JP6582037B2 - Resist developer management apparatus and management method - Google Patents

Description

  The present invention relates to a management device and a management method for a developer used for developing a photoresist in a manufacturing process of a semiconductor integrated circuit, a printed wiring board, a liquid crystal panel, and the like, and in particular, the contact between the developer and air is cut off. The present invention relates to a resist developer management device and a management method that prevent deterioration of the developer.

  Conventionally, a photolithography method has been widely used in the manufacture of electronic devices. In this photolithography method, a process is performed in which a predetermined optical pattern is exposed to a photoresist to form a latent image, and then the photoresist is developed and patterned. For such normal development, a resist developer containing tetramethylammonium hydroxide (hereinafter, TMAH) is used.

  The TMAH in the resist developer deteriorates the developing performance of the resist developer as the usage time elapses with development of the resist. In recent years, the concentration of TMAH is made constant so that the conductivity of the resist developer is constant, and the life of the resist developer is extended while maintaining the development performance of the resist developer. Accordingly, the resist developer tends to come into contact with an atmospheric gas such as air for a long time.

  When the resist developer comes into contact with an atmospheric gas such as air for a long time, carbon dioxide in the atmosphere dissolves in the resist developer, and various carbonates such as carbonates of TMA (tetramethylammonium) are contained in the resist developer. There is a problem that accumulates.

  If such carbonates accumulate in the resist developer, the development performance of the resist may be adversely affected. Further, since TMA carbonate is partially dissociated in the resist developer, the TMA carbonate increases the conductivity of the resist developer.

  Therefore, even if the resist developer is supplemented with TMAH so as to keep the conductivity of the resist developer constant, it is difficult to accurately control the concentration of TMAH in the resist developer.

  Therefore, the invention described in Patent Document 1 discloses a method for removing a resist developer containing TMAH (tetramethylammonium) and carbonate with a nanofiltration membrane in order to remove carbonate in the resist developer. .

JP 2006-189646 A

  However, the invention described in Patent Document 1 is in a state where the resist developer is in contact with air and cannot prevent the formation of carbonate, and it is necessary to frequently replace the nanofiltration membrane, thereby reducing the cost. It is difficult to plan.

  The present invention has been made in view of the above problems, and resists the formation of carbonate due to the reaction between the developer and carbon dioxide in the air by blocking the contact between the developer and air with an inert gas. It is an object of the present invention to provide a developer management apparatus and management method.

In order to solve the above problems, the present invention provides a resist developer management apparatus for supplying an alkaline resist developer to a development process facility, the development process facility capable of being filled with an inert gas, and the development A new solution storage tank capable of storing a resist developer, which is a new solution to be supplied to the process equipment, and being filled with an inert gas; and a stock solution tank for feeding a high concentration resist developer to the new solution storage tank; the the new liquid storage tank, a stock solution tank, and an inert gas supply means for supplying an inert gas to the developing process equipment, of the new chemical reservoir tank and the developing step in the tank from the facility and the facility Bei and exhaust means for exhausting the air, and supply means for supplying fresh liquid from said fresh liquid storage tank to the developer process equipment, and recovery means for recovering the resist developer from the developing process equipment, the And said supply means, a removal means for removing said resist developer Thermoelectric device for the temperature constant, the impurity of the electronic thermal device than in New disposed downstream liquid, Conductivity measuring means disposed downstream of the removing means for measuring the conductivity of the new liquid, and circulating the resist developer by the new liquid storage tank and the recovery means, The conductivity measuring means measures the conductivity of the resist developer and supplies the new solution having a predetermined conductivity to the development process equipment. The inert gas supply means A gas supply line for supplying the inert gas directly connected to each of the tank and the development process facility; and the exhaust means is directly connected to each of the new liquid storage tank and the development process facility The And an exhaust pipe for exhausting air, and supplying the inert gas to the new liquid storage tank and the development process equipment by the inert gas supply means, and at the same time, air in the tank and equipment by the exhaust means. It is characterized by exhausting.

The fresh liquid storage tank is provided with a valve that can be opened and closed in the gas supply pipe and the exhaust pipe connected to the fresh liquid storage tank and the development process facility, respectively. Features.

Further, the supply means, prior to the conductivity of the resist developer is measured by Kishirube conductivity measuring means, if the conductivity is less than the prescribed value, the new liquid storage high density resist developer from the stock solution tank It is characterized by feeding liquid to the tank.

  The new solution storage tank wastes a predetermined amount of the resist developer stored in the tank when a high-concentration resist developer is sent from the stock solution tank.

  Further, the new liquid storage tank has a first measuring means for measuring the oxygen concentration in the tank, and the inert gas supply means measures the oxygen concentration in the tank by the measuring means. An inert gas is supplied into the tank, and air in the tank is exhausted by the exhaust means.

  Further, the development process facility has a second measuring unit for measuring the oxygen concentration in the facility, and the inert gas supply is performed while measuring the oxygen concentration in the facility by the second measuring unit. An inert gas is supplied into the facility by the means, and air in the tank is exhausted by the exhaust means.

  According to the present invention, in the tank for storing the developing solution or in the facility for performing the developing process, the contact between the developing solution and air is blocked, thereby generating carbonate by the reaction between the developing solution and carbon dioxide in the air. Can be prevented.

1 is a diagram illustrating a configuration of a developer management apparatus according to a first embodiment. FIG. 5 is a flowchart showing a flow of a developer management method according to the first embodiment. FIG. 5 is a diagram illustrating a configuration of a developer management apparatus according to a second embodiment. 10 is a flowchart illustrating a developer management method according to a second embodiment.

  Next, a resist developer management apparatus and management method according to the present embodiment will be described with reference to the drawings.

<First Embodiment>
FIG. 1 is a diagram illustrating a configuration of a developing solution management apparatus according to the first embodiment.
As shown in the figure, the resist developer management apparatus 100 includes a new solution storage tank 2, a stock solution tank 3, a pump 4, a filter 5, a level sensor 6, a regulator 6, control valves 10 to 23, New liquid supply line 30, recovery line 31, exhaust lines 32 and 39, nitrogen gas supply lines 33 and 35, stock solution replenishment line 34, waste liquid lines 36 and 37, and development process equipment 40 It consists of and.

  In the new solution storage tank 2, a new solution supply line 30 for supplying a new solution of the resist developer to the developing process facility 40, and a recovery line 31 for recovering the resist developer from the developing process facility 40, An exhaust line 32 for exhausting air in the tank, a nitrogen gas supply line 33 for supplying nitrogen gas into the tank, and replenishment of stock solution for replenishing the resist developer stock solution from the stock tank 3 A pipe 34, a waste liquid pipe 36 for discarding the waste liquid, and a measuring instrument 2a for measuring the oxygen concentration in the tank are connected.

  The new liquid storage tank 2 stores an alkaline developer used in the development process equipment 40, and is, for example, a 2.38 mass% aqueous solution of TMAH (trimethylammonium hydroxide). This alkaline developer is supplied from the stock solution tank 3 in which a high-concentration developer is stored through the stock solution replenishment conduit 34, and after adjusting the concentration, adjusting the conductivity, etc., as a new solution, development process equipment 40.

  The new liquid supply pipe 30 for supplying the new liquid to the development process equipment 40 connected to the new liquid storage tank 2 includes an electronic cooling device 2b, a filter 5, and a conductivity meter 2c in the middle of the pipe. And are connected. The electronic cooling device 2b is for making the temperature of the new solution constant when supplying the new solution from the new solution storage tank 2 to the development process facility 40. The filter 5 removes impurities contained in the new solution. It is for removing. The conductivity meter 2c is for measuring the conductivity of the new liquid.

  In the new solution storage tank 2, the resist developer already stored and the stock solution fed from the stock solution tank 3 are mixed so that the proper conductivity can be obtained while measuring the conductivity. A new solution is generated and supplied to the development process facility 40.

In this case, the control valve 10 provided in the new liquid supply line 30 is opened, the control valve 11 is closed, and the control valve 12 provided in the recovery line 31 is opened. The new liquid is circulated in the new liquid storage tank 2 and the recovery pipe line 31. During this period, the temperature of the new liquid can be kept constant or the conductivity can be adjusted. When supply to the development process facility 40 is necessary, the control valve 11 is opened to supply a new solution.
The new liquid that is no longer needed can be discarded from the waste liquid conduit 26 connected to the new liquid storage tank 2.

The stock solution tank 3 is connected to a stock solution supply line 34 for supplying stock solution to the new solution storage tank 2 and a nitrogen gas supply line 35 for supplying nitrogen gas into the stock solution tank 3. The nitrogen gas supply line 35 is provided with a regulator 7 for adjusting the pressure in the stock solution tank 3.
The level sensor 6 provided in the stock solution replenishment line 34 monitors the remaining amount of the stock solution in the stock solution tank 3.
Moreover, in this embodiment, the gas supplied to the fresh solution storage tank 2 and the stock solution tank 3 is not limited to nitrogen gas, but may be an inert gas.

  In addition, when replenishing the stock solution from the stock solution tank 3 to the new solution storage tank 2, it is performed after discarding a predetermined amount of the new solution in the new solution storage tank 2.

  The control valves 10 to 23 are controlled to open and close by a control unit (not shown). Further, the temperature and conductivity of the new liquid and the oxygen concentration in the new liquid storage tank 2 are monitored by the control unit, and the control valves 10 to 23 are controlled according to the situation to supply the raw liquid and nitrogen gas, Exhaust can be performed.

  The development process facility 40 employs the spin method in the first embodiment, and a substrate holding unit 41 for holding the wafer W is installed in the development process facility 40. The new liquid supplied from the new liquid supply conduit 30 is sprayed from the upper part of the wafer W and applied to the wafer W.

  Further, the new liquid scattered around the wafer W is recovered by the recovery pipe line 31 connected to the development process facility 40 or processed as waste liquid from the connected waste liquid pipe line 37.

Next, with reference to FIG. 2, a resist developer management method according to the first embodiment will be described.
FIG. 2 is a flowchart showing a flow of a resist developer management method according to the first embodiment.
First, the oxygen concentration in the tank is measured by the measuring instrument 2a installed in the new liquid storage tank 2 (step S1). When the oxygen concentration in the new liquid storage tank 2 is equal to or less than a preset specified value or zero (step S2 / NO), the oxygen concentration is measured again.

  When the oxygen concentration in the new liquid storage tank 2 is equal to or higher than a predetermined value set in advance (step S2 / YES), the control valve 14 provided in the exhaust pipe line 32 is opened by the control unit, and the nitrogen gas supply pipe The control valves 15 and 16 provided in the path 33 are opened (step S3).

  Nitrogen gas is supplied into the new liquid storage tank 2 by opening the control valves 15 and 16 (step S4). On the other hand, the air in the new liquid storage tank 2 is exhausted from the exhaust pipe 32. Then, the oxygen concentration in the new liquid storage tank 2 is measured again. If the oxygen concentration in the new liquid storage tank 2 is equal to or less than the specified value or zero (step S5 / YES), the control valves 15 and 16 are closed and nitrogen is added. The supply of gas is stopped and the control valve 14 of the exhaust pipe 32 is closed (step S6). Thereby, it will be in the state with which nitrogen gas was filled in the new liquid storage tank 2. FIG.

  If the oxygen concentration in the new liquid storage tank 2 is not less than the specified value (step S5 / NO), nitrogen gas is supplied until the oxygen concentration is lower than the specified value, and the air in the new liquid storage tank 2 is Continue to exhaust.

  According to the management apparatus and management method for a resist developer according to the first embodiment, the new liquid storage tank 2 is filled with nitrogen gas and the air is exhausted, so that the air in the new liquid storage tank 2 is in the air. Contact between the carbon dioxide gas and the resist developer can be prevented, and the formation of carbonate can be prevented.

  Accordingly, even when the new solution is not supplied to the resist developing device for a long period of time, the inside of the new solution storage tank 2 is filled with nitrogen gas, and there is no contact with carbon dioxide in the air. Is not produced and can be used again without discarding the new solution.

<Second Embodiment>
Next, a resist developer management apparatus and management method according to the second embodiment will be described.
FIG. 3 is a diagram showing a configuration of a resist developer management apparatus according to the second embodiment.
Note that description of the same components as those in the first embodiment is omitted.
As shown in the figure, in addition to the configuration of the first embodiment described above, the resist developer management apparatus 200 includes a nitrogen gas supply line 38 for supplying nitrogen gas to the development process equipment 40 and the development process equipment 40. An exhaust line 39 for exhausting air, a recovery line 31 for recovering the resist developer, and a measuring instrument 43 for measuring the oxygen concentration in the development process facility 40 are connected.

The development process facility 40 according to the second embodiment employs a cassette batch method, and is a facility that accommodates a plurality of wafers W in the processing tank 42 and performs development processing. In addition, this equipment is provided with a lid 41, and the inside of the equipment can be sealed by closing the lid 41 .

  In the development process equipment 40, first, the lid 41 is closed to shut off the inside of the equipment from the outside air so as to be sealed, the control valve 23 provided in the exhaust pipe 39 is opened, and then the nitrogen gas supply pipe 38 is connected. The provided control valve 22 is opened. Then, nitrogen gas is supplied from the nitrogen gas supply line 38 into the developing process facility 40, and the air in the developing process facility 40 is exhausted from the exhaust line 39. The measuring device 43 measures the oxygen concentration in the development process facility 40 and continues to supply nitrogen gas until the oxygen concentration is equal to or less than a specified value or zero.

  When the development process facility 40 is filled with nitrogen gas, the control valves 22 and 23 are closed to perform development processing. When the lid 41 is opened and the wafer W is accommodated or taken out, the air in the development process facility 40 is exhausted again, and nitrogen gas is supplied to fill the facility with nitrogen gas.

A recovery line 31 is connected to the new liquid storage tank 2, and the resist developer overflowed in the development process facility 40 is recovered.
Note that the process described in the first embodiment is the same for the process of supplying a new solution to the development process facility 40 and the process of supplying nitrogen gas into the new solution storage tank 2 or the stock solution tank 3. The description is omitted.

Next, a developer management method according to the second embodiment will be described.
FIG. 4 is a flowchart illustrating a developer management method according to the second embodiment.
As shown in the figure, first, nitrogen gas is supplied from the development process facility 40 through the nitrogen gas supply line 38 (step S10). In the development process facility 40, along with the supply of nitrogen gas, the air in the facility is exhausted by the exhaust line 39, and the facility is filled with nitrogen gas while measuring the oxygen concentration in the facility by the measuring instrument 42. Block contact with carbon dioxide.

  Next, a resist developer as a new solution is supplied from the new solution storage tank 2 to the development process facility 40 (step S11), and the development process is started (step S12). Then, the developer overflowed from the processing tank 41 during the developing process is collected (step S13).

  The developer overflowed from the processing tank 42 is recovered by the recovery pipe 31 and sent to the new liquid storage tank 2. Next, the conductivity of the new liquid stored in the new liquid storage tank 2 is measured (step S14). If the conductivity of the new solution has reached the specified value, the new solution is brought to a constant temperature by the electronic cooling / heating device 2b, and the new solution is supplied to the development process facility 40 (step S17).

  On the other hand, when the conductivity of the new liquid in the new liquid storage tank 2 does not reach the specified value (step S15 / NO), a certain amount of the new liquid is discharged from the waste liquid line 36, and a high concentration resist is supplied from the stock liquid tank 3. The developer is supplied to the new solution storage tank 2. In the new solution storage tank 2, a high-concentration resist developer is supplied from the stock solution tank 3, stirred with a built-in stirrer (not shown), and added with pure water to adjust the conductivity (step) S16). Then, a new solution whose conductivity is adjusted is supplied to the development process facility (step S17).

  According to the developer management apparatus and method according to the second embodiment, the resist developer and the air (particularly, by exhausting the air in the facility while supplying nitrogen gas into the development process facility 40). Contact with carbon dioxide gas) can be blocked. Thereby, the production | generation of carbonate by reaction of a resist developing solution and a carbon dioxide gas can be prevented within an installation.

100, 200 Developer management device 2 New solution storage tank 2a, measuring instrument 2b Electronic cooling device 2c Conductivity meter 3 Stock solution tank 4 Pump 5 Filter 6 Level sensor 10-23 Control valve 30 New solution supply line 32, 39 Exhaust Lines 33, 35, 38 Nitrogen gas supply line 34 Supply line 36 Waste liquid line 31 Recovery line 40 Development process equipment 41 Processing tank

Claims (6)

A resist developer management apparatus for supplying an alkaline resist developer to a development process facility,
The development process equipment capable of being filled with an inert gas;
A new solution storage tank capable of storing a resist developer, which is a new solution to be supplied to the development process equipment, and being filled with an inert gas;
A stock solution tank for sending a high-concentration resist developer to the new solution storage tank;
An inert gas supply means for supplying an inert gas to the new solution storage tank, the stock solution tank, and the development process facility ;
Exhaust means for exhausting air in the tank and equipment from the new liquid storage tank and the development process equipment,
Supply means for supplying new liquid from the new liquid storage tank to the development process facility;
A recovery means for recovering the resist developer from the development process equipment ,
The supply means includes an electronic cooling device for keeping the temperature of the resist developer constant, a removing means disposed downstream from the electronic cooling device to remove impurities in the new solution, and the removing means An electrical conductivity measuring means for measuring the electrical conductivity of the new liquid disposed further downstream, and circulating the resist developer by the new liquid storage tank and the recovery means, Measuring the conductivity of the resist developer by a measuring means, and configured to supply the new solution having a predetermined conductivity to the development process equipment,
The inert gas supply means, each of said developing process equipment and the new liquid storage tank is directly connected to have a gas supply conduit for supplying the inert gas, before Symbol exhaust means, said fresh liquid reservoir When connected directly to each of the tanks and the developing process equipment possess an exhaust pipe for exhausting the air, supplying an inert gas wherein the new liquid storage tank and the developing process equipment by the previous SL inert gas supply means At the same time, the exhaust unit has been configured to exhaust the air in and features tank by resist developer management apparatus, characterized in that.   2. The resist according to claim 1, wherein valves that can be opened and closed are respectively provided in the gas supply pipe and the exhaust pipe connected to the new liquid storage tank and the development process facility, respectively. Developer management device. Said supply means, prior to measuring the conductivity of the resist developer by Kishirube conductivity measuring means, if the conductivity is less than the prescribed value, the resist developing solution having a high concentration of the stock solution tank said the new liquid storage tank The resist developer management apparatus according to claim 1 , wherein the resist developer management apparatus feeds the liquid. The new chemical storage tank, when the resist developing solution having a high concentration of the stock solution tank is fed, according to claim 3, characterized in that the waste liquid a certain amount of the resist developing solution stored in the tank resist developer management device according to.   The new liquid storage tank has first measuring means for measuring the oxygen concentration in the tank, and the inert gas supply means measures the tank while the oxygen concentration in the tank is measured by the measuring means. 2. The resist developer management apparatus according to claim 1, wherein an inert gas is supplied into the tank and air in the tank is exhausted by the exhaust means. The development process facility has a second measuring unit for measuring the oxygen concentration in the facility, and the inert gas supply unit measures the oxygen concentration in the facility by the second measuring unit. 2. The resist developer management apparatus according to claim 1, wherein an inert gas is supplied into the facility and air in the tank is exhausted by the exhaust means.

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