JP2015207655A - Imprint mold, blank for imprint mold, method for manufacturing imprint mold substrate, and method for manufacturing imprint mold - Google Patents

Imprint mold, blank for imprint mold, method for manufacturing imprint mold substrate, and method for manufacturing imprint mold Download PDF

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JP2015207655A
JP2015207655A JP2014087188A JP2014087188A JP2015207655A JP 2015207655 A JP2015207655 A JP 2015207655A JP 2014087188 A JP2014087188 A JP 2014087188A JP 2014087188 A JP2014087188 A JP 2014087188A JP 2015207655 A JP2015207655 A JP 2015207655A
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convex
convex structure
imprint mold
portion
surface
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JP6398284B2 (en
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貴昭 平加
Takaaki Hiraka
貴昭 平加
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大日本印刷株式会社
Dainippon Printing Co Ltd
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Abstract

An imprint mold, a blank for imprint mold, and a substrate for imprint mold capable of removing a fine uneven pattern by a polishing process without deteriorating flatness (flatness) of an upper surface of a convex structure portion And a method of manufacturing an imprint mold. An imprint mold 1 includes a base 2 having a first surface 2A and a second surface 2B opposite to the first surface 2A, and a convex structure portion 3 and a convex portion protruding from the first surface 2A. 4 and a fine concavo-convex pattern 5 formed on the upper surface 3A of the convex structure portion 3, and the convex portion 4 is positioned around the convex structure portion 3 in plan view from the first surface 2A side. The height T4 of the convex portion 4 is substantially the same as the height T3 of the convex structure portion 3. [Selection] Figure 1

Description

  The present invention relates to an imprint mold, imprint mold blanks, and a method for manufacturing an imprint mold substrate and an imprint mold.

  Nanoimprint technology as a microfabrication technology uses a mold member (imprint mold) in which a fine concavo-convex pattern is formed on the surface of a substrate, and transfers the fine concavo-convex pattern to a workpiece such as an imprint material. This is a pattern formation technique for transferring a fine concavo-convex pattern at an equal magnification (see Patent Document 1). In particular, with the progress of further miniaturization of wiring patterns and the like in semiconductor devices, nanoimprint technology is gaining more and more attention in semiconductor device manufacturing processes and the like.

  In general, a mold having a fine concavo-convex pattern (master mold) formed using a fine processing technique such as electron beam exposure is produced, and the fine concavo-convex pattern of the master mold is concavo-convex by imprint processing using the master mold. A large number of inverted molds (replica molds) are produced. This replica mold is usually used for imprint processing, which is one of the manufacturing processes for semiconductor products and the like. The reason why imprint processing is performed using such a replica mold is to reduce the risk of damage to the master mold, which requires a great amount of time and cost for production.

  The master mold and replica mold (hereinafter sometimes referred to as “imprint mold”) may be damaged and discarded. In that case, it is not preferable to discard the imprint mold or the like as it is from the viewpoint of manufacturing cost and environment. Therefore, it is desired to remove the fine concavo-convex pattern such as the imprint mold and reproduce it as an imprint mold substrate.

  As a method for removing the fine concavo-convex pattern such as the imprint mold, for example, a polishing pad such as urethane while supplying a polishing slurry to a surface to be polished (surface on which the fine concavo-convex pattern is formed) such as the imprint mold. A method of polishing by pressing a surface plate to which is attached (see Patent Document 2) or the like is conceivable. This polishing process includes a primary polishing process using a polishing slurry mainly composed of cerium oxide having a relatively large particle size (about 0.3 to 3 μm) and a relatively small particle size (about 10 to 300 nm). And a secondary polishing treatment using a polishing slurry containing colloidal silica.

US Pat. No. 5,772,905 JP-A 64-40267

  In general, as shown in FIG. 8, an imprint mold 100 (particularly a replica mold) includes a base 200 having a first surface 200A and a second surface 200B facing the first surface 200A, and a first surface 200A of the base 200. A projection having a protruding convex structure 300, a fine concave / convex pattern 500 formed on the upper surface 300A of the convex structure 300, and a recess 600 formed on the second surface 200B is used.

  In order to remove the fine concavo-convex pattern 500 of the imprint mold 100 having such a configuration, the upper surface 300A of the convex structure portion 300 is polished by the polishing method disclosed in Patent Document 2. In this case, the base 200 of the imprint mold 100, particularly the stress when the polishing pad 91 attached to the surface plate 92 is brought into contact with the upper surface 300 </ b> A of the convex structure 300, the weight of the imprint mold 100, There is a possibility that a portion of the base portion 200 where the hollow portion 600 is formed (a portion having a smaller thickness than other portions) is deformed so as to be curved (see FIG. 9). When the polishing process is performed with the deformation as described above, the polishing amount in the vicinity of the outer peripheral edge of the convex structure portion 300 becomes larger than the polishing amount in the vicinity of the central portion of the convex structure portion 300, and the upper surface 300A of the convex structure portion 300 is flat There is a problem that the roughness (flatness) deteriorates, and in particular, the substrate is regenerated as an imprint mold substrate in which the corners of the outer peripheral edge of the convex structure 300 are rounded (see FIG. 10). In particular, the above-described problem may occur due to the primary polishing process using a polishing slurry mainly composed of cerium oxide having a relatively large particle size (about 0.3 to 3 μm).

  When an imprint mold is manufactured using a substrate for imprint mold in which the flatness (flatness) of the upper surface 300A of the convex structure portion 300 from which the fine concavo-convex pattern 500 has been removed by the polishing process is deteriorated, the imprint mold is used. During the imprint process, the uniformity of the residual film thickness of the imprint resin is reduced due to the deterioration of the flatness (flatness) of the upper surface 300A of the convex structure 300, and as a result, the imprint mold is used. There is a possibility that the dimensional accuracy of the formed transfer pattern is deteriorated.

  In view of the above problems, the present invention provides an imprint mold and an imprint mold blank that can remove a fine uneven pattern by polishing without deteriorating the flatness (flatness) of the upper surface of the convex structure portion. And an imprint mold substrate and a method for producing the imprint mold.

  In order to solve the above problems, the present invention provides a base having a first surface and a second surface facing the first surface, a convex structure portion and a convex portion protruding from the first surface, A fine concavo-convex pattern formed on the upper surface of the convex structure portion, and the convex portion is located around the convex structure portion in a plan view from the first surface side. An imprint mold is provided in which the height is substantially the same as the height of the convex structure portion (Invention 1).

  According to the said invention (invention 1), since the convex part which has substantially the same height as a convex structure part is located in the circumference | surroundings of a convex structure part, the fine uneven | corrugated pattern of the said imprint mold is grind | polished. Therefore, it is possible to prevent the base from being deformed when it is removed and regenerated, and as a result, it is possible to prevent the flatness (flatness) of the upper surface of the convex structure portion from being deteriorated by the deformation of the base. .

  In the present invention, “the height of the convex portion is substantially the same as the height of the convex structure portion” means that the height of the convex portion based on the first surface of the base portion is the first surface. It means that it is -1.0 to + 0.3%, preferably -0.5 to 0% with respect to the height of the convex structure portion with respect to.

  In the above invention (Invention 1), a plurality of the convex portions are provided on the first surface, and each convex portion is centered on the convex structure portion in a plan view from the first surface side. It is preferable to be provided at a position having the symmetry as described above (Invention 2).

  In the said invention (invention 1 and 2), the said convex structure part is substantially rectangular shape in planar view, Comprising: The same shape as the said convex structure part on the said 1st surface, and the area | region around the said convex structure part When a plurality of rectangular regions are arranged in parallel, it is preferable that the convex portion is located on any side of the rectangular region (Invention 3).

  In the said invention (invention 1-3), the said 2nd surface of the said base is formed with the hollow part, and the said hollow part is the said 1st surface side in the planar view of the said base part. The projected area is formed on the second surface so that the projected area projected onto the projection structure part includes the projected structure part, and the projected part projects at least the depression part on the first surface side. It is preferable to be provided outside (Invention 4).

  In the said invention (invention 1-4), the said convex structure part is planar view substantially rectangular shape, and the upper surface of the said convex structure part contains the boundary area | region located between a several small area | region and an adjacent small area | region. The fine concavo-convex pattern is formed in each of the plurality of small regions, and a plurality of rectangular regions having the same shape as the convex structure portion are arranged in parallel in a region around the convex structure portion on the first surface. Then, it is preferable that the convex portion is located in a region corresponding to the boundary region in the rectangular region (Invention 5).

  Moreover, this invention has a grinding | polishing process which grind | polishes the upper surface of the said convex structure part of the imprint mold which concerns on the said invention (invention 1-5), The polishing tool attached to the surface plate in the said grinding | polishing process WHEREIN: By rotating the surface plate relative to the imprint mold while supplying an abrasive to the polishing tool in a state of being in contact with the upper surface of the convex structure portion and the convex portion, the convex structure portion A method for producing an imprint mold substrate is provided, wherein the upper surface of the substrate is polished (Invention 6).

  Furthermore, the present invention provides a pattern forming step of forming a fine concavo-convex pattern on the upper surface of the convex structure portion of the imprint mold substrate manufactured by the method for manufacturing an imprint mold substrate according to the invention (invention 6). An imprint mold manufacturing method is provided (Invention 7).

  Furthermore, the present invention includes a base having a first surface and a second surface facing the first surface, and a convex structure and a convex protruding from the first surface, and the convex Is located around the convex structure portion in plan view from the first surface side, and the height of the convex portion is substantially the same as the height of the convex structure portion. A recess is formed on the second surface, and the recess has a projection region in which the recess is projected on the first surface side in a plan view of the base to include the convex structure. As described above, it is formed on the second surface, and the convex portion is provided at least outside the projection region in which the depression is projected on the first surface side. Blanks for imprint molds are provided (Invention 8).

  According to the present invention, an imprint mold, a blank for imprint mold, and an imprint capable of removing a fine uneven pattern by a polishing process without deteriorating flatness (flatness) of an upper surface of a convex structure portion A method of manufacturing a mold substrate and an imprint mold can be provided.

FIG. 1 is a cut end view showing a schematic configuration of an imprint mold according to an embodiment of the present invention. FIG. 2 is a plan view showing a schematic configuration of an imprint mold according to an embodiment of the present invention. FIG. 3 is a plan view showing a specific aspect of the convex portion in one embodiment of the present invention. 4A and 4B are plan views showing another schematic configuration of the imprint mold according to the embodiment of the present invention. FIG. 5 is a process flow diagram showing each step of the imprint mold manufacturing method according to the embodiment of the present invention in a cut end view. FIG. 6 is a side view schematically showing a step of polishing the upper surface of the convex structure portion of the imprint mold according to the embodiment of the present invention. FIG. 7 is a process flow diagram showing each step of the imprint mold substrate manufacturing method and the new imprint mold manufacturing method according to an embodiment of the present invention in a cut end view. FIG. 8 is a cross-sectional side view showing a schematic configuration of a conventional imprint mold. FIG. 9 is a cut end view schematically showing a step of polishing the upper surface of the convex structure portion of the conventional imprint mold. FIG. 10 is a cut end view showing a schematic configuration of an imprint mold substrate which is regenerated by polishing the upper surface of the convex structure portion by a conventional method.

  Hereinafter, an imprint mold according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a cut end view illustrating a schematic configuration of an imprint mold according to the present embodiment, and FIG. 2 is a plan view illustrating a schematic configuration of the imprint mold according to the present embodiment.

  As shown in FIG. 1, the imprint mold 1 according to the present embodiment includes a first surface 2A and a base 2 having a second surface 2B facing the first surface 2A, and the first surface 2A. Protruding convex structures 3 and convex parts 4 are provided, a fine uneven pattern 5 is formed on the upper surface 3A of the convex structure 3, and a recess 6 is formed on the second surface 2B.

  The material constituting the base 2 is a material corresponding to the use of the imprint mold 1 according to the present embodiment (use for optical imprint, thermal imprint, etc.), and constitutes the imprint mold substrate. General materials (for example, glass materials such as quartz glass, soda glass, fluorite, calcium fluoride, magnesium fluoride, acrylic glass, resin materials such as polycarbonate, polypropylene, polyethylene, etc., are arbitrarily selected from these In addition, a transparent material such as a laminated material obtained by laminating two or more materials; a metal material such as nickel, titanium, or aluminum; a semiconductor material such as silicon or gallium nitride, or the like). In the present embodiment, “transparent” means that the transmittance of light having a wavelength of 300 to 450 nm is 85% or more, and preferably 90% or more.

  The shape of the base 2 in plan view is not particularly limited, and examples thereof include a substantially rectangular shape and a substantially circular shape. If it is the imprint mold 1 which consists of a quartz glass substrate generally used for optical imprints, the planar view shape of the base 2 is usually a substantially rectangular shape.

The size of the base 2 is not particularly limited, but as the imprint mold 1 made of the above-described quartz glass substrate, generally, the base 2 having a size of 152 mm × 152 mm is used. The thickness T 2 of the base 2, the intensity, considering handling properties, etc., for example, may be appropriately set within a range of about 300Myuemu~10mm.

  The convex structure portion 3 protruding from the first surface 2A of the base portion 2 is provided at substantially the center of the base portion 2 in plan view. Examples of the shape of the convex structure portion 3 include a substantially rectangular shape and a substantially circular shape.

  The size of the convex structure portion 3 is appropriately set according to a product manufactured through an imprint process using the imprint mold 1. For example, a substantially rectangular convex structure portion 3 of 33 mm × 26 mm can be given.

The height T 3 of the convex structure portion 3 is not particularly limited as long as the imprint mold 1 can achieve the purpose of including the convex structure portion 3, and can be set to about 10 to 100 μm, for example.

  A recess 6 having a predetermined size is formed on the second surface 2B of the base 2. By forming the depression 6, the base 2, particularly the convex, is formed during imprint processing using the imprint mold 1 according to the present embodiment, particularly when in contact with the imprint resin or when the imprint mold 1 is peeled off. The upper surface 3A of the structure part 3 can be curved. As a result, when the upper surface 3A of the convex structure 3 and the imprint resin are brought into contact with each other, it is possible to prevent air from being sandwiched between the fine uneven pattern 5 and the imprint resin, and from the transfer pattern. The imprint mold 1 can be easily peeled off.

  It is preferable that the planar view shape of the hollow portion 6 is a substantially circular shape. Due to the substantially circular shape, the convexity of the imprint mold 1 is imprinted, particularly when the upper surface 3A of the convex structure 3 is brought into contact with the imprint resin or when the imprint mold 1 is peeled off from the imprint resin. The upper surface 3A of the structure portion 3 can be curved substantially uniformly in the plane.

  As shown in FIG. 2, the size of the depression 6 in plan view is such that the convex structure 3 is included in the projection area HA in which the depression 6 is projected on the first surface 2A side of the base 2. As long as it is a size, it is not particularly limited. If the projection area HA has a size that does not allow the convex structure portion 3 to be included, the entire upper surface 3A of the convex structure portion 3 of the imprint mold 1 may not be effectively curved. In FIG. 2, the fine concavo-convex pattern 5 formed on the upper surface 3 </ b> A of the convex structure portion 3 is not shown.

The convex portion 4 is provided around the convex structure portion 3 in the plan view of the base portion 2. As a planar view shape of the convex part 4, a substantially rectangular shape, a substantially circular shape, a line shape, etc. can be illustrated. The height T 4 of the convex portion 4 is substantially the same as the height T 3 of the convex structure portion 3. Since the height T 4 of the convex portion 4 is substantially the same as the height T 3 of the convex structure portion 3, when the upper surface 3 A of the convex structure portion 3 is subjected to a polishing process, Not only the upper surface 3A but also the convex part 4 abuts. Therefore, at the time of the polishing process, it is possible to suppress deformation of the base 2, particularly a portion where the recess 6 is formed in the base 2 (a portion thinner than other portions). As a result, when the imprint mold 1 is regenerated by polishing the upper surface 3A of the convex structure portion 3, the flatness of the upper surface 3A of the convex structure portion 3 is not deteriorated. On the other hand, if the height T 4 of the convex portion 4 is too lower than the height T 3 of the convex structure portion 3, the base portion 2 is curved when the polishing tool is brought into contact with the upper surface 3 A of the convex structure portion 3. As a result, the flatness (flatness) of the upper surface 3A of the convex structure 3 may be deteriorated. The height T 4 of the protrusion 4 is too high than the height T 3 of the convex portions 3, there is a possibility that the protrusions 4 at the time of imprinting can come into contact to the transfer substrate, also, In the polishing process, the polishing tool cannot be brought into contact with the upper surface 3A of the convex structure portion 3, and it may not be possible to polish effectively.

In the present embodiment, the "convex height T 3 of the structure 3 ', height from the first surface 2A of the base 2, i.e. the upper surface 3A of the convex portions 3 from the first surface 2A (Height in the vertical direction with respect to the first surface 2A), and the “height T 4 of the convex portion 4 ” is a height based on the first surface 2A of the base portion 2, that is, It means the length from the first surface 2A to the upper end of the convex portion 4 (the length in the direction perpendicular to the first surface 2A). Then, the "height T 4 of the convex portion 4 is substantially the same as the height T 3 of the convex portions 3 ', the height T 3 of the height T 4 of the protrusion 4 is convex structure section 3 -1.0 to + 0.3%, preferably -0.5 to 0.0%.

  The imprint mold 1 according to the present embodiment may have a plurality of convex portions 4. In this case, the plurality of convex portions 4 are symmetrical with respect to the top surface 3 </ b> A of the convex structure portion 3 in the plan view of the base portion 2, more specifically, centered on the figure gravity center of the upper surface 3 </ b> A of the convex structure portion 3. It is preferably provided at a position having (line symmetry, rotational symmetry, etc.). In particular, it is preferably provided at a position having rotational symmetry such as N-fold symmetry (N is an integer of 2 or more). In order to regenerate the imprint mold 1 according to the present embodiment, the plurality of convex portions 4 are provided at positions having symmetry with respect to the upper surface 3A of the convex structure portion 3 (the graphic center of the upper surface 3A). When a polishing tool is brought into contact with the upper surface 3A of the convex structure portion 3 to perform the polishing process, stress applied to the upper surface 3A of the convex structure portion 3 (stress due to contact of the polishing tool) is in-plane with the upper surface 3A. Becomes substantially uniform. As a result, the above polishing process can be performed without deteriorating the flatness of the upper surface 3A of the convex structure portion 3.

  As the convex part 4 provided in the position which has the said symmetry, the aspect with which the several linear convex part 4 is arrange | positioned radially centering on the upper surface 3A of the convex structure part 3, for example (refer FIG. 3 (A)). A mode in which the plurality of line-shaped convex portions 4 extend in either the first direction or the second direction orthogonal to the first direction (see FIG. 3B), and the annular convex portion 4 is the convex structure portion 3. Although the aspect (refer FIG.3 (C)) surrounding the circumference | surroundings, etc. are mentioned, It is not limited to these aspects.

  When the imprint mold 1 according to the present embodiment is used for forming a transfer pattern in a plurality of regions of a transfer substrate by a step-and-repeat imprint process, the plurality of convex portions 4 are It is preferable to be provided at a position corresponding to a scribe line of a transfer substrate on which a pattern is formed by imprint processing using the imprint mold 1. Since a transfer pattern is not formed on the scribe line of the transfer substrate, the protrusion 4 is prevented from contacting the transfer pattern formed on the transfer substrate by being provided at a position corresponding to the scribe line. can do.

  Specifically, as shown in FIG. 4A, the convex structure portion 3 has a rectangular shape in plan view, and a fine uneven pattern 5 (in FIG. 4A) is formed on substantially the entire upper surface 3A of the convex structure portion 3. In the plan view from the first surface 2A side of the base 2, the same outer shape as the convex structure 3 on the first surface 2A (around the convex structure 3). When a plurality of rectangular regions 30 are arranged, a side 31 of each rectangular region 30 is a position corresponding to the scribe line of the transfer substrate. In such a case, the convex part 4 can be provided so that it may be located on either side 31 (on the line which extended each side 31) of each rectangular area | region 30. FIG. By providing the convex portion 4 at such a position, the convex portion 4 is positioned on the scribe line of the transfer substrate during imprint processing, and the convex portion is formed on the transfer pattern formed on the transfer substrate. It can prevent that 4 contacts.

  Further, as shown in FIG. 4B, the convex structure portion 3 has a rectangular shape in plan view, and the upper surface 3A of the convex structure portion 3 is divided into a plurality of small regions S1 to S4 by a cross-shaped boundary region 3B. Thus, the fine unevenness pattern 5 (not shown in FIG. 4B) is formed in each of the small regions S1 to S4, and the fine unevenness pattern 5 in each of the small regions S1 to S4 is one product (for example, a semiconductor Product, etc.), that is, for a plurality of products (four in the example shown in FIG. 4B) (semiconductor products, etc.) by one imprint process. When the transfer pattern is formed, a rectangular region 30 having the same outer shape as the convex structure portion 3 is formed on the first surface 2A (around the convex structure portion 3) in a plan view from the first surface 2A side of the base portion 2. When a plurality of arrangements are made, the sides 31 of each rectangular area 30 and each In the form region 30, the line segment 32 which corresponds to the cross-shaped boundary region 3B of the upper surface 3A of the convex portions 3 becomes the position corresponding to the scribe line of the transfer target substrate. In such a case, the convex part 4 can be provided at least on the line segment 32. In the example shown in FIG. 4B, the convex portion 4 may be located on any side 31 of each rectangular region 30 (on a line obtained by extending each side 31).

  In FIG. 4B, the upper surface 3A of the convex structure portion 3 has been described with an example in which the upper surface 3A is divided into four (2 × 2) small regions. Instead, the imprint mold 1 according to the present embodiment may be one in which the upper surface 3A of the convex structure portion 3 is divided into six (3 × 2) small regions, for example.

  The convex portion 4 is, in plan view from the first surface 2A side, one of the inside of the projection area HA and the outside of the projection area HA obtained by projecting the depression 6 on the first surface 2A side, or those It may be provided in both, and it is particularly preferable that at least a part of the convex portion 4 is provided outside the projection area HA. At this time, for example, one convex part 4 may be provided inside and outside the projection area HA so as to straddle the projection area HA, or a plurality of convex parts 4 are provided on the first surface 2A. In some cases, the convex portion 4 may be provided at least outside the projection area HA. By providing the convex part 4 at least outside the projection area HA, it is possible to effectively prevent the deformation of the base part 2 when the upper surface 3A of the convex structure part 3 is subjected to the polishing process. The upper surface 3A of the convex structure 3 can be polished without deteriorating the flatness (flatness) of the upper surface 3A.

  The dimensions of the protrusions 4 (the width in the short direction if the shape of the protrusions 4 is a line shape, the diameter or the diagonal length if the shape of the protrusions 4 is a pillar shape) are not particularly limited. , About 10 to 200 μm. If the imprint mold 1 according to the present embodiment is used for forming a transfer pattern in a plurality of regions of a substrate to be transferred by a step-and-repeat type imprint process, the dimensions of the protrusions 4 are The dimension is smaller than the scribe line of the transfer substrate to be patterned by the imprint process using the imprint mold 1. Specifically, it is about 50 to 95% with respect to the dimension of the scribe line, and preferably about 80 to 95%.

  The imprint mold 1 according to the present embodiment described above can be manufactured as follows. FIG. 5 is a process flow diagram showing the manufacturing process of the imprint mold 1 according to the present embodiment in a cut end view.

  First, an imprint mold substrate 10 having a hard mask layer 7 formed on the first surface 2A is prepared (see FIG. 5A).

  As the substrate 10 for imprint mold, for example, a substrate generally used when manufacturing an imprint mold (for example, quartz glass, soda glass, fluorite, calcium fluoride substrate, magnesium fluoride substrate, acrylic glass, etc.) Glass substrates, polycarbonate substrates, polypropylene substrates, resin substrates such as polyethylene substrates, transparent substrates such as laminated substrates formed by laminating two or more substrates selected from these substrates; nickel substrates, titanium substrates, aluminum substrates Or a metal substrate such as a silicon substrate, a semiconductor substrate such as a gallium nitride substrate, or the like.

  The thickness of the imprint mold substrate 10 can be appropriately set in the range of, for example, about 300 μm to 10 mm in consideration of the strength of the substrate, handling suitability, and the like. In the present embodiment, “transparent” means that the transmittance of light having a wavelength of 300 to 450 nm is 85% or more, and preferably 90% or more.

  Examples of the material constituting the hard mask layer 7 include metals such as chromium, titanium, tantalum, silicon, and aluminum; chromium-based compounds such as chromium nitride, chromium oxide, and chromium oxynitride, tantalum oxide, tantalum oxynitride, and boron oxide. A tantalum compound such as tantalum tantalum or tantalum oxynitride, titanium nitride, silicon nitride, silicon oxynitride, or the like can be used alone or in combination of two or more selected arbitrarily.

  The hard mask layer 7 is patterned in a process described later (see FIG. 5C), and the hard mask patterns 71 and 72 formed thereby are formed by etching the imprint mold substrate 10 and the convex structures 3 and It is used as a mask when forming the convex portion 4 (see FIG. 5D). Therefore, it is preferable to select the constituent material of the hard mask layer 7 in consideration of the etching selection ratio according to the type of the substrate 10 for imprint mold. For example, when the imprint mold substrate 10 is made of quartz glass, a chromium-based compound film such as a metal chromium film, a chromium oxide film, or a chromium nitride film can be suitably selected as the hard mask layer 7.

  The thickness of the hard mask layer 7 is appropriately set in consideration of the etching selectivity according to the type of the imprint mold substrate 10. For example, when the imprint mold substrate 10 is made of quartz glass and the hard mask layer 7 is a metal chromium film, the thickness of the hard mask layer 7 is about 10 nm to 1 μm.

  Next, a resist pattern 81 corresponding to the convex structure portion 3 and a resist pattern 82 corresponding to the convex portion 4 are formed on the hard mask layer 7 by a photolithography method or the like (FIG. 5B).

  The resist material constituting the resist patterns 81 and 82 is not particularly limited, and an energy beam sensitive resist material or the like generally used by a photolithography method or the like can be used.

  Subsequently, using the resist patterns 81 and 82 as a mask, the hard mask layer 7 is etched to form hard mask patterns 71 and 72 (FIG. 5C). Then, using the hard mask patterns 71 and 72 as a mask, the imprint mold substrate 10 is etched to form the convex structure portion 3 and the convex portion 4, and the remaining hard mask patterns 71 and 72 and the resist patterns 81 and 82 are formed. It is removed (FIG. 5D).

  Finally, a recess 6 is formed on the second surface 2B side of the substrate 10 for imprint molding, and then, if desired, the first surface 2A, the upper surface 3A of the convex structure portion 3 and the hard surface on the convex portion 4 are hardened. A mask layer 70 is formed (FIG. 5E). The recess 6 may be formed by an etching process using the resist film as a mask by forming a resist film having an opening corresponding to the recess 6 on the second surface 2B side of the imprint mold substrate 10. Alternatively, it may be formed by excavation processing using a predetermined excavation tool or the like. Thus, the imprint mold blanks 11 having the convex structure portion 3 and the convex portion 4 protruding from the first surface 2A side and having the recess portion 6 formed on the second surface 2B side can be produced. it can.

Thus, by forming the convex portions 3 and the projections 4 in the same step, the convex portions 3 of the height T 3 and the convex portion 4 and the height T 4 can be substantially the same . Further, when the imprint mold 1 according to the present embodiment is used for forming a transfer pattern in a plurality of regions of a transfer substrate by a step-and-repeat type imprint process, Since it is necessary to be provided at a position corresponding to the scribe line of the transfer substrate, the convex portion 4 is required to have high positional accuracy. In this regard, by forming the convex structure portion 3 and the convex portion 4 in the same process, the positional deviation of the convex portion 4 is less likely to occur, and the convex portion 4 can be formed with high positional accuracy.

  The imprint mold 1 according to the present embodiment is manufactured by forming the fine concavo-convex pattern 5 on the upper surface 3A of the convex structure portion 3 of the imprint mold blanks 11 produced as described above by a conventionally known method. (FIG. 5F).

As described above, according to the imprint mold 1 according to the present embodiment, the convex portions 3 of the height T 3 is substantially the same height T 4 for having a convex portion 4, the convex portions 3 When polishing the upper surface 3A, not only the upper surface 3A of the convex structure part 3 but also the convex part 4 abuts on the polishing tool. Therefore, at the time of the polishing process, it is possible to suppress deformation of the base 2, particularly a portion where the recess 6 is formed in the base 2 (a portion thinner than other portions). As a result, when the polishing process is performed on the upper surface 3A of the convex structure portion 3 in order to regenerate the used imprint mold 1, the polishing is performed without deteriorating the flatness (flatness) of the upper surface 3A of the convex structure portion 3. can do.

  Next, a method for regenerating the imprint mold 1 and manufacturing a new imprint mold will be described. FIG. 6 is a side view schematically showing a step of polishing the upper surface of the convex structure portion of the imprint mold in the present embodiment, and FIG. 7 shows each method of manufacturing a new imprint mold in the present embodiment. It is a process flow figure showing a process with a cut end view.

  First, a convex surface structure of the imprint mold 1 is prepared by preparing a polishing surface plate 92 to which a polishing tool 91 such as a nonwoven fabric, a polishing cloth, or urethane is attached, and pressing the imprint mold 1 against the polishing tool 91. The upper surface 3A of the part 3 is brought into contact with the polishing tool 91 (see FIG. 6). At this time, the convex portion 4 is brought into contact with the polishing tool 91 together with the convex structure portion 3. Thereby, in the subsequent polishing process, deformation of the base 2 of the imprint mold 1, in particular, a portion where the recess 6 is formed in the base 2 (a portion thinner than other portions) can be suppressed. As a result, polishing can be performed without deteriorating the flatness (flatness) of the upper surface 3A of the convex structure portion 3.

  Then, by supplying the polishing slurry to the polishing tool 91, the polishing slurry is supplied between the polishing tool 91 and the upper surface 3 </ b> A of the convex structure portion 3, and the polishing surface plate 92 is relative to the convex structure portion 3. (Polishing tool 91) is rotated to polish the upper surface 3A of the convex structure 3 (see FIG. 6).

  As a polishing slurry, it can select suitably according to the material etc. which comprise the imprint mold 1, For example, the polishing slurry etc. which contain colloidal particles (colloidal silica etc.) can be used.

  The polishing amount in the polishing process is not particularly limited as long as the polishing process is such that the fine uneven pattern 5 of the imprint mold 1 can be eliminated by the polishing process and the upper surface 3A of the convex structure portion 3 can be made flat. As long as it is about the depth of the fine concavo-convex pattern 5 or more.

  The above polishing treatment is preferably performed by supplying a polishing slurry mainly composed of cerium oxide having a relatively large particle size (average particle size of about 0.3 to 3 μm) and polishing. And secondary polishing in which a polishing slurry containing colloidal silica having a relatively small particle size (average particle size of about 10 to 300 nm) is supplied and polished after the treatment. In addition, when the depth of the fine concavo-convex pattern 5 of the imprint mold 1 is about 5 nm, the primary polishing process may be omitted.

  Thus, the imprint mold substrate can be manufactured (regenerated) by polishing the upper surface 3A of the convex structure portion 3 of the imprint mold 1 and eliminating the fine uneven pattern 5.

According to the above-described method for manufacturing (reproducing) an imprint mold substrate, the convex portion 4 is provided on the first surface 2A of the imprint mold 1, and the height T 4 of the convex portion 4 is the convex structure portion. 3 is substantially the same as the height T 3 of 3. Therefore, when polishing the upper surface 3A of the convex structure portion 3, the polishing tool 91 contacts not only the convex structure portion 3 but also the convex portion 4. As a result, the deformation of the base portion 2 of the imprint mold 1 can be suppressed, and the upper surface 3A of the convex structure portion 3 can be polished without deteriorating the flatness (flatness) of the upper surface 3A of the convex structure portion 3. Therefore, an imprint mold substrate with good flatness (flatness) of the upper surface 3A of the convex structure portion 3 can be manufactured.

  After performing a predetermined cleaning process or the like on the imprint mold substrate, the hard mask layers 73 and 74 are formed on the first surface 2A of the imprint mold substrate, the upper surface 3A of the convex structure portion 3, and the convex portion 4. , 75 (see FIG. 7A). Then, a resist pattern (not shown) is formed on the hard mask layer 74 on the upper surface 3A of the convex structure portion 3, and the hard mask layer 74 is etched (dry etching) using the resist pattern as a mask to form a hard mask pattern 76. It is formed (see FIG. 7B). Thereafter, the fine uneven pattern 5 is formed by etching the upper surface 3A of the convex structure portion 3 using the hard mask pattern 76 as a mask. As a result, a new imprint mold 1 ′ can be manufactured (see FIG. 7C).

  The embodiment described above is described for facilitating understanding of the present invention, and is not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.

  In the said embodiment, although the imprint mold 1 gave the example in which the hollow part 6 was formed in the 2nd surface 2B of the base 2, the present invention is not limited to such an aspect. In addition, the recess 6 may not be formed on the second surface 2B.

  EXAMPLES Hereinafter, although an Example etc. are given and this invention is demonstrated further in detail, this invention is not limited at all by the following Example etc.

[Example 1]
As an imprint mold to be reproduced, an imprint mold 1 having the configuration shown in FIG. 1 was prepared as a test sample, except that the fine uneven pattern 5 was not provided.

Polishing processing was performed on the upper surface 3A of the convex structure portion 3 of the imprint mold 1 under the following conditions.
Polishing slurry: Polishing slurry containing colloidal silica Polishing device: Rotating and revolving polishing device Polishing pad: Suede type polishing pad Polishing amount: 1000 nm

  The flatness of the upper surface 3A of the convex structure portion 3 after the polishing treatment was measured using a non-contact three-dimensional shape measuring device (product name: NH-4N, manufactured by Mitaka Kogyo Co., Ltd.). The amount of change (the difference between the flatness of the upper surface 3A of the convex structure 3 before the polishing treatment and the flatness after the polishing treatment) was 50 nm.

[Comparative Example 1]
An imprint mold having the same configuration as in Example 1 was prepared except that the convex portion 4 was not provided, and the upper surface 3A of the convex structure portion 3 was subjected to polishing treatment in the same manner as in Example 1.

  When the flatness of the upper surface 3A of the convex structure part 3 after the polishing process is measured using a non-contact three-dimensional shape measuring device (product name: NH-4N, manufactured by Mitaka Kogyo Co., Ltd.), the flatness before and after the polishing process is measured. The amount of change in the degree (the difference between the flatness of the upper surface 3A of the convex structure part 3 before the polishing process and the flatness after the polishing process) was 300 nm.

  The flatness of the upper surface 3A of the convex structure part 3 after the polishing process of Comparative Example 1 was deteriorated more than the flatness of the upper surface 3A of the convex structure part 3 after the polishing process of Example 1. In particular, in the comparative example 1, it was grind | polished so that the corner | angular part of the outer periphery of the convex structure part 3 might become round. The flatness of the upper surface 3A of the convex structure part 3 of Comparative Example 1 was deteriorated because the imprint mold of Comparative Example 1 did not have the convex part 4, and the convex structure part 3 was pressed against the polishing tool. It is considered that the cause is that the base 2 is sometimes deformed and polished in that state. Thus, the convex structure part of the imprint mold 1 is provided by providing the convex part 4 having substantially the same height as the convex structure part 3 of the imprint mold 1 around the convex structure part 3. It is considered that the fine concavo-convex pattern 5 is lost by polishing treatment while maintaining the flatness (flatness) of 3, and can be regenerated as an imprint mold substrate.

  The present invention is useful in the field of microfabrication technology in which a nanoimprint process is performed using an imprint mold in order to form a fine uneven pattern on a semiconductor substrate or the like.

DESCRIPTION OF SYMBOLS 1,1 '... Imprint mold 2 ... Base 2A ... 1st surface 2B ... 2nd surface 3 ... Convex structure part 4 ... Convex part 5 ... Fine uneven | corrugated pattern 6 ... Indentation part

Claims (8)

  1. A base having a first surface and a second surface opposite the first surface;
    A convex structure portion and a convex portion protruding from the first surface;
    A fine concavo-convex pattern formed on the upper surface of the convex structure portion,
    The convex portion is located around the convex structure portion in a plan view from the first surface side,
    The height of the said convex part is substantially the same as the height of the said convex structure part, The imprint mold characterized by the above-mentioned.
  2. A plurality of the convex portions are provided on the first surface,
    2. The imprint mold according to claim 1, wherein each of the convex portions is provided at a position having symmetry with respect to the convex structure portion in a plan view from the first surface side. .
  3. The convex structure portion has a substantially rectangular shape in plan view,
    When a plurality of rectangular regions having the same shape as the convex structure portion are arranged in parallel in the region around the convex structure portion on the first surface, the convex portion is on any side of the rectangular region. The imprint mold according to claim 1, wherein the imprint mold is located.
  4. The convex structure portion has a substantially rectangular shape in plan view,
    The upper surface of the convex structure portion includes a plurality of small regions and a boundary region located between adjacent small regions,
    The fine concavo-convex pattern is formed in each of the plurality of small regions,
    When a plurality of rectangular regions having the same shape as the convex structure portion are arranged in parallel in the region around the convex structure portion on the first surface, the convex portion corresponds to the boundary region in the rectangular region. The imprint mold according to claim 1, wherein the imprint mold is located in a region where the imprint is performed.
  5. A recess is formed on the second surface of the base,
    The recess is formed on the second surface such that a projection region obtained by projecting the recess on the first surface side in the plan view of the base includes the convex structure.
    The imprint mold according to any one of claims 1 to 4, wherein the convex portion is provided at least on the outer side of the projection region in which the hollow portion is projected on the first surface side. .
  6. A polishing step of polishing the upper surface of the convex structure part of the imprint mold according to any one of claims 1 to 5,
    In the polishing step, with the polishing tool attached to the surface plate in contact with the upper surface of the convex structure portion and the convex portion, the surface plate is moved to the imprint mold while supplying an abrasive to the polishing tool. A method for manufacturing an imprint mold substrate, wherein the upper surface of the convex structure portion is polished by rotating it relative to the substrate.
  7.   It has a pattern formation process which forms a fine unevenness | corrugation pattern on the upper surface of the said convex structure part of the said substrate for imprint molds manufactured by the manufacturing method of the substrate for imprint molds of Claim 6. Mold manufacturing method.
  8. A base having a first surface and a second surface opposite the first surface;
    A convex structure portion and a convex portion protruding from the first surface;
    The convex portion is located around the convex structure portion in a plan view from the first surface side,
    The height of the convex portion is substantially the same as the height of the convex structure portion,
    A recess is formed on the second surface of the base,
    The recess is formed on the second surface such that a projection region obtained by projecting the recess on the first surface side in the plan view of the base includes the convex structure.
    The imprint mold blank is characterized in that the convex portion is provided at least on the outer side of the projection region where the hollow portion is projected on the first surface side.
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