JP6445792B2 - インプリント装置及び物品の製造方法 - Google Patents

インプリント装置及び物品の製造方法 Download PDF

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JP6445792B2
JP6445792B2 JP2014122741A JP2014122741A JP6445792B2 JP 6445792 B2 JP6445792 B2 JP 6445792B2 JP 2014122741 A JP2014122741 A JP 2014122741A JP 2014122741 A JP2014122741 A JP 2014122741A JP 6445792 B2 JP6445792 B2 JP 6445792B2
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substrate
measurement
mold
alignment
substrate stage
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JP2016002668A5 (cg-RX-API-DMAC7.html
JP2016002668A (ja
Inventor
岩永　武彦
武彦 岩永
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Canon Inc
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Canon Inc
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JP2014122741A 2014-06-13 2014-06-13 インプリント装置及び物品の製造方法 Active JP6445792B2 (ja)

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JP2014122741A JP6445792B2 (ja) 2014-06-13 2014-06-13 インプリント装置及び物品の製造方法

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JP2014122741A JP6445792B2 (ja) 2014-06-13 2014-06-13 インプリント装置及び物品の製造方法

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JP2016002668A JP2016002668A (ja) 2016-01-12
JP2016002668A5 JP2016002668A5 (cg-RX-API-DMAC7.html) 2017-07-06
JP6445792B2 true JP6445792B2 (ja) 2018-12-26

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6818522B2 (ja) * 2016-11-17 2021-01-20 キヤノン株式会社 インプリント装置、および物品製造方法
JP6818523B2 (ja) * 2016-11-17 2021-01-20 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6716484B2 (ja) * 2017-03-14 2020-07-01 キオクシア株式会社 インプリント方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI574305B (zh) * 2006-01-19 2017-03-11 尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法
KR20100102580A (ko) * 2007-12-17 2010-09-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JP5284212B2 (ja) * 2009-07-29 2013-09-11 株式会社東芝 半導体装置の製造方法
JP6018405B2 (ja) * 2012-04-25 2016-11-02 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法

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