JP6588125B2 - 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 - Google Patents
蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 Download PDFInfo
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- JP6588125B2 JP6588125B2 JP2018085753A JP2018085753A JP6588125B2 JP 6588125 B2 JP6588125 B2 JP 6588125B2 JP 2018085753 A JP2018085753 A JP 2018085753A JP 2018085753 A JP2018085753 A JP 2018085753A JP 6588125 B2 JP6588125 B2 JP 6588125B2
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- resin layer
- magnetic metal
- vapor deposition
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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Images
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- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018085753A JP6588125B2 (ja) | 2018-04-26 | 2018-04-26 | 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018085753A JP6588125B2 (ja) | 2018-04-26 | 2018-04-26 | 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017566424A Division JP6410247B1 (ja) | 2017-01-31 | 2017-01-31 | 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018138698A JP2018138698A (ja) | 2018-09-06 |
| JP2018138698A5 JP2018138698A5 (enExample) | 2018-10-18 |
| JP6588125B2 true JP6588125B2 (ja) | 2019-10-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018085753A Expired - Fee Related JP6588125B2 (ja) | 2018-04-26 | 2018-04-26 | 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 |
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| Country | Link |
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| JP (1) | JP6588125B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12116660B2 (en) | 2020-11-03 | 2024-10-15 | Samsung Display Co., Ltd. | Mask, mask fabrication method, and mask assembly |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109609902B (zh) * | 2018-10-26 | 2020-08-11 | 武汉华星光电半导体显示技术有限公司 | 一种掩模板及显示面板封装方法 |
| US20220181594A1 (en) * | 2019-03-27 | 2022-06-09 | Sakai Display Products Corporation | Method for manufacturing resin film having fine pattern, method for manufacturing organic el display device, base material film for use in formation of fine pattern, and resin film having support member attached thereto |
| CN109778116B (zh) | 2019-03-28 | 2021-03-02 | 京东方科技集团股份有限公司 | 一种掩膜版及其制作方法、掩膜版组件 |
| JP7473298B2 (ja) * | 2019-03-29 | 2024-04-23 | マクセル株式会社 | 蒸着マスク |
| CN110846614B (zh) | 2019-11-21 | 2022-03-25 | 昆山国显光电有限公司 | 一种掩膜版和蒸镀系统 |
| KR102716371B1 (ko) * | 2023-01-20 | 2024-10-15 | 주식회사 오럼머티리얼 | 밀착 지지부 및 그 제조 방법 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5899585B2 (ja) * | 2011-11-04 | 2016-04-06 | 株式会社ブイ・テクノロジー | マスクの製造方法 |
| JP6142386B2 (ja) * | 2012-12-21 | 2017-06-07 | 株式会社ブイ・テクノロジー | 蒸着マスクの製造方法 |
| JP6217197B2 (ja) * | 2013-07-11 | 2017-10-25 | 大日本印刷株式会社 | 蒸着マスク、樹脂層付き金属マスク、および有機半導体素子の製造方法 |
| JP6769692B2 (ja) * | 2015-01-14 | 2020-10-14 | 大日本印刷株式会社 | 蒸着マスクの製造方法、及び有機半導体素子の製造方法 |
| WO2017006821A1 (ja) * | 2015-07-03 | 2017-01-12 | 大日本印刷株式会社 | 蒸着マスクの製造方法、蒸着マスク準備体、有機半導体素子の製造方法、有機elディスプレイの製造方法、及び蒸着マスク |
| JP6341434B2 (ja) * | 2016-03-29 | 2018-06-13 | 株式会社ブイ・テクノロジー | 成膜マスク、その製造方法及び成膜マスクのリペア方法 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12116660B2 (en) | 2020-11-03 | 2024-10-15 | Samsung Display Co., Ltd. | Mask, mask fabrication method, and mask assembly |
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| Publication number | Publication date |
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| JP2018138698A (ja) | 2018-09-06 |
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