JP6422317B2 - Small manufacturing equipment - Google Patents

Small manufacturing equipment Download PDF

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JP6422317B2
JP6422317B2 JP2014243651A JP2014243651A JP6422317B2 JP 6422317 B2 JP6422317 B2 JP 6422317B2 JP 2014243651 A JP2014243651 A JP 2014243651A JP 2014243651 A JP2014243651 A JP 2014243651A JP 6422317 B2 JP6422317 B2 JP 6422317B2
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container
manufacturing apparatus
semiconductor manufacturing
tray
transport
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JP2016111032A (en
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史朗 原
史朗 原
仁 前川
仁 前川
孝弘 福田
孝弘 福田
博幸 西原
博幸 西原
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DESIGN NETWORK CO., LTD.
National Institute of Advanced Industrial Science and Technology AIST
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DESIGN NETWORK CO., LTD.
National Institute of Advanced Industrial Science and Technology AIST
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Description

本発明は、特に、直径が20mm以下の小口径の半導体ウェハを製造するための半導体製造装置などの小型製造装置に関するものである。   The present invention particularly relates to a small-sized manufacturing apparatus such as a semiconductor manufacturing apparatus for manufacturing a small-diameter semiconductor wafer having a diameter of 20 mm or less.

従来、半導体製造技術では、ウェハの大口径化によって、チップ製造単価の低減が図られてきた。このため、一連の製造プロセスで使用される半導体製造装置は巨大化、高価格化の一途をたどり、製造工場の規模や建設・運営コストを肥大化させることとなった。このような大規模製造システムは、少品種大量生産ではチップの製造単価低減に寄与するが、少量多品種生産の要請に応えにくく、市場状況に応じた生産量の調整を困難にするとともに、中小企業の参入を困難にする。   Conventionally, in the semiconductor manufacturing technology, the chip manufacturing unit cost has been reduced by increasing the diameter of the wafer. For this reason, the semiconductor manufacturing equipment used in a series of manufacturing processes has become larger and more expensive, and the scale of the manufacturing factory and the construction and operation costs have been enlarged. Such a large-scale manufacturing system contributes to a reduction in the unit cost of chip production in small-quantity mass production, but it is difficult to meet the demand for small-quantity, high-variety production, making it difficult to adjust the production volume according to market conditions, Make it difficult for companies to enter.

これらの問題を解決するためには、小口径(例えば、直径20mm以下)の半導体ウェハを用いて低コストで半導体チップを製造できる小型の半導体製造装置が望まれる。このような小型の半導体製造装置を用いて生産ラインを構築する場合には、床面上に複数の半導体製造装置を一直線上に並設し、半導体ウェハに対する一連の製造プロセスにおいては、これら複数の半導体製造装置間で、半導体ウェハをウェハ搬送容器に収容した状態で搬送することになる(例えば、特許文献1、2参照)。   In order to solve these problems, a small semiconductor manufacturing apparatus that can manufacture a semiconductor chip at low cost using a semiconductor wafer having a small diameter (for example, a diameter of 20 mm or less) is desired. When building a production line using such a small semiconductor manufacturing apparatus, a plurality of semiconductor manufacturing apparatuses are arranged in a straight line on the floor, and in a series of manufacturing processes for semiconductor wafers, A semiconductor wafer is transferred between semiconductor manufacturing apparatuses in a state of being accommodated in a wafer transfer container (for example, see Patent Documents 1 and 2).

このような複数の半導体製造装置からなる生産ラインにおいて、半導体ウェハに対する一連の製造プロセスを効率よく進めるためには、複数の半導体製造装置間でウェハ搬送容器を自動的に搬送することが必要になる。   In such a production line composed of a plurality of semiconductor manufacturing apparatuses, in order to efficiently advance a series of manufacturing processes for semiconductor wafers, it is necessary to automatically transfer a wafer transfer container between the plurality of semiconductor manufacturing apparatuses. .

特開2014−110358号公報JP 2014-110358 A 特開2014−110359号公報JP 2014-110359 A

しかしながら、半導体製造装置を設置する床面が波打っている場合には、半導体製造装置間で3方向(X方向、Y方向、Z方向)に若干の位置ずれが発生し、ウェハ搬送容器の自動搬送を円滑に実行できなくなる恐れがある。なお、X方向は半導体製造装置の筐体の幅方向(左右方向)、Y方向は半導体製造装置の筐体の奥行き方向(前後方向)、Z方向は半導体製造装置の筐体の高さ方向(上下方向)を指す。   However, when the floor surface on which the semiconductor manufacturing apparatus is installed is wavy, a slight positional deviation occurs in the three directions (X direction, Y direction, Z direction) between the semiconductor manufacturing apparatuses, and the wafer transfer container is automatically There is a risk that the transfer cannot be performed smoothly. The X direction is the width direction (left-right direction) of the housing of the semiconductor manufacturing apparatus, the Y direction is the depth direction (front-back direction) of the housing of the semiconductor manufacturing apparatus, and the Z direction is the height direction of the housing of the semiconductor manufacturing apparatus ( (Vertical direction).

本発明は、このような事情に鑑み、複数の半導体製造装置からなる生産ラインにおいて、これらの半導体製造装置間で位置ずれがあっても、これらの半導体製造装置間でウェハ搬送容器の自動搬送を円滑に実行することが可能な技術を提供することを目的とする。   In view of such circumstances, the present invention enables automatic transfer of wafer transfer containers between these semiconductor manufacturing apparatuses even if there is a positional shift between these semiconductor manufacturing apparatuses in a production line composed of a plurality of semiconductor manufacturing apparatuses. It aims at providing the technique which can be performed smoothly.

かかる目的を達成するため、請求項1に記載の発明は、処理室および装置前室が筐体の内部に配設され、前記筐体に凹部が形成され、この凹部に、処理基板が収容された基板搬送容器を載置するための容器載置台が設けられ、前記処理基板を処理する際には、この処理基板が、前記容器載置台から搬入されて前記装置前室を経て前記処理室に搬送され、この処理室で処理された後、この処理室から前記装置前室を経て前記容器載置台に戻されて搬出される小型製造装置であって、前記凹部には、前記基板搬送容器を一時的に保持する仮置きトレイと、この仮置きトレイと前記容器載置台との間で前記基板搬送容器を搬送する容器搬送手段とが設けられ、前記容器搬送手段は、前記小型製造装置が複数並設されたときに、任意の小型製造装置の前記容器載置台と当該小型製造装置に隣接する小型製造装置の前記仮置きトレイとの間で前記基板搬送容器を搬送しうるように構成され、前記容器搬送手段によって前記基板搬送容器が前記仮置きトレイに載置されるときに、当該基板搬送容器を当該仮置きトレイ上の基準位置に位置決めする位置決め機構が組み込まれている小型製造装置としたことを特徴とする。 In order to achieve such an object, according to the invention described in claim 1, the processing chamber and the front chamber of the apparatus are disposed inside the casing, and a concave portion is formed in the casing, and the processing substrate is accommodated in the concave portion. When the processing substrate is processed, the processing substrate is transferred from the container mounting table to the processing chamber through the front chamber of the apparatus. A small manufacturing apparatus that is transported and processed in the processing chamber, and then returned from the processing chamber to the container mounting table through the front chamber of the apparatus, and is carried out in the recess. Temporary holding trays that are temporarily held, and container transfer means for transferring the substrate transfer container between the temporary setting tray and the container mounting table are provided, and the container transfer means includes a plurality of the small manufacturing apparatuses. When juxtaposed, any small manufacturing equipment The substrate transport container can be transported between the container mounting table and the temporary storage tray of the small manufacturing apparatus adjacent to the small manufacturing apparatus, and the temporary transport container is placed by the container transport means. A small-sized manufacturing apparatus incorporating a positioning mechanism for positioning the substrate transport container at a reference position on the temporary storage tray when placed on the tray is provided.

また、請求項2に記載の発明は、請求項1に記載の構成に加え、前記位置決め機構は、前記基板搬送容器が、前記筐体の幅方向であるX方向における前記仮置きトレイ上の基準位置に位置決めされたか否かを検出するX方向停止スイッチと、このX方向停止スイッチによって前記基板搬送容器がX方向における前記仮置きトレイ上の基準位置に位置決めされたと検出された場合に、その旨の信号を送信する送信機と、前記基板搬送容器がX方向における前記仮置きトレイ上の基準位置に位置決めされた旨の信号を受信する受信機と、この受信機からの信号に基づいて前記容器搬送手段による前記基板搬送容器の搬送動作を停止させる停止制御装置とからなるX方向位置決め機構を含んでいることを特徴とする。   According to a second aspect of the present invention, in addition to the configuration according to the first aspect, the positioning mechanism is configured such that the substrate transport container is a reference on the temporary placement tray in the X direction that is the width direction of the housing. An X-direction stop switch for detecting whether or not the substrate transport container is positioned at a position, and when it is detected by the X-direction stop switch that the substrate transport container is positioned at a reference position on the temporary storage tray in the X direction. A transmitter for transmitting a signal of the above, a receiver for receiving a signal indicating that the substrate transport container is positioned at a reference position on the temporary storage tray in the X direction, and the container based on the signal from the receiver An X-direction positioning mechanism including a stop control device for stopping the transfer operation of the substrate transfer container by the transfer means is included.

また、請求項3に記載の発明は、請求項1または2に記載の構成に加え、前記容器搬送手段は、前記筐体に対してX方向に移動自在に取り付けられた搬送アームと、この搬送アームをX方向に駆動するアーム駆動装置と、前記搬送アームに対してX方向に移動自在に取り付けられ、前記基板搬送容器を着脱自在に把持する容器把持部材とを有することを特徴とする。   According to a third aspect of the present invention, in addition to the configuration according to the first or second aspect, the container transport means includes a transport arm that is movably attached to the housing in the X direction, and the transport arm. An arm driving device that drives the arm in the X direction; and a container gripping member that is movably attached to the transport arm in the X direction and that detachably grips the substrate transport container.

また、請求項4に記載の発明は、請求項3に記載の構成に加え、前記容器把持部材は、前記搬送アームのX方向の移動に連動してX方向に移動するように構成され、前記搬送アームと前記容器把持部材との間には、当該搬送アームのX方向の移動を増速して当該容器把持部材に伝える増速機構が設けられていることを特徴とする。   In addition to the configuration according to claim 3, the invention according to claim 4 is configured such that the container gripping member moves in the X direction in conjunction with movement of the transfer arm in the X direction. A speed increasing mechanism is provided between the transfer arm and the container gripping member to increase the movement of the transport arm in the X direction and transmit the movement to the container gripping member.

また、請求項5に記載の発明は、請求項1乃至4のいずれかに記載の構成に加え、前記容器搬送手段は、前記筐体に定荷重ばねを介して昇降自在に支持されていることを特徴とする。   According to a fifth aspect of the present invention, in addition to the configuration according to any one of the first to fourth aspects, the container transport means is supported by the casing so as to be movable up and down via a constant load spring. It is characterized by.

また、請求項6に記載の発明は、請求項1乃至5のいずれかに記載の構成に加え、前記位置決め機構は、前記筐体の奥行き方向であるY方向における筐体上の基準位置を中心として前記仮置きトレイをY方向に弾性的に揺動させるトレイ揺動手段と、前記容器搬送手段によって前記基板搬送容器を前記仮置きトレイに載置するときに、当該仮置きトレイをY方向にガイドして当該基板搬送容器を当該仮置きトレイ上の基準位置に位置決めするガイド部材とからなるY方向位置決め機構を含んでいることを特徴とする。   According to a sixth aspect of the present invention, in addition to the configuration according to any of the first to fifth aspects, the positioning mechanism is centered on a reference position on the housing in the Y direction that is the depth direction of the housing. A tray swinging means for elastically swinging the temporary placing tray in the Y direction, and when the substrate carrying container is placed on the temporary placing tray by the container carrying means, the temporary placing tray is moved in the Y direction. A Y-direction positioning mechanism including a guide member that guides and positions the substrate transport container at a reference position on the temporary storage tray is included.

また、請求項7に記載の発明は、請求項1乃至6のいずれかに記載の構成に加え、前記位置決め機構は、前記基板搬送容器が、前記筐体の高さ方向であるZ方向における前記仮置きトレイ上の基準位置に位置決めされたか否かを検出するZ方向停止スイッチと、このZ方向停止スイッチによって前記基板搬送容器がZ方向における前記仮置きトレイ上の基準位置に位置決めされたと検出された場合に、その旨の信号を送信する送信機と、前記基板搬送容器がZ方向における前記仮置きトレイ上の基準位置に位置決めされた旨の信号を受信する受信機と、この受信機からの信号に基づいて前記容器搬送手段による前記基板搬送容器の搬送動作を停止させる停止制御装置とからなるZ方向位置決め機構を含んでいることを特徴とする。   According to a seventh aspect of the present invention, in addition to the configuration according to any one of the first to sixth aspects, the positioning mechanism is configured such that the substrate transport container is in the Z direction, which is the height direction of the housing. A Z-direction stop switch that detects whether or not the reference position on the temporary placement tray is positioned, and the Z-direction stop switch detects that the substrate transport container has been positioned at the reference position on the temporary placement tray in the Z direction. A transmitter that transmits a signal to that effect, a receiver that receives a signal that the substrate transport container is positioned at a reference position on the temporary storage tray in the Z direction, and a A Z-direction positioning mechanism including a stop control device for stopping the transfer operation of the substrate transfer container by the container transfer means based on the signal is included.

本発明によれば、各小型製造装置が容器搬送手段および仮置きトレイを備え、さらに、複数の小型製造装置間で発生しうる位置ずれを吸収するための位置決め機構が組み込まれているため、複数の小型製造装置からなる生産ラインにおいて、これらの小型製造装置間で位置ずれがあっても、これらの小型製造装置間でウェハ搬送容器の自動搬送を円滑に実行することが可能となる。   According to the present invention, each small manufacturing apparatus includes a container transport unit and a temporary storage tray, and further includes a positioning mechanism for absorbing misalignment that may occur between the plurality of small manufacturing apparatuses. In the production line comprising the small manufacturing apparatuses, even if there is a positional shift between these small manufacturing apparatuses, it is possible to smoothly carry out automatic transfer of the wafer transfer container between these small manufacturing apparatuses.

本発明の実施の形態1に係る生産ラインを示す図であって、(a)はその正面図、(b)はその左側面図である。It is a figure which shows the production line which concerns on Embodiment 1 of this invention, Comprising: (a) is the front view, (b) is the left view. 同実施の形態1に係る容器搬送手段を示す詳細図であって、(a)はその左側面図、(b)はその正面図である。It is detail drawing which shows the container conveyance means which concerns on the same Embodiment 1, Comprising: (a) is the left view, (b) is the front view. 同実施の形態1に係るX方向位置決め機構を示す図であって、(a)は右側に隣接する容器搬送手段によって、仮置きトレイにウェハ搬送装容器が載置された状態を示す平面図、(b)は本仮置きトレイと一体となる半導体製造装置に設置された容器搬送手段によって、仮置きトレイにウェハ搬送装容器が載置された状態を示す平面図である。It is a figure which shows the X direction positioning mechanism which concerns on the same Embodiment 1, Comprising: (a) is a top view which shows the state by which the wafer conveyance apparatus container was mounted in the temporary placement tray by the container conveyance means adjacent to the right side, (B) is a top view which shows the state by which the wafer conveyance equipment container was mounted in the temporary placement tray by the container conveyance means installed in the semiconductor manufacturing apparatus united with this temporary placement tray. 同実施の形態1に係るY方向位置決め機構を示す図であって、(a)はウェハ搬送容器を仮置きトレイに載置する直前の状態を示す側面図、(b)はウェハ搬送容器を仮置きトレイに載置した直後の状態を示す側面図である。2A and 2B are diagrams illustrating a Y-direction positioning mechanism according to the first embodiment, in which FIG. 1A is a side view illustrating a state immediately before the wafer transfer container is placed on a temporary storage tray, and FIG. It is a side view which shows the state immediately after mounting in a placing tray. 同実施の形態1に係るZ方向位置決め機構を示す側面図である。It is a side view which shows the Z direction positioning mechanism which concerns on the same Embodiment 1. FIG. 同実施の形態1に係る生産ラインの容器搬送手段によるウェハ搬送容器の搬送工程を示す図である。It is a figure which shows the conveyance process of the wafer conveyance container by the container conveyance means of the production line which concerns on the same Embodiment 1. FIG.

以下、本発明の実施の形態について説明する。   Embodiments of the present invention will be described below.

[発明の実施の形態1]
図1乃至図6には、本発明の実施の形態1を示す。
Embodiment 1 of the Invention
1 to 6 show a first embodiment of the present invention.

実施の形態1に係る生産ライン1は、図1に示すように、この実施の形態1では3個の小型の半導体製造装置(小型製造装置)2が床面16上に一直線上に並設されて構成されている。これら3個の半導体製造装置2(右側の半導体製造装置2A、中央の半導体製造装置2B、左側の半導体製造装置2C)は、互いに所定間隔(例えば、6mm)の隙間を挟んで横向きに対向している。   As shown in FIG. 1, the production line 1 according to the first embodiment has three small semiconductor manufacturing apparatuses (small manufacturing apparatuses) 2 arranged in parallel on the floor 16 in this first embodiment. Configured. These three semiconductor manufacturing apparatuses 2 (the right semiconductor manufacturing apparatus 2A, the central semiconductor manufacturing apparatus 2B, and the left semiconductor manufacturing apparatus 2C) face each other with a predetermined gap (for example, 6 mm) therebetween. Yes.

各半導体製造装置2はそれぞれ、図1に示すように、所定の大きさ(例えば、幅30cm、奥行き45cm、高さ144cm)の略直方体状の筐体3を有しており、筐体3の内部には、処理室5および装置前室6が配設されている。   As shown in FIG. 1, each semiconductor manufacturing apparatus 2 includes a substantially rectangular parallelepiped casing 3 having a predetermined size (for example, a width of 30 cm, a depth of 45 cm, and a height of 144 cm). A processing chamber 5 and an apparatus front chamber 6 are disposed inside.

また、筐体3の前部には、図1に示すように、凹部7が装置前室6の上方に形成されている。この凹部7は、前面側および側面側が開放され、前面から奥行きに向けて凹んでいる。この凹部7には、小口径(例えば、直径20mm以下)の半導体ウェハが密閉状態で収容されたウェハ搬送容器(基板搬送容器)10を載置するための容器載置台9が設置されているとともに、このウェハ搬送容器10を一時的に保持する仮置きトレイ8が設置されている。ここで、仮置きトレイ8は、図1(a)に示すように、半導体製造装置2が複数並設されたときに、任意の半導体製造装置2の容器載置台9と、その隣の半導体製造装置2の容器載置台9との間に位置するように設けられている。また、各半導体製造装置2において、容器載置台9と仮置きトレイ8との位置関係(筐体の幅方向、奥行き方向および高さ方向)は精度よく定められている。   Further, as shown in FIG. 1, a recess 7 is formed in the front part of the housing 3 above the apparatus front chamber 6. The recess 7 is open on the front side and the side, and is recessed from the front toward the depth. The recess 7 is provided with a container mounting table 9 for mounting a wafer transfer container (substrate transfer container) 10 in which a semiconductor wafer having a small diameter (for example, a diameter of 20 mm or less) is contained in a sealed state. A temporary storage tray 8 for temporarily holding the wafer transfer container 10 is installed. Here, as shown in FIG. 1A, the temporary placement tray 8 is configured such that when a plurality of semiconductor manufacturing apparatuses 2 are arranged side by side, a container mounting table 9 of an arbitrary semiconductor manufacturing apparatus 2 and a semiconductor manufacturing apparatus adjacent thereto. It is provided so that it may be located between the container mounting base 9 of the apparatus 2. In each semiconductor manufacturing apparatus 2, the positional relationship (the width direction, the depth direction, and the height direction of the housing) between the container mounting table 9 and the temporary placement tray 8 is accurately determined.

また、半導体製造装置2が複数並設されたときには、これら複数の半導体製造装置2の並設方向(図1(a)左右方向)に延伸する容器搬送経路14が複数の半導体製造装置2の凹部7を貫くように形成される。   When a plurality of semiconductor manufacturing apparatuses 2 are arranged side by side, the container transport path 14 extending in the direction in which the plurality of semiconductor manufacturing apparatuses 2 are arranged side by side (the left-right direction in FIG. 1A) is a concave portion of the plurality of semiconductor manufacturing apparatuses 2. 7 is formed so as to penetrate through 7.

また、筐体3には、図2に示すように、3個の半導体製造装置2間でウェハ搬送容器10を搬送するための容器搬送手段12がZ軸モータ18によって昇降自在に設けられている。この容器搬送手段12は、図6(a)、(b)に示すように、その半導体製造装置2の仮置きトレイ8と容器載置台9との間でウェハ搬送容器10を往復搬送することができるとともに、図6(b)、(c)に示すように、その半導体製造装置2の容器載置台9と隣の半導体製造装置2の仮置きトレイ8との間でウェハ搬送容器10を往復搬送することができるように構成されている。   Further, as shown in FIG. 2, the case 3 is provided with a container transfer means 12 for transferring the wafer transfer container 10 between the three semiconductor manufacturing apparatuses 2 by a Z-axis motor 18. . As shown in FIGS. 6A and 6B, the container transfer means 12 can reciprocate the wafer transfer container 10 between the temporary tray 8 and the container mounting table 9 of the semiconductor manufacturing apparatus 2. As shown in FIGS. 6B and 6C, the wafer transfer container 10 is reciprocally transferred between the container mounting table 9 of the semiconductor manufacturing apparatus 2 and the temporary storage tray 8 of the adjacent semiconductor manufacturing apparatus 2. It is configured to be able to.

すなわち、容器搬送手段12は、図2に示すように、筐体3に水平に固定されたラック20と、このラック20に噛合したピニオン21と、このピニオン21をX方向(図2左右方向)に移動させるX軸モータ(アーム駆動装置)22と、このX軸モータ22によってピニオン21と同期的にX方向に移動する搬送アーム27と、この搬送アーム27の一端(図2右端)に回転自在に取り付けられ、ピニオン21の回転に連動して回転する駆動側プーリ23と、搬送アーム27の他端(図2左端)に回転自在に取り付けられた従動側プーリ24と、駆動側プーリ23および従動側プーリ24に架け渡されたベルト25と、このベルト25の一部に固定され、ウェハ搬送容器10の上部を吸着して把持する容器把持部材26とから構成されている。そして、X軸モータ22を回転駆動することにより、ピニオン21がラック20に噛合したままX方向(図2左右方向)に転動し、それに連動して搬送アーム27がX方向に移動するとともに駆動プーリ23が転動し、ベルト25が回転するため、容器把持部材26がX方向に移動するように構成されている。したがって、搬送アーム27と容器把持部材26との間には、搬送アーム27のX方向の移動を増速して容器把持部材26に伝える増速機構が設けられており、例えば、搬送アーム27がX方向に25cm移動すると、容器把持部材26はX方向に30cm移動することになる。   That is, as shown in FIG. 2, the container transport means 12 includes a rack 20 that is horizontally fixed to the housing 3, a pinion 21 that meshes with the rack 20, and the pinion 21 in the X direction (left and right direction in FIG. 2). The X-axis motor (arm drive device) 22 is moved to the X axis, the transfer arm 27 is moved in the X direction synchronously with the pinion 21 by the X-axis motor 22, and is rotated to one end (the right end in FIG. 2) of the transfer arm 27 And a driven pulley 24 that is rotatably attached to the other end (left end in FIG. 2) of the transfer arm 27, and a driven pulley 23 and a driven pulley. The belt 25 spans the side pulley 24 and a container gripping member 26 that is fixed to a part of the belt 25 and sucks and grips the upper portion of the wafer transfer container 10. . Then, by rotating the X-axis motor 22, the pinion 21 rolls in the X direction (left and right direction in FIG. 2) while meshing with the rack 20, and the conveyance arm 27 moves in the X direction in conjunction with the rotation. Since the pulley 23 rolls and the belt 25 rotates, the container gripping member 26 is configured to move in the X direction. Therefore, a speed increasing mechanism is provided between the transfer arm 27 and the container gripping member 26 to increase the movement of the transfer arm 27 in the X direction and transmit it to the container gripping member 26. When moved 25 cm in the X direction, the container gripping member 26 moves 30 cm in the X direction.

なお、容器搬送手段12は、その非使用時には、図1に示すように、その半導体製造装置2の筐体3の直方体状の外形線LNから前方(図1(b)右方)にも左右方向(図1(a)左右方向)にも食み出さない状態で凹部7に収納されている。また、容器搬送手段12は、その使用時(ウェハ搬送容器10の搬送時)には、図1に示すように、その半導体製造装置2および隣の半導体製造装置2の筐体3の直方体状の外形線LNから前方(図1(b)右方)へ突出しないようになっている。   When the container transporting unit 12 is not in use, as shown in FIG. 1, the container conveying unit 12 is also left and right from the rectangular parallelepiped LN of the housing 3 of the semiconductor manufacturing apparatus 2 (to the right in FIG. 1B). It is accommodated in the recess 7 so as not to protrude in the direction (FIG. 1 (a) left-right direction). Further, the container transfer means 12 is in the shape of a rectangular parallelepiped of the semiconductor manufacturing apparatus 2 and the casing 3 of the adjacent semiconductor manufacturing apparatus 2 as shown in FIG. 1 when used (when transferring the wafer transfer container 10). It does not protrude forward from the outline LN (to the right in FIG. 1B).

そして、容器搬送手段12には、生産ライン1の構築に際して3個の半導体製造装置2間で発生しうる若干の位置ずれを吸収するための位置決め機構4が組み込まれている。この位置決め機構4は、X方向位置決め機構4X(図3参照)、Y方向位置決め機構4Y(図4参照)およびZ方向位置決め機構4Z(図5参照)から構成されている。   The container transfer means 12 incorporates a positioning mechanism 4 for absorbing a slight misalignment that may occur between the three semiconductor manufacturing apparatuses 2 when the production line 1 is constructed. The positioning mechanism 4 includes an X-direction positioning mechanism 4X (see FIG. 3), a Y-direction positioning mechanism 4Y (see FIG. 4), and a Z-direction positioning mechanism 4Z (see FIG. 5).

X方向位置決め機構4Xは、図3に示すように、ウェハ搬送容器10がX方向(図3左右方向)における仮置きトレイ8上の基準位置に位置決めされたか否かを検出するX方向停止スイッチ30と、このX方向停止スイッチ30によってウェハ搬送容器10がX方向における仮置きトレイ8上の基準位置に位置決めされたと検出された場合に、その旨の信号を送信する送信機(図示せず)と、ウェハ搬送容器10がX方向における仮置きトレイ8上の基準位置に位置決めされた旨の信号を受信する受信機(図示せず)と、この受信機からの信号に基づいて容器搬送手段12によるウェハ搬送容器10の搬送動作を停止させる停止制御装置(図示せず)とから構成されている。ここで、X方向停止スイッチ30は、図3(b)に示すように、その半導体製造装置2の容器把持部材26が図3左側から容器把持部材26が移動してきたときには、回転軸CT1を中心として矢印M方向に回転して容器把持部材26の移動を阻害しないエスケープ機能を備えているとともに、図3(a)に示すように、その半導体製造装置2の隣の半導体製造装置2の容器把持部材26が図3右側から移動してきたときには、上述した位置決め検出機能を発現する。   As shown in FIG. 3, the X-direction positioning mechanism 4X detects whether or not the wafer transfer container 10 is positioned at a reference position on the temporary tray 8 in the X direction (left and right direction in FIG. 3). And a transmitter (not shown) that transmits a signal to that effect when it is detected by the X direction stop switch 30 that the wafer transfer container 10 has been positioned at the reference position on the temporary storage tray 8 in the X direction. A receiver (not shown) that receives a signal indicating that the wafer transfer container 10 has been positioned at the reference position on the temporary storage tray 8 in the X direction, and the container transfer means 12 based on the signal from the receiver. A stop control device (not shown) for stopping the transfer operation of the wafer transfer container 10 is configured. Here, as shown in FIG. 3B, when the container gripping member 26 of the semiconductor manufacturing apparatus 2 moves from the left side of FIG. 3, the X direction stop switch 30 is centered on the rotation axis CT1. As shown in FIG. 3A, the container gripping of the semiconductor manufacturing apparatus 2 adjacent to the semiconductor manufacturing apparatus 2 is provided. When the member 26 has moved from the right side of FIG. 3, the above-described positioning detection function is exhibited.

また、Y方向位置決め機構4Yは、図4に示すように、Y方向(図4左右方向)における筐体3上の基準位置を中心として仮置きトレイ8をY方向に弾性的に揺動させる前後一対のコイルスプリング(トレイ揺動手段)40と、容器搬送手段12によってウェハ搬送容器10を仮置きトレイ8に載置するときに、この仮置きトレイ8をY方向にガイドしてウェハ搬送容器10を仮置きトレイ8上の基準位置に位置決めする前後一対のガイド部材41とから構成されている。   Further, as shown in FIG. 4, the Y-direction positioning mechanism 4Y is configured to move the temporary tray 8 elastically in the Y direction around the reference position on the housing 3 in the Y direction (left and right direction in FIG. 4). When the wafer transfer container 10 is placed on the temporary placement tray 8 by the pair of coil springs (tray swinging means) 40 and the container transfer means 12, the temporary transfer tray 8 is guided in the Y direction to guide the wafer transfer container 10. Is constituted by a pair of front and rear guide members 41 that are positioned at a reference position on the temporary tray 8.

さらに、Z方向位置決め機構4Zは、図5に示すように、Z方向における仮置きトレイ8上の基準位置に位置決めされたか否かを検出するZ方向停止スイッチ50と、このZ方向停止スイッチ50によってウェハ搬送容器10がZ方向における仮置きトレイ8上の基準位置に位置決めされたと検出された場合に、その旨の信号を送信する送信機(図示せず)と、ウェハ搬送容器10がZ方向における仮置きトレイ8上の基準位置に位置決めされた旨の信号を受信する受信機(図示せず)と、この受信機からの信号に基づいて容器搬送手段12によるウェハ搬送容器10の搬送動作を停止させる停止制御装置(図示せず)とから構成されている。   Further, as shown in FIG. 5, the Z-direction positioning mechanism 4 </ b> Z includes a Z-direction stop switch 50 that detects whether or not the Z-direction positioning switch 4 is positioned at the reference position on the temporary storage tray 8 in the Z direction, and the Z-direction stop switch 50. When it is detected that the wafer transfer container 10 is positioned at the reference position on the temporary storage tray 8 in the Z direction, a transmitter (not shown) that transmits a signal to that effect, and the wafer transfer container 10 in the Z direction A receiver (not shown) that receives a signal indicating that it has been positioned at the reference position on the temporary storage tray 8, and the transfer operation of the wafer transfer container 10 by the container transfer means 12 is stopped based on the signal from the receiver. And a stop control device (not shown).

また、各半導体製造装置2の筐体3はそれぞれ、図1に示すように、平板状の底板11を有しており、底板11には、筐体3を床面16上の所定位置に位置決めする位置決め手段13が設けられている。   Each housing 3 of each semiconductor manufacturing apparatus 2 has a flat bottom plate 11 as shown in FIG. 1, and the housing 3 is positioned at a predetermined position on the floor 16 on the bottom plate 11. Positioning means 13 is provided.

生産ライン1は以上のような構成を有するので、この生産ライン1において半導体ウェハに一連の製造プロセスを施す際には、例えば、以下に説明するとおり、右側の半導体製造装置2Aから中央の半導体製造装置2Bを経て左側の半導体製造装置2Cへ順送りでウェハ搬送容器10を搬送しつつ、各半導体製造装置2A、2B、2Cにおいて、このウェハ搬送容器10内に収容された半導体ウェハに対して一連の製造プロセスを施す。   Since the production line 1 has the above-described configuration, when a series of manufacturing processes are performed on a semiconductor wafer in the production line 1, for example, as described below, the semiconductor manufacturing apparatus 2A on the right side is manufactured from the semiconductor manufacturing apparatus on the right side. A series of wafer transfer containers 10 are transferred to the semiconductor manufacturing apparatus 2C on the left side through the apparatus 2B, and a series of semiconductor wafers accommodated in the wafer transfer container 10 in each of the semiconductor manufacturing apparatuses 2A, 2B, and 2C. Apply the manufacturing process.

まず、第1処理工程では、右側の半導体製造装置2Aにおいて、半導体ウェハが、容器載置台9から搬入されて装置前室6を経て処理室5に搬送され、処理室5で所定の処理が施された後、処理室5から装置前室6を経て容器載置台9に戻されて搬出される。   First, in the first processing step, in the semiconductor manufacturing apparatus 2A on the right side, a semiconductor wafer is carried from the container mounting table 9 and transferred to the processing chamber 5 through the front chamber 6 of the apparatus, and predetermined processing is performed in the processing chamber 5. After that, it is returned from the processing chamber 5 to the container mounting table 9 through the front chamber 6 and carried out.

次に、第1搬送工程に移行し、右側の半導体製造装置2Aの容器搬送手段12と中央の半導体製造装置2Bの容器搬送手段12とが相互に連携して、右側の半導体製造装置2Aの容器載置台9から中央の半導体製造装置2Bの仮置きトレイ8に一時的に仮置きされた後、中央の半導体製造装置2Bの仮置きトレイ8から中央の半導体製造装置2Bの容器載置台9へウェハ搬送容器10が搬送されて載置される。   Next, the process proceeds to the first transfer step, where the container transfer means 12 of the right semiconductor manufacturing apparatus 2A and the container transfer means 12 of the central semiconductor manufacturing apparatus 2B cooperate with each other, and the container of the right semiconductor manufacturing apparatus 2A. After being temporarily placed on the temporary placement tray 8 of the central semiconductor manufacturing apparatus 2B from the mounting table 9, the wafer is transferred from the temporary placement tray 8 of the central semiconductor manufacturing apparatus 2B to the container mounting base 9 of the central semiconductor manufacturing apparatus 2B. The transport container 10 is transported and placed.

すなわち、まず、右側の半導体製造装置2Aにおいて、図6(b)に示すように、容器載置台9にウェハ搬送容器10が載置されているとともに、この容器載置台9の上方に容器搬送手段12の容器把持部材26が位置決めされている状態で、Z軸モータ18を回転駆動して容器搬送手段12を下降させ、容器把持部材26でウェハ搬送容器10を吸着して把持した後、Z軸モータ18を駆動して容器搬送手段12を上昇させる。次いで、図6(c)に示すように、X軸モータ22を回転駆動して容器把持部材26を中央の半導体製造装置2Bの仮置きトレイ8の上方に位置決めする。その後、Z軸モータ18を回転駆動して容器搬送手段12を下降させ、容器把持部材26によるウェハ搬送容器10の吸着状態を解除して、中央の半導体製造装置2Bの仮置きトレイ8にウェハ搬送容器10を載置する。次に、Z軸モータ18を駆動して容器搬送手段12を上昇させるとともに、X軸モータ22を回転駆動して容器把持部材26を右側の半導体製造装置2Aへ戻す。   That is, first, in the semiconductor manufacturing apparatus 2A on the right side, as shown in FIG. 6B, the wafer transfer container 10 is mounted on the container mounting table 9, and the container transfer means is disposed above the container mounting table 9. In a state where the 12 container gripping members 26 are positioned, the Z-axis motor 18 is rotationally driven to lower the container transporting means 12, and the wafer gripping container 10 is sucked and gripped by the container gripping member 26, and then the Z-axis The motor 18 is driven to raise the container conveying means 12. Next, as shown in FIG. 6C, the X-axis motor 22 is rotationally driven to position the container gripping member 26 above the temporary storage tray 8 of the central semiconductor manufacturing apparatus 2B. Thereafter, the Z-axis motor 18 is rotationally driven to lower the container transfer means 12, release the suction state of the wafer transfer container 10 by the container gripping member 26, and transfer the wafer to the temporary placement tray 8 of the central semiconductor manufacturing apparatus 2B. The container 10 is placed. Next, the Z-axis motor 18 is driven to raise the container conveying means 12, and the X-axis motor 22 is rotationally driven to return the container gripping member 26 to the right semiconductor manufacturing apparatus 2A.

その後、中央の半導体製造装置2Bにおいて、図6(d)に示すように、X軸モータ22を回転駆動して容器把持部材26を仮置きトレイ8の上方に位置決めする。次に、Z軸モータ18を回転駆動して容器搬送手段12を下降させ、容器把持部材26でウェハ搬送容器10を吸着して把持した後、Z軸モータ18を駆動して容器搬送手段12を上昇させる。次いで、図6(e)に示すように、X軸モータ22を回転駆動して容器把持部材26を容器載置台9の上方に位置決めする。その後、Z軸モータ18を回転駆動して容器搬送手段12を下降させ、容器把持部材26によるウェハ搬送容器10の吸着状態を解除して、容器載置台9にウェハ搬送容器10を載置する。   Thereafter, in the central semiconductor manufacturing apparatus 2B, as shown in FIG. 6D, the X-axis motor 22 is rotationally driven to position the container gripping member 26 above the temporary tray 8. Next, the Z-axis motor 18 is rotationally driven to lower the container transfer means 12, and the wafer holding container 10 is sucked and held by the container holding member 26, and then the Z-axis motor 18 is driven to move the container transfer means 12. Raise. Next, as shown in FIG. 6 (e), the X-axis motor 22 is rotationally driven to position the container gripping member 26 above the container mounting table 9. Thereafter, the Z-axis motor 18 is rotationally driven to lower the container transfer means 12, release the suction state of the wafer transfer container 10 by the container gripping member 26, and place the wafer transfer container 10 on the container mounting table 9.

このとき、中央の半導体製造装置2BにはX方向位置決め機構4Xが組み込まれているので、ウェハ搬送容器10はX方向において精度よく位置決めされる。すなわち、右側の半導体製造装置2Aの容器把持部材26を中央の半導体製造装置2Bの仮置きトレイ8の上方に位置決めするときには(図6(c)参照)、図3(a)に示すように、中央の半導体製造装置2BのX方向位置決め機構4XのX方向停止スイッチ30がウェハ搬送容器10の位置決めを検出すると、その旨の信号を中央の半導体製造装置2BのX方向位置決め機構4Xの送信機が右側の半導体製造装置2AのX方向位置決め機構4Xの受信機に無線で送信する。すると、右側の半導体製造装置2AのX方向位置決め機構4Xの受信機が右側の半導体製造装置2AのX方向位置決め機構4Xの停止制御装置にその旨の信号を送信する。すると、右側の半導体製造装置2AのX方向位置決め機構4Xの停止制御装置が、ウェハ搬送容器10の搬送動作を停止させる。その結果、ウェハ搬送容器10をX方向において精度よく位置決めすることができる。   At this time, since the X direction positioning mechanism 4X is incorporated in the central semiconductor manufacturing apparatus 2B, the wafer transfer container 10 is accurately positioned in the X direction. That is, when the container gripping member 26 of the right semiconductor manufacturing apparatus 2A is positioned above the temporary storage tray 8 of the central semiconductor manufacturing apparatus 2B (see FIG. 6C), as shown in FIG. When the X direction stop switch 30 of the X direction positioning mechanism 4X of the central semiconductor manufacturing apparatus 2B detects the positioning of the wafer transfer container 10, the transmitter of the X direction positioning mechanism 4X of the central semiconductor manufacturing apparatus 2B sends a signal to that effect. It transmits wirelessly to the receiver of the X direction positioning mechanism 4X of the semiconductor manufacturing apparatus 2A on the right side. Then, the receiver of the X direction positioning mechanism 4X of the right semiconductor manufacturing apparatus 2A transmits a signal to that effect to the stop control device of the X direction positioning mechanism 4X of the right semiconductor manufacturing apparatus 2A. Then, the stop control device of the X direction positioning mechanism 4X of the right semiconductor manufacturing apparatus 2A stops the transfer operation of the wafer transfer container 10. As a result, the wafer transfer container 10 can be accurately positioned in the X direction.

また、中央の半導体製造装置2BにはY方向位置決め機構4Yも組み込まれているので、ウェハ搬送容器10はY方向においても精度よく位置決めされる。すなわち、右側の半導体製造装置2Aの容器把持部材26に把持されたウェハ搬送容器10を中央の半導体製造装置2Bの仮置きトレイ8に載置するときには、図4(a)に示すように、仮置きトレイ8の中心CT3に対して容器把持部材26の中心CT2がY方向(図4左右方向)にずれていても、容器搬送手段12の下降に伴って、図4(b)に示すように、前後一対のコイルスプリング40の弾性に抗する形で仮置きトレイ8がY方向(図4左向き)に移動して、その中心CT3を容器把持部材26の中心CT2に合致させる。その結果、ウェハ搬送容器10をY方向において精度よく位置決めすることができる。その後、容器把持部材26がウェハ搬送容器10の把持状態を解除して退避すると、ウェハ搬送容器10を仮置きトレイ8上に残したまま上昇する。このとき、仮置きトレイ8は、前後一対のコイルスプリング40の弾性により、Y方向(図4右向き)に移動して筐体3上の基準位置(図4(a)の中心CT3の位置)に戻る。   Further, since the Y-direction positioning mechanism 4Y is also incorporated in the central semiconductor manufacturing apparatus 2B, the wafer transfer container 10 can be accurately positioned in the Y direction. That is, when the wafer transfer container 10 held by the container holding member 26 of the right semiconductor manufacturing apparatus 2A is placed on the temporary storage tray 8 of the central semiconductor manufacturing apparatus 2B, as shown in FIG. Even if the center CT2 of the container gripping member 26 is displaced in the Y direction (left and right direction in FIG. 4) with respect to the center CT3 of the placing tray 8, as shown in FIG. The temporary storage tray 8 moves in the Y direction (leftward in FIG. 4) against the elasticity of the pair of front and rear coil springs 40, and the center CT3 thereof is matched with the center CT2 of the container gripping member 26. As a result, the wafer transfer container 10 can be accurately positioned in the Y direction. Thereafter, when the container gripping member 26 releases the gripping state of the wafer transport container 10 and retreats, the wafer transport container 10 is raised while remaining on the temporary placement tray 8. At this time, the temporary tray 8 is moved in the Y direction (rightward in FIG. 4) by the elasticity of the pair of front and rear coil springs 40 to the reference position on the housing 3 (the position of the center CT3 in FIG. 4A). Return.

さらに、中央の半導体製造装置2BにはZ方向位置決め機構4Zも組み込まれているので、ウェハ搬送容器10はZ方向においても精度よく位置決めされる。すなわち、右側の半導体製造装置2Aの容器把持部材26に把持されたウェハ搬送容器10を中央の半導体製造装置2Bの仮置きトレイ8に載置するときには、図5に示すように、中央の半導体製造装置2BのZ方向位置決め機構4ZのZ方向停止スイッチ50がウェハ搬送容器10の位置決めを検出すると、その旨の信号を中央の半導体製造装置2BのZ方向位置決め機構4Zの送信機が右側の半導体製造装置2AのZ方向位置決め機構4Zの受信機に無線で送信する。すると、右側の半導体製造装置2AのZ方向位置決め機構4Zの受信機が右側の半導体製造装置2AのZ方向位置決め機構4Zの停止制御装置にその旨の信号を送信する。すると、右側の半導体製造装置2AのZ方向位置決め機構4Zの停止制御装置が、ウェハ搬送容器10の搬送動作を停止させる。その結果、ウェハ搬送容器10をZ方向において精度よく位置決めすることができる。   Further, since the Z-direction positioning mechanism 4Z is also incorporated in the central semiconductor manufacturing apparatus 2B, the wafer transfer container 10 can be accurately positioned in the Z direction. That is, when the wafer transfer container 10 held by the container holding member 26 of the semiconductor manufacturing apparatus 2A on the right side is placed on the temporary storage tray 8 of the central semiconductor manufacturing apparatus 2B, as shown in FIG. When the Z-direction stop switch 50 of the Z-direction positioning mechanism 4Z of the apparatus 2B detects the positioning of the wafer transfer container 10, a signal to that effect is sent from the transmitter of the Z-direction positioning mechanism 4Z of the central semiconductor manufacturing apparatus 2B to the right semiconductor manufacture. It transmits wirelessly to the receiver of the Z-direction positioning mechanism 4Z of the apparatus 2A. Then, the receiver of the Z direction positioning mechanism 4Z of the right semiconductor manufacturing apparatus 2A transmits a signal to that effect to the stop control device of the Z direction positioning mechanism 4Z of the right semiconductor manufacturing apparatus 2A. Then, the stop control device for the Z-direction positioning mechanism 4Z of the semiconductor manufacturing apparatus 2A on the right side stops the transfer operation of the wafer transfer container 10. As a result, the wafer transfer container 10 can be accurately positioned in the Z direction.

また、中央の半導体製造装置2Bにおいて、仮置きトレイ8からウェハ搬送容器10を受け取るときには、上述したとおり、図3(b)に示すように、X方向位置決め機構4XのX方向停止スイッチ30がエスケープ機能を発現するので、容器把持部材26の移動を阻害しない。しかも、上述したとおり、容器載置台9と仮置きトレイ8との位置関係は精度よく定められているので、X方向位置決め機構4Xに頼らなくてもウェハ搬送容器10を円滑に受け取ることができる。   Further, when the wafer transport container 10 is received from the temporary storage tray 8 in the central semiconductor manufacturing apparatus 2B, as described above, as shown in FIG. 3B, the X-direction stop switch 30 of the X-direction positioning mechanism 4X is escaped. Since the function is expressed, the movement of the container gripping member 26 is not hindered. In addition, as described above, since the positional relationship between the container mounting table 9 and the temporary storage tray 8 is determined with high accuracy, the wafer transfer container 10 can be received smoothly without relying on the X-direction positioning mechanism 4X.

その後、第2処理工程に移行し、中央の半導体製造装置2Bにおいて、半導体ウェハが、容器載置台9から搬入されて装置前室6を経て処理室5に搬送され、処理室5で所定の処理が施された後、処理室5から装置前室6を経て容器載置台9に戻されて搬出される。   Thereafter, the process proceeds to the second processing step. In the central semiconductor manufacturing apparatus 2B, the semiconductor wafer is carried from the container mounting table 9 and transferred to the processing chamber 5 through the apparatus front chamber 6, and a predetermined processing is performed in the processing chamber 5. Then, the processing chamber 5 is returned to the container mounting table 9 through the apparatus front chamber 6 and carried out.

次いで、第2搬送工程に移行し、中央の半導体製造装置2Bの容器搬送手段12と左側の半導体製造装置2Cの容器搬送手段12とが相互に連携して、中央の半導体製造装置2Bの容器載置台9から左側の半導体製造装置2Cの仮置きトレイ8に一時的に仮置きされた後、左側の半導体製造装置2Cの仮置きトレイ8から左側の半導体製造装置2Cの容器載置台9へウェハ搬送容器10が搬送されて載置される。   Next, the process proceeds to the second transfer step, where the container transfer means 12 of the central semiconductor manufacturing apparatus 2B and the container transfer means 12 of the left semiconductor manufacturing apparatus 2C cooperate with each other to mount the container of the central semiconductor manufacturing apparatus 2B. After being temporarily placed on the temporary placement tray 8 of the left semiconductor manufacturing apparatus 2C from the mounting table 9, the wafer is transferred from the temporary placement tray 8 of the left semiconductor manufacturing apparatus 2C to the container mounting table 9 of the left semiconductor manufacturing apparatus 2C. The container 10 is transported and placed.

すなわち、まず、中央の半導体製造装置2Bにおいて、図6(b)に示すように、容器載置台9にウェハ搬送容器10が載置されているとともに、この容器載置台9の上方に容器搬送手段12の容器把持部材26が位置決めされている状態で、Z軸モータ18を回転駆動して容器搬送手段12を下降させ、容器把持部材26でウェハ搬送容器10を吸着して把持した後、Z軸モータ18を駆動して容器搬送手段12を上昇させる。次いで、図6(c)に示すように、X軸モータ22を回転駆動して容器把持部材26を左側の半導体製造装置2Cの仮置きトレイ8の上方に位置決めする。その後、Z軸モータ18を回転駆動して容器搬送手段12を下降させ、容器把持部材26によるウェハ搬送容器10の吸着状態を解除して、左側の半導体製造装置2Cの仮置きトレイ8にウェハ搬送容器10を載置する。次に、Z軸モータ18を駆動して容器搬送手段12を上昇させるとともに、X軸モータ22を回転駆動して容器把持部材26を中央の半導体製造装置2Bへ戻す。   That is, first, in the central semiconductor manufacturing apparatus 2B, as shown in FIG. 6B, the wafer transfer container 10 is mounted on the container mounting table 9, and the container transfer means is disposed above the container mounting table 9. In a state where the 12 container gripping members 26 are positioned, the Z-axis motor 18 is rotationally driven to lower the container transporting means 12, and the wafer gripping container 10 is sucked and gripped by the container gripping member 26, and then the Z-axis The motor 18 is driven to raise the container conveying means 12. Next, as shown in FIG. 6C, the X-axis motor 22 is rotationally driven to position the container gripping member 26 above the temporary storage tray 8 of the semiconductor manufacturing apparatus 2C on the left side. Thereafter, the Z-axis motor 18 is rotationally driven to lower the container transfer means 12, release the suction state of the wafer transfer container 10 by the container gripping member 26, and transfer the wafer to the temporary placement tray 8 of the semiconductor manufacturing apparatus 2 </ b> C on the left side. The container 10 is placed. Next, the Z-axis motor 18 is driven to raise the container conveying means 12, and the X-axis motor 22 is rotationally driven to return the container gripping member 26 to the central semiconductor manufacturing apparatus 2B.

その後、左側の半導体製造装置2Cにおいて、図6(d)に示すように、X軸モータ22を回転駆動して容器把持部材26を仮置きトレイ8の上方に位置決めする。次に、Z軸モータ18を回転駆動して容器搬送手段12を下降させ、容器把持部材26でウェハ搬送容器10を吸着して把持した後、Z軸モータ18を駆動して容器搬送手段12を上昇させる。次いで、図6(e)に示すように、X軸モータ22を回転駆動して容器把持部材26を容器載置台9の上方に位置決めする。その後、Z軸モータ18を回転駆動して容器搬送手段12を下降させ、容器把持部材26によるウェハ搬送容器10の吸着状態を解除して、容器載置台9にウェハ搬送容器10を載置する。   Thereafter, in the semiconductor manufacturing apparatus 2 </ b> C on the left side, as shown in FIG. 6D, the X-axis motor 22 is rotationally driven to position the container gripping member 26 above the temporary tray 8. Next, the Z-axis motor 18 is rotationally driven to lower the container transfer means 12, and the wafer holding container 10 is sucked and held by the container holding member 26, and then the Z-axis motor 18 is driven to move the container transfer means 12. Raise. Next, as shown in FIG. 6 (e), the X-axis motor 22 is rotationally driven to position the container gripping member 26 above the container mounting table 9. Thereafter, the Z-axis motor 18 is rotationally driven to lower the container transfer means 12, release the suction state of the wafer transfer container 10 by the container gripping member 26, and place the wafer transfer container 10 on the container mounting table 9.

このとき、左側の半導体製造装置2CにはX方向位置決め機構4Xが組み込まれているので、ウェハ搬送容器10はX方向において精度よく位置決めされる。すなわち、中央の半導体製造装置2Bの容器把持部材26を左側の半導体製造装置2Cの仮置きトレイ8の上方に位置決めするときには(図6(c)参照)、図3(a)に示すように、左側の半導体製造装置2CのX方向位置決め機構4XのX方向停止スイッチ30がウェハ搬送容器10の位置決めを検出すると、その旨の信号を左側の半導体製造装置2CのX方向位置決め機構4Xの送信機が中央の半導体製造装置2BのX方向位置決め機構4Xの受信機に無線で送信する。すると、中央の半導体製造装置2BのX方向位置決め機構4Xの受信機が中央の半導体製造装置2BのX方向位置決め機構4Xの停止制御装置にその旨の信号を送信する。すると、中央の半導体製造装置2BのX方向位置決め機構4Xの停止制御装置が、ウェハ搬送容器10の搬送動作を停止させる。その結果、ウェハ搬送容器10をX方向において精度よく位置決めすることができる。   At this time, since the X direction positioning mechanism 4X is incorporated in the semiconductor manufacturing apparatus 2C on the left side, the wafer transfer container 10 is accurately positioned in the X direction. That is, when positioning the container gripping member 26 of the central semiconductor manufacturing apparatus 2B above the temporary storage tray 8 of the left semiconductor manufacturing apparatus 2C (see FIG. 6C), as shown in FIG. When the X direction stop switch 30 of the X direction positioning mechanism 4X of the left semiconductor manufacturing apparatus 2C detects the positioning of the wafer transfer container 10, the transmitter of the X direction positioning mechanism 4X of the left semiconductor manufacturing apparatus 2C sends a signal to that effect. It transmits by radio to the receiver of the X-direction positioning mechanism 4X of the central semiconductor manufacturing apparatus 2B. Then, the receiver of the X direction positioning mechanism 4X of the central semiconductor manufacturing apparatus 2B transmits a signal to that effect to the stop control device of the X direction positioning mechanism 4X of the central semiconductor manufacturing apparatus 2B. Then, the stop control device for the X direction positioning mechanism 4X of the central semiconductor manufacturing apparatus 2B stops the transfer operation of the wafer transfer container 10. As a result, the wafer transfer container 10 can be accurately positioned in the X direction.

また、左側の半導体製造装置2CにはY方向位置決め機構4Yも組み込まれているので、ウェハ搬送容器10はY方向においても精度よく位置決めされる。すなわち、中央の半導体製造装置2Bの容器把持部材26に把持されたウェハ搬送容器10を左側の半導体製造装置2Cの仮置きトレイ8に載置するときには、図4(a)に示すように、仮置きトレイ8の中心CT3に対して容器把持部材26の中心CT2がY方向(図4左右方向)にずれていても、容器搬送手段12の下降に伴って、図4(b)に示すように、前後一対のコイルスプリング40の弾性に抗する形で仮置きトレイ8がY方向(図4左向き)に移動して、その中心CT3を容器把持部材26の中心CT2に合致させる。その結果、ウェハ搬送容器10をY方向において精度よく位置決めすることができる。その後、容器把持部材26がウェハ搬送容器10の把持状態を解除して退避すると、ウェハ搬送容器10を仮置きトレイ8上に残したまま上昇する。このとき、仮置きトレイ8は、前後一対のコイルスプリング40の弾性により、Y方向(図4右向き)に移動して筐体3上の基準位置(図4(a)の中心CT3の位置)に戻る。   Further, since the Y-direction positioning mechanism 4Y is also incorporated in the left side semiconductor manufacturing apparatus 2C, the wafer transfer container 10 is positioned with high accuracy in the Y direction. That is, when the wafer transfer container 10 held by the container holding member 26 of the central semiconductor manufacturing apparatus 2B is placed on the temporary storage tray 8 of the left semiconductor manufacturing apparatus 2C, as shown in FIG. Even if the center CT2 of the container gripping member 26 is displaced in the Y direction (left and right direction in FIG. 4) with respect to the center CT3 of the placing tray 8, as shown in FIG. The temporary storage tray 8 moves in the Y direction (leftward in FIG. 4) against the elasticity of the pair of front and rear coil springs 40, and the center CT3 thereof is matched with the center CT2 of the container gripping member 26. As a result, the wafer transfer container 10 can be accurately positioned in the Y direction. Thereafter, when the container gripping member 26 releases the gripping state of the wafer transport container 10 and retreats, the wafer transport container 10 is raised while remaining on the temporary placement tray 8. At this time, the temporary tray 8 is moved in the Y direction (rightward in FIG. 4) by the elasticity of the pair of front and rear coil springs 40 to the reference position on the housing 3 (the position of the center CT3 in FIG. 4A). Return.

さらに、左側の半導体製造装置2CにはZ方向位置決め機構4Zも組み込まれているので、ウェハ搬送容器10はZ方向においても精度よく位置決めされる。すなわち、中央の半導体製造装置2Bの容器把持部材26に把持されたウェハ搬送容器10を左側の半導体製造装置2Cの仮置きトレイ8に載置するときには、図5に示すように、左側の半導体製造装置2CのZ方向位置決め機構4ZのZ方向停止スイッチ50がウェハ搬送容器10の位置決めを検出すると、その旨の信号を左側の半導体製造装置2CのZ方向位置決め機構4Zの送信機が中央の半導体製造装置2BのZ方向位置決め機構4Zの受信機に無線で送信する。すると、中央の半導体製造装置2BのZ方向位置決め機構4Zの受信機が中央の半導体製造装置2BのZ方向位置決め機構4Zの停止制御装置にその旨の信号を送信する。すると、中央の半導体製造装置2BのZ方向位置決め機構4Zの停止制御装置が、ウェハ搬送容器10の搬送動作を停止させる。その結果、ウェハ搬送容器10をZ方向において精度よく位置決めすることができる。   Furthermore, since the Z-direction positioning mechanism 4Z is also incorporated in the left semiconductor manufacturing apparatus 2C, the wafer transfer container 10 can be accurately positioned in the Z direction. That is, when the wafer transfer container 10 held by the container holding member 26 of the central semiconductor manufacturing apparatus 2B is placed on the temporary storage tray 8 of the left semiconductor manufacturing apparatus 2C, as shown in FIG. When the Z-direction stop switch 50 of the Z-direction positioning mechanism 4Z of the apparatus 2C detects the positioning of the wafer transfer container 10, a signal to that effect is sent from the transmitter of the Z-direction positioning mechanism 4Z of the left semiconductor manufacturing apparatus 2C to the central semiconductor manufacture. It transmits wirelessly to the receiver of the Z direction positioning mechanism 4Z of the apparatus 2B. Then, the receiver of the Z direction positioning mechanism 4Z of the central semiconductor manufacturing apparatus 2B transmits a signal to that effect to the stop control device of the Z direction positioning mechanism 4Z of the central semiconductor manufacturing apparatus 2B. Then, the stop control device for the Z-direction positioning mechanism 4Z of the central semiconductor manufacturing apparatus 2B stops the transfer operation of the wafer transfer container 10. As a result, the wafer transfer container 10 can be accurately positioned in the Z direction.

また、左側の半導体製造装置2Cにおいて、仮置きトレイ8からウェハ搬送容器10を受け取るときには、上述したとおり、図3(b)に示すように、X方向位置決め機構4XのX方向停止スイッチ30がエスケープ機能を発現するので、容器把持部材26の移動を阻害しない。しかも、上述したとおり、容器載置台9と仮置きトレイ8との位置関係は精度よく定められているので、X方向位置決め機構4Xに頼らなくてもウェハ搬送容器10を円滑に受け取ることができる。   Further, when the left semiconductor manufacturing apparatus 2C receives the wafer transfer container 10 from the temporary storage tray 8, as described above, as shown in FIG. 3B, the X-direction stop switch 30 of the X-direction positioning mechanism 4X is escaped. Since the function is expressed, the movement of the container gripping member 26 is not hindered. In addition, as described above, since the positional relationship between the container mounting table 9 and the temporary storage tray 8 is determined with high accuracy, the wafer transfer container 10 can be received smoothly without relying on the X-direction positioning mechanism 4X.

最後に、第3処理工程に移行し、左側の半導体製造装置2Cにおいて、半導体ウェハが、容器載置台9から搬入されて装置前室6を経て処理室5に搬送され、処理室5で所定の処理が施された後、処理室5から装置前室6を経て容器載置台9に戻されて搬出される。   Finally, the process proceeds to the third processing step, and in the semiconductor manufacturing apparatus 2C on the left side, the semiconductor wafer is carried from the container mounting table 9 and transferred to the processing chamber 5 through the front chamber 6 of the apparatus. After the processing, the processing chamber 5 returns to the container mounting table 9 through the front chamber 6 and is carried out.

ここで、半導体ウェハに対する一連の製造プロセスが終了する。   Here, a series of manufacturing processes for the semiconductor wafer is completed.

なお、上述した一連の製造プロセスでは、ウェハ搬送容器10を順送りで搬送しつつ半導体ウェハに一連の製造プロセスを施す場合の手順について説明したが、この順送りの他にも任意の順番でウェハ搬送容器10を搬送しつつ半導体ウェハに一連の製造プロセスを施すことが可能である。   In the series of manufacturing processes described above, the procedure in the case of performing a series of manufacturing processes on the semiconductor wafer while transporting the wafer transfer container 10 in the forward feed has been described. However, in addition to this forward feed, the wafer transport container in an arbitrary order. It is possible to perform a series of manufacturing processes on the semiconductor wafer while carrying 10.

例えば、生産ライン1において、上述した順送りと逆の手順により、左側の半導体製造装置2Cから中央の半導体製造装置2Bを経て右側の半導体製造装置2Aへ逆送りでウェハ搬送容器10を搬送しつつ半導体ウェハに一連の製造プロセスを施すこともできる。   For example, in the production line 1, the semiconductor is transported while transporting the wafer transport container 10 by back feeding from the semiconductor manufacturing apparatus 2 C on the left side to the semiconductor manufacturing apparatus 2 A on the right side from the semiconductor manufacturing apparatus 2 B on the left side by the procedure reverse to the above-described forward feeding. The wafer can be subjected to a series of manufacturing processes.

また、生産ライン1において、左側の半導体製造装置2C、右側の半導体製造装置2A、中央の半導体製造装置2Bの順番でウェハ搬送容器10を搬送しつつ半導体ウェハに一連の製造プロセスを施すことも可能である。この場合、左側の半導体製造装置2Cから右側の半導体製造装置2Aへウェハ搬送容器10を搬送する際には、左側の半導体製造装置2Cから中央の半導体製造装置2Bを経由して右側の半導体製造装置2Aへウェハ搬送容器10を搬送すればよい。   In the production line 1, it is also possible to perform a series of manufacturing processes on the semiconductor wafer while transporting the wafer transport container 10 in the order of the left semiconductor manufacturing apparatus 2C, the right semiconductor manufacturing apparatus 2A, and the central semiconductor manufacturing apparatus 2B. It is. In this case, when the wafer transfer container 10 is transferred from the left semiconductor manufacturing apparatus 2C to the right semiconductor manufacturing apparatus 2A, the right semiconductor manufacturing apparatus passes from the left semiconductor manufacturing apparatus 2C through the central semiconductor manufacturing apparatus 2B. The wafer transfer container 10 may be transferred to 2A.

以上説明したとおり、半導体ウェハに対する一連の製造プロセスにおいては、生産ライン1を構成する3個の半導体製造装置2の容器搬送手段12が相互に連携することにより、これらの半導体製造装置2間でウェハ搬送容器10が搬送される。その結果、3個の半導体製造装置2間でウェハ搬送容器10を自動的に搬送することができ、半導体ウェハに対する一連の製造プロセスを効率よく進めることが可能となる。   As described above, in a series of manufacturing processes for semiconductor wafers, the container transfer means 12 of the three semiconductor manufacturing apparatuses 2 constituting the production line 1 cooperate with each other, so that the wafers are connected between these semiconductor manufacturing apparatuses 2. The transport container 10 is transported. As a result, the wafer transfer container 10 can be automatically transferred between the three semiconductor manufacturing apparatuses 2, and a series of manufacturing processes for semiconductor wafers can be efficiently advanced.

また、各半導体製造装置2はそれぞれ仮置きトレイ8が設けられているため、生産ライン1で複数の半導体ウェハを連続的に処理する場合に、各半導体ウェハに対する一連の製造プロセスの途中でウェハ搬送容器10を仮置きトレイ8に仮置きすることにより、容器搬送手段12の待機時間、ひいては、すべての半導体ウェハに対する一連の製造プロセス全体の所要時間を短縮することができる。   In addition, since each semiconductor manufacturing apparatus 2 is provided with a temporary tray 8, when a plurality of semiconductor wafers are continuously processed on the production line 1, the wafer is transported during a series of manufacturing processes for each semiconductor wafer. By temporarily placing the container 10 on the temporary placing tray 8, it is possible to shorten the standby time of the container conveying means 12, and thus the time required for the entire series of manufacturing processes for all semiconductor wafers.

しかも、各半導体製造装置2が容器搬送手段12および仮置きトレイ8を備え、さらに、複数の半導体製造装置2間で発生しうる位置ずれを吸収するための位置決め機構4が組み込まれているため、床面の波打ち等に起因して複数の半導体製造装置2間で若干の位置ずれがあっても、これらの半導体製造装置2間でウェハ搬送容器10を確実に搬送することができる。   In addition, each semiconductor manufacturing apparatus 2 includes a container transport unit 12 and a temporary tray 8, and further includes a positioning mechanism 4 for absorbing a positional shift that may occur between the plurality of semiconductor manufacturing apparatuses 2. Even if there is a slight misalignment between the plurality of semiconductor manufacturing apparatuses 2 due to corrugation of the floor surface, the wafer transfer container 10 can be reliably transferred between these semiconductor manufacturing apparatuses 2.

また、容器搬送手段12は、上述したとおり、その非使用時には、その半導体製造装置2の筐体3の直方体状の外形線LNから前方にも左右方向にも食み出さない状態で凹部7に収納されているので、3個の半導体製造装置2を並設して生産ライン1を構築するときには、これらの半導体製造装置2の据え付け作業や取り替え作業を円滑に行うことができる。   Further, as described above, the container transporting unit 12 is in the recess 7 in a state in which it does not protrude forward or leftward and rightward from the rectangular outer shape line LN of the housing 3 of the semiconductor manufacturing apparatus 2 when not in use. Since they are housed, when the production line 1 is constructed by arranging the three semiconductor manufacturing apparatuses 2 side by side, the installation and replacement of these semiconductor manufacturing apparatuses 2 can be performed smoothly.

さらに、容器搬送手段12は、上述したとおり、その使用時には、その半導体製造装置2および隣の半導体製造装置2の筐体3の直方体状の外形線LNから前方へ突出しないようになっているので、容器搬送手段12を用いて半導体製造装置2間でウェハ搬送容器10を搬送するときに、この容器搬送手段12が作業者の邪魔になる事態を回避することができる。   Further, as described above, the container transport means 12 does not protrude forward from the rectangular parallelepiped LN of the housing 3 of the semiconductor manufacturing apparatus 2 and the adjacent semiconductor manufacturing apparatus 2 when used. When the wafer transfer container 10 is transferred between the semiconductor manufacturing apparatuses 2 using the container transfer means 12, it is possible to avoid a situation where the container transfer means 12 interferes with the operator.

また、各半導体製造装置2の筐体3には、上述したとおり、筐体3を床面16上の所定位置に位置決めする位置決め手段13が設けられているので、半導体製造装置2を床面16上に設置すると同時に、この半導体製造装置2の位置決めを行うことができ、半導体製造装置2の位置調節作業を別途行う必要はない。   Further, as described above, the housing 3 of each semiconductor manufacturing apparatus 2 is provided with positioning means 13 for positioning the housing 3 at a predetermined position on the floor surface 16, so that the semiconductor manufacturing apparatus 2 is placed on the floor surface 16. Simultaneously with the installation, the semiconductor manufacturing apparatus 2 can be positioned, and there is no need to separately adjust the position of the semiconductor manufacturing apparatus 2.

さらに、ウェハ搬送容器10の搬送中においては、半導体ウェハは、常にウェハ搬送容器10内に密閉状態で収容されているので、空気中の微粒子がウェハ搬送容器10内に侵入して半導体ウェハに付着する恐れはない。そのため、生産ライン1全体を密閉する必要がなく、生産ライン1を低廉に構築することができる。   Furthermore, during the transfer of the wafer transfer container 10, the semiconductor wafer is always stored in a sealed state in the wafer transfer container 10, so that fine particles in the air enter the wafer transfer container 10 and adhere to the semiconductor wafer. There is no fear of doing. Therefore, it is not necessary to seal the entire production line 1 and the production line 1 can be constructed at a low cost.

[発明のその他の実施の形態]
なお、上述した実施の形態1では、第1搬送工程において、右側の半導体製造装置2Aの容器把持部材26に把持されたウェハ搬送容器10がX方向における基準位置に位置決めされたか否かを検出するのに、中央の半導体製造装置2BのX方向位置決め機構4XのX方向停止スイッチ30および送信機を用いる場合について説明した。しかし、この検出動作を右側の半導体製造装置2A自身が行うようにしてもよい。この場合、右側の半導体製造装置2Aと中央の半導体製造装置2Bとの間で信号をやり取りする必要がなくなる利点がある。このことは、第2搬送工程についても同様である。
[Other Embodiments of the Invention]
In the first embodiment described above, in the first transfer process, it is detected whether or not the wafer transfer container 10 held by the container holding member 26 of the right semiconductor manufacturing apparatus 2A is positioned at the reference position in the X direction. However, the case where the X direction stop switch 30 and the transmitter of the X direction positioning mechanism 4X of the central semiconductor manufacturing apparatus 2B are used has been described. However, this detection operation may be performed by the right semiconductor manufacturing apparatus 2A itself. In this case, there is an advantage that it is not necessary to exchange signals between the right semiconductor manufacturing apparatus 2A and the central semiconductor manufacturing apparatus 2B. The same applies to the second transport step.

また、上述した実施の形態1では、第1搬送工程において、右側の半導体製造装置2Aの容器把持部材26に把持されたウェハ搬送容器10がZ方向における基準位置に位置決めされたか否かを検出するのに、中央の半導体製造装置2BのZ方向位置決め機構4ZのZ方向停止スイッチ50および送信機を用いる場合について説明した。しかし、この検出動作を右側の半導体製造装置2A自身が行うようにしてもよい。この場合、右側の半導体製造装置2Aと中央の半導体製造装置2Bとの間で信号をやり取りする必要がなくなる利点がある。このことは、第2搬送工程についても同様である。   In the first embodiment described above, in the first transfer step, it is detected whether or not the wafer transfer container 10 held by the container holding member 26 of the right semiconductor manufacturing apparatus 2A is positioned at the reference position in the Z direction. However, the case where the Z direction stop switch 50 of the Z direction positioning mechanism 4Z of the central semiconductor manufacturing apparatus 2B and the transmitter are used has been described. However, this detection operation may be performed by the right semiconductor manufacturing apparatus 2A itself. In this case, there is an advantage that it is not necessary to exchange signals between the right semiconductor manufacturing apparatus 2A and the central semiconductor manufacturing apparatus 2B. The same applies to the second transport step.

また、上述した実施の形態1において、左右一対の螺旋状の定荷重ばね(図示せず)で容器搬送手段12を昇降自在に支持するようにしても構わない。この場合、定荷重ばねが伸縮しても荷重がほぼ一定となるため、容器搬送手段12の昇降動作を円滑にすることができる。   Moreover, in Embodiment 1 mentioned above, you may make it support the container conveyance means 12 so that raising / lowering is possible by a pair of left and right spiral constant load springs (not shown). In this case, since the load becomes substantially constant even when the constant load spring expands and contracts, the lifting and lowering operation of the container transport means 12 can be made smooth.

また、上述した実施の形態1では、3個の半導体製造装置2からなる生産ライン1について説明したが、生産ライン1を構成する半導体製造装置2の個数は、3個に限るわけではなく、複数(2個以上)であれば何個でも構わない。   In the first embodiment described above, the production line 1 including the three semiconductor manufacturing apparatuses 2 has been described. However, the number of the semiconductor manufacturing apparatuses 2 constituting the production line 1 is not limited to three, and a plurality of semiconductor manufacturing apparatuses 2 may be used. Any number can be used as long as it is (two or more).

また、上述した実施の形態1では、本発明を小口径の半導体ウェハに適用する場合について説明したが、8インチや12インチ等の大口径の半導体ウェハ等にも本発明を同様に適用することができる。   Further, in the above-described first embodiment, the case where the present invention is applied to a small-diameter semiconductor wafer has been described, but the present invention is similarly applied to a large-diameter semiconductor wafer such as 8 inches or 12 inches. Can do.

さらに、上述した実施の形態1では、半導体ウェハを用いる半導体製造装置2を例に採って説明したが、本発明は、他の種類の基板(例えば、サファイア基板などの絶縁性基板や、アルミニウム基板などの導電性基板)や、非円盤形状(例えば、矩形)の処理基板からデバイスを製造する製造装置にも同様に適用することができる。   Further, in the first embodiment described above, the semiconductor manufacturing apparatus 2 using a semiconductor wafer has been described as an example. However, the present invention is applicable to other types of substrates (for example, an insulating substrate such as a sapphire substrate, an aluminum substrate, etc. The present invention can be similarly applied to a manufacturing apparatus for manufacturing a device from a non-disk-shaped (for example, rectangular) processing substrate.

本発明は、半導体製造装置のみならず、様々な分野で多品種少量生産をする生産ラインに広く適用することができる。   The present invention can be widely applied not only to a semiconductor manufacturing apparatus but also to a production line for producing various kinds and small quantities in various fields.

1……生産ライン
2……半導体製造装置(小型製造装置)
3……筐体
4……位置決め機構
5……処理室
6……装置前室
7……凹部
8……仮置きトレイ
9……容器載置台
10……ウェハ搬送容器(基板搬送容器)
11……底板
12……容器搬送手段
13……位置決め手段
14……容器搬送経路
22……X軸モータ(アーム駆動装置)
26……容器把持部材
27……搬送アーム
30……X方向停止スイッチ
40……コイルスプリング(トレイ揺動手段)
41……ガイド部材
50……Z方向停止スイッチ
1 ... Production line 2 ... Semiconductor manufacturing equipment (small manufacturing equipment)
3 ... Case 4 ... Positioning mechanism 5 ... Processing chamber 6 ... Front chamber 7 ... Recess 8 ... Temporary tray 9 ... Container mounting table 10 ... Wafer transfer container (substrate transfer container)
DESCRIPTION OF SYMBOLS 11 ... Bottom plate 12 ... Container conveyance means 13 ... Positioning means 14 ... Container conveyance path 22 ... X-axis motor (arm drive device)
26 …… Container gripping member 27 …… Transfer arm 30 …… X direction stop switch 40 …… Coil spring (tray swinging means)
41 …… Guide member 50 …… Z direction stop switch

Claims (7)

処理室および装置前室が筐体の内部に配設され、
前記筐体に凹部が形成され、
この凹部に、処理基板が収容された基板搬送容器を載置するための容器載置台が設けられ、
前記処理基板を処理する際には、この処理基板が、前記容器載置台から搬入されて前記装置前室を経て前記処理室に搬送され、この処理室で処理された後、この処理室から前記装置前室を経て前記容器載置台に戻されて搬出される小型製造装置であって、
前記凹部には、前記基板搬送容器を一時的に保持する仮置きトレイと、この仮置きトレイと前記容器載置台との間で前記基板搬送容器を搬送する容器搬送手段とが設けられ、
前記容器搬送手段は、前記小型製造装置が複数並設されたときに、任意の小型製造装置の前記容器載置台と当該小型製造装置に隣接する小型製造装置の前記仮置きトレイとの間で前記基板搬送容器を搬送しうるように構成され、
前記容器搬送手段によって前記基板搬送容器が前記仮置きトレイに載置されるときに、当該基板搬送容器を当該仮置きトレイ上の基準位置に位置決めする位置決め機構が組み込まれていることを特徴とする小型製造装置。
The processing chamber and the front chamber of the apparatus are disposed inside the housing,
A recess is formed in the housing,
In this recess, a container mounting table for mounting a substrate transfer container in which a processing substrate is stored is provided,
When processing the processing substrate, the processing substrate is carried from the container mounting table, transferred to the processing chamber through the front chamber of the apparatus, processed in the processing chamber, and then from the processing chamber to the processing chamber. It is a small manufacturing apparatus that is returned to the container mounting table through the front chamber of the apparatus and carried out,
The recess is provided with a temporary tray that temporarily holds the substrate transport container, and a container transport unit that transports the substrate transport container between the temporary tray and the container mounting table.
When the plurality of small manufacturing apparatuses are arranged side by side, the container transporting unit is configured such that the container placing table is disposed between the container mounting table of an arbitrary small manufacturing apparatus and the temporary storage tray of the small manufacturing apparatus adjacent to the small manufacturing apparatus. It is configured to be able to transport the substrate transport container,
A positioning mechanism is incorporated to position the substrate transport container at a reference position on the temporary placement tray when the substrate transport container is placed on the temporary placement tray by the container transport means. Small manufacturing equipment.
前記位置決め機構は、前記基板搬送容器が、前記筐体の幅方向であるX方向における前記仮置きトレイ上の基準位置に位置決めされたか否かを検出するX方向停止スイッチと、このX方向停止スイッチによって前記基板搬送容器がX方向における前記仮置きトレイ上の基準位置に位置決めされたと検出された場合に、その旨の信号を送信する送信機と、前記基板搬送容器がX方向における前記仮置きトレイ上の基準位置に位置決めされた旨の信号を受信する受信機と、この受信機からの信号に基づいて前記容器搬送手段による前記基板搬送容器の搬送動作を停止させる停止制御装置とからなるX方向位置決め機構を含んでいることを特徴とする請求項1に記載の小型製造装置。   The positioning mechanism includes an X-direction stop switch that detects whether or not the substrate transport container is positioned at a reference position on the temporary storage tray in the X direction that is the width direction of the housing, and the X-direction stop switch. When it is detected that the substrate transport container is positioned at a reference position on the temporary placement tray in the X direction, a transmitter that transmits a signal to that effect, and the temporary transport tray in which the substrate transport container is in the X direction X direction comprising a receiver for receiving a signal indicating that it has been positioned at the upper reference position, and a stop control device for stopping the transfer operation of the substrate transfer container by the container transfer means based on the signal from the receiver The small-sized manufacturing apparatus according to claim 1, further comprising a positioning mechanism. 前記容器搬送手段は、前記筐体に対してX方向に移動自在に取り付けられた搬送アームと、この搬送アームをX方向に駆動するアーム駆動装置と、前記搬送アームに対してX方向に移動自在に取り付けられ、前記基板搬送容器を着脱自在に把持する容器把持部材とを有することを特徴とする請求項1または2に記載の小型製造装置。   The container transport means is a transport arm attached to the housing so as to be movable in the X direction, an arm driving device for driving the transport arm in the X direction, and movable in the X direction with respect to the transport arm. 3. The small-sized manufacturing apparatus according to claim 1, further comprising: a container gripping member that is attached to the substrate and detachably grips the substrate transport container. 前記容器把持部材は、前記搬送アームのX方向の移動に連動してX方向に移動するように構成され、
前記搬送アームと前記容器把持部材との間には、当該搬送アームのX方向の移動を増速して当該容器把持部材に伝える増速機構が設けられていることを特徴とする請求項3に記載の小型製造装置。
The container gripping member is configured to move in the X direction in conjunction with the movement of the transfer arm in the X direction,
The speed increasing mechanism which accelerates | stimulates the movement of the said conveyance arm to the X direction of the said conveyance arm and transmits to the said container holding member between the said conveyance arm and the said container holding member is provided. Small manufacturing apparatus as described
前記容器搬送手段は、前記筐体に定荷重ばねを介して昇降自在に支持されていることを特徴とする請求項1乃至4のいずれかに記載の小型製造装置。   The small-sized manufacturing apparatus according to any one of claims 1 to 4, wherein the container transport unit is supported by the casing so as to be movable up and down via a constant load spring. 前記位置決め機構は、前記筐体の奥行き方向であるY方向における筐体上の基準位置を中心として前記仮置きトレイをY方向に弾性的に揺動させるトレイ揺動手段と、前記容器搬送手段によって前記基板搬送容器を前記仮置きトレイに載置するときに、当該仮置きトレイをY方向にガイドして当該基板搬送容器を当該仮置きトレイ上の基準位置に位置決めするガイド部材とからなるY方向位置決め機構を含んでいることを特徴とする請求項1乃至5のいずれかに記載の小型製造装置。   The positioning mechanism includes tray swinging means for elastically swinging the temporary tray in the Y direction around a reference position on the casing in the Y direction which is the depth direction of the casing, and the container transporting means. A Y-direction comprising a guide member for guiding the temporary storage tray in the Y direction and positioning the substrate transfer container at a reference position on the temporary storage tray when the substrate transfer container is placed on the temporary storage tray. The small-sized manufacturing apparatus according to claim 1, further comprising a positioning mechanism. 前記位置決め機構は、前記基板搬送容器が、前記筐体の高さ方向であるZ方向における前記仮置きトレイ上の基準位置に位置決めされたか否かを検出するZ方向停止スイッチと、このZ方向停止スイッチによって前記基板搬送容器がZ方向における前記仮置きトレイ上の基準位置に位置決めされたと検出された場合に、その旨の信号を送信する送信機と、前記基板搬送容器がZ方向における前記仮置きトレイ上の基準位置に位置決めされた旨の信号を受信する受信機と、この受信機からの信号に基づいて前記容器搬送手段による前記基板搬送容器の搬送動作を停止させる停止制御装置とからなるZ方向位置決め機構を含んでいることを特徴とする請求項1乃至6のいずれかに記載の小型製造装置。   The positioning mechanism includes a Z-direction stop switch that detects whether or not the substrate transport container is positioned at a reference position on the temporary storage tray in the Z direction, which is the height direction of the housing, and the Z-direction stop When the switch detects that the substrate transport container is positioned at the reference position on the temporary placement tray in the Z direction, the transmitter transmits a signal to that effect, and the temporary placement of the substrate transport container in the Z direction. Z comprising: a receiver that receives a signal indicating that it is positioned at a reference position on the tray; and a stop control device that stops the transport operation of the substrate transport container by the container transport means based on the signal from the receiver. The small manufacturing apparatus according to claim 1, further comprising a direction positioning mechanism.
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