JP6411493B2 - フレキソ印刷フォームの製造方法 - Google Patents

フレキソ印刷フォームの製造方法 Download PDF

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Publication number
JP6411493B2
JP6411493B2 JP2016526555A JP2016526555A JP6411493B2 JP 6411493 B2 JP6411493 B2 JP 6411493B2 JP 2016526555 A JP2016526555 A JP 2016526555A JP 2016526555 A JP2016526555 A JP 2016526555A JP 6411493 B2 JP6411493 B2 JP 6411493B2
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Japan
Prior art keywords
embossing
flexographic printing
layer
plate
embossing device
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JP2016526555A
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English (en)
Japanese (ja)
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JP2016526708A (ja
JP2016526708A5 (https=
Inventor
フロンツキーヴィチ，ピーター
ベッカー，アルミン
Original Assignee
フリント、グループ、ジャーマニー、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツング
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
JP2016526555A 2013-07-15 2014-07-14 フレキソ印刷フォームの製造方法 Active JP6411493B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13176465 2013-07-15
EP13176465.6 2013-07-15
PCT/EP2014/065001 WO2015007667A1 (en) 2013-07-15 2014-07-14 Process of manufacturing flexographic printing forms

Publications (3)

Publication Number Publication Date
JP2016526708A JP2016526708A (ja) 2016-09-05
JP2016526708A5 JP2016526708A5 (https=) 2018-09-27
JP6411493B2 true JP6411493B2 (ja) 2018-10-24

Family

ID=48793035

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016526555A Active JP6411493B2 (ja) 2013-07-15 2014-07-14 フレキソ印刷フォームの製造方法

Country Status (8)

Country Link
US (1) US9671695B2 (https=)
EP (1) EP3022606B1 (https=)
JP (1) JP6411493B2 (https=)
CN (1) CN105531628B (https=)
BR (1) BR112016000713B1 (https=)
ES (1) ES2638783T3 (https=)
MX (1) MX347930B (https=)
WO (1) WO2015007667A1 (https=)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6542202B2 (ja) 2013-09-18 2019-07-10 フリント、グループ、ジャーマニー、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツング デジタル的に露光可能なフレキソ印刷要素、及びフレキソ印刷版を生産するための方法
US9256129B2 (en) * 2014-02-19 2016-02-09 Macdermid Printing Solutions, Llc Method for creating surface texture on flexographic printing elements
MX374316B (es) 2014-08-28 2025-03-06 Flint Group Germany Gmbh Dispositivo y metodo para producir placas de impresion flexografica.
EP3054352B1 (de) 2015-02-06 2017-11-08 Flint Group Germany GmbH Automatisierte uv-led belichtung von flexodruckplatten
US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
US10036956B2 (en) * 2016-05-03 2018-07-31 Macdermid Graphics Solutions, Llc Method of making relief image printing elements
DE20213034T1 (de) 2017-07-20 2021-06-24 Esko-Graphics Imaging Gmbh System und verfahren zur direkten härtung von photopolymerdruckplatten
ES2957695T3 (es) * 2017-12-08 2024-01-24 Flint Group Germany Gmbh Procedimiento para identificar un precursor de relieve que permite producir una estructura en relieve
US11724533B2 (en) 2018-04-06 2023-08-15 Esko-Graphics Imaging Gmbh System and process for persistent marking of flexo plates and plates marked therewith
DE212019000246U1 (de) 2018-04-06 2020-11-11 Esko-Graphics Imaging Gmbh System zum Herstellen einer Flexoplatte, Flexoplatte computerlesbares Medium, Flexoplatte-Bearbeitungsmaschine und Lesegerät für eine Verwendung in einem Verfahren zur Herstellung einer Flexoplatte
CN109454973B (zh) * 2018-11-15 2021-01-12 安徽原上草节能环保科技有限公司 柔性印刷版的处理方法
WO2020123650A1 (en) 2018-12-11 2020-06-18 Dupont Electronics, Inc. Flexographic printing form precursor and a method for making the precursor
EP4042245B1 (en) 2019-10-07 2023-09-27 Esko-Graphics Imaging GmbH System and process for persistent marking of flexo plates and plates marked therewith
CN110936701B (zh) * 2019-12-30 2022-04-08 杭州全为包装印刷有限公司 柔印渐变印刷用柔性板处理工艺
IT202000010171A1 (it) * 2020-05-08 2021-11-08 G M C Di G Maccaferri E Claudio Snc Apparato di trasferimento, fissaggio e lucidatura di immagini stampate su superfici in plastica o in metallo di oggetti tridimensionali
CN118660815A (zh) 2021-12-07 2024-09-17 艾司科软件有限公司 用于柔性版印刷板的人字形微结构表面图案
CN116213229B (zh) * 2023-02-15 2024-03-19 苏大维格(盐城)光电科技有限公司 深纹路镭射膜的制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5262275A (en) 1992-08-07 1993-11-16 E. I. Du Pont De Nemours And Company Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate
DE19859623A1 (de) * 1998-12-23 2000-08-24 Basf Drucksysteme Gmbh Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen
EP1069475B1 (en) 1999-07-13 2002-09-18 BASF Drucksysteme GmbH Flexographic printing element comprising an IR-ablatable layer with high sensitivity
SE515607C2 (sv) * 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
US20030129533A1 (en) * 2001-12-14 2003-07-10 Creo Products, Inc. Photosensitive flexographic device with associated addressable mask
US20040234886A1 (en) 2003-03-12 2004-11-25 Rudolph Michael Lee Photosensitive element for use as flexographic printing plate
US7279254B2 (en) 2005-05-16 2007-10-09 Eastman Kodak Company Method of making an article bearing a relief image using a removable film
US20090084278A1 (en) * 2007-10-02 2009-04-02 R Tape Corporation Process for making metalized micro-embossed films
US8236479B2 (en) 2008-01-23 2012-08-07 E I Du Pont De Nemours And Company Method for printing a pattern on a substrate
US8227769B2 (en) 2008-05-27 2012-07-24 Esko-Graphics Imaging Gmbh Curing of photo-curable printing plates with flat tops or round tops
US8739701B2 (en) 2008-07-31 2014-06-03 Ryan Vest Method and apparatus for thermal processing of photosensitive printing elements
US8399177B2 (en) * 2008-12-08 2013-03-19 Eastman Kodak Company Enhanced relief printing plate
US8158331B2 (en) 2009-10-01 2012-04-17 Recchia David A Method of improving print performance in flexographic printing plates
US9720326B2 (en) * 2009-10-01 2017-08-01 David A. Recchia Method of improving print performance in flexographic printing plates
DE102010031527A1 (de) 2010-07-19 2012-01-19 Flint Group Germany Gmbh Verfahren zur Herstellung von Flexodruckformen umfassend die Bestrahlung mit UV-LEDs

Also Published As

Publication number Publication date
BR112016000713A2 (https=) 2017-07-25
MX347930B (es) 2017-05-19
MX2016000337A (es) 2016-05-05
US9671695B2 (en) 2017-06-06
JP2016526708A (ja) 2016-09-05
US20160154308A1 (en) 2016-06-02
CN105531628A (zh) 2016-04-27
CN105531628B (zh) 2018-04-20
ES2638783T3 (es) 2017-10-24
EP3022606A1 (en) 2016-05-25
WO2015007667A1 (en) 2015-01-22
EP3022606B1 (en) 2017-05-31
BR112016000713B1 (pt) 2022-02-08

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