR23は、それぞれ独立に、アルキル基、アルケニル基、アルキニル基又はアリール基であるか、R22及びR23は、一緒になって、環構造を形成し、
X1は、酸素原子又は硫黄原子であり、
R24は、アルキル基、アルケニル基、アルキニル基又はアリール基であるが、
但し、R21、R22及びR23は、ビニル基又は1−メチルビニル基ではなく、
B1は、独立して、アルキレン基であり、m1は、1以上であり、
D1は、アリーレン基、アルキレン−アリーレン−アルキレン基、アルキレン−アリーレン基、アリーレン−アルキレン−アリーレン基又は基:−B2−(O−B2)m2−であり、B2は、独立に、アルキレン基であり、m2は、0又は1以上であり、
C1、C2及びC3は、それぞれ独立に、水素原子、式(1−1)で表される基、式(1−2)で表される基、式(2−1)で表される基、式(2−2)で表される基又は式(2−3)で表される基である。〕
[3]変性樹脂が、[2]の変性樹脂である、[1]の硬化性樹脂組成物。
[4]更に、エポキシ樹脂(但し、(メタ)アクリロイル基を有するエポキシ樹脂を除く)、エポキシ樹脂のエポキシ基の一部又は全部が(メタ)アクリル酸無水物で変性された変性エポキシ樹脂、エポキシ樹脂のエポキシ基の全部が変性化合物で変性された変性エポキシ樹脂からなる群より選択される1以上の樹脂を含み、
ここで前記変性化合物は、カルボン酸(但し、(メタ)アクリル酸を除く)、カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)、アルコール及びチオールからなる群より選択される1以上の化合物である、[1]又は[3]の硬化性樹脂組成物。
[5]液晶用シール剤である、[1]、[3]又は[4]の硬化性樹脂組成物。
[6]エポキシ樹脂と、必須成分としての変性化合物と、任意成分としての(メタ)アクリル酸無水物とを反応させる工程を含み、ここで、前記変性化合物は、カルボン酸(但し、(メタ)アクリル酸を除く)、カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)、アルコール及びチオールからなる群より選択される1種以上の化合物である、[2]の変性樹脂の製造方法。
The present invention has the following configuration.
[1] The molecule has one or more groups selected from the group consisting of a group represented by the following formula (1-1) and a group represented by the following formula (1-2), and Having one or more groups selected from the group consisting of a group represented by the formula (2-1), a group represented by the following formula (2-2), and a group represented by the following formula (2-3) A modified resin,
A curable resin composition comprising a thermosetting agent and / or a polymerization initiator.
[Where,
R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 are each independently a hydrogen atom or a methyl group,
R 21 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
R 22 and R 23 are each independently an alkyl group, alkenyl group, alkynyl group or aryl group, or R 22 and R 23 together form a ring structure;
X 1 is an oxygen atom or a sulfur atom,
R 24 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
However, R 21 , R 22 and R 23 are not a vinyl group or a 1-methylvinyl group. ]
[2] A modified resin represented by the following formula (3).
Ar 1 (—O—A 1 ) n1 (3)
[Where,
Ar 1 is an n1 valent group having a total number of carbon atoms and heteroatoms of 5 or more, and including one or more aromatic rings or heteroaromatic rings,
n1 is 1 or more,
A 1 is independently a hydrogen atom, a group represented by the following formula (1-1), a group represented by the following formula (1-2), a group represented by the following formula (2-1), the following A group represented by the formula (2-2), a group represented by the following formula (2-3), a group represented by the formula (4-1), or a group represented by the formula (4-2) In Although,
However, in the molecule, a group represented by formula (4-1) having a group represented by formula (1-1) or a group represented by formula (1-2); A group represented by formula (4-2) having a group represented by formula (1-2) and / or a group represented by formula (1-2); a group represented by formula (1-1); and formula (1-2) And one or more groups selected from the group consisting of groups represented by:
A group represented by formula (4-1) having a group represented by formula (2-1), a group represented by formula (2-2), or a group represented by formula (2-3); A group represented by formula (4-2) having a group represented by (2-1), a group represented by formula (2-2) and / or a group represented by formula (2-3); It has one or more groups selected from the group consisting of a group represented by formula (2-1); a group represented by formula (2-2); and a group represented by formula (2-3). ]
R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently a hydrogen atom or a methyl group,
R 21 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
R 22 and R 23 are each independently an alkyl group, alkenyl group, alkynyl group or aryl group, or R 22 and R 23 together form a ring structure;
X 1 is an oxygen atom or a sulfur atom,
R 24 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
However, R 21 , R 22 and R 23 are not vinyl groups or 1-methylvinyl groups,
B 1 is independently an alkylene group, m 1 is 1 or more,
D 1 is an arylene group, an alkylene-arylene-alkylene group, an alkylene-arylene group, an arylene-alkylene-arylene group or a group: —B 2 — (O—B 2 ) m2 —, and B 2 is independently An alkylene group, m2 is 0 or 1 or more,
C 1 , C 2 and C 3 are each independently represented by a hydrogen atom, a group represented by the formula (1-1), a group represented by the formula (1-2), or a formula (2-1). A group represented by formula (2-2) or a group represented by formula (2-3). ]
[3] The curable resin composition of [1], wherein the modified resin is the modified resin of [2].
[4] Further, epoxy resins (except for epoxy resins having (meth) acryloyl groups), modified epoxy resins in which a part or all of the epoxy groups of the epoxy resin are modified with (meth) acrylic anhydride, epoxy Including one or more resins selected from the group consisting of modified epoxy resins in which all of the epoxy groups of the resin are modified with a modifying compound;
Here, the modifying compound is selected from the group consisting of carboxylic acid (excluding (meth) acrylic acid), carboxylic anhydride (excluding (meth) acrylic anhydride), alcohol and thiol. The curable resin composition according to [1] or [3], which is the above compound.
[5] The curable resin composition according to [1], [3] or [4], which is a liquid crystal sealant.
[6] A step of reacting an epoxy resin, a modified compound as an essential component, and (meth) acrylic anhydride as an optional component, wherein the modified compound is a carboxylic acid (provided that (meth) Production of a modified resin according to [2], which is one or more compounds selected from the group consisting of carboxylic acid anhydrides (excluding (meth) acrylic anhydrides), alcohols and thiols, excluding acrylic acid). Method.
本発明によれば、基材同士を貼り合せたときに、高い接着強度を発揮する、変性樹脂及びそれを含む硬化性樹脂組成物が提供される。 ADVANTAGE OF THE INVENTION According to this invention, when a base material is bonded together, the modified resin and curable resin composition containing the same which exhibit high adhesive strength are provided.
以下、本発明の好適な実施形態について説明する。
[明細書の定義]
本明細書において、「グリシジル基」とは、2,3−エポキシプロピル基を意味する。本明細書において、「メチルグリシジル基」とは、2,3−エポキシ−2−メチルプロピル基を意味する。本明細書において「エポキシ基」とは、グリシジル基及びメチルグリシジル基の少なくとも一方を含む。本明細書において「(メタ)アクリロイル基」とは、アクリロイル基(CH2=CH2−C(=O)−)及びメタクリロイル基(CH2=CH(CH3)−C(=O)−)の少なくとも一方を含む。「置換されていてもよい」とは、「置換又は非置換」を意味する。
Hereinafter, preferred embodiments of the present invention will be described.
[Definition of statement]
In the present specification, the “glycidyl group” means a 2,3-epoxypropyl group. In the present specification, the “methyl glycidyl group” means a 2,3-epoxy-2-methylpropyl group. In this specification, the “epoxy group” includes at least one of a glycidyl group and a methylglycidyl group. In this specification, “(meth) acryloyl group” means an acryloyl group (CH 2 ═CH 2 —C (═O) —) and a methacryloyl group (CH 2 ═CH (CH 3 ) —C (═O) —). At least one of the above. “Optionally substituted” means “substituted or unsubstituted”.
本明細書において「〜」を用いて示された数値範囲は、「〜」の前後に記載される数値をそれぞれ最小値及び最大値として含む範囲を示す。本明細書において組成物中の各成分の量は、組成物中に各成分に該当する物質が複数存在する場合、特に断らない限り、組成物中に存在する当該複数の物質の合計量を意味する。本明細書において「工程」との語は、独立した工程だけではなく、他の工程と明確に区別できない場合であってもその工程の所期の目的が達成されれば、本用語に含まれる。 In the present specification, a numerical range indicated using “to” indicates a range including the numerical values described before and after “to” as the minimum value and the maximum value, respectively. In the present specification, the amount of each component in the composition means the total amount of the plurality of substances present in the composition unless there is a specific notice when there are a plurality of substances corresponding to each component in the composition. To do. In this specification, the term “process” is not limited to an independent process, and is included in the term if the intended purpose of the process is achieved even when it cannot be clearly distinguished from other processes. .
本明細書において、単独で又は他の用語との組み合わせにおいて、「アルキル基」は、直鎖状又は分岐状である、1価の基である。アルキル基の炭素原子数は、1〜20であるのが好ましく、1〜18であるのがより好ましく、1〜10であるのが更に好ましく、1〜4であるのが特に好ましい。アルキル基は、メチル基、エチル基、プロピル基、i−プロピル基、n−ブチル基、i−ブチル基、sec−ブチル基、tert−ブチル基、n−ペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基、n−ウンデシル基、n−ドデシル基等が挙げられる。 In this specification, alone or in combination with other terms, an “alkyl group” is a monovalent group that is linear or branched. The number of carbon atoms in the alkyl group is preferably 1-20, more preferably 1-18, still more preferably 1-10, and particularly preferably 1-4. The alkyl group is methyl group, ethyl group, propyl group, i-propyl group, n-butyl group, i-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, n-hexyl group, n- A heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, etc. are mentioned.
本明細書において、単独で又は他の用語との組み合わせにおいて、「アルキレン基」は、直鎖状又は分岐状である、2価の基である。アルキレン基の炭素原子数は、1〜20であるのが好ましく、1〜8であるのが特に好ましい。アルキレン基は、メチレン基、エチレン基、エチリデン基(エタン−1,1−ジイル基)、トリメチレン基、プロピレン基(プロパン−1,2−ジイル基)、プロピリデン基(プロパン−1,1−ジイル基)、イソプロピリデン基(プロパン−2,2−ジイル基)、テトラメチレン基、ブチリデン基(ブタン−1,1−ジイル基)、イソブチリデン基(2−メチルプロパン−1,1−ジイル基)、ペンタメチレン基、2−メチルペンタン−1,5−ジイル基、ヘキサメチレン基、2−エチルヘキサン−1,6−ジイル基、ヘプタメチレン基、オクタメチレン基等が挙げられる。 In this specification, alone or in combination with other terms, an “alkylene group” is a divalent group that is linear or branched. The number of carbon atoms of the alkylene group is preferably 1-20, and particularly preferably 1-8. The alkylene group includes a methylene group, an ethylene group, an ethylidene group (ethane-1,1-diyl group), a trimethylene group, a propylene group (propane-1,2-diyl group), and a propylidene group (propane-1,1-diyl group). ), Isopropylidene group (propane-2,2-diyl group), tetramethylene group, butylidene group (butane-1,1-diyl group), isopropylidene group (2-methylpropane-1,1-diyl group), penta Examples include methylene group, 2-methylpentane-1,5-diyl group, hexamethylene group, 2-ethylhexane-1,6-diyl group, heptamethylene group, octamethylene group and the like.
本明細書において、単独で又は他の用語との組み合わせにおいて、「アルケニル基」は、直鎖状又は分岐状である、1価の基である。アルケニル基が有する不飽和結合の数は、1〜5であるのが好ましく、1又は2であるのが特に好ましい。アルケニル基は、炭素原子数が2〜20であるのが好ましく、3〜20であるのがより好ましく、3〜15であるのが更に好ましく、3〜10であるのが特に好ましい。また、アルケニル基がビニル基又は1−メチルビニル基を含む場合、アルケニル基は、炭素原子数が2〜20であってもよく、2〜15であってもよく、2〜10であってもよい。アルケニル基は、ビニル基、1−メチルビニル基、1−プロペニル基、2−プロペニル基、1−メチル−1−プロペニル基、2−メチル−1−プロペニル基、2−ブテニル基、3−ブテニル基、2−ペンテニル基、3−ペンテニル基、4−ペンテニル基、2−ヘキセニル基、3−ヘキセニル基、4−ヘキセニル基、5−ヘキセニル基、9−デセニル基等が挙げられる。 In this specification, alone or in combination with other terms, an “alkenyl group” is a monovalent group that is linear or branched. The number of unsaturated bonds that the alkenyl group has is preferably 1 to 5, particularly preferably 1 or 2. The alkenyl group preferably has 2 to 20 carbon atoms, more preferably 3 to 20 carbon atoms, still more preferably 3 to 15 carbon atoms, and particularly preferably 3 to 10 carbon atoms. When the alkenyl group includes a vinyl group or a 1-methylvinyl group, the alkenyl group may have 2 to 20 carbon atoms, 2 to 15 carbon atoms, or 2 to 10 carbon atoms. Good. Alkenyl groups are vinyl, 1-methylvinyl, 1-propenyl, 2-propenyl, 1-methyl-1-propenyl, 2-methyl-1-propenyl, 2-butenyl, and 3-butenyl. 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 2-hexenyl group, 3-hexenyl group, 4-hexenyl group, 5-hexenyl group, 9-decenyl group and the like.
本明細書において、単独で又は他の用語との組み合わせにおいて、「アルキニル基」は、直鎖状又は分岐状である、1価の基である。アルキニル基の炭素原子数は、2〜20であるのが好ましく、2〜15であるのが特に好ましい。アルキニル基は、エチニル基、プロパルギル基、2−ブチニル基、3−ブチニル基、2−ペンチニル基、3−ペンチニル基、4−ペンチニル基、2−ヘキシニル基、3−ヘキシニル基、4−ヘキシニル基、5−ヘキシニル基等が挙げられる。 As used herein, alone or in combination with other terms, an “alkynyl group” is a monovalent group that is linear or branched. The number of carbon atoms of the alkynyl group is preferably 2-20, and particularly preferably 2-15. Alkynyl group includes ethynyl group, propargyl group, 2-butynyl group, 3-butynyl group, 2-pentynyl group, 3-pentynyl group, 4-pentynyl group, 2-hexynyl group, 3-hexynyl group, 4-hexynyl group, 5-hexynyl group etc. are mentioned.
アルキル基、アルキレン基、アルケニル基及びアルキニル基は、置換基により置換されていてもよい。置換基は、特に限定されず、ハロゲン原子、アミノ基等が挙げられる。 The alkyl group, alkylene group, alkenyl group and alkynyl group may be substituted with a substituent. The substituent is not particularly limited, and examples thereof include a halogen atom and an amino group.
本明細書において、単独で又は他の用語との組み合わせにおいて、「アリール基」は、単環又は多環の芳香族環を有する1価の基である。アリール基の炭素原子数は、6〜20であるのが好ましい。アリール基は、フェニル基、ビフェニリル基、ナフチル基、ターフェニリル基、アントラセニル基、フルオレニル基等が挙げられ、フェニル基が好ましい。 In this specification, alone or in combination with other terms, the “aryl group” is a monovalent group having a monocyclic or polycyclic aromatic ring. The aryl group preferably has 6 to 20 carbon atoms. Examples of the aryl group include a phenyl group, a biphenylyl group, a naphthyl group, a terphenylyl group, an anthracenyl group, a fluorenyl group, and the like, and a phenyl group is preferable.
本明細書において、単独で又は他の用語との組み合わせにおいて、「アリーレン基」は、単環又は多環の芳香族環を有する2価の基である。アリーレン基の炭素原子数は、6〜20であるのが好ましい。アリーレン基は、フェニレン基、ナフチレン基、アントラニレン基、フェナントラニレン基等が挙げられ、フェニレン基、ナフチレン基が好ましい。 In this specification, alone or in combination with other terms, the “arylene group” is a divalent group having a monocyclic or polycyclic aromatic ring. The number of carbon atoms in the arylene group is preferably 6-20. Examples of the arylene group include a phenylene group, a naphthylene group, an anthranylene group, and a phenanthranylene group, and a phenylene group and a naphthylene group are preferable.
アリール基及びアリーレン基は置換基により置換されていてもよい。置換基は、特に限定されず、アルキル基、アルコキシ基、アルキルカルボニル基、アルキルメルカプト基、シクロアルキル基、ハロゲン原子が挙げられる。アルキル基は、炭素原子数が1〜4であるのが好ましい。アルコキシ基におけるアルキル部分は、炭素原子数が1〜4であるアルキル基が好ましい。アルコキシ基として、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、n−ブトキシ基、i−ブトキシ基、sec−ブトキシ基、tert−ブトキシ基等が挙げられる。アルキルカルボニル基及びアルキルメルカプト基におけるアルキル部分は、炭素原子数が1〜4であるアルキル基が好ましい。アルキルカルボニル基として、アセチル基、プロパノイル基、2−メチルプロパノイル基、ブタノイル基等が挙げられる。アルキルメルカプト基として、メチルメルカプト基、エチルメルカプト基、プロピルメルカプト基、i−プロピルメルカプト基、ブチルメルカプト基、i−ブチルメルカプト基、sec−ブチルメルカプト基、tert−ブチルメルカプト基等が挙げられる。シクロアルキル基は、炭素原子数3〜20の単環又は多環の脂肪族炭化水素基であり、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基、シクロデシル基、シクロドデシル基、アダマンチル基等が挙げられる。 The aryl group and the arylene group may be substituted with a substituent. The substituent is not particularly limited, and examples thereof include an alkyl group, an alkoxy group, an alkylcarbonyl group, an alkyl mercapto group, a cycloalkyl group, and a halogen atom. The alkyl group preferably has 1 to 4 carbon atoms. The alkyl part in the alkoxy group is preferably an alkyl group having 1 to 4 carbon atoms. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, an n-butoxy group, an i-butoxy group, a sec-butoxy group, and a tert-butoxy group. The alkyl moiety in the alkylcarbonyl group and the alkyl mercapto group is preferably an alkyl group having 1 to 4 carbon atoms. Examples of the alkylcarbonyl group include an acetyl group, a propanoyl group, a 2-methylpropanoyl group, and a butanoyl group. Examples of the alkyl mercapto group include methyl mercapto group, ethyl mercapto group, propyl mercapto group, i-propyl mercapto group, butyl mercapto group, i-butyl mercapto group, sec-butyl mercapto group, tert-butyl mercapto group and the like. The cycloalkyl group is a monocyclic or polycyclic aliphatic hydrocarbon group having 3 to 20 carbon atoms, and includes a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecyl group, A cyclododecyl group, an adamantyl group, etc. are mentioned.
[硬化性樹脂組成物]
硬化性樹脂組成物は、分子中に、下記式(1−1)で表される基及び下記式(1−2)で表される基からなる群より選択される1以上の基を有し、且つ、下記式(2−1)で表される基、下記式(2−2)で表される基及び下記式(2−3)で表される基からなる群より選択される1以上の基を有する、変性樹脂と、熱硬化剤及び/又は重合開始剤とを含有する。
R1、R2、R3、R4、R5、R6及びR7は、それぞれ独立に、水素原子又はメチル基であり、
R21は、アルキル基、アルケニル基、アルキニル基又はアリール基であり、
R22及びR23は、それぞれ独立に、アルキル基、アルケニル基、アルキニル基又はアリール基であるか、R22及びR23は、一緒になって、環構造を形成し、
X1は、酸素原子又は硫黄原子であり、
R24は、アルキル基、アルケニル基、アルキニル基又はアリール基であるが、
但し、R21、R22及びR23は、ビニル基又は1−メチルビニル基ではない。〕
[Curable resin composition]
The curable resin composition has one or more groups selected from the group consisting of a group represented by the following formula (1-1) and a group represented by the following formula (1-2) in the molecule. And one or more selected from the group consisting of a group represented by the following formula (2-1), a group represented by the following formula (2-2), and a group represented by the following formula (2-3) A modified resin having a group of: a thermosetting agent and / or a polymerization initiator.
R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 are each independently a hydrogen atom or a methyl group,
R 21 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
R 22 and R 23 are each independently an alkyl group, alkenyl group, alkynyl group or aryl group, or R 22 and R 23 together form a ring structure;
X 1 is an oxygen atom or a sulfur atom,
R 24 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
However, R 21 , R 22 and R 23 are not a vinyl group or a 1-methylvinyl group. ]
(変性樹脂)
変性樹脂は、分子中に、式(1−1)で表される基及び式(1−2)で表される基からなる群より選択される1以上の基を有し、且つ、式(2−1)で表される基、式(2−2)で表される基及び式(2−3)で表される基からなる群より選択される1以上の基を有する(以下、「第一の変性樹脂」ともいう。)。
(Modified resin)
The modified resin has one or more groups selected from the group consisting of a group represented by the formula (1-1) and a group represented by the formula (1-2) in the molecule, and the formula ( 2-1), one or more groups selected from the group consisting of a group represented by formula (2-2) and a group represented by formula (2-3) (hereinafter referred to as “ Also referred to as “first modified resin”).
第一の変性樹脂が、式(1−1)で表される基及び式(1−2)で表される基からなる群より選択される1以上の基を有するため、エポキシ樹脂及び/又はエポキシ樹脂の(メタ)アクリル酸無水物変性樹脂としての特性を有する。また、第一の変性樹脂が、式(1−1)で表される基及び/又は式(1−2)で表される基に加えて、式(2−1)で表される基、式(2−2)で表される基及び式(2−3)で表される基からなる群より選択される1以上の基を有することにより、前記したエポキシ樹脂等の特性に加えて、変性化合物(即ち、カルボン酸(但し、(メタ)アクリル酸を除く)、カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)、アルコール及びチオールからなる群より選択される1種以上の化合物)によって付与される更なる特性も有することができる。 Since the first modified resin has one or more groups selected from the group consisting of the group represented by the formula (1-1) and the group represented by the formula (1-2), the epoxy resin and / or It has properties as a (meth) acrylic anhydride modified resin of epoxy resin. In addition to the group represented by Formula (1-1) and / or the group represented by Formula (1-2), the first modified resin is a group represented by Formula (2-1), By having one or more groups selected from the group consisting of the group represented by the formula (2-2) and the group represented by the formula (2-3), in addition to the properties of the above-described epoxy resin, One or more selected from the group consisting of modified compounds (that is, carboxylic acid (excluding (meth) acrylic acid), carboxylic acid anhydride (excluding (meth) acrylic anhydride), alcohol and thiol. It can also have further properties conferred by
式(1−1)で表される基、式(1−2)で表される基、式(2−1)で表される基、式(2−2)で表される基及び式(2−3)で表される基は、一価の基であり、こられの基における「*」は、結合位置を意味する。後述する式(4−1)で表される基、式(4−2)で表される基、式(4−3)で表される基及び式(4−4)で表される基についても同様である。 A group represented by formula (1-1), a group represented by formula (1-2), a group represented by formula (2-1), a group represented by formula (2-2), and a formula ( The group represented by 2-3) is a monovalent group, and “*” in these groups means a bonding position. About the group represented by formula (4-1), the group represented by formula (4-2), the group represented by formula (4-3), and the group represented by formula (4-4) described later Is the same.
式(2−2)において、一緒になって環構造を形成しているR22及びR23は、R22及びR23が結合するC(=O)OC*CH2OC(=O)基と一緒になって環構造を形成することを意味する。ここで、C*は、R6が結合する炭素原子である。この場合、−R22R23−は、特に限定されないが、アルキレン基;アルケニレン基;アルキニレン基;アリーレン基;シクロアルキレン基;アリーレン基若しくはシクロアルキレン基で中断されている、アルキレン基、アルケニレン基又はアルキニレン基等が挙げられる。ここで、アルケニレン基及びアルキニレン基は、アルケニル基及びアルキニル基から、1つの水素原子を除いた基が挙げられる。 In the formula (2-2), R 22 and R 23 which together form a ring structure are a C (═O) OC * CH 2 OC (═O) group to which R 22 and R 23 are bonded. It means to form a ring structure together. Here, C * is a carbon atom to which R 6 is bonded. In this case, -R 22 R 23 -is not particularly limited, but is an alkylene group; an alkenylene group; an alkynylene group; an arylene group; a cycloalkylene group; an alkylene group, an alkenylene group interrupted by an arylene group or a cycloalkylene group, or Alkynylene group etc. are mentioned. Here, examples of the alkenylene group and the alkynylene group include groups obtained by removing one hydrogen atom from an alkenyl group and an alkynyl group.
第一の変性樹脂において、式(1−1)で表される基、式(1−2)で表される基、式(2−1)で表される基、式(2−2)で表される基及び式(2−3)で表される基以外の部分は、任意であり、例えば、芳香族又は脂肪族の基であることができる。 In the first modified resin, a group represented by the formula (1-1), a group represented by the formula (1-2), a group represented by the formula (2-1), and a formula (2-2) The part other than the group represented by the group represented by formula (2-3) is arbitrary, and can be, for example, an aromatic or aliphatic group.
第一の変性樹脂としては、例えば下記式(3)で表される変性樹脂(以下、「第二の変性樹脂」ともいう。)が挙げられる。
Ar1(−O−A1)n1 (3)
〔式中、
Ar1は、炭素原子数、及びヘテロ原子数の合計が5以上であり、且つ1つ以上の芳香環、又はヘテロ芳香環を含むn1価の基であり、
n1は、1以上であり、
A1は、独立に、水素原子、下記式(1−1)で表される基、下記式(1−2)で表される基、下記式(2−1)で表される基、下記式(2−2)で表される基、下記式(2−3)で表される基、下記式(4−1)で表される基、又は、下記式(4−2)で表される基であるが、
但し、分子中に、式(1−1)で表される基又は式(1−2)で表される基を有する式(4−1)で表される基;式(1−1)で表される基及び/又は式(1−2)で表される基を有する式(4−2)で表される基;式(1−1)で表される基;及び式(1−2)で表される基からなる群より選択される1以上の基を有し、且つ、
式(2−1)で表される基、式(2−2)で表される基又は式(2−3)で表される基を有する式(4−1)で表される基;式(2−1)で表される基、式(2−2)で表される基及び/又は式(2−3)で表される基を有する式(4−2)で表される基;式(2−1)で表される基;式(2−2)で表される基;及び式(2−3)で表される基からなる群より選択される1以上の基を有する。〕
R1、R2、R3、R4、R5、R6、R7及びR8は、それぞれ独立に、水素原子又はメチル基であり、
R21は、アルキル基、アルケニル基、アルキニル基又はアリール基であり、
R22及びR23は、それぞれ独立に、アルキル基、アルケニル基、アルキニル基又はアリール基であるか、R22及びR23は、一緒になって、環構造を形成し、
X1は、酸素原子又は硫黄原子であり、
R24は、アルキル基、アルケニル基、アルキニル基又はアリール基であるが、
但し、R21、R22及びR23は、ビニル基又は1−メチルビニル基ではなく、
B1は、独立して、アルキレン基であり、m1は、1以上であり、
D1は、アリーレン基、アルキレン−アリーレン−アルキレン基、アルキレン−アリーレン基、アリーレン−アルキレン−アリーレン基又は基:−B2−(O−B2)m2−であり、B2は、独立に、アルキレン基であり、m2は、0又は1以上であり、
C1、C2及びC3は、それぞれ独立に、水素原子、式(1−1)で表される基、式(1−2)で表される基、式(2−1)で表される基、式(2−2)で表される基又は式(2−3)で表される基である。〕
Examples of the first modified resin include a modified resin represented by the following formula (3) (hereinafter also referred to as “second modified resin”).
Ar 1 (—O—A 1 ) n1 (3)
[Where,
Ar 1 is an n1 valent group having a total number of carbon atoms and heteroatoms of 5 or more, and including one or more aromatic rings or heteroaromatic rings,
n1 is 1 or more,
A 1 is independently a hydrogen atom, a group represented by the following formula (1-1), a group represented by the following formula (1-2), a group represented by the following formula (2-1), the following A group represented by the formula (2-2), a group represented by the following formula (2-3), a group represented by the following formula (4-1), or a group represented by the following formula (4-2). The group
However, in the molecule, a group represented by formula (4-1) having a group represented by formula (1-1) or a group represented by formula (1-2); A group represented by formula (4-2) having a group represented by formula (1-2) and / or a group represented by formula (1-2); a group represented by formula (1-1); and formula (1-2) And one or more groups selected from the group consisting of groups represented by:
A group represented by formula (4-1) having a group represented by formula (2-1), a group represented by formula (2-2), or a group represented by formula (2-3); A group represented by formula (4-2) having a group represented by (2-1), a group represented by formula (2-2) and / or a group represented by formula (2-3); It has one or more groups selected from the group consisting of a group represented by formula (2-1); a group represented by formula (2-2); and a group represented by formula (2-3). ]
R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently a hydrogen atom or a methyl group,
R 21 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
R 22 and R 23 are each independently an alkyl group, alkenyl group, alkynyl group or aryl group, or R 22 and R 23 together form a ring structure;
X 1 is an oxygen atom or a sulfur atom,
R 24 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
However, R 21 , R 22 and R 23 are not vinyl groups or 1-methylvinyl groups,
B 1 is independently an alkylene group, m 1 is 1 or more,
D 1 is an arylene group, an alkylene-arylene-alkylene group, an alkylene-arylene group, an arylene-alkylene-arylene group or a group: —B 2 — (O—B 2 ) m2 —, and B 2 is independently An alkylene group, m2 is 0 or 1 or more,
C 1 , C 2 and C 3 are each independently represented by a hydrogen atom, a group represented by the formula (1-1), a group represented by the formula (1-2), or a formula (2-1). A group represented by formula (2-2) or a group represented by formula (2-3). ]
式(3)において、n1は1〜8であるのが好ましく、1〜4であるのが特に好ましい。 In Formula (3), n1 is preferably 1 to 8, and particularly preferably 1 to 4.
式(3)において、Ar1に含まれる炭素原子数が4〜40であり、酸素原子数が0〜5であり、窒素原子数が0〜5であり、硫黄原子数が0〜5であり、且つAr1に含まれる環構造の数が1〜5であるのが好ましい。 In Formula (3), the number of carbon atoms contained in Ar 1 is 4 to 40, the number of oxygen atoms is 0 to 5, the number of nitrogen atoms is 0 to 5, and the number of sulfur atoms is 0 to 5. And the number of ring structures contained in Ar 1 is preferably 1 to 5.
Ar1に含まれる環構造(芳香環及びヘテロ芳香環)は、1種単独であっても2種以上で複数存在してもよく、前記環構造は単環構造であっても縮合環構造であってもよい。また、これらの環構造は直接結合又は連結基を介して結合して複数存在してもよい。 The ring structure (aromatic ring and heteroaromatic ring) contained in Ar 1 may be one kind alone, or two or more kinds may be present, and the ring structure may be a monocyclic structure or a condensed ring structure. There may be. A plurality of these ring structures may be bonded to each other through a direct bond or a linking group.
この連結基の例として、炭素数1〜4のアルキレン基、炭素数2〜4のアルキリデン基、エーテル基、エステル基、ケト基、スルフィド基、スルホニル基等が挙げられる。また、式(3)において、Ar1に結合する酸素原子とAr1に含まれる環構造とは、この連結基を介して結合してもよいが、Ar1に含まれる環構造は、Ar1に結合する酸素原子と直接結合しているのが好ましい。 Examples of this linking group include an alkylene group having 1 to 4 carbon atoms, an alkylidene group having 2 to 4 carbon atoms, an ether group, an ester group, a keto group, a sulfide group, and a sulfonyl group. Further, in the equation (3), the ring structure included in the oxygen atom and the Ar 1 that binds to Ar 1, the ring structure may be bonded via a linking group, but contained in Ar 1 is, Ar 1 It is preferably directly bonded to an oxygen atom bonded to.
また、これらの環構造はそれぞれ独立に置換基を有していてもよい。このような置換基の例としては、アルキル基、アルコキシ基、アルキルカルボニル基、アルキルメルカプト基、シクロアルキル基、ハロゲン原子等が挙げられる。 Moreover, these ring structures may each independently have a substituent. Examples of such a substituent include an alkyl group, an alkoxy group, an alkylcarbonyl group, an alkyl mercapto group, a cycloalkyl group, and a halogen atom.
Ar1に含まれる環構造の例としては、ベンゼン環、ナフタレン環、フルオレン環、アントラセン環、フラン環、ピロール環、チオフェン環、イミダゾール環、オキサゾール環、チアゾール環、ピリジン環、チアジン環、並びにこれらの環に前記の置換基が結合したもの等が挙げられる。 Examples of the ring structure contained in Ar 1 include benzene ring, naphthalene ring, fluorene ring, anthracene ring, furan ring, pyrrole ring, thiophene ring, imidazole ring, oxazole ring, thiazole ring, pyridine ring, thiazine ring, and these And those having the above substituents bonded to the ring.
n1が1である場合のAr1の具体例として、フェニル基、ビフェニリル基、ナフチル基、ターフェニリル基、アントラセニル基、フルオレニル基等が挙げられる。 Specific examples of Ar 1 when n1 is 1 include a phenyl group, a biphenylyl group, a naphthyl group, a terphenylyl group, an anthracenyl group, a fluorenyl group, and the like.
n1が2である場合のAr1の具体例として、炭素原子数6〜20のアリーレン基、炭素原子数6〜20のアリーレン−炭素原子数1〜6のアルキレン−炭素原子数6〜20のアリーレン基又は炭素原子数6〜20のアリーレン−O−(R51−O)m3−炭素原子数6〜20のアリーレン基(式中、R51は、炭素原子数1〜8のアルキレン基であり、m3は、0又は1〜6の整数である)が挙げられ、フェニレン−イソプロピリデン−フェニレン基(ビスフェノールAから2つの水酸基を除いた基)、フェニレン−メチレン−フェニレン基(ビスフェノールFから2つの水酸基を除いた基)、フェニレン−エチリデン−フェニレン基(ビスフェノールADから2つの水酸基を除いた基)等のビスフェノール類から2つの水酸基を除いた基が好ましい。 Specific examples of Ar 1 when n1 is 2 include arylene groups having 6 to 20 carbon atoms, arylene groups having 6 to 20 carbon atoms, alkylene groups having 1 to 6 carbon atoms, and arylene groups having 6 to 20 carbon atoms. arylene -O- group or having 6 to 20 carbon atoms (R 51 -O) m3 - arylene group (wherein 6 to 20 carbon atoms, R 51 is an alkylene group having 1 to 8 carbon atoms, m3 is 0 or an integer of 1 to 6, and includes a phenylene-isopropylidene-phenylene group (a group obtained by removing two hydroxyl groups from bisphenol A) and a phenylene-methylene-phenylene group (two hydroxyl groups derived from bisphenol F). And 2 hydroxyl groups are removed from bisphenols such as phenylene-ethylidene-phenylene groups (groups obtained by removing 2 hydroxyl groups from bisphenol AD). Group is preferred.
n1が3である場合のAr1の具体例として、下記式が挙げられる。ここで、*は、結合位置を示す。
n1が4である場合のAr1の具体例として、下記式が挙げられる。ここで、*は、結合位置を示す。
n1が2以上である場合のAr1の具体例として、下記式で表されるフェノールノボラックも挙げられる。
〔式中、R61は、独立に、水素原子、炭素原子数1〜4のアルキル基であり、m4は、0又は1以上であり、R62は、独立に、結合位置又は水酸基であり、R62における結合位置の数は、Ar1の価数に一致する。〕
As a specific example of Ar 1 when n1 is 2 or more, a phenol novolak represented by the following formula may also be mentioned.
[Wherein, R 61 is independently a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, m4 is 0 or 1 or more, and R 62 is independently a bonding position or a hydroxyl group, The number of bonding positions in R 62 matches the valence of Ar 1 . ]
なお、n1が5以上である場合のAr1の具体例として、n1が1である場合のAr1の具体例の芳香族炭素原子に結合した水素原子を4以上除いた基や、n1が2である場合のAr1の具体例の芳香族炭素原子に結合した水素原子を3以上除いた基や、n1が3である場合のAr1の具体例の芳香族基の芳香族炭素原子に結合した水素原子を2以上除いた基や、n1が4である場合のAr1の具体例の芳香族炭素原子に結合した水素原子を1以上除いた基が挙げられる。 In addition, as a specific example of Ar 1 when n1 is 5 or more, a group in which 4 or more hydrogen atoms bonded to the aromatic carbon atom of the specific example of Ar 1 when n1 is 1 is removed, or n1 is 2 3 above except groups and the hydrogen atoms bonded to aromatic carbon atoms of the examples of Ar 1 in the case where, bonded to aromatic carbon atoms of the aromatic group examples of Ar 1 when n1 is 3 And a group in which one or more hydrogen atoms bonded to the aromatic carbon atom of the specific example of Ar 1 when n1 is 4 are removed.
式(3)において、A1の定義における「独立に」とは、例えば、n1が2以上の場合、各場合において選択肢(例えばA1)が独立に定義されていることを意味する。すなわち、n1が2以上の場合、式(3)で定義された選択肢(例えばA1)は、異なっていても同一であってもよい。後述する式(5)等においても同様である。 In the formula (3), “independently” in the definition of A 1 means that, for example, when n1 is 2 or more, options (for example, A 1 ) are independently defined in each case. That is, when n1 is 2 or more, the options defined by the formula (3) (for example, A 1 ) may be different or the same. The same applies to equation (5) and the like to be described later.
式(4−1)において、m1は、1〜6の整数であるのが好ましい。式(4−2)において、m2が1以上である場合、1〜6の整数であるのが好ましい。D1の具体例として、n1が2である場合のAr1の具体例が挙げられる。 In Formula (4-1), m1 is preferably an integer of 1 to 6. In Formula (4-2), when m2 is 1 or more, it is preferably an integer of 1 to 6. Specific examples of D 1 include a specific example of Ar 1 when n 1 is 2.
<好ましい態様>
R21がアルケニル基である場合、接着強度がより高まる観点から、炭素原子数3〜20であるのが好ましく、3〜10であるのがより好ましく、1−プロペニル基、2−プロペニル基、1−メチル−1−プロペニル基、2−メチル−1−プロペニル基、3−ブテニル基、1,3−ジペンテニル基及び9−デセニル基が特に好ましい。R21がアルキル基である場合、炭素原子数1〜18であるのが好ましく、1〜4であるのがより好ましく、メチル基、プロピル基及びイソプロピル基が特に好ましい。R22及びR23がアルケニル基である場合、炭素原子数3〜20であるのが好ましく、3〜10であるのがより好ましく、1−プロペニル基が特に好ましい。R22及びR23がアルキル基である場合、炭素原子数1〜18であるのが好ましく、1〜4であるのがより好ましく、メチル基、プロピル基及びイソプロピル基が特に好ましい。R22及びR23がアリール基である場合、フェニル基が好ましい。R24がアルキル基である場合、炭素原子数1〜10であるのが好ましく、1〜4がより好ましく、メチル基及びブチル基が特に好ましい。第一の変性樹脂は、第二の変性樹脂が好ましい。
<Preferred embodiment>
When R 21 is an alkenyl group, the number of carbon atoms is preferably from 3 to 20, more preferably from 3 to 10 from the viewpoint of further increasing the adhesive strength, and a 1-propenyl group, 2-propenyl group, 1 -Methyl-1-propenyl, 2-methyl-1-propenyl, 3-butenyl, 1,3-dipentenyl and 9-decenyl are particularly preferred. When R 21 is an alkyl group, it preferably has 1 to 18 carbon atoms, more preferably 1 to 4, and particularly preferably a methyl group, a propyl group, and an isopropyl group. When R 22 and R 23 are alkenyl groups, the number of carbon atoms is preferably 3 to 20, more preferably 3 to 10, and particularly preferably a 1-propenyl group. When R 22 and R 23 are alkyl groups, the number of carbon atoms is preferably 1 to 18, more preferably 1 to 4, and particularly preferably a methyl group, a propyl group, and an isopropyl group. When R 22 and R 23 are aryl groups, a phenyl group is preferred. When R 24 is an alkyl group, the number of carbon atoms is preferably 1 to 10, more preferably 1 to 4, and particularly preferably a methyl group and a butyl group. The first modified resin is preferably a second modified resin.
[変性樹脂の製造方法]
変性樹脂の製造方法は、第一の変性樹脂が得られる方法であれば特に限定されない。変性樹脂の製造方法は、例えば、エポキシ樹脂と、必須成分としての変性化合物と、任意成分としての(メタ)アクリル酸無水物とを反応させる工程を含み、ここで、前記変性化合物は、カルボン酸(但し、(メタ)アクリル酸を除く)、カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)、アルコール及びチオールからなる群より選択される1種以上の化合物である、製造方法が挙げられる。変性樹脂の製造方法は、好ましくは、第二の変性樹脂の製造方法である。以下、変性樹脂の製造方法を、エポキシ樹脂と、必須成分としての変性化合物と、任意成分としての(メタ)アクリル酸無水物とを反応させる工程を含む、製造方法を例にして説明する。
[Method for producing modified resin]
The method for producing the modified resin is not particularly limited as long as the first modified resin is obtained. The method for producing a modified resin includes, for example, a step of reacting an epoxy resin, a modified compound as an essential component, and (meth) acrylic anhydride as an optional component, wherein the modified compound is a carboxylic acid. (However, (meth) acrylic acid is excluded), Carboxylic anhydride (however, (meth) acrylic anhydride is excluded), The manufacturing method which is 1 or more types of compounds selected from the group which consists of alcohol and thiol. Is mentioned. The method for producing the modified resin is preferably a method for producing the second modified resin. Hereinafter, a method for producing a modified resin will be described by taking as an example a production method including a step of reacting an epoxy resin, a modified compound as an essential component, and (meth) acrylic anhydride as an optional component.
<エポキシ樹脂>
エポキシ樹脂としては、1分子中にエポキシ基を2以上有する樹脂であれば特に限定されない。ここで、変性樹脂の製造方法が、第二の変性樹脂の製造方法である場合、エポキシ樹脂としては、例えば、下記式(5)で表されるエポキシ樹脂が挙げられる。
式:Ar2(−O−A2)n2 (5)
〔式中、
Ar2は、Ar1と同義であり、
n2は、n1と同義であり、
A2は、独立に、水素原子;下記式(1−1)で表される基;下記式(4−3)で表される基;又は、下記式(4−4)で表される基であるが、
但し、分子中に、エポキシ基を2以上有する。〕
The epoxy resin is not particularly limited as long as it is a resin having two or more epoxy groups in one molecule. Here, when the manufacturing method of modified resin is the manufacturing method of 2nd modified resin, as an epoxy resin, the epoxy resin represented by following formula (5) is mentioned, for example.
Formula: Ar 2 (—O—A 2 ) n2 (5)
[Where,
Ar 2 is synonymous with Ar 1 ,
n2 is synonymous with n1,
A 2 is independently a hydrogen atom; a group represented by the following formula (1-1); a group represented by the following formula (4-3); or a group represented by the following formula (4-4). In Although,
However, it has 2 or more epoxy groups in the molecule. ]
式(5)で表されるエポキシ樹脂は、1分子中にエポキシ基を2以上有するが、このエポキシ基は、式(1−1)で表される基が有するエポキシ基である。よって、n2が1である場合、A2は、式(4−4)で表される基であって、C5及びC6が式(1−1)で表される基である。 The epoxy resin represented by the formula (5) has two or more epoxy groups in one molecule, and this epoxy group is an epoxy group possessed by the group represented by the formula (1-1). Therefore, if n2 is 1, A 2 is a group represented by the formula (4-4), a group C 5 and C 6 are represented by the formula (1-1).
また、式(5)で表されるエポキシ樹脂のAr2を任意の構造(例えば、芳香族又は脂肪族の基)とすることで、第一の変性樹脂の製造方法としてもよい。 Further, the formula Ar 2 any structure of the epoxy resin represented by (5) (e.g., an aromatic or aliphatic group) With, or as a manufacturing process of the first modified resin.
このような1分子中にエポキシ基を2以上有する樹脂としては、特に限定されず、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、脂環式エポキシ樹脂、脂肪族鎖状エポキシ樹脂、グリシジルエステル型エポキシ樹脂、グリシジルアミン型エポキシ樹脂、ヒダントイン型エポキシ樹脂、イソシアヌレート型エポキシ樹脂、トリフェノールメタン骨格を有するフェノールノボラック型エポキシ樹脂等が挙げられる。その他、二官能フェノール類のジグリシジルエーテル化物、二官能アルコール類のジグリシジルエーテル化物及びそれらのハロゲン化物、水素添加物等も使用することができる。 Such a resin having two or more epoxy groups in one molecule is not particularly limited, and is bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy. Resin, bisphenol A novolac type epoxy resin, bisphenol F novolak type epoxy resin, alicyclic epoxy resin, aliphatic chain epoxy resin, glycidyl ester type epoxy resin, glycidylamine type epoxy resin, hydantoin type epoxy resin, isocyanurate type epoxy Examples thereof include resins and phenol novolac type epoxy resins having a triphenolmethane skeleton. In addition, diglycidyl etherified products of difunctional phenols, diglycidyl etherified products of difunctional alcohols and their halides, hydrogenated products, and the like can also be used.
エポキシ樹脂は、市販されているか、又は、公知の方法に従い調製することができる。式(4−3)で表される基を有するエポキシ樹脂は、例えば、特開平8−333356号公報に記載された方法又はそれと類似する方法により得ることができる。また、式(4−4)で表される基を有するエポキシ樹脂は、例えば、特開2012−077202号公報及び特開2013−241488号公報に記載された方法又はそれと類似する方法により得ることができる。 Epoxy resins are commercially available or can be prepared according to known methods. The epoxy resin having a group represented by the formula (4-3) can be obtained, for example, by the method described in JP-A-8-333356 or a method similar thereto. Moreover, the epoxy resin which has group represented by Formula (4-4) can be obtained by the method described in Unexamined-Japanese-Patent No. 2012-070220 and Unexamined-Japanese-Patent No. 2013-241488, or a method similar to it, for example. it can.
<変性化合物>
変性化合物は、カルボン酸(但し、(メタ)アクリル酸を除く)、カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)、アルコール及びチオールからなる群より選択される1以上の化合物である。変性化合物は、それぞれ、1種単独で用いても、2種以上を組み合わせて用いてもよい。
<Modified compound>
The modifying compound is one or more compounds selected from the group consisting of carboxylic acid (excluding (meth) acrylic acid), carboxylic anhydride (excluding (meth) acrylic anhydride), alcohol and thiol. It is. A modification compound may be used individually by 1 type, respectively, or may be used in combination of 2 or more type.
カルボン酸(但し、(メタ)アクリル酸を除く)としては、式:R41−COOH〔式中、R41は、R21と同義である。〕で表される化合物が挙げられる。カルボン酸(但し、(メタ)アクリル酸を除く)を用いることにより、式(2−1)で表される基を有する変性樹脂が得られる。この場合、R5は、式(5)で表されるエポキシ樹脂が有するエポキシ基がグリシジル基であるとき、水素原子であり、式(5)で表されるエポキシ樹脂が有するエポキシ基がメチルグリシジル基であるとき、メチル基である。 Carboxylic acid (where (meth) excluding acrylic acid) as the formula: R 41 -COOH wherein, R 41 has the same meaning as R 21. ] The compound represented by this is mentioned. By using carboxylic acid (excluding (meth) acrylic acid), a modified resin having a group represented by the formula (2-1) is obtained. In this case, R 5 is a hydrogen atom when the epoxy group of the epoxy resin represented by formula (5) is a glycidyl group, and the epoxy group of the epoxy resin represented by formula (5) is methyl glycidyl. When it is a group, it is a methyl group.
カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)としては、式:R42−C(=O)−O−C(=O)−R43〔式中、R42及びR43は、R22及びR23と同義である。〕で表される化合物が挙げられる。カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)を用いることにより、式(2−2)で表される基を有する変性樹脂が得られる。また、一緒になって環構造を形成しているR22及びR23は、エポキシ樹脂におけるエポキシ基と、コハク酸無水物、マレイン酸無水物、フタル酸無水物等のジカルボン酸無水物との反応により形成される。これらの場合、R6は、R5と同様である。 Carboxylic anhydride (excluding (meth) acrylic anhydride) has the formula R 42 —C (═O) —O—C (═O) —R 43 [wherein R 42 and R 43 Is synonymous with R 22 and R 23 . ] The compound represented by this is mentioned. By using a carboxylic acid anhydride (excluding (meth) acrylic anhydride), a modified resin having a group represented by the formula (2-2) is obtained. R 22 and R 23 which together form a ring structure are a reaction between an epoxy group in an epoxy resin and a dicarboxylic anhydride such as succinic anhydride, maleic anhydride, phthalic anhydride, etc. It is formed by. In these cases, R 6 is the same as R 5 .
アルコール及びチオールとしては、式:R44−X2−H〔式中、R44は、R24と同義であり、X2は、X1と同義である。〕で表される化合物が挙げられる。アルコール及びチオールからなる群より選択される1以上の化合物を用いることにより、式(2−3)で表される基を有する変性樹脂が得られる。この場合、R7は、R5と同様である。 The alcohols and thiols, formula: R 44 -X 2 -H [wherein, R 44 has the same meaning as R 24, X 2 has the same meaning as X 1. ] The compound represented by this is mentioned. By using one or more compounds selected from the group consisting of alcohol and thiol, a modified resin having a group represented by Formula (2-3) is obtained. In this case, R 7 is the same as R 5 .
<(メタ)アクリル酸無水物>
(メタ)アクリル酸無水物は、アクリル酸無水物及びメタクリル酸無水物からなる群より選択される1以上である。エポキシ樹脂におけるエポキシ基と(メタ)アクリル酸無水物とが反応することにより、式(1−2)で表される基を有する変性樹脂が得られる。この場合、R2及びR3は、前記(メタ)アクリル酸無水物がアクリル酸無水物であるとき、水素原子であり、前記(メタ)アクリル酸無水物がメタクリル酸無水物であるとき、メチル基である。また、R4は、R5と同様である。
<(Meth) acrylic anhydride>
The (meth) acrylic anhydride is one or more selected from the group consisting of acrylic anhydride and methacrylic anhydride. A modified resin having a group represented by the formula (1-2) is obtained by the reaction between the epoxy group in the epoxy resin and the (meth) acrylic anhydride. In this case, R 2 and R 3 are hydrogen atoms when the (meth) acrylic anhydride is acrylic anhydride, and methyl when the (meth) acrylic anhydride is methacrylic anhydride. It is a group. R 4 is the same as R 5 .
なお、得られる変性樹脂において、(メタ)アクリル酸無水物及び変性化合物と反応していないエポキシ基が存在する場合は、変性樹脂は式(1−1)で表される基を有する。この場合、R1は、R5と同様である。 In addition, in the modified resin obtained, when the epoxy group which has not reacted with the (meth) acrylic anhydride and the modifying compound exists, the modified resin has a group represented by the formula (1-1). In this case, R 1 is the same as R 5 .
<反応条件>
変性樹脂を得るための反応条件は、エポキシ樹脂と、必須成分としての変性化合物と、任意成分としての(メタ)アクリル酸無水物との反応により用いられる公知の条件を適宜適用できる。
<Reaction conditions>
As the reaction conditions for obtaining the modified resin, known conditions used by the reaction of the epoxy resin, the modified compound as an essential component, and (meth) acrylic anhydride as an optional component can be appropriately applied.
反応は塩基性触媒及び/又は酸触媒の存在下又は非存在下で行うことができる。塩基性触媒及び酸触媒としては、エポキシ樹脂と、必須成分としての変性化合物と、任意成分としての(メタ)アクリル酸無水物との反応により用いられる公知の塩基性触媒及び酸触媒が挙げられる。 The reaction can be carried out in the presence or absence of a basic catalyst and / or an acid catalyst. As a basic catalyst and an acid catalyst, the well-known basic catalyst and acid catalyst used by reaction with an epoxy resin, the modified compound as an essential component, and the (meth) acrylic anhydride as an arbitrary component are mentioned.
塩基性触媒は、アルカリ金属の水酸化物(水酸化ナトリウム、水酸化カリウム等)、アルカリ金属の炭酸塩(炭酸ナトリウム、炭酸カリウム等)、アルカリ金属アルコキシド(ナトリウムメトキシド等)、3価の有機リン化合物及び/又はアミン化合物が好ましい。また、塩基性触媒をポリマーに担持させた、ポリマー担持塩基性触媒を用いることもできる。 Basic catalysts include alkali metal hydroxides (sodium hydroxide, potassium hydroxide, etc.), alkali metal carbonates (sodium carbonate, potassium carbonate, etc.), alkali metal alkoxides (sodium methoxide, etc.), trivalent organic compounds. Phosphorus compounds and / or amine compounds are preferred. A polymer-supported basic catalyst in which a basic catalyst is supported on a polymer can also be used.
3価の有機リン化合物としては、トリエチルホスフィン、トリ−n−プロピルホスフィン、トリ−n−ブチルホスフィンのようなアルキルホスフィン類及びその塩、トリフェニルホスフィン、トリ−m−トリルホスフィン、トリス−(2,6−ジメトキシフェニル)ホスフィン、ビス[2−(ジフェニルホスフィノ)フェニル]エーテル等のアリールホスフィン類及びその塩、トリフェニルホスファイト、トリエチルホスファイト、トリス(ノニルフェニル)ホスファイト等の亜リン酸トリエステル類及びその塩等が挙げられる。3価の有機リン化合物の塩としては、トリフェニルホスフィン・エチルブロミド、トリフェニルホスフィン・ブチルブロミド、トリフェニルホスフィン・オクチルブロミド、トリフェニルホスフィン・デシルブロミド、トリフェニルホスフィン・イソブチルブロミド、トリフェニルホスフィン・プロピルクロリド、トリフェニルホスフィン・ペンチルクロリド、トリフェニルホスフィン・ヘキシルブロミド等が挙げられる。 Examples of the trivalent organic phosphorus compound include alkylphosphines such as triethylphosphine, tri-n-propylphosphine, tri-n-butylphosphine and salts thereof, triphenylphosphine, tri-m-tolylphosphine, tris- (2 , 6-dimethoxyphenyl) phosphine, arylphosphines such as bis [2- (diphenylphosphino) phenyl] ether and salts thereof, phosphorous acid such as triphenylphosphite, triethylphosphite, tris (nonylphenyl) phosphite Examples include triesters and salts thereof. Trivalent phosphine / ethyl bromide, triphenyl phosphine / butyl bromide, triphenyl phosphine / octyl bromide, triphenyl phosphine / decyl bromide, triphenyl phosphine / isobutyl bromide, triphenyl phosphine / Examples thereof include propyl chloride, triphenylphosphine / pentyl chloride, triphenylphosphine / hexyl bromide and the like.
アミン化合物としては、ジエタノールアミン等の第二級アミン、トリエタノールアミン、ジメチルベンジルアミン、トリスジメチルアミノメチルフェノール、トリスジエチルアミノメチルフェノール等の第3級アミン、1,5,7−トリアザビシクロ[4.4.0]デカ−5−エン(TBD)、7−メチル−1,5,7−トリアザビシクロ[4.4.0]デカ−5−エン(Me−TBD)、1,8−ジアザビシクロ[5.4.0]ウンデカ−7−エン(DBU)、6−ジブチルアミノ−1,8−ジアザビシクロ[5.4.0]ウンデカ−7−エン、1,5−ジアザビシクロ[4.3.0]ノナ−5−エン(DBN)、1,1,3,3−テトラメチルグアニジン等の強塩基性アミン及びその塩が挙げられる。中でも、1,5,7−トリアザビシクロ[4.4.0]デカ−5−エン(TBD)が好ましい。アミン化合物の塩としては、塩化ベンジルトリメチルアンモニウム、塩化ベンジルトリエチルアンモニウム等が挙げられる。 Examples of the amine compound include secondary amines such as diethanolamine, tertiary amines such as triethanolamine, dimethylbenzylamine, trisdimethylaminomethylphenol, trisdiethylaminomethylphenol, 1,5,7-triazabicyclo [4. 4.0] dec-5-ene (TBD), 7-methyl-1,5,7-triazabicyclo [4.4.0] dec-5-ene (Me-TBD), 1,8-diazabicyclo [ 5.4.0] Undec-7-ene (DBU), 6-dibutylamino-1,8-diazabicyclo [5.4.0] undec-7-ene, 1,5-diazabicyclo [4.3.0] Examples include strongly basic amines such as non-5-ene (DBN) and 1,1,3,3-tetramethylguanidine, and salts thereof. Among these, 1,5,7-triazabicyclo [4.4.0] dec-5-ene (TBD) is preferable. Examples of the salt of the amine compound include benzyltrimethylammonium chloride and benzyltriethylammonium chloride.
酸触媒は、硫酸、トリフルオロメタンスルホン酸等のスルホン酸、グラファイト酸化物、フッ化アンチモン等が挙げられる。また酸触媒は、陽イオン交換体(例えば、市販品としてアンバーリストが挙げられる)を用いてもよい。酸触媒は、エポキシ樹脂と、アルコール及びチオールからなる群より選択される1以上の化合物との反応のために用いられ得る。 Examples of the acid catalyst include sulfonic acid such as sulfuric acid and trifluoromethanesulfonic acid, graphite oxide, and antimony fluoride. Moreover, you may use a cation exchanger (For example, amber list is mentioned as a commercial item) as an acid catalyst. The acid catalyst can be used for the reaction of the epoxy resin with one or more compounds selected from the group consisting of alcohols and thiols.
反応は、溶媒の存在下又は非存在下で行うことができる。反応に際しては炭化水素、エーテル又はケトンのような反応に不活性な溶媒を用いることもできるが、エポキシ樹脂を過剰に用いた場合には当該樹脂が溶媒としても機能するため、これらの溶媒は必須ではない。 The reaction can be carried out in the presence or absence of a solvent. In the reaction, a solvent inert to the reaction such as hydrocarbon, ether or ketone can be used. However, when an excessive amount of epoxy resin is used, the resin also functions as a solvent. is not.
反応温度は、用いる触媒及び原料化合物等に応じて当業者が適宜設定できる。例えば、触媒が塩基性触媒であり、(メタ)アクリル酸無水物、及び変性化合物としてカルボン酸(但し、(メタ)アクリル酸を除く)及びカルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)からなる群より選択される1以上が用いられる場合、反応温度は、好ましくは60〜120℃、より好ましくは80〜120℃、さらに好ましくは90〜120℃であり、特に好ましくは100℃〜120℃である。例えば、触媒が酸触媒であり、変性化合物としてアルコールが用いられる場合、反応温度は、好ましくは0〜100℃、より好ましくは10〜90℃、特に好ましくは25〜80℃である。 The reaction temperature can be appropriately set by those skilled in the art according to the catalyst and the raw material compound used. For example, the catalyst is a basic catalyst, (meth) acrylic acid anhydride, and carboxylic acid (however, excluding (meth) acrylic acid) and carboxylic acid anhydride (however, (meth) acrylic acid anhydride) as the modifying compound When one or more selected from the group consisting of (except for the above) is used, the reaction temperature is preferably 60 to 120 ° C, more preferably 80 to 120 ° C, still more preferably 90 to 120 ° C, particularly preferably 100. ° C to 120 ° C. For example, when the catalyst is an acid catalyst and alcohol is used as the modifying compound, the reaction temperature is preferably 0 to 100 ° C, more preferably 10 to 90 ° C, and particularly preferably 25 to 80 ° C.
前記エポキシ樹脂の、エポキシ基1当量に対する、必須成分としての変性化合物及び任意成分としての(メタ)アクリル酸無水物の合計の反応量は、0超100当量%であり、好ましくは5〜95当量%であり、より好ましくは10〜90当量%であり、特に好ましくは20〜80当量%である。変性樹脂の製造方法において、エポキシ基と、(メタ)アクリル酸無水物及び変性化合物との反応は定量的に進むため、得られた変性樹脂の変性率は、エポキシ当量より推定することもできる。 The total reaction amount of the modified compound as an essential component and the (meth) acrylic anhydride as an optional component with respect to 1 equivalent of the epoxy group of the epoxy resin is more than 0 and 100 equivalent%, preferably 5 to 95 equivalents. %, More preferably 10 to 90 equivalent%, and particularly preferably 20 to 80 equivalent%. In the modified resin production method, the reaction between the epoxy group, the (meth) acrylic anhydride, and the modified compound proceeds quantitatively, and therefore the modification rate of the obtained modified resin can be estimated from the epoxy equivalent.
必須成分としての変性化合物及び任意成分としての(メタ)アクリル酸無水物は、同時にエポキシ樹脂と反応させて変性樹脂を得てもよい。また、エポキシ樹脂と、変性化合物とを反応させて変性化合物で部分変性されたエポキシ樹脂を得、前記変性化合物で部分変性されたエポキシ樹脂と(メタ)アクリル酸無水物とを反応させて、変性樹脂を得てもよく、エポキシ樹脂と(メタ)アクリル酸無水物とを反応させて(メタ)アクリル酸無水物で部分変性されたエポキシ樹脂を得、(メタ)アクリル酸無水物で部分変性されたエポキシ樹脂と変性化合物とを反応させて、変性樹脂を得てもよい。 The modified compound as an essential component and the (meth) acrylic anhydride as an optional component may be simultaneously reacted with an epoxy resin to obtain a modified resin. Moreover, the epoxy resin and the modifying compound are reacted to obtain an epoxy resin partially modified with the modifying compound, and the epoxy resin partially modified with the modifying compound is reacted with (meth) acrylic anhydride to modify the epoxy resin. A resin may be obtained. An epoxy resin partially modified with (meth) acrylic anhydride is obtained by reacting an epoxy resin with (meth) acrylic anhydride, and partially modified with (meth) acrylic anhydride. The modified resin may be obtained by reacting the epoxy resin with the modified compound.
なお、変性樹脂の製造方法により得られる変性樹脂は、同じ骨格を有する樹脂を含む樹脂混合物として得られてもよい。ここで、第二の変性樹脂における前記骨格とは、Ar1の部分をいう。そして、第一の変性樹脂における前記骨格とは、式(1−1)で表される基、式(1−2)で表される基、式(2−1)で表される基、式(2−2)で表される基及び式(2−3)で表される基以外の部分をいう。 The modified resin obtained by the method for producing a modified resin may be obtained as a resin mixture containing a resin having the same skeleton. Here, the skeleton in the second modified resin refers to the Ar 1 portion. The skeleton in the first modified resin is a group represented by the formula (1-1), a group represented by the formula (1-2), a group represented by the formula (2-1), a formula It refers to a moiety other than the group represented by (2-2) and the group represented by formula (2-3).
(熱硬化剤及び/又は重合開始剤)
熱硬化剤及び/又は重合開始剤は、硬化性樹脂組成物に含まれる成分に応じて適宜選択できる。熱硬化剤を用いることにより、硬化性樹脂組成物を熱硬化性樹脂組成物とすることができる。重合開始剤を用いることにより、硬化性樹脂組成物をラジカル重合硬化性、アニオン重合硬化性及び/又はカチオン重合硬化性の樹脂組成物とすることができる。
(Thermosetting agent and / or polymerization initiator)
A thermosetting agent and / or a polymerization initiator can be suitably selected according to the component contained in curable resin composition. By using a thermosetting agent, a curable resin composition can be made into a thermosetting resin composition. By using a polymerization initiator, the curable resin composition can be made into a radical polymerization curable, anionic polymerization curable and / or cationic polymerization curable resin composition.
<熱硬化剤>
熱硬化剤は、特に限定されないが、アミン系熱硬化剤、例えば有機酸ジヒドラジド化合物、アミンアダクト、イミダゾール及びその誘導体、ジシアンジアミド、芳香族アミン、エポキシ変性ポリアミン、及びポリアミノウレア等が挙げられ、VDH(1,3−ビス(ヒドラジノカルボエチル)−5−イソプロピルヒダントイン)、ADH(アジピン酸ジヒドラジド)、UDH(7,11−オクタデカジエン−1,18−ジカルボヒドラジド)及びLDH(オクタデカン−1,18−ジカルボン酸ジヒドラジド)等の有機酸ジヒドラジド;株式会社ADEKAから、アデカハードナーEH5030S等として販売されているポリアミン系化合物;味の素ファインテクノ株式会社から、アミキュアPN−23、アミキュアPN−30、アミキュアMY−24、アミキュアMY−H等として市販されているアミンアダクトが好ましい。これらの熱硬化剤は、単独で用いても、複数で用いてもよい。
<Thermosetting agent>
The thermosetting agent is not particularly limited, and examples thereof include amine thermosetting agents such as organic acid dihydrazide compounds, amine adducts, imidazoles and derivatives thereof, dicyandiamide, aromatic amines, epoxy-modified polyamines, and polyaminoureas. 1,3-bis (hydrazinocarboethyl) -5-isopropylhydantoin), ADH (adipic acid dihydrazide), UDH (7,11-octadecadien-1,18-dicarbohydrazide) and LDH (octadecane-1, Organic acid dihydrazide such as 18-dicarboxylic acid dihydrazide); polyamine compounds sold as ADEKA HARDNER EH5030S etc. from ADEKA Corporation; from Ajinomoto Fine Techno Co., Ltd., Amicure PN-23, Amicure PN-30, Amicure Y-24, preferably an amine adduct commercially available as Amicure MY-H, and the like. These thermosetting agents may be used alone or in combination.
<重合開始剤>
重合開始剤として、ラジカル重合開始剤、アニオン重合開始剤及び/又はカチオン重合開始剤が挙げられる。重合開始剤は、硬化性樹脂組成物に含まれる硬化成分を、ラジカル重合させる際のラジカル発生源、アニオン重合させる際のアニオン発生源、カチオン重合させる際のカチオン発生源となる成分である。
<Polymerization initiator>
Examples of the polymerization initiator include a radical polymerization initiator, an anionic polymerization initiator and / or a cationic polymerization initiator. The polymerization initiator is a component that becomes a radical generation source when radically polymerizing a curable component contained in the curable resin composition, an anion generation source when anionic polymerization is performed, and a cation generation source when cationic polymerization is performed.
ラジカル重合開始剤としては、ベンゾイン類、アセトフェノン類、ベンゾフェノン類、チオキサントン類、α−アシロキシムエステル類、フェニルグリオキシレート類、ベンジル類、アゾ系化合物、ジフェニルスルフィド系化合物、アシルホスフィンオキシド系化合物、ベンゾインエーテル類、アントラキノン類、有機過酸化物等が挙げられる。ラジカル重合開始剤は、液晶への溶解性が低く、また、それ自身で光照射時に分解物がガス化しないような反応性基を有するものが好ましい。また、ラジカル重合開始剤として、WO2012/077720に記載されている、少なくとも2個のエポキシ基を有する化合物と、ジメチルアミノ安息香酸とを反応させて得られる化合物、及び、少なくとも2個のエポキシ基を有する化合物と、ヒドロキシチオキサントンとを反応させて得られる化合物との混合物である重合開始剤が好ましい。 As radical polymerization initiators, benzoins, acetophenones, benzophenones, thioxanthones, α-acyloxime esters, phenylglyoxylates, benzyls, azo compounds, diphenyl sulfide compounds, acylphosphine oxide compounds, Examples include benzoin ethers, anthraquinones, and organic peroxides. The radical polymerization initiator preferably has a low solubility in the liquid crystal and a reactive group that itself does not gasify the decomposition product when irradiated with light. Further, as a radical polymerization initiator, a compound obtained by reacting a compound having at least two epoxy groups with dimethylaminobenzoic acid described in WO2012 / 0777720, and at least two epoxy groups A polymerization initiator which is a mixture of a compound obtained by reacting the compound having a compound with hydroxythioxanthone is preferable.
アニオン重合開始剤としては、イミダゾール類、アミン類、ホスフィン類、有機金属塩、金属塩化物、有機過酸化物等が挙げられる。 Examples of the anionic polymerization initiator include imidazoles, amines, phosphines, organic metal salts, metal chlorides, and organic peroxides.
カチオン重合開始剤としては、オニウム塩、鉄アレン錯体、チタノセン錯体、アリールシラノールアルミニウム錯体、ルイス酸化合物、ブレンステッド酸化合物、ベンジルスルホニウム塩、チオフェニウム塩、チオラニウム塩、ベンジルアンモニウム、ピリジニウム塩、ヒドラジニウム塩、カルボン酸エステル、スルホン酸エステル、アミンイミド、スルホン化合物類、スルホン酸エステル類、スルホンイミド類、ジスルホニルジアゾメタン類、及びアミン類等が挙げられる。 Cationic polymerization initiators include onium salts, iron allene complexes, titanocene complexes, arylsilanol aluminum complexes, Lewis acid compounds, Bronsted acid compounds, benzylsulfonium salts, thiophenium salts, thiolanium salts, benzylammonium, pyridinium salts, hydrazinium salts, Examples thereof include carboxylic acid esters, sulfonic acid esters, amine imides, sulfone compounds, sulfonic acid esters, sulfonimides, disulfonyldiazomethanes, and amines.
重合開始剤は、市販されているか、又は、公知の方法に従い調製することができる。ラジカル重合開始剤、アニオン重合開始剤及びカチオン重合開始剤は、それぞれ、1種単独で用いても、2種以上を組み合わせて用いてもよい。重合開始剤は、所望の硬化条件(エネルギー線硬化及び/又は熱硬化)に応じて、適宜用いることができる。 The polymerization initiator is commercially available or can be prepared according to a known method. Each of the radical polymerization initiator, the anionic polymerization initiator and the cationic polymerization initiator may be used alone or in combination of two or more. The polymerization initiator can be appropriately used according to desired curing conditions (energy ray curing and / or heat curing).
(更なる成分)
硬化性樹脂組成物は、更なる樹脂(但し、第一の変性樹脂を除く)、光増感剤、フィラー及びカップリング剤からなる群より選択される1以上の更なる成分を含むことができる。
(Further ingredients)
The curable resin composition can include one or more additional components selected from the group consisting of a further resin (excluding the first modified resin), a photosensitizer, a filler, and a coupling agent. .
<更なる樹脂>
更なる樹脂は、第一の変性樹脂以外の樹脂であれば特に限定されず、液晶シール剤の主剤として用いられる従来の不飽和基及び/又はエポキシ基を有する樹脂、並びに、不飽和基及びエポキシ基のいずれも有さない樹脂が挙げられる。ここで、「不飽和基」とは、エチレン性不飽和基及び/又はアセチレン性不飽和基を意味する。
<Further resin>
The additional resin is not particularly limited as long as it is a resin other than the first modified resin, and is a conventional resin having an unsaturated group and / or an epoxy group used as a main component of a liquid crystal sealant, and an unsaturated group and an epoxy. Resins that do not have any of the groups are mentioned. Here, the “unsaturated group” means an ethylenically unsaturated group and / or an acetylenically unsaturated group.
<<不飽和基を有する樹脂>>
不飽和基を有する樹脂としては、(メタ)アクリレート化合物、脂肪族アクリルアミド化合物、脂環式アクリルアミド化合物、芳香族を含むアクリルアミド化合物、N−置換アクリルアミド系化合物、ジエン系ポリマー(例えば、ポリブタジエンポリマー、ポリイソプレンポリマー等)が挙げられる。(メタ)アクリレート化合物の官能性は、一官能性、二官能性又は三官能性以上の多官能性であることができる。
<< resin having an unsaturated group >>
Examples of the resin having an unsaturated group include (meth) acrylate compounds, aliphatic acrylamide compounds, alicyclic acrylamide compounds, aromatic acrylamide compounds, N-substituted acrylamide compounds, diene polymers (for example, polybutadiene polymers, poly Isoprene polymer). The functionality of the (meth) acrylate compound can be monofunctional, bifunctional or trifunctional or higher polyfunctional.
一官能性の(メタ)アクリレート化合物としては、ヒドロキシエチル(メタ)アクリレート、ベンジル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、イソオクチル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、シクロヘキシルオキシエチル(メタ)アクリレート、ジシクロペンタニルオキシエチル(メタ)アクリレート、ジシクロペンテニルオキシエチル(メタ)アクリレート、イソミリスチル(メタ)アクリレート、ラウリル(メタ)アクリレート、tert−ブチル(メタ)アクリレート、ジエチレングリコールモノエチルエーテル(メタ)アクリレート、パラクミルフェノキシエチレングリコール(メタ)アクリレート、及びエトキシ化フェニル(メタ)アクリレートからなる群より選択される1以上の化合物が好ましい。 Monofunctional (meth) acrylate compounds include hydroxyethyl (meth) acrylate, benzyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, isooctyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate , Dicyclopentanyl (meth) acrylate, cyclohexyloxyethyl (meth) acrylate, dicyclopentanyloxyethyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, isomyristyl (meth) acrylate, lauryl (meth) Acrylate, tert-butyl (meth) acrylate, diethylene glycol monoethyl ether (meth) acrylate, paracumylphenoxyethylene glycol (meth) acrylate Relate, and one or more compounds selected from the group consisting of ethoxylated phenyl (meth) acrylate.
二官能性の(メタ)アクリレート化合物としては、トリシクロデカンジメタノールジ(メタ)アクリレート、ジメチロールジシクロペンタンジ(メタ)アクリレート、EO変性1,6−ヘキサンジオールジ(メタ)アクリレート、EO変性ビスフェノールAジ(メタ)アクリレート、PO変性ビスフェノールAジ(メタ)アクリレート、ポリエステルジ(メタ)アクリレート(例えば、ARONIX M−6100、東亜合成株式会社製)、ポリエチレングリコールジ(メタ)アクリレート(例えば、4G、新中村化学工業株式会社製)、及びシリコンジ(メタ)アクリレート(例えば、EBECRYL 350、ダイセル・オルネクス株式会社製)からなる群より選択される1以上の化合物が好ましい。ここで、「EO」はエチレンオキシドを意味し、「PO」はプロピレンオキシドを意味する。 Examples of the bifunctional (meth) acrylate compound include tricyclodecane dimethanol di (meth) acrylate, dimethylol dicyclopentane di (meth) acrylate, EO-modified 1,6-hexanediol di (meth) acrylate, and EO-modified. Bisphenol A di (meth) acrylate, PO-modified bisphenol A di (meth) acrylate, polyester di (meth) acrylate (for example, ARONIX M-6100, manufactured by Toagosei Co., Ltd.), polyethylene glycol di (meth) acrylate (for example, 4G And one or more compounds selected from the group consisting of silicon di (meth) acrylate (for example, EBECRYL 350, manufactured by Daicel Ornex Co., Ltd.). Here, “EO” means ethylene oxide, and “PO” means propylene oxide.
三官能性以上の多官能性(メタ)アクリレート化合物としては、EO変性グリセロールトリ(メタ)アクリレート(三官能)、PO変性グリセロールトリ(メタ)アクリレート(三官能)、ペンタエリスリトールトリ(メタ)アクリレート(三官能)、ジペンタエリスリトールヘキサ(メタ)アクリレート(六官能)及びペンタエリスリトールテトラ(メタ)アクリレート(四官能)より選択される1以上の化合物が好ましい。 Trifunctional or higher polyfunctional (meth) acrylate compounds include EO-modified glycerol tri (meth) acrylate (trifunctional), PO-modified glycerol tri (meth) acrylate (trifunctional), pentaerythritol tri (meth) acrylate ( One or more compounds selected from trifunctional), dipentaerythritol hexa (meth) acrylate (hexafunctional) and pentaerythritol tetra (meth) acrylate (tetrafunctional) are preferred.
更に、不飽和基を有する樹脂として、エポキシ樹脂のエポキシ基の全部が(メタ)アクリル酸で変性されたエポキシ樹脂、及びエポキシ樹脂のエポキシ基の全部が不飽和基を有する変性化合物で変性されたエポキシ樹脂が挙げられる。 Furthermore, as the resin having an unsaturated group, all of the epoxy groups of the epoxy resin are modified with (meth) acrylic acid, and all of the epoxy groups of the epoxy resin are modified with a modifying compound having an unsaturated group. An epoxy resin is mentioned.
<<エポキシ基を有する樹脂>>
エポキシ基を有する樹脂は、エポキシ基を1以上有するものであれば特に限定されない。エポキシ基を1つ有する樹脂としては、芳香族エポキシ樹脂及び脂肪族エポキシ樹脂が挙げられる。エポキシ基を2以上有する樹脂としては、エポキシ樹脂として前記したものが挙げられる。
<< Resin having epoxy group >>
The resin having an epoxy group is not particularly limited as long as it has one or more epoxy groups. Examples of the resin having one epoxy group include aromatic epoxy resins and aliphatic epoxy resins. Examples of the resin having two or more epoxy groups include those described above as the epoxy resin.
<<不飽和基及びエポキシ基を有する樹脂>>
不飽和基及びエポキシ基を有する樹脂としては、例えば、エポキシ樹脂のエポキシ基の一部が(メタ)アクリル酸系化合物で変性された部分(メタ)アクリレート変性エポキシ樹脂が挙げられる。
<< Resin having unsaturated group and epoxy group >>
Examples of the resin having an unsaturated group and an epoxy group include a partial (meth) acrylate-modified epoxy resin in which a part of the epoxy group of the epoxy resin is modified with a (meth) acrylic acid compound.
<<不飽和基及びエポキシ基のいずれも有さない樹脂>>
不飽和基及びエポキシ基のいずれも有さない樹脂としては、エポキシ樹脂のエポキシ基の全部が不飽和基を有さない変性化合物で変性された変性エポキシ樹脂、水酸基含有化合物とイソシアネート基含有化合物から形成されるウレタン樹脂等が挙げられる。
<< Resin having neither unsaturated group nor epoxy group >>
As a resin having neither an unsaturated group nor an epoxy group, all of the epoxy groups of the epoxy resin are modified with a modified compound having no unsaturated group, a hydroxyl group-containing compound and an isocyanate group-containing compound. The urethane resin etc. which are formed are mentioned.
<<好ましい更なる樹脂>>
更なる樹脂として、エポキシ樹脂(但し、(メタ)アクリロイル基を有するエポキシ樹脂を除く)、エポキシ樹脂のエポキシ基の一部又は全部が(メタ)アクリル酸無水物で変性された変性エポキシ樹脂、エポキシ樹脂のエポキシ基の全部が変性化合物で変性された変性エポキシ樹脂からなる群より選択される1以上の樹脂を含み、ここで前記変性化合物は、カルボン酸(但し、(メタ)アクリル酸を除く)、カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)、アルコール及びチオールからなる群より選択される1以上の化合物である、樹脂が好ましい。
<< Preferred Further Resin >>
Further resins include epoxy resins (excluding epoxy resins having a (meth) acryloyl group), modified epoxy resins in which part or all of the epoxy groups of the epoxy resin are modified with (meth) acrylic anhydride, epoxy One or more resins selected from the group consisting of modified epoxy resins in which all of the epoxy groups of the resin are modified with a modifying compound, wherein the modifying compound is a carboxylic acid (except (meth) acrylic acid) A resin that is one or more compounds selected from the group consisting of carboxylic anhydrides (excluding (meth) acrylic anhydride), alcohols and thiols is preferred.
ここで、エポキシ樹脂(但し、(メタ)アクリロイル基を有するエポキシ樹脂を除く)は、変性樹脂を得るための原料のエポキシ樹脂であり得る。また、エポキシ樹脂のエポキシ基の一部又は全部が(メタ)アクリル酸無水物で変性された変性エポキシ樹脂は、変性樹脂の製造方法によって、変性樹脂以外の成分として得られ得る成分である。エポキシ樹脂のエポキシ基の全部が変性化合物で変性された変性エポキシ樹脂であって、前記変性化合物が、カルボン酸(但し、(メタ)アクリル酸を除く)、カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)、アルコール及びチオールからなる群より選択される1以上の化合物である変性エポキシ樹脂は、変性樹脂の製造方法によって、変性樹脂以外の成分として得られ得る成分である。 Here, the epoxy resin (excluding an epoxy resin having a (meth) acryloyl group) may be a raw material epoxy resin for obtaining a modified resin. Moreover, the modified epoxy resin by which one part or all part of the epoxy group of the epoxy resin was modified | denatured with the (meth) acrylic anhydride is a component which can be obtained as components other than modified resin with the manufacturing method of modified resin. A modified epoxy resin in which all of the epoxy groups of the epoxy resin are modified with a modifying compound, wherein the modifying compound is a carboxylic acid (excluding (meth) acrylic acid), a carboxylic acid anhydride (providing (meth) The modified epoxy resin which is one or more compounds selected from the group consisting of alcohol and thiol (excluding acrylic anhydride) is a component that can be obtained as a component other than the modified resin by the method for producing the modified resin.
<光増感剤>
硬化性樹脂組成物は、光硬化の際、光への感度を高めるため、更に、光増感剤を含有してもよい。光増感剤は、硬化性の観点から、例えば、カルボニル化合物、有機硫黄化合物、過硫化物、レドックス系化合物、アゾ及びジアゾ化合物、ハロゲン化合物、光還元性色素等が挙げられる。光増感剤として、具体的には、N−メチルアクリドン、N−ブチルアクリドンのようなアクリドン誘導体;その他、α,α−ジエトキシアセトフェノン、ベンジル、フルオレノン、キサントン、ウラニル化合物等が挙げられ、また重合開始剤の例として挙げたものにも、光増感剤として機能するものがある。光増感剤は、1種単独で用いても2種以上を組み合わせて用いてもよい。
<Photosensitizer>
The curable resin composition may further contain a photosensitizer in order to increase sensitivity to light during photocuring. Examples of the photosensitizer include carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo and diazo compounds, halogen compounds, and photoreducible dyes from the viewpoint of curability. Specific examples of the photosensitizer include an acridone derivative such as N-methylacridone and N-butylacridone; in addition, α, α-diethoxyacetophenone, benzyl, fluorenone, xanthone, uranyl compound and the like. Some of the polymerization initiators function as photosensitizers. A photosensitizer may be used individually by 1 type, or may be used in combination of 2 or more type.
<フィラー>
フィラーは、硬化性樹脂組成物の粘度制御や硬化性樹脂組成物を硬化させた硬化物の強度向上、又は線膨張性を抑えることによって硬化性樹脂組成物の接着信頼性を向上させる等の目的で添加される。フィラーは、特に限定されず、無機フィラー及び有機フィラーが挙げられる。無機フィラーとしては、炭酸カルシウム、炭酸マグネシウム、硫酸バリウム、硫酸マグネシウム、珪酸アルミニウム、酸化チタン、アルミナ、酸化亜鉛、二酸化ケイ素、カオリン、タルク、ガラスビーズ、セリサイト活性白土、ベントナイト、窒化アルミニウム、及び窒化ケイ素が挙げられる。有機フィラーとしては、ポリメタクリル酸メチル、ポリスチレン、これらを構成するモノマーと他のモノマーとを共重合させて得られる共重合体、ポリエステル微粒子、ポリウレタン微粒子、ゴム微粒子、及び高いガラス転移温度を有する共重合体を含むシェルと低いガラス転移温度を有する共重合体のコアとから構成されるコアシェルタイプ粒子等が挙げられる。フィラーは、市販品を用いることができる。二酸化ケイ素粒子の市販品としては、シーホスターKEシリーズ(KE−C50等)等が挙げられる。また、コアシェルタイプ粒子としては、ゼフィアックシリーズ(F−351等、アイカ工業株式会社製)等が挙げられる。フィラーは、それぞれ、1種単独で用いても、2種以上を組み合わせて用いてもよい。
<Filler>
The purpose of the filler is to improve the adhesive reliability of the curable resin composition by controlling the viscosity of the curable resin composition, improving the strength of the cured product obtained by curing the curable resin composition, or suppressing linear expansion. Is added. A filler is not specifically limited, An inorganic filler and an organic filler are mentioned. Inorganic fillers include calcium carbonate, magnesium carbonate, barium sulfate, magnesium sulfate, aluminum silicate, titanium oxide, alumina, zinc oxide, silicon dioxide, kaolin, talc, glass beads, sericite activated clay, bentonite, aluminum nitride, and nitriding Silicon may be mentioned. Examples of the organic filler include polymethyl methacrylate, polystyrene, a copolymer obtained by copolymerizing the monomer and other monomers, polyester fine particles, polyurethane fine particles, rubber fine particles, and a copolymer having a high glass transition temperature. Examples thereof include core-shell type particles composed of a shell containing a polymer and a copolymer core having a low glass transition temperature. A commercial item can be used for a filler. Examples of commercially available silicon dioxide particles include the Seahoster KE series (KE-C50, etc.). Moreover, as a core-shell type particle | grain, Zefiac series (F-351 grade | etc., Aika Industrial Co., Ltd. product) etc. are mentioned. A filler may be used individually by 1 type, respectively, or may be used in combination of 2 or more type.
<シランカップリング剤>
シランカップリング剤は、接着強度をより高めることを目的として添加される。シランカップリング剤は、特に限定されず、γ−アミノプロピルトリメトキシシラン、γ−メルカプトプロピルトリメトキシシラン、γ−イソシアネートプロピルトリメトキシシラン及び3−グリシドキシプロピルトリメトキシシラン等が挙げられる。シランカップリング剤は、単独で用いられてもよく、2種以上を組み合わせて用いてもよい。
<Silane coupling agent>
The silane coupling agent is added for the purpose of further increasing the adhesive strength. The silane coupling agent is not particularly limited, and examples thereof include γ-aminopropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-isocyanatopropyltrimethoxysilane, and 3-glycidoxypropyltrimethoxysilane. A silane coupling agent may be used independently and may be used in combination of 2 or more type.
(硬化性樹脂組成物の用途)
硬化性樹脂組成物は、封止剤であるのが好ましく、表示素子、光量調整素子、焦点可変素子、光変調素子等に用いられる封止剤であるのがより好ましい。また、硬化性樹脂組成物は、モジュール型ディスプレイ、三次元ディスプレイ、ヘッドマウントディスプレイ、プロジェクション型ディスプレイ等を含む液晶ディスプレイ(又は液晶表示素子);調光フィルタ、調光シャッター、防眩ミラー、空間光量変調器等の光量調整液晶素子;液晶レンズ等の焦点可変液晶素子;及び、光偏向器、光分波器、位相制御、偏光制御、ホログラム、回折格子、波長フィルタ、周波数フィルタ等の光変調液晶素子;に用いられる液晶用シール剤であるのが更に好ましく、液晶滴下工法用シール剤であるのが特に好ましい。
(Use of curable resin composition)
The curable resin composition is preferably a sealant, and more preferably a sealant used for a display element, a light amount adjusting element, a focus variable element, a light modulation element, and the like. In addition, the curable resin composition is a liquid crystal display (or liquid crystal display element) including a module-type display, a three-dimensional display, a head-mounted display, a projection-type display, etc .; a dimming filter, a dimming shutter, an anti-glare mirror, a spatial light quantity Light modulation liquid crystal elements such as modulators; variable focus liquid crystal elements such as liquid crystal lenses; and light modulation liquid crystals such as optical deflectors, optical demultiplexers, phase control, polarization control, holograms, diffraction gratings, wavelength filters, and frequency filters More preferably, it is a liquid crystal sealant used in the element; and a liquid crystal dropping method sealant is particularly preferable.
硬化性樹脂組成物は、紫外線等のエネルギー線の照射により、熱を加えることにより、又は紫外線等のエネルギー線の照射の、前、後若しくは同時に熱を加えることにより硬化させることができる。 The curable resin composition can be cured by applying heat by irradiation with energy rays such as ultraviolet rays, or by applying heat before, after or simultaneously with irradiation of energy rays such as ultraviolet rays.
以下、本発明を実施例により具体的に説明するが、本発明はこれらの実施例に限定されるものではない。実施例及び比較例で使用した樹脂は以下のように製造した。 EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. Resins used in Examples and Comparative Examples were produced as follows.
[比較合成例1]比較変性樹脂1(部分メタクリル化ビスフェノールA型エポキシ樹脂)
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)340.0g、メタクリル酸(東京化成工業株式会社製)86.1g、及びトリフェニルホスフィン(東京化成工業株式会社製)500mgを混合し100℃で6時間撹拌した。淡黄色透明粘稠物の比較(メタ)アクリレート樹脂1を418.0g得た。
[Comparative Synthesis Example 1] Comparative modified resin 1 (partially methacrylated bisphenol A type epoxy resin)
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 340.0 g, methacrylic acid (Tokyo Chemical Industry Co., Ltd.) 86.1 g, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 500 mg were mixed and mixed. Stir at 6 ° C. for 6 hours. 418.0g of comparative (meth) acrylate resin 1 of the pale yellow transparent viscous substance was obtained.
[合成例1]変性樹脂1
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)340.0g、クロトン酸(東京化成工業株式会社製)86.1g、及びトリフェニルホスフィン(東京化成工業株式会社製)524mgを混合し100℃で4時間撹拌した。黄色透明粘稠物の変性樹脂1を421.0g得た。
[Synthesis Example 1] Modified resin 1
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 340.0 g, crotonic acid (Tokyo Chemical Industry Co., Ltd.) 86.1 g, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 524 mg are mixed and mixed. Stir at 4 ° C. for 4 hours. 421.0g of modified resin 1 of yellow transparent viscous substance was obtained.
[合成例2]変性樹脂2
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、ソルビン酸(東京化成工業株式会社製)28.0g、トルエン5mL、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で7時間撹拌した。トルエンを留去して透明粘稠物の変性樹脂2を107.0g得た。
[Synthesis Example 2] Modified resin 2
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, sorbic acid (Tokyo Chemical Industry Co., Ltd.) 28.0 g, toluene 5 mL, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 132 mg Mix and stir at 100 ° C. for 7 hours. Toluene was distilled off to obtain 107.0 g of a transparent viscous modified resin 2.
[合成例3]変性樹脂3
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、3−ブテン酸(東京化成工業株式会社製)21.5g、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で6時間撹拌した。透明粘稠物の変性樹脂3を102.0g得た。
[Synthesis Example 3] Modified resin 3
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, 3-butenoic acid (Tokyo Chemical Industry Co., Ltd.) 21.5 g, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 132 mg are mixed. And stirred at 100 ° C. for 6 hours. 102.0 g of modified resin 3 having a transparent viscous substance was obtained.
[合成例4]変性樹脂4
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、10−ウンデセン酸(東京化成工業株式会社製)46.1g、トルエン5mL、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で10時間撹拌した。トルエンを留去して透明粘稠物の変性樹脂4を130.0g得た。
[Synthesis Example 4] Modified resin 4
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, 10-undecenoic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) 46.1 g, toluene 5 mL, and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) 132 mg was mixed and stirred at 100 ° C. for 10 hours. Toluene was distilled off to obtain 130.0 g of a transparent viscous modified resin 4.
[合成例5]変性樹脂5
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、3−メチルクロトン酸(東京化成工業株式会社製)25.0g、トルエン5mL、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で6時間撹拌した。トルエンを留去して透明粘稠物の変性樹脂5を105.0g得た。
[Synthesis Example 5] Modified resin 5
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, 3-methylcrotonic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) 25.0 g, toluene 5 mL, and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) ) 132 mg was mixed and stirred at 100 ° C. for 6 hours. Toluene was distilled off to obtain 105.0 g of a modified resin 5 having a transparent viscous substance.
[合成例6]変性樹脂6
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、チグリン酸(東京化成工業株式会社製)25.0g、トルエン5mL、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で4時間撹拌した。トルエンを留去して透明粘稠物の変性樹脂6を106.0g得た。
[Synthesis Example 6] Modified resin 6
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, tiglic acid (Tokyo Chemical Industry Co., Ltd.) 25.0 g, toluene 5 mL, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 132 mg Mix and stir at 100 ° C. for 4 hours. Toluene was distilled off to obtain 106.0 g of a transparent viscous modified resin 6.
[合成例7]変性樹脂7
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)55.8g、4−ペンテン酸(東京化成工業株式会社製)16.4g、及びトリフェニルホスフィン(東京化成工業株式会社製)86mgを混合し100℃で7時間撹拌した。透明粘稠物の変性樹脂7を71.9g得た。
[Synthesis Example 7] Modified resin 7
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 55.8 g, 4-pentenoic acid (Tokyo Chemical Industry Co., Ltd.) 16.4 g, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 86 mg are mixed. And stirred at 100 ° C. for 7 hours. 71.9g of modified resin 7 of a transparent viscous substance was obtained.
[合成例8]変性樹脂8
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、酢酸(関東化学株式会社製)15.0g、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で7時間撹拌した。透明粘稠物の変性樹脂8を89.0g得た。
[Synthesis Example 8] Modified resin 8
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, acetic acid (manufactured by Kanto Chemical Co., Ltd.) 15.0 g, and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) 132 mg were mixed at 100 ° C. Stir for 7 hours. 89.0 g of modified resin 8 having a transparent viscous substance was obtained.
[合成例9]変性樹脂9
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、酪酸(東京化成工業株式会社製)22.0g、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で7時間撹拌した。透明粘稠物の変性樹脂9を96.6g得た。
[Synthesis Example 9] Modified resin 9
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, butyric acid (Tokyo Chemical Industry Co., Ltd.) 22.0 g, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 132 mg were mixed and mixed at 100 ° C. For 7 hours. 96.6g of modified resin 9 of transparent viscous material was obtained.
[合成例10]変性樹脂10
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、酢酸無水物(東京化成工業株式会社製)25.5g、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で14時間撹拌した。透明粘稠物の変性樹脂10を107.0g得た。
[Synthesis Example 10] Modified resin 10
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, acetic anhydride (Tokyo Chemical Industry Co., Ltd.) 25.5 g, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 132 mg were mixed. Stir at 100 ° C. for 14 hours. 107.0g of modified resin 10 of a transparent viscous material was obtained.
[合成例11]変性樹脂11
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、酪酸無水物(東京化成工業株式会社製)39.6g、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で72時間撹拌した。透明粘稠物の変性樹脂11を122.0g得た。
[Synthesis Example 11] Modified Resin 11
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, butyric anhydride (Tokyo Chemical Industry Co., Ltd.) 39.6 g, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 132 mg were mixed. The mixture was stirred at 100 ° C. for 72 hours. 122.0 g of modified resin 11 having a transparent viscous substance was obtained.
[合成例12]変性樹脂12
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、クロトン酸無水物(東京化成工業株式会社製)38.7g、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で30時間撹拌した。透明粘稠物の変性樹脂12を120.0g得た。
[Synthesis Example 12] Modified Resin 12
85.0 g of bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation), 38.7 g of crotonic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), and 132 mg of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) are mixed. And stirred at 100 ° C. for 30 hours. 120.0 g of a modified resin 12 having a transparent viscous substance was obtained.
[合成例13]変性樹脂13
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、安息香酸無水物(東京化成工業株式会社製)56.6g、及びトリフェニルホスフィン(東京化成工業株式会社製)132mgを混合し100℃で6時間撹拌した。透明粘稠物の変性樹脂13を138.0g得た。
[Synthesis Example 13] Modified resin 13
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, benzoic anhydride (Tokyo Chemical Industry Co., Ltd.) 56.6 g, and triphenylphosphine (Tokyo Chemical Industry Co., Ltd.) 132 mg are mixed. And stirred at 100 ° C. for 6 hours. 138.0g of modified resin 13 of a transparent viscous material was obtained.
[合成例14]変性樹脂14
ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0g、メタノール(関東化学株式会社製)425.0g、ナトリウムメトキシド(関東化学株式会社製)2.7gを混合し50℃で140分間撹拌した後、3%塩酸50.0gを加え、メタノールを減圧留去した後、酢酸エチル300mLを加えて300mLの水で4回洗浄した。得られた有機相に硫酸マグネシウムを加え、乾燥後、ろ過等で固形分を濾別し、得られた有機相の溶媒を減圧留去により留去し、透明粘稠物の変性樹脂14を83.5g得た。
[Synthesis Example 14] Modified resin 14
Bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) 85.0 g, methanol (manufactured by Kanto Chemical Co., Ltd.) 425.0 g, sodium methoxide (manufactured by Kanto Chemical Co., Ltd.) 2.7 g were mixed at 50 ° C. After stirring for 140 minutes, 50.0 g of 3% hydrochloric acid was added, methanol was distilled off under reduced pressure, 300 mL of ethyl acetate was added, and the mixture was washed 4 times with 300 mL of water. Magnesium sulfate is added to the obtained organic phase, and after drying, the solid content is separated by filtration and the like, and the solvent of the obtained organic phase is distilled off under reduced pressure to obtain 83 of a transparent viscous modified resin 14. .5 g was obtained.
[合成例15]変性樹脂15
1−ブタノール(関東化学株式会社製)425g、ナトリウムメトキシド(関東化学株式会社製)2.7gを混合し70℃で3時間撹拌した。反応混合物を50℃まで冷却し、ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)85.0gを加えて110分間撹拌した後、3%塩酸50.0gを加え、1−ブタノールを減圧留去した後、酢酸エチル300mLを加えて300mLの水で4回洗浄した。得られた有機相に硫酸マグネシウムを加え、乾燥後、ろ過等で固形分を濾別し、得られた有機相の溶媒を減圧留去により留去し、透明粘稠物の変性樹脂15を106.0g得た。
[Synthesis Example 15] Modified Resin 15
425 g of 1-butanol (manufactured by Kanto Chemical Co., Ltd.) and 2.7 g of sodium methoxide (manufactured by Kanto Chemical Co., Ltd.) were mixed and stirred at 70 ° C. for 3 hours. The reaction mixture was cooled to 50 ° C., 85.0 g of bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) was added and stirred for 110 minutes, 50.0 g of 3% hydrochloric acid was added, and 1-butanol was reduced in pressure. After evaporation, 300 mL of ethyl acetate was added and washed with 300 mL of water four times. Magnesium sulfate is added to the obtained organic phase, and after drying, the solid content is filtered off by filtration or the like, and the solvent of the obtained organic phase is distilled off under reduced pressure to remove a transparent viscous modified resin 15 by 106. 0.0 g was obtained.
[参考合成例1]エポキシ樹脂A
(参考合成例1−1)EXA−850CRPのエチレングリコール開環体の合成
エチレングリコール(東京化成工業株式会社製)500.0g、及び45%ホウフッ化錫(II)水溶液(森田化学工業株式会社製)1.0gをナスフラスコに入れた。ビスフェノールA型エポキシ樹脂(EXA−850CRP、DIC株式会社製)340.0gを撹拌しながら80℃に保ち1時間にわたり徐々に加え、添加終了より1時間80℃で撹拌した。反応混合物を室温に冷却し、クロロホルムを1L加え、水1Lで6回洗浄した。得られた有機相の溶媒を減圧留去により除去し、無色透明粘稠物のEXA−850CRP−エチレングリコール開環体を410.0g得た。
(参考合成例1−2)エポキシ樹脂Aの合成
EXA−850CRP−エチレングリコール開環体400.0g、エピクロロヒドリン(株式会社大阪ソーダ製)1017.0g、及び塩化ベンジルトリメチルアンモニウム(東京化成工業株式会社製)51.0gを、機械撹拌機、温度計、温度調節器、凝縮器、ディーン・スターク・トラップ及び滴下ロートを付した2Lの3頸丸底フラスコに入れた。次いで、混合物を70トル(torr)の高真空下撹拌しながら約50ないし55℃に加熱してエピクロロヒドリンを激しく還流した。48%水酸化ナトリウム水溶液(関東化学株式会社製)137.0gを2時間にわたり混合物にゆっくりと添加した。共沸物が生成次第、水/エピクロロヒドリン混合物のうち、エピクロロヒドリンを反応系に戻しながら撹拌を続けた。添加終了後、3時間にわたり撹拌を継続した。次いで、反応混合物を室温に冷却し、クロロホルム1Lを加え1Lの水で6回洗浄した。得られた有機相の溶媒を減圧留去により除去し、淡黄色透明粘稠物のエポキシ樹脂A(エポキシ当量228g/eq、粘度27,600mPa・s)を506.0g得た。
[Reference Synthesis Example 1] Epoxy resin A
(Reference Synthesis Example 1-1) Synthesis of EXA-850CRP ethylene glycol ring-opened product 500.0 g of ethylene glycol (manufactured by Tokyo Chemical Industry Co., Ltd.) and 45% tin borofluoride (II) aqueous solution (manufactured by Morita Chemical Co., Ltd.) ) 1.0 g was placed in an eggplant flask. 340.0 g of bisphenol A type epoxy resin (EXA-850CRP, manufactured by DIC Corporation) was gradually added over 1 hour while stirring at 80 ° C., and stirred at 80 ° C. for 1 hour from the end of the addition. The reaction mixture was cooled to room temperature, 1 L of chloroform was added, and the mixture was washed 6 times with 1 L of water. The solvent of the obtained organic phase was removed by distillation under reduced pressure to obtain 410.0 g of colorless and transparent viscous EXA-850CRP-ethylene glycol ring-opened product.
(Reference Synthesis Example 1-2) Synthesis of Epoxy Resin A 400.0 g of EXA-850CRP-ethylene glycol ring-opened product, 1017.0 g of epichlorohydrin (manufactured by Osaka Soda Co., Ltd.), and benzyltrimethylammonium chloride (Tokyo Chemical Industry) 51.0 g) was put into a 2 L 3-neck round bottom flask equipped with a mechanical stirrer, thermometer, temperature controller, condenser, Dean-Stark trap and dropping funnel. The mixture was then heated to about 50-55 ° C. with stirring under a high vacuum of 70 torr to vigorously reflux the epichlorohydrin. 137.0 g of 48% aqueous sodium hydroxide (manufactured by Kanto Chemical Co., Inc.) was slowly added to the mixture over 2 hours. As soon as the azeotrope was formed, stirring was continued while returning epichlorohydrin to the reaction system in the water / epichlorohydrin mixture. Stirring was continued for 3 hours after the addition. The reaction mixture was then cooled to room temperature, 1 L of chloroform was added, and the mixture was washed 6 times with 1 L of water. The solvent of the obtained organic phase was removed by distillation under reduced pressure to obtain 506.0 g of a light yellow transparent viscous epoxy resin A (epoxy equivalent 228 g / eq, viscosity 27,600 mPa · s).
[合成例16]変性樹脂16
エポキシ樹脂A68.4g、クロトン酸(東京化成工業株式会社製)12.9g、トルエン3mL、及びトリフェニルホスフィン(東京化成工業株式会社製)79mgを混合し100℃で9時間撹拌した。トルエンを留去して透明粘稠物の変性樹脂16を78.5g得た。
[Synthesis Example 16] Modified resin 16
68.4 g of epoxy resin A, 12.9 g of crotonic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), 3 mL of toluene, and 79 mg of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 100 ° C. for 9 hours. Toluene was distilled off to obtain 78.5 g of a transparent viscous modified resin 16.
[合成例17]変性樹脂17
エポキシ樹脂A45.7g、3−ブテン酸(東京化成工業株式会社製)8.6g、及びトリフェニルホスフィン(東京化成工業株式会社製)53mgを混合し100℃で16時間撹拌した。透明粘稠物の変性樹脂17を50.0g得た。
[Synthesis Example 17] Modified resin 17
45.7 g of epoxy resin A, 8.6 g of 3-butenoic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) and 53 mg of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 100 ° C. for 16 hours. 50.0 g of a modified resin 17 having a transparent viscous substance was obtained.
[合成例18]変性樹脂18
エポキシ樹脂A68.4g、10−ウンデセン酸(東京化成工業株式会社製)27.6g、トルエン3mL、及びトリフェニルホスフィン(東京化成工業株式会社製)79mgを混合し100℃で22時間撹拌した。トルエンを留去して透明粘稠物の変性樹脂18を93.8g得た。
[Synthesis Example 18] Modified Resin 18
68.4 g of epoxy resin A, 27.6 g of 10-undecenoic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), 3 mL of toluene, and 79 mg of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 100 ° C. for 22 hours. Toluene was distilled off to obtain 93.8 g of a transparent viscous modified resin 18.
[合成例19]変性樹脂19
エポキシ樹脂A68.4g、酢酸(関東化学株式会社製)9.0g、及びトリフェニルホスフィン(東京化成工業株式会社製)79mgを混合し100℃で13時間撹拌した。透明粘稠物の変性樹脂19を74.8g得た。
[Synthesis Example 19] Modified resin 19
68.4 g of epoxy resin A, 9.0 g of acetic acid (manufactured by Kanto Chemical Co., Inc.) and 79 mg of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 100 ° C. for 13 hours. 74.8 g of a modified resin 19 having a transparent viscous substance was obtained.
[合成例20]変性樹脂20
エポキシ樹脂A228.0g、メタクリル酸無水物(東京化成工業株式会社製)77.1g、イソブチル酸無水物(東京化成工業株式会社製)39.5g、及びトリフェニルホスフィン(東京化成工業株式会社製)262mgを混合し100℃で8時間撹拌した。黄色透明粘稠物の変性樹脂20を338.0g得た。
[Synthesis Example 20] Modified resin 20
228.0 g of epoxy resin A, 77.1 g of methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), 39.5 g of isobutyric anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) 262 mg was mixed and stirred at 100 ° C. for 8 hours. 338.0 g of yellowish transparent viscous modified resin 20 was obtained.
[合成例21]変性樹脂21
エポキシ樹脂A228.0g、メタクリル酸無水物(東京化成工業株式会社製)77.1g、イソブチル酸(東京化成工業株式会社製)22.0g、及びトリフェニルホスフィン(東京化成工業株式会社製)262mgを混合し100℃で7時間撹拌した。黄色透明粘稠物の変性樹脂21を324.0g得た。
[Synthesis Example 21] Modified resin 21
228.0 g of epoxy resin A, 77.1 g of methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), 22.0 g of isobutyric acid (manufactured by Tokyo Chemical Industry Co., Ltd.), and 262 mg of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) Mix and stir at 100 ° C. for 7 hours. 324.0g of modified resin 21 of a yellow transparent viscous substance was obtained.
[合成例22]変性樹脂22
エポキシ樹脂A228.0g、メタクリル酸無水物(東京化成工業株式会社製)57.8g、イソブチル酸無水物(東京化成工業株式会社製)59.3g、及びトリフェニルホスフィン(東京化成工業株式会社製)262mgを混合し100℃で8時間撹拌した。黄色透明粘稠物の変性樹脂22を342.0g得た。
[Synthesis Example 22] Modified Resin 22
228.0 g of epoxy resin A, 57.8 g of methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), 59.3 g of isobutyric anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) 262 mg was mixed and stirred at 100 ° C. for 8 hours. 342.0g of modified resin 22 of yellow transparent viscous material was obtained.
[合成例23]変性樹脂23
エポキシ樹脂A228.0g、メタクリル酸無水物(東京化成工業株式会社製)38.5g、イソブチル酸無水物(東京化成工業株式会社製)79.1g、及びトリフェニルホスフィン(東京化成工業株式会社製)262mgを混合し100℃で8時間撹拌した。黄色透明粘稠物の変性樹脂23を341.0g得た。
[Synthesis Example 23] Modified Resin 23
228.0 g of epoxy resin A, 38.5 g of methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), 79.1 g of isobutyl acid anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) 262 mg was mixed and stirred at 100 ° C. for 8 hours. 341.0g of modified resin 23 of yellow transparent viscous substance was obtained.
[合成例24]変性樹脂24
エポキシ樹脂A228.0g、メタクリル酸無水物(東京化成工業株式会社製)25.7g、イソブチル酸無水物(東京化成工業株式会社製)26.4g、及びトリフェニルホスフィン(東京化成工業株式会社製)262mgを混合し100℃で5時間撹拌した。黄色透明粘稠物の変性樹脂24を277.0g得た。
[Synthesis Example 24] Modified Resin 24
228.0 g of epoxy resin A, 25.7 g of methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), 26.4 g of isobutyl acid anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) 262 mg was mixed and stirred at 100 ° C. for 5 hours. 277.0 g of a yellow transparent viscous modified resin 24 was obtained.
[合成例25]変性樹脂25
エポキシ樹脂A228.0g、メタクリル酸無水物(東京化成工業株式会社製)17.1g、イソブチル酸無水物(東京化成工業株式会社製)35.1g、及びトリフェニルホスフィン(東京化成工業株式会社製)262mgを混合し100℃で5時間撹拌した。黄色透明粘稠物の変性樹脂25を276.0g得た。
[Synthesis Example 25] Modified Resin 25
228.0 g of epoxy resin A, 17.1 g of methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), 35.1 g of isobutyric anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) 262 mg was mixed and stirred at 100 ° C. for 5 hours. 276.0g of modified resin 25 of yellow transparent viscous material was obtained.
[合成例26]変性樹脂26
エポキシ樹脂A90.8g、メタクリル酸無水物(東京化成工業株式会社製)10.7g、クロトン酸無水物(東京化成工業株式会社製)10.7g、及びトリフェニルホスフィン(東京化成工業株式会社製)79mgを混合し100℃で4時間撹拌した。黄色透明粘稠物の変性樹脂26を102.2g得た。
[Synthesis Example 26] Modified Resin 26
Epoxy resin A 90.8 g, methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) 10.7 g, crotonic acid anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) 10.7 g, and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) 79 mg was mixed and stirred at 100 ° C. for 4 hours. 102.2 g of a modified resin 26 having a yellow transparent viscosity was obtained.
[合成例27]変性樹脂27
エポキシ樹脂A67.7g、メタクリル酸無水物(東京化成工業株式会社製)5.1g、クロトン酸無水物(東京化成工業株式会社製)10.2g、及びトリフェニルホスフィン(東京化成工業株式会社製)79mgを混合し100℃で4時間撹拌した。黄色透明粘稠物の変性樹脂27を79.3g得た。
[Synthesis Example 27] Modified Resin 27
67.7 g of epoxy resin A, 5.1 g of methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), 10.2 g of crotonic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), and triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) 79 mg was mixed and stirred at 100 ° C. for 4 hours. 79.3 g of a modified resin 27 having a yellow transparent viscosity was obtained.
[比較合成例2]比較変性樹脂2
エポキシ樹脂A228.0g、メタクリル酸(東京化成工業株式会社製)43.0g、及びトリフェニルホスフィン(東京化成工業株式会社製)262mgを混合し100℃で7時間撹拌した。黄色透明粘稠物の比較変性樹脂2を265.0g得た。
[Comparative Synthesis Example 2] Comparative modified resin 2
228.0 g of epoxy resin A, 43.0 g of methacrylic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), and 262 mg of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 100 ° C. for 7 hours. 265.0g of comparative modified resin 2 of a yellow transparent viscous substance was obtained.
[比較合成例3]比較変性樹脂3
エポキシ樹脂A228.0g、メタクリル酸無水物(東京化成工業株式会社製)115.6g、及びトリフェニルホスフィン(東京化成工業株式会社製)262mgを混合し100℃で8時間撹拌した。黄色透明粘稠物の比較変性樹脂3を339.0g得た。
[Comparative Synthesis Example 3] Comparative modified resin 3
228.0 g of epoxy resin A, 115.6 g of methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), and 262 mg of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 100 ° C. for 8 hours. 339.0g of comparative modified resin 3 of a yellow transparent viscous substance was obtained.
[比較合成例4]比較変性樹脂4
エポキシ樹脂A228.0g、メタクリル酸無水物(東京化成工業株式会社製)51.3g、及びトリフェニルホスフィン(東京化成工業株式会社製)262mgを混合し100℃で5時間撹拌した。黄色透明粘稠物の比較変性樹脂4を272.0g得た。
[Comparative Synthesis Example 4] Comparative modified resin 4
228.0 g of epoxy resin A, 51.3 g of methacrylic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.), and 262 mg of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) were mixed and stirred at 100 ° C. for 5 hours. 272.0g of comparative modified resin 4 of a yellow transparent viscous substance was obtained.
[光重合開始剤の製造]
実施例及び比較例で使用した光重合開始剤は、以下のようにして製造した。
(光重合開始剤1の製造)
PEG400のジグリシジルエーテル(デナコールEX−830、ナガセケムテックス株式会社製)26.8g、4−ジメチルアミノ安息香酸16.5g、塩化ベンジルトリメチルアンモニウム3.7g、及びメチルイソブチルケトン(MIBK)25.0gをフラスコに入れ、110℃、24時間撹拌した。反応混合物を室温に冷却し、クロロホルム50.0gに溶解させ、水100mLで6回洗浄した。有機相の溶媒を減圧留去し、光重合開始剤1を35.3g得た。
(光重合開始剤2の製造)
PEG400のジグリシジルエーテル(デナコールEX−830、ナガセケムテックス株式会社製)26.8g、2−ヒドロキシ−9H−チオキサンテン−9−オン22.8g、塩化ベンジルトリメチルアンモニウム3.7g、及びMIBK40.0gをフラスコに入れ、110℃、72時間撹拌した。反応混合物を室温に冷却し、クロロホルム50.0gに溶解させ、水100mLで6回洗浄した。有機相の溶媒を減圧留去し、光重合開始剤2を36.2g得た。
[Production of photopolymerization initiator]
The photopolymerization initiator used in Examples and Comparative Examples was produced as follows.
(Production of photopolymerization initiator 1)
26.8 g of diglycidyl ether of PEG400 (Denacol EX-830, manufactured by Nagase ChemteX Corporation), 16.5 g of 4-dimethylaminobenzoic acid, 3.7 g of benzyltrimethylammonium chloride, and 25.0 g of methyl isobutyl ketone (MIBK) Was placed in a flask and stirred at 110 ° C. for 24 hours. The reaction mixture was cooled to room temperature, dissolved in 50.0 g of chloroform, and washed 6 times with 100 mL of water. The solvent of the organic phase was distilled off under reduced pressure to obtain 35.3 g of photopolymerization initiator 1.
(Production of photopolymerization initiator 2)
26.8 g of diglycidyl ether of PEG400 (Denacol EX-830, manufactured by Nagase ChemteX Corporation), 22.8 g of 2-hydroxy-9H-thioxanthen-9-one, 3.7 g of benzyltrimethylammonium chloride, and 40.0 g of MIBK Was placed in a flask and stirred at 110 ° C. for 72 hours. The reaction mixture was cooled to room temperature, dissolved in 50.0 g of chloroform, and washed 6 times with 100 mL of water. The solvent of the organic phase was distilled off under reduced pressure to obtain 36.2 g of photopolymerization initiator 2.
[実施例1〜55及び比較例1〜4]
合成例及び比較合成例で製造した変性樹脂及び比較変性樹脂のそれぞれと、光重合開始剤1及び2、フィラー;コアシェルタイプ粒子(ゼフィアックF−351、アイカ工業株式会社製)、フィラー;二酸化ケイ素粒子(シーホスターKE−C50、株式会社日本触媒製)、シランカップリング剤;3−グリシドキシプロピルメチルジエトキシシラン(KBM−403、信越化学工業株式会社製)、硬化剤;ポリアミン系化合物(EH−5030S、株式会社ADEKA製、活性水素当量105g/eq)を用いて、下記の表1〜9に示す配合量(重量部)にて混合後、3本ロールミル(C−4 3/4×10、株式会社井上製作所製)により充分に混練して実施例及び比較例の硬化性樹脂組成物を作製した。
[Examples 1 to 55 and Comparative Examples 1 to 4]
Each of the modified resins and comparative modified resins produced in the synthesis examples and comparative synthesis examples, photopolymerization initiators 1 and 2, fillers; core-shell type particles (Zefiac F-351, manufactured by Aika Industry Co., Ltd.), fillers; silicon dioxide particles (Seahoster KE-C50, manufactured by Nippon Shokubai Co., Ltd.), silane coupling agent; 3-glycidoxypropylmethyldiethoxysilane (KBM-403, manufactured by Shin-Etsu Chemical Co., Ltd.), curing agent; polyamine compound (EH- 5030S, manufactured by ADEKA Co., Ltd., active hydrogen equivalent 105 g / eq), mixed in the blending amounts (parts by weight) shown in Tables 1 to 9 below, followed by a three roll mill (C-4 3/4 × 10, The curable resin compositions of Examples and Comparative Examples were sufficiently kneaded by Inoue Seisakusho Co., Ltd.
合成例及び比較合成例で製造した各変性樹脂、そして実施例及び比較例の硬化性樹脂組成物について、以下の試験による評価を行った。 Each modified resin produced in Synthesis Examples and Comparative Synthesis Examples, and the curable resin compositions of Examples and Comparative Examples were evaluated by the following tests.
[試験条件]
変性樹脂及び比較変性樹脂について、エポキシ当量及び粘度を測定し、光重合開始剤1及び2について、粘度を測定し、実施例及び比較例で製造した硬化性樹脂組成物の接着強度を測定した。
[Test conditions]
The epoxy equivalent and the viscosity of the modified resin and the comparative modified resin were measured, the viscosity of the photopolymerization initiators 1 and 2 was measured, and the adhesive strength of the curable resin compositions produced in Examples and Comparative Examples was measured.
(1)エポキシ当量(WPE)測定
JIS K 7236:2001記載の条件で測定した。表におけるエポキシ当量の単位は、g/eqである。
(1) Epoxy equivalent (WPE) measurement It measured on the conditions of JISK7236: 2001. The unit of epoxy equivalent in the table is g / eq.
(2)粘度測定
E型粘度計(RE105U、東機産業株式会社製)を用いて、25℃で測定した。
(2) Viscosity measurement It measured at 25 degreeC using the E-type viscosity meter (RE105U, the Toki Sangyo Co., Ltd. make).
(3)接着強度測定
純水洗浄後乾燥させたITO基板(403005XG−10SQ1500A、ジオマテック株式会社製)にエアディスペンサーを用いてポリイミド系配向液(サンエバーSE−7492、日産化学工業株式会社製)を滴下(0.4MPa、5.0秒)した後、スピンコーターにて10秒で5000rpmに達し、その後20秒キープする条件で均一塗布した。均一塗布した後、85℃のホットプレート上でプリベーク(1分)、230℃のオーブンでポストベーク(60分)し、ポリイミド配向膜付基板を作成した。
(3) Adhesive strength measurement A polyimide-based alignment liquid (Sunever SE-7492, manufactured by Nissan Chemical Industries, Ltd.) was dropped onto an ITO substrate (403005XG-10SQ1500A, manufactured by Geomat Co., Ltd.) that had been washed with pure water and dried using an air dispenser. (0.4 MPa, 5.0 seconds), and then, it was uniformly applied under the condition of reaching 5000 rpm in 10 seconds with a spin coater and then keeping for 20 seconds. After uniformly coating, pre-baking (1 minute) on an 85 ° C. hot plate and post-baking (60 minutes) in an oven at 230 ° C., a substrate with a polyimide alignment film was prepared.
硬化性樹脂組成物を、6μmスペーサーを散布したITO基板、ポリイミド配向膜付基板(30mm×30mm×0.5mmt)上の15mm×3mm、15mm×21mmの位置に、貼り合わせ後の硬化性樹脂組成物の直径が1.5〜2.5mmφの範囲となるように点塗布した。その後、同種の基板(23mm×23mm×0.5mmt)を貼り合わせ、紫外線を積算光量3000mJ/cm2で照射(照射装置:UVX−01224S1、ウシオ電機株式会社製)して硬化させ、120℃オーブンで1時間熱硬化を行い、硬化物試験片を作成した。オートグラフ(TG−2kN、ミネベア株式会社製)を用い、試験片を固定して基板の15mm×25mmの位置を5mm/分の速度で押し抜き、ITO基板同士(ITO/ITO)及びポリイミド基板同士(PI/PI(TN))の接着強度を測定した。 Curable resin composition after bonding the curable resin composition to the positions of 15 mm × 3 mm, 15 mm × 21 mm on an ITO substrate with a 6 μm spacer dispersed, a substrate with a polyimide alignment film (30 mm × 30 mm × 0.5 mmt) Spot coating was performed so that the diameter of the object was in the range of 1.5 to 2.5 mmφ. Thereafter, the same type of substrates (23 mm × 23 mm × 0.5 mmt) are bonded together, and ultraviolet rays are irradiated with an integrated light amount of 3000 mJ / cm 2 (irradiation apparatus: UVX-01224S1, manufactured by Ushio Electric Co., Ltd.), and cured. And cured for 1 hour to prepare a cured specimen. Using an autograph (TG-2kN, manufactured by Minebea Co., Ltd.), fixing the test piece and punching out a 15 mm × 25 mm position of the substrate at a speed of 5 mm / min, ITO substrates (ITO / ITO) and polyimide substrates The adhesive strength of (PI / PI (TN)) was measured.
エポキシ当量及び粘度測定の結果を、実施例1〜55及び比較例1〜4の硬化性樹脂組成物の配合組成と共に、表1〜9に示す。また、実施例及び比較例の一部について行った接着強度測定の結果を表10〜17に示す。 The results of the epoxy equivalent and viscosity measurement are shown in Tables 1 to 9 together with the blending compositions of the curable resin compositions of Examples 1 to 55 and Comparative Examples 1 to 4. Moreover, the result of the adhesive strength measurement performed about a part of Example and the comparative example is shown to Tables 10-17.
Claims (2)
熱硬化剤及び/又は重合開始剤と
を含有することを特徴とする、液晶用シール剤。
Ar 1 (−O−A 1 ) n1 (3)
〔式中、
Ar 1 は、炭素原子数、及びヘテロ原子数の合計が5以上であり、且つ1つ以上の芳香環、又はヘテロ芳香環を含むn1価の基であり、
n1は、1以上であり、
A 1 は、独立に、水素原子、下記式(1−1)で表される基、下記式(1−2)で表される基、下記式(2−1)で表される基、下記式(2−2)で表される基、下記式(2−3)で表される基、下記式(4−1)で表される基、又は、下記式(4−2)で表される基であるが、
但し、分子中に、式(1−1)で表される基又は式(1−2)で表される基を有する式(4−1)で表される基;式(1−1)で表される基及び/又は式(1−2)で表される基を有する式(4−2)で表される基;式(1−1)で表される基;並びに式(1−2)で表される基からなる群より選択される1以上の基を有し、且つ、
式(2−1)で表される基、式(2−2)で表される基又は式(2−3)で表される基を有する式(4−1)で表される基;式(2−1)で表される基、式(2−2)で表される基及び/又は式(2−3)で表される基を有する式(4−2)で表される基;式(2−1)で表される基;式(2−2)で表される基;並びに式(2−3)で表される基からなる群より選択される1以上の基を有する。〕
〔式中、
R 1 、R 2 、R 3 、R 4 、R 5 、R 6 、R 7 及びR 8 は、それぞれ独立に、水素原子又はメチル基であり、
R 21 は、アルキル基、アルケニル基、アルキニル基又はアリール基であり、
R 22 及びR 23 は、それぞれ独立に、アルキル基、アルケニル基、アルキニル基又はアリール基であるか、R 22 及びR 23 は、一緒になって、環構造を形成し、
X 1 は、酸素原子又は硫黄原子であり、
R 24 は、アルキル基、アルケニル基、アルキニル基又はアリール基であるが、
但し、R 21 、R 22 及びR 23 は、ビニル基又は1−メチルビニル基ではなく、
B 1 は、独立して、アルキレン基であり、m1は、1以上であり、
D 1 は、アリーレン基、アルキレン−アリーレン−アルキレン基、アルキレン−アリーレン基、アリーレン−アルキレン−アリーレン基又は基:−B 2 −(O−B 2 ) m2 −であり、B 2 は、独立に、アルキレン基であり、m2は、0又は1以上であり、
C 1 、C 2 及びC 3 は、それぞれ独立に、水素原子、式(1−1)で表される基、式(1−2)で表される基、式(2−1)で表される基、式(2−2)で表される基又は式(2−3)で表される基である。〕 A modified resin represented by the following formula (3) ;
A sealing agent for liquid crystal, comprising a thermosetting agent and / or a polymerization initiator.
Ar 1 (—O—A 1 ) n1 (3)
[Where,
Ar 1 is an n1 valent group having a total number of carbon atoms and heteroatoms of 5 or more, and including one or more aromatic rings or heteroaromatic rings,
n1 is 1 or more,
A 1 is independently a hydrogen atom, a group represented by the following formula (1-1), a group represented by the following formula (1-2), a group represented by the following formula (2-1), the following A group represented by the formula (2-2), a group represented by the following formula (2-3), a group represented by the following formula (4-1), or a group represented by the following formula (4-2). The group
However, in the molecule, a group represented by formula (4-1) having a group represented by formula (1-1) or a group represented by formula (1-2); A group represented by formula (4-2) having a group represented by formula (1-2) and / or a group represented by formula (1-2); a group represented by formula (1-1); and formula (1-2) And one or more groups selected from the group consisting of groups represented by:
A group represented by formula (4-1) having a group represented by formula (2-1), a group represented by formula (2-2), or a group represented by formula (2-3); A group represented by formula (4-2) having a group represented by (2-1), a group represented by formula (2-2) and / or a group represented by formula (2-3); A group represented by formula (2-1); a group represented by formula (2-2); and one or more groups selected from the group consisting of groups represented by formula (2-3). ]
[Where,
R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently a hydrogen atom or a methyl group,
R 21 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
R 22 and R 23 are each independently an alkyl group, alkenyl group, alkynyl group or aryl group, or R 22 and R 23 together form a ring structure;
X 1 is an oxygen atom or a sulfur atom,
R 24 is an alkyl group, an alkenyl group, an alkynyl group or an aryl group,
However, R 21 , R 22 and R 23 are not vinyl groups or 1-methylvinyl groups,
B 1 is independently an alkylene group, m 1 is 1 or more,
D 1 is an arylene group, an alkylene-arylene-alkylene group, an alkylene-arylene group, an arylene-alkylene-arylene group or a group: —B 2 — (O—B 2 ) m2 —, and B 2 is independently An alkylene group, m2 is 0 or 1 or more,
C 1 , C 2 and C 3 are each independently represented by a hydrogen atom, a group represented by the formula (1-1), a group represented by the formula (1-2), or a formula (2-1). A group represented by formula (2-2) or a group represented by formula (2-3). ]
ここで前記変性化合物は、カルボン酸(但し、(メタ)アクリル酸を除く)、カルボン酸無水物(但し、(メタ)アクリル酸無水物を除く)、アルコール及びチオールからなる群より選択される1以上の化合物である、請求項1に記載の液晶用シール剤。 Furthermore, epoxy resins (however, excluding epoxy resins having (meth) acryloyl groups), modified epoxy resins in which some or all of the epoxy groups of the epoxy resin are modified with (meth) acrylic anhydride, and epoxy resin epoxy Including one or more resins selected from the group consisting of modified epoxy resins wherein all of the groups are modified with a modifying compound;
Here, the modifying compound is selected from the group consisting of carboxylic acid (excluding (meth) acrylic acid), carboxylic anhydride (excluding (meth) acrylic anhydride), alcohol and thiol. is a more compounds, a liquid crystal sealing agent according to claim 1.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017070658A JP6601634B2 (en) | 2017-03-31 | 2017-03-31 | Modified resin and curable resin composition containing the same |
KR1020197028437A KR102220144B1 (en) | 2017-03-31 | 2018-03-29 | Modified resin and curable resin composition comprising the same |
CN201880014530.8A CN110366571B (en) | 2017-03-31 | 2018-03-29 | Modified resin and curable resin composition containing the same |
PCT/JP2018/013093 WO2018181649A1 (en) | 2017-03-31 | 2018-03-29 | Modified resin and curable resin composition containing same |
TW107111229A TWI724291B (en) | 2017-03-31 | 2018-03-30 | Modified resin and curable resin composition containing it |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017070658A JP6601634B2 (en) | 2017-03-31 | 2017-03-31 | Modified resin and curable resin composition containing the same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2018172484A JP2018172484A (en) | 2018-11-08 |
JP2018172484A5 JP2018172484A5 (en) | 2019-04-18 |
JP6601634B2 true JP6601634B2 (en) | 2019-11-06 |
Family
ID=63678151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017070658A Active JP6601634B2 (en) | 2017-03-31 | 2017-03-31 | Modified resin and curable resin composition containing the same |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6601634B2 (en) |
KR (1) | KR102220144B1 (en) |
CN (1) | CN110366571B (en) |
TW (1) | TWI724291B (en) |
WO (1) | WO2018181649A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6601633B2 (en) * | 2017-03-31 | 2019-11-06 | 協立化学産業株式会社 | (Meth) acrylate resin and curable resin composition containing the same |
CN114729073B (en) * | 2019-11-27 | 2023-09-29 | 大阪有机化学工业株式会社 | (meth) acrylate, curable resin composition, and cured product |
WO2024024331A1 (en) * | 2022-07-26 | 2024-02-01 | 味の素株式会社 | Resin composition |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5512043B2 (en) * | 1972-10-28 | 1980-03-29 | ||
JPS5910726B2 (en) * | 1979-10-12 | 1984-03-10 | 日立化成工業株式会社 | Method for producing water-dilutable self-curing resin |
JPS5659819A (en) * | 1979-10-18 | 1981-05-23 | Hitachi Chem Co Ltd | Production of epoxy-modified copolymer |
JPS62184014A (en) * | 1986-02-10 | 1987-08-12 | Nippon Shokubai Kagaku Kogyo Co Ltd | Resin composition which can give cured product excellent in heat resistance and electrical insulating property |
JP3543409B2 (en) * | 1995-03-24 | 2004-07-14 | 大日本インキ化学工業株式会社 | Active energy ray-curable epoxy acrylate resin composition |
JPH08333356A (en) * | 1995-06-09 | 1996-12-17 | Asahi Chiba Kk | New glycidyl compound, its production and curable composition containing the same compound |
JP3605452B2 (en) * | 1995-10-04 | 2004-12-22 | 三菱レイヨン株式会社 | Resin for water-based paint and water-based paint using the same |
JP2003107693A (en) * | 2001-09-27 | 2003-04-09 | Sumitomo Chem Co Ltd | Resin composition |
JP2004043575A (en) * | 2002-07-10 | 2004-02-12 | Sumitomo Chem Co Ltd | Resin composition |
CN100418995C (en) * | 2003-07-31 | 2008-09-17 | 日立化成工业株式会社 | Modified epoxy resin, process for production thereof, photosensitive resin compositions and photosensitive elements |
CN100404579C (en) * | 2003-11-26 | 2008-07-23 | 三井化学株式会社 | One-pack-type resin composition curable with combination of light and heat and use of the same |
CN101512421B (en) * | 2006-09-07 | 2011-05-11 | 三井化学株式会社 | Liquid crystal sealing agent, method for manufacturing liquid crystal display panel using the liquid crystal sealing agent, and liquid crystal display panel |
JP5172321B2 (en) | 2006-12-26 | 2013-03-27 | 三井化学株式会社 | Liquid crystal sealant |
CN102138104B (en) * | 2008-09-04 | 2013-01-23 | 日立化成工业株式会社 | Photosensitive resin composition for protective film of printed wiring board for semiconductor package |
JP2010248297A (en) * | 2009-04-10 | 2010-11-04 | Taiyo Ink Mfg Ltd | Photocurable resin and photocurable resin composition |
KR101220047B1 (en) * | 2009-10-12 | 2013-01-08 | 금호석유화학 주식회사 | Sealant composition for liquid crystal display device |
JP5736613B2 (en) * | 2010-10-01 | 2015-06-17 | 協立化学産業株式会社 | Low-eluting epoxy resin, partially esterified epoxy resin, production method thereof, and curable resin composition containing the same |
JP5979972B2 (en) | 2012-05-17 | 2016-08-31 | 協立化学産業株式会社 | Esterified epoxy resin, method for producing the same, and curable composition containing the same |
WO2014057871A1 (en) * | 2012-10-12 | 2014-04-17 | 協立化学産業株式会社 | Glycidyl ether compound, liquid crystal sealant, and method for producing glycidyl ether compound |
TWI641625B (en) * | 2013-03-06 | 2018-11-21 | 日商艾迪科股份有限公司 | Photocurable composition |
CN105431778A (en) * | 2013-08-02 | 2016-03-23 | 日立化成株式会社 | Photosensitive-resin composition |
TWI680994B (en) * | 2014-03-31 | 2020-01-01 | 日商協立化學產業股份有限公司 | Composition of curable resin with excellent flexibility after curing, (meth)acrylic curable resin, and liquid crystal sealant |
JP6461721B2 (en) * | 2015-06-11 | 2019-01-30 | 協立化学産業株式会社 | Epoxy compound and partially esterified epoxy compound thereof, production method thereof, and curable composition containing the same |
JP6601633B2 (en) * | 2017-03-31 | 2019-11-06 | 協立化学産業株式会社 | (Meth) acrylate resin and curable resin composition containing the same |
-
2017
- 2017-03-31 JP JP2017070658A patent/JP6601634B2/en active Active
-
2018
- 2018-03-29 CN CN201880014530.8A patent/CN110366571B/en active Active
- 2018-03-29 KR KR1020197028437A patent/KR102220144B1/en active IP Right Grant
- 2018-03-29 WO PCT/JP2018/013093 patent/WO2018181649A1/en active Application Filing
- 2018-03-30 TW TW107111229A patent/TWI724291B/en active
Also Published As
Publication number | Publication date |
---|---|
TW201902680A (en) | 2019-01-16 |
KR20190131045A (en) | 2019-11-25 |
TWI724291B (en) | 2021-04-11 |
WO2018181649A1 (en) | 2018-10-04 |
KR102220144B1 (en) | 2021-02-25 |
CN110366571A (en) | 2019-10-22 |
CN110366571B (en) | 2020-09-18 |
JP2018172484A (en) | 2018-11-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6601633B2 (en) | (Meth) acrylate resin and curable resin composition containing the same | |
JP6248221B2 (en) | Curable resin excellent in flexibility after curing, (meth) acrylated curable resin, and liquid crystal sealant composition | |
JP6601634B2 (en) | Modified resin and curable resin composition containing the same | |
JP6114107B2 (en) | Photocurable resin composition for liquid crystal sealant | |
CN113544183B (en) | Curable resin composition | |
US20180134839A1 (en) | Monomeric and oligomeric resins for one drop fill sealant application | |
JP6310852B2 (en) | Glycidyl ether compound, liquid crystal sealant, and method for producing glycidyl ether compound | |
JP6190553B2 (en) | Photopolymerization initiator | |
JP5773782B2 (en) | Novel (meth) acrylic resin and resin composition using the same | |
JP2017203830A (en) | Liquid crystal sealant and liquid crystal display cell using the same | |
JP6618186B2 (en) | Resin composition and adhesive for electronic parts | |
JP6643949B2 (en) | New (meth) acrylic compound and resin composition using the same | |
TW201736491A (en) | Photocurable resin composition, display element sealant, liquid crystal display element sealant, and liquid crystal display panel and production method therefor | |
JP2023061612A (en) | Curable resin composition comprising modified resin | |
JP2017203067A (en) | Resin composition and adhesive for electronic component | |
JP2024033212A (en) | Curable resin excellent in storage stability, and manufacturing method of the same | |
CN115003709B (en) | Compound, method for producing compound, and curable composition | |
JP2018063274A (en) | Liquid crystal sealant and liquid crystal display cell using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190305 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190305 |
|
A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20190305 |
|
A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20190328 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190514 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190705 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20190827 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20190924 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6601634 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |