JP6588125B2 - 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 - Google Patents

蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 Download PDF

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JP6588125B2
JP6588125B2 JP2018085753A JP2018085753A JP6588125B2 JP 6588125 B2 JP6588125 B2 JP 6588125B2 JP 2018085753 A JP2018085753 A JP 2018085753A JP 2018085753 A JP2018085753 A JP 2018085753A JP 6588125 B2 JP6588125 B2 JP 6588125B2
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resin layer
magnetic metal
vapor deposition
metal body
layer
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JP2018138698A (ja
JP2018138698A5 (enExample
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克彦 岸本
克彦 岸本
崎尾　進
進 崎尾
光志 西田
光志 西田
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Sakai Display Products Corp
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Sakai Display Products Corp
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JP2018085753A 2018-04-26 2018-04-26 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法 Expired - Fee Related JP6588125B2 (ja)

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JP2018085753A JP6588125B2 (ja) 2018-04-26 2018-04-26 蒸着マスクの製造方法、蒸着マスク、および有機半導体素子の製造方法

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JP2018138698A5 JP2018138698A5 (enExample) 2018-10-18
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12116660B2 (en) 2020-11-03 2024-10-15 Samsung Display Co., Ltd. Mask, mask fabrication method, and mask assembly

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109609902B (zh) * 2018-10-26 2020-08-11 武汉华星光电半导体显示技术有限公司 一种掩模板及显示面板封装方法
JP6801130B1 (ja) * 2019-03-27 2020-12-16 堺ディスプレイプロダクト株式会社 微細パターンを有する樹脂フィルムの製造方法及び有機ｅｌ表示装置の製造方法並びに微細パターン形成用基材フィルム、及びサポート部材付き樹脂フィルム
CN109778116B (zh) 2019-03-28 2021-03-02 京东方科技集团股份有限公司 一种掩膜版及其制作方法、掩膜版组件
JP7473298B2 (ja) * 2019-03-29 2024-04-23 マクセル株式会社 蒸着マスク
CN110846614B (zh) * 2019-11-21 2022-03-25 昆山国显光电有限公司 一种掩膜版和蒸镀系统
KR102716371B1 (ko) * 2023-01-20 2024-10-15 주식회사 오럼머티리얼 밀착 지지부 및 그 제조 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5899585B2 (ja) * 2011-11-04 2016-04-06 株式会社ブイ・テクノロジー マスクの製造方法
JP6142386B2 (ja) * 2012-12-21 2017-06-07 株式会社ブイ・テクノロジー 蒸着マスクの製造方法
JP6217197B2 (ja) * 2013-07-11 2017-10-25 大日本印刷株式会社 蒸着マスク、樹脂層付き金属マスク、および有機半導体素子の製造方法
JP6769692B2 (ja) * 2015-01-14 2020-10-14 大日本印刷株式会社 蒸着マスクの製造方法、及び有機半導体素子の製造方法
WO2017006821A1 (ja) * 2015-07-03 2017-01-12 大日本印刷株式会社 蒸着マスクの製造方法、蒸着マスク準備体、有機半導体素子の製造方法、有機ｅｌディスプレイの製造方法、及び蒸着マスク
JP6341434B2 (ja) * 2016-03-29 2018-06-13 株式会社ブイ・テクノロジー 成膜マスク、その製造方法及び成膜マスクのリペア方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12116660B2 (en) 2020-11-03 2024-10-15 Samsung Display Co., Ltd. Mask, mask fabrication method, and mask assembly

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