JP6447553B2 - プローバ - Google Patents
プローバ Download PDFInfo
- Publication number
- JP6447553B2 JP6447553B2 JP2016055901A JP2016055901A JP6447553B2 JP 6447553 B2 JP6447553 B2 JP 6447553B2 JP 2016055901 A JP2016055901 A JP 2016055901A JP 2016055901 A JP2016055901 A JP 2016055901A JP 6447553 B2 JP6447553 B2 JP 6447553B2
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- probe card
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- 239000000523 sample Substances 0.000 claims description 164
- 230000007246 mechanism Effects 0.000 claims description 138
- 238000005259 measurement Methods 0.000 claims description 132
- 238000012360 testing method Methods 0.000 claims description 114
- 238000012423 maintenance Methods 0.000 claims description 82
- 238000012546 transfer Methods 0.000 claims description 36
- 238000007689 inspection Methods 0.000 claims description 29
- 230000007613 environmental effect Effects 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 10
- 235000012431 wafers Nutrition 0.000 description 100
- 230000032258 transport Effects 0.000 description 96
- 239000007789 gas Substances 0.000 description 16
- 238000002347 injection Methods 0.000 description 9
- 239000007924 injection Substances 0.000 description 9
- 230000003028 elevating effect Effects 0.000 description 7
- 230000007723 transport mechanism Effects 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 210000000078 claw Anatomy 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
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- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2868—Complete testing stations; systems; procedures; software aspects
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2893—Handling, conveying or loading, e.g. belts, boats, vacuum fingers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2887—Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Environmental & Geological Engineering (AREA)
- Automation & Control Theory (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
に沿ってY軸方向にスライド移動して開口14bを介してメンテナンスエリアA2側に引き出される(図12(b)参照)。これにより、テストヘッド44のメンテナンス(例えば、テストヘッド内部の基板交換等)が可能となる。
まず、搬送ユニット16がウエハWをウエハ収納部12aから検査(例えば、高温検査又は低温検査)が実施される測定部14内に搬送する場合の動作例について説明する。
次に、搬送ユニット16がプローブカードPCをプローブカード収納部12bから検査(例えば、高温検査又は低温検査)が実施される測定部14内に搬送する場合の動作例について説明する。
次に、テストヘッド44をメンテナンスエリアA2側に引き出す場合の動作例について説明する。
次に、ポゴフレーム46をメンテナンスエリアA2側に引き出す場合の動作例について説明する。
Claims (7)
- 搬送エリアとメンテナンスエリアとの間に配置された複数の測定部であって、ウエハ上に形成された半導体素子の検査の際に用いられる被メンテナンス装置と、前記被メンテナンス装置を前記メンテナンスエリア側に引き出す引出機構と、を備えた複数の測定部と、
搬送物を搬送先の測定部内に搬送する搬送ユニットと、
前記メンテナンスエリア側から前記測定部に前記搬送物を装填する装填部と、
を備え、
前記測定部は、前記搬送エリア側及び前記メンテナンスエリア側から前記搬送物が装填されることが可能であるプローバ。 - 前記搬送ユニットは、前記搬送物が前記半導体素子の検査用である場合には前記搬送物を前記測定部へ装填し、
前記装填部は、前記搬送物が前記測定部の位置の校正に用いられる場合には前記搬送物を前記測定部へ装填する請求項1に記載のプローバ。 - 前記搬送ユニットは、前記搬送物が環境の制御が必要な場合には前記搬送物を前記測定部へ装填し、
前記装填部は、前記搬送物が環境の制御が必要でない場合には前記搬送物を前記測定部へ装填する請求項1又は2に記載のプローバ。 - 前記装填部が前記測定部に装填する前記搬送物は、校正用プローブカードである請求項1から3のいずれか1項に記載のプローバ。
- 前記搬送ユニットが前記測定部に装填する前記搬送物は、測定用プローブカードである請求項1から4のいずれか1項に記載のプローバ。
- 前記被メンテナンス装置の引出方向と前記搬送物の搬送方向とが一直線状であり、
前記被メンテナンス装置はテストヘッドである、
請求項1から5のいずれか1項に記載のプローバ。 - 前記被メンテナンス装置の引出方向と前記搬送物の搬送方向とが一直線状であり、
前記被メンテナンス装置はテストヘッドとプローブカードとの間に配置されるポゴフレームである、
請求項1から5のいずれか1項に記載のプローバ。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016055901A JP6447553B2 (ja) | 2016-03-18 | 2016-03-18 | プローバ |
PCT/JP2016/060790 WO2017158852A1 (ja) | 2016-03-18 | 2016-03-31 | プローバ |
US16/132,278 US10510574B2 (en) | 2016-03-18 | 2018-09-14 | Prober |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016055901A JP6447553B2 (ja) | 2016-03-18 | 2016-03-18 | プローバ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017174852A JP2017174852A (ja) | 2017-09-28 |
JP6447553B2 true JP6447553B2 (ja) | 2019-01-09 |
Family
ID=59852121
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016055901A Active JP6447553B2 (ja) | 2016-03-18 | 2016-03-18 | プローバ |
Country Status (3)
Country | Link |
---|---|
US (1) | US10510574B2 (ja) |
JP (1) | JP6447553B2 (ja) |
WO (1) | WO2017158852A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7762822B2 (en) | 2005-04-27 | 2010-07-27 | Aehr Test Systems | Apparatus for testing electronic devices |
US7800382B2 (en) | 2007-12-19 | 2010-09-21 | AEHR Test Ststems | System for testing an integrated circuit of a device and its method of use |
US8030957B2 (en) | 2009-03-25 | 2011-10-04 | Aehr Test Systems | System for testing an integrated circuit of a device and its method of use |
US10466292B2 (en) | 2016-01-08 | 2019-11-05 | Aehr Test Systems | Method and system for thermal control of devices in an electronics tester |
CN110383092B (zh) * | 2017-03-03 | 2022-04-01 | 雅赫测试系统公司 | 电子测试器 |
US11194259B2 (en) * | 2018-08-30 | 2021-12-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Equipment module with enhanced protection from airborne contaminants, and method of operation |
JP7390934B2 (ja) | 2020-03-03 | 2023-12-04 | 東京エレクトロン株式会社 | 検査装置 |
EP4226165A1 (en) | 2020-10-07 | 2023-08-16 | AEHR Test Systems | Electronics tester |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0732175B2 (ja) | 1988-02-12 | 1995-04-10 | 東京エレクトロン株式会社 | プローブカード自動交換機能付プローブ装置 |
JPH0758168A (ja) | 1993-08-19 | 1995-03-03 | Tokyo Electron Ltd | プローブ装置 |
US5912555A (en) | 1995-04-10 | 1999-06-15 | Tokyo Electron Limited | Probe apparatus |
JP3326751B2 (ja) | 1995-04-10 | 2002-09-24 | 東京エレクトロン株式会社 | テストヘッドの移動方法及び装置並びにプローブ装置 |
JP2000124274A (ja) | 1998-10-21 | 2000-04-28 | Tokyo Seimitsu Co Ltd | プローバ |
JP2000150596A (ja) | 1998-11-10 | 2000-05-30 | Tokyo Seimitsu Co Ltd | プローバ |
JP2002158266A (ja) | 2000-11-20 | 2002-05-31 | Seiko Epson Corp | 半導体測定装置 |
JP2009277773A (ja) | 2008-05-13 | 2009-11-26 | Micronics Japan Co Ltd | プロービング装置 |
JP5343488B2 (ja) | 2008-09-26 | 2013-11-13 | 東京エレクトロン株式会社 | プローブ装置 |
JP2011035724A (ja) * | 2009-08-03 | 2011-02-17 | Canon Inc | 情報処理装置、データ処理方法およびプログラム |
WO2011016096A1 (ja) * | 2009-08-07 | 2011-02-10 | 株式会社アドバンテスト | 試験装置および試験方法 |
JP5664938B2 (ja) | 2013-02-01 | 2015-02-04 | 株式会社東京精密 | プローバ及びプローブ検査方法 |
JP2014179379A (ja) * | 2013-03-13 | 2014-09-25 | Tokyo Electron Ltd | ウエハ検査装置及び該装置の整備方法 |
JP6271257B2 (ja) | 2014-01-08 | 2018-01-31 | 東京エレクトロン株式会社 | 基板検査装置及びプローブカード搬送方法 |
US9577770B2 (en) * | 2015-05-08 | 2017-02-21 | APS Soutions GmbH | Method for analyzing the RF performance of a probe card, detector assembly and system for analyzing the RF performance of a probe card |
-
2016
- 2016-03-18 JP JP2016055901A patent/JP6447553B2/ja active Active
- 2016-03-31 WO PCT/JP2016/060790 patent/WO2017158852A1/ja active Application Filing
-
2018
- 2018-09-14 US US16/132,278 patent/US10510574B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
WO2017158852A1 (ja) | 2017-09-21 |
JP2017174852A (ja) | 2017-09-28 |
US10510574B2 (en) | 2019-12-17 |
US20190019711A1 (en) | 2019-01-17 |
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