BR112016000713B1 - Processo de fabricação de formas de transferência - Google Patents
Processo de fabricação de formas de transferência Download PDFInfo
- Publication number
- BR112016000713B1 BR112016000713B1 BR112016000713-1A BR112016000713A BR112016000713B1 BR 112016000713 B1 BR112016000713 B1 BR 112016000713B1 BR 112016000713 A BR112016000713 A BR 112016000713A BR 112016000713 B1 BR112016000713 B1 BR 112016000713B1
- Authority
- BR
- Brazil
- Prior art keywords
- transfer
- embossing
- process according
- light
- layer
- Prior art date
Links
- 238000012546 transfer Methods 0.000 title claims abstract description 169
- 238000004519 manufacturing process Methods 0.000 title abstract description 8
- 238000004049 embossing Methods 0.000 claims abstract description 103
- 238000000034 method Methods 0.000 claims abstract description 68
- 230000008569 process Effects 0.000 claims abstract description 49
- 238000010438 heat treatment Methods 0.000 claims description 14
- 238000007639 printing Methods 0.000 claims description 9
- 238000011161 development Methods 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 37
- 239000001301 oxygen Substances 0.000 abstract description 37
- 229910052760 oxygen Inorganic materials 0.000 abstract description 37
- 238000003384 imaging method Methods 0.000 abstract description 13
- 239000007858 starting material Substances 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 61
- 239000007787 solid Substances 0.000 description 25
- 239000000758 substrate Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 9
- 230000007246 mechanism Effects 0.000 description 9
- 230000005764 inhibitory process Effects 0.000 description 8
- 230000005855 radiation Effects 0.000 description 8
- 230000008901 benefit Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- -1 polyethylene Polymers 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000007717 exclusion Effects 0.000 description 3
- 238000009499 grossing Methods 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000010023 transfer printing Methods 0.000 description 2
- ROGIWVXWXZRRMZ-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1 ROGIWVXWXZRRMZ-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 238000009459 flexible packaging Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000010147 laser engraving Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000346 polystyrene-polyisoprene block-polystyrene Polymers 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13176465 | 2013-07-15 | ||
| EP13176465.6 | 2013-07-15 | ||
| PCT/EP2014/065001 WO2015007667A1 (en) | 2013-07-15 | 2014-07-14 | Process of manufacturing flexographic printing forms |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR112016000713A2 BR112016000713A2 (https=) | 2017-07-25 |
| BR112016000713B1 true BR112016000713B1 (pt) | 2022-02-08 |
Family
ID=48793035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR112016000713-1A BR112016000713B1 (pt) | 2013-07-15 | 2014-07-14 | Processo de fabricação de formas de transferência |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9671695B2 (https=) |
| EP (1) | EP3022606B1 (https=) |
| JP (1) | JP6411493B2 (https=) |
| CN (1) | CN105531628B (https=) |
| BR (1) | BR112016000713B1 (https=) |
| ES (1) | ES2638783T3 (https=) |
| MX (1) | MX347930B (https=) |
| WO (1) | WO2015007667A1 (https=) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6542202B2 (ja) | 2013-09-18 | 2019-07-10 | フリント、グループ、ジャーマニー、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツング | デジタル的に露光可能なフレキソ印刷要素、及びフレキソ印刷版を生産するための方法 |
| US9256129B2 (en) * | 2014-02-19 | 2016-02-09 | Macdermid Printing Solutions, Llc | Method for creating surface texture on flexographic printing elements |
| MX374316B (es) | 2014-08-28 | 2025-03-06 | Flint Group Germany Gmbh | Dispositivo y metodo para producir placas de impresion flexografica. |
| EP3054352B1 (de) | 2015-02-06 | 2017-11-08 | Flint Group Germany GmbH | Automatisierte uv-led belichtung von flexodruckplatten |
| US10732507B2 (en) | 2015-10-26 | 2020-08-04 | Esko-Graphics Imaging Gmbh | Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof |
| US10036956B2 (en) * | 2016-05-03 | 2018-07-31 | Macdermid Graphics Solutions, Llc | Method of making relief image printing elements |
| DE20213034T1 (de) | 2017-07-20 | 2021-06-24 | Esko-Graphics Imaging Gmbh | System und verfahren zur direkten härtung von photopolymerdruckplatten |
| ES2957695T3 (es) * | 2017-12-08 | 2024-01-24 | Flint Group Germany Gmbh | Procedimiento para identificar un precursor de relieve que permite producir una estructura en relieve |
| US11724533B2 (en) | 2018-04-06 | 2023-08-15 | Esko-Graphics Imaging Gmbh | System and process for persistent marking of flexo plates and plates marked therewith |
| DE212019000246U1 (de) | 2018-04-06 | 2020-11-11 | Esko-Graphics Imaging Gmbh | System zum Herstellen einer Flexoplatte, Flexoplatte computerlesbares Medium, Flexoplatte-Bearbeitungsmaschine und Lesegerät für eine Verwendung in einem Verfahren zur Herstellung einer Flexoplatte |
| CN109454973B (zh) * | 2018-11-15 | 2021-01-12 | 安徽原上草节能环保科技有限公司 | 柔性印刷版的处理方法 |
| WO2020123650A1 (en) | 2018-12-11 | 2020-06-18 | Dupont Electronics, Inc. | Flexographic printing form precursor and a method for making the precursor |
| EP4042245B1 (en) | 2019-10-07 | 2023-09-27 | Esko-Graphics Imaging GmbH | System and process for persistent marking of flexo plates and plates marked therewith |
| CN110936701B (zh) * | 2019-12-30 | 2022-04-08 | 杭州全为包装印刷有限公司 | 柔印渐变印刷用柔性板处理工艺 |
| IT202000010171A1 (it) * | 2020-05-08 | 2021-11-08 | G M C Di G Maccaferri E Claudio Snc | Apparato di trasferimento, fissaggio e lucidatura di immagini stampate su superfici in plastica o in metallo di oggetti tridimensionali |
| CN118660815A (zh) | 2021-12-07 | 2024-09-17 | 艾司科软件有限公司 | 用于柔性版印刷板的人字形微结构表面图案 |
| CN116213229B (zh) * | 2023-02-15 | 2024-03-19 | 苏大维格(盐城)光电科技有限公司 | 深纹路镭射膜的制备方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5262275A (en) | 1992-08-07 | 1993-11-16 | E. I. Du Pont De Nemours And Company | Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate |
| DE19859623A1 (de) * | 1998-12-23 | 2000-08-24 | Basf Drucksysteme Gmbh | Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen |
| EP1069475B1 (en) | 1999-07-13 | 2002-09-18 | BASF Drucksysteme GmbH | Flexographic printing element comprising an IR-ablatable layer with high sensitivity |
| SE515607C2 (sv) * | 1999-12-10 | 2001-09-10 | Obducat Ab | Anordning och metod vid tillverkning av strukturer |
| US20030129533A1 (en) * | 2001-12-14 | 2003-07-10 | Creo Products, Inc. | Photosensitive flexographic device with associated addressable mask |
| US20040234886A1 (en) | 2003-03-12 | 2004-11-25 | Rudolph Michael Lee | Photosensitive element for use as flexographic printing plate |
| US7279254B2 (en) | 2005-05-16 | 2007-10-09 | Eastman Kodak Company | Method of making an article bearing a relief image using a removable film |
| US20090084278A1 (en) * | 2007-10-02 | 2009-04-02 | R Tape Corporation | Process for making metalized micro-embossed films |
| US8236479B2 (en) | 2008-01-23 | 2012-08-07 | E I Du Pont De Nemours And Company | Method for printing a pattern on a substrate |
| US8227769B2 (en) | 2008-05-27 | 2012-07-24 | Esko-Graphics Imaging Gmbh | Curing of photo-curable printing plates with flat tops or round tops |
| US8739701B2 (en) | 2008-07-31 | 2014-06-03 | Ryan Vest | Method and apparatus for thermal processing of photosensitive printing elements |
| US8399177B2 (en) * | 2008-12-08 | 2013-03-19 | Eastman Kodak Company | Enhanced relief printing plate |
| US8158331B2 (en) | 2009-10-01 | 2012-04-17 | Recchia David A | Method of improving print performance in flexographic printing plates |
| US9720326B2 (en) * | 2009-10-01 | 2017-08-01 | David A. Recchia | Method of improving print performance in flexographic printing plates |
| DE102010031527A1 (de) | 2010-07-19 | 2012-01-19 | Flint Group Germany Gmbh | Verfahren zur Herstellung von Flexodruckformen umfassend die Bestrahlung mit UV-LEDs |
-
2014
- 2014-07-14 US US14/905,527 patent/US9671695B2/en active Active
- 2014-07-14 EP EP14739418.3A patent/EP3022606B1/en active Active
- 2014-07-14 ES ES14739418.3T patent/ES2638783T3/es active Active
- 2014-07-14 CN CN201480050140.8A patent/CN105531628B/zh active Active
- 2014-07-14 BR BR112016000713-1A patent/BR112016000713B1/pt active IP Right Grant
- 2014-07-14 JP JP2016526555A patent/JP6411493B2/ja active Active
- 2014-07-14 WO PCT/EP2014/065001 patent/WO2015007667A1/en not_active Ceased
- 2014-07-14 MX MX2016000337A patent/MX347930B/es active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| BR112016000713A2 (https=) | 2017-07-25 |
| MX347930B (es) | 2017-05-19 |
| MX2016000337A (es) | 2016-05-05 |
| US9671695B2 (en) | 2017-06-06 |
| JP2016526708A (ja) | 2016-09-05 |
| JP6411493B2 (ja) | 2018-10-24 |
| US20160154308A1 (en) | 2016-06-02 |
| CN105531628A (zh) | 2016-04-27 |
| CN105531628B (zh) | 2018-04-20 |
| ES2638783T3 (es) | 2017-10-24 |
| EP3022606A1 (en) | 2016-05-25 |
| WO2015007667A1 (en) | 2015-01-22 |
| EP3022606B1 (en) | 2017-05-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
| B350 | Update of information on the portal [chapter 15.35 patent gazette] | ||
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 14/07/2014, OBSERVADAS AS CONDICOES LEGAIS. |
|
| B25D | Requested change of name of applicant approved |
Owner name: XSYS GERMANY GMBH (DE) |
|
| B25G | Requested change of headquarter approved |
Owner name: XSYS GERMANY GMBH (DE) |