JP6394242B2 - Method for producing difluoroionic complex - Google Patents

Method for producing difluoroionic complex Download PDF

Info

Publication number
JP6394242B2
JP6394242B2 JP2014200351A JP2014200351A JP6394242B2 JP 6394242 B2 JP6394242 B2 JP 6394242B2 JP 2014200351 A JP2014200351 A JP 2014200351A JP 2014200351 A JP2014200351 A JP 2014200351A JP 6394242 B2 JP6394242 B2 JP 6394242B2
Authority
JP
Japan
Prior art keywords
fluoride
acid
atom
complex
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014200351A
Other languages
Japanese (ja)
Other versions
JP2016069328A (en
Inventor
幹弘 高橋
幹弘 高橋
孝敬 森中
孝敬 森中
益隆 新免
益隆 新免
渉 河端
渉 河端
誠 久保
誠 久保
寛樹 松崎
寛樹 松崎
建太 山本
建太 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP2014200351A priority Critical patent/JP6394242B2/en
Priority to PCT/JP2015/075405 priority patent/WO2016052092A1/en
Priority to TW104132232A priority patent/TWI595003B/en
Publication of JP2016069328A publication Critical patent/JP2016069328A/en
Application granted granted Critical
Publication of JP6394242B2 publication Critical patent/JP6394242B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6564Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
    • C07F9/6571Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms
    • C07F9/6574Esters of oxyacids of phosphorus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/54Electrolytes
    • H01G11/58Liquid electrolytes
    • H01G11/62Liquid electrolytes characterised by the solute, e.g. salts, anions or cations therein
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/54Electrolytes
    • H01G11/58Liquid electrolytes
    • H01G11/64Liquid electrolytes characterised by additives
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/056Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
    • H01M10/0564Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
    • H01M10/0566Liquid materials
    • H01M10/0567Liquid materials characterised by the additives
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/056Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
    • H01M10/0564Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
    • H01M10/0566Liquid materials
    • H01M10/0568Liquid materials characterised by the solutes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00Other general methods
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Description

本発明は、リチウムイオン電池、ナトリウムイオン電池、リチウム空気電池、リチウム硫黄電池、リチウムイオンキャパシタなどの電気化学デバイスの電極表面を保護するために電解液に添加される添加剤や電解液の支持電解質として利用されるジフルオロイオン性錯体の製造方法に関するものである。   The present invention relates to an additive added to an electrolytic solution and a supporting electrolyte for the electrolytic solution in order to protect the electrode surface of an electrochemical device such as a lithium ion battery, a sodium ion battery, a lithium air battery, a lithium sulfur battery, and a lithium ion capacitor. The present invention relates to a method for producing a difluoroionic complex used as the above.

電気化学デバイスである電池において、近年、情報関連機器、通信機器、即ちパソコン、ビデオカメラ、デジタルカメラ、携帯電話、スマートフォン等の小型、高エネルギー密度用途向けの蓄電システムや、電気自動車、ハイブリッド車、燃料電池車補助電源、電力貯蔵等の大型、パワー用途向けの蓄電システムが注目を集めている。その一つの候補としてリチウムイオン電池、リチウム電池、リチウムイオンキャパシタ等の非水電解液電池が盛んに開発されている   In the battery that is an electrochemical device, in recent years, information-related equipment, communication equipment, that is, personal computers, video cameras, digital cameras, mobile phones, smart phones and other small-sized, high energy density power storage systems, electric vehicles, hybrid vehicles, Storage systems for large and power applications such as fuel cell vehicle auxiliary power supplies and power storage are attracting attention. Non-aqueous electrolyte batteries such as lithium ion batteries, lithium batteries, and lithium ion capacitors have been actively developed as one candidate.

これらの非水電解液電池は既に実用化されているものも多いが、低温時又は充放電を繰り返すこと、更には高温環境下に曝されることで電気容量の低下が起こる。このような理由のため、自動車の電源といったマイナス30℃程度の低温環境、60℃程度の高温環境下や数年間の長期間での使用が求められる用途では、非水電解液電池の性能は充分とは言えない。   Many of these non-aqueous electrolyte batteries have already been put into practical use, but their electric capacity is reduced by repeated charging and discharging at low temperatures or exposure to high temperature environments. For these reasons, the performance of non-aqueous electrolyte batteries is sufficient in applications that require use in a low temperature environment of about minus 30 ° C., a high temperature environment of about 60 ° C., or for a long period of several years, such as automobile power supplies. It can not be said.

リチウムイオン電池の場合、初充電時に負極にリチウムカチオンが挿入される際に、負極とリチウムカチオン、又は負極と電解液溶媒が反応し、負極表面上に酸化リチウムや炭酸リチウム、アルキル炭酸リチウムを主成分とする被膜を形成する。この電極表面上の皮膜はSolid Electrolyte Interface(SEI)と呼ばれ、溶媒の分解を抑制し電池性能の劣化を抑える等、その性質が電池性能に大きな影響を与える。   In the case of a lithium ion battery, when lithium cations are inserted into the negative electrode during the initial charge, the negative electrode and the lithium cation, or the negative electrode and the electrolyte solvent react, and lithium oxide, lithium carbonate, and alkyl lithium carbonate are mainly formed on the negative electrode surface. A coating film as a component is formed. The film on the electrode surface is called Solid Electrolyte Interface (SEI), and its properties have a great influence on the battery performance, such as suppressing the decomposition of the solvent and suppressing the deterioration of the battery performance.

低温時、高温時、又は充放電を繰り返すことによる電気容量の低下を抑制するためには、イオン伝導性が高く、且つ電子伝導性が低く、長期に亘って安定なSEIを形成させることが重要である。そのため、添加剤と称される化合物を電解液中に少量(通常は0.01質量%以上10質量%以下)加え、その一部又は全てを初期充電時に分解させることで、積極的に良好なSEIを形成させる試みが広くなされている。   In order to suppress a decrease in electric capacity due to low temperature, high temperature, or repeated charge / discharge, it is important to form SEI that has high ion conductivity and low electron conductivity and is stable over a long period of time. It is. Therefore, a small amount (usually 0.01% by mass or more and 10% by mass or less) of a compound called an additive is added to the electrolytic solution, and a part or all of the compound is decomposed at the time of initial charging. There have been extensive attempts to form SEI.

例えば、特許文献1ではビニレンカーボネートが、特許文献2では1,3―プロペンスルトンを始めとする不飽和環状スルホン酸エステルが、特許文献3では二酸化炭素が、特許文献4では1,2,3,4−テトラヒドロナフタレンを始めとする芳香族化合物が、特許文献5ではピリジンを始めとする含窒素不飽和化合物が、特許文献6ではビスオキサラトホウ酸リチウムが、特許文献7では配位子としてシュウ酸を有するジフルオロイオン性
酸錯体、テトラフルオロイオン性錯体の混合物が有効なSEIを形成させる添加剤として用いられている。
For example, in Patent Document 1, vinylene carbonate is used. In Patent Document 2, unsaturated cyclic sulfonic acid esters such as 1,3-propene sultone are used. In Patent Document 3, carbon dioxide is used. In Patent Document 4, 1,2,3, Aromatic compounds such as 4-tetrahydronaphthalene, nitrogen-containing unsaturated compounds such as pyridine in Patent Document 5, lithium bisoxalatoborate in Patent Document 6, and oxalic acid as a ligand in Patent Document 7 A mixture of a difluoroionic acid complex having a tetrafluoroionic complex and tetrafluoroionic complex is used as an additive for forming effective SEI.

また、ヘキサフルオロリン酸アニオン、テトラフルオロホウ酸アニオン、ヘキサフルオロ砒酸アニオンの様な、ルイス酸とフッ素イオンが結合したイオン性錯体の金属塩(Li、Na他)がその高い溶解性、高いイオン解離性、そして広い電位窓の観点から電気化学デバイスの電解液の支持電解質として使用されている。   In addition, metal salts (Li, Na, etc.) of ionic complexes in which Lewis acid and fluorine ions are bonded, such as hexafluorophosphate anion, tetrafluoroborate anion and hexafluoroarsenate anion, have high solubility and high ion. From the standpoint of dissociation and wide potential window, it is used as a supporting electrolyte for electrolytes of electrochemical devices.

その中でも、ヘキサフルオロリン酸リチウムは(以下LiPF)は、ヘキサフルオロ砒酸リチウムに比べて毒性が低く、テトラフルオロホウ酸リチウムに比べて溶解性が高いことから特に広く使用されている。 Among them, lithium hexafluorophosphate (hereinafter LiPF 6 ) is particularly widely used because it is less toxic than lithium hexafluoroarsenate and has higher solubility than lithium tetrafluoroborate.

しかし、このLiPFにも、熱安定性が低く加熱によりフッ化リチウム(以下LiF)と五フッ化リン(以下PF)に分解するといった大きな欠点が存在する。LiFは電極表面上に堆積し抵抗成分となることでリチウムイオン電池を始めとするリチウム系電気化学デバイスの性能を低下させ、PFはその強いルイス酸性から電解液溶媒の分解を加速させることが知られている。 However, this LiPF 6 also has a major drawback in that it has low thermal stability and decomposes into lithium fluoride (hereinafter LiF) and phosphorus pentafluoride (hereinafter PF 5 ) by heating. LiF accumulates on the electrode surface and becomes a resistance component, thereby reducing the performance of lithium-based electrochemical devices such as lithium ion batteries, and PF 5 accelerates the decomposition of the electrolyte solvent from its strong Lewis acidity. Are known.

そのため、ヘキサフルオロ砒酸より毒性が低く、テトラフルオロホウ酸リチウムより溶解度が高く、LiPFより熱安定性が高いイオン性錯体の開発が活発に進められており、例えばLiPFのフッ素の一部を、フルオロアルキル基(CF、C)に置き換えたイオン性錯体の利用が特許文献8に、LiPFのフッ素の一部又は全てをシュウ酸に置き換えたイオン性錯体の利用が特許文献9、非特許文献1、2に開示されている。 Therefore, less toxic than hexafluoroarsenate, soluble than lithium tetrafluoroborate is high, LiPF 6 Development of thermal stability is high ionic complex has been actively than, for example, a part of fluorine LiPF 6 The use of an ionic complex in which a fluoroalkyl group (CF 3 , C 2 F 5 ) is replaced is disclosed in Patent Document 8, and the use of an ionic complex in which a part or all of the fluorine of LiPF 6 is replaced with oxalic acid is disclosed in Patent Document 8. 9 and disclosed in Non-Patent Documents 1 and 2.

以上の様に電気化学デバイスの電極表面を保護するために電解液に添加する添加剤として、又は電解液の支持電解質として利用されるイオン性錯体の中でも、特にジフルオロイオン性錯体が優れていることが近年の研究で明らかになってきている。  As described above, among ionic complexes used as an additive to be added to the electrolyte solution to protect the electrode surface of the electrochemical device or as a supporting electrolyte for the electrolyte solution, the difluoroionic complex is particularly excellent. However, recent research has revealed this.

特開平8−045545(特許3573521)号公報JP-A-8-045545 (Japanese Patent No. 3573521) 特開2002−329528(特許4190162)号公報JP 2002-329528 (Patent No. 4190162) 特開平7−176323号公報JP 7-176323 A 特開2003−007334(特許3417411)号公報Japanese Patent Laid-Open No. 2003-007334 (Patent No. 3417411) 特開2003−115324号公報JP 2003-115324 A 特開2007−335143公報JP 2007-335143 A 特開2011−222193(特許5573313)号公報JP 2011-222193 (Patent No. 5573313) 特開2003−17118号公報JP 2003-17118 A 特開2002−110235(特許3722685)号公報JP 2002-110235 (Patent No. 3722585) 特開2003−137890(特許3907446)号公報JP 2003-137890 (Patent 3907446)

ECS Transactions 2009, 16 (35), 3-11ECS Transactions 2009, 16 (35), 3-11 Chem.Eur.J.2004, 10, 2451-2458Chem. Eur. J. 2004, 10, 2451-2458

中心元素がリンで且つ配位子としてシュウ酸を有するジフルオロイオン性錯体は特許文献10に開示されている通り、LiPFとシュウ酸を、SiCl、BCl又はAlClなどの反応助剤の存在下で反応させることにより製造される。反応助剤に含まれるSi、B又はAlがFと強固な結合を形成することを利用してLiPFからFを除去しつつ、シュウ酸をリンに配位させており、ここでLiPFから除去されたFは廃棄せざるを得ない状態である。すなわち、Si−F、B−F及びAl−F結合は強固なため、この結合を切断しFを回収再利用するためには大きなエネルギーを必要とし、コストが見合わないため、Fを廃棄せざるを得なかった。 A difluoroionic complex having phosphorus as a central element and oxalic acid as a ligand is disclosed in Patent Document 10, and LiPF 6 and oxalic acid are mixed with a reaction aid such as SiCl 4 , BCl 3, or AlCl 3 . It is produced by reacting in the presence. Oxalic acid is coordinated to phosphorus while removing F from LiPF 6 by utilizing the fact that Si, B, or Al contained in the reaction aid forms a strong bond with F. Here, LiPF 6 The removed F is in a state that must be discarded. That is, since the Si-F, BF, and Al-F bonds are strong, a large amount of energy is required to cut the bonds and recover and reuse the F. I had to.

また、原料となるLiPFは三塩化リンや五塩化リンといったフッ素を含まない原料をフッ素化することによって製造されている。ジフルオロイオン性錯体を合成する過程で、LiPFからフッ素を4分子除去したうえで2分子の2座配位子を配位させることが必須であり、一度リンに結合させたフッ素を取り除くことになり、フッ素利用効率が極めて低くなっている。 Further, LiPF 6 as a raw material is manufactured by fluorinating a raw material not containing fluorine such as phosphorus trichloride or phosphorus pentachloride. In the process of synthesizing a difluoroionic complex, it is essential to remove four molecules of fluorine from LiPF 6 and then coordinate two molecules of bidentate ligands. To remove fluorine once bound to phosphorus Thus, the fluorine utilization efficiency is extremely low.

以上の様な、反応助剤の使用、除去したフッ素(Si、B、Alのフッ化物)の廃棄/無害化処理、フッ素の利用効率の低さが製造コストの上昇の一因となるだけでなく、反応助剤、又は反応助剤と原料配位子との反応生成物が残留塩素成分として反応液中に残留し、ジフルオロイオン性錯体を電気化学デバイスの電極表面を保護するために電解液に添加される添加剤として、又は電解液の支持電解質として用いた場合に、その残留塩素成分が電気化学デバイス構成部品の腐食を引き起こす原因となっており、反応助剤を使用しない、そしてフッ素利用効率の高い合成法が強く望まれていた。   The use of reaction aids as described above, disposal / detoxification treatment of removed fluorine (fluoride of Si, B, Al), and low use efficiency of fluorine only contribute to an increase in manufacturing costs. In order to protect the electrode surface of the electrochemical device, the reaction aid or the reaction product of the reaction aid and the raw material ligand remains in the reaction solution as a residual chlorine component. When used as an additive added to the electrolyte or as a supporting electrolyte for the electrolyte, the residual chlorine component causes corrosion of electrochemical device components, does not use reaction aids, and uses fluorine A highly efficient synthesis method has been strongly desired.

本発明は上記事情を鑑みてなされたもので、反応助剤の使用無しに、高いフッ素利用効率にて廃棄物が少ないだけでなく、残留塩素成分も少ないジフルオロイオン性錯体の製造方法を提供することを目的とする。   The present invention has been made in view of the above circumstances, and provides a method for producing a difluoroionic complex having not only a small amount of waste with high fluorine utilization efficiency but also a small amount of residual chlorine component without using a reaction aid. For the purpose.

本発明者は、上記課題を解決するために鋭意研究を重ねたところ、2座配位子が3分子配位した6配位イオン性錯体を選択的にフッ素化することで、上記の課題を解決できることを見出し、本発明を完成するに至った。具体的に、本発明では、以下のようなものを提供する。   The present inventor has made extensive studies to solve the above problems, and selectively fluorinated a hexacoordinate ionic complex in which three molecules of a bidentate ligand are coordinated. The inventors have found that this can be solved, and have completed the present invention. Specifically, the present invention provides the following.

本発明は、下記一般式(1)で表される2座配位子が3分子配位した6配位イオン性錯体に、酸性フッ化カリウム、酸性フッ化ナトリウム、酸性フッ化アンモニウム、フッ化水素過剰の有機アミンフッ化水素塩、フッ化水素からなる群より選ばれる一つ以上のフッ素化剤によりフッ素を導入する工程を含む、下記一般式(2)で表されるジフルオロイオン性錯体の製造方法を提供する。 The present invention relates to a hexacoordinate ionic complex in which three molecules of a bidentate ligand represented by the following general formula (1) are coordinated with acidic potassium fluoride, acidic sodium fluoride, acidic ammonium fluoride, fluoride Production of a difluoroionic complex represented by the following general formula (2) including a step of introducing fluorine with one or more fluorinating agents selected from the group consisting of hydrogen-rich organic amine hydrogen fluoride salts and hydrogen fluoride Provide a method.

一般式(1)、(2)において、Aは金属イオン、プロトン及びオニウムイオンからなる群から選ばれるいずれか1つであり、MはP、As及びSbからなる群から選ばれるいずれか1つである。Fはフッ素原子である。Oは酸素原子である。
Yは炭素原子又は硫黄原子である。Yが炭素原子である場合qは1である。Yが硫黄原子である場合qは1又は2である。
Wは炭素数1〜10のヘテロ原子及び/又はハロゲン原子を有していてもよい炭化水素基(炭素数が3以上の場合にあっては、分岐鎖又は環状構造のものも使用できる)、又は−N(R1)−を表す。このとき、Rは水素原子、アルカリ金属、炭素数1〜10のヘテロ原子及び/又はハロゲン原子を有していてもよい炭化水素基を表す。炭素数が3以上の場合にあっては、Rは分岐鎖又は環状構造をとることもできる。Zは炭素原子である。pは0又は1、qは0〜2の整数、rは0〜2の整数、sは0又は1をそれぞれ表し、p+r≧1である。但し、sが0の場合は、Zに二重結合する酸素原子も存在しない。
In the general formulas (1) and (2), A + is any one selected from the group consisting of metal ions, protons and onium ions, and M is any one selected from the group consisting of P, As and Sb. One. F is a fluorine atom. O is an oxygen atom.
Y is a carbon atom or a sulfur atom. Q is 1 when Y is a carbon atom. Q is 1 or 2 when Y is a sulfur atom.
W is a hydrocarbon group that may have a heteroatom having 1 to 10 carbon atoms and / or a halogen atom (in the case where the number of carbon atoms is 3 or more, a branched chain or cyclic structure can also be used), Or -N (R < 1 >)-is represented. In this case, R 1 represents a hydrogen atom, an alkali metal, hydrocarbon group which may have a hetero atom and / or a halogen atom having 1 to 10 carbon atoms. When the number of carbon atoms is 3 or more, R 1 can take a branched chain or a cyclic structure. Z is a carbon atom. p is 0 or 1, q is an integer of 0 to 2, r is an integer of 0 to 2, s represents 0 or 1, and p + r ≧ 1. However, when s is 0, there is no oxygen atom double-bonded to Z.

前記6配位イオン性錯体(1)、並びにジフルオロイオン性錯体(2)のアニオン部分の各元素が(a)、(b)、(c)から選ばれる少なくとも一つの組み合わせであることが好ましい。
(a)M=P、Y=C、p、q、s=1、r=0
(b)M=P、W=C(CF、p、q=0、r、s=1
(c)M=P、W=C(CF、p、q、s=0、r=2
It is preferable that each element of the anion portion of the hexacoordinate ionic complex (1) and the difluoroionic complex (2) is at least one combination selected from (a), (b), and (c).
(A) M = P, Y = C, p, q, s = 1, r = 0
(B) M = P, W = C (CF 3 ) 2 , p, q = 0, r, s = 1
(C) M = P, W = C (CF 3 ) 2 , p, q, s = 0, r = 2

前記フッ素化剤がイオン性フッ化物であることが好ましく、前記フッ素化剤が、酸性フッ化カリウム、酸性フッ化ナトリウム、酸性フッ化アンモニウム、フッ化水素過剰の有機アミンフッ化水素塩、フッ化水素からなる群より選ばれる一つ以上であることが好ましい。また、前記フッ素化剤の当量が、前記6配位イオン性錯体(1)に対して1.5から50モル当量であることが好ましい。   The fluorinating agent is preferably an ionic fluoride, and the fluorinating agent is acidic potassium fluoride, acidic sodium fluoride, acidic ammonium fluoride, hydrogen fluoride-excess organic amine hydrogen fluoride salt, hydrogen fluoride. It is preferably at least one selected from the group consisting of Moreover, it is preferable that the equivalent of the said fluorinating agent is 1.5 to 50 molar equivalent with respect to the said six coordination ionic complex (1).

特に、前記フッ素化剤がフッ化水素を含み、前記フッ素化剤としてのフッ化水素の当量が前記6配位イオン性錯体(1)に対して1.5から50モル当量であることが好ましい。   In particular, the fluorinating agent preferably contains hydrogen fluoride, and the equivalent of hydrogen fluoride as the fluorinating agent is preferably 1.5 to 50 molar equivalents relative to the six-coordinate ionic complex (1). .

本発明は、前記一般式(1)で示される6配位イオン性錯体(1)を非水溶媒中で、酸性フッ化カリウム、酸性フッ化ナトリウム、酸性フッ化アンモニウム、フッ化水素過剰の有機アミンフッ化水素塩、フッ化水素、フッ化カリウム、フッ化ナトリウム、フッ化リチウム、フッ化セシウム、フッ化ニッケル、フッ化カルシウム、フッ化アンチモン、フッ化鉄、フッ化亜鉛、フッ化マンガン、フッ化イッテルビウム、フッ化ハフニウム、フッ化コバルト、フッ化アンモニウム、テトラブチルアンモニウムフルオリドからなる群より選ばれる一つ以上のフッ素化剤によりフッ素化する方法であって、フッ素化時に、硫酸、フルオロ硫酸、塩化水素、メタンスルホン酸、トリフルオロメタンスルホン酸、トリフルオロ酢酸、硝酸、p-トルエンスルホン酸、三フッ化ホウ素、五フッ化リン、三塩化アルミニウム、五塩化ニオブ、トリフルオロメタンスルホン酸金属塩からなる群より選ばれる1つ以上のフッ素化剤以外の酸又はルイス酸を非水溶媒に添加する、前記一般式(2)で表されるジフルオロイオン性錯体の製造方法を提供する。前記フッ素化剤以外の酸又はルイス酸の当量が前記6配位イオン性錯体(1)に対して0.001〜2.0モル当量であることが好ましい。 In the present invention, the six-coordinated ionic complex (1) represented by the general formula (1) is an organic solution containing potassium acid fluoride, sodium acid fluoride, ammonium acid fluoride, excess hydrogen fluoride in a non-aqueous solvent. Amine hydrogen fluoride, hydrogen fluoride, potassium fluoride, sodium fluoride, lithium fluoride, cesium fluoride, nickel fluoride, calcium fluoride, antimony fluoride, iron fluoride, zinc fluoride, manganese fluoride, fluorine A method of fluorinating with one or more fluorinating agents selected from the group consisting of ytterbium fluoride, hafnium fluoride, cobalt fluoride, ammonium fluoride, tetrabutylammonium fluoride, and at the time of fluorination, sulfuric acid, fluorosulfuric acid , Hydrogen chloride, methanesulfonic acid, trifluoromethanesulfonic acid, trifluoroacetic acid, nitric acid, p-toluenesulfo Non-aqueous solvent for acid or Lewis acid other than one or more fluorinating agents selected from the group consisting of acid, boron trifluoride, phosphorus pentafluoride, aluminum trichloride, niobium pentachloride, metal trifluoromethanesulfonate A method for producing a difluoroionic complex represented by the general formula (2) to be added to the above is provided. It is preferable that the equivalent of an acid or Lewis acid other than the fluorinating agent is 0.001 to 2.0 molar equivalents relative to the hexacoordinate ionic complex (1).

特に、前記フッ素化剤以外の酸がトリフルオロメタンスルホン酸、メタンスルホン酸、トリフルオロ酢酸からなる群より選ばれる1つ以上であり、前記フッ素化剤以外の酸の当量が前記6配位イオン性錯体(1)に対して0.001〜2.0モル当量であることが好ましい。また、前記フッ素化剤がフッ化水素であり、フッ素化剤以外の酸がトリフルオロメタンスルホン酸、メタンスルホン酸、トリフルオロ酢酸からなる群より選ばれる1つ以上であることが好ましい。   In particular, the acid other than the fluorinating agent is one or more selected from the group consisting of trifluoromethanesulfonic acid, methanesulfonic acid, and trifluoroacetic acid, and the equivalent of the acid other than the fluorinating agent is the 6-coordinated ionicity. It is preferable that it is 0.001-2.0 molar equivalent with respect to a complex (1). The fluorinating agent is preferably hydrogen fluoride, and the acid other than the fluorinating agent is preferably one or more selected from the group consisting of trifluoromethanesulfonic acid, methanesulfonic acid, and trifluoroacetic acid.

フッ素化時に前記フッ素化剤以外の酸又はルイス酸が添加され、前記フッ素化剤に、フッ化リチウム、フッ化ナトリウム、フッ化カリウム、フッ化セシウム、フッ化カルシウム、フッ化ニッケル、フッ化鉄、フッ化亜鉛、フッ化アンモニウムからなる群より選ばれる一つ以上が含まれることが好ましい。   An acid other than the fluorinating agent or Lewis acid is added at the time of fluorination, and lithium fluoride, sodium fluoride, potassium fluoride, cesium fluoride, calcium fluoride, nickel fluoride, iron fluoride are added to the fluorinating agent. Preferably, at least one selected from the group consisting of zinc fluoride and ammonium fluoride is included.

非水溶媒が炭酸エステル類、エステル類、ケトン類、ラクトン類、エーテル類、ニトリル類、アミド類、スルホン類からなる群より選ばれる一つ、又はこれらの混合物であることが好ましく、前記非水溶媒が炭酸ジメチル、炭酸エチルメチル、炭酸ジエチル、炭酸メチルプロピル、炭酸エチルプロピル、酢酸エチル、酢酸プロピル、酢酸ブチル、プロピオン酸メチル、プロピオン酸エチル、プロピオン酸ブチル、アセトン、エチルメチルケトン、ジエチルケトン、γ−ブチロラクトン、γ−バレロラクトン、テトラヒドロフラン、テトラヒドロピラン、ジブチルエーテル、ジイソプロピルエーテル、1,2−ジメトキシエタン、1,2−ジエトキシエタン、アセトニトリル、プロピオニトリル、N,N−ジメチルホルムアミド、ジメチルスルホキシド、スルホランからなる群より選ばれる一つ、又はこれらの混合物であることが好ましい。   The non-aqueous solvent is preferably one selected from the group consisting of carbonates, esters, ketones, lactones, ethers, nitriles, amides, sulfones, or a mixture thereof. Solvent is dimethyl carbonate, ethyl methyl carbonate, diethyl carbonate, methyl propyl carbonate, ethyl propyl carbonate, ethyl acetate, propyl acetate, butyl acetate, methyl propionate, ethyl propionate, butyl propionate, acetone, ethyl methyl ketone, diethyl ketone, γ-butyrolactone, γ-valerolactone, tetrahydrofuran, tetrahydropyran, dibutyl ether, diisopropyl ether, 1,2-dimethoxyethane, 1,2-diethoxyethane, acetonitrile, propionitrile, N, N-dimethylformamide, dimethylsulfo One selected from the group consisting of xoxide and sulfolane, or a mixture thereof is preferable.

フッ素化を−60℃〜150℃の温度で実施することが好ましく、フッ素化後に減圧操作を行うことが好ましい。特に、前記6配位イオン性錯体(1)と前記ジフルオロイオン性錯体(2)の配位子がシュウ酸であり、フッ素化後の減圧操作にて析出したシュウ酸をろ過にて分離することが好ましい。   The fluorination is preferably performed at a temperature of −60 ° C. to 150 ° C., and it is preferable to perform a decompression operation after the fluorination. In particular, the ligand of the six-coordinated ionic complex (1) and the difluoroionic complex (2) is oxalic acid, and the oxalic acid that has precipitated in the pressure reduction operation after fluorination is separated by filtration. Is preferred.

本発明は、2座配位子が3分子配位した6配位イオン性錯体を選択的にフッ素化することで、従来のようなSiCl、BCl又はAlClなどの反応助剤を使用しないため、反応助剤と反応したフッ素を廃棄する必要がなく、高いフッ素利用効率にて廃棄物が少ないだけでなく、塩素を含む反応助剤を使用しないため残留塩素成分も少ないジフルオロイオン性錯体の製造方法を提供することができる。 The present invention uses a conventional reaction aid such as SiCl 4 , BCl 3, or AlCl 3 by selectively fluorinating a six-coordinate ionic complex in which three molecules of a bidentate ligand are coordinated. Therefore, there is no need to dispose of fluorine that has reacted with the reaction aid, and not only waste is reduced due to high fluorine utilization efficiency, but also a difluoroionic complex with little residual chlorine component because no reaction aid containing chlorine is used. The manufacturing method of can be provided.

以下に、本発明をより詳細に説明する。   Hereinafter, the present invention will be described in more detail.

本発明は、下記一般式(1)で表される2座配位子が3分子配位した6配位イオン性錯体(以下、6配位イオン性錯体(1)と呼ぶことがある)にフッ素を導入する工程を含む、下記一般式(2)で表されるジフルオロイオン性錯体(以下、ジフルオロイオン性錯体(2)と呼ぶことがある)の製造方法である。   The present invention relates to a hexacoordinate ionic complex in which three molecules of a bidentate ligand represented by the following general formula (1) are coordinated (hereinafter sometimes referred to as a hexacoordinate ionic complex (1)). This is a method for producing a difluoroionic complex represented by the following general formula (2) (hereinafter sometimes referred to as difluoroionic complex (2)), including a step of introducing fluorine.

一般式(1)、(2)において、Aは金属イオン、プロトン及びオニウムイオンからなる群から選ばれるいずれか1つであり、非水電解液電池中でのイオン伝導を助ける役割をするという観点から、リチウムイオン、ナトリウムイオン、カリウムイオン、又は4級アルキルアンモニウムイオンが好ましい。4級アルキルアンモニウムイオンとしては、特に限定はされないが、例えばトリメチルプロピルアンモニウムや、1−ブチル−1−メチルピロリジニウムが挙げられる。 In the general formulas (1) and (2), A + is any one selected from the group consisting of metal ions, protons and onium ions, and serves to assist ion conduction in the nonaqueous electrolyte battery. From the viewpoint, lithium ion, sodium ion, potassium ion, or quaternary alkyl ammonium ion is preferable. Although it does not specifically limit as a quaternary alkylammonium ion, For example, a trimethylpropyl ammonium and 1-butyl-1-methylpyrrolidinium are mentioned.

一般式(1)、(2)において、MはP、As及びSbからなる群から選ばれるいずれか1つである。Fはフッ素原子である。Oは酸素原子である。
Yは炭素原子又は硫黄原子である。Yが炭素原子である場合qは1である。Yが硫黄原子である場合qは1又は2である。
Wは炭素数1〜10のヘテロ原子及び/又はハロゲン原子を有していてもよい炭化水素基(炭素数が3以上の場合にあっては、分岐鎖又は環状構造のものも使用できる)、又は−N(R1)−を表す。このとき、Rは水素原子、アルカリ金属、炭素数1〜10のヘテロ原子及び/又はハロゲン原子を有していてもよい炭化水素基を表す。炭素数が3以上の場合にあっては、Rは分岐鎖又は環状構造をとることもできる。Zは炭素原子である。pは0又は1、qは0〜2の整数、rは0〜2の整数、sは0又は1をそれぞれ表し、p+r≧1である。但し、sが0の場合は、Zに二重結合する酸素原子も存在しない。

In the general formulas (1) and (2), M is any one selected from the group consisting of P, As and Sb. F is a fluorine atom. O is an oxygen atom.
Y is a carbon atom or a sulfur atom. Q is 1 when Y is a carbon atom. Q is 1 or 2 when Y is a sulfur atom.
W is a hydrocarbon group that may have a heteroatom having 1 to 10 carbon atoms and / or a halogen atom (in the case where the number of carbon atoms is 3 or more, a branched chain or cyclic structure can also be used), Or -N (R < 1 >)-is represented. In this case, R 1 represents a hydrogen atom, an alkali metal, hydrocarbon group which may have a hetero atom and / or a halogen atom having 1 to 10 carbon atoms. When the number of carbon atoms is 3 or more, R 1 can take a branched chain or a cyclic structure. Z is a carbon atom. p is 0 or 1, q is an integer of 0 to 2, r is an integer of 0 to 2, s represents 0 or 1, and p + r ≧ 1. However, when s is 0, there is no oxygen atom double-bonded to Z.

前記6配位イオン性錯体(1)、並びにジフルオロイオン性錯体(2)のアニオン部分の各元素が(a)、(b)、(c)から選ばれる少なくとも一つの組み合わせであることが好ましい。
(a)M=P、Y=C、p、q、s=1、r=0 シュウ酸
(b)M=P、W=C(CF、p、q=0、r、s=1 ヘキサフルオロヒドロキシイソ酪酸
(c)M=P、W=C(CF、p、q、s=0、r=2 パーフルオロピナコール
It is preferable that each element of the anion portion of the hexacoordinate ionic complex (1) and the difluoroionic complex (2) is at least one combination selected from (a), (b), and (c).
(A) M = P, Y = C, p, q, s = 1, r = 0 Oxalic acid (b) M = P, W = C (CF 3 ) 2 , p, q = 0, r, s = 1 hexafluorohydroxyisobutyric acid (c) M = P, W = C (CF 3 ) 2 , p, q, s = 0, r = 2 perfluoropinacol

6配位イオン性錯体(1)を非水溶媒に溶解、又は懸濁させた後、6配位イオン性錯体(1)に対して1.5倍モル以上50モル倍以下のフッ素化剤を使用して選択的にフッ素化することによりジフルオロイオン性錯体(2)が得られる。この時、フッ素化剤の使用量は1.8〜40モル倍が好ましく、2.0〜20モル倍が更に好ましい。   After dissolving or suspending the 6-coordinating ionic complex (1) in a non-aqueous solvent, a fluorinating agent having a molar ratio of 1.5 to 50 moles to the 6-coordinated ionic complex (1) is added. The difluoroionic complex (2) is obtained by selective fluorination with use. At this time, the amount of the fluorinating agent used is preferably 1.8 to 40 mol times, more preferably 2.0 to 20 mol times.

フッ素化剤としては、非水溶媒に添加した際に、フッ化物イオンを生じるイオン性フッ化剤が使用可能であり、中でも酸性フッ化カリウム、酸性フッ化ナトリウム、酸性フッ化アンモニウム、フッ化水素過剰の有機アミンフッ化水素塩、フッ化水素などの酸性のものが好ましく、反応速度が速いことからフッ化水素が更に好ましい。   As a fluorinating agent, an ionic fluorinating agent that generates fluoride ions when added to a non-aqueous solvent can be used. Among them, acidic potassium fluoride, acidic sodium fluoride, acidic ammonium fluoride, hydrogen fluoride Acidic substances such as excess organic amine hydrogen fluoride and hydrogen fluoride are preferred, and hydrogen fluoride is more preferred because of its high reaction rate.

フッ素化時に、フッ素化剤以外に酸又はルイス酸を添加してもよい。酸、又はルイス酸を添加することでフッ素化剤を用いたフッ素導入時の反応速度を向上させることが可能である。ここでは、フッ素化剤以外の酸(プロトン酸又はブレンステッド酸)として、硫酸、フルオロ硫酸、塩化水素、メタンスルホン酸、トリフルオロメタンスルホン酸、トリフルオロ酢酸、硝酸、p-トルエンスルホン酸を使用でき、フッ素化剤以外のルイス酸として、三フッ化ホウ素、五フッ化リン、三塩化アルミニウム、五塩化ニオブ、トリフルオロメタンスルホン酸金属塩(カチオンはLi、Na、K、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Y)を使用することが出来る。特に、トリフルオロメタンスルホン酸、メタンスルホン酸、トリフルオロ酢酸を用いることが、反応速度を向上させる効果が大きいため好ましい。   At the time of fluorination, an acid or a Lewis acid may be added in addition to the fluorinating agent. By adding an acid or a Lewis acid, the reaction rate at the time of introducing fluorine using a fluorinating agent can be improved. Here, sulfuric acid, fluorosulfuric acid, hydrogen chloride, methanesulfonic acid, trifluoromethanesulfonic acid, trifluoroacetic acid, nitric acid, p-toluenesulfonic acid can be used as an acid (protic acid or Bronsted acid) other than the fluorinating agent. As a Lewis acid other than the fluorinating agent, boron trifluoride, phosphorus pentafluoride, aluminum trichloride, niobium pentachloride, trifluoromethanesulfonic acid metal salt (cations are Li, Na, K, La, Ce, Pr, Nd Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Y) can be used. In particular, it is preferable to use trifluoromethanesulfonic acid, methanesulfonic acid, or trifluoroacetic acid because the effect of improving the reaction rate is great.

フッ素化剤以外の酸又はルイス酸の当量が、6配位イオン性錯体(1)に対して0.001〜2.0モル当量であることが好ましい。フッ素化剤以外の酸又はルイス酸の量が少なすぎると、反応速度を向上させる効果が小さく、量が多すぎると、コストが上がるだけでなく、生成物の分解が進行する。   The equivalent of the acid other than the fluorinating agent or the Lewis acid is preferably 0.001 to 2.0 molar equivalents relative to the hexacoordinate ionic complex (1). If the amount of the acid other than the fluorinating agent or the Lewis acid is too small, the effect of improving the reaction rate is small. If the amount is too large, not only the cost increases but also the decomposition of the product proceeds.

酸、又はルイス酸を添加することで、前述の酸性のフッ素化剤以外の使用も可能であり、この場合にはフッ化カリウム、フッ化ナトリウム、フッ化リチウム、フッ化セシウム、フッ化ニッケル、フッ化カルシウム、フッ化アンチモン、フッ化鉄、フッ化亜鉛、フッ化マンガン、フッ化イッテルビウム、フッ化ハフニウム、フッ化コバルト、フッ化アンモニウム、テトラブチルアンモニウムフルオリド等が用いられ、中でもフッ化カリウム、フッ化ナトリウム、フッ化リチウム、フッ化セシウム、フッ化カルシウム、フッ化ニッケル、フッ化コバルト、フッ化鉄、フッ化亜鉛、フッ化マンガン、フッ化アンモニウムが好ましく、更には、選択性の観点から、フッ化リチウム、フッ化ナトリウム、フッ化カリウム、フッ化セシウム、フッ化カルシウム、フッ化ニッケル、フッ化鉄、フッ化亜鉛、フッ化アンモニウムが好ましい。   By adding an acid or Lewis acid, it is possible to use other than the above acidic fluorinating agent. In this case, potassium fluoride, sodium fluoride, lithium fluoride, cesium fluoride, nickel fluoride, Calcium fluoride, antimony fluoride, iron fluoride, zinc fluoride, manganese fluoride, ytterbium fluoride, hafnium fluoride, cobalt fluoride, ammonium fluoride, tetrabutylammonium fluoride, etc. are used, especially potassium fluoride , Sodium fluoride, lithium fluoride, cesium fluoride, calcium fluoride, nickel fluoride, cobalt fluoride, iron fluoride, zinc fluoride, manganese fluoride, and ammonium fluoride are preferable. To lithium fluoride, sodium fluoride, potassium fluoride, cesium fluoride, calcium fluoride Beam, nickel fluoride, iron fluoride, zinc fluoride, ammonium fluoride is preferred.

以上に述べた合成法に用いられる非水溶媒は、原料となる6配位イオン性錯体(1)を極微量でも溶解させるもので、系内の化合物と反応を起こさないものが良く、好ましくは比誘電率2以上のものが良い。ここで全く溶解度の無い非水溶媒を用いた場合、フッ素化が非常に遅くなるため好ましくない。僅かにでも溶解度があれば、目的のジフルオロイオン性錯体(2)の溶解度が高いため反応は進行する。例えば、炭酸エステル類、エステル類、ケトン類、ラクトン類、エーテル類、ニトリル類、アミド類、スルホン類等が使用でき、単一の溶媒だけでなく二種類以上の混合溶媒でも良い。   The non-aqueous solvent used in the synthesis method described above dissolves the 6-coordinate ionic complex (1) as a raw material even in a very small amount, and does not cause a reaction with a compound in the system. Those having a relative dielectric constant of 2 or more are preferable. Here, when a non-aqueous solvent having no solubility is used, it is not preferable because fluorination becomes very slow. If there is even a slight solubility, the reaction proceeds because the solubility of the target difluoroionic complex (2) is high. For example, carbonate esters, esters, ketones, lactones, ethers, nitriles, amides, sulfones and the like can be used, and not only a single solvent but also two or more kinds of mixed solvents may be used.

非水溶媒の具体例としては炭酸ジメチル、炭酸エチルメチル、炭酸ジエチル、炭酸メチルプロピル、炭酸エチルプロピル、酢酸エチル、酢酸プロピル、酢酸ブチル、プロピオン酸メチル、プロピオン酸エチル、プロピオン酸ブチル、アセトン、エチルメチルケトン、ジエチルケトン、γ−ブチロラクトン、γ−バレロラクトン、テトラヒドロフラン、テトラヒドロピラン、ジブチルエーテル、ジイソプロピルエーテル、1,2−ジメトキシエタン、1,2−ジエトキシエタン、アセトニトリル、プロピオニトリル、N,N−ジメチルホルムアミド、ジメチルスルホキシド、スルホラン等を挙げることが出来、中でも沸点が120℃以下の溶媒が好ましく、炭酸ジメチル、炭酸エチルメチル、炭酸ジエチル、酢酸エチル、プロピオン酸メチル、プロピオン酸エチル、アセトン、テトラヒドロフラン、1,2−ジメトキシエタン、アセトニトリルが更に好ましい。   Specific examples of the non-aqueous solvent include dimethyl carbonate, ethyl methyl carbonate, diethyl carbonate, methyl propyl carbonate, ethyl propyl carbonate, ethyl acetate, propyl acetate, butyl acetate, methyl propionate, ethyl propionate, butyl propionate, acetone, ethyl Methyl ketone, diethyl ketone, γ-butyrolactone, γ-valerolactone, tetrahydrofuran, tetrahydropyran, dibutyl ether, diisopropyl ether, 1,2-dimethoxyethane, 1,2-diethoxyethane, acetonitrile, propionitrile, N, N -Dimethylformamide, dimethyl sulfoxide, sulfolane and the like. Among them, a solvent having a boiling point of 120 ° C or lower is preferable, and dimethyl carbonate, ethyl methyl carbonate, diethyl carbonate, ethyl acetate, methyl propionate, propylene More preferred are ethyl lopionate, acetone, tetrahydrofuran, 1,2-dimethoxyethane, and acetonitrile.

フッ素化剤を用いたフッ素導入時の反応温度は−60℃〜150℃、好ましくは−20〜120℃である。−60℃より低い温度ではフッ素導入が充分に進行せず、150℃以上では原料となる6配位イオン性錯体(1)又は、生成物であるジフルオロイオン性錯体(2)の分解が起こる可能性がある。充分なフッ素導入速度を得つつ、分解を起こさないためには−20〜120℃の範囲が最適である。   The reaction temperature at the time of introducing fluorine using a fluorinating agent is −60 ° C. to 150 ° C., preferably −20 to 120 ° C. Fluorine introduction does not proceed sufficiently at temperatures lower than −60 ° C., and decomposition of the 6-coordinate ionic complex (1) or difluoroionic complex (2) that is a product may occur at temperatures above 150 ° C. There is sex. The range of −20 to 120 ° C. is optimal in order to obtain a sufficient fluorine introduction rate and not cause decomposition.

また、反応時間は、反応速度に応じて適宜選択することができるが、長期間装置を占有することは生産コストの上昇につながるため、現実的には72時間以下にすることが好ましい。さらに、系全体の反応を進行させるために、反応中は溶液を攪拌することが好ましい。   The reaction time can be appropriately selected according to the reaction rate. However, since occupying the apparatus for a long time leads to an increase in production cost, it is actually preferable to set it to 72 hours or less. Furthermore, in order to advance the reaction of the entire system, it is preferable to stir the solution during the reaction.

フッ素化後に、残留遊離酸濃度を低減させるために減圧操作を行い、さらに必要に応じて、析出物をろ過にて取り除くことが好ましい。この際、非水溶媒の一部も留去されるため、生成物であるジフルオロイオン性錯体(2)の濃度は濃縮される。減圧操作には、真空ポンプ、アスピレータなどを用いることができる。減圧操作は、反応器を密閉状態としてから、系内を大気圧以下の圧力に保持することにより行う。系内の圧力は、精製対象の液体の温度と蒸気圧によって変わるため、一概には言えないが、減圧は、槽内の真空度が、絶対圧で80kPa以下に保持することが好ましい。保持する圧力が80kPa超では、残留遊離酸濃度が所望の濃度以下になるまで排除するのに長時間を要するため、好ましくない。また、保持する圧力が50kPa以下であると、分解反応物と未反応精製剤を低濃度まで排除できるため、さらに好ましい。なお、装置の負担を考えると、絶対圧を20kPa以上とすることが好ましい。特に、前記6配位イオン性錯体(1)と前記ジフルオロイオン性錯体(2)の配位子がシュウ酸である場合、フッ素化後に減圧操作を行い、溶媒の一部を留去してジフルオロイオン性錯体(2)を濃縮する際に析出したシュウ酸をろ過にて分離することが好ましい。   After fluorination, it is preferable to perform a pressure reduction operation to reduce the residual free acid concentration, and if necessary, remove the precipitate by filtration. At this time, since a part of the non-aqueous solvent is also distilled off, the concentration of the product difluoroionic complex (2) is concentrated. A vacuum pump, an aspirator, etc. can be used for pressure reduction operation. The depressurization operation is carried out by keeping the reactor in a sealed state and then maintaining the system at a pressure below atmospheric pressure. Since the pressure in the system varies depending on the temperature and vapor pressure of the liquid to be purified, it cannot be generally stated. However, it is preferable to maintain the vacuum in the tank at 80 kPa or less in absolute pressure. If the pressure to be maintained exceeds 80 kPa, it takes a long time to eliminate the residual free acid concentration until it becomes a desired concentration or less. Moreover, since the decomposition reaction product and the unreacted purification agent can be excluded to a low concentration, it is further preferable that the pressure to be maintained is 50 kPa or less. In view of the burden on the apparatus, the absolute pressure is preferably 20 kPa or more. In particular, when the ligand of the six-coordinated ionic complex (1) and the difluoroionic complex (2) is oxalic acid, a pressure reduction operation is performed after fluorination, and a part of the solvent is distilled off to difluoro It is preferable to separate the oxalic acid deposited when the ionic complex (2) is concentrated by filtration.

以下、実施例により本発明を具体的に説明するが、本発明は係る実施例により限定されるものではない。   EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited by the Example which concerns.

いずれも原料や生成物の取り扱いは、露点が−50℃以下の窒素雰囲気下にて行った。また、使用する硝子製反応器、フッ素樹脂製反応器は、150℃で12時間以上乾燥させた後に、露点が−50℃以下の窒素気流下で室温まで冷却させたものを用いた。   In either case, the raw materials and products were handled in a nitrogen atmosphere having a dew point of −50 ° C. or less. The glass reactor and fluororesin reactor used were those dried at 150 ° C. for 12 hours or more and then cooled to room temperature under a nitrogen stream having a dew point of −50 ° C. or less.

[実施例1−1]
非特許文献2に開示された方法に従って、シュウ酸が3分子配位した6配位イオン性錯体であるトリスオキサラトリン酸リチウム(1a−Li)を得た。500mLフッ素樹脂製反応器に(1a−Li)(30g、99.4mmol)を加え、非水溶媒としてエチルメチルカーボネート(以下EMC)(120mL)を追加して溶解させた後、フッ素化剤としてフッ化水素(以下HF)(3.6g、178.8mmol、1.8モル当量)を添加した。25℃にて24時間攪拌させた後、25℃にて絶対圧50〜80kPaに減圧し、残留するHFを除去すると同時に非水溶媒の一部を留去してイオン性錯体の濃縮を行った。析出したシュウ酸をろ過にて取り除いた後に、変換率と選択率をF、P−NMRにて、残留塩素濃度を硝酸銀滴定にて、残留遊離酸濃度を遊離酸滴定により求めた結果、目的とするシュウ酸が2配位したジフルオロイオン性錯体(2a−Li)への変換率は25.0%、選択率は98.0%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
変換率[%] = 目的物モル%
選択率[%] = 変換率/(100−残留原料モル%) ×100
[Example 1-1]
According to the method disclosed in Non-Patent Document 2, lithium trisoxalatophosphate (1a-Li), which is a hexacoordinate ionic complex in which three molecules of oxalic acid are coordinated, was obtained. (1a-Li) (30 g, 99.4 mmol) is added to a 500 mL fluororesin reactor, and ethyl methyl carbonate (hereinafter EMC) (120 mL) is added and dissolved as a non-aqueous solvent. Hydrogen fluoride (hereinafter HF) (3.6 g, 178.8 mmol, 1.8 molar equivalent) was added. After stirring at 25 ° C. for 24 hours, the pressure was reduced to 50-80 kPa at 25 ° C. to remove residual HF, and at the same time, part of the nonaqueous solvent was distilled off to concentrate the ionic complex. . After removing the precipitated oxalic acid by filtration, the conversion rate and selectivity were determined by F, P-NMR, the residual chlorine concentration by silver nitrate titration, and the residual free acid concentration by free acid titration. The conversion rate to a difluoroionic complex (2a-Li) in which oxalic acid is coordinated to 25.0% and selectivity is 98.0%. The residual chlorine concentration and the residual free acid concentration are difluoroionic. They were less than 100 ppm by mass and 2000 ppm by mass, respectively, based on the complex (2a-Li).
Conversion rate [%] = Target product mol%
Selectivity [%] = conversion rate / (100−mol% of residual raw material) × 100

[実施例1−2]
HFの添加量を(4.0g、198.7mmol、2.0モル当量)へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は29.6%、選択率は93.4%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 1-2]
As a result of carrying out the reaction in the same procedure as Example 1-1 except that the addition amount of HF was changed to (4.0 g, 198.7 mmol, 2.0 molar equivalents), the difluoroionic complex (2a-Li) The conversion rate to 29.6% and the selectivity were 93.4%, and the residual chlorine concentration and the residual free acid concentration were less than 100 ppm by mass and 2000 masses, respectively, based on the difluoroionic complex (2a-Li). ppm.

[実施例1−3]
反応時間を24時間から72時間へ変更した以外は実施例1−2と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は37.7%、選択率は95.7%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 1-3]
As a result of performing the reaction in the same procedure as in Example 1-2 except that the reaction time was changed from 24 hours to 72 hours, the conversion rate to the difluoroionic complex (2a-Li) was 37.7%, and the selectivity The residual chlorine concentration and the residual free acid concentration were respectively less than 100 ppm by mass and 2000 ppm by mass based on the difluoroionic complex (2a-Li).

[実施例1−4]
温度を25℃から40℃へ変更した以外は実施例1−3と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は50.5%、選択率は94.7%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 1-4]
As a result of performing the reaction in the same procedure as in Example 1-3 except that the temperature was changed from 25 ° C. to 40 ° C., the conversion rate to the difluoroionic complex (2a-Li) was 50.5%, and the selectivity was The residual chlorine concentration and the residual free acid concentration were respectively less than 100 ppm by mass and 2000 ppm by mass based on the difluoroionic complex (2a-Li).

[実施例1−5]
温度を25℃から80℃へ変更した以外は実施例1−2と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は51.3%、選択率は94.0%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 1-5]
As a result of performing the reaction in the same procedure as in Example 1-2 except that the temperature was changed from 25 ° C. to 80 ° C., the conversion rate to the difluoroionic complex (2a-Li) was 51.3%, and the selectivity was The residual chlorine concentration and the residual free acid concentration were respectively less than 100 ppm by mass and 2000 ppm by mass based on the difluoroionic complex (2a-Li).

[実施例1−6]
HFの添加量を(11.9g、596.2mmol、6.0モル当量)へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は71.0%、選択率は95.4%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 1-6]
As a result of carrying out the reaction in the same procedure as Example 1-1 except that the addition amount of HF was changed to (11.9 g, 596.2 mmol, 6.0 molar equivalent), the difluoroionic complex (2a-Li) The conversion rate to 71.0% and the selectivity is 95.4%, and the residual chlorine concentration and residual free acid concentration are less than 100 ppm by mass and 2000 masses, respectively, based on the difluoroionic complex (2a-Li). ppm.

[実施例1−7]
反応時間を24時間から48時間へ変更した以外は実施例1−6と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は90.0%、選択率は95.2%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 1-7]
As a result of carrying out the reaction in the same procedure as in Example 1-6 except that the reaction time was changed from 24 hours to 48 hours, the conversion rate to the difluoroionic complex (2a-Li) was 90.0%, and the selectivity The residual chlorine concentration and the residual free acid concentration were respectively less than 100 ppm by mass and 2000 ppm by mass based on the difluoroionic complex (2a-Li).

[実施例1−8]
HFの添加量を(19.9g、993.6mmol、10.0モル当量)へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は92.3%、選択率は93.2%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 1-8]
As a result of carrying out the reaction by the same procedure as Example 1-1 except that the addition amount of HF was changed to (19.9 g, 993.6 mmol, 10.0 molar equivalent), the difluoroionic complex (2a-Li) The conversion rate is 92.3% and the selectivity is 93.2%. The residual chlorine concentration and the residual free acid concentration are less than 100 ppm by mass and 2000 masses, respectively, based on the difluoroionic complex (2a-Li). ppm.

[実施例1−9]
HFの添加量を(39.7g、1987.2mmol、20.0モル当量)へ、反応時間を3時間へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は93.4%、選択率は94.3%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、4000質量ppmであった。EMC30mLを加え、再度減圧濃縮にて追加分の30mLを留去したところ、残留遊離酸濃度は2000質量ppmまで低下した。
[Example 1-9]
As a result of carrying out the reaction in the same procedure as in Example 1-1, except that the addition amount of HF was changed to (39.7 g, 1987.2 mmol, 20.0 molar equivalents) and the reaction time was changed to 3 hours, difluoro ion The conversion rate to the functional complex (2a-Li) is 93.4% and the selectivity is 94.3%. The residual chlorine concentration and the residual free acid concentration are based on the difluoroionic complex (2a-Li), respectively. It was less than 100 mass ppm and 4000 mass ppm. When 30 mL of EMC was added and 30 mL of the additional portion was distilled off again by concentration under reduced pressure, the residual free acid concentration decreased to 2000 ppm by mass.

[実施例1−10]
HFの添加量を(79.5g、3974.4mmol、40.0モル当量)へ、反応時間を1時間へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は91.0%、選択率は95.0%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、7000質量ppmであった。EMC30mLを加え、再度減圧濃縮にて追加分の30mLを留去したところ、残留遊離酸濃度は3000質量ppmまで低下した。
[Example 1-10]
As a result of carrying out the reaction in the same procedure as in Example 1-1, except that the addition amount of HF was changed to (79.5 g, 3984.4 mmol, 40.0 molar equivalent) and the reaction time was changed to 1 hour, difluoro ion The conversion rate to the functional complex (2a-Li) is 91.0% and the selectivity is 95.0%. The residual chlorine concentration and the residual free acid concentration are based on the difluoroionic complex (2a-Li), respectively. It was less than 100 mass ppm and 7000 mass ppm. When 30 mL of EMC was added and 30 mL of the additional portion was distilled off again by concentration under reduced pressure, the residual free acid concentration decreased to 3000 ppm by mass.

[実施例1−11]
フッ素化剤をトリエチルアミン三フッ化水素塩(32.0g、198.7mmol、2.0モル当量)に変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は21.2%、選択率は91.2%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、6000質量ppmであった。EMC30mLを加え、再度減圧濃縮にて追加分の30mLを留去したところ、残留遊離酸濃度は3000質量ppmまで低下した。
[Example 1-11]
As a result of carrying out the reaction in the same procedure as Example 1-1 except that the fluorinating agent was changed to triethylamine hydrogen trifluoride (32.0 g, 198.7 mmol, 2.0 molar equivalent), a difluoroionic complex was obtained. The conversion rate to (2a-Li) is 21.2%, the selectivity is 91.2%, and the residual chlorine concentration and the residual free acid concentration are 100 masses each based on the difluoroionic complex (2a-Li). It was less than ppm and 6000 mass ppm. When 30 mL of EMC was added and 30 mL of the additional portion was distilled off again by concentration under reduced pressure, the residual free acid concentration decreased to 3000 ppm by mass.

[実施例1−12]
フッ素化剤をトリエチルアミン三フッ化水素塩(96.1g、596.2mmol、6.0モル当量)に変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は63.1%、選択率は83.5%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、15000質量ppmであった。EMC30mLを加え、再度減圧濃縮にて追加分の30mLを留去したところ、残留遊離酸濃度は6000質量ppmまで低下した。
[Example 1-12]
As a result of carrying out the reaction in the same procedure as Example 1-1 except that the fluorinating agent was changed to triethylamine hydrogen trifluoride (96.1 g, 596.2 mmol, 6.0 molar equivalent), a difluoroionic complex was obtained. The conversion rate to (2a-Li) is 63.1%, the selectivity is 83.5%, and the residual chlorine concentration and the residual free acid concentration are 100 masses each based on the difluoroionic complex (2a-Li). It was less than 1ppm and 15000 mass ppm. When 30 mL of EMC was added and 30 mL of the additional portion was distilled off again by concentration under reduced pressure, the residual free acid concentration decreased to 6000 ppm by mass.

[実施例1−13]
フッ素化剤を酸性フッ化カリウム(15.5g、198.7mmol、2.0当量)に変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は13.6%、選択率は94.4%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、5000質量ppmであった。
[Example 1-13]
As a result of carrying out the reaction in the same procedure as in Example 1-1 except that the fluorinating agent was changed to acidic potassium fluoride (15.5 g, 198.7 mmol, 2.0 equivalents), difluoroionic complex (2a- The conversion rate to Li) is 13.6%, the selectivity is 94.4%, and the residual chlorine concentration and the residual free acid concentration are less than 100 ppm by mass, respectively, based on the difluoroionic complex (2a-Li). It was 5000 mass ppm.

[実施例1−14]
フッ素化剤を酸性フッ化カリウム(46.6g、596.2mmol、6.0当量)に変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は29.5、選択率は87.5%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、10000質量ppmであった。
[Example 1-14]
As a result of carrying out the reaction in the same procedure as in Example 1-1 except that the fluorinating agent was changed to acidic potassium fluoride (46.6 g, 596.2 mmol, 6.0 equivalents), a difluoroionic complex (2a- The conversion to Li) is 29.5, the selectivity is 87.5%, and the residual chlorine concentration and the residual free acid concentration are less than 100 ppm by mass, respectively, based on the difluoroionic complex (2a-Li), and 10,000 The mass was ppm.

以上の実施例1−1〜1−14の内容を以下の表1(条件)、表2(結果)に示す。表1において、3分子配位体(1)とは2座配位子が3分子配位した6配位イオン性錯体(1)を、EtN・3HFはトリエチルアミン三フッ化水素塩、KF・HFは酸性フッ化カリウムを表す。なお、遊離酸濃度における、「4000→2000」等は、再度の減圧除去を行い、遊離酸濃度を減少させたことを意味する。 The contents of the above Examples 1-1 to 1-14 are shown in the following Table 1 (conditions) and Table 2 (results). In Table 1, the tricoordinator (1) is a hexacoordinate ionic complex (1) in which three molecules of a bidentate ligand are coordinated, Et 3 N · 3HF is triethylamine hydrogen trifluoride, KF -HF represents acidic potassium fluoride. Incidentally, “4000 → 2000” or the like in the free acid concentration means that the removal under reduced pressure was performed again to reduce the free acid concentration.

以上の結果をまとめる。フッ素化剤HFのモル当量が1.8、又は2.0で、温度25℃場合は24時間後に目的物(2a−Li)の生成は確認できるものの、その変換率は25.0〜29.6%であった(実施例1−1、1−2)。それに対して、HF2.0モル当量、温度25℃にて、72時間まで延長させた場合、(2a−Li)への変換率は37.7%と向上が見られた(実施例1−3)。更にそこから温度を40℃まで上げた結果、変換率は50.5%まで向上した(実施例1−4)。24時間のままで温度を80℃にあげた場合も、ほぼ同程度の変換率51.3%となった。(実施例1−5)   The above results are summarized. When the molar equivalent of the fluorinating agent HF is 1.8 or 2.0 and the temperature is 25 ° C., the formation of the target product (2a-Li) can be confirmed after 24 hours, but the conversion rate is 25.0 to 29. 6% (Examples 1-1 and 1-2). On the other hand, when extended to 72 hours at 2.0 molar equivalents of HF and a temperature of 25 ° C., the conversion rate to (2a-Li) was improved to 37.7% (Example 1-3). ). As a result of further increasing the temperature to 40 ° C., the conversion rate was improved to 50.5% (Example 1-4). When the temperature was raised to 80 ° C. for 24 hours, the conversion rate was about 51.3%. (Example 1-5)

以上の通り、HF1.8〜2.0モル当量では変換率50%程度までしか上昇しなかった。そこで、HFのモル当量を増加させて反応を実施した。HF6.0、10.0モル当量にて、温度25℃、24時間では、それぞれ変換率は71.0%、92.3%と大幅に向上が見られた(実施例1−6、1−8)。HF6.0モル当量、温度25℃でも、48時間まで延長させることで変換率はHF10.0モル当量と同程度の90.0%まで向上した(実施例1−7)。更にHFのモル当量を増やすにつれて、反応速度は向上し、HF20.0モル当量では3時間にて変換率93.4%(実施例1−9)、HF40.0モル当量では1時間にて変換率91.0%(実施例1−10)となった。   As described above, the conversion rate increased only to about 50% at HF 1.8 to 2.0 molar equivalents. Therefore, the reaction was carried out by increasing the molar equivalent of HF. At HF 6.0 and 10.0 molar equivalents, at temperatures of 25 ° C. and 24 hours, the conversion rates were significantly improved to 71.0% and 92.3%, respectively (Examples 1-6, 1- 8). Even at HF 6.0 molar equivalent and a temperature of 25 ° C., the conversion rate was increased to 90.0%, which was the same as 10.0 molar equivalent of HF, by extending to 48 hours (Example 1-7). Further, as the molar equivalent of HF was increased, the reaction rate was improved, with a conversion rate of 93.4% (Example 1-9) in 3 hours for HF 20.0 molar equivalents, and conversion in 1 hour for HF 40.0 molar equivalents. The rate was 91.0% (Example 1-10).

使用するフッ素化剤をHFからトリエチルアミン三フッ化水素塩に変更してフッ素化を行った結果、目的物(2a−Li)の生成は確認できるものの、HFの場合に比べて変換率と選択率の低下が見られた。トリエチルアミンの影響によって目的物以外のリン酸フッ素化物の生成が進行したと思われる(実施例1−11、1−12)。   As a result of fluorination by changing the fluorinating agent used from HF to triethylamine trifluoride, the formation of the target product (2a-Li) can be confirmed, but the conversion rate and selectivity compared to HF Decrease was observed. It seems that the production of phosphoric acid fluoride other than the target product progressed under the influence of triethylamine (Examples 1-11 and 1-12).

使用するフッ素化剤をHFから酸性フッ化カリウムに変更してフッ素化を行った結果、目的物(2a−Li)の生成は確認できるものの、HFの場合に比べて変換率の低下が見られた。(実施例1−13、1−14)。このことから、酸性フッ化カリウム中のフッ化カリウム成分は反応を加速される効果は低いと考えられる。   As a result of fluorination by changing the fluorinating agent to be used from HF to acidic potassium fluoride, the formation of the target product (2a-Li) can be confirmed, but the conversion rate is lower than that of HF. It was. (Examples 1-13 and 1-14). From this, it is considered that the potassium fluoride component in the acidic potassium fluoride has a low effect of accelerating the reaction.

また、実施例1−1〜1−14においては原料に塩化物が含まれないことから、残留塩素濃度は何れも100質量ppm未満であった。HFの添加量が特に多い実施例1−9、1−10にて残留遊離酸濃度が上昇する結果となり、再度の減圧除去を行った。また、トリエチルアミン三フッ化水素塩を使用した系では、HFのみの系に比べて残留する遊離酸が多い結果となった。   In Examples 1-1 to 1-14, since chlorides were not included in the raw material, the residual chlorine concentration was less than 100 ppm by mass. In Examples 1-9 and 1-10, in which the amount of HF added was particularly large, the residual free acid concentration increased, and the removal under reduced pressure was performed again. In the system using triethylamine hydrogen trifluoride, the amount of residual free acid was larger than that in the system using only HF.

[実施例2−1]
非特許文献2に開示された方法に従って、シュウ酸が3分子配位した6配位イオン性錯体であるトリスオキサラトリン酸リチウム(1a−Li)を得た。この(1a−Li)(30g、99.4mmol)をEMC(120mL)に溶解させ、HF(4.0g、198.7mmol、2.0モル当量)を加えた後、反応を加速させるための酸として塩化水素(以下HCl)(7.3g、198.7mmol、2.0モル当量)を添加した。25℃にて3時間攪拌させた後、減圧にて残留するHFと添加した酸の除去と濃縮を行った。析出したシュウ酸をろ過にて取り除いた後に、変換率と選択率をF、P−NMRにて、残留塩素濃度を硝酸銀滴定にて、残留遊離酸濃度を遊離酸滴定により求めた結果、目的とするシュウ酸が2分子配位したジフルオロイオン性錯体(2a−Li)への変換率は42.6%、選択率は80.4%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 2-1]
According to the method disclosed in Non-Patent Document 2, lithium trisoxalatophosphate (1a-Li), which is a hexacoordinate ionic complex in which three molecules of oxalic acid are coordinated, was obtained. This (1a-Li) (30 g, 99.4 mmol) was dissolved in EMC (120 mL), HF (4.0 g, 198.7 mmol, 2.0 molar equivalents) was added, and then an acid was added to accelerate the reaction. Hydrogen chloride (hereinafter HCl) (7.3 g, 198.7 mmol, 2.0 molar equivalents) was added. After stirring at 25 ° C. for 3 hours, the remaining HF and the added acid were removed and concentrated under reduced pressure. After removing the precipitated oxalic acid by filtration, the conversion rate and selectivity were determined by F, P-NMR, the residual chlorine concentration by silver nitrate titration, and the residual free acid concentration by free acid titration. The conversion rate to a difluoroionic complex (2a-Li) in which two molecules of oxalic acid are coordinated is 42.6% and the selectivity is 80.4%. The residual chlorine concentration and the residual free acid concentration are difluoroions. The amount was less than 100 ppm by mass and 2000 ppm by mass based on the sex complex (2a-Li), respectively.

[実施例2−2]
反応時間を3時間から24時間へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は72.8%、選択率は80.5%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 2-2]
As a result of carrying out the reaction in the same procedure as in Example 2-1, except that the reaction time was changed from 3 hours to 24 hours, the conversion rate to the difluoroionic complex (2a-Li) was 72.8%, and the selectivity The residual chlorine concentration and the residual free acid concentration were respectively less than 100 ppm by mass and 2000 ppm by mass based on the difluoroionic complex (2a-Li).

[実施例2−3]
酸をHClからトリフルオロメタンスルホン酸(以下TfOH)(0.3g、2.0mmol、0.02モル当量)へ、反応時間を3時間から6時間へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は93.2%、選択率は94.1%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2500質量ppmであった。
[Example 2-3]
The same procedure as Example 2-1 except that the acid was changed from HCl to trifluoromethanesulfonic acid (hereinafter TfOH) (0.3 g, 2.0 mmol, 0.02 molar equivalent), and the reaction time was changed from 3 hours to 6 hours. As a result, the conversion rate to the difluoroionic complex (2a-Li) was 93.2% and the selectivity was 94.1%. The residual chlorine concentration and the residual free acid concentration were difluoroionic. They were less than 100 ppm by mass and 2500 ppm by mass, respectively, based on the complex (2a-Li).

[実施例2−4]
酸をHClからTfOH(0.3g、2.0mmol、0.02モル当量)へ、反応時間を3時間から24時間へ、反応温度を25℃から0℃へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は94.2%、選択率は95.2%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2500質量ppmであった。
[Example 2-4]
Example 2-1 except that the acid was changed from HCl to TfOH (0.3 g, 2.0 mmol, 0.02 molar equivalent), the reaction time was changed from 3 hours to 24 hours, and the reaction temperature was changed from 25 ° C. to 0 ° C. As a result of performing the reaction in the same procedure as above, the conversion rate to the difluoroionic complex (2a-Li) is 94.2%, the selectivity is 95.2%, the residual chlorine concentration and the residual free acid concentration are They were less than 100 ppm by mass and 2500 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−5]
酸をHClからTfOH(0.3g、2.0mmol、0.02モル当量)へ、反応時間を3時間から1時間へ、反応温度を25℃から40℃へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は91.2%、選択率は92.0%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2500質量ppmであった。
[Example 2-5]
Example 2-1 except that the acid was changed from HCl to TfOH (0.3 g, 2.0 mmol, 0.02 molar equivalent), the reaction time was changed from 3 hours to 1 hour, and the reaction temperature was changed from 25 ° C. to 40 ° C. As a result of performing the reaction in the same procedure, the conversion rate to the difluoroionic complex (2a-Li) was 91.2%, the selectivity was 92.0%, the residual chlorine concentration and the residual free acid concentration were They were less than 100 ppm by mass and 2500 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−6]
酸をHClからTfOH(0.03g、0.2mmol、0.002モル当量)へ、反応時間を3時間から72時間へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は95.2%、選択率は96.0%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 2-6]
Results obtained by performing the reaction in the same procedure as in Example 2-1, except that the acid was changed from HCl to TfOH (0.03 g, 0.2 mmol, 0.002 molar equivalent), and the reaction time was changed from 3 hours to 72 hours. The conversion rate to the difluoroionic complex (2a-Li) is 95.2%, the selectivity is 96.0%, and the residual chlorine concentration and the residual free acid concentration are the same as those of the difluoroionic complex (2a-Li). The standards were less than 100 mass ppm and 2000 mass ppm, respectively.

[実施例2−7]
酸をHClからトリフルオロ酢酸(以下TFA)(0.1g、1.0mmol、0.01モル当量)へ変更した以外は実施例2−2と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は35.6%、選択率は97.0%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 2-7]
As a result of carrying out the reaction in the same procedure as in Example 2-2 except that the acid was changed from HCl to trifluoroacetic acid (hereinafter TFA) (0.1 g, 1.0 mmol, 0.01 molar equivalent), difluoroionic properties were obtained. The conversion rate to the complex (2a-Li) was 35.6% and the selectivity was 97.0%. The residual chlorine concentration and the residual free acid concentration were 100 based on the difluoroionic complex (2a-Li), respectively. It was less than mass ppm and 2000 mass ppm.

[実施例2−8]
酸をHClからTFA(1.1g、9.9mmol、0.1モル当量)へ変更した以外は実施例2−2と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は53.2%、選択率は96.6%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2500質量ppmであった。
[Example 2-8]
As a result of carrying out the reaction in the same procedure as in Example 2-2 except that the acid was changed from HCl to TFA (1.1 g, 9.9 mmol, 0.1 molar equivalent), the difluoroionic complex (2a-Li) The conversion rate to 53.2% and the selectivity are 96.6%, and the residual chlorine concentration and the residual free acid concentration are less than 100 ppm by mass, respectively, and 2500 masses based on the difluoroionic complex (2a-Li). ppm.

[実施例2−9]
フッ素化剤をHFからフッ化リチウム(以下LiF)(5.2g、198.7mmol、2.0モル当量)へ、酸をHClからTfOH(29.8g、198.7mmol、2.0モル当量)へ変更した以外は実施例2−2と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は30.2%、選択率は95.2%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、4000質量ppmであった。
[Example 2-9]
Fluorinating agent from HF to lithium fluoride (hereinafter LiF) (5.2 g, 198.7 mmol, 2.0 molar equivalent), acid from HCl to TfOH (29.8 g, 198.7 mmol, 2.0 molar equivalent) As a result of carrying out the reaction in the same procedure as in Example 2-2, except that it was changed to 2, the conversion rate to the difluoroionic complex (2a-Li) was 30.2%, and the selectivity was 95.2%. The residual chlorine concentration and the residual free acid concentration were less than 100 ppm by mass and 4000 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−10]
フッ素化剤をHFからフッ化ナトリウム(以下NaF)(8.3g、198.7mmol、2.0モル当量)へ、酸をHClからTfOH(29.8g、198.7mmol、2.0モル当量)へ変更した以外は実施例2−2と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は30.9%、選択率は94.3%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、4000質量ppmであった。
[Example 2-10]
Fluorinating agent from HF to sodium fluoride (hereinafter NaF) (8.3 g, 198.7 mmol, 2.0 molar equivalent), acid from HCl to TfOH (29.8 g, 198.7 mmol, 2.0 molar equivalent) As a result of carrying out the reaction in the same procedure as in Example 2-2, except that it was changed to 3, the conversion rate to the difluoroionic complex (2a-Li) was 30.9%, and the selectivity was 94.3%. The residual chlorine concentration and the residual free acid concentration were less than 100 ppm by mass and 4000 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−11]
フッ素化剤をHFからフッ化カリウム(以下KF)(11.5g、198.7mmol、2.0モル当量)へ、酸をHClからTfOH(29.8g、198.7mmol、2.0モル当量)へ変更した以外は実施例2−2と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は32.1%、選択率は94.8%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、4000質量ppmであった。
[Example 2-11]
Fluorinating agent from HF to potassium fluoride (hereinafter KF) (11.5 g, 198.7 mmol, 2.0 molar equivalent); acid from HCl to TfOH (29.8 g, 198.7 mmol, 2.0 molar equivalent) As a result of carrying out the reaction in the same procedure as in Example 2-2, except that it was changed to 2, the conversion rate to the difluoroionic complex (2a-Li) was 32.1%, and the selectivity was 94.8%. The residual chlorine concentration and the residual free acid concentration were less than 100 ppm by mass and 4000 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−12]
酸をHClからTfOH(0.03g、0.2mmol、0.002モル当量)へ、反応時間を3時間から72時間へ、溶媒をEMCからジメチルカーボネート(以下DMC)へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は94.9%、選択率は95.7%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 2-12]
Example 2 except that the acid was changed from HCl to TfOH (0.03 g, 0.2 mmol, 0.002 molar equivalent), the reaction time was changed from 3 hours to 72 hours, and the solvent was changed from EMC to dimethyl carbonate (hereinafter DMC). As a result of performing the reaction in the same procedure as -1, the conversion rate to the difluoroionic complex (2a-Li) was 94.9%, the selectivity was 95.7%, and the residual chlorine concentration and residual free acid concentration Were less than 100 ppm by mass and 2000 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−13]
酸をHClからTfOH(0.03g、0.2mmol、0.002モル当量)へ、反応時間を3時間から72時間へ、溶媒をEMCからジエチルカーボネート(以下DEC)へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は93.5%、選択率は94.6%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2500質量ppmであった。
[Example 2-13]
Example 2 except that the acid was changed from HCl to TfOH (0.03 g, 0.2 mmol, 0.002 molar equivalent), the reaction time was changed from 3 hours to 72 hours, and the solvent was changed from EMC to diethyl carbonate (hereinafter DEC). As a result of carrying out the reaction in the same procedure as -1, the conversion rate to the difluoroionic complex (2a-Li) was 93.5%, the selectivity was 94.6%, and the residual chlorine concentration and residual free acid concentration Were less than 100 ppm by mass and 2500 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−14]
酸をHClからTfOH(0.03g、0.2mmol、0.002モル当量)へ、反応時間を3時間から72時間へ、溶媒をEMCからテトラヒドロフラン(以下THF)へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は92.2%、選択率は93.9%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 2-14]
Example 2 except that the acid was changed from HCl to TfOH (0.03 g, 0.2 mmol, 0.002 molar equivalent), the reaction time was changed from 3 hours to 72 hours, and the solvent was changed from EMC to tetrahydrofuran (hereinafter THF). As a result of performing the reaction in the same procedure as 1, the conversion rate to the difluoroionic complex (2a-Li) was 92.2%, the selectivity was 93.9%, and the residual chlorine concentration and the residual free acid concentration were And less than 100 ppm by mass and 2000 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−15]
酸をHClからTfOH(0.03g、0.2mmol、0.002モル当量)へ、反応時間を3時間から72時間へ、溶媒をEMCから酢酸エチル(以下AcOEt)へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は91.1%、選択率は92.2%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 2-15]
Example 2 except that the acid was changed from HCl to TfOH (0.03 g, 0.2 mmol, 0.002 molar equivalent), the reaction time was changed from 3 hours to 72 hours, and the solvent was changed from EMC to ethyl acetate (hereinafter AcOEt). As a result of performing the reaction in the same procedure as -1, the conversion rate to the difluoroionic complex (2a-Li) was 91.1%, the selectivity was 92.2%, the residual chlorine concentration and the residual free acid concentration Were less than 100 ppm by mass and 2000 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−16]
酸をHClからTfOH(0.03g、0.2mmol、0.002モル当量)へ、反応時間を3時間から72時間へ、溶媒をEMCからアセトニトリル(以下CHCN)へ変更した以外は実施例2−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)への変換率は90.5%、選択率は92.3%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ100質量ppm未満、3000質量ppmであった。
[Example 2-16]
Example except that the acid was changed from HCl to TfOH (0.03 g, 0.2 mmol, 0.002 molar equivalent), the reaction time was changed from 3 hours to 72 hours, and the solvent was changed from EMC to acetonitrile (hereinafter CH 3 CN). As a result of carrying out the reaction in the same procedure as in 2-1, the conversion rate to the difluoroionic complex (2a-Li) was 90.5%, the selectivity was 92.3%, the residual chlorine concentration and the residual free acid The concentrations were less than 100 ppm by mass and 3000 ppm by mass, respectively, based on the difluoroionic complex (2a-Li).

[実施例2−17]
非特許文献2に開示された方法に従って、シュウ酸が3分子配位した6配位イオン性錯体であるトリスオキサラトリン酸リチウム(1a−Li)を得た。ダウケミカル製強酸性陽イオン交換樹脂252(以後、イオン交換樹脂)を500g量り取り、0.1規定の水酸化ナトリウム水溶液(2.5kg)に浸漬させ、25℃で6時間攪拌を行った。ろ過でイオン交換樹脂を回収し、洗液のpHが8以下になるまで純水で充分に洗浄した。その後、12時間の減圧乾燥(120℃、1.3kPa)にて水分を除去した。(1a−Li)(30g、99.4mmol)をEMC(270mL)に溶解させ、そこに150gの乾燥済み前記イオン交換樹脂を加え、25℃にて6時間攪拌を行った。その後、ろ過にてイオン交換樹脂を取り除くことで、カチオンがLiからNaへ交換された(1a−Na)/EMC溶液が得られた。イオンクロマトグラフィーにてカチオンの定量を行うと、Na/Liの比率は99.5であった。
(1a−Na)/EMC溶液の塩濃度が約20質量%となるまで、減圧濃縮を行った。その後、HF(4.0g、198.7mmol、2.0モル当量)と、TfOH(0.03g、0.2mmol、0.002モル当量)を添加した。温度25℃にて72時間攪拌させた後、減圧にて残留するHFと添加した酸の除去と濃縮を行った。析出したシュウ酸をろ過にて取り除いた後に、変換率と選択率をF、P−NMRにて、残留塩素濃度を硝酸銀滴定にて、残留遊離酸濃度を遊離酸滴定により求めた結果、目的とするジフルオロイオン性錯体(2a−Na)への変換率は94.8%、選択率は96.0%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Na)を基準としてそれぞれ100質量ppm未満、2000質量ppmであった。
[Example 2-17]
According to the method disclosed in Non-Patent Document 2, lithium trisoxalatophosphate (1a-Li), which is a hexacoordinate ionic complex in which three molecules of oxalic acid are coordinated, was obtained. 500 g of strongly acidic cation exchange resin 252 (hereinafter referred to as “ion exchange resin”) manufactured by Dow Chemical was weighed and immersed in a 0.1 N aqueous sodium hydroxide solution (2.5 kg), and stirred at 25 ° C. for 6 hours. The ion exchange resin was collected by filtration and washed thoroughly with pure water until the pH of the washing solution was 8 or less. Thereafter, moisture was removed by drying under reduced pressure (120 ° C., 1.3 kPa) for 12 hours. (1a-Li) (30 g, 99.4 mmol) was dissolved in EMC (270 mL), 150 g of the dried ion exchange resin was added thereto, and the mixture was stirred at 25 ° C. for 6 hours. Then, by removing the ion exchange resin by filtration, a (1a-Na) / EMC solution in which cations were exchanged from Li + to Na + was obtained. When the cation was quantified by ion chromatography, the ratio of Na + / Li + was 99.5.
Concentration under reduced pressure was performed until the salt concentration of the (1a-Na) / EMC solution was about 20% by mass. Then HF (4.0 g, 198.7 mmol, 2.0 molar equivalent) and TfOH (0.03 g, 0.2 mmol, 0.002 molar equivalent) were added. After stirring at a temperature of 25 ° C. for 72 hours, residual HF and the added acid were removed and concentrated under reduced pressure. After removing the precipitated oxalic acid by filtration, the conversion rate and selectivity were determined by F, P-NMR, the residual chlorine concentration by silver nitrate titration, and the residual free acid concentration by free acid titration. The conversion rate to the difluoroionic complex (2a-Na) is 94.8%, the selectivity is 96.0%, and the residual chlorine concentration and the residual free acid concentration are the same as the difluoroionic complex (2a-Na). The standards were less than 100 mass ppm and 2000 mass ppm, respectively.

[実施例2−18]
非特許文献2に開示された方法に従って、シュウ酸が3分子配位した6配位イオン性錯体であるトリスオキサラトリン酸リチウム(1a−Li)を得た。この(1a−Li)(30g、99.4mmol)をEMC(150mL)に溶解させ、そこにトリメチルプロピルアンモニウムクロリド(14.4g、104.4mmol)を加えて45℃にて6時間攪拌を行った。5℃まで冷却した後に不溶解物をろ過で取り除くことでカチオンがLiからトリメチルプロピルアンモニウムカチオン(以下、TMPA)へ交換された(1a−TMPA)/EMC溶液が得られた。イオンクロマトグラフィーにてカチオンの定量を行ったところTMPA/Liの比率は98.4であった。
(1a−TMPA)/EMC溶液へ、HF(4.0g、198.7mmol、2.0モル当量)と、TfOH(0.03g、0.2mmol、0.002モル当量)を添加した。温度25℃にて72時間攪拌させた後、減圧にて残留するHFと添加した酸の除去と濃縮を行った。析出したシュウ酸をろ過にて取り除いた後に、変換率と選択率をF、P−NMRにて、残留塩素濃度を硝酸銀滴定にて、残留遊離酸濃度を遊離酸滴定により求めた結果、目的とするジフルオロイオン性錯体(2a−TMPA)への変換率は90.1%、選択率は93.5%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−TMPA)を基準としてそれぞれ200質量ppm、2000質量ppmであった。
[Example 2-18]
According to the method disclosed in Non-Patent Document 2, lithium trisoxalatophosphate (1a-Li), which is a hexacoordinate ionic complex in which three molecules of oxalic acid are coordinated, was obtained. This (1a-Li) (30 g, 99.4 mmol) was dissolved in EMC (150 mL), trimethylpropylammonium chloride (14.4 g, 104.4 mmol) was added thereto, and the mixture was stirred at 45 ° C. for 6 hours. . After cooling to 5 ° C., insoluble matters were removed by filtration to obtain a (1a-TMPA) / EMC solution in which cations were exchanged from Li + to trimethylpropylammonium cation (hereinafter referred to as TMPA). When the cation was quantified by ion chromatography, the ratio of TMPA / Li + was 98.4.
HF (4.0 g, 198.7 mmol, 2.0 molar equivalent) and TfOH (0.03 g, 0.2 mmol, 0.002 molar equivalent) were added to the (1a-TMPA) / EMC solution. After stirring at a temperature of 25 ° C. for 72 hours, residual HF and the added acid were removed and concentrated under reduced pressure. After removing the precipitated oxalic acid by filtration, the conversion rate and selectivity were determined by F, P-NMR, the residual chlorine concentration by silver nitrate titration, and the residual free acid concentration by free acid titration. The conversion rate to the difluoroionic complex (2a-TMPA) is 90.1%, the selectivity is 93.5%, and the residual chlorine concentration and residual free acid concentration are the same as the difluoroionic complex (2a-TMPA). The reference values were 200 ppm by mass and 2000 ppm by mass, respectively.

[実施例2−19]
非特許文献2に開示された方法を参考に、ヘキサフルオロ−2−ヒドロキシイソ酪酸が3分子配位した6配位イオン性錯体であるトリス(ヘキサフルオロ−2−ヒドロキシイソブチラト)リン酸リチウム(1b−Li)を得た。この(1b−Li)(66.4g、99.4mmol)をEMC(150mL)に溶解させ、HF(4.0g、198.7mmol、2.0モル当量)と、TfOH(0.03g、0.2mmol、0.002モル当量)を添加した。温度25℃にて72時間攪拌させた後、減圧にて残留するHFとヘキサフルオロ−2−ヒドロキシイソ酪酸と添加した酸の除去と濃縮を行った。析出した固体をろ過にて取り除いた後に、変換率と選択率をF、P−NMRにて、残留塩素濃度を硝酸銀滴定にて、残留遊離酸濃度を遊離酸滴定により求めた結果、目的とするヘキサフルオロ−2−ヒドロキシイソ酪酸が2分子配位したジフルオロイオン性錯体(2b−Li)への変換率は92.1%、選択率は94.5%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2b−Li)を基準としてそれぞれ100質量ppm未満、20000質量ppmであった。
[Example 2-19]
Referring to the method disclosed in Non-Patent Document 2, lithium tris (hexafluoro-2-hydroxyisobutyrate), which is a hexacoordinate ionic complex in which three molecules of hexafluoro-2-hydroxyisobutyric acid are coordinated (1b-Li) was obtained. This (1b-Li) (66.4 g, 99.4 mmol) was dissolved in EMC (150 mL), HF (4.0 g, 198.7 mmol, 2.0 molar equivalents) and TfOH (0.03 g, 0.0. 2 mmol, 0.002 molar equivalent) was added. After stirring at a temperature of 25 ° C. for 72 hours, the remaining HF, hexafluoro-2-hydroxyisobutyric acid and the added acid were removed and concentrated under reduced pressure. After the precipitated solid was removed by filtration, the conversion rate and selectivity were determined by F and P-NMR, the residual chlorine concentration was determined by silver nitrate titration, and the residual free acid concentration was determined by free acid titration. Conversion to difluoroionic complex (2b-Li) in which two molecules of hexafluoro-2-hydroxyisobutyric acid are coordinated is 92.1%, and selectivity is 94.5%. Residual chlorine concentration and residual free acid The concentrations were less than 100 ppm by mass and 20000 ppm by mass, respectively, based on the difluoroionic complex (2b-Li).

[実施例2−20]
非特許文献2に開示された方法を参考に、パーフルオロピナコールが3分子配位した6配位イオン性錯体であるトリス(テトラトリフルオロメチルエタンジオラト)リン酸リチウム(1c−Li)を得た。この(1c−Li)(102.7g、99.4mmol)をEMC(200mL)に溶解させ、HF(4.0g、198.7mmol、2.0モル当量)と、TfOH(0.03g、0.2mmol、0.002モル当量)を添加した。温度25℃にて72時間攪拌させた後、減圧にて残留するHFとパーフルオロピナコールと添加した酸の除去と濃縮を行った。析出した固体をろ過にて取り除いた後に、変換率と選択率をF、P−NMRにて、残留塩素濃度を硝酸銀滴定にて、残留遊離酸濃度を遊離酸滴定により求めた結果、目的とするパーフルオロピナコールが2分子配位したジフルオロイオン性錯体(2c−Li)への変換率は90.5%、選択率は91.6%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2c−Li)を基準としてそれぞれ100質量ppm未満、10000質量ppmであった。
[Example 2-20]
Referring to the method disclosed in Non-Patent Document 2, tris (tetratrifluoromethylethanediolato) lithium phosphate (1c-Li), which is a hexacoordinate ionic complex in which three molecules of perfluoropinacol are coordinated, is obtained. It was. This (1c-Li) (102.7 g, 99.4 mmol) was dissolved in EMC (200 mL), and HF (4.0 g, 198.7 mmol, 2.0 molar equivalents) and TfOH (0.03 g, 0.0. 2 mmol, 0.002 molar equivalent) was added. After stirring at a temperature of 25 ° C. for 72 hours, the remaining HF, perfluoropinacol and the added acid were removed and concentrated under reduced pressure. After the precipitated solid was removed by filtration, the conversion rate and selectivity were determined by F and P-NMR, the residual chlorine concentration was determined by silver nitrate titration, and the residual free acid concentration was determined by free acid titration. The conversion rate to a difluoroionic complex (2c-Li) in which two molecules of perfluoropinacol are coordinated is 90.5%, and the selectivity is 91.6%. The residual chlorine concentration and the residual free acid concentration are difluoro ions. Was less than 100 ppm by mass and 10000 ppm by mass, respectively, based on the sex complex (2c-Li).

以上の実施例2−1〜2−20の内容を以下の表3(条件)、表4(結果)に示す。表3において、HHIBはヘキサフルオロ−2−ヒドロキシイソ酪酸を、PFPはパーフルオロピナコールを表す。   The contents of the above Examples 2-1 to 2-20 are shown in Table 3 (conditions) and Table 4 (results) below. In Table 3, HHIB represents hexafluoro-2-hydroxyisobutyric acid, and PFP represents perfluoropinacol.

以上の結果をまとめる。HFを過剰に用いることで高い変換率で3分子配位体(1a−Li)のフッ素化が進行することが明らかになった。過剰のHFにより反応液中のプロトン濃度が上昇し、それによって反応速度が向上したと推測できるため、より解離度の高い酸の添加を試みた。HF2.0モル当量に加えてHCl2.0モル当量を添加してフッ素化反応を行ったところ、25℃3時間で変換率42.6%、24時間で72.8%となった(実施例2−1、2−2)。HClを使用しない実施例1−2の結果と比較して大幅に反応速度が向上したことが分かる。但し、HClが引き起こす副反応により選択率の低下が見られるため、より効果的な酸の探索を行うこととした。   The above results are summarized. It has been clarified that the fluorination of the trimolecular coordination body (1a-Li) proceeds at a high conversion rate by using HF excessively. Since it can be presumed that the proton concentration in the reaction solution increased due to excess HF, and thereby the reaction rate was improved, addition of an acid having a higher degree of dissociation was attempted. When fluorination reaction was carried out by adding 2.0 molar equivalents of HCl in addition to 2.0 molar equivalents of HF, the conversion rate was 42.6% at 25 ° C. for 3 hours and 72.8% at 24 hours (Examples). 2-1, 2-2). It can be seen that the reaction rate was significantly improved as compared with the result of Example 1-2 in which no HCl was used. However, since the selectivity decreased due to the side reaction caused by HCl, the search for a more effective acid was performed.

酸をTfOHに換えてフッ素化を行った結果、0.02モル当量でも極めて高い添加効果が見られ、25℃6時間で変換率93.2%(実施例2−3)、40℃1時間で変換率91.2%(実施例2−5)であり、0℃においても24時間まで延長させることで変換率94.2%(実施例2−4)となった。更に添加量を削減したTfOH0.002モル当量においても、時間を72時間まで延長させることで、選択率を低下させること無く変換率を95.2%まで向上させることができた(実施例2−6)。   As a result of performing fluorination by replacing the acid with TfOH, a very high addition effect was observed even at 0.02 molar equivalent, conversion rate 93.2% (Example 2-3) at 25 ° C. for 6 hours, 40 ° C. for 1 hour. The conversion rate was 91.2% (Example 2-5), and the conversion rate was 94.2% (Example 2-4) by extending it to 24 hours even at 0 ° C. Further, even at a TfOH 0.002 molar equivalent in which the amount added was reduced, the conversion rate could be improved to 95.2% without decreasing the selectivity by extending the time to 72 hours (Example 2-). 6).

次に、酸をTFAに換えてフッ素化を行った結果、25℃24時間の条件において0.01モル当量では変換率35.6%(実施例2−7)、0.1モル当量では変換率53.2%(実施例2−8)となり、TFA無しに比べると向上は見られたものの、TfOH程の効果は得られなかった。   Next, as a result of fluorination by replacing the acid with TFA, the conversion rate was 35.6% (Example 2-7) at 0.01 molar equivalents at 25 ° C. for 24 hours, and conversion at 0.1 molar equivalents. The rate was 53.2% (Example 2-8), and although an improvement was seen as compared with the case without TFA, the effect of TfOH was not obtained.

フッ素化剤を金属フッ素化物(LiF、NaF、KF)に変更し、TfOHの存在下でフッ素化反応を行った。その結果変換率30%程度で目的物(2a−Li)が得られた。(実施例2−9、2−10、2−11)これは、TfOHを使用せずにHFのみを2.0モル当量使用した実施例1−2の結果から僅かではあるが向上が見られる。TfOHによって金属フッ素化物がプロトン化されて、2.0モル当量のHFが系内で発生し、それによりフッ素化が進行したと考えられるが、そこにトリフルオロメタンスルホン酸塩がルイス酸効果を発揮した結果として変換率が向上した可能性が高い。   The fluorinating agent was changed to a metal fluorinated product (LiF, NaF, KF), and the fluorination reaction was performed in the presence of TfOH. As a result, the target product (2a-Li) was obtained with a conversion rate of about 30%. (Examples 2-9, 2-10, 2-11) This is a slight improvement from the results of Example 1-2 in which only 2.0 molar equivalents of HF were used without using TfOH. . The metal fluoride is protonated by TfOH, and 2.0 molar equivalents of HF are generated in the system, and it is considered that fluorination has progressed. However, trifluoromethanesulfonate exhibits the Lewis acid effect. As a result, the conversion rate is likely to be improved.

HF2.0モル当量、TfOH0.002モル当量、25℃72時間の条件にて、溶媒をEMCから変更してフッ素化反応を実施した。その結果、変換率はDMC、DECではEMCと同等(実施例2−12、2−13)であり、THF、AcOEt、CHCNではEMCに比べて若干低下した(実施例2−14、2−15、2−16)ものの、何れも変換率90%以上であった。 The fluorination reaction was carried out by changing the solvent from EMC under the conditions of HF 2.0 molar equivalent, TfOH 0.002 molar equivalent, and 25 ° C. for 72 hours. As a result, the conversion rate was the same as that of EMC for DMC and DEC (Examples 2-12 and 2-13), and was slightly decreased for THF, AcOEt and CH 3 CN (Examples 2-14 and 2). -15 and 2-16), but the conversion rate was 90% or more.

原料のカチオンがLiからNaに換わった(1a−Na)や、TMPAに換わった(1a−TMPA)を使用し、HF2.0モル当量、TfOH0.002モル当量、25℃72時間の条件でフッ素化を行った結果、問題なく反応は進行し、(2a−Na)が変換率94.8%(実施例2−17)で、(2a−TMPA)が変換率90.1%(実施例2−18)で得られた。 Using cation of Li + changed from Li + to Na + (1a-Na) or TMPA (1a-TMPA), HF 2.0 molar equivalent, TfOH 0.002 molar equivalent, 25 ° C. for 72 hours As a result of the fluorination, the reaction proceeded without any problem. (2a-Na) had a conversion rate of 94.8% (Example 2-17) and (2a-TMPA) had a conversion rate of 90.1% (implementation). Obtained in Example 2-18).

原料の配位子がシュウ酸からHHIBに換わった(1b−Li)や、PFPに換わった(1c−Li)を使用し、HF2.0モル当量、TfOH0.002モル当量、25℃72時間の条件でフッ素化を行った結果、問題なく反応は進行し、(2b−Li)が変換率92.1%(実施例2−19)で、(2c−Li)が変換率90.5%(実施例2−20)で得られた。   The raw material ligand was changed from oxalic acid to HHIB (1b-Li) or PFP (1c-Li), HF 2.0 molar equivalent, TfOH 0.002 molar equivalent, 25 ° C. for 72 hours. As a result of fluorination under the conditions, the reaction proceeded without any problem. (2b-Li) was 92.1% conversion (Example 2-19) and (2c-Li) was 90.5% conversion ( Obtained in Example 2-20).

以上の通り、酸を添加することでHFによるフッ素化速度が大幅に向上することが明らかになった。また、カチオンがLiからNaやTMPAへ、配位子がシュウ酸からHHIBやPFPに換わっても効率的に目的物であるジフルオロイオン性錯体を得ることが出来た。 As described above, it has been clarified that the addition of an acid significantly improves the HF fluorination rate. Further, even when the cation was changed from Li + to Na + or TMPA and the ligand was changed from oxalic acid to HHIB or PFP, the target difluoroionic complex could be obtained efficiently.

残留塩素濃度は実施例2−18を除いて100質量ppm未満であった。実施例2−18の残留塩素濃度が200質量ppmとなっているのは、原料である3分子配位体(1a−TMPA)を合成する際に使用した塩化物からの持込であると思われる。   Residual chlorine concentration was less than 100 mass ppm except for Example 2-18. The residual chlorine concentration of Example 2-18 is 200 ppm by mass, which seems to be brought from the chloride used when synthesizing the trimolecular coordination body (1a-TMPA) as a raw material. It is.

残留遊離酸濃度は、配位子がシュウ酸である場合、酸の添加量が多い系(実施例2−9、2−10、2−11)にて4000質量ppmまでの上昇が見られたのと、溶媒がCHCNの系(実施例2−16)にて3000質量ppmとなった以外は2000〜2500質量ppmであった。配位子がHHIBの場合、残留遊離酸濃度が20000質量ppmと極めて高くなった。これはHHIBの高い溶解度により濃縮、ろ過操作にて充分に除去することができなかったためである。同様に高い溶解度を有するPFPの場合も残留遊離酸濃度は10000質量ppmと高い値となった。PFPはHHIBに比べて揮発性が高いため、濃縮時に一部留去されたものと考えられる。 When the ligand was oxalic acid, the residual free acid concentration increased up to 4000 mass ppm in the systems with a large amount of acid added (Examples 2-9, 2-10, 2-11). The solvent was 2000 to 2500 mass ppm except that the solvent was 3000 mass ppm in the CH 3 CN system (Example 2-16). When the ligand was HHIB, the residual free acid concentration was as extremely high as 20000 mass ppm. This is because the high solubility of HHIB could not be removed sufficiently by concentration and filtration operations. Similarly, in the case of PFP having high solubility, the residual free acid concentration was as high as 10,000 ppm by mass. Since PFP has higher volatility than HHIB, it is considered that it was partially distilled off during concentration.

[比較例1−1]
特許文献10に記載された方法を参考に反応を実施した。LiPF(20.0g、132.0mmol)とEMC110mL、そしてシュウ酸(11.9g、132.0mmol)を容積500mLの硝子製フラスコに加えた。このとき、LiPFは完全に溶解したが、シュウ酸の大部分は溶け残っていた。40℃撹拌下、四塩化ケイ素(13.4g、79mmol)をフラスコ内へ1.5時間かけて滴下した後、撹拌を2.5時間継続した。続いて、減圧にてテトラフルオロシラン及び塩酸を除去し、不溶解物をろ過にて取り除いた後に、ジフルオロイオン性錯体(2a−Li)を得た。ジフルオロイオン性錯体(2a−Li)への変換率は92.5%、選択率は92.5%であり、残留塩素濃度と残留遊離酸濃度は、ジフルオロイオン性錯体(2a−Li)を基準としてそれぞれ1500質量ppm、2000質量ppmであった。
[Comparative Example 1-1]
The reaction was carried out with reference to the method described in Patent Document 10. LiPF 6 (20.0 g, 132.0 mmol), 110 mL of EMC, and oxalic acid (11.9 g, 132.0 mmol) were added to a 500 mL glass flask. At this time, LiPF 6 was completely dissolved, but most of oxalic acid remained undissolved. Under stirring at 40 ° C., silicon tetrachloride (13.4 g, 79 mmol) was dropped into the flask over 1.5 hours, and then stirring was continued for 2.5 hours. Subsequently, tetrafluorosilane and hydrochloric acid were removed under reduced pressure, and the insoluble matter was removed by filtration to obtain a difluoroionic complex (2a-Li). Conversion to difluoroionic complex (2a-Li) is 92.5%, selectivity is 92.5%. Residual chlorine concentration and residual free acid concentration are based on difluoroionic complex (2a-Li). As 1500 ppm by mass and 2000 ppm by mass, respectively.

[比較例1−2]
フッ素化剤をHFからフッ化リチウム(以下LiF)(5.2g、198.7mmol、2.0モル当量)へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)の生成は確認できなかった。
[Comparative Example 1-2]
As a result of carrying out the reaction in the same procedure as in Example 1-1 except that the fluorinating agent was changed from HF to lithium fluoride (hereinafter LiF) (5.2 g, 198.7 mmol, 2.0 molar equivalent), difluoro Formation of the ionic complex (2a-Li) could not be confirmed.

[比較例1−3]
フッ素化剤をHFからフッ化ナトリウム(以下NaF)(8.3g、198.7mmol、2.0モル当量)へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)の生成は確認できなかった。
[Comparative Example 1-3]
As a result of carrying out the reaction in the same procedure as in Example 1-1, except that the fluorinating agent was changed from HF to sodium fluoride (hereinafter NaF) (8.3 g, 198.7 mmol, 2.0 molar equivalent), difluoro Formation of the ionic complex (2a-Li) could not be confirmed.

[比較例1−4]
フッ素化剤をHFからフッ化カリウム(以下KF)(11.5g、198.7mmol、2.0モル当量)へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)の生成は確認できなかった。
[Comparative Example 1-4]
As a result of carrying out the reaction in the same procedure as Example 1-1, except that the fluorinating agent was changed from HF to potassium fluoride (hereinafter KF) (11.5 g, 198.7 mmol, 2.0 molar equivalent), difluoro Formation of the ionic complex (2a-Li) could not be confirmed.

[比較例1−5]
フッ素化剤をHFから濃度1mol/Lのテトラブチルアンモニウムフルオリド/THF溶液(199mL、2.0モル当量)へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)の生成は確認できなかった。
[Comparative Example 1-5]
As a result of carrying out the reaction in the same procedure as in Example 1-1, except that the fluorinating agent was changed from HF to a tetrabutylammonium fluoride / THF solution (199 mL, 2.0 molar equivalent) at a concentration of 1 mol / L. Formation of the ionic complex (2a-Li) could not be confirmed.

[比較例1−6]
フッ素化剤をHFからトリエチルアミンフッ化水素塩(24.1g、198.7mmol、2.0モル当量)へ変更した以外は実施例1−1と同じ手順にて反応を行った結果、ジフルオロイオン性錯体(2a−Li)の生成は確認できなかった。
[Comparative Example 1-6]
As a result of carrying out the reaction in the same procedure as in Example 1-1, except that the fluorinating agent was changed from HF to triethylamine hydrofluoride (24.1 g, 198.7 mmol, 2.0 molar equivalent), difluoroionic properties were obtained. Formation of the complex (2a-Li) could not be confirmed.

以上の比較例1−1〜1−6の内容を以下の表5(条件)、表6(結果)に示す。表5において、TBAFはテトラブチルアンモニウムフルオリドを表し、EtN・3HFはトリエチルアミン三フッ化水素塩を表す。 The contents of the above Comparative Examples 1-1 to 1-6 are shown in Table 5 (Condition) and Table 6 (Result) below. In Table 5, TBAF represents tetrabutylammonium fluoride, and Et 3 N · 3HF represents triethylamine trifluoride.

比較例1−2〜1−6は非酸性条件にてフッ素化を試みたものであるが、何れも目的物(2a−Li)の生成は確認できず、3分子配位体のフッ素化にはプロトン酸、又はルイス酸の助けが必要であることは明らかである。また、比較例1−1は特許文献10に開示された手法にて実施したものであるが、変換率、選択率は3分子配位体をフッ素化した結果(実施例2−6)から若干の低下が見られる上、塩素濃度は1500質量ppmと大幅に高くなった。  In Comparative Examples 1-2 to 1-6, fluorination was attempted under non-acidic conditions, but in any case, the formation of the target product (2a-Li) could not be confirmed, and fluorination of the trimolecular coordination body was not possible. Obviously, it needs the help of a protonic acid or a Lewis acid. Comparative Example 1-1 was carried out by the method disclosed in Patent Document 10, but the conversion rate and selectivity were slightly from the results of fluorination of the trimolecular coordination body (Example 2-6). In addition, the chlorine concentration was significantly increased to 1500 mass ppm.

Claims (13)

一般式(1)で示される6配位イオン性錯体(1)を非水溶媒中で、酸性フッ化カリウム、酸性フッ化ナトリウム、酸性フッ化アンモニウム、フッ化水素過剰の有機アミンフッ化水素塩、フッ化水素からなる群より選ばれる一つ以上のフッ素化剤によりフッ素化することを特徴とする、一般式(2)で示されるジフルオロイオン性錯体(2)の製造方法。


一般式(1)、(2)において、Aは金属イオン、プロトン及びオニウムイオンからなる群から選ばれるいずれか1つであり、MはP、As及びSbからなる群から選ばれるいずれか1つである。Fはフッ素原子である。Oは酸素原子である。
Yは炭素原子又は硫黄原子である。Yが炭素原子である場合qは1である。Yが硫黄原子である場合qは1又は2である。
Wは炭素数1〜10のヘテロ原子及び/又はハロゲン原子を有していてもよい炭化水素基(炭素数が3以上の場合にあっては、分岐鎖又は環状構造のものも使用できる)、又は−N(R1)−を表す。このとき、Rは水素原子、アルカリ金属、炭素数1〜10のヘテロ原子及び/又はハロゲン原子を有していてもよい炭化水素基を表す。炭素数が3以上の場合にあっては、Rは分岐鎖又は環状構造をとることもできる。Zは炭素原子である。pは0又は1、qは0〜2の整数、rは0〜2の整数、sは0又は1をそれぞれ表し、p+r≧1である。但し、sが0の場合は、Zに二重結合する酸素原子も存在しない。
A six-coordinated ionic complex (1) represented by the general formula (1) in a non-aqueous solvent , acidic potassium fluoride, acidic sodium fluoride, acidic ammonium fluoride, hydrogen fluoride-excess organic amine hydrofluoride, A method for producing a difluoroionic complex (2) represented by the general formula (2), wherein the fluorination is performed with one or more fluorinating agents selected from the group consisting of hydrogen fluoride .


In the general formulas (1) and (2), A + is any one selected from the group consisting of metal ions, protons and onium ions, and M is any one selected from the group consisting of P, As and Sb. One. F is a fluorine atom. O is an oxygen atom.
Y is a carbon atom or a sulfur atom. Q is 1 when Y is a carbon atom. Q is 1 or 2 when Y is a sulfur atom.
W is a hydrocarbon group that may have a heteroatom having 1 to 10 carbon atoms and / or a halogen atom (in the case where the number of carbon atoms is 3 or more, a branched chain or cyclic structure can also be used), Or -N (R < 1 >)-is represented. In this case, R 1 represents a hydrogen atom, an alkali metal, hydrocarbon group which may have a hetero atom and / or a halogen atom having 1 to 10 carbon atoms. When the number of carbon atoms is 3 or more, R 1 can take a branched chain or a cyclic structure. Z is a carbon atom. p is 0 or 1, q is an integer of 0 to 2, r is an integer of 0 to 2, s represents 0 or 1, and p + r ≧ 1. However, when s is 0, there is no oxygen atom double-bonded to Z.
一般式(1)で示される6配位イオン性錯体(1)を非水溶媒中で、酸性フッ化カリウム、酸性フッ化ナトリウム、酸性フッ化アンモニウム、フッ化水素過剰の有機アミンフッ化水素塩、フッ化水素、フッ化カリウム、フッ化ナトリウム、フッ化リチウム、フッ化セシウム、フッ化ニッケル、フッ化カルシウム、フッ化アンチモン、フッ化鉄、フッ化亜鉛、フッ化マンガン、フッ化イッテルビウム、フッ化ハフニウム、フッ化コバルト、フッ化アンモニウム、テトラブチルアンモニウムフルオリドからなる群より選ばれる一つ以上のフッ素化剤によりフッ素化する方法であって、フッ素化時に、硫酸、フルオロ硫酸、塩化水素、メタンスルホン酸、トリフルオロメタンスルホン酸、トリフルオロ酢酸、硝酸、p-トルエンスルホン酸、三フッ化ホウ素、五フッ化リン、三塩化アルミニウム、五塩化ニオブ、トリフルオロメタンスルホン酸金属塩からなる群より選ばれる1つ以上の酸又はルイス酸を非水溶媒に添加することを特徴とする、一般式(2)で示されるジフルオロイオン性錯体(2)の製造方法。


一般式(1)、(2)において、Aは金属イオン、プロトン及びオニウムイオンからなる群から選ばれるいずれか1つであり、MはP、As及びSbからなる群から選ばれるいずれか1つである。Fはフッ素原子である。Oは酸素原子である。
Yは炭素原子又は硫黄原子である。Yが炭素原子である場合qは1である。Yが硫黄原子である場合qは1又は2である。
Wは炭素数1〜10のヘテロ原子及び/又はハロゲン原子を有していてもよい炭化水素基(炭素数が3以上の場合にあっては、分岐鎖又は環状構造のものも使用できる)、又は−N(R1)−を表す。このとき、Rは水素原子、アルカリ金属、炭素数1〜10のヘテロ原子及び/又はハロゲン原子を有していてもよい炭化水素基を表す。炭素数が3以上の場合にあっては、Rは分岐鎖又は環状構造をとることもできる。Zは炭素原子である。pは0又は1、qは0〜2の整数、rは0〜2の整数、sは0又は1をそれぞれ表し、p+r≧1である。但し、sが0の場合は、Zに二重結合する酸素原子も存在しない。
A six-coordinated ionic complex (1) represented by the general formula (1) in a non-aqueous solvent , acidic potassium fluoride, acidic sodium fluoride, acidic ammonium fluoride, hydrogen fluoride-excess organic amine hydrofluoride, Hydrogen fluoride, potassium fluoride, sodium fluoride, lithium fluoride, cesium fluoride, nickel fluoride, calcium fluoride, antimony fluoride, iron fluoride, zinc fluoride, manganese fluoride, ytterbium fluoride, fluoride A method of fluorinating with one or more fluorinating agents selected from the group consisting of hafnium, cobalt fluoride, ammonium fluoride, and tetrabutylammonium fluoride . During fluorination, sulfuric acid, fluorosulfuric acid, hydrogen chloride, methane Sulfonic acid, trifluoromethanesulfonic acid, trifluoroacetic acid, nitric acid, p-toluenesulfonic acid, trifluoride One or more acids or Lewis acids selected from the group consisting of boron, phosphorus pentafluoride, aluminum trichloride, niobium pentachloride, and metal trifluoromethanesulfonate are added to a non-aqueous solvent. A method for producing the difluoroionic complex (2) represented by (2).


In the general formulas (1) and (2), A + is any one selected from the group consisting of metal ions, protons and onium ions, and M is any one selected from the group consisting of P, As and Sb. One. F is a fluorine atom. O is an oxygen atom.
Y is a carbon atom or a sulfur atom. Q is 1 when Y is a carbon atom. Q is 1 or 2 when Y is a sulfur atom.
W is a hydrocarbon group that may have a heteroatom having 1 to 10 carbon atoms and / or a halogen atom (in the case where the number of carbon atoms is 3 or more, a branched chain or cyclic structure can also be used), Or -N (R < 1 >)-is represented. In this case, R 1 represents a hydrogen atom, an alkali metal, hydrocarbon group which may have a hetero atom and / or a halogen atom having 1 to 10 carbon atoms. When the number of carbon atoms is 3 or more, R 1 can take a branched chain or a cyclic structure. Z is a carbon atom. p is 0 or 1, q is an integer of 0 to 2, r is an integer of 0 to 2, s represents 0 or 1, and p + r ≧ 1. However, when s is 0, there is no oxygen atom double-bonded to Z.
前記6配位イオン性錯体(1)と前記ジフルオロイオン性錯体(2)の各元素が下記の(a)、(b)、(c)から選ばれる少なくとも一つの組み合わせであることを特徴とする請求項1又は2に記載の製造方法。
(a)M=P、Y=C、p、q、s=1、r=0
(b)M=P、W=C(CF、p、q=0、r、s=1
(c)M=P、W=C(CF、p、q、s=0、r=2
Each element of the hexacoordinate ionic complex (1) and the difluoroionic complex (2) is at least one combination selected from the following (a), (b), and (c) The manufacturing method of Claim 1 or 2 .
(A) M = P, Y = C, p, q, s = 1, r = 0
(B) M = P, W = C (CF 3 ) 2 , p, q = 0, r, s = 1
(C) M = P, W = C (CF 3 ) 2 , p, q, s = 0, r = 2
前記フッ素化剤の当量が、前記6配位イオン性錯体(1)に対して1.5から50モル当量であることを特徴とする請求項1〜3のいずれか1項に記載の製造方法。 The manufacturing method according to any one of claims 1 to 3 , wherein the equivalent of the fluorinating agent is 1.5 to 50 molar equivalents relative to the hexacoordinate ionic complex (1). . 前記フッ素化剤がフッ化水素を含み、
前記フッ素化剤としてのフッ化水素の当量が前記6配位イオン性錯体(1)に対して1.5から50モル当量であることを特徴とする請求項1に記載の製造方法。
The fluorinating agent comprises hydrogen fluoride;
2. The production method according to claim 1, wherein the equivalent of hydrogen fluoride as the fluorinating agent is 1.5 to 50 molar equivalents relative to the six-coordinated ionic complex (1).
前記酸又はルイス酸の当量が前記6配位イオン性錯体(1)に対して0.001〜2.0モル当量であることを特徴とする請求項に記載の製造方法。 The production method according to claim 2 , wherein an equivalent amount of the acid or Lewis acid is 0.001 to 2.0 molar equivalents relative to the hexacoordinate ionic complex (1). 前記酸がトリフルオロメタンスルホン酸、メタンスルホン酸、トリフルオロ酢酸からなる群より選ばれる1つ以上であり、前記フッ素化剤以外の酸の当量が前記6配位イオン性錯体(1)に対して0.001〜2.0モル当量であることを特徴とする請求項に記載の製造方法。 The acid is one or more selected from the group consisting of trifluoromethanesulfonic acid, methanesulfonic acid, and trifluoroacetic acid, and the equivalent of an acid other than the fluorinating agent is based on the six-coordinated ionic complex (1). It is 0.001-2.0 molar equivalent, The manufacturing method of Claim 2 characterized by the above-mentioned. 前記フッ素化剤がフッ化水素であり、前記フッ素化剤以外の酸がトリフルオロメタンスルホン酸、メタンスルホン酸、トリフルオロ酢酸からなる群より選ばれる1つ以上であることを特徴とする請求項に記載の製造方法。 The fluorinating agent is hydrogen fluoride, claim, wherein the acid other than said fluorinated agent is trifluoromethanesulfonic acid, methanesulfonic acid, one or more members selected from the group consisting of trifluoroacetic acid 2 The manufacturing method as described in. 前記非水溶媒が炭酸エステル類、エステル類、ケトン類、ラクトン類、エーテル類、ニトリル類、アミド類、スルホン類からなる群より選ばれる一つ、又はこれらの混合物であることを特徴とする請求項1〜のいずれか1項に記載の製造方法。 The non-aqueous solvent is one selected from the group consisting of carbonates, esters, ketones, lactones, ethers, nitriles, amides and sulfones, or a mixture thereof. Item 9. The production method according to any one of Items 1 to 8 . 前記非水溶媒が炭酸ジメチル、炭酸エチルメチル、炭酸ジエチル、炭酸メチルプロピル、炭酸エチルプロピル、酢酸エチル、酢酸プロピル、酢酸ブチル、プロピオン酸メチル、プロピオン酸エチル、プロピオン酸ブチル、アセトン、エチルメチルケトン、ジエチルケトン、γ−ブチロラクトン、γ−バレロラクトン、テトラヒドロフラン、テトラヒドロピラン、ジブチルエーテル、ジイソプロピルエーテル、1,2−ジメトキシエタン、1,2−ジエトキシエタン、アセトニトリル、プロピオニトリル、N,N−ジメチルホルムアミド、ジメチルスルホキシド、スルホランからなる群より選ばれる一つ、又はこれらの混合物であることを特徴とする請求項1〜のいずれか1項に記載の製造方法。 The nonaqueous solvent is dimethyl carbonate, ethyl methyl carbonate, diethyl carbonate, methyl propyl carbonate, ethyl propyl carbonate, ethyl acetate, propyl acetate, butyl acetate, methyl propionate, ethyl propionate, butyl propionate, acetone, ethyl methyl ketone, Diethyl ketone, γ-butyrolactone, γ-valerolactone, tetrahydrofuran, tetrahydropyran, dibutyl ether, diisopropyl ether, 1,2-dimethoxyethane, 1,2-diethoxyethane, acetonitrile, propionitrile, N, N-dimethylformamide , one selected from the group consisting of dimethyl sulfoxide, sulfolane, or process according to any one of claims 1 to 9, characterized in that a mixture thereof. フッ素化を−60℃〜150℃の温度で実施する請求項1〜10のいずれか1項に記載の製造方法。 The production method according to any one of claims 1 to 10 , wherein the fluorination is carried out at a temperature of -60 ° C to 150 ° C. フッ素化後に減圧操作を行うことを特徴とする請求項1〜11のいずれか1項に記載の製造方法。 The production method according to any one of claims 1 to 11 , wherein a pressure reduction operation is performed after fluorination. 前記6配位イオン性錯体(1)と前記ジフルオロイオン性錯体(2)の配位子がシュウ酸であり、フッ素化後の減圧操作にて析出したシュウ酸をろ過にて分離することを特徴とする請求項1〜12のいずれか1項に記載の製造方法。 The ligand of the six-coordinated ionic complex (1) and the difluoroionic complex (2) is oxalic acid, and the oxalic acid deposited by the depressurization operation after fluorination is separated by filtration. The manufacturing method according to any one of claims 1 to 12 .
JP2014200351A 2014-09-30 2014-09-30 Method for producing difluoroionic complex Active JP6394242B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014200351A JP6394242B2 (en) 2014-09-30 2014-09-30 Method for producing difluoroionic complex
PCT/JP2015/075405 WO2016052092A1 (en) 2014-09-30 2015-09-08 Method for producing difluoro ionic complex
TW104132232A TWI595003B (en) 2014-09-30 2015-09-30 Method for producing difluoride ion complex

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014200351A JP6394242B2 (en) 2014-09-30 2014-09-30 Method for producing difluoroionic complex

Publications (2)

Publication Number Publication Date
JP2016069328A JP2016069328A (en) 2016-05-09
JP6394242B2 true JP6394242B2 (en) 2018-09-26

Family

ID=55630135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014200351A Active JP6394242B2 (en) 2014-09-30 2014-09-30 Method for producing difluoroionic complex

Country Status (3)

Country Link
JP (1) JP6394242B2 (en)
TW (1) TWI595003B (en)
WO (1) WO2016052092A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6871008B2 (en) * 2017-02-13 2021-05-12 積水化学工業株式会社 Electrolytes for lithium-ion secondary batteries, electrolytes for lithium-ion secondary batteries using them, and lithium-ion secondary batteries
WO2019111958A1 (en) 2017-12-06 2019-06-13 セントラル硝子株式会社 Liquid electrolyte for non-aqueous electrolyte cell, and non-aqueous electrolyte cell in which said liquid electrolyte for non-aqueous electrolyte cell is used
JP7168851B2 (en) 2017-12-06 2022-11-10 セントラル硝子株式会社 Electrolyte for non-aqueous electrolyte battery and non-aqueous electrolyte battery using the same
CN109180730A (en) * 2018-08-29 2019-01-11 苏州松湖新能源材料有限公司 A kind of double oxalic acid method for production of phosphate salt of difluoro
CN112661791B (en) * 2020-12-23 2023-09-22 多氟多新材料股份有限公司 Preparation method of difluoro lithium bisoxalato phosphate
WO2024012974A1 (en) * 2022-07-13 2024-01-18 Bayerische Motoren Werke Aktiengesellschaft Liquid electrolyte composition comprising a salt, electrochemical cell comprising the electrolyte composition, salt, and use of the salt in the electrochemical cell

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10016801A1 (en) * 2000-04-05 2001-10-11 Merck Patent Gmbh Lithium salts, processes for their production, non-aqueous electrolyte and electrochemical cell
JP3907446B2 (en) * 2001-11-05 2007-04-18 セントラル硝子株式会社 Synthesis of ionic metal complexes
US6849752B2 (en) * 2001-11-05 2005-02-01 Central Glass Company, Ltd. Process for synthesizing ionic metal complex
US20100267984A1 (en) * 2006-09-07 2010-10-21 U.S. Government As Represented By The Secretary Of The Army Oxyfluorophosphate synthesis process and compound therefrom
JP5120596B2 (en) * 2006-11-22 2013-01-16 ソニー株式会社 Non-aqueous electrolyte, electrochemical device and non-aqueous secondary battery
JP5119182B2 (en) * 2009-02-24 2013-01-16 トヨタ自動車株式会社 Method for producing lithium ion secondary battery

Also Published As

Publication number Publication date
WO2016052092A1 (en) 2016-04-07
TWI595003B (en) 2017-08-11
JP2016069328A (en) 2016-05-09
TW201623319A (en) 2016-07-01

Similar Documents

Publication Publication Date Title
JP6394242B2 (en) Method for producing difluoroionic complex
CN109311669B (en) Method for producing alkali metal salt of bis (fluorosulfonyl) imide, and alkali metal salt composition of bis (fluorosulfonyl) imide
US7465517B2 (en) High purity lithium polyhalogenated boron cluster salts useful in lithium batteries
KR101046107B1 (en) How to Purify Battery Active Materials
JP6595104B2 (en) Method for producing non-aqueous electrolyte
KR102208181B1 (en) Method for producing bis(fluorosulfonyl)imide alkali metal salt
JP4560132B2 (en) Method for producing difluorophosphate
US10967295B2 (en) Processes for removing reactive solvent from lithium bis(fluorosulfonyl)imide (LiFSI) using organic solvents that are stable toward anodes in lithium-ion and lithium-metal batteries
US20220384847A1 (en) Method for producing lithium difluorophosphate, method for producing difluorophosphate ester, lithium difluorophosphate, method for producing nonaqueous electrolytic solution, and method for producing nonaqueous secondary battery
TWI594489B (en) Electrolyte solution purification method and electrolyte solution manufacturing method
WO2020100115A1 (en) Processes for removing reactive solvent from lithium bis(fluorosulfonyl)imide (lifsi) using organic solvents that are stable toward anodes in lithium-ion and lithium-metal batteries
JP6691740B2 (en) Method for producing fluorosulfonylimide compound
JP2017052689A (en) Granules or powder of disulfonyl amide salt
JP5793284B2 (en) Method for producing difluorophosphate
JP7042018B2 (en) Manufacturing method of electrolytic solution material
JP2017122058A (en) Aminosulfonyl imide salt

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170620

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180206

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180214

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180605

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180717

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180731

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180813

R150 Certificate of patent or registration of utility model

Ref document number: 6394242

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250