JP6579933B2 - Substrate storage container - Google Patents
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- JP6579933B2 JP6579933B2 JP2015239909A JP2015239909A JP6579933B2 JP 6579933 B2 JP6579933 B2 JP 6579933B2 JP 2015239909 A JP2015239909 A JP 2015239909A JP 2015239909 A JP2015239909 A JP 2015239909A JP 6579933 B2 JP6579933 B2 JP 6579933B2
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Description
本発明は、半導体ウェーハ、フォトマスクガラス、アルミニウムディスクなどの基板を収納する基板収納容器に関する。 The present invention relates to a substrate storage container for storing substrates such as semiconductor wafers, photomask glass, and aluminum disks.
従来から、半導体ウェーハ、フォトマスクガラス、アルミニウムディスクなどの基板を出し入れする開口部を備えた容器本体と当該開口部を閉鎖する蓋体とを有する基板収納容器が知られている。容器本体の内側壁には、基板を水平に支持するための支持部と、支持部の奥側に位置する壁面には基板を保持するための傾斜溝が設けられている。蓋体の基板と向き合う内側の面には、基板を保持する前側溝部を備えたリテーナが取り付けられている。こうした基板収納容器において、蓋体を容器本体に取り付けて閉鎖した際には、蓋体に取り付けられるリテーナの前側溝部と、容器本体の内側壁に備えられる支持部の奥側にある傾斜溝との間で基板を支持部から浮かした状態で保持し、輸送時に基板が振動等で汚染されないようにしている。蓋体を容器本体の開口部から取り外した際には、支持部の上面に基板が搭載される。このように、蓋体を取り付けた状態と取り外した状態とでは、基板の支持位置が異なる。 2. Description of the Related Art Conventionally, there is known a substrate storage container having a container main body having an opening for taking in and out a substrate such as a semiconductor wafer, a photomask glass, and an aluminum disk, and a lid for closing the opening. A support portion for horizontally supporting the substrate is provided on the inner side wall of the container main body, and an inclined groove for holding the substrate is provided on a wall surface located on the back side of the support portion. A retainer having a front groove portion for holding the substrate is attached to the inner surface of the lid that faces the substrate. In such a substrate storage container, when the lid is attached to the container body and closed, the front groove portion of the retainer attached to the lid body, and the inclined groove on the back side of the support portion provided on the inner wall of the container body, The substrate is held in a state where it is lifted from the support portion so that the substrate is not contaminated by vibration or the like during transportation. When the lid is removed from the opening of the container body, the substrate is mounted on the upper surface of the support. Thus, the support position of the substrate differs between the state where the lid is attached and the state where it is removed.
上記のような基本構造を有する基板収納容器において、例えば、蓋体を容器本体に取り付けるときに基板が傾斜溝を登りやすくする一方、蓋体を取り外したときに基板が滑り下りやすいように、傾斜溝の上下の角度を変えて、なおかつ使用時に基板収納容器の上下を反転させることが提案されている(例えば、特許文献1を参照)。また、リテーナの前側溝部の傾斜角度により基板の回転を抑制する提案もなされている(例えば、特許文献2を参照)。 In the substrate storage container having the basic structure as described above, for example, when the lid is attached to the container body, the substrate is easy to climb the inclined groove, while the substrate is easily inclined when the lid is removed. It has been proposed to change the vertical angle of the groove and to reverse the vertical direction of the substrate storage container during use (see, for example, Patent Document 1). In addition, proposals have been made to suppress the rotation of the substrate by the inclination angle of the front groove portion of the retainer (see, for example, Patent Document 2).
上記従来技術は、基板収納容器の上下反転を可能にし、あるいは収納時の基板の回転を抑制する上では一定の効果を奏するものの、収納時の基板に樹脂の擦れ痕が付くのを低減し、かつ回転をさらに抑制するには、新たな改良を要することがわかった。昨今、基板の代表例であるウェーハの口径が450mmとさらに大きくなる提案があり、これに伴い、ウェーハの質量も大きくなることが予想される。ウェーハの質量が大きくなると、従来よりも基板を保持する傾斜溝と基板とが強く接触し、ウェーハの輸送時には振動などによってウェーハ端面に傾斜溝を構成している材料の擦れ痕が付着する可能性が高くなると考えられる。また、ウェーハの保持力不足の場合には、ウェーハの回転が発生する危険性も高くなる。これは、ウェーハのみならず、フォトマスクガラスあるいはアルミニウムディスク等の他の基板でも同様の問題である。 The above prior art enables the substrate storage container to be turned upside down or has a certain effect in suppressing the rotation of the substrate during storage, but reduces the amount of resin rubbing marks on the substrate during storage, Moreover, it was found that a new improvement is required to further suppress the rotation. Recently, there is a proposal that the diameter of a wafer, which is a representative example of a substrate, is further increased to 450 mm, and accordingly, the mass of the wafer is expected to increase. When the mass of the wafer increases, the inclined groove that holds the substrate and the substrate come into stronger contact than before, and when the wafer is transported, there is a possibility that the rubbing traces of the material constituting the inclined groove adhere to the wafer end surface due to vibration or the like. Will be higher. In addition, when the holding force of the wafer is insufficient, there is a high risk that the wafer will rotate. This is the same problem not only with wafers but also with other substrates such as photomask glass or aluminum disks.
本発明は、上記課題を解決すること、すなわち、基板の輸送時に基板の回転を低減し、基板を保持する材料の擦れ痕の付着を低減可能な基板収納容器を提供することを目的とする。 An object of the present invention is to solve the above-mentioned problems, that is, to provide a substrate storage container that can reduce the rotation of the substrate during transportation of the substrate and reduce the adhesion of rubbing traces of the material that holds the substrate.
上記目的を達成するための一実施の形態に係る基板収納容器は、互いに向かい合う内側壁に、基板を支持する支持部をそれぞれ備え、内側壁以外の方向に開口部を有する容器本体と、開口部を閉鎖可能な蓋体と、を備える基板収納容器であって、蓋体は、容器本体内に基板を収納して開口部を蓋体にて閉鎖した閉鎖状態において基板を挟持可能な前側溝部を備えたリテーナを有し、支持部は、開口部と反対側の後部方向に形成され、閉鎖状態において基板を挟持可能な傾斜溝を有し、傾斜溝は、その溝内にて上側に位置する上側傾斜面と、上側傾斜面と反対側から基板に接するもう一つの斜面であってその溝内にて下側に位置する下側傾斜面と、を有し、上側傾斜面の水平面となす角度θ1と下側傾斜面の水平面となす角度θ2が下記式1を満たすように形成されている基板収納容器である。 A substrate storage container according to an embodiment for achieving the above object includes a container main body having support portions for supporting a substrate on inner walls facing each other and having an opening in a direction other than the inner wall, and an opening. A lid that can close the substrate, wherein the lid is a front groove portion that can hold the substrate in a closed state in which the substrate is housed in the container body and the opening is closed by the lid. The support portion is formed in the rear portion direction opposite to the opening portion, and has an inclined groove that can sandwich the substrate in the closed state, and the inclined groove is positioned on the upper side in the groove. An upper inclined surface, and another inclined surface that is in contact with the substrate from the opposite side of the upper inclined surface and is located in the lower side of the groove, and is a horizontal surface of the upper inclined surface. The angle θ2 formed by the angle θ1 and the horizontal plane of the lower inclined surface satisfies the following formula 1. It is the substrate storage container formed so that it may be added.
式1: F1≧F2
(F1は、リテーナからの基板を保持する力Fが上側傾斜面および下側傾斜面に加わったときに上側傾斜面および下側傾斜面から基板に及ぼす垂直抗力rNの垂直方向成分であり、F2は、垂直抗力rNの水平方向成分である。)
Formula 1: F1 ≧ F2
(F1 is a vertical component of the vertical drag rN exerted on the substrate from the upper inclined surface and the lower inclined surface when a force F for holding the substrate from the retainer is applied to the upper inclined surface and the lower inclined surface, and F2 Is the horizontal component of the vertical drag rN.)
別の実施の形態に係る基板収納容器は、互いに向かい合う内側壁に、基板を支持する支持部をそれぞれ備え、内側壁以外の方向に開口部を有する容器本体と、開口部を閉鎖可能な蓋体と、を備える基板収納容器であって、蓋体は、容器本体内に基板を収納して開口部を蓋体にて閉鎖した閉鎖状態において基板を挟持可能な前側溝部を備えたリテーナを有し、支持部は、開口部と反対側の後部方向に形成され、閉鎖状態において基板を挟持可能な傾斜溝を有し、傾斜溝は、基板に接する斜面であってその溝内にて上側に位置する上側傾斜面と、上側傾斜面と反対側から基板に接するもう一つの斜面であってその溝内にて下側に位置する下側傾斜面とを有し、上側傾斜面の水平面となす角度θ1を45度以下とし、下側傾斜面の水平面となす角度θ2を45度以下とする。 A substrate storage container according to another embodiment includes a support body that supports a substrate on inner walls facing each other, a container body having an opening in a direction other than the inner wall, and a lid that can close the opening. The lid has a retainer having a front groove portion that can hold the substrate in a closed state in which the substrate is housed in the container body and the opening is closed by the lid. The support portion is formed in the rear direction opposite to the opening portion and has an inclined groove that can sandwich the substrate in the closed state, and the inclined groove is an inclined surface that contacts the substrate and is on the upper side in the groove. An upper inclined surface, and another lower inclined surface that is in contact with the substrate from the opposite side of the upper inclined surface and is located in the lower side of the groove, and serves as a horizontal surface of the upper inclined surface. Angle θ1 is 45 degrees or less, and the angle θ formed with the horizontal surface of the lower inclined surface 2 is 45 degrees or less.
別の実施の形態に係る基板収納容器では、さらに、角度θ2を角度θ1より大きくしても良い。 In the substrate storage container according to another embodiment, the angle θ2 may be larger than the angle θ1.
別の実施の形態に係る基板収納容器は、また、角度θ1および角度θ2の少なくともいずれか一方を、19.5度以上45度以下の範囲としても良い。 In the substrate storage container according to another embodiment, at least one of the angle θ1 and the angle θ2 may be in the range of 19.5 degrees to 45 degrees.
別の実施の形態に係る基板収納容器では、傾斜溝は、下側傾斜面より傾斜溝の開口側に近い位置に、角度θ2より大きな角度θ3で開口する第二下側傾斜面を、さらに備えても良い。 In the substrate storage container according to another embodiment, the inclined groove further includes a second lower inclined surface that opens at an angle θ3 larger than the angle θ2 at a position closer to the opening side of the inclined groove than the lower inclined surface. May be.
本発明によれば、基板の輸送時に基板の回転を低減し、基板を保持する材料の擦れ痕の付着を低減できる。 According to the present invention, it is possible to reduce the rotation of the substrate during transportation of the substrate, and to reduce the adhesion of rubbing marks on the material that holds the substrate.
次に、本発明の基板収納容器の実施の形態について、図面を参照しながら説明する。なお、以下に説明する実施の形態は本発明を限定するものではなく、また、実施の形態の中で説明されている諸要素およびその組み合わせの全てが本発明の解決手段に必須であるとは限らない。 Next, an embodiment of the substrate storage container of the present invention will be described with reference to the drawings. Note that the embodiments described below do not limit the present invention, and that all the elements and combinations thereof described in the embodiments are essential for the solution means of the present invention. Not exclusively.
図1は、本発明の実施の形態に係る基板収納容器の展開斜視図を示す。図2は、図1の基板収納容器を垂直方向にて切断した縦断面図を示す。図3は、図1の蓋体の内側の面を紙面表方向に向けた裏面図を示す。図4は、図1の基板収納容器を水平方向にて切断した横断面図を示す。なお、本願では、図2の「垂直方向にて切断」とは、容器本体の内側壁面に平行な方向にて上下に切断する意味である。 FIG. 1 shows an exploded perspective view of a substrate storage container according to an embodiment of the present invention. FIG. 2 is a longitudinal sectional view of the substrate storage container of FIG. 1 cut in the vertical direction. FIG. 3 is a back view in which the inner surface of the lid of FIG. FIG. 4 is a cross-sectional view of the substrate storage container of FIG. 1 cut in the horizontal direction. In the present application, “cutting in the vertical direction” in FIG. 2 means cutting up and down in a direction parallel to the inner wall surface of the container body.
本発明の実施の形態に係る基板収納容器1は、図1〜4に示すように、互いに向かい合う内側壁に、基板Wを支持する支持部6をそれぞれ備え、その内側壁以外の方向に開口部を有する容器本体2と、その開口部を閉鎖可能な蓋体3と、を備える。蓋体3は、容器本体2内に基板Wを収納して開口部を蓋体3にて閉鎖した閉鎖状態において基板Wを挟持可能な前側溝部5aを備えたリテーナ5を有する。蓋体3は、さらに、容器本体2の開口部をシール可能に閉鎖するガスケット4と、容器本体2に対して施錠と解錠とを可能とする施錠機構7と、を備える。施錠機構7は、外部から操作可能な回転体7aと、これに接続されるラッチバー7bと、容器本体2の開口部の係止凹部12に係合する係止部7cと、を有しており、蓋体3を容器本体2に固定したり、あるいは取り外したりするときに操作される。このように、蓋体3は、基板収納容器1において、容器本体2の開口部をシール可能に封鎖するドアとして機能する。 As shown in FIGS. 1 to 4, the substrate storage container 1 according to the embodiment of the present invention includes support portions 6 that support the substrates W on the inner walls facing each other, and an opening in a direction other than the inner walls. And a lid 3 that can close the opening. The lid 3 includes a retainer 5 having a front groove 5 a that can hold the substrate W in a closed state in which the substrate W is accommodated in the container body 2 and the opening is closed by the lid 3. The lid 3 further includes a gasket 4 that closes the opening of the container body 2 in a sealable manner, and a locking mechanism 7 that enables the container body 2 to be locked and unlocked. The locking mechanism 7 includes a rotating body 7a that can be operated from the outside, a latch bar 7b connected to the rotating body 7a, and a locking portion 7c that engages with a locking recess 12 in the opening of the container body 2. It is operated when the lid 3 is fixed to the container body 2 or removed. Thus, the lid 3 functions as a door for sealing the opening of the container main body 2 in the substrate storage container 1 so as to be sealed.
容器本体2の外側壁には、作業員等が把持するためのマニュアルハンドル10が取り付けられている。また、容器本体2は、その底面壁にコンベア搬送用のボトムプレート8を、天面壁には天井搬送用のロボティックフランジ9を、それぞれ備える。 A manual handle 10 is attached to the outer wall of the container body 2 for gripping by an operator or the like. Moreover, the container main body 2 is provided with the bottom plate 8 for conveyor conveyance in the bottom wall, and the robotic flange 9 for ceiling conveyance in the top wall, respectively.
支持部6は、容器本体2の左右の内側壁にそれぞれ複数段にて備えられていて、基板Wを略水平に支持する板状の支持片である。ここで、支持部6の奥側の壁面には、基板Wの奥側への移動を規制する傾斜溝6aを備えている。傾斜溝6aは、基板Wに接する斜面であって、傾斜溝6a内にて上側に位置する上側傾斜面17と、上側傾斜面17と反対側から基板Wに接するもう一つの斜面であって傾斜溝6a内にて下側に位置する下側傾斜面19とを有する。下側傾斜面19は、支持部6の板上面から上方に延びる。上側傾斜面17は、下側傾斜面19と逆方向に傾斜する。このように、傾斜溝6aは、上側傾斜面17と下側傾斜面19を有する略V字形状の溝である。これ以外の傾斜溝6aの詳細構造については、後述する。 The support portion 6 is a plate-like support piece that is provided in a plurality of stages on the left and right inner walls of the container body 2 and supports the substrate W substantially horizontally. Here, the wall surface on the back side of the support portion 6 is provided with an inclined groove 6 a that restricts the movement of the substrate W to the back side. The inclined groove 6 a is an inclined surface in contact with the substrate W, and is an upper inclined surface 17 positioned on the upper side in the inclined groove 6 a and another inclined surface in contact with the substrate W from the side opposite to the upper inclined surface 17. And a lower inclined surface 19 positioned on the lower side in the groove 6a. The lower inclined surface 19 extends upward from the upper surface of the support portion 6. The upper inclined surface 17 is inclined in the opposite direction to the lower inclined surface 19. Thus, the inclined groove 6 a is a substantially V-shaped groove having the upper inclined surface 17 and the lower inclined surface 19. The detailed structure of the other inclined grooves 6a will be described later.
容器本体2に蓋体3を取り付けた際には、傾斜溝6aは、リテーナ5の前側溝部5aとの間で、基板Wを支持部6の搭載部6bから下側傾斜面19に沿って持ち上げて下側傾斜面19の中心付近で支持する。搭載部6bは、傾斜溝6aよりも容器本体2の開口部側に位置する。基板収納容器1の輸送は、このように、基板Wが搭載部6bから浮いた状態で行われる。次に、蓋体3を容器本体2から取り外すときには、基板Wは、下側傾斜面19を滑り落ち、再び搭載部6b上に支持され、取り出しロボットにて取り出される。 When the lid 3 is attached to the container body 2, the inclined groove 6 a is located between the front groove portion 5 a of the retainer 5 and the substrate W from the mounting portion 6 b of the support portion 6 along the lower inclined surface 19. It is lifted and supported near the center of the lower inclined surface 19. The mounting portion 6b is located closer to the opening of the container body 2 than the inclined groove 6a. The transport of the substrate storage container 1 is thus performed in a state where the substrate W is lifted from the mounting portion 6b. Next, when removing the lid 3 from the container body 2, the substrate W slides down the lower inclined surface 19, is again supported on the mounting portion 6b, and is taken out by the take-out robot.
容器本体2は、その開口部から最も奥にある背面部に、後方支持部13を備える。後方支持部13は、上下に複数段の棚を有しているが、通常は基板Wとは非接触な状態となる。この場合、後方支持部13の各棚は、支持部6の搭載部6bの板面とは、異なる高さに形成されている。後方支持部13は、基板収納容器1の輸送中に大きな衝撃が加わったときなどに、基板Wの位置を規制する役割を有する。 The container main body 2 includes a rear support portion 13 on the back surface portion that is farthest from the opening. Although the rear support portion 13 has a plurality of upper and lower shelves, it is normally in a non-contact state with the substrate W. In this case, each shelf of the rear support portion 13 is formed at a different height from the plate surface of the mounting portion 6 b of the support portion 6. The rear support portion 13 has a role of regulating the position of the substrate W when a large impact is applied during transportation of the substrate storage container 1.
本実施の形態に係る基板収納容器1を構成する容器本体2および蓋体3は、好ましくは、熱可塑性樹脂の一例である透明なポリカーボネート樹脂から主として形成される。ここで、「主として」とは、熱可塑性樹脂とは異なる材料(例えば、セラミックス等のフィラー)を含むことを許容し、その場合であっても容器本体2および蓋体3の50体積%以上を熱可塑性樹脂から形成することを意味する。ただし、容器本体2および蓋体3をそれぞれ構成する材料は、上述の熱可塑性樹脂以外の材料でも良い。 The container body 2 and the lid 3 constituting the substrate storage container 1 according to the present embodiment are preferably formed mainly from a transparent polycarbonate resin which is an example of a thermoplastic resin. Here, “mainly” allows the inclusion of a material (for example, a filler such as ceramics) different from the thermoplastic resin, and even in such a case, 50 volume% or more of the container body 2 and the lid 3 are included. It means forming from a thermoplastic resin. However, the materials constituting the container body 2 and the lid body 3 may be materials other than the thermoplastic resin described above.
また、容器本体2の内空間における左右の内側壁に備えられる複数段の支持部6は、容器本体2と同一あるいは別の樹脂から構成されていても良い。支持部6(特に、傾斜溝6a)は、基板Wと接触する摺動性を要する部材である。支持部6の構成材料としては、例えば、ポリカーボネート樹脂、シクロオレフィン樹脂、ポリエーテルイミド樹脂、ポリブチレンテレフタレート樹脂、ポリエチレンテレフタレート樹脂、あるいはこれらを主成分とするアロイ樹脂も使用できる。また、支持部6に、摺動性付与剤として、ポリテトラフルオロエチレンに代表されるフッ素含有樹脂の粒子; ポリエチレン(PE)、シリコーンゴム、シリカ等の摺動性樹脂成分を別の樹脂成分でコーティングした粒子; を含有させても良い。 Further, the multi-stage support portions 6 provided on the left and right inner walls in the inner space of the container body 2 may be made of the same or different resin as the container body 2. The support portion 6 (particularly, the inclined groove 6 a) is a member that requires slidability to come into contact with the substrate W. As a constituent material of the support portion 6, for example, a polycarbonate resin, a cycloolefin resin, a polyetherimide resin, a polybutylene terephthalate resin, a polyethylene terephthalate resin, or an alloy resin containing these as a main component can be used. In addition, as a slidability imparting agent, fluorine-containing resin particles typified by polytetrafluoroethylene; a slidable resin component such as polyethylene (PE), silicone rubber, silica, etc. as another resin component. Coated particles; may be included.
図5は、図4における一方の支持部近傍のみを上方から見た一部平面図(5A)、当該一部平面図中のA−A線で切断した際の拡大断面図(5B)および当該拡大断面図中から基板を除外した傾斜溝の拡大断面図(5C)をそれぞれ示す。 5 is a partial plan view (5A) in which only one support portion in FIG. 4 is viewed from above, an enlarged cross-sectional view (5B) taken along line AA in the partial plan view, and An enlarged sectional view (5C) of the inclined groove excluding the substrate from the enlarged sectional view is shown.
図5(5B)および図5(5C)に示すように、傾斜溝6aは、その溝の最も奥に、溝部底面16を備え、溝部底面16から上方は上側傾斜面17とつながり、下方は下側傾斜面19とつながる。上側傾斜面17は、好ましくは、さらに、傾斜溝6aの開口側に位置する第二上側傾斜面18とつながる。また、下側傾斜面19は、好ましくは、さらに、傾斜溝6aの開口側に位置する第二下側傾斜面20とつながる。ただし、第二上側傾斜面18および第二下側傾斜面20の少なくともいずれか一方の面は、傾斜溝6aに備えていなくとも良い。その場合には、上側傾斜面17および下側傾斜面19のいずれか一方若しくは両方が傾斜溝6aの開口部の縁につながる。 As shown in FIG. 5 (5B) and FIG. 5 (5C), the inclined groove 6a is provided with a groove bottom surface 16 at the innermost part of the groove, and the upper portion from the groove bottom surface 16 is connected to the upper inclined surface 17, and the lower portion is lower. It connects with the side inclined surface 19. The upper inclined surface 17 is preferably further connected to a second upper inclined surface 18 located on the opening side of the inclined groove 6a. The lower inclined surface 19 is preferably further connected to the second lower inclined surface 20 located on the opening side of the inclined groove 6a. However, at least one of the second upper inclined surface 18 and the second lower inclined surface 20 may not be provided in the inclined groove 6a. In that case, one or both of the upper inclined surface 17 and the lower inclined surface 19 are connected to the edge of the opening of the inclined groove 6a.
図5(5B)に示すように、この実施の形態にて容器本体2内に収納される基板Wは、通常、その端面に「べベル部」と称するR面を形成して成る。傾斜溝6aは、上側傾斜面17および下側傾斜面19の両斜面にて、基板Wのべベル部と接触する。図5(5C)の断面図において、基板Wのべベル部と上側傾斜面17および下側傾斜面19との接触部位は点接触のように示されているが、立体空間上では、線接触である。なお、第二上側傾斜面18および第二下側傾斜面20は、基板Wの収納時において、基板Wのべベル部とは接触していない。 As shown in FIG. 5 (5B), the substrate W accommodated in the container body 2 in this embodiment is usually formed by forming an R surface called a “bevel portion” on the end surface. The inclined groove 6 a is in contact with the bevel portion of the substrate W on both the inclined surfaces of the upper inclined surface 17 and the lower inclined surface 19. In the cross-sectional view of FIG. 5 (5C), the contact portion between the bevel portion of the substrate W and the upper inclined surface 17 and the lower inclined surface 19 is shown as a point contact. It is. The second upper inclined surface 18 and the second lower inclined surface 20 are not in contact with the bevel portion of the substrate W when the substrate W is stored.
上側傾斜面17の水平面となす角度(図5(5C)では、「保持角上側」)θ1は、好ましくは45度以下であり、より好ましくは19.5度以上45度以下の範囲にある。また、下側傾斜面19の水平面となす角度(図5(5C)では、「保持角下側」)θ2は、好ましくは45度以下であり、より好ましくは19.5度以上45度以下の範囲にある。角度θ1および角度θ2をより好ましくは19.5度以上とするのは、基板Wの端面のベベル領域の傾斜角度以上とすることで、支持部6の奥側の傾斜溝6aと基板Wとの接触状態を線状にして基板Wを保持することで材料の擦れ痕がつきにくくするとともに、この傾斜溝6a内で基板Wが挟み込まれて抜けなくなってしまうことを防止するためである。また、角度θ1および角度θ2を好ましくは45度以下とするのは、基板収納容器1内に収納された状態の基板Wに対して、これを輸送するときに、あらゆる方向からの衝撃(加速度)や振動が生じても、基板Wが支持部6の奥側の傾斜溝6aから離れずに接触状態を維持させることで、基板Wの回転や移動を防止して基板Wを保持する材料の擦れ痕を低減させるためである。なお、角度θ1および角度θ2のいずれか一方のみを19.5度以上45度以下の範囲としても良い。 The angle (the “holding angle upper side” in FIG. 5 (5C)) θ1 formed with the horizontal plane of the upper inclined surface 17 is preferably 45 degrees or less, more preferably 19.5 degrees or more and 45 degrees or less. In addition, the angle (the “holding angle lower side” in FIG. 5 (5C)) θ2 formed with the horizontal surface of the lower inclined surface 19 is preferably 45 degrees or less, more preferably 19.5 degrees or more and 45 degrees or less. Is in range. The angle θ1 and the angle θ2 are more preferably set to 19.5 degrees or more by setting the angle θ1 or more to be equal to or greater than the inclination angle of the bevel region of the end surface of the substrate W. This is because the substrate W is held in a linear contact state to make it difficult for the material to be rubbed, and to prevent the substrate W from being sandwiched in the inclined groove 6a and not coming out. Further, the angle θ1 and the angle θ2 are preferably set to 45 degrees or less when the substrate W stored in the substrate storage container 1 is transported with respect to an impact (acceleration) from any direction. Even if vibration or vibration occurs, the substrate W is kept away from the inclined groove 6a on the back side of the support portion 6 to maintain the contact state, so that the rotation and movement of the substrate W are prevented and the material holding the substrate W is rubbed. This is to reduce the marks. Note that only one of the angle θ1 and the angle θ2 may be in the range of 19.5 degrees to 45 degrees.
角度θ2は、角度θ1より大きくする方が好ましい。また、角度θ1は、19.5度以上30度以下であるのがより好ましい。一方、角度θ2は、30度以上45度以下であるのがより好ましい。このような角度形成によって、蓋体3を容器本体2の開口部から取り外した際に、基板Wを所望の位置まで滑り下ろしやすくでき、もって基板Wをより取り出しやすくできるからである。図5は、角度θ1=22.5度および角度θ2=40度の好適な例を示すが、角度θ1および角度θ2は、かかる例に限定されるものでない。 The angle θ2 is preferably larger than the angle θ1. Further, the angle θ1 is more preferably 19.5 degrees or more and 30 degrees or less. On the other hand, the angle θ2 is more preferably not less than 30 degrees and not more than 45 degrees. This is because by forming such an angle, when the lid 3 is removed from the opening of the container body 2, the substrate W can be easily slid down to a desired position, and the substrate W can be more easily taken out. FIG. 5 shows a preferred example of the angle θ1 = 22.5 degrees and the angle θ2 = 40 degrees, but the angles θ1 and θ2 are not limited to such examples.
第二上側傾斜面18の水平面となす角度(図5(5C)では、「滑り角」)θ4は、角度θ1より大きな角度であって90度を超えない角度である。また、第二下側傾斜面20の水平面となす角度(図5(5C)では、「滑り角」)θ3は、角度θ2より大きな角度であって90度を超えない角度である。このように、傾斜溝6aの下側を、下側傾斜面19から続く第二下側傾斜面20を形成して二段傾斜とすることにより、容器本体2から蓋体3を取り外した際に、基板Wを下方に向かってより滑り下ろしやすくできる。なお、図5は、角度θ3=60度および角度θ4=60度の好適な例を示すが、角度θ3および角度θ4は、かかる例に限定されるものでない。なお、本願において、角度θ1、角度θ2、角度θ3および角度θ4は、特に言及しなくとも、全て、水平面となす角度を意味する。 The angle (the “slip angle” in FIG. 5 (5C)) θ4 formed with the horizontal plane of the second upper inclined surface 18 is an angle larger than the angle θ1 and does not exceed 90 degrees. Further, the angle θ3 (in FIG. 5C, “slip angle”) θ3 formed with the horizontal plane of the second lower inclined surface 20 is an angle larger than the angle θ2 and does not exceed 90 degrees. As described above, when the lid 3 is removed from the container body 2 by forming the second lower inclined surface 20 continuing from the lower inclined surface 19 and forming the second lower inclined surface 20 on the lower side of the inclined groove 6a. The substrate W can be more easily slid down. FIG. 5 shows a preferred example of the angle θ3 = 60 degrees and the angle θ4 = 60 degrees, but the angles θ3 and θ4 are not limited to such examples. In the present application, the angle θ1, the angle θ2, the angle θ3, and the angle θ4 all mean the angle formed with the horizontal plane even if not specifically mentioned.
以上のように、この実施の形態に係る基板収納容器1は、互いに向かい合う内側壁に、基板Wを支持する支持部6をそれぞれ備え、内側壁以外の方向に開口部を有する容器本体2と、開口部を閉鎖可能な蓋体3とを備え、蓋体3には、容器本体2内に基板Wを収納して開口部を蓋体3にて閉鎖した閉鎖状態において基板Wを挟持可能な前側溝部5aを備えたリテーナ5を有し、支持部6には、開口部と反対側の後部方向に形成され、閉鎖状態において基板Wを挟持可能な傾斜溝6aを有し、傾斜溝6aに、その溝内にて上側に位置する上側傾斜面17と、上側傾斜面17と反対側から基板Wに接するもう一つの斜面であってその溝内にて下側に位置する下側傾斜面19と、を備えている。上側傾斜面17の水平面となす角度θ1を45度以下とし、下側傾斜面19の水平面となす角度θ2を45度以下としているので、基板Wの回転を低減でき、かつ傾斜溝6aを構成する材料(例えば、樹脂)の擦れ痕の付着を低減できる。 As described above, the substrate storage container 1 according to this embodiment includes the support body 6 that supports the substrate W on the inner walls facing each other, and the container body 2 having an opening in a direction other than the inner wall; And a lid 3 that can close the opening. The lid 3 is a state in which the substrate W is housed in the container body 2 and the opening is closed by the lid 3 before the substrate W can be sandwiched. The retainer 5 is provided with a side groove 5a. The support 6 has an inclined groove 6a that is formed in the rear direction opposite to the opening and can hold the substrate W in the closed state. The upper inclined surface 17 located on the upper side in the groove, and another inclined surface 19 which is in contact with the substrate W from the opposite side of the upper inclined surface 17 and located on the lower side in the groove. And. Since the angle θ1 formed with the horizontal plane of the upper inclined surface 17 is 45 degrees or less and the angle θ2 formed with the horizontal plane of the lower inclined plane 19 is 45 degrees or less, the rotation of the substrate W can be reduced and the inclined groove 6a is configured. It is possible to reduce adhesion of a rubbing mark of a material (for example, resin).
図6は、図5の傾斜溝の形成に関する基本コンセプトを説明するための図を示す。 FIG. 6 is a diagram for explaining the basic concept regarding the formation of the inclined grooves in FIG.
図6中、左側の図は良好な傾斜溝6aの例を、右側の図は好ましくない傾斜溝6aの例を、それぞれ示す。なお、図6では、基板Wの上側の端部が上側傾斜面17に接している状態のみを示しているが、基板Wの下側の端部が下側傾斜面19に接する状態も、以下に説明する状況と同様である。 In FIG. 6, the left figure shows an example of a good inclined groove 6a, and the right figure shows an example of an undesirable inclined groove 6a. 6 shows only the state in which the upper end portion of the substrate W is in contact with the upper inclined surface 17, the state in which the lower end portion of the substrate W is in contact with the lower inclined surface 19 is also described below. This is the same as the situation described in the section.
基板Wを傾斜溝6a内に保持すると、基板Wと上側傾斜面17との接触部位に、リテーナ5からの基板Wの保持力Fが与えられる。この結果、上側傾斜面17は、上側傾斜面17の接触部位に接する面に垂直な方向に、垂直抗力Nを受ける。なお、垂直抗力Nのベクトルと保持力Fのベクトルのなす角度は、図6においてθで示されている。一方、基板Wは、当該垂直抗力Nの方向と逆方向の反力(垂直抗力反力という)rNを受ける(ここで、rは、Reactive Forceを意味する。)。垂直抗力反力rNは、垂直成分(Z方向成分ともいう)F1と、水平成分(Y方向成分ともいう)F2と、に分け、下記式1の条件を満たすように上側傾斜面17を形成すると、効果的に、基板Wの輸送時に基板Wの回転を低減し、基板Wを保持する材料(樹脂)の擦れ痕の付着を低減できる。 When the substrate W is held in the inclined groove 6a, the holding force F of the substrate W from the retainer 5 is applied to the contact portion between the substrate W and the upper inclined surface 17. As a result, the upper inclined surface 17 receives a vertical drag N in a direction perpendicular to the surface in contact with the contact portion of the upper inclined surface 17. The angle formed by the vector of the normal force N and the vector of the holding force F is indicated by θ in FIG. On the other hand, the substrate W receives a reaction force rN in the direction opposite to the direction of the vertical reaction force N (referred to as a vertical reaction force), where r means a reactive force. The vertical reaction force rN is divided into a vertical component (also referred to as a Z direction component) F1 and a horizontal component (also referred to as a Y direction component) F2, and the upper inclined surface 17 is formed so as to satisfy the condition of the following formula 1. Effectively, the rotation of the substrate W can be reduced during the transportation of the substrate W, and the adhesion of the rubbing traces of the material (resin) holding the substrate W can be reduced.
F1≧F2・・・式1
(F1は、リテーナ5からの基板Wを保持する力Fが上側傾斜面17および下側傾斜面19に加わったときに上側傾斜面17および下側傾斜面19から基板Wに及ぼす垂直抗力rNの垂直方向成分であり、F2は、垂直抗力rNの水平方向成分である。)
F1 ≧ F2 Formula 1
(F1 is the vertical drag rN exerted on the substrate W from the upper inclined surface 17 and the lower inclined surface 19 when the force F for holding the substrate W from the retainer 5 is applied to the upper inclined surface 17 and the lower inclined surface 19. (It is a vertical component, and F2 is a horizontal component of the vertical drag rN.)
図6中の左側の例に示すように、角度θ1=22.5度の上側傾斜面17と基板Wの上側端面とが接する場合、F1>F2となり、基板Wの回転抑止および擦れ痕の付着低減の効果が得られる。一方、図6中の右側の例に示すように、角度θ1=55度の上側傾斜面17と基板Wの上側端面とが接する場合、F1<F2となり、上記効果と同等の効果は得られない。 As shown in the example on the left side in FIG. 6, when the upper inclined surface 17 having an angle θ1 = 22.5 degrees and the upper end surface of the substrate W are in contact with each other, F1> F2, and the rotation of the substrate W is suppressed and the rubbing marks are attached. Reduction effect is obtained. On the other hand, as shown in the example on the right side in FIG. 6, when the upper inclined surface 17 having the angle θ1 = 55 degrees and the upper end surface of the substrate W are in contact with each other, F1 <F2, and the same effect as the above cannot be obtained. .
以上のように、この実施の形態に係る基板収納容器1は、互いに向かい合う内側壁に、基板Wを支持する支持部6をそれぞれ備え、内側壁以外の方向に開口部を有する容器本体2と、開口部を閉鎖可能な蓋体3とを備え、蓋体3には、容器本体2内に基板Wを収納して開口部を蓋体3にて閉鎖した閉鎖状態において基板Wを挟持可能な前側溝部5aを備えたリテーナ5を有し、支持部6には、開口部と反対側の後部方向に形成され、閉鎖状態において基板Wを挟持可能な傾斜溝6aを有し、傾斜溝6aに、その溝内にて上側に位置する上側傾斜面17と、上側傾斜面17と反対側から基板Wに接するもう一つの斜面であってその溝内にて下側に位置する下側傾斜面19と、を備えている。上側傾斜面17の水平面となす角度θ1と下側傾斜面19の水平面となす角度θ2は、式1(F1≧F2)を満たすように形成されているので、基板Wの回転を低減でき、かつ傾斜溝6aを構成する材料(例えば、樹脂)の擦れ痕の付着を低減できる。 As described above, the substrate storage container 1 according to this embodiment includes the support body 6 that supports the substrate W on the inner walls facing each other, and the container body 2 having an opening in a direction other than the inner wall; And a lid 3 that can close the opening. The lid 3 is a state in which the substrate W is housed in the container body 2 and the opening is closed by the lid 3 before the substrate W can be sandwiched. The retainer 5 is provided with a side groove 5a. The support 6 has an inclined groove 6a that is formed in the rear direction opposite to the opening and can hold the substrate W in the closed state. The upper inclined surface 17 located on the upper side in the groove, and another inclined surface 19 which is in contact with the substrate W from the opposite side of the upper inclined surface 17 and located on the lower side in the groove. And. Since the angle θ1 formed with the horizontal plane of the upper inclined surface 17 and the angle θ2 formed with the horizontal plane of the lower inclined surface 19 are formed so as to satisfy Formula 1 (F1 ≧ F2), the rotation of the substrate W can be reduced, and Adhesion of rubbing traces of the material (for example, resin) constituting the inclined groove 6a can be reduced.
以上、本発明に係る基板収納容器の好適な実施の形態について説明してきたが、本発明は、上記形態に限定されることなく、種々の変形を施して実施可能である。 The preferred embodiments of the substrate storage container according to the present invention have been described above, but the present invention is not limited to the above-described embodiments and can be implemented with various modifications.
例えば、角度θ2は、角度θ1と同一若しくは角度θ1より小さくても良い。かかる角度の関係でも、基板Wの回転を低減でき、かつ傾斜溝6aを構成する材料(例えば、樹脂)の擦れ痕の付着を低減できるからである。また、角度θ1および角度θ2の少なくともいずれか一方を、1度以上19.5度未満の範囲としても良い。 For example, the angle θ2 may be the same as or smaller than the angle θ1. This is also because the rotation of the substrate W can be reduced and the adhesion of the rubbing trace of the material (for example, resin) constituting the inclined groove 6a can be reduced even with such an angle relationship. Further, at least one of the angle θ1 and the angle θ2 may be in the range of 1 degree or more and less than 19.5 degrees.
傾斜溝6aは、上側傾斜面17より傾斜溝6aの開口側に近い位置に、角度θ1より大きな角度θ4で開口する第二上側傾斜面18を備える一方、下側傾斜面19より傾斜溝6aの開口側に近い位置に、角度θ2より大きな角度θ3で開口する第二下側傾斜面20を備えていなくとも良い。また、傾斜溝6aは、第二上側傾斜面18を備えずに、第二下側傾斜面20のみを備えても良い。 The inclined groove 6 a includes a second upper inclined surface 18 that opens at an angle θ 4 larger than the angle θ 1 at a position closer to the opening side of the inclined groove 6 a than the upper inclined surface 17, while The second lower inclined surface 20 that opens at an angle θ3 larger than the angle θ2 may not be provided at a position close to the opening side. In addition, the inclined groove 6 a may include only the second lower inclined surface 20 without including the second upper inclined surface 18.
次に、本発明の実施例を比較例と比較して説明する。ただし、本発明は、以下に説明する実施例に限定して解釈されるものではない。 Next, examples of the present invention will be described in comparison with comparative examples. However, the present invention is not construed as being limited to the examples described below.
1.実施例
(実施例1)
容器本体と蓋体とを透明なポリカーボネート樹脂から製造した。傾斜溝を含む支持部は、ポリブチレンテレフタレート樹脂から製造し、これを容器本体に取り付け又は容器本体と一体成形して、基板収納容器を製造した。傾斜溝は、水平に対する保持角(上側)θ1(角度θ1という)を19.5度、保持角(下側)θ2(角度θ2という)を30度、滑り角θ3(角度θ3という)および滑り角θ4(角度θ4という)を共に65度とするように形成した。
(実施例2)
傾斜溝を、角度θ1=22.5度、角度θ2=40度とするように形成した以外、実施例1と同一条件で基板収納容器を製造した。
(実施例3)
傾斜溝を、角度θ1=30度、角度θ2=40度とするように形成した以外、実施例1と同一条件で基板収納容器を製造した。
(実施例4)
傾斜溝を、角度θ1=45度、角度θ2=45度とするように形成した以外、実施例1と同一条件で基板収納容器を製造した。
1. Example (Example 1)
The container body and the lid were manufactured from a transparent polycarbonate resin. The support part including the inclined groove was manufactured from polybutylene terephthalate resin, and this was attached to the container body or integrally formed with the container body to manufacture the substrate storage container. The inclined groove has a horizontal holding angle (upper side) θ1 (referred to as angle θ1) of 19.5 degrees, a holding angle (lower side) θ2 (referred to as angle θ2) of 30 degrees, a sliding angle θ3 (referred to as angle θ3), and a sliding angle. Both θ4 (referred to as angle θ4) were formed to be 65 degrees.
(Example 2)
A substrate storage container was manufactured under the same conditions as in Example 1 except that the inclined grooves were formed to have an angle θ1 = 22.5 degrees and an angle θ2 = 40 degrees.
(Example 3)
A substrate storage container was manufactured under the same conditions as in Example 1 except that the inclined grooves were formed to have an angle θ1 = 30 degrees and an angle θ2 = 40 degrees.
Example 4
A substrate storage container was manufactured under the same conditions as in Example 1 except that the inclined grooves were formed to have an angle θ1 = 45 degrees and an angle θ2 = 45 degrees.
2.比較例
(比較例1)
傾斜溝を、角度θ1=65度、角度θ2=65度とするように形成した以外、実施例1と同一条件で基板収納容器を製造した。
(比較例2)
傾斜溝を、角度θ1=22.5度、角度θ2=65度とするように形成した以外、実施例1と同一条件で基板収納容器を製造した。
(比較例3)
傾斜溝を、角度θ1=60度、角度θ2=60度、角度θ3=60度、角度θ4=60度とするように形成した以外、実施例1と同一条件で基板収納容器を製造した。
2. Comparative Example (Comparative Example 1)
A substrate storage container was manufactured under the same conditions as in Example 1 except that the inclined grooves were formed to have an angle θ1 = 65 degrees and an angle θ2 = 65 degrees.
(Comparative Example 2)
A substrate storage container was manufactured under the same conditions as in Example 1 except that the inclined grooves were formed to have an angle θ1 = 22.5 degrees and an angle θ2 = 65 degrees.
(Comparative Example 3)
A substrate storage container was manufactured under the same conditions as in Example 1 except that the inclined grooves were formed to have an angle θ1 = 60 degrees, an angle θ2 = 60 degrees, an angle θ3 = 60 degrees, and an angle θ4 = 60 degrees.
3.評価方法
(1)接触痕の付着評価
振動機(EMIC製、936−AW/LAH)を用いて、JIS Z0200:1999に準拠する方法にて、基板Wを収納した基板収納容器を振動させた後、基板に傾斜溝の樹脂擦れ痕が確認できたか否かを調べた。振動条件は、陸走1000km未満相当とした。正弦波振動は、周波数5〜50Hzにて一往復半(5Hz→50Hz→5Hz→50Hz)変化させて行った。加速度は、±0.75G、掃引時間は片道7分間で合計21分間とした。擦れ痕の評価は、集光灯反射光量の簡易目視観察と、デジタルマイクロスコープによる観察とから行った。いずれの観察でも擦れ痕が認められない場合には、「○」(良好の意味)と評価し、いずれかの方法で擦れ痕が認められた場合には、「×」(不良の意味)と評価した。
3. Evaluation Method (1) Contact Mark Adhesion Evaluation After Vibrating a Substrate Storage Container Containing a Substrate W Using a Vibrator (EMIC, 936-AW / LAH) by a Method Conforming to JIS Z0200: 1999 Then, it was examined whether or not the resin rubbing trace of the inclined groove could be confirmed on the substrate. The vibration condition was equivalent to less than 1000 km on land. The sine wave vibration was performed by changing one and a half times (5 Hz → 50 Hz → 5 Hz → 50 Hz) at a frequency of 5 to 50 Hz. The acceleration was ± 0.75 G, and the sweep time was 7 minutes one way for a total of 21 minutes. The rubbing marks were evaluated from simple visual observation of the amount of light reflected from the condenser lamp and observation using a digital microscope. If no scratch marks are observed in any of the observations, it is evaluated as “◯” (good meaning), and if any scratch marks are recognized by any method, “×” (defective meaning). evaluated.
(2)基板の回転
上記(1)の振動の前後で基板の回転が全く認められない場合には、「○」(良好の意味)と評価し、少しでも回転が認められた場合には、「×」(不良の意味)と評価した。
(2) Substrate rotation If no substrate rotation is observed before and after the vibration of (1) above, it is evaluated as “◯” (good meaning). It evaluated as "x" (meaning defect).
(3)基板の滑り上がり性および滑り下がり性
容器本体に蓋体を取り付けた際に、基板が傾斜溝の下側傾斜面をスムーズに上がった場合には、「○」(良好の意味)と評価し、少しでも引っかかりが認められた場合には、「×」(不良の意味)と評価した。また、容器本体から蓋体を取り外した際に、基板が傾斜溝の下側傾斜面をスムーズに滑り下がった場合には、「○」(良好の意味)と評価し、少しでも引っかかりが認められた場合には、「×」(不良の意味)と評価した。
(3) Slip-up and slide-down of the board When the cover is attached to the container body, if the board rises smoothly on the lower inclined surface of the inclined groove, “○” (good meaning) When it was evaluated and even a slight catch was found, it was evaluated as “×” (defective meaning). If the substrate slides smoothly down the lower inclined surface of the inclined groove when the lid is removed from the container body, it is evaluated as “◯” (good meaning), and even a slight catch is recognized. In such a case, it was evaluated as “×” (defective meaning).
4.評価結果
表1は、各実施例および各比較例の製造条件および各種評価結果を示す。
4). Evaluation Results Table 1 shows the manufacturing conditions and various evaluation results of each Example and each Comparative Example.
表1から明らかなように、各実施例と各比較例とを比較すると、振動試験後の擦れ痕の評価にて大きな差が認められ、各実施例では基板に擦れ痕が認められなかったのに対して、各比較例では基板に擦れ痕が認められた。擦れ痕以外の評価については、各実施例および各比較例ともに差異は無く、良好な評価が得られた。総合判定では、全ての評価項目にて良好な実施例1〜4は合格、接触痕の付着が認められた比較例1〜3は不合格となった。この結果から、角度θ1および角度θ2の両角度を水平に対して45度以下とすると、基板に擦れ痕を付着させないようにできると考えられる。 As is apparent from Table 1, when each example and each comparative example were compared, a large difference was observed in the evaluation of the scratch marks after the vibration test, and no scratch marks were observed on the substrate in each example. On the other hand, in each comparative example, scratch marks were observed on the substrate. Regarding the evaluations other than the scratch marks, there was no difference in each Example and each Comparative Example, and a good evaluation was obtained. In comprehensive judgment, Examples 1-4 excellent in all the evaluation items passed, and Comparative Examples 1-3 in which adhesion of contact marks was recognized failed. From this result, it is considered that when both the angle θ1 and the angle θ2 are 45 degrees or less with respect to the horizontal, the rubbing traces can be prevented from adhering to the substrate.
本発明は、半導体ウェーハやフォトマスクガラス、アルミニウムディスク等の基板を収納する基板収納容器に用いることができる。 The present invention can be used for a substrate storage container for storing a substrate such as a semiconductor wafer, a photomask glass, or an aluminum disk.
1 基板収納容器
2 容器本体
3 蓋体
5 リテーナ
5a 前側溝部
6 支持部
6a 傾斜溝
17 上側傾斜面
19 下側傾斜面
20 第二下側傾斜面
W 基板
DESCRIPTION OF SYMBOLS 1 Substrate storage container 2 Container main body 3 Cover body 5 Retainer 5a Front side groove part 6 Support part 6a Inclination groove 17 Upper inclined surface 19 Lower inclined surface 20 Second lower inclined surface W Substrate
Claims (4)
前記開口部を閉鎖可能な蓋体と、
を備える基板収納容器であって、
前記蓋体は、前記容器本体内に前記基板を収納して前記開口部を前記蓋体にて閉鎖した閉鎖状態において前記基板を挟持可能な前側溝部を備えたリテーナを有し、
前記支持部は、前記開口部と反対側の後部方向に形成され、前記閉鎖状態において前記前側溝部との間で前記基板を挟持して前記支持部の搭載部から持ち上げて支持可能な傾斜溝を有し、
前記傾斜溝は、その溝内にて上側に位置する上側傾斜面と、前記上側傾斜面と反対側から前記基板に接するもう一つの斜面であってその溝内にて下側に位置する下側傾斜面とを有し、
前記上側傾斜面の水平面となす角度をθ1とし、前記下側傾斜面の水平面となす角度をθ2としたとき、θ2がθ1より大きく、θ1およびθ2が共に45度以下であり、かつ下記式1を満たすように形成されている基板収納容器。
式1: F1≧F2
(F1は、前記リテーナからの前記基板を保持する力Fが前記上側傾斜面および前記下側傾斜面に加わったときに前記上側傾斜面および前記下側傾斜面から前記基板に及ぼす垂直抗力rNの垂直方向成分であり、F2は、前記垂直抗力rNの水平方向成分である。) A container main body provided with support portions for supporting a substrate on inner walls facing each other, and having an opening in a direction other than the inner wall;
A lid capable of closing the opening;
A substrate storage container comprising:
The lid body includes a retainer including a front groove portion that can hold the substrate in the closed state in which the substrate is housed in the container body and the opening is closed by the lid body,
The support portion is formed in a rear direction opposite to the opening, and in the closed state, the support portion is sandwiched between the front groove portion and lifted from the mounting portion of the support portion to support the inclined groove. Have
The inclined groove is an upper inclined surface located on the upper side in the groove, and another inclined surface that is in contact with the substrate from the opposite side of the upper inclined surface and is located on the lower side in the groove. An inclined surface,
When the angle formed with the horizontal plane of the upper inclined surface is θ1, and the angle formed with the horizontal plane of the lower inclined surface is θ2, θ2 is larger than θ1, both θ1 and θ2 are 45 degrees or less, and the following formula 1 A substrate storage container formed so as to satisfy the above.
Formula 1: F1 ≧ F2
(F1 is a normal force rN exerted on the substrate from the upper inclined surface and the lower inclined surface when a force F for holding the substrate from the retainer is applied to the upper inclined surface and the lower inclined surface. (It is a vertical component, and F2 is a horizontal component of the vertical drag rN.)
前記支持部を、シクロオレフィン樹脂、ポリエーテルイミド樹脂、ポリブチレンテレフタレート樹脂、ポリエチレンテレフタレート樹脂、若しくはこれらを主成分とするアロイ樹脂製の部材、または摺動性付与剤を含有させた部材とする請求項1から請求項3のいずれか1項に記載の基板収納容器。 The support part is a member made of a cycloolefin resin, a polyetherimide resin, a polybutylene terephthalate resin, a polyethylene terephthalate resin, or an alloy resin containing these as a main component, or a member containing a slidability imparting agent. The substrate storage container according to any one of claims 1 to 3.
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