JPS6440267A - Manufacture of precisely polished glass - Google Patents

Manufacture of precisely polished glass

Info

Publication number
JPS6440267A
JPS6440267A JP62197781A JP19778187A JPS6440267A JP S6440267 A JPS6440267 A JP S6440267A JP 62197781 A JP62197781 A JP 62197781A JP 19778187 A JP19778187 A JP 19778187A JP S6440267 A JPS6440267 A JP S6440267A
Authority
JP
Japan
Prior art keywords
glass
polished
surface
manufacture
abrasive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62197781A
Inventor
Yukio Shibano
Hitoshi Hasegawa
Koji Yamaga
Original Assignee
Shinetsu Chemical Co
Naoetsu Seimitsu Kako Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co, Naoetsu Seimitsu Kako Kk filed Critical Shinetsu Chemical Co
Priority to JP62197781A priority Critical patent/JPS6440267A/en
Publication of JPS6440267A publication Critical patent/JPS6440267A/en
Application status is Pending legal-status Critical

Links

Abstract

PURPOSE:To obtain a photomask glass substrate having a high resolution without surface scattered light in a short time by finishing a roughly polished glass surface by using colloidal silica. CONSTITUTION:A surface of glass such as quartz glass is polished by using an abrasive primarily composed of cerium oxide having a large polishing speed,. Then, the polished glass surface is finished by using colloidal silica to remove in a relatively short time a work-affected layer generated on the glass surface polished by the abrasive primarily composed of cerium oxide.
JP62197781A 1987-08-07 1987-08-07 Manufacture of precisely polished glass Pending JPS6440267A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62197781A JPS6440267A (en) 1987-08-07 1987-08-07 Manufacture of precisely polished glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62197781A JPS6440267A (en) 1987-08-07 1987-08-07 Manufacture of precisely polished glass

Publications (1)

Publication Number Publication Date
JPS6440267A true JPS6440267A (en) 1989-02-10

Family

ID=16380242

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62197781A Pending JPS6440267A (en) 1987-08-07 1987-08-07 Manufacture of precisely polished glass

Country Status (1)

Country Link
JP (1) JPS6440267A (en)

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5776219A (en) * 1994-09-08 1998-07-07 Nikon Corporation Method of making a piece of glass for measuring transmittance
JP2001009708A (en) * 1999-06-28 2001-01-16 Soc Europeenne De Systemes Optiques Polishing work method of silicon part surface
US6322425B1 (en) 1999-07-30 2001-11-27 Corning Incorporated Colloidal polishing of fused silica
US6951502B2 (en) 2002-03-29 2005-10-04 Hoya Corporation Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus
JP2005275388A (en) * 2004-02-25 2005-10-06 Hoya Corp Glass substrate for mask blank, its manufacturing method, method for manufacturing mask blank, and method for manufacturing exposure mask
JP2006096977A (en) * 2004-08-30 2006-04-13 Showa Denko Kk Polishing slurry, method for producing glass substrate for information recording medium and method for producing information recording medium
KR100664609B1 (en) * 2004-10-20 2007-01-04 주식회사 신안에스엔피 Method of Polishing Glass for OLED and Glass for OLED manufactured using the same
JP2007284341A (en) * 2002-08-19 2007-11-01 Hoya Corp Methods for production of glass substrate for mask blank, mask blank, transfer mask, semiconductor device, glass substrate for mask blank, and mask blank and transfer mask
US7413832B2 (en) 2002-08-19 2008-08-19 Hoya Corporation Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer mask
WO2009150938A1 (en) 2008-06-11 2009-12-17 信越化学工業株式会社 Polishing agent for synthetic quartz glass substrate
JP2009297814A (en) * 2008-06-11 2009-12-24 Shin-Etsu Chemical Co Ltd Synthetic silica glass substrate polishing agent
JP2010069609A (en) * 2008-09-22 2010-04-02 Nihon Micro Coating Co Ltd Cleaning material and manufacturing method for cleaning material
JP2010228456A (en) * 2010-05-25 2010-10-14 Dainippon Printing Co Ltd Thermal transfer image receiving sheet
US7963825B2 (en) 1997-12-18 2011-06-21 Hitachi Chemical Company, Ltd. Abrasive, method of polishing target member and process for producing semiconductor device
EP2338849A1 (en) 2009-12-28 2011-06-29 Shin-Etsu Chemical Co., Ltd. Preparation of synthetic quartz glass substrates
JP2011219358A (en) * 2004-02-25 2011-11-04 Hoya Corp Method for manufacturing glass substrate for mask blank, method for manufacturing mask blank, method for manufacturing exposure mask, method for manufacturing reflective mask blank and method for manufacturing reflective mask blank
EP2412687A1 (en) 2010-07-26 2012-02-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
US8252488B2 (en) 2008-10-23 2012-08-28 Hoya Corporation Mask blank substrate manufacturing method, and reflective mask blank manufacturing method
JP2012212082A (en) * 2011-03-31 2012-11-01 Hoya Corp Method for manufacturing glass substrate for mask blank, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
EP2594618A1 (en) 2011-11-18 2013-05-22 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
EP2623469A1 (en) 2012-02-02 2013-08-07 Shin-Etsu Chemical Co., Ltd. Manufacture of synthetic quartz glass substrate
KR20150119121A (en) 2013-06-21 2015-10-23 호야 가부시키가이샤 Mask blank substrate, mask blank, transfer mask, manufacturing methods therefor, and manufacturing method for semiconductor device
JP2015207655A (en) * 2014-04-21 2015-11-19 大日本印刷株式会社 Imprint mold, blank for imprint mold, method for manufacturing imprint mold substrate, and method for manufacturing imprint mold
KR20160105930A (en) 2014-03-26 2016-09-07 호야 가부시키가이샤 Substrate for mask blanks, mask blank, transfer mask, and production method for these
US9684232B2 (en) 2014-08-07 2017-06-20 Asahi Glass Company, Limited Glass substrate for mask blank, and method for producing the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5074969A (en) * 1973-11-02 1975-06-19
JPS5641854A (en) * 1979-07-26 1981-04-18 Pilkington Brothers Ltd Glass product surface finishing method
JPS60263666A (en) * 1984-06-08 1985-12-27 Nippon Telegr & Teleph Corp <Ntt> Polishing method of si wafer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5074969A (en) * 1973-11-02 1975-06-19
JPS5641854A (en) * 1979-07-26 1981-04-18 Pilkington Brothers Ltd Glass product surface finishing method
JPS60263666A (en) * 1984-06-08 1985-12-27 Nippon Telegr & Teleph Corp <Ntt> Polishing method of si wafer

Cited By (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5776219A (en) * 1994-09-08 1998-07-07 Nikon Corporation Method of making a piece of glass for measuring transmittance
US6129987A (en) * 1994-09-08 2000-10-10 Nikon Corporation Method of making a piece of glass for measuring transmittance
DE19533321B4 (en) * 1994-09-08 2012-06-28 Nikon Corp. An excised from a preform for an optical component and method for producing the same
US8137159B2 (en) 1997-12-18 2012-03-20 Hitachi Chemical Company, Ltd. Abrasive, method of polishing target member and process for producing semiconductor device
US8162725B2 (en) 1997-12-18 2012-04-24 Hitachi Chemical Company, Ltd. Abrasive, method of polishing target member and process for producing semiconductor device
US8616936B2 (en) 1997-12-18 2013-12-31 Hitachi Chemical Company, Ltd. Abrasive, method of polishing target member and process for producing semiconductor device
US7963825B2 (en) 1997-12-18 2011-06-21 Hitachi Chemical Company, Ltd. Abrasive, method of polishing target member and process for producing semiconductor device
JP2001009708A (en) * 1999-06-28 2001-01-16 Soc Europeenne De Systemes Optiques Polishing work method of silicon part surface
US6616718B2 (en) 1999-07-30 2003-09-09 Corning Incorporated Aqueous solution for colloidal polishing of silicate substrates
US6322425B1 (en) 1999-07-30 2001-11-27 Corning Incorporated Colloidal polishing of fused silica
US7455785B2 (en) 2002-03-29 2008-11-25 Hoya Corporation Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus
US6951502B2 (en) 2002-03-29 2005-10-04 Hoya Corporation Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus
JP2007284341A (en) * 2002-08-19 2007-11-01 Hoya Corp Methods for production of glass substrate for mask blank, mask blank, transfer mask, semiconductor device, glass substrate for mask blank, and mask blank and transfer mask
US7413832B2 (en) 2002-08-19 2008-08-19 Hoya Corporation Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer mask
US7732101B2 (en) 2002-08-19 2010-06-08 Hoya Corporation Method of producing a glass substrate for a mask blank by polishing with an alkaline polishing liquid that contains colloidal silica abrasive grains
JP2005275388A (en) * 2004-02-25 2005-10-06 Hoya Corp Glass substrate for mask blank, its manufacturing method, method for manufacturing mask blank, and method for manufacturing exposure mask
JP2011219358A (en) * 2004-02-25 2011-11-04 Hoya Corp Method for manufacturing glass substrate for mask blank, method for manufacturing mask blank, method for manufacturing exposure mask, method for manufacturing reflective mask blank and method for manufacturing reflective mask blank
JP2006096977A (en) * 2004-08-30 2006-04-13 Showa Denko Kk Polishing slurry, method for producing glass substrate for information recording medium and method for producing information recording medium
KR100664609B1 (en) * 2004-10-20 2007-01-04 주식회사 신안에스엔피 Method of Polishing Glass for OLED and Glass for OLED manufactured using the same
US9919962B2 (en) 2008-06-11 2018-03-20 Shin-Etsu Chemical Co., Ltd. Polishing agent for synthetic quartz glass substrate
JP2009297814A (en) * 2008-06-11 2009-12-24 Shin-Etsu Chemical Co Ltd Synthetic silica glass substrate polishing agent
WO2009150938A1 (en) 2008-06-11 2009-12-17 信越化学工業株式会社 Polishing agent for synthetic quartz glass substrate
JP2010069609A (en) * 2008-09-22 2010-04-02 Nihon Micro Coating Co Ltd Cleaning material and manufacturing method for cleaning material
US8252488B2 (en) 2008-10-23 2012-08-28 Hoya Corporation Mask blank substrate manufacturing method, and reflective mask blank manufacturing method
US8500517B2 (en) 2009-12-28 2013-08-06 Shin-Etsu Chemical Co., Ltd. Preparation of synthetic quartz glass substrates
CN102179731A (en) * 2009-12-28 2011-09-14 信越化学工业株式会社 Preparation of synthetic quartz glass substrates
EP2338849A1 (en) 2009-12-28 2011-06-29 Shin-Etsu Chemical Co., Ltd. Preparation of synthetic quartz glass substrates
CN102179731B (en) * 2009-12-28 2014-11-05 信越化学工业株式会社 Preparation of synthetic quartz glass substrates
JP2010228456A (en) * 2010-05-25 2010-10-14 Dainippon Printing Co Ltd Thermal transfer image receiving sheet
EP2412687A1 (en) 2010-07-26 2012-02-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
KR20120010968A (en) 2010-07-26 2012-02-06 신에쓰 가가꾸 고교 가부시끼가이샤 Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
JP2012212082A (en) * 2011-03-31 2012-11-01 Hoya Corp Method for manufacturing glass substrate for mask blank, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
EP2594618A1 (en) 2011-11-18 2013-05-22 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
US9963634B2 (en) 2011-11-18 2018-05-08 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
US9616542B2 (en) 2012-02-02 2017-04-11 Shin-Etsu Chemical Co., Ltd. Manufacture of synthetic quartz glass substrate
EP2623469A1 (en) 2012-02-02 2013-08-07 Shin-Etsu Chemical Co., Ltd. Manufacture of synthetic quartz glass substrate
KR20160021899A (en) 2013-06-21 2016-02-26 호야 가부시키가이샤 Mask blank substrate, mask blank, transfer mask, manufacturing methods therefor, and manufacturing method for semiconductor device
US10168613B2 (en) 2013-06-21 2019-01-01 Hoya Corporation Mask blank substrate, mask blank, transfer mask, and method of manufacturing semiconductor device
US9690189B2 (en) 2013-06-21 2017-06-27 Hoya Corporation Mask blank substrate, mask blank, transfer mask, and method of manufacturing semiconductor device
KR20150119121A (en) 2013-06-21 2015-10-23 호야 가부시키가이샤 Mask blank substrate, mask blank, transfer mask, manufacturing methods therefor, and manufacturing method for semiconductor device
KR20160105930A (en) 2014-03-26 2016-09-07 호야 가부시키가이샤 Substrate for mask blanks, mask blank, transfer mask, and production method for these
US9778209B2 (en) 2014-03-26 2017-10-03 Hoya Corporation Substrate for mask blanks, mask blank, transfer mask, and method of manufacturing them
JP2015207655A (en) * 2014-04-21 2015-11-19 大日本印刷株式会社 Imprint mold, blank for imprint mold, method for manufacturing imprint mold substrate, and method for manufacturing imprint mold
US9684232B2 (en) 2014-08-07 2017-06-20 Asahi Glass Company, Limited Glass substrate for mask blank, and method for producing the same

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