JP6563144B2 - モノクロメータの製造方法 - Google Patents
モノクロメータの製造方法 Download PDFInfo
- Publication number
- JP6563144B2 JP6563144B2 JP2018552749A JP2018552749A JP6563144B2 JP 6563144 B2 JP6563144 B2 JP 6563144B2 JP 2018552749 A JP2018552749 A JP 2018552749A JP 2018552749 A JP2018552749 A JP 2018552749A JP 6563144 B2 JP6563144 B2 JP 6563144B2
- Authority
- JP
- Japan
- Prior art keywords
- slit
- monochromator
- electron beam
- thin film
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B7/00—Control of exposure by setting shutters, diaphragms or filters, separately or conjointly
- G03B7/08—Control effected solely on the basis of the response, to the intensity of the light received by the camera, of a built-in light-sensitive device
- G03B7/081—Analogue circuits
- G03B7/085—Analogue circuits for control of aperture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1204—Grating and filter
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/053—Arrangements for energy or mass analysis electrostatic
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/019—Manufacture or treatment of bond pads
- H10W72/01951—Changing the shapes of bond pads
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2016-0064041 | 2016-05-25 | ||
| KR1020160064041A KR101787379B1 (ko) | 2016-05-25 | 2016-05-25 | 모노크로미터의 제조방법 |
| PCT/KR2016/005545 WO2017204380A1 (ko) | 2016-05-25 | 2016-05-26 | 모노크로미터의 제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019519063A JP2019519063A (ja) | 2019-07-04 |
| JP6563144B2 true JP6563144B2 (ja) | 2019-08-21 |
Family
ID=60296239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018552749A Active JP6563144B2 (ja) | 2016-05-25 | 2016-05-26 | モノクロメータの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6563144B2 (ko) |
| KR (1) | KR101787379B1 (ko) |
| WO (1) | WO2017204380A1 (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113109949B (zh) * | 2021-04-09 | 2022-09-02 | 长春长光格瑞光电技术有限公司 | 宽谱段高分辨中阶梯光栅单色器的针孔装调方法 |
| US20230245933A1 (en) * | 2022-02-02 | 2023-08-03 | Kla Corporation | Combining focused ion beam milling and scanning electron microscope imaging |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06101318B2 (ja) * | 1985-10-16 | 1994-12-12 | 株式会社日立製作所 | イオンマイクロビ−ム装置 |
| US5097126A (en) * | 1990-09-25 | 1992-03-17 | Gatan, Inc. | High resolution electron energy loss spectrometer |
| NL1009959C2 (nl) * | 1998-08-28 | 2000-02-29 | Univ Delft Tech | Elektronenmicroscoop. |
| JP2001084900A (ja) * | 1999-09-13 | 2001-03-30 | Hitachi Ltd | 集束イオンビーム加工観察装置の固定絞りの加工方法 |
| JP2003031171A (ja) * | 2001-07-18 | 2003-01-31 | Nikon Corp | 電子線装置及び該電子線装置を用いたデバイス製造方法 |
| JP2003331764A (ja) * | 2002-05-17 | 2003-11-21 | Jeol Ltd | エネルギーフィルタ |
| JP2004327377A (ja) * | 2003-04-28 | 2004-11-18 | Jeol Ltd | モノクロメータ |
| GB0320187D0 (en) * | 2003-08-28 | 2003-10-01 | Shimadzu Res Lab Europe Ltd | Particle optical apparatus |
| EP2287883B1 (en) * | 2004-04-15 | 2017-08-16 | Carl Zeiss SMT GmbH | Apparatus and method for investigating or modifying a surface with a beam of charged particles |
| DE102004037781A1 (de) | 2004-08-03 | 2006-02-23 | Carl Zeiss Nts Gmbh | Elektronenstrahlgerät |
| DE102007024353B4 (de) * | 2007-05-24 | 2009-04-16 | Ceos Corrected Electron Optical Systems Gmbh | Monochromator und Strahlquelle mit Monochromator |
| JP5247761B2 (ja) * | 2010-05-21 | 2013-07-24 | 株式会社日立ハイテクサイエンス | Fib−sem複合装置 |
| US8592761B2 (en) * | 2011-05-19 | 2013-11-26 | Hermes Microvision Inc. | Monochromator for charged particle beam apparatus |
| EP2811506B1 (en) * | 2013-06-05 | 2016-04-06 | Fei Company | Method for imaging a sample in a dual-beam charged particle apparatus |
| KR101633978B1 (ko) * | 2014-06-20 | 2016-06-28 | 한국표준과학연구원 | 모노크로메이터 및 이를 구비한 하전입자빔 장치 |
| JP6266467B2 (ja) * | 2014-08-11 | 2018-01-24 | 日本電子株式会社 | 電子顕微鏡、およびモノクロメーターの調整方法 |
| EP3010031B1 (en) * | 2014-10-16 | 2017-03-22 | Fei Company | Charged Particle Microscope with special aperture plate |
-
2016
- 2016-05-25 KR KR1020160064041A patent/KR101787379B1/ko active Active
- 2016-05-26 JP JP2018552749A patent/JP6563144B2/ja active Active
- 2016-05-26 WO PCT/KR2016/005545 patent/WO2017204380A1/ko not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| KR101787379B1 (ko) | 2017-10-18 |
| JP2019519063A (ja) | 2019-07-04 |
| WO2017204380A1 (ko) | 2017-11-30 |
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