JP6551833B2 - Method of manufacturing functional precision parts and functional precision parts - Google Patents

Description

  The present invention relates to a method for manufacturing a functional precision component and a functional precision component, and more particularly, to a method for manufacturing a functional precision component having a sub-μm order microstructure formed on the surface and a functional precision component. .

  Conventionally, various methods have been provided for planarizing or polishing the surface of a workpiece. Typically, there is CMP (Chemical Mechanical Polishing), and recently, the present inventor has proposed CARE (CAtalyst-Referred Etching).

CMP increases the mechanical polishing (surface removal) effect by the relative movement of the polishing agent and the polishing object by the surface chemical action of the polishing agent (abrasive grain) itself or the action of the chemical component contained in the polishing liquid, and high speed And it is a technique to obtain a smooth polished surface. Generally, an object to be polished is held by a member called a carrier, and a polishing pad or polishing pad is pressed against a flat plate (lap) to flow a slurry containing various chemical components and hard fine abrasive grains together. Perform polishing by moving relative to By changing the surface of the object to be polished by the chemical component, the processing speed can be improved as compared with the case where the polishing agent alone is used for polishing. In addition, when the polishing agent alone is used for polishing, fine scratches on the surface left after the polishing or the processing-deteriorated layer remaining in the vicinity of the surface is extremely small, and an ideal smooth surface can be obtained. Here, fine particles of cerium oxide mainly containing cerium oxide (CeO ₂ ) or lanthanum are used as the polishing slurry for CMP.

In contrast, as described in Patent Document 1, CARE is a solid oxide in which one or more elements are bound via oxygen, or a solid oxidation of a multicomponent system consisting of a plurality of oxides. A processing method in which an object is a workpiece and the surface of the workpiece is flattened or processed into an arbitrary curved surface, in which water molecules are dissociated to form a solid oxide and back bonds of oxygen elements and other elements A catalytic substance that assists in the production of decomposition products by hydrolysis as a processing reference surface, and in the presence of water, the workpiece and the processing reference surface are placed in close contact or in close proximity, The potential of the machining reference surface is set to a range that includes a natural potential and H ₂ and O ₂ are not generated, and the workpiece and the machining reference surface are moved relative to each other to remove the decomposition products from the workpiece surface. , Processing that does not use abrasives or abrasives at all It is the law. This processing method is called Water-CARE because basically only water is used.

  In the field of regenerative medicine typified by IPS cells and in the field of microchemical engineering, it is expected that the demand for products such as cell templates for partially culturing cells on glass slides and microreactors serving as chemical reaction sites is expanding. Many researches and developments are currently being conducted on manufacturing technology. As an absolute condition for the spread of these products, firstly, production at a low cost is mentioned, and in addition, since the liquid phase reaction is an important function, it is required to control wettability. This is because there are cases in which a plurality of types of cells are cultured in one cell template, and in the case of a microreactor, it is necessary to transport the liquid only in the flow path. In the world of μm order, the influence of the surface tension of the liquid becomes relatively large, so it is difficult to control the liquid only by physical unevenness, and control of wettability, specifically water repellence of convex part, hydrophilicity of concave part It is necessary to make sex.

Revised 2013/084934 gazette

  What about cell templates and microreactors? It is necessary to form a microstructure on the surface and to partially form a functional surface such as hydrophilicity and water repellency. In order to develop products that meet these objectives, microfabrication technologies such as machining, laser processing, and etching, and methods combining functional thin films have been studied, but mass production technology such as manufacturing at low cost is the biggest bottleneck. Development is urgently desired. In particular, since the surface microstructure is on the order of sub-μm and the thickness of the functional layer formed on the surface is on the order of nm, it is difficult to precisely control the processing speed with conventional machining and polishing techniques. Not applicable. Furthermore, when using abrasive grains or the like, if particles such as abrasive grains or polishing scraps adhere to the recesses, it is difficult to remove and clean them. Residues can also be a problem when using chemicals in processing and cleaning processes.

  Therefore, in view of the above-described situation, the present invention intends to solve the problem by providing a chemical processing process that uses only water and does not use any abrasive or abrasive grains, and is provided on the surface of the substrate. Another object of the present invention is to provide a manufacturing method capable of efficiently manufacturing a functional precision component in which a functional material is formed only in a recess having an uneven microstructure having a range of 10 nm to 1 mm, and a functional precision component manufactured thereby. .

The present invention is a method for producing a functional precision component in which a functional material is formed only in the concave portion of the concave-convex microstructure in the range of 10 nm to 1 mm provided on the surface of the resin base for solving the above-described problem, In the presence of water, a catalyst substance is used which dissociates water molecules to cut back and absorb back bonds of oxygen element and other elements constituting the work, and helps to form a decomposition product by hydrolysis, in the presence of water. The workpiece and the catalyst material are arranged in contact with or in close proximity to each other, the potential of the catalyst material is within a range that includes a natural potential and H ₂ and O ₂ are not generated, and the workpiece and the catalyst material are moved relative to each other. In addition, a processing process for removing the decomposition products from the surface of the workpiece is used, and a stopper layer having a predetermined thickness that can not be processed by hydrolysis is not formed on the entire surface of the substrate. Do Wrapper layer forming step, on the stopper layer, wherein the functional material lamination step of the processable functional materials degradation products due to hydrolysis by the processing process occurs laminated form, functionality outside the recess by the machining process The manufacturing method of the functional precision part which consists of the processing process which removes material, and was comprised.

Here, the functional material laminating step is performed by laminating a functional material that can be decomposed by hydrolysis on the stopper layer to a thickness that does not block the concave structure. In the step of forming a layer, it is preferable to have a functional layer of a predetermined thickness only on the inner surface of the concave portion of the substrate.

The functional material is preferably SiO ₂ , and the material of the stopper layer is preferably carbon. More preferably, the substrate is a cycloolefin polymer (COP) resin.

Further, the present invention is a functional precision component in which a functional material is formed only in the concave portion of the concavo-convex microstructure provided on the surface of the resin base , and the resin substrate in which the concavo-convex microstructure of 10 nm to 1 mm is formed on the surface And a stopper layer covering the entire surface of the substrate, and a functional material formed on the stopper layer only in the concave portion of the concavo-convex microstructure, and water molecules dissociate to form a workpiece. Using the catalytic substance which cuts back and adsorbs the back bond of the constituent oxygen element and other elements and assists in the formation of decomposition products by hydrolysis, the above-mentioned workpiece and catalytic substance are contacted or poled in the presence of water. The decomposition product is placed in a close proximity, the potential of the catalyst material is within a range that includes a natural potential and H ₂ and O ₂ are not generated, and the workpiece and the catalyst material are moved relative to each other, so that the decomposition product is treated. Processing to remove from the surface Relative process, the stopper layer is unworkable material that degradation products does not occur due to hydrolysis, the functional material that features the decomposition products due to hydrolysis is processable material produced Made of precision precision parts.

In the functional precision component of the present invention, it is preferable that the functional material is formed to a thickness that does not block the concave portion of the concave-convex microstructure, and has a functional layer having a predetermined thickness only on the inner surface of the concave portion.

The method for producing a functional precision component according to the present invention as described above is a method for producing a functional precision component in which a functional material is formed only in the concave portion of the concavo-convex fine structure in the range of 10 nm to 1 mm provided on the resin substrate surface. In the presence of water, a catalytic substance is used to dissociate the water molecules and adsorb by cutting back bonds between oxygen and other elements that make up the workpiece and helping to generate decomposition products by hydrolysis. And the catalytic material is brought into contact with or in close proximity to the material to be processed, and the potential of the catalytic material is in a range not including the generation of H ₂ and O ₂ including the natural potential, and the material to be processed and the catalytic material Relative movement to remove the decomposition product from the surface of the workpiece, and the predetermined processable thickness does not produce a decomposition product by hydrolysis over the surface of the substrate over the entire surface of the substrate Stopper Stopper layer formation step of forming a layer on top of the stopper layer, the functional material lamination step of laminating forming a processable functional materials degradation products due to hydrolysis by the working process takes place, the recess by the machining process Since the processing step of removing the functional material outside is performed, the following effects can be obtained. By using the base as a resin, it is possible to form an uneven microstructure on the surface by resin injection molding or shape transfer technology. Since it is basically a chemical processing process (Water-CARE) using only water, without using any abrasive grains, even a substrate surface having a concavo-convex microstructure of sub-μm order is introduced without introducing a process-altered layer Only the external functional material can be precisely removed to produce a functional precision part having the functional material only in the recess, and particles and chemical components such as abrasive grains and slurry may remain in the recess. Because it is not, the cleaning process can be performed simply and at low cost.

  Then, the functional material laminating step is a step of forming a functional layer on the stopper layer by laminating a functional material that can be processed by the processing process to a thickness that does not block the concave structure, By having the functional layer of a predetermined thickness only on the inner surface of the concave portion of the substrate, the concave portion can be used as a functional concave portion. The present invention is most effective when a stopper layer of nm order is formed on the surface of a fine concavo-convex structure of the order of sub-μm, and a functional material is laminated and formed thereon with a thickness of nm order. In the case of having a functional layer with a thickness of nm order only on the inner surface of the concave portion of.

In addition, when the functional material is SiO ₂ , the inside of the recess can be made hydrophilic, and when the material of the stopper layer is carbon, the outside of the recess can be made water repellant. Carbon can be thinly deposited uniformly in the nm order by vapor deposition on the surface of the uneven microstructure on the surface of the substrate, and it is hardly processed by Water-CARE, so it becomes a good stopper layer and the processing step by the processing process It can be controlled with high precision, which contributes to the process efficiency. Also, the SiO ₂ thin film can be easily formed by vapor deposition, is stable because it is an oxide, and can be easily processed by water-CARE.

  Furthermore, if the substrate is a cycloolefin polymer (COP) resin, it is possible to form an uneven microstructure on the surface with high efficiency by a shape transfer method, low hygroscopicity, and excellent shape stability. Suitable for parts.

The functional precision component of the present invention is a functional precision component in which the functional material is formed only in the concave portion of the concavo-convex microstructure provided on the surface of the resin substrate, and the concavo-convex fineness in the range of 10 nm to 1 mm on the surface It consists of a resin base on which a structure is formed, a stopper layer covering the entire surface of the base, and a functional material formed on the stopper layer only in the recess of the concavo-convex microstructure, and water molecules are dissociated In the presence of water, the work piece and the catalyst are formed by using a catalytic substance that cuts and absorbs the back bonds of the oxygen element and other elements constituting the work piece and adsorbs, and generates decomposition products by hydrolysis. The substance is placed in contact with or in close proximity to the substance, and the potential of the catalyst substance is set to H including the natural potential. ₂ And O ₂ In the process of removing the decomposition products from the surface of the workpiece by moving the workpiece and the catalyst material relative to each other, the stopper layer generates decomposition products due to hydrolysis. Since the functional material is a workable material in which a decomposition product is generated by hydrolysis, the following effects can be obtained. First, when the substrate is made of resin, the surface irregular microstructure can be formed by resin injection molding or shape transfer technology. And the functional precision component which has a functional material only in the recessed part of the uneven | corrugated fine structure of the range of 10 nm-1 mm formed in the surface of the resin base | substrate can be provided. As described above, the present invention is most effective when a stopper layer of nm order is formed on the surface of a fine concavo-convex structure of sub-μm order, and a functional material is laminated on the surface to a thickness of nm order. And the functional layer having a thickness on the order of nm is provided only on the inner surface of the concave portion of the substrate.

The manufacturing process of the functional precision component by this invention is shown, (a) is sectional drawing of the state in which the stopper layer was formed on the surface of a base | substrate, (b) is sectional drawing of the state in which the functional layer was formed on the stopper layer (C) is sectional drawing of the state which is performing the processing process, (d) has shown sectional drawing of the completion state which removed only the functional layer of the convex part, respectively. The manufacturing process of the functional precision component of another form is shown, (a) is sectional drawing of the state which laminated | stacked the functional material so that a recessed part might be filled up in a functional material lamination process, (b) is a stopper layer of a convex part FIG. 6 shows a cross-sectional view of a completed state in which the processing process is performed until the exposure of the functional material is removed. It is explanatory drawing of the base | substrate shaping | molding method of a plane transfer system. It is explanatory drawing of the base | substrate shaping | molding method of a roll transfer system. The interference-microscope image and AFM image of the surface before and behind the planarization process of quartz glass are shown. A case where a substrate having undulation on the surface is processed by CARE having a processing reference surface of the catalyst is shown, (a) is a cross-sectional view before processing, and (b) is a cross-sectional view in a state where only a ridge portion of the undulation is processed. It is. The case where the substrate on which only the ridges of the ridges were processed is further processed by CARE provided with the processing reference surface of the catalyst is shown, (a) is a cross-sectional view before processing, (b) a microstructure of the ridges of the ridges It is sectional drawing of the state processed until it lose | disappeared. The case where a substrate with a surface undulation is processed by CARE of a work surface standard is shown, (a) is a sectional view before processing, (b) is a sectional view in a state where ridges and valleys of the undulation are processed is there.

  Next, an embodiment of the present invention will be described in detail based on the attached drawings. The technique for mass production of functional precision parts according to the present invention is a combination of resin structure transfer technology, thin film formation technology and ultra-precision processing technology. The asperity microstructure to be targeted is in the range of 10 nm to 1 mm, and more preferably in the range of 100 nm to 100 μm. In this embodiment, as shown in FIG. 1, a 100 μm pitch, 100 μm square, 100 μm high microstructured prismatic structure is formed on the surface of the substrate 1, the convex portion 2 is water repellent, and the concave portion 3 is hydrophilic. The procedure for manufacturing the above-described functional precision part A will be described. Water-CARE (Water-CAtalyst-Referred Etching) is used as the ultra-precision processing technology (processing process).

  First, a synthetic resin base 1 having an uneven microstructure in the range of 10 nm to 1 mm on the surface is prepared. Here, a cycloolefin polymer (COP) resin is used as the material of the substrate 1, but other synthetic resins, glass, or the like can be used depending on the intended use. Next, a stopper layer forming step (see FIG. 1A) for forming a stopper layer 4 having a thickness on the order of nm that cannot be processed by the processing process on the entire surface of the substrate 1, and on the stopper layer 4 A functional material laminating step (see FIG. 1B) for laminating and forming a functional layer 5 made of a functional material that can be processed by the processing process, and the functional material outside the recess 3 is removed by the processing process. The functional precision part A is manufactured through the processing step (see FIG. 1 (c)) (see FIG. 1 (d)).

In the present embodiment, the stopper layer 4 is a carbon thin film having a thickness of about 30 nm, has water repellency, and has the property that it is hardly processed by the present processing process. On the other hand, the functional layer 5 is a SiO ₂ thin film having a thickness of 150 to 180 nm, has hydrophilicity, and has a property of being easily processed by the present processing process. Then, when the main processing process is performed on the surface of the substrate 1 in water using the processing head 6 using the catalyst as the processing reference surface, the SiO ₂ thin film located in the convex portion 2 is removed along with the progress of processing Although the thickness is reduced, when the carbon thin film is exposed, the processing speed is rapidly reduced. After the SiO ₂ thin film of the convex portion 2 is completely removed, the present processing process is stopped. In this case, the machining process, since only the vicinity of contact with the catalyst is to function in, SiO ₂ thin film positioned in the recess 3 remote from the catalyst is not at all processed. As described above, even when the recess is in the sub-μm order, the functional recess 7 in which the inner wall surface is covered with the functional layer 5 can be formed by forming a thin film in the nm order.

  On the other hand, as shown in FIG. 2, in the functional material laminating step (see FIG. 2A), when the functional material 8 is laminated so as to fill the concave portion 3, the subsequent processing steps ( When the processing is stopped after the processing has progressed to the level of the stopper layer 4 according to FIG. 2 (b)), the convex portion 2 is water-repellent and the concave portion 3 is filled with the functional material 8. Precision parts B can be manufactured.

  In order to form a concavo-convex microstructure on the surface of the substrate 1, the resin is formed by injection molding or transfer technology using a mold. These transfer techniques have many reports and achievements so far as low-cost mass production techniques, are being put to practical use as nanoimprint lithography for forming semiconductor fine circuits, and can cope with structures of nm order. FIG. 3 shows a planar transfer method, in which a base material is placed on a planar mold 9 and a transfer mold 10 on which a fine uneven pattern is formed is pressed from above at a predetermined temperature to form an uneven microstructure on the surface of the substrate 1. Transcript. FIG. 4 shows a roll transfer system, in which a sheet-like continuous substrate 1 is fed between a cylindrical roll 11 and a transfer roll 12 having a fine concavo-convex pattern formed on the outer periphery, and the fine concavo-convex pattern of the cylindrical roll 11 is transferred to the substrate. It is to be repeatedly transferred to the surface of 1. In particular, if a roll transfer method is adopted, it can be expected as a cheaper manufacturing technology.

  The cycloolefin polymer (COP) resin used as the material of the substrate 1 is excellent in dimensional stability even under the minimum water absorption and high humidity among plastics, and there is almost no warp or deformation of a molded product, so it is suitable for precision molding As it is excellent and has high fluidity, it has excellent transferability. Therefore, COP is used for precision parts such as semiconductor containers, biochips, bioplates, infusion bags, multilayer films and the like.

The stopper layer 4 does not have to be water repellant, and is formed of an unprocessable or difficult-to-process material by this process. In the case of normal mechanical polishing, the thin film of the nm order thickness is removed in an instant and is largely removed to the convex portion 2 of the substrate 1 and the desired uneven microstructure can not be maintained. The present processing process is a processing principle in which water molecules intervene, and therefore, a water repellent material can not be processed and can be preferably employed. In addition, this processing process is suitable for processing solid oxide, and a SiO ₂ thin film, which is a typical hydrophilic material, is the functional material most suitable for processing.

Next, the details of the processing process (Water-CARE) used in the present invention will be described mainly in the case of using a solid oxide as a processing target. Water-CARE uses a catalytic substance as a processing reference surface that dissociates water molecules and adsorbs by cutting back bonds between oxygen and other elements constituting the solid oxide, and helps to generate decomposition products by hydrolysis. In the presence of water, the workpiece and the processing reference surface are disposed in contact with or in close proximity to each other, and the potential of the processing reference surface is a range in which H ₂ and O ₂ are not generated including the natural potential; The workpiece and the processing reference surface are moved relative to each other to remove the decomposition product from the surface of the workpiece for processing.

  Here, it is preferable to use a catalyst material surface containing a transition metal element as the catalyst material and having an electron d orbit of the transition metal element in the vicinity of the Fermi level. In this processing process, since a solution reactive with a metal element is not used, various transition metal elements can be used. Among them, Pt, Ru, Ni, Co, Cr, and Mo including Pt having a large work function can be used. Etc. are preferably used. Furthermore, the catalyst substance to be the processing reference surface may be a metal element alone or an alloy composed of a plurality of metal elements. Practically, it is preferable to use Pt, Ru, Ni, Cr as a processing reference surface. Here, the catalyst material does not need to be a bulk, and may be a thin film formed by vapor deposition, sputtering, electroplating or the like of a metal or a transition metal on the surface of a base material that is inexpensive and has good shape stability. The base material on which the catalyst substance is formed may be a hard elastic material, and for example, a fluorine-based rubber material can be used. When the catalyst material is conductive, the processing speed can be controlled by externally controlling the potential of the processing reference surface. Further, even a compound containing a transition metal element and an insulating catalyst material can be used satisfactorily if the d-orbital of electrons of the transition metal element is a catalyst material in the vicinity of the Fermi level. Leave as it is.

As the water, it is necessary to realize pure processing environment and use precise control of processing conditions to use pure water or ultrapure water having few impurities and constant characteristics. Generally, pure water has an electrical resistivity of about 1 to 10 MΩ · cm, and ultrapure water has an electrical resistivity of 15 MΩ · cm or more, but there is no boundary between the two. In addition, in this processing process, it may be preferable to perform processing in a state where hydrogen is adsorbed to the catalyst substance of the processing reference surface using hydrogen water in which pure water or ultrapure water is purged with hydrogen. In addition, it is also preferable to use water in which pure water or ultrapure water is mixed with a complex that aids dissolution of decomposition products. Here, the complex acts to promote the dissolution of the decomposition product and to form a complex ion and maintain it stably in water. Moreover, it is preferable to adjust pH of water (processing liquid) in 2-12. Even if the pH is lower (strongly acidic) or higher (strongly alkaline) than this range, the processing speed is decreased. Since the properties of oxides to be processed are diverse and decomposition products generated in the processing process are various, it is desirable to adjust the pH accordingly. For adjusting the pH, for example, the acidic region is added with HNO ₃ , and the alkaline region is added with KOH. Of course, the pH of the processing fluid may be 7 (neutral: as it is), and in that case, it can be applied universally to the processing of various oxides.

  It is considered that the processing mechanism of Water-CARE is phenomenologically as follows. When a processing reference surface having a catalytic material whose d electron orbit is near the Fermi level at least contacts the surface of the solid oxide contacts or closely approaches, that is, the d electron orbit approaches the surface of the solid oxide. The d electrons act to lower the barrier of reaction against both the dissociation of water molecules and the phenomenon when the oxide backbond becomes loose. Phenomenologically, when the catalyst material approaches the oxide, the bonding force of the back bond between the oxygen element constituting the oxide and the other element weakens, and the water molecules dissociate and the oxygen element of the oxide The back bonds of other elements are cut and adsorbed to generate hydrolysis decomposition products. And it is a principle of making a decomposition product elute into processing fluid. Here, the processing reference surface having the catalyst substance is brought into contact with the surface of the solid oxide and rubbed to give a mechanical force to the decomposition product, thereby promoting elution into water. Further, even if the surface of the solid oxide and the processing reference surface do not contact each other, there is an action of promoting the elution of the decomposition product into the water by the flow of water caused by the relative movement of both.

Further, if the catalyst substance forming the processing reference surface is a conductive material, the processing speed can be controlled by adjusting the potential of the catalyst substance. The oxidation-reduction potential changes the property that the surface of a conductive substance (eg, Pt) “extracts” and “gives” electrons from the oxide side. The potential of the conductive material is a parameter for changing to the optimum processing speed according to the precision to be finally aimed at. However, if the potential of the conductive material is increased positively, O ₂ is generated, and if it is negatively increased, H ₂ is generated, and bubbles interfere with processing. Therefore, adjustment is made within a range in which H ₂ and O ₂ are not generated. Control range of the potential is about 1.6V.

For example, a crystal of silicon dioxide (SiO ₂ ) has a structure in which Si is located at the center of a tetrahedron and O is bonded to four apexes, and Si is three-dimensionally bonded via O, the machining, cutting the bond Si-O-Si, a Si-OH, OH-Si by hydrolysis of _{H 2} O. Thus, hydrolysis produces silicic acid {[SiO _x (OH) _{4-2 x} ] _n }. Here, 0 <x <2. Typically, there are orthosilicic acid (H ₄ SiO ₄ ), metasilicic acid (H ₂ SiO ₃ ), metadisilicic acid (H ₂ Si ₂ O ₅ ) and the like. These decomposition products are eluted in water.

  When processing a material other than a solid oxide, a catalyst substance having a function of promoting both oxidation of the material and hydrolysis of the oxide film is used as a processing reference surface. Thus, for example, processing of materials such as Si and SiC and GaN is also possible.

Next, FIG. 5 shows a result of processing quartz glass (pure SiO ₂ ) using Pt as a catalyst material for forming the processing reference surface. The quartz glass used CMP surface as a pre-processed surface, and the processing characteristics were evaluated by observing the surfaces before and after processing with a phase shift interference microscope (Zygo, NewView) and an atomic force microscope (AFM). Processing pressure: 200 hPa, rotational speed: 10 rpm, solution: ultrapure water, processing time: 1 hour. The processing rate was 831 nm / h. As a result of processing, in the phase shift interference microscope image, rms: 0.338 nm before processing becomes rms: 0.147 nm after processing, and the surface roughness is significantly improved. In the AFM image, the rms: 1.455 nm prior to processing significantly improved the surface roughness to rms: 0.103 nm after processing, and scratches were observed on the surface before processing, but such scratches were removed, It was found to have a smooth surface at the atomic level. It can be seen that the SiO ₂ thin film having a thickness of 150 to 180 nm can be removed in about 10 minutes.

  The biggest problem in the present invention is to establish the ultra-precision processing technique which is the final step. As mentioned above, the microstructure manufacturing technology using resin materials has already been established by mass production technology, and the functional thin film formation technology on the resin also requires some consideration such as peeling resistance during processing and use. Is almost established. The problem is an ultra-precision processing technique that selectively removes only one kind of ultra-thin film having a thickness of about 100 nm formed on a very delicate resin material that is soft and has a fine structure. The reason for making the ultrathin film is that if the film is thick, the film fills the uneven micro structure of the order of sub μm.

Water-CARE is developed to perform ultra-smoothing finishing with a surface roughness of about 1 nmPV using only water, without using abrasive grains and a workpiece such as quartz glass. A hydrophilic SiO ₂ thin film (the same component as synthetic quartz glass) is formed on the outermost surface, and a water-repellent thin film which does not react with Water-CARE (is not processed) under it is made to act as a stopper layer. It is possible to form a fine structure in which desired wettability is controlled. If a workpiece with a fine structure is processed by the conventional polishing method using abrasive particles, the chemical components of the abrasive particles and the slurry remain in the recess, so a great deal of time and cost are required in the cleaning step. The occurrence of defects such as scratches is also expected.

  The resinous substrate having a concavo-convex fine structure used in the present invention is a soft material, and since it is manufactured by injection molding or shape transfer method, the occurrence of waviness of the order of μm on the outermost layer or the reference surface is avoided. I can't. For this reason, in the conventional CARE, if the surface of the substrate 1 has waviness as shown in FIG. 6A, uniform ultra-precise processing cannot be performed on the surface of the processing head 6. That is, since the peak portion of the undulation of the substrate 1 is selectively processed and the valley portion of the undulation is not processed at all, it is only possible to partially form a target fine structure with controlled wettability (see FIG. 6 (b)). ). As shown in FIG. 7, there is a limit to the stopper layer 4 for CARE, and when the long-time processing or mechanical processing conditions are increased, the stopper layer 4 is broken, and the essential fine uneven structure disappears. (FIG. 7B).

  In order to overcome this problem, instead of using the catalyst plane of the machining head 6 as a reference, as shown in FIG. 8, an elastic catalyst tool 13 is used to remove the film with reference to the surface of the workpiece having waviness. Work surface standard CARE. As a result, a 100 μm square, 100 μm square microstructure with a 100 μm pitch is formed on a 2 inch (φ 50 mm) resin base with a surface undulation of about 10 μm, and water repellency and hydrophilicity are formed thereon. It is possible to manufacture a functional precision component by forming a thin film and forming a fine structure in which the convex portion is water-repellent and the concave portion is hydrophilic on the entire surface of the workpiece.

  Establishing the workpiece surface reference CARE machining method makes it possible to expand CARE from flat to curved surfaces, and it is also possible to follow grinding, so it can ultimately be developed to ultra-precision grinding of free-form surface shapes. Means that. The ultra-high precision (ultra-smooth surface) free-form surface is the ultimate optical component.

  The present invention is basically applicable to mass production of microreactors and templates for cell sheet culture. In addition, since the fine structure of sub-μm order functions as a photonic crystal, it can be applied to inspection equipment such as biomarkers for checking viruses.

A, B Functional precision component 1 Base body 2 Convex part 3 Concave part 4 Stopper layer 5 Functional layer 6 Processing head 7 Functional concave part 8 Functional material 9 Plane type 10 Transfer mold 11 Cylindrical roll 12 Transfer roll 13 Elastic catalyst tool

Claims (10)

A method for producing a functional precision component, wherein a functional material is formed only in a concave portion of a concavo-convex fine structure in a range of 10 nm to 1 mm provided on a resin substrate surface,
A catalytic substance that assists in the generation of decomposition products by hydrolysis by adsorbing by breaking back bonds between oxygen elements and other elements that constitute the workpiece by dissociating water molecules, and in the presence of water, The workpiece and the catalyst material are arranged in contact with or in close proximity to each other, the potential of the catalyst material is within a range that includes a natural potential and H ₂ and O ₂ are not generated, and the workpiece and the catalyst material are moved relative to each other. Using a processing process for removing the decomposition products from the surface of the workpiece,
A stopper layer forming step of forming a non-processable stopper layer having a predetermined thickness which does not produce a decomposition product by hydrolysis by the processing process over the entire surface of the substrate;
A functional material laminating step for laminating a functional material that can be processed on the stopper layer to generate a decomposition product by hydrolysis by the processing process;
A processing step of removing functional material outside the recess by the processing process;
And manufacturing method of functional precision parts. In the functional material laminating step, a functional layer is formed on the stopper layer by laminating a functional material that can be decomposed by hydrolysis by the processing process to a thickness that does not block the concave structure. The method for producing a functional precision component according to claim 1, wherein a functional layer having a predetermined thickness is provided only on the inner surface of the concave portion of the substrate. The method for producing a functional precision part according to claim 1, wherein the functional material is SiO ₂ .   The method for manufacturing a functional precision part according to any one of claims 1 to 3, wherein a material of the stopper layer is carbon.   The method for producing a functional precision part according to any one of claims 1 to 4, wherein the substrate is a cycloolefin polymer (COP) resin. A functional precision component in which a functional material is formed only in the concave portion of the concavo-convex microstructure provided on the surface of the resin substrate ,
A resin substrate having an uneven microstructure in the range of 10 nm to 1 mm formed on the surface;
A stopper layer covering the entire surface of the substrate;
A functional material formed on the stopper layer only in the concave portion of the concavo-convex microstructure;
Consists of
A catalytic substance that assists in the generation of decomposition products by hydrolysis by adsorbing by breaking back bonds between oxygen elements and other elements that constitute the workpiece by dissociating water molecules, and in the presence of water, The workpiece and the catalyst material are arranged in contact with or in close proximity to each other, the potential of the catalyst material is within a range that includes a natural potential and H ₂ and O ₂ are not generated, and the workpiece and the catalyst material are moved relative to each other. The stopper layer is a non-processable material that does not produce a hydrolysis degradation product, and the functional material is a hydrolysis degradation product, in contrast to the processing process for removing the degradation product from the surface of the workpiece. A functional precision part characterized in that it is a processable material that an object produces . The functional precision component according to claim 6, wherein the functional material is formed to a thickness that does not block the concave portion of the concave-convex microstructure, and has a functional layer having a predetermined thickness only on the inner surface of the concave portion. The functional material is SiO ₂ The functional precision part according to claim 6 or 7, wherein The functional precision component according to any one of claims 6 to 8, wherein a material of the stopper layer is carbon. The functional precision part according to any one of claims 6 to 9, wherein the substrate is a cycloolefin polymer (COP) resin.