JP6438935B2 - 電気外科デバイス用のZrO2を含んでなるコーティング系、コーティング系を有する医療用デバイス、及び医療用デバイスをコーティングする方法 - Google Patents
電気外科デバイス用のZrO2を含んでなるコーティング系、コーティング系を有する医療用デバイス、及び医療用デバイスをコーティングする方法 Download PDFInfo
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- 239000011248 coating agent Substances 0.000 title claims description 45
- 238000000576 coating method Methods 0.000 title claims description 45
- 238000000034 method Methods 0.000 title claims description 22
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 title claims description 10
- 238000005240 physical vapour deposition Methods 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 9
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 230000015556 catabolic process Effects 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 4
- 238000000168 high power impulse magnetron sputter deposition Methods 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 claims description 3
- 239000012768 molten material Substances 0.000 claims description 2
- 238000002679 ablation Methods 0.000 claims 1
- 238000002271 resection Methods 0.000 claims 1
- 238000005516 engineering process Methods 0.000 description 6
- 230000015271 coagulation Effects 0.000 description 3
- 238000005345 coagulation Methods 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 3
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000000740 bleeding effect Effects 0.000 description 2
- 239000008280 blood Substances 0.000 description 2
- 210000004369 blood Anatomy 0.000 description 2
- 239000012636 effector Substances 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 238000001356 surgical procedure Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000002266 amputation Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000017531 blood circulation Effects 0.000 description 1
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- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000002439 hemostatic effect Effects 0.000 description 1
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- 238000007733 ion plating Methods 0.000 description 1
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- 210000005036 nerve Anatomy 0.000 description 1
- 230000000399 orthopedic effect Effects 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
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- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000002792 vascular Effects 0.000 description 1
Classifications
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- A61B18/14—Probes or electrodes therefor
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
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Description
電気外科器具は、器具の構造の種類次第で、
− 第2の単極電極の少なくとも一部分において、または
− 誘電体コーティングが、電気的に活性な電極の少なくとも1つとの直接的な組織接触を防ぐことができる、第1および第2の単極電極の少なくとも1つにおいて、または
− 組織への二極式エネルギーの適用の間、その上の表面電荷の形成を低下させるため、ステープルカートリッジの少なくとも1つのステープルにおいて、
配置することができる非伝導性および誘電体コーティングを含んでなる。特許文献2による非伝導性または誘電体コーティングは、限定されないが、ポリテトラフルオロエチレン(PTFE)、二酸化チタン、あるいはパラキシレンまたはエポキシをベースとするポリマーであることができる。
Claims (15)
- 医療装置あるいは電気外科デバイスの一部分である導電性基板の表面上に析出された電気絶縁特性を有するコーティング系において、
ジルコニウムからなる液滴を含む少なくとも1つの二酸化ジルコニウム層(ZrO2層)を備えて構成され、前記液滴は、適切に蒸発しなかった、したがってZrO 2 を形成するための反応性酸素と適切に反応しなかったターゲットからの溶融材料であり、
前記少なくとも1つの二酸化ジルコニウム層は前記導電性基板の表面を非導電性にすることを特徴とする、コーティング系。 - 前記ZrO2層が、18.4の比誘電率、および/または0.60kVの高電圧ブレークダウン、および/または20mAの降伏電流を示すことを特徴とする、請求項1に記載のコーティング系。
- 前記二酸化ジルコニウム層の厚さが、少なくとも3μm、もしくは、少なくとも4μmまたは5μmであることを特徴とする、請求項2に記載のコーティング系。
- 前記コーティング系が、少なくとも1つの窒化ジルコニウム層を含んでなることを特徴とする、請求項1〜3のいずれか一項に記載のコーティング系。
- 前記窒化ジルコニウム層が、中間層および/または支持層として、前記基板と前記二酸化ジルコニウム層との間で析出されることを特徴とする、請求項4に記載のコーティング系。
- 請求項2に記載のコーティング系を有する医療用デバイスであって、ブレードまたはカッターまたは融除材または単極式電気外科器具または二極式電気外科器具である医療用デバイス。
- 電極、もしくは、金属製のワイヤーと、前記ワイヤーに取り付けられた少なくとも端部とから形成される電極を含み、前記電極が、患者の組織と接触する接触面を提供し、かつ前記コーティング系が前記電極の表面の少なくとも一部分上に析出され、コーティングされた電極表面の導電率が低下し、結果的に前記電極接触面の熱エネルギーも低下して、前記組織の損傷を回避することを特徴とする、請求項6に記載の医療用デバイス。
- 患者の体または前記医療用デバイスの操作者の体と接触する可能性のある電極の表面を含み、かつ前記コーティング系が、前記患者または前記操作者の感電を回避するために、少なくともこの表面の一部分上に析出されることを特徴とする、請求項6に記載の医療用デバイス。
- 前記コーティング系が、操作の間の前記医療用デバイスの短絡を回避するために、前記医療装置の表面で適用されることを特徴とする、請求項6に記載の医療用デバイス。
- 組織の切断のため、および/または閉塞の切除のために使用されることを特徴とする、請求項6に記載の医療用デバイス。
- 少なくとも前記二酸化ジルコニウム層が、物理蒸着技術によって析出されることを特徴とする、請求項6〜10のいずれか一項に記載の医療用デバイスをコーティングする方法。
- 前記物理蒸着技術がアークPVD技術であることを特徴とする、請求項11に記載の方法。
- 前記物理蒸着技術が、ハイパワーインパルスマグネトロンスパッタリング技術の使用を含むことを特徴とする、請求項11に記載の方法。
- 前記二酸化ジルコニウム層が、酸素含有雰囲気での、主にジルコニウムからなるターゲットのアーク蒸発によって析出されることを特徴とする、請求項11に記載の方法。
- 少なくとも前記二酸化ジルコニウム層の析出の間、パルスバイアス電圧が、表面がコーティングされる基板に印加されることを特徴とする、請求項11に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102013006598.4 | 2013-04-17 | ||
DE201310006598 DE102013006598A1 (de) | 2013-04-17 | 2013-04-17 | Beschichtungssystem mit ZrO₂ für elektrochirurgische Geräte |
PCT/EP2014/001003 WO2014170011A1 (en) | 2013-04-17 | 2014-04-15 | Coating system comprising zro2 for electrosurgical devices |
Publications (3)
Publication Number | Publication Date |
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JP2016522321A JP2016522321A (ja) | 2016-07-28 |
JP2016522321A5 JP2016522321A5 (ja) | 2017-06-08 |
JP6438935B2 true JP6438935B2 (ja) | 2018-12-19 |
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JP2016508037A Active JP6438935B2 (ja) | 2013-04-17 | 2014-04-15 | 電気外科デバイス用のZrO2を含んでなるコーティング系、コーティング系を有する医療用デバイス、及び医療用デバイスをコーティングする方法 |
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EP (1) | EP2999806B1 (ja) |
JP (1) | JP6438935B2 (ja) |
KR (1) | KR102277499B1 (ja) |
CN (1) | CN105164304B (ja) |
DE (1) | DE102013006598A1 (ja) |
WO (1) | WO2014170011A1 (ja) |
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CN104928624B (zh) * | 2015-03-20 | 2018-04-10 | 刘姒 | 一种金属托槽表面构筑纳米二氧化锆涂层的方法 |
DE102015212389A1 (de) * | 2015-07-02 | 2017-01-05 | Aesculap Ag | Beschichtung für Applikatoren in der Elektrochirurgie |
USD896378S1 (en) | 2016-12-22 | 2020-09-15 | Integra Lifesciences Corporation | Bipolar forceps |
CN109350236A (zh) * | 2018-11-26 | 2019-02-19 | 杭州欧创医疗器械有限公司 | 一种电凝切剪及其钳头、钳头加工工艺 |
CN113645917A (zh) * | 2019-03-29 | 2021-11-12 | 康曼德公司 | 高介电常数电外科电极涂层 |
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US5391166A (en) | 1991-06-07 | 1995-02-21 | Hemostatic Surgery Corporation | Bi-polar electrosurgical endoscopic instruments having a detachable working end |
US5324289A (en) | 1991-06-07 | 1994-06-28 | Hemostatic Surgery Corporation | Hemostatic bi-polar electrosurgical cutting apparatus and methods of use |
DE4212053C1 (de) * | 1992-04-10 | 1996-01-11 | Erbe Elektromedizin | Chirurgisches Instrument |
US5300068A (en) | 1992-04-21 | 1994-04-05 | St. Jude Medical, Inc. | Electrosurgical apparatus |
US5356408A (en) * | 1993-07-16 | 1994-10-18 | Everest Medical Corporation | Bipolar electrosurgical scissors having nonlinear blades |
US6330750B1 (en) * | 1996-01-11 | 2001-12-18 | Molecular Metallurgy, Inc. | Scapel blade having high sharpness and toughness |
US20030130653A1 (en) * | 1997-09-30 | 2003-07-10 | Scimed Life Systems, Inc. | Electrosurgical tissue removal with a selectively insulated electrode |
US6533781B2 (en) * | 1997-12-23 | 2003-03-18 | Team Medical Llc | Electrosurgical instrument |
AU4821699A (en) * | 1998-06-10 | 2000-04-03 | Advanced Bypass Technologies, Inc. | Aortic aneurysm treatment systems |
WO2005122935A1 (ja) * | 2004-06-18 | 2005-12-29 | Olympus Corporation | 生体組織切断用器具 |
US7780663B2 (en) | 2006-09-22 | 2010-08-24 | Ethicon Endo-Surgery, Inc. | End effector coatings for electrosurgical instruments |
SE533395C2 (sv) * | 2007-06-08 | 2010-09-14 | Sandvik Intellectual Property | Sätt att göra PVD-beläggningar |
US20100036370A1 (en) * | 2008-08-07 | 2010-02-11 | Al Mirel | Electrosurgical instrument jaw structure with cutting tip |
KR101073431B1 (ko) * | 2008-12-08 | 2011-10-17 | 한국전자통신연구원 | Rf기반 선택적 기능성 생체 이식형 뇌자극 전극 및 그 제작 방법 |
DE202012008484U1 (de) * | 2012-09-05 | 2012-09-24 | Precision Machinery Research & Development Center | Ein nichthaftendes Instrument für die Elektrochirurgie |
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- 2014-04-15 CN CN201480021699.8A patent/CN105164304B/zh active Active
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KR102277499B1 (ko) | 2021-07-15 |
KR20150143782A (ko) | 2015-12-23 |
DE102013006598A1 (de) | 2014-10-23 |
JP2016522321A (ja) | 2016-07-28 |
CN105164304B (zh) | 2019-01-11 |
EP2999806A1 (en) | 2016-03-30 |
US9974598B2 (en) | 2018-05-22 |
EP2999806B1 (en) | 2020-11-18 |
CN105164304A (zh) | 2015-12-16 |
WO2014170011A1 (en) | 2014-10-23 |
US20160074094A1 (en) | 2016-03-17 |
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